US7771788B2 - Spherical ultrafine particles and process for producing the same - Google Patents

Spherical ultrafine particles and process for producing the same Download PDF

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Publication number
US7771788B2
US7771788B2 US11/662,385 US66238505A US7771788B2 US 7771788 B2 US7771788 B2 US 7771788B2 US 66238505 A US66238505 A US 66238505A US 7771788 B2 US7771788 B2 US 7771788B2
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Prior art keywords
ultrafine particles
spherical
production
particles
resin
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Expired - Fee Related, expires
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US11/662,385
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US20080107902A1 (en
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Seichin Kinuta
Atsushi Nishino
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Optnics Precision Co Ltd
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Optnics Precision Co Ltd
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Assigned to OPTNICS PRECISION CO., LTD. reassignment OPTNICS PRECISION CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KINUTA, SEICHIN, NISHINO, ATSUSHI
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22—Electrodes
    • H01G11/24—Electrodes characterised by structural features of the materials making up or comprised in the electrodes, e.g. form, surface area or porosity; characterised by the structural features of powders or particles used therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
    • B01J4/002—Nozzle-type elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/06—Metallic powder characterised by the shape of the particles
    • B22F1/065—Spherical particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/02—Making metallic powder or suspensions thereof using physical processes
    • B22F9/06—Making metallic powder or suspensions thereof using physical processes starting from liquid material
    • B22F9/08—Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/05—Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/30—Active carbon
    • C01B32/354—After-treatment
    • C01B32/382—Making shaped products, e.g. fibres, spheres, membranes or foam
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00—Developers
    • G03G9/08—Developers with toner particles
    • G03G9/0802—Preparation methods
    • G03G9/0804—Preparation methods whereby the components are brought together in a liquid dispersing medium
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00—Developers
    • G03G9/08—Developers with toner particles
    • G03G9/0802—Preparation methods
    • G03G9/0815—Post-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00—Developers
    • G03G9/08—Developers with toner particles
    • G03G9/0827—Developers with toner particles characterised by their shape, e.g. degree of sphericity
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00—Developers
    • G03G9/08—Developers with toner particles
    • G03G9/10—Developers with toner particles characterised by carrier particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22—Electrodes
    • H01G11/30—Electrodes characterised by their material
    • H01G11/32—Carbon-based
    • H01G11/34—Carbon-based characterised by carbonisation or activation of carbon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22—Electrodes
    • H01G11/30—Electrodes characterised by their material
    • H01G11/32—Carbon-based
    • H01G11/42—Powders or particles, e.g. composition thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/13—Energy storage using capacitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
    • Y10T428/2995—Silane, siloxane or silicone coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
    • Y10T428/2996—Glass particles or spheres
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y10T428/2998—Coated including synthetic resin or polymer
US11/662,385 2004-09-09 2005-09-07 Spherical ultrafine particles and process for producing the same Expired - Fee Related US7771788B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004-261756 2004-09-09
JP2004261756A JP4762517B2 (ja) 2004-09-09 2004-09-09 プリンター用トナーの製造方法
PCT/JP2005/016871 WO2006028257A1 (ja) 2004-09-09 2005-09-07 球状超微粒子及びその製造方法

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US20080107902A1 US20080107902A1 (en) 2008-05-08
US7771788B2 true US7771788B2 (en) 2010-08-10

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JP (1) JP4762517B2 (ja)
CN (1) CN100584444C (ja)
WO (1) WO2006028257A1 (ja)

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US20120240727A1 (en) * 2011-03-24 2012-09-27 Electronics And Telecommunications Research Institute Method of manufacturing solder powder having diameter of sub-micrometers or several micrometers
US9018131B2 (en) 2013-03-27 2015-04-28 Corning Incorporated Chemical activation of carbon via a gas atomization method
US10017835B2 (en) 2015-03-05 2018-07-10 Sumitomo Metal Mining Co., Ltd. Method for producing nickel sulfide and hydrometallurgical method for nickel oxide ore
KR20190113259A (ko) 2018-03-28 2019-10-08 (주)세원하드페이싱 유동성 향상을 위한 마이크로파 플라즈마를 이용한 세라믹 분말의 표면 처리 방법

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JP5058467B2 (ja) * 2005-08-30 2012-10-24 リグナイト株式会社 電極材料、二次電池用電極、電気二重層キャパシタ分極性電極用炭素材料、電気二重層キャパシタ分極性電極及びその製造方法
JP5224022B2 (ja) * 2006-07-28 2013-07-03 三菱マテリアル株式会社 銀微粒子の製造方法および製造装置
US20100009191A1 (en) * 2006-07-28 2010-01-14 Mitsubishi Materials Corporation Fine silver particles, production method thereof, and production apparatus therefor
KR101342773B1 (ko) 2006-10-20 2013-12-19 에아.워타 가부시키가이샤 비열용융성 입상 페놀 수지 및 그 제조 방법, 그리고 열경화성 수지 조성물, 반도체용 밀봉재 및 반도체용 접착제
US7638076B2 (en) * 2007-10-26 2009-12-29 Martin Resource Management Corporation Method and system for pelletizing sulfur
JP5062593B2 (ja) 2007-12-03 2012-10-31 独立行政法人産業技術総合研究所 リグニンを原料とする炭素微粒子及びその製造方法
JP5288408B2 (ja) 2009-01-22 2013-09-11 独立行政法人産業技術総合研究所 中空炭素微粒子およびその製造方法
CN101972616B (zh) * 2010-11-13 2012-10-31 上海交通大学 均匀球形微粒制备装置及其制备方法
US8329072B2 (en) 2010-11-24 2012-12-11 Brimrock International Inc. Method and system for generating sulfur seeds and granules
JP5099277B1 (ja) * 2010-12-03 2012-12-19 南開工業株式会社 活性炭粉末とその製造方法、及び電気二重層キャパシタ
CN102557044B (zh) * 2010-12-16 2015-02-11 中国石油化工股份有限公司 一种制备大孔二氧化硅微球的方法
CN102491681B (zh) * 2011-12-06 2013-07-17 湖南文象炭基环保材料股份有限公司 一种炭基板材的制备方法
CN103112847B (zh) * 2013-02-26 2014-12-03 华南理工大学 一种利用曼尼希反应制备功能化石墨烯的方法
US20150225245A1 (en) * 2014-02-11 2015-08-13 Corning Incorporated Method for forming activated carbon
AU2015344139B2 (en) * 2014-11-05 2017-07-20 Jgc Catalysts And Chemicals Ltd. Porous Silica Particle and Cleansing Cosmetic
JP2017084838A (ja) * 2015-10-22 2017-05-18 株式会社キャタラー 蓄電デバイス用炭素材料及び蓄電デバイス
JP6754198B2 (ja) * 2016-03-04 2020-09-09 株式会社 東北テクノアーチ 多孔質炭素材料の製造方法
EP3489281B1 (en) * 2016-07-22 2023-04-19 Sekisui Plastics Co., Ltd. Generally spherical resin particles formed of thermoplastic resin, method for producing same and use of same
CN109304463A (zh) * 2018-10-09 2019-02-05 中国科学院合肥物质科学研究院 一种孔径、孔型可调的高孔隙率Mn-Cu基高阻尼合金的制作方法
CN109499541A (zh) * 2019-01-13 2019-03-22 清华大学 一种用于水处理行业的快速高效吸附材料、制备方法及其应用
JP7396009B2 (ja) * 2019-12-10 2023-12-12 三菱マテリアル株式会社 シリコン微粒子及びその製造方法
JP7093085B2 (ja) * 2020-05-12 2022-06-29 株式会社 東北テクノアーチ 多孔質炭素材料

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JPH05253468A (ja) 1992-03-10 1993-10-05 Oogawara Kakoki Kk 噴霧熱分解方法および装置
JPH06279008A (ja) 1993-03-29 1994-10-04 Nittetsu Mining Co Ltd 焼結法による球状窒化鉄微粒子の製造方法
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JPH09215918A (ja) 1996-02-09 1997-08-19 Kawasaki Heavy Ind Ltd 気液反応装置
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JP2003203829A (ja) 2002-01-10 2003-07-18 Futamura Chemical Industries Co Ltd 電気二重層キャパシタ用活性炭及びその製造方法
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JP3786034B2 (ja) * 2002-03-07 2006-06-14 セイコーエプソン株式会社 トナー製造装置、トナーの製造方法およびトナー

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JPH0243943A (ja) 1988-04-12 1990-02-14 Mitsuboshi:Kk 超微粉体の製造法
JPH05253468A (ja) 1992-03-10 1993-10-05 Oogawara Kakoki Kk 噴霧熱分解方法および装置
JPH06279008A (ja) 1993-03-29 1994-10-04 Nittetsu Mining Co Ltd 焼結法による球状窒化鉄微粒子の製造方法
JPH0739743A (ja) 1993-07-30 1995-02-10 Kanegafuchi Chem Ind Co Ltd 均一液滴形成方法およびその装置
JPH09215918A (ja) 1996-02-09 1997-08-19 Kawasaki Heavy Ind Ltd 気液反応装置
JPH1111314A (ja) 1997-06-24 1999-01-19 Nishimura Denko:Kk 鉄道用信号器具箱
JP2003528419A (ja) 1998-08-27 2003-09-24 スーペリア マイクロパウダーズ リミテッド ライアビリティ カンパニー 金属−炭素複合粉体、該粉体の製造方法、及び該粉体から製造される装置
US20020107140A1 (en) 1998-08-27 2002-08-08 Hampden-Smith Mark J. Electrocatalyst powders, methods for producing powders and devices fabricated from same
WO2000015547A2 (en) 1998-08-27 2000-03-23 Superior Micropowders Llc Metal-carbon composite powders, methods for producing powders and devices fabricated from same
EP1358124A2 (en) 1998-08-27 2003-11-05 Superior Micropowders LLC Metal-carbon composite powders, methods for producing powders and devices fabricated from same
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KR20190113259A (ko) 2018-03-28 2019-10-08 (주)세원하드페이싱 유동성 향상을 위한 마이크로파 플라즈마를 이용한 세라믹 분말의 표면 처리 방법

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WO2006028257A1 (ja) 2006-03-16
US20080107902A1 (en) 2008-05-08

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