DE10194625T1 - Vorrichtung zum Züchten eines Kristalls - Google Patents
Vorrichtung zum Züchten eines KristallsInfo
- Publication number
- DE10194625T1 DE10194625T1 DE10194625T DE10194625T DE10194625T1 DE 10194625 T1 DE10194625 T1 DE 10194625T1 DE 10194625 T DE10194625 T DE 10194625T DE 10194625 T DE10194625 T DE 10194625T DE 10194625 T1 DE10194625 T1 DE 10194625T1
- Authority
- DE
- Germany
- Prior art keywords
- growing
- crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/206—Controlling or regulating the thermal history of growing the ingot
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1068—Seed pulling including heating or cooling details [e.g., shield configuration]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1072—Seed pulling including details of means providing product movement [e.g., shaft guides, servo means]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1076—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
- Y10T117/1088—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone including heating or cooling details
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000309107A JP3587155B2 (ja) | 2000-10-10 | 2000-10-10 | 結晶成長装置 |
JP2000-309107 | 2000-10-10 | ||
PCT/JP2001/008810 WO2002031234A1 (fr) | 2000-10-10 | 2001-10-05 | Appareil de croissance de cristal |
Publications (2)
Publication Number | Publication Date |
---|---|
DE10194625T1 true DE10194625T1 (de) | 2002-12-05 |
DE10194625B3 DE10194625B3 (de) | 2015-12-10 |
Family
ID=18789322
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE10194625.2T Expired - Fee Related DE10194625B3 (de) | 2000-10-10 | 2001-10-05 | Vorrichtung zum Züchten eines Kristalls |
Country Status (5)
Country | Link |
---|---|
US (1) | US6764547B2 (de) |
JP (1) | JP3587155B2 (de) |
KR (1) | KR100499435B1 (de) |
DE (1) | DE10194625B3 (de) |
WO (1) | WO2002031234A1 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005162599A (ja) | 2003-12-03 | 2005-06-23 | Siltron Inc | 均一なベイカンシ欠陥を有するシリコン単結晶インゴット、シリコンウエハ、シリコン単結晶インゴットの製造装置、及びシリコン単結晶インゴットの製造方法 |
JP5018609B2 (ja) | 2008-04-08 | 2012-09-05 | 株式会社Sumco | 単結晶引上げ装置 |
DE112009001202T5 (de) | 2008-05-20 | 2011-06-22 | Shin-Etsu Handotai Co., Ltd. | Einkristallherstellungsvorrichtung |
TWI567253B (zh) * | 2015-10-07 | 2017-01-21 | 環球晶圓股份有限公司 | 長晶裝置 |
CN110106547B (zh) * | 2019-06-25 | 2022-07-15 | 宁夏盾源聚芯半导体科技股份有限公司 | 提高直拉单晶拉速的装置 |
CN111876824A (zh) * | 2020-07-23 | 2020-11-03 | 上海汉虹精密机械有限公司 | 单晶炉主腔室上部导热系统及其控制方法 |
JP7115592B1 (ja) | 2021-05-28 | 2022-08-09 | 信越半導体株式会社 | 単結晶製造装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2939601B2 (ja) * | 1992-01-29 | 1999-08-25 | コマツ電子金属株式会社 | 単結晶製造装置 |
DE19503357A1 (de) * | 1995-02-02 | 1996-08-08 | Wacker Siltronic Halbleitermat | Vorrichtung zur Herstellung eines Einkristalls |
JPH08333189A (ja) * | 1995-06-02 | 1996-12-17 | Sumitomo Metal Ind Ltd | 結晶引き上げ装置 |
JP4195738B2 (ja) * | 1998-04-08 | 2008-12-10 | Sumco Techxiv株式会社 | 単結晶製造装置 |
JP2001240492A (ja) * | 2000-02-29 | 2001-09-04 | Komatsu Electronic Metals Co Ltd | リチャージ・追いチャージを円滑に行うcz法単結晶引上げ装置 |
US6482263B1 (en) * | 2000-10-06 | 2002-11-19 | Memc Electronic Materials, Inc. | Heat shield assembly for crystal pulling apparatus |
US6579362B2 (en) * | 2001-03-23 | 2003-06-17 | Memc Electronic Materials, Inc. | Heat shield assembly for crystal puller |
-
2000
- 2000-10-10 JP JP2000309107A patent/JP3587155B2/ja not_active Expired - Fee Related
-
2001
- 2001-10-05 WO PCT/JP2001/008810 patent/WO2002031234A1/ja active IP Right Grant
- 2001-10-05 DE DE10194625.2T patent/DE10194625B3/de not_active Expired - Fee Related
- 2001-10-05 KR KR10-2002-7007251A patent/KR100499435B1/ko active IP Right Grant
- 2001-10-05 US US10/149,223 patent/US6764547B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2002121096A (ja) | 2002-04-23 |
US20030051661A1 (en) | 2003-03-20 |
KR20020070312A (ko) | 2002-09-05 |
KR100499435B1 (ko) | 2005-07-05 |
DE10194625B3 (de) | 2015-12-10 |
JP3587155B2 (ja) | 2004-11-10 |
WO2002031234A1 (fr) | 2002-04-18 |
US6764547B2 (en) | 2004-07-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R016 | Response to examination communication | ||
R018 | Grant decision by examination section/examining division | ||
R020 | Patent grant now final | ||
R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |