WO1998003693A1 - Element decoratif a base de titane et procede de durcissement dudit element - Google Patents
Element decoratif a base de titane et procede de durcissement dudit element Download PDFInfo
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- WO1998003693A1 WO1998003693A1 PCT/JP1997/002513 JP9702513W WO9803693A1 WO 1998003693 A1 WO1998003693 A1 WO 1998003693A1 JP 9702513 W JP9702513 W JP 9702513W WO 9803693 A1 WO9803693 A1 WO 9803693A1
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- titanium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
- C23C8/24—Nitriding
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/34—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases more than one element being applied in more than one step
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/28—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases more than one element being applied in one step
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12993—Surface feature [e.g., rough, mirror]
Definitions
- the present invention relates to a titanium decorative member whose surface and inside are hardened, and a method of hardening the titanium decorative member.
- titanium and titanium alloys have been used in various fields, taking advantage of their features of being light, not selling, and not causing metal allergy. Above all, the above features are very effective as a watch material, and have been applied in the past.
- titanium and titanium alloys have the disadvantage that the surface is easily damaged due to problems inherent to the material. In particular, when considering a mirror surface, which is a surface with an aesthetic appearance, scratches on the surface are likely to be conspicuous. Therefore, in the past, a sand-plast treatment or the like was performed to make the scratches inconspicuous. This gave the general public the impression that decorative members made of titanium and titanium alloy had a dark surface.
- the phenomenon of being easily scratched is due to the low surface hardness of the member, and various hardening treatments have been performed on titanium.
- the surface hardening treatment of titanium is roughly classified into a method of coating a hard film on the surface of the titanium member and a method of hardening the titanium member itself.
- ion implantation, ion nitriding, gas nitriding, gas carburizing, gas nitrocarburizing, etc. are known as methods for hardening a metal member itself such as titanium.
- the processing temperature is high, and the crystal grains are coarsened, the surface is roughened, and the appearance quality is inferior.
- hardening treatment is applied to the aesthetic surface of decorative members such as watches, eyeglasses, and jewelry while maintaining the surface condition before processing without causing surface roughness.
- the method of curing the titanium member itself does not cause a film peeling problem because the diffusion element inside the metal member has a gradient concentration from the surface.
- the force ⁇ considered to be useful as a treatment method and the appearance quality is degraded due to the surface roughness.
- the problem of deterioration of the appearance quality is considered to be caused by surface roughness due to the prominence at the grain boundary, especially in the initial stage.
- the bulges at the grain boundaries that occur during gas nitriding and oxynitriding are phenomena such as compound formation at the grain boundaries or stress concentration at the grain boundaries caused by lattice distortion due to solid solution diffusion of nitrogen and oxygen.
- the maximum height R max and the average surface roughness Ra increase, and the appearance quality deteriorates.
- the height of the bumps at the grain boundaries is caused by the size of the crystal grains of the titanium member itself before the treatment.
- the height of the bumps grew in the plane direction after the treatment of the titanium hardened member. It was found that the higher the size of the crystal grains or the crystal grains before the treatment, the higher the size.
- the method of hardening the titanium member itself such as gas nitriding, carburizing, oxidizing, or oxynitriding in the conventional method can solve the problem of deterioration of appearance quality after hardening, that is, surface roughness as described above. Did not.
- An object of the present invention is to solve the problems or problems of the prior art described above and to provide a hardened titanium member capable of reducing surface roughness without deterioration in appearance quality even after a hardening treatment. Disclosure of the invention
- a titanium cured member and a method for curing a titanium member of the present invention basically employ the following structure and method.
- a titanium decorative member 2 having a hardened layer 20 hardened on the surface of the titanium member 21, wherein the hardened layer 20 on the surface contains an element consisting of nitrogen and oxygen, and the titanium decorative member 2
- the titanium decorative member 2 is characterized in that the size of the crystal grains 24 on the surface (diameter indicated by 26 in FIG. 1) is 0.1 to 60 m.
- a step of heating and heating the titanium member in an inert gas atmosphere, and a treatment temperature of 700 ° C. or more in an atmosphere containing nitrogen and oxygen as the first atmosphere a step of heating and heating the titanium member in an inert gas atmosphere, and a treatment temperature of 700 ° C. or more in an atmosphere containing nitrogen and oxygen as the first atmosphere.
- the first curing process step where the temperature is high, and the atmosphere of inert gas such as argon, helium, etc.
- a method for hardening a titanium member comprising a second atmosphere adjusting step of ripening to a processing temperature of 700 ° C. or more with air and a step of cooling in an inert gas atmosphere. is there.
- fine crystals of 0.1 to 60 m are formed on the surface of the titanium-containing member 2.
- a protective film having particles 24 a step of heating and heating the titanium member in an inert gas atmosphere, and a step of heating the titanium member in an atmosphere containing nitrogen and oxygen as the first atmosphere.
- a method for curing a titanium-cured member obtained by curing a titanium member comprising a step of cooling in a gas atmosphere.
- Another embodiment of the method for curing a titanium-cured member according to the present invention includes a surface Curing method for titanium decorative component with cured layer Forming a protective film having crystal grains of 0.1 to 60 / m on the surface of the titanium decorative member, heating the titanium member in an inert gas atmosphere, and heating nitrogen and oxygen.
- This is a method for curing a titanium cured member obtained by curing a titanium member, which comprises a second atmosphere adjustment treatment step and a step of cooling in an inert gas atmosphere.
- the titanium cured member obtained by the method for curing a titanium decorative member of the present invention has a crystal grain size of 0.1 to 60 m after the treatment, or a protective film having fine crystal grains.
- the formation step enables the appearance quality to be maintained even after the curing treatment, that is, the surface roughness to be reduced.
- the problem of the deterioration of the appearance quality in the present invention is caused by surface roughness due to the bulging at the crystal grain boundary part 22 particularly in the initial stage.
- the bulge at the grain boundary 22 generated during gas nitriding, oxynitriding, etc. is caused by compound formation at the grain boundary or by lattice distortion caused by lattice distortion due to solid solution diffusion of nitrogen and oxygen. It was thought to arise from phenomena such as stress concentration.
- the height of the bump increases, the maximum height R max and the average surface roughness Ra increase, and the appearance quality deteriorates.
- the height of the protrusions is increased as the size of the crystal grains of the titanium decorative member itself increases, due to the size of the crystal grains of the titanium decorative member itself before the treatment. .
- the height of the bumps increases as the size of the crystal grains of titanium and the titanium alloy itself before the treatment increases. When macroscopically observed, it was found that the surface seemed to be rough, the appearance quality was degraded, and it could not be applied particularly to mirror-surface decorative members.
- TiN titanium nitride
- a titanium member with a surface crystal grain size of 0.1 to 60 m or less is subjected to a heat treatment controlled at a temperature and time in an atmosphere containing nitrogen and oxygen. Due to the effect of small crystal grains on the surface and the effect of nitrogen and oxygen dissolved in the crystal grain boundaries to suppress the coarsening of the crystal grains, the surface grows in the 0.1 to 60 m plane direction.
- the hardening treatment can be performed while maintaining the crystal grains in this condition.
- the height of the protrusion at the crystal grain boundary at this time becomes low. That is, the strain stress at the crystal grain boundary generated from the lattice distortion due to the solid solution diffusion of nitrogen and oxygen is dispersed due to an effect such as an increase in the area of the crystal grain boundary occupying a unit area. This phenomenon reduces the surface roughness and makes it possible to suppress the deterioration of appearance quality when observed macroscopically.
- a protective film having fine crystal grains of 0.1 to 60 m is formed on the surface of the titanium decorative member, heat treatment is performed in a nitrogen or oxygen atmosphere.
- the effect of the fine structure before heat treatment and the effect of nitrogen and oxygen suppressing the coarsening of the crystal grains are to maintain the surface as crystal grains grown in the 0.1 to 60 m plane direction.
- FIG. 1 is a three-dimensional view showing a titanium hardened member after a hardened layer is formed in an embodiment of the present invention.
- FIG. 2 is a schematic view showing a processing apparatus for forming a hardened layer on a hardened titanium member according to an embodiment of the present invention.
- FIG. 3 is a schematic view showing a process for forming a hardened layer on a hardened titanium member according to the embodiment of the present invention.
- FIG. 4 (A) shows the size of crystal grains when a hardened layer is formed at a processing temperature of 700 ° C. for a titanium member having small crystal grains in the embodiment of the present invention.
- 4 (B) is a graph showing the measurement results of the surface roughness.
- FIG. 5 (A) shows the crystal grain size when a hardened layer is formed at a processing temperature of 700 ° C. for a titanium member having a large crystal grain in the embodiment of the present invention.
- FIG. (B) is a graph showing the measurement results of the surface roughness.
- FIGS. 6 (A) to 6 (C) show thin film X-ray diffraction data of the titanium decorative member according to the present invention and the conventional titanium cured member.
- FIGS. (A) and (B) of FIG. 7 are views showing an example of a case where a protective film is formed on a titanium cured member according to the present invention and then a curing treatment method is performed.
- FIG. 8 is a view showing an example of the shape of a titanium decorative member having a protective film before the curing treatment method according to the present invention can be executed.
- a first aspect according to the present invention is a titanium cured member having a cured layer obtained by curing the surface of a titanium member as described above, wherein the cured layer on the surface contains an element consisting of nitrogen and oxygen.
- a titanium decorative member characterized by having a crystal grain size of 0.1 to 60 m.
- the surface roughness R max is A titanium decorative member having a surface of 100 nm or less.
- FIG. 1 is a three-dimensionally enlarged view of a titanium hardened member having a hardened layer formed by a hardening treatment according to the embodiment of the present invention
- FIG. 2 hardens the surface of the titanium hardened member of the present invention.
- FIG. 3 is a schematic view showing a process for forming a hardened layer on the hardened titanium member in the embodiment of the present invention.
- the curing treatment device used in the present invention includes a heating power supply i 4 in a vacuum treatment tank 6 having a gas inlet 8 and a sample outlet 18.
- a device capable of heating the surface of the titanium decorative member 2 placed on the sample stage 4 by the heating means 12 to which energy is supplied can be used.
- a vacuum exhaust device 16 and a gas exhaust port 10 are provided to enable the vacuum exhaust in the vacuum processing tank 6 so that the curing process can be performed in a reduced pressure atmosphere.
- JIS type 2 pure titanium (equivalent to grade 2 of ASTM) having a shape of 25 mm X 25 mm was used as the titanium hardened member.
- the treated surface was polished, and the surface roughness was 50 nm or less in maximum height R max value.
- Untreated crystal grains have a polycrystalline structure with a size of 10 to 30 m.
- FIG. 3 is a conceptual diagram showing the steps of the curing treatment method of the present invention.
- the evacuation step 2 8 the inside of the processing vessel 6 is evacuated by the vacuum exhaust device 1 6, 1 X 1 0 - was [delta] 1 orr following reduced pressure atmosphere.
- a certain amount of inert gas such as argon and helium was introduced from the gas inlet 8, and the amount of introduced gas and the amount of exhaust gas were adjusted to make the inside of the processing tank 6 an inert atmosphere under a reduced pressure of 0.1 torr. .
- the titanium decorative member 2 was heated by the heating means 12, and the temperature was raised to a curing treatment temperature of 700 ° C.
- pure nitrogen and a mixed gas containing a small amount of water vapor in nitrogen are introduced from the gas inlet 8, and the amount of introduced gas and the amount of exhaust gas are adjusted to about 0.it 0 rr Of nitrogen and a small amount of water vapor.
- the ratio of water vapor to nitrogen was about 400 ppm. Then, the temperature was maintained for about 3 hours while keeping the curing temperature constant. After that, the inside of the processing tank was again kept under the reduced pressure of the inert gas atmosphere, and was maintained for about 0.1 “) for the second atmosphere adjustment processing step.
- the treated surface was polished, and the surface roughness was 50 nm or less in maximum height R max value.
- the size of untreated grains is less than 5 m.
- a vacuum evacuation step 28 the inside of the treatment tank was evacuated by a vacuum evacuation device 16 to a reduced pressure atmosphere of i X 10 15 t 0 rr or less.
- a certain amount of inert gas such as argon and helium was introduced from the gas inlet 8, and the amount of introduced gas and the amount of exhaust gas were adjusted to make the inside of the processing tank 6 an inert atmosphere under a reduced pressure of 0.1 torr. .
- the titanium decorative member 2 was heated by the heating means 12, and the temperature was raised to a curing treatment temperature of 700 ° C.
- the first curing step 32 pure nitrogen and a mixed gas containing a small amount of oxygen in nitrogen are introduced from the gas inlet 8, and the amount of introduced gas and the amount of exhaust gas are adjusted to about 0.1 torr.
- the atmosphere was nitrogen and a small amount of oxygen.
- the ratio of oxygen to nitrogen was about 500 ppm. Then, the temperature was kept for about 3 hours while keeping the curing temperature constant. Thereafter, the inside of the treatment tank was again set to an inert gas atmosphere under reduced pressure, and was maintained for about 0.5 hour to perform a second atmosphere adjustment treatment step. Then, cooling was performed while maintaining the inert atmosphere, and when the temperature of the surface of the titanium decorative member reached a temperature at which it did not oxidize, the treatment was completed and the sample was taken out.
- the remaining amount was 4.5 wt% A1-3 w ⁇ % V-2 wt% Mo of 25 mm X 25 mm in shape.
- the processing tank 6 is evacuated by the evacuation device 16 to reduce the pressure to 1 X 10—'t 0 r 1- Atmosphere.
- a fixed amount of an inert gas such as argon or helium was introduced from the gas inlet 8, and the amount of the introduced gas and the amount of exhaust gas were adjusted to make the inside of the processing tank 6 an inert atmosphere under a reduced pressure of 0.1 torr.
- the titanium decorative member 2 was heated by the heating means 2 to raise the temperature to a curing treatment temperature of 700 ° C.
- pure nitrogen and pure nitrogen are A mixed gas containing a small amount of water vapor was introduced, and the amount of introduced gas and the amount of exhaust gas were adjusted to create an atmosphere of about 0.1 torr-nitrogen and a small amount of water vapor.
- the ratio of water vapor to nitrogen was about 400 ppm.
- the temperature was kept for about 3 hours while the curing temperature was kept constant. Thereafter, the inside of the treatment tank was again set to an inert gas atmosphere under reduced pressure, and was maintained for about 0.5 hour to perform a second atmosphere adjustment treatment step. Then, cooling was performed while maintaining the inert atmosphere, and when the temperature of the surface of the titanium decorative member reached a temperature at which it did not oxidize, the treatment was completed and the sample was taken out.
- the hardening treatment method of the titanium decorative member used in the present invention will be described in more detail,
- the temperature raising step 30 for making the atmosphere inert to titanium is performed by polishing the titanium.
- the purpose is to recrystallize the work strain layer generated when working into a member.
- the strained layer remains crystallographically close to the amorphous phase, with the stress during polishing remaining as a lattice strain. Therefore, if a gas containing nitrogen and oxygen is directly introduced into the polished titanium member and subjected to hardening treatment, the processed strain layer has a high reactivity between oxygen and nitrogen, and the surface of the strained member is nitrided as a coloring substance. And oxides are formed.
- the temperature raising step before the first curing step in the present invention needs to be performed in an inert atmosphere.
- a mixed gas obtained by adding a trace amount of oxygen component to nitrogen is introduced into the treatment apparatus, and the treatment pressure is reduced to 0. It is characterized in that processing is performed in a mixed gas atmosphere adjusted within the range of 0.001 to 10 T rr.
- the second atmosphere adjusting treatment step 34 in the above-mentioned curing treatment method indicates a step for completely removing the nitrogen and oxygen component gases introduced into the treatment apparatus from the inside of the apparatus.
- the nitrogen or oxygen component in the first curing step is performed. If the remaining gas remains, the diffusion into the titanium member is slow due to the low ambient temperature, and nitride or oxide is formed on the surface of the titanium member. As described above, these compounds cause problems of surface roughness and deterioration of appearance quality, and are not in a preferable state as a titanium decorative member.
- cooling step 36 in the present invention is a step for rapidly cooling the glass member to room temperature and taking it out of the processing apparatus.
- the cooling step if the same gas atmosphere as in the hardening step is used, nitrogen and oxygen are supplied while cooling, so that diffusion of nitrogen and oxygen from the surface of the titanium member is slowed down, and the surface is colored. To form nitrides and oxides. In order to prevent the formation of these coloring substances, the atmosphere in the cooling step needs to be an atmosphere inert to the titanium member.
- the reason why the titanium decorative member according to the present invention can exhibit many excellent characteristics as described above as compared with a conventional metal hardened member is that the titanium decorative member constituting the titanium decorative member is used. This is considered to be due to maintaining a state of solid solution with oxygen at an appropriate ratio.
- FIGS. 6 (A), (B) and (C) show the titanium hardened member before the hardening method according to the present invention, the titanium hardened member after the hardening method according to the present invention and the conventional technology.
- the results of thin film X-ray diffraction analysis of each of the titanium hardened members at an incident angle of 0.5 ° are shown.
- the titanium-hardened member according to the conventional technique has a peak clearly different from that of the titanium member before hardening shown in FIG. 6 (A). Is recognized.
- the peaks of the titanium-hardened member of the present invention were all found at substantially the same positions as compared with the titanium member, and the titanium-hardened member of the present invention exhibited a higher level of the hardening treatment. The peak value is slightly shifted to the lower angle side of the titanium hardened member before the method.
- a titanium alloy composed of 25 mm X 25 mm 3 wt% A] -2.5 wt% V and the balance Ti was used as the titanium hardened member.
- the treated surface was polished, and the surface roughness was 50 nm in maximum height Rmax value. Untreated grains have a fine structure of 5 m or less.
- the inside of the treatment tank 6 is evacuated by the evacuation apparatus 16 to a reduced pressure atmosphere of 1 ⁇ 1 (T 5 torr or less.
- a certain amount of an inert gas such as argon and helium was introduced from the inlet 8, and the amount of the introduced gas and the amount of exhaust gas were adjusted to make the inside of the processing tank 6 an inert atmosphere under a reduced pressure of 0.1 t0 rr.
- the titanium decorative member 2 was heated by the heating means 12, and the temperature was raised to a curing treatment temperature of 700 ° C.
- a mixed gas of pure nitrogen and nitrogen containing a small amount of water vapor is introduced from the gas inlet 8, and the amount of introduced gas and the amount of exhaust gas are adjusted.
- the ratio of water vapor to nitrogen was about 400 ppm.
- the temperature was kept for about 3 hours while keeping the curing temperature constant. Thereafter, the inside of the treatment tank was again set to an inert gas atmosphere under reduced pressure, and was maintained for about 0.5 hour to perform a second atmosphere adjustment treatment step. Then, cooling was performed while maintaining the inert atmosphere.
- the temperature of the surface of the titanium decorative member reached a temperature at which the surface did not oxidize, the treatment was completed and the sample was taken out.
- Table 1 is a table in which the evaluation results of the specific examples of the present invention and the evaluation results of the implementation of the prior art are compared, and the evaluation methods include a scratch resistance test (sand removal test), a hardness, a size of crystal grains, Pass / fail judgment was made based on the following criteria for the evaluation in which the surface roughness was used and the titanium bulk material was processed as it was without forming a protective film.
- a scratch resistance test sand removal test
- a hardness a size of crystal grains
- Pass / fail judgment was made based on the following criteria for the evaluation in which the surface roughness was used and the titanium bulk material was processed as it was without forming a protective film.
- the scratch resistance test was passed when the degree of occurrence of surface scratches was 50% or less as observed by an optical microscope at a magnification of 400 times after the sand removal test.
- the hardness was determined to be acceptable by a Vickers hardness tester for those having a Pickers hardness of HV 600 or more at a depth of 5 m from the cured surface.
- the size of the crystal grains is determined by observing the surface with an electron microscope and an optical microscope.If the size of the crystal grains on the surface is in the range of 0.1 to 60 m, the size is small, and the size is 60 ⁇ ⁇ or more. Was large.
- a surface shape analysis in the range of 500 m was performed, and a sample having a maximum height Rmax of 100 nm or less was judged to be acceptable.
- the overall evaluation results were acceptable for those that passed the scratch resistance test and hardness, and had a maximum height of 100 nm or less.
- Table 1 shows that before the hardening treatment, using pure JIS type 2 (equivalent to ASTM grade 2) pure titanium, whose average size of the crystal grains in the horizontal direction of the surface is about 15 m and about 80 m, Scratch resistance test, surface hardness, surface roughness, average of crystal grains after performing the curing treatment of the present invention at a temperature of 50 ° C. to 900 ° C. and after performing the curing treatment according to the conventional technology. It is the table
- a and i in Table 1 are evaluation results before processing, b and j in Table 1 are evaluation results at a processing temperature of 650 ° C, and c and k in Table 1 are processing temperatures at 700 ° C.
- D, 1 are the evaluation results at the processing temperature of 750
- e and m are the evaluation results at the processing temperature of 800
- f and n are 85 (the evaluation results at the processing temperature of TC.
- G, 0 are the evaluation results at the processing temperature of 850 ° C
- h, p are the evaluation results by the conventional gas nitriding (850 ° C, 10 hours).
- the surface roughness due to the implementation of the conventional technology is the maximum height R max and untreated JIS type 2 (corresponding to ASTM grade 2). On the other hand, it is as large as 150 nm, and the surface is rough. On the other hand, from a and d in Table 1, it can be seen that the surface roughness according to the embodiment of the present invention is [00] nm or less at the maximum height, which is lower than the conventional technology.
- the size of the crystal grains is coarsened to 80 to 200 m in the conventional technology
- the size of pure titanium before the practice of the present invention is 10 to 30 m by the practice of the present invention. It is now possible to maintain the same size.
- the maximum height was as large as about 100 nm even at a processing temperature of 65 ° C., because the crystal grains at the initial stage were large.
- the maximum height further increased at a processing temperature of 700 ° C. or higher.
- the maximum height of the surface roughness is correlated with the prominence of the grain boundary in the above description. The effect of small It is thought that.
- Table 2 shows that pure titanium equivalent to JIS class 4 (equivalent to grade 4 of ASTM) with a crystal grain size of 10 m or less, Ti-4.5 wt% A 1-3 wt% V -Titanium alloy of 2 wt% Mo and Ti-3 wt% A 1-2.5 Titanium alloy of 2.5 wt% V 5 is a table showing a scratch resistance test, a surface hardness, a surface roughness, and a size of a crystal grain after performing the curing treatment of the present invention in three hours and after performing the curing treatment according to the conventional technique.
- the surface roughness is not increased in the initial stage, i.e., to reduce the crystal grains before the treatment, and within the temperature and time range where the crystal grains on the treated surface are not coarsened.
- Treatment and selecting a treatment step in which the timing of gas introduction is controlled by temperature and time such as the practice of the present invention, which does not cause the compound to form thickly on the surface.
- the fact that the crystal grains grown in the plane direction of the treated surface are not coarsened is a factor that prevents the maximum height of the surface roughness from being extremely increased.
- Table 3 shows the results obtained by performing the curing treatment according to the method of the present invention using various gases in comparison with the conventional example.
- gas species N 2 0, NO, may be used oxynitride gases N 0 2, and the like.
- the treated surface is described as a polished mirror surface, but is not particularly limited, and the surface is relatively rough, such as a polished surface, a honed surface subjected to honing, a shot peened surface, and a hair-lined surface. Any of the faces can be applied.
- an inert gas atmosphere such as argon or helium is used in the temperature increasing step, the second atmosphere adjusting step and the cooling step.
- a gas containing nitrogen and oxygen as described above is introduced, a compound is formed on the surface, and the surface is roughened or discolored. Any atmosphere that does not affect these gases may be used. The atmosphere may be.
- the first curing treatment step was performed for 3 hours and the treatment temperature was set at 700 ° C., but there is no particular limitation, and it is important that This is to treat the crystal grains grown in the plane direction of the treated surface within a temperature and time range that does not cause coarsening, and to set the time and temperature conditions so as to satisfy the required hardness and scratch resistance.
- a long-time treatment and an increase in the treatment temperature affect the coarsening of crystal grains, so that any treatment may be performed as long as the treatment is performed within 10 hours.
- the treatment is preferably performed at a very low temperature due to the problem of surface roughness, but any temperature may be used as long as the temperature is 700 ° C. or more and a ⁇ transformation point or less.
- this concentration if it is water vapor, it may be in the range of 300 ppm to 300 ppm, and if it is oxygen, it is in the range of 300 ppm to 2000 ppm. Any concentration can be applied within the range. What is important is that if these gases are supplied in an excessive amount, the surface will be discolored by oxides, and if the amount is too small, the amount of oxygen will be insufficient. Applicable to
- the processing pressure in all the steps is set to 0. ⁇ torr, and the described force ⁇ , without any particular limitation, is arbitrary from 0.001 to 10 t0 rr. Applicable at pressures of What is important is that, as with the treatment concentration, if the pressure is too low, the absolute amount of the diffusing element will be insufficient, and if the pressure is too high, compounds will be formed on the surface.
- the description is made on the assumption that the time of the second atmosphere control treatment step is 0.5 hour.
- the atmosphere before entering the cooling step becomes inactive. Any time is fine.
- Example 5 Another specific example of a curing treatment method for manufacturing a titanium decorative member according to the present invention will be described as Example 5 with reference to the drawings.
- the curing treatment method for a titanium decorative member having a cured layer whose surface is cured Forming a protective film having 0.1 to 60 m crystal grains on the surface of the titanium decoration member, heating the titanium member in an inert gas atmosphere, and heating the titanium member in an atmosphere containing nitrogen and oxygen.
- FIG. 8 is a three-dimensional view showing the untreated titanium decorative member, and the three-dimensional view showing the titanium decorative member after the curing treatment is shown in FIG. 1 as already described.
- the feature of this specific example is that the surface of the hardened titanium member has a fine structure in advance.
- the cured layer is formed after the formation of the protective film, and the outline of the curing treatment method is shown in FIGS. 7 (A) and 7 (B).
- the titanium decorative member two types of pure titanium of JIS having a shape of 25 mm ⁇ 25 mm were used as the titanium decorative member.
- the treated surface was polished, and the surface roughness was less than 50 nm in maximum height Rmax value.
- the size of the untreated crystal grains is a uniform structure having a size almost equal to 50 to 100 / m.
- the forming method was selected from the vapor deposition method, the sputtering method, the plasma CVD method, and the DC sputtering method according to the type of the protective film.
- the Ti film was selected as the protective film and the RF sputtering method was selected as the formation method
- a high-purity pure titanium / silver type was used for the RF target, and the introduced gas was ultra-high. Pure argon gas was used.
- the pure titanium sample was placed facing the RF target in the RF sputtering device.
- a method of actively cooling with water was adopted so that the surface temperature of the pure titanium sample at the time of film formation was 0 to 50 ° C.
- the temperature of the surface reaches 50 ° C or higher, it is affected by the crystal grains of the pure titanium sample itself, that is, the base itself. That is, a crystal grain having a fine structure of about 0.1 to 60 m cannot be obtained, but a crystal grain of 60 m or more.
- the inside of the treatment tank 6 is evacuated by the evacuation device 16 and a reduced pressure atmosphere of 1 X 10-5 t0 rr or less is obtained. It was an atmosphere.
- a fixed amount of an inert gas such as argon or helium was introduced from the gas inlet 8, and the amount of the introduced gas and the amount of exhaust gas were adjusted to make the inside of the processing tank 6 an inert atmosphere under a reduced pressure of 0.1 torr.
- the temperature raising step 30 the titanium member 2 with the protective film was heated by the heating means 12 to raise the temperature to a curing treatment temperature of 700 ° C.
- a mixed gas of pure nitrogen and oxygen was introduced from the gas inlet 8, and the amount of introduced gas and the amount of exhaust were adjusted to an atmosphere of 0.1 to 1-r of nitrogen and a small amount of oxygen.
- the ratio of oxygen to nitrogen was set at about 500 ppm.
- the temperature was kept for about 3 hours while keeping the curing temperature constant.
- the inside of the treatment tank was again set to an inert gas atmosphere under reduced pressure, and was maintained for about 0.5 hour to perform a second atmosphere adjustment treatment step.
- cooling was performed while maintaining the inert atmosphere.
- a protective film having crystal grains of 0.1 to 60 m is formed on the surface of a JIS type 2 pure titanium sample by a sputtering apparatus or the like. Then, a hardened layer is formed by heat treatment in a nitrogen atmosphere using a vacuum heat treatment furnace.
- Table 4 is a table comparing the evaluation results by the implementation of the present invention with the evaluation results by the implementation of the conventional technology.
- the surface roughness, the Vickers hardness, and the size of the crystal grains were adopted.
- the maximum height was measured by a surface roughness tester, the Vickers hardness was measured by a microhardness tester, and the size of crystal grains was measured by surface observation with an electron microscope.
- the evaluation result of the sample on which the protective film was formed was 300 mm or less at the maximum height, and the sample having a surface hardness of 1200 or more was accepted.
- a in Table 4 is an untreated JIS Class 2 pure titanium sample
- B in Table 1 is an evaluation result by performing a conventional technique
- C is an implementation of the present invention in which a hardened layer was formed after forming a protective film.
- the practice of the present invention has made it possible to reduce the size to 20 to 50.
- the maximum height corresponds to the elevation of the grain boundary in the description above, and the reason why the maximum height of the present invention is low is an effect due to the small crystal grains of the present invention. it is conceivable that.
- titanium pure members of JIS 2 types as titanium decorative members.
- present invention is also applicable to JIS Class 1 pure titanium members, JIS Class 3 pure titanium members, and titanium alloy members containing titanium base.
- the surface to be treated here is not particularly limited, and any surface having a relatively rough surface such as a polished surface, a honed surface subjected to honing treatment, a shot peened surface, a hairline surface, etc. is applied. It is possible.
- the protective film is formed by a vapor deposition method, a sputtering method, a plasma CVD method, or a sputtering DC method depending on the type of the protective film.
- the present invention can be applied to the T i ⁇ 2 film and the T i N film.
- the description has been made using a nitrogen gas as a gas for forming a hardened layer, but the present invention is also applicable to an oxynitriding gas such as NO 2 , NO, or N 2 .
- an oxynitriding gas such as NO 2 , NO, or N 2 .
- this specific example includes a step of forming a protective film having crystal grains of 0.1 to 60 m on the surface of the titanium decorative member, and a step of heating and heating the titanium member in an inert gas atmosphere.
- JIS class 2 pure titanium having a shape of 25 mm X 25 mm was used as the titanium decorative member.
- the treated surface was polished, and the surface roughness was less than 50 nm in maximum height R max value.
- the size of the untreated crystal grains is a uniform structure of approximately equal size of 60 to 100 m.
- An RF sputtering device was used to form a Ti film as a protective film.
- High-purity pure titanium evening target was used for the RF target, and ultra-high-purity argon gas was used as the gas to be introduced.
- the sample was placed so as to face the RF sunset in the RF sputtering apparatus.
- the control of the surface temperature of the pure titanium sample is important in order to form a fine film having a fine structure of 1 to 50 / m.
- a method of actively cooling with water was adopted so that the surface temperature of the pure titanium sample during film formation was 0 to 50 ° C.
- the temperature of the surface reaches 50 ° C or more, it is affected by the crystal grains of the pure titanium sample itself, that is, the base itself. That is, crystal grains having a fine structure of about 0.1 to 60 / m cannot be obtained, and crystal grains having a size of 60 m or more are obtained.
- the inside of the processing tank 6 is evacuated by the evacuation device 16;
- the atmosphere was reduced in pressure.
- a fixed amount of inert gas such as argon or helium was introduced from the gas inlet 8 and the amount of introduced gas and the amount of exhaust gas were adjusted to make the inside of the processing tank 6 an inert atmosphere under reduced pressure of 0.1 t0 rr. .
- the temperature raising step 30 the titanium member 2 with the protective film was heated by the heating means 12 to raise the temperature to a curing treatment temperature of 700 ° C.
- the first curing treatment step 32 pure nitrogen and a mixed gas containing a small amount of water vapor in nitrogen are introduced from the gas inlet 8, and the amount of introduced gas and the amount of exhaust gas are adjusted to 0.1 t0 rr.
- the atmosphere was nitrogen and a small amount of water vapor.
- the ratio of water vapor to nitrogen was about 400 ppm.
- the temperature was kept for about 3 hours while keeping the curing temperature constant.
- the inside of the processing tank was again set to an inert gas atmosphere under reduced pressure and maintained for about 0.5 hour to perform a second atmosphere adjustment processing step. Then, cooling was performed while maintaining the inert atmosphere, and when the temperature of the surface of the titanium decorative member reached a temperature at which it did not oxidize, the treatment was completed and the sample was taken out.
- a step of forming a protective film having fine crystal grains of 0.2 to 60 m on the surface of the titanium decorative member, and under reduced pressure By heating the titanium decorative member in an atmosphere containing nitrogen and oxygen, a step of forming a hardened layer was performed, thereby enabling hardening treatment while keeping the surface roughness small. As a result, even after the hardening treatment of the titanium member itself, the appearance quality is not degraded and the titanium member can be applied particularly to decorative members.
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Adornments (AREA)
Description
Claims
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50679798A JP3225263B2 (ja) | 1996-07-18 | 1997-07-18 | チタン装飾部材及びその硬化処理方法 |
EP97930850A EP0931848B1 (en) | 1996-07-18 | 1997-07-18 | Titanium-base decoration member and method for curing the same |
DE69731101T DE69731101T2 (de) | 1996-07-18 | 1997-07-18 | Dekorationsteil aus titanbasis und verfahren zum härten |
US09/230,131 US6451129B2 (en) | 1996-07-18 | 1997-07-18 | Titanium-base decoration member and method for curing the same |
BR9710379A BR9710379A (pt) | 1996-07-18 | 1997-07-18 | Material decorativo de tit-nio e m-todo de endurecimento para o mesmo |
AU34629/97A AU3462997A (en) | 1996-07-18 | 1997-07-18 | Titanium-base decoration member and method for curing the same |
HK00101668A HK1026926A1 (en) | 1996-07-18 | 2000-03-20 | Titanium-base decoration member and method for curing the same |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8/189110 | 1996-07-18 | ||
JP18911096 | 1996-07-18 | ||
JP6626397 | 1997-03-19 | ||
JP9/66263 | 1997-03-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1998003693A1 true WO1998003693A1 (fr) | 1998-01-29 |
Family
ID=26407444
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP1997/002513 WO1998003693A1 (fr) | 1996-07-18 | 1997-07-18 | Element decoratif a base de titane et procede de durcissement dudit element |
Country Status (10)
Country | Link |
---|---|
US (1) | US6451129B2 (ja) |
EP (1) | EP0931848B1 (ja) |
JP (1) | JP3225263B2 (ja) |
KR (1) | KR100494751B1 (ja) |
CN (1) | CN1333102C (ja) |
AU (1) | AU3462997A (ja) |
BR (1) | BR9710379A (ja) |
DE (1) | DE69731101T2 (ja) |
HK (1) | HK1026926A1 (ja) |
WO (1) | WO1998003693A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020045535A (ja) * | 2018-09-20 | 2020-03-26 | Ntn株式会社 | 機械部品 |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9715175D0 (en) * | 1997-07-19 | 1997-09-24 | Univ Birmingham | Method of case hardening |
US6720089B2 (en) * | 2002-02-12 | 2004-04-13 | Architectural Titanium Llc | Decorative architectural titanium panels and method of fabrication thereof |
KR100771018B1 (ko) * | 2002-04-08 | 2007-10-29 | 주식회사 만도 | 전자제어식 브레이크 시스템의 펌프 |
JP3930420B2 (ja) * | 2002-11-20 | 2007-06-13 | 愛三工業株式会社 | チタン部材の表面処理方法 |
US20140141698A1 (en) * | 2012-11-16 | 2014-05-22 | Chi-Hung Su | Surface treating method for a golf club head |
US9127343B2 (en) * | 2012-11-16 | 2015-09-08 | Chi-Hung Su | Surface treating method for a golf club head |
KR101454514B1 (ko) | 2012-11-30 | 2014-10-23 | 주식회사 포스코 | 티타늄 판재의 열처리방법 및 열처리장치 |
WO2016084980A1 (ja) * | 2014-11-28 | 2016-06-02 | 新日鐵住金株式会社 | チタン合金部材およびチタン合金部材の製造方法 |
EP3192737B1 (en) * | 2016-01-14 | 2020-12-02 | Safran Landing Systems UK Limited | Shock strut |
US11060175B2 (en) * | 2016-06-02 | 2021-07-13 | Danmarks Tekniske Universitet | Case hardened component of titanium |
CN106637049A (zh) * | 2017-01-03 | 2017-05-10 | 中山源谥真空科技有限公司 | 一种纯钛或钛合金及其表面硬化方法 |
JP6911651B2 (ja) * | 2017-08-31 | 2021-07-28 | セイコーエプソン株式会社 | チタン焼結体、装飾品および時計 |
US11661645B2 (en) | 2018-12-20 | 2023-05-30 | Expanite Technology A/S | Method of case hardening a group IV metal |
EP4018011A1 (en) * | 2019-08-23 | 2022-06-29 | Danmarks Tekniske Universitet | Low temperature titanium hardening |
CN111270198A (zh) * | 2020-03-27 | 2020-06-12 | 广东省新材料研究所 | 一种钛合金离子渗氮方法 |
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1997
- 1997-07-18 CN CNB971976929A patent/CN1333102C/zh not_active Expired - Lifetime
- 1997-07-18 DE DE69731101T patent/DE69731101T2/de not_active Expired - Fee Related
- 1997-07-18 AU AU34629/97A patent/AU3462997A/en not_active Abandoned
- 1997-07-18 KR KR10-1999-7000378A patent/KR100494751B1/ko not_active IP Right Cessation
- 1997-07-18 EP EP97930850A patent/EP0931848B1/en not_active Expired - Lifetime
- 1997-07-18 US US09/230,131 patent/US6451129B2/en not_active Expired - Lifetime
- 1997-07-18 WO PCT/JP1997/002513 patent/WO1998003693A1/ja active IP Right Grant
- 1997-07-18 JP JP50679798A patent/JP3225263B2/ja not_active Expired - Lifetime
- 1997-07-18 BR BR9710379A patent/BR9710379A/pt not_active Application Discontinuation
-
2000
- 2000-03-20 HK HK00101668A patent/HK1026926A1/xx not_active IP Right Cessation
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JP2020045535A (ja) * | 2018-09-20 | 2020-03-26 | Ntn株式会社 | 機械部品 |
Also Published As
Publication number | Publication date |
---|---|
CN1229441A (zh) | 1999-09-22 |
AU3462997A (en) | 1998-02-10 |
EP0931848A4 (en) | 2001-10-24 |
EP0931848A1 (en) | 1999-07-28 |
HK1026926A1 (en) | 2000-12-29 |
BR9710379A (pt) | 1999-08-17 |
US20010053460A1 (en) | 2001-12-20 |
KR100494751B1 (ko) | 2005-06-13 |
JP3225263B2 (ja) | 2001-11-05 |
DE69731101D1 (de) | 2004-11-11 |
KR20000067920A (ko) | 2000-11-25 |
EP0931848B1 (en) | 2004-10-06 |
DE69731101T2 (de) | 2006-02-23 |
CN1333102C (zh) | 2007-08-22 |
US6451129B2 (en) | 2002-09-17 |
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