WO2002031234A1 - Appareil de croissance de cristal - Google Patents
Appareil de croissance de cristal Download PDFInfo
- Publication number
- WO2002031234A1 WO2002031234A1 PCT/JP2001/008810 JP0108810W WO0231234A1 WO 2002031234 A1 WO2002031234 A1 WO 2002031234A1 JP 0108810 W JP0108810 W JP 0108810W WO 0231234 A1 WO0231234 A1 WO 0231234A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- cooling body
- cooling
- crystal
- support member
- furnace
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/206—Controlling or regulating the thermal history of growing the ingot
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1068—Seed pulling including heating or cooling details [e.g., shield configuration]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1072—Seed pulling including details of means providing product movement [e.g., shaft guides, servo means]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1076—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
- Y10T117/1088—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone including heating or cooling details
Definitions
- the present invention relates to a crystal growth apparatus used for producing a silicon single crystal or the like used as a semiconductor material.
- CZ method Choklarsky method
- a seed crystal is immersed in a silicon melt formed in a quartz crucible, and from this state, the seed crystal is gradually rotated upward while rotating the crucible and the seed crystal. To grow a single crystal of silicon below the seed crystal.
- the distribution of defects in the crystal cross section is governed by the crystal growth rate, that is, the pulling rate. More specifically, as the pulling speed is increased, the ring-shaped OSF generation region moves to the outer peripheral portion, and is eventually removed to the outside of the effective crystal portion. Conversely, when the pulling speed is reduced, the ring-shaped OSF generation region moves to the center of the crystal and eventually disappears at the center.
- the heat shield is an inverted frustum-shaped cylindrical heat insulation member provided so as to surround the periphery of the single crystal, and mainly blocks the radiant heat from the heater inside the crucible and the heater arranged outside the crucible. This promotes the cooling of the single crystal pulled from the melt and increases the pulling speed.
- the cylindrical main body of the cooling body is a part of the cooling body, that is, a flange integrated with the cylindrical main body.
- the water passage pipe extending from the cylindrical main body is supported and fixed as a supporting member in the furnace of the pulling furnace.
- a copper-based metal member that is forcibly cooled by passing water is recommended from the viewpoint of cooling capacity for a single crystal, but the tubular main body and its supporting member as described above are integrated.
- the cylindrical main body is made of a copper-based metal, the support member is inevitably made of the same copper-based metal as the main body.
- the supporting member is the same copper-based metal as the main body.
- the dislocation is generated in the single crystal during the bow I raising due to the excessive cooling of the support member and the drop of a large amount of silicon oxide deposited on the surface.
- the supporting member is made of the same copper-based metal as the main body, it is difficult to secure the mechanical strength of that part. For this reason, there is a concern that the position of the main body may be displaced due to the deformation of the support member, thereby distorting the pulled crystal and hindering high speed operation, or causing a steam explosion by breaking the piping. This danger is particularly great when copper water pipes are used as support members.
- An object of the present invention is to provide a bow 1 without lowering the cooling capacity for the raised crystal.
- Another object of the present invention is to provide a crystal growth apparatus capable of avoiding a reduction in the dislocation-free pulling rate, reducing the manufacturing cost of the cooling body, and solving various problems due to the displacement of the cooling body. Disclosure of the invention
- a crystal growth apparatus of the present invention is a crystal growth apparatus for growing a single crystal from a raw material melt in a pulling furnace by a CZ method, wherein the single crystal is grown from the raw material melt.
- a cylindrical cooling body is provided, and the cooling body is detachably supported on the furnace body of the pulling furnace by an independent support member divided from the cooling body.
- a cylindrical cooling body is made of a copper-based metal with good heat conductivity.
- the support member can be made of, for example, stainless steel, which is cheaper than copper-based metal, has higher mechanical strength, and has poor thermal conductivity.
- the support member is prevented from being excessively cooled without lowering the cooling capacity for the bow I raised crystal, and a reduction in the dislocation-free pulling rate is avoided.
- the manufacturing cost of the cooling body is reduced, and the supporting strength of the cooling body is increased, thereby solving various problems due to the displacement.
- the cooling body can be attached to and detached from the support member, it becomes easy to design the cooling body according to the bow I raising condition.
- the cooling body is made of a metal body that is forcibly cooled by passing water.
- a copper-based metal mainly composed of copper having good thermal conductivity is preferable.
- the specific dimensions and shape of the cooling body are appropriately designed according to the pulling conditions.
- the supporting member is preferable in that a plurality of supporting arms radially arranged around the pulling shaft in the furnace do not obstruct the gas flow in the furnace and can reduce material costs.
- a constituent material of the support member a material that is less expensive, has higher mechanical strength, and lower thermal conductivity than copper-based metal is preferable.
- stainless steel is optimal, but graphite, carbon fiber composite, etc. Is also effective.
- the supporting member is made of a material having a lower thermal conductivity than that of the copper-based metal and then cooled with water, from the viewpoint of increasing the pulling speed.
- the method of fixing the cooling body and the support member is not particularly limited, but the connection and fixing by bolts are simple and preferable. For simplicity, it is possible to put the cooling body on or off the support member, but it is important to take care not to apply a load to the water piping to the cooling body. .
- Cooling bodies should also be combined with heat shields and placed inside.
- the combination with the heat shield not only promotes the cooling of the crystal, but also more effectively suppresses the temperature rise of the cooling body itself. And the bow I raising speed is promoted.
- FIG. 1 is a longitudinal sectional view of a pulling furnace showing the structure of an example of the crystal growth apparatus of the present invention
- FIG. 2 is a transverse sectional view of the pulling furnace
- FIG. 3 is a longitudinal sectional view of a main part of the pulling furnace.
- the pulling furnace has a cylindrical main cylinder 1 and a pull chamber 2 as furnace bodies.
- the pull chamber 2 which is smaller in diameter and longer than the main chamber 1, is set up on the center of the main chamber 1.
- the crucible 3 is located in the center of the main chamber 1.
- the crucible 3 is composed of an inner quartz crucible filled with polycrystalline silicon and a graphite supporting crucible fitted on the outer side.
- the crucible 3 is driven to rotate and move up and down by a support shaft called ⁇ distal.
- a resistance heating type heater 4 is arranged concentrically, and further outside the crucible 1, a heat retaining cylinder 5 is arranged along the inner surface of the main chamber 11.
- the caster 4 melts the polycrystalline silicon filled in the crucible 3 to form a silicon melt 6 in the crucible 3.
- a wire 7 serving as a pulling shaft is suspended through the center of the pull chamber 12.
- the wire 7 is driven to rotate by a pulling mechanism provided on the upper part of the pull chamber 2 and is driven to move up and down in the axial direction.
- a shield chuck for holding a seed crystal is attached at the lower end of the wire 7, a shield chuck for holding a seed crystal is attached. Seed crystals held in the seed hack A single crystal of silicon 8 is grown below the seed crystal by immersing it in the melt 6 in the crucible 3 and driving the wire 7 to gradually raise the seed crystal while rotating it.
- a cylindrical heat shield 9 is provided concentrically near the melt 6 in the crucible 3 so as to surround the single crystal 8.
- the heat shield 9 is made of graphite, and its diameter gradually increases from below to above in order to effectively block the radiant heat from the melt 6 and the heater 4 in the crucible 3, and the lower part is inserted into the crucible 3. And placed above the melt 6 in the crucible 3.
- a cylindrical cooling body 10 is provided concentrically inside the heat shielding body 9.
- the cooling body 10 is arranged inside the lower part of the heat shield 9, and like the heat shield 9, has a theno shape in which the diameter gradually increases from below to above.
- the cooling body 10 is made of a copper-based metal having good thermal conductivity, and an annular water passage 10a is formed in a plurality of stages inside the cooling body. Then, cooling water is forcibly cooled by supplying cooling water to the water passage 10a through the water-flowing pipes 11 and 11 made of copper-based metal, and the cooling body 10 is particularly cooled immediately after solidification of the single crystal 8. Promotes cooling of hot parts.
- the water supply pipes 11 and 11 are welded to the cooling body 10 and supported so that the load of the cooling body 10 is not applied.
- the support member that supports the cooling body 1Q in the furnace includes, here, a plurality of support arms 12 ′ arranged radially around a pulling axis in the furnace.
- the support arm 1 2 ′ is made of a substantially inverted L-shaped bar that extends horizontally from the upper inner peripheral surface of the main chamber 11 toward the center of the furnace, and curves downward from the middle, and has an upper end portion. It penetrates and is fixed to the side wall of the main chamber 1.
- An upper end of the cooling body 1G is detachably connected to each lower end of the support arms 1 2 ⁇ by a radial bolt 13.
- each support arm 12 is made of stainless steel, and has a U-shaped water passage 12a extending in the longitudinal direction of the arm. Then, each support arm 12 is forcibly cooled by the cooling water supplied to the water passage 12a.
- the polycrystalline silicon material is charged to the crucible 3 in an amount of 100 kg, and then the chamber is set to an Ar atmosphere of 133 Pa.
- the heater 4 provided outside the crucible 3 melts the polycrystalline silicon raw material in the crucible 3 and grows a single crystal 8 having a diameter of 200 mm below it using a 100-oriented seed crystal. Let it.
- the crucible 3 is gradually raised in accordance with the crystal growth so that the liquid level of the melt 6 in the crucible 3 is kept constant.
- the crucible 3 is rotated in the same or opposite direction as the rotation direction of the single crystal 8.
- the cooling body 10 was made of a copper-based metal, the average pulling speed of the straight body of the single crystal 8 was 2.3 mm / min. In addition, although five single crystals 8 were pulled, all five were able to be pulled without dislocation, and no displacement of the cooling body 10 occurred. This is because the supporting arm 12 of the cooling body 10 was made of stainless steel different from that of the cooling body 10 so that it could be prevented from being too cold, and the supporting strength of the cooling body 10 could be increased. That is the reason.
- the cooling body 10 and the supporting arms 12 ⁇ were integrally made of copper-based metal, and both were cooled with water. A pulling speed of 2.3 mm Z was achieved, but the rate of dislocation-free pulling with five pulls was only 40% of two of the five pulls.
- Manufacturing of the cooling body 10 including the support arms 1 2 ⁇ ⁇ ⁇ The cost is to manufacture the cooling body 10 from copper-based metal, and to manufacture the support arms 1 2 ⁇ ⁇ stainless steel and bolt them together. About 3 compared to the case Doubled.
- the supporting strength of the cooling body 10 was not sufficient, and there was a concern that the displacement of the cooling body 10 would cause crystal deformation, decrease the pulling speed, and breakage of the pipe due to the application of a load to the water flow pipe.
- the cooling body 10 and the supporting arms 12 ⁇ ⁇ ⁇ were integrally made of stainless steel, and both were cooled with water before use.
- the achieved pulling speed was reduced to 1.7 mm / min.
- the pull-up rate of dislocation-free with five pull-ups was only 20% of one out of five. This is presumed to be due to the fact that the possibility of dislocations increased due to the longer pulling process time due to the lower speed.
- the manufacturing cost of the cooling body 10 including the support arms 1 2- is made by manufacturing the cooling body 1 Q from copper-based metal, manufacturing the support arms 1 2 ⁇ 'from stainless steel, and bolting both. It increased about 2.5 times compared to the case. However, the support strength of the cooling body 10 was sufficient, and there was no concern about displacement of the cooling body 10.
- the cooling body for cooling the pulled crystal to increase the pulling speed is provided to the furnace body of the pulling furnace by the independent support member divided from the cooling body.
- the detachable support makes it possible to avoid a drop in the dislocation-free pull rate without lowering the cooling capacity for the pulled crystal. Also, the manufacturing cost of the cooling body can be reduced. Further, it is possible to increase the supporting strength of the cooling body, and to avoid crystal deformation and a decrease in the pulling speed due to the displacement thereof, and to prevent the pipe from being broken due to the addition of a load to the water flow pipe.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10194625.2T DE10194625B3 (de) | 2000-10-10 | 2001-10-05 | Vorrichtung zum Züchten eines Kristalls |
US10/149,223 US6764547B2 (en) | 2000-10-10 | 2001-10-05 | Crystal growth apparatus |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-309107 | 2000-10-10 | ||
JP2000309107A JP3587155B2 (ja) | 2000-10-10 | 2000-10-10 | 結晶成長装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2002031234A1 true WO2002031234A1 (fr) | 2002-04-18 |
Family
ID=18789322
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2001/008810 WO2002031234A1 (fr) | 2000-10-10 | 2001-10-05 | Appareil de croissance de cristal |
Country Status (5)
Country | Link |
---|---|
US (1) | US6764547B2 (ja) |
JP (1) | JP3587155B2 (ja) |
KR (1) | KR100499435B1 (ja) |
DE (1) | DE10194625B3 (ja) |
WO (1) | WO2002031234A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110106547A (zh) * | 2019-06-25 | 2019-08-09 | 宁夏银和新能源科技有限公司 | 提高直拉单晶拉速的装置 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005162599A (ja) | 2003-12-03 | 2005-06-23 | Siltron Inc | 均一なベイカンシ欠陥を有するシリコン単結晶インゴット、シリコンウエハ、シリコン単結晶インゴットの製造装置、及びシリコン単結晶インゴットの製造方法 |
JP5018609B2 (ja) * | 2008-04-08 | 2012-09-05 | 株式会社Sumco | 単結晶引上げ装置 |
JP5152328B2 (ja) | 2008-05-20 | 2013-02-27 | 信越半導体株式会社 | 単結晶製造装置 |
TWI567253B (zh) * | 2015-10-07 | 2017-01-21 | 環球晶圓股份有限公司 | 長晶裝置 |
CN111876824A (zh) * | 2020-07-23 | 2020-11-03 | 上海汉虹精密机械有限公司 | 单晶炉主腔室上部导热系统及其控制方法 |
JP7115592B1 (ja) | 2021-05-28 | 2022-08-09 | 信越半導体株式会社 | 単結晶製造装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05208888A (ja) * | 1992-01-29 | 1993-08-20 | Komatsu Denshi Kinzoku Kk | Cz法による単結晶製造装置の冷却システム |
JPH08333189A (ja) * | 1995-06-02 | 1996-12-17 | Sumitomo Metal Ind Ltd | 結晶引き上げ装置 |
JP2001240492A (ja) * | 2000-02-29 | 2001-09-04 | Komatsu Electronic Metals Co Ltd | リチャージ・追いチャージを円滑に行うcz法単結晶引上げ装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19503357A1 (de) * | 1995-02-02 | 1996-08-08 | Wacker Siltronic Halbleitermat | Vorrichtung zur Herstellung eines Einkristalls |
JP4195738B2 (ja) * | 1998-04-08 | 2008-12-10 | Sumco Techxiv株式会社 | 単結晶製造装置 |
US6482263B1 (en) * | 2000-10-06 | 2002-11-19 | Memc Electronic Materials, Inc. | Heat shield assembly for crystal pulling apparatus |
US6579362B2 (en) * | 2001-03-23 | 2003-06-17 | Memc Electronic Materials, Inc. | Heat shield assembly for crystal puller |
-
2000
- 2000-10-10 JP JP2000309107A patent/JP3587155B2/ja not_active Expired - Fee Related
-
2001
- 2001-10-05 KR KR10-2002-7007251A patent/KR100499435B1/ko active IP Right Grant
- 2001-10-05 WO PCT/JP2001/008810 patent/WO2002031234A1/ja active IP Right Grant
- 2001-10-05 DE DE10194625.2T patent/DE10194625B3/de not_active Expired - Fee Related
- 2001-10-05 US US10/149,223 patent/US6764547B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05208888A (ja) * | 1992-01-29 | 1993-08-20 | Komatsu Denshi Kinzoku Kk | Cz法による単結晶製造装置の冷却システム |
JPH08333189A (ja) * | 1995-06-02 | 1996-12-17 | Sumitomo Metal Ind Ltd | 結晶引き上げ装置 |
JP2001240492A (ja) * | 2000-02-29 | 2001-09-04 | Komatsu Electronic Metals Co Ltd | リチャージ・追いチャージを円滑に行うcz法単結晶引上げ装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110106547A (zh) * | 2019-06-25 | 2019-08-09 | 宁夏银和新能源科技有限公司 | 提高直拉单晶拉速的装置 |
Also Published As
Publication number | Publication date |
---|---|
DE10194625T1 (de) | 2002-12-05 |
JP2002121096A (ja) | 2002-04-23 |
KR20020070312A (ko) | 2002-09-05 |
DE10194625B3 (de) | 2015-12-10 |
JP3587155B2 (ja) | 2004-11-10 |
KR100499435B1 (ko) | 2005-07-05 |
US20030051661A1 (en) | 2003-03-20 |
US6764547B2 (en) | 2004-07-20 |
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