WO2003014426A1 - Procede de production de particules electro-conductrices - Google Patents
Procede de production de particules electro-conductrices Download PDFInfo
- Publication number
- WO2003014426A1 WO2003014426A1 PCT/JP2002/007794 JP0207794W WO03014426A1 WO 2003014426 A1 WO2003014426 A1 WO 2003014426A1 JP 0207794 W JP0207794 W JP 0207794W WO 03014426 A1 WO03014426 A1 WO 03014426A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- particles
- plated
- barrel
- plating layer
- plating
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/16—Apparatus for electrolytic coating of small objects in bulk
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/006—Nanoparticles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/18—Non-metallic particles coated with metal
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/16—Apparatus for electrolytic coating of small objects in bulk
- C25D17/18—Apparatus for electrolytic coating of small objects in bulk having closed containers
- C25D17/20—Horizontal barrels
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/20—Electroplating using ultrasonics, vibrations
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Nanotechnology (AREA)
- Electroplating Methods And Accessories (AREA)
- Physical Vapour Deposition (AREA)
- Chemically Coating (AREA)
- Powder Metallurgy (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2004-7001429A KR20040019089A (ko) | 2001-07-31 | 2002-07-31 | 도전성 미립자의 제조 방법 |
DE10296936T DE10296936T5 (de) | 2001-07-31 | 2002-07-31 | Verfahren zur Herstellung von elektroleitfähigen Teilchen |
US10/485,369 US7045050B2 (en) | 2001-07-31 | 2002-07-31 | Method for producing electroconductive particles |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001-231927 | 2001-07-31 | ||
JP2001231927 | 2001-07-31 | ||
JP2002022115 | 2002-01-30 | ||
JP2002-22115 | 2002-01-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003014426A1 true WO2003014426A1 (fr) | 2003-02-20 |
Family
ID=26619678
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2002/007794 WO2003014426A1 (fr) | 2001-07-31 | 2002-07-31 | Procede de production de particules electro-conductrices |
Country Status (6)
Country | Link |
---|---|
US (1) | US7045050B2 (ja) |
KR (1) | KR20040019089A (ja) |
CN (1) | CN1261621C (ja) |
DE (1) | DE10296936T5 (ja) |
TW (1) | TW554350B (ja) |
WO (1) | WO2003014426A1 (ja) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100784902B1 (ko) * | 2004-12-30 | 2007-12-11 | 주식회사 동부하이텍 | 플라스틱 전도성 미립자의 제조방법 |
KR100650284B1 (ko) * | 2005-02-22 | 2006-11-27 | 제일모직주식회사 | 도전성능이 우수한 고분자 수지 미립자, 전도성 미립자 및이를 포함한 이방 전도성 접속재료 |
KR100720895B1 (ko) * | 2005-07-05 | 2007-05-22 | 제일모직주식회사 | 농도 구배를 갖는 이종(異種) 복합 금속층이 형성된 전도성미립자, 그 제조방법 및 이를 이용한 이방 전도성 접착제조성물 |
ES2422455T3 (es) | 2005-08-12 | 2013-09-11 | Modumetal Llc | Materiales compuestos modulados de manera composicional y métodos para fabricar los mismos |
US7713859B2 (en) * | 2005-08-15 | 2010-05-11 | Enthone Inc. | Tin-silver solder bumping in electronics manufacture |
KR100765363B1 (ko) * | 2005-10-31 | 2007-10-09 | 전자부품연구원 | 도전성 입자의 제조 방법 |
US7521128B2 (en) * | 2006-05-18 | 2009-04-21 | Xtalic Corporation | Methods for the implementation of nanocrystalline and amorphous metals and alloys as coatings |
KR100693132B1 (ko) * | 2006-06-23 | 2007-03-14 | 동해전장 주식회사 | 정션박스내에 삽입된 릴레이의 동작 검사 장치 |
US8226807B2 (en) | 2007-12-11 | 2012-07-24 | Enthone Inc. | Composite coatings for whisker reduction |
US20090145764A1 (en) * | 2007-12-11 | 2009-06-11 | Enthone Inc. | Composite coatings for whisker reduction |
JP5765606B2 (ja) * | 2009-02-20 | 2015-08-19 | 日立金属株式会社 | 電子部品用複合ボールの製造方法 |
WO2010144509A2 (en) | 2009-06-08 | 2010-12-16 | Modumetal Llc | Electrodeposited, nanolaminate coatings and claddings for corrosion protection |
JP5435355B2 (ja) * | 2009-09-04 | 2014-03-05 | 日立金属株式会社 | メッキ装置 |
EP2783517A2 (en) * | 2011-10-03 | 2014-10-01 | Tyco Electronics Raychem BVBA | Aggregation enclosure for elevated, outdoor locations |
GB201212489D0 (en) | 2012-07-13 | 2012-08-29 | Conpart As | Improvements in conductive adhesives |
CA2905575C (en) | 2013-03-15 | 2022-07-12 | Modumetal, Inc. | A method and apparatus for continuously applying nanolaminate metal coatings |
EA032264B1 (ru) | 2013-03-15 | 2019-05-31 | Модьюметл, Инк. | Способ нанесения покрытия на изделие, изделие, полученное вышеуказанным способом, и труба |
EA201500949A1 (ru) | 2013-03-15 | 2016-02-29 | Модьюметл, Инк. | Способ формирования многослойного покрытия, покрытие, сформированное вышеуказанным способом, и многослойное покрытие |
EA201790643A1 (ru) | 2014-09-18 | 2017-08-31 | Модьюметал, Инк. | Способ и устройство для непрерывного нанесения нанослоистых металлических покрытий |
AR102068A1 (es) | 2014-09-18 | 2017-02-01 | Modumetal Inc | Métodos de preparación de artículos por electrodeposición y procesos de fabricación aditiva |
BR112017009761B1 (pt) | 2014-11-14 | 2022-04-19 | Ykk Corporation | Método para tratamento eletrolítico de superfície de parte de acessório de vestuário |
US10626515B2 (en) | 2014-11-14 | 2020-04-21 | Ykk Corporation | Surface electrolytic treatment apparatus for garment accessory part |
CA3036191A1 (en) * | 2016-09-08 | 2018-03-15 | Modumetal, Inc. | Processes for providing laminated coatings on workpieces, and articles made therefrom |
CA3060619A1 (en) | 2017-04-21 | 2018-10-25 | Modumetal, Inc. | Tubular articles with electrodeposited coatings, and systems and methods for producing the same |
CN108085734B (zh) * | 2017-12-26 | 2019-11-05 | 石家庄铁道大学 | 试验用小型滚镀装置 |
WO2019210264A1 (en) | 2018-04-27 | 2019-10-31 | Modumetal, Inc. | Apparatuses, systems, and methods for producing a plurality of articles with nanolaminated coatings using rotation |
CN111155163B (zh) * | 2020-01-14 | 2022-04-29 | 北京大学东莞光电研究院 | 一种小型零部件的电镀装置及其电镀方法 |
CN115595652A (zh) * | 2022-09-28 | 2023-01-13 | 广东微容电子科技有限公司(Cn) | 一种mlcc大高产品电镀的滚筒搅拌方法 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55119197A (en) * | 1979-03-02 | 1980-09-12 | Tipton Mfg Corp | Vibrating plating device with plating liquid circulating device |
US5167779A (en) * | 1990-08-17 | 1992-12-01 | Henig Hans J | Process and apparatus for electrolyte exchange |
JPH09137289A (ja) * | 1995-04-03 | 1997-05-27 | Sekisui Finechem Co Ltd | 導電性微粒子の製造方法 |
WO1998046811A1 (en) * | 1997-04-17 | 1998-10-22 | Sekisui Chemical Co., Ltd. | Conductive particles and method and device for manufacturing the same, anisotropic conductive adhesive and conductive connection structure, and electronic circuit components and method of manufacturing the same |
JPH10331000A (ja) * | 1997-05-30 | 1998-12-15 | Mitsui High Tec Inc | 電気めっき液の濃度安定化方法 |
JPH1136099A (ja) * | 1997-07-16 | 1999-02-09 | Kizai Kk | めっき装置およびそれによるめっき方法 |
US5965820A (en) * | 1995-07-14 | 1999-10-12 | Murata Manufacturing Co., Ltd. | Vibrational processing apparatus and method |
JP2001032097A (ja) * | 1999-07-23 | 2001-02-06 | Nec Corp | めっき装置とその置換析出防止方法 |
JP2002121699A (ja) * | 2000-05-25 | 2002-04-26 | Nippon Techno Kk | めっき浴の振動流動とパルス状めっき電流との組み合わせを用いた電気めっき方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3494327A (en) * | 1968-01-22 | 1970-02-10 | Minnesota Mining & Mfg | Vibratory-rotary tumbler |
JPS5856202B2 (ja) | 1976-06-02 | 1983-12-14 | 株式会社井上ジャパックス研究所 | 導電性粒子 |
JPH0689068B2 (ja) | 1985-05-31 | 1994-11-09 | 積水ファインケミカル株式会社 | 導電性微球体の製造方法 |
JPH0689069B2 (ja) | 1985-05-31 | 1994-11-09 | 積水ファインケミカル株式会社 | 導電性微球体 |
JPS62185749A (ja) | 1986-02-12 | 1987-08-14 | Dainippon Ink & Chem Inc | 導電性被覆粒体 |
JP2507381B2 (ja) | 1987-01-30 | 1996-06-12 | 積水フアインケミカル株式会社 | 導電性微球体 |
JPH01225776A (ja) | 1988-03-07 | 1989-09-08 | Mitsubishi Metal Corp | 銀被覆球状フエノール樹脂粉末 |
JPH01247501A (ja) | 1988-03-30 | 1989-10-03 | Pentel Kk | 導電性粒子 |
JPH04147513A (ja) | 1990-10-08 | 1992-05-21 | Kao Corp | 導電性微粒子及びその製造方法 |
US5580838A (en) * | 1995-06-05 | 1996-12-03 | Patterson; James A. | Uniformly plated microsphere catalyst |
US5698081A (en) * | 1995-12-07 | 1997-12-16 | Materials Innovation, Inc. | Coating particles in a centrifugal bed |
JP3776566B2 (ja) | 1997-07-01 | 2006-05-17 | 株式会社大和化成研究所 | めっき方法 |
WO1999023676A1 (fr) * | 1997-10-30 | 1999-05-14 | Sumitomo Special Metals Co., Ltd. | Procede de fabrication d'aimants a liaison r-fe-b presentant une haute resistance a la corrosion |
JPH11200097A (ja) | 1998-01-14 | 1999-07-27 | Matsushita Electric Ind Co Ltd | チップ部品のバレルめっき方法 |
JP3360250B2 (ja) | 1998-03-05 | 2002-12-24 | 株式会社アライドマテリアル | 複合マイクロボールとその製造方法と製造装置 |
JP3872201B2 (ja) | 1998-03-25 | 2007-01-24 | ディップソール株式会社 | 錫−銀系合金酸性電気めっき浴 |
JPH11279800A (ja) | 1998-03-26 | 1999-10-12 | Hitachi Metals Ltd | 小型電子部品のめっき方法 |
US6322685B1 (en) * | 1998-05-13 | 2001-11-27 | International Business Machines Corporation | Apparatus and method for plating coatings on to fine powder materials and use of the powder therefrom |
JP2000021993A (ja) | 1998-06-29 | 2000-01-21 | Oki Electric Ind Co Ltd | バイポーラデバイスの検査用回路素子 |
JP3396475B2 (ja) | 1999-04-28 | 2003-04-14 | 住友特殊金属株式会社 | 樹脂成形体表面への金属被膜の形成方法 |
-
2002
- 2002-07-31 CN CNB028151518A patent/CN1261621C/zh not_active Expired - Fee Related
- 2002-07-31 WO PCT/JP2002/007794 patent/WO2003014426A1/ja active Application Filing
- 2002-07-31 US US10/485,369 patent/US7045050B2/en not_active Expired - Fee Related
- 2002-07-31 DE DE10296936T patent/DE10296936T5/de not_active Withdrawn
- 2002-07-31 TW TW091117099A patent/TW554350B/zh active
- 2002-07-31 KR KR10-2004-7001429A patent/KR20040019089A/ko active IP Right Grant
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55119197A (en) * | 1979-03-02 | 1980-09-12 | Tipton Mfg Corp | Vibrating plating device with plating liquid circulating device |
US5167779A (en) * | 1990-08-17 | 1992-12-01 | Henig Hans J | Process and apparatus for electrolyte exchange |
JPH09137289A (ja) * | 1995-04-03 | 1997-05-27 | Sekisui Finechem Co Ltd | 導電性微粒子の製造方法 |
US5965820A (en) * | 1995-07-14 | 1999-10-12 | Murata Manufacturing Co., Ltd. | Vibrational processing apparatus and method |
WO1998046811A1 (en) * | 1997-04-17 | 1998-10-22 | Sekisui Chemical Co., Ltd. | Conductive particles and method and device for manufacturing the same, anisotropic conductive adhesive and conductive connection structure, and electronic circuit components and method of manufacturing the same |
JPH10331000A (ja) * | 1997-05-30 | 1998-12-15 | Mitsui High Tec Inc | 電気めっき液の濃度安定化方法 |
JPH1136099A (ja) * | 1997-07-16 | 1999-02-09 | Kizai Kk | めっき装置およびそれによるめっき方法 |
JP2001032097A (ja) * | 1999-07-23 | 2001-02-06 | Nec Corp | めっき装置とその置換析出防止方法 |
JP2002121699A (ja) * | 2000-05-25 | 2002-04-26 | Nippon Techno Kk | めっき浴の振動流動とパルス状めっき電流との組み合わせを用いた電気めっき方法 |
Also Published As
Publication number | Publication date |
---|---|
US7045050B2 (en) | 2006-05-16 |
DE10296936T5 (de) | 2004-07-29 |
CN1261621C (zh) | 2006-06-28 |
CN1537180A (zh) | 2004-10-13 |
US20040234683A1 (en) | 2004-11-25 |
KR20040019089A (ko) | 2004-03-04 |
TW554350B (en) | 2003-09-21 |
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