US20160002803A1 - Nickel-Chromium Nanolaminate Coating Having High Hardness - Google Patents

Nickel-Chromium Nanolaminate Coating Having High Hardness Download PDF

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Publication number
US20160002803A1
US20160002803A1 US14/855,252 US201514855252A US2016002803A1 US 20160002803 A1 US20160002803 A1 US 20160002803A1 US 201514855252 A US201514855252 A US 201514855252A US 2016002803 A1 US2016002803 A1 US 2016002803A1
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Prior art keywords
nickel
substrate
chromium
coating
layers
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Abandoned
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US14/855,252
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English (en)
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Glenn Sklar
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Mdoumetal Inc
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Mdoumetal Inc
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Priority to US14/855,252 priority Critical patent/US20160002803A1/en
Publication of US20160002803A1 publication Critical patent/US20160002803A1/en
Priority to US16/191,386 priority patent/US10844504B2/en
Priority to US17/077,970 priority patent/US11168408B2/en
Assigned to MODUMETAL, INC. reassignment MODUMETAL, INC. CHANGE OF ADDRESS Assignors: MODUMETAL, INC.
Abandoned legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/20—Electroplating: Baths therefor from solutions of iron
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/54—Electroplating: Baths therefor from solutions of metals not provided for in groups C25D3/04 - C25D3/50
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00—Electrolytic coating other than with metals
    • C25D9/04—Electrolytic coating other than with metals with inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C25D5/36—Pretreatment of metallic surfaces to be electroplated of iron or steel

Definitions

  • Electrodeposition is recognized as a low-cost method for forming a dense coating on a variety of conductive materials, including metals, alloys, conductive polymers and the like. Electrodeposition has also been successfully used to deposit nanolaminated coatings on non-conductive material such as non-conductive polymers by incorporating sufficient materials into the non-conductive polymer to render it sufficiently conductive or by treating the surface to render it conductive, for example by electroless deposition of nickel, copper, silver, cadmium etc. a variety of engineering applications.
  • Electrodeposition has also been demonstrated as a viable means for producing laminated and nanolaminated coatings, materials and objects, in which the individual laminate layers may vary in the composition of the metal, ceramic, organic-metal composition, and/or microstructure features.
  • Laminated coatings and materials, and in particular nanolaminated metals are of interest for a variety of purposes, including structural, thermal, and corrosion resistance applications because of their unique toughness, fatigue resistance, thermal stability, wear (abrasion resistance and chemical properties.
  • the present disclosure is directed to the production NiCr nanolaminated materials having a high hardness.
  • the materials have a variety of uses including, but not limited to, the preparation of coatings that protect an underlying substrate, and which may also increase its strength.
  • hard NiCr coatings and materials are wear/abrasion resistant and find use as wear resistant coatings in tribological applications.
  • the hard NiCr coatings prevent damage to the underlying substrates. Where the NiCr materials are applied as a coating that is more noble then the underlying material upon which it is placed, it may function as a corrosion resistant barrier coating.
  • the present disclosure is directed to the method of producing laminate materials and coatings comprising layers each comprising nickel or nickel and chromium.
  • the materials, which are prepared by electrodeposition, have a Vickers hardness value up to about 750 without the addition of other elements or heat treatments.
  • the method may further comprise the step of separating said substrate or mandrel from the coating, where the coating forms an object comprised of the laminate material.
  • the high hardness coating produced by the process typically has alternating first and second layers.
  • the first layers are each from about 25 nm to about 75 nm thick, and comprises from about 92% to about 99% nickel, with the balance typically comprising chromium.
  • the second layers are each from about 125 nm to about 175 nm thick, and typically comprise from about 10% to about 21% chromium by weight with the balance typically comprising nickel.
  • Laminate or “laminated” as used herein refers to materials that comprise a series of layers, including nanolaminated materials.
  • Nanolaminate or “nanolaminated” as used herein refers to materials that comprise a series of layers less than 1 micron.
  • Electrodeposition has been demonstrated as a viable means for producing nanolaminated metal materials and coatings in which the individual laminate layers may vary in the composition or structure of the metal components.
  • electrodeposition permits the inclusion of other components, such as ceramic particles and organic-metal components.
  • Multi-laminate materials having layers with different compositions can be realized by moving a mandrel or substrate from one bath to another and electrodepositing a layer of the final material.
  • Each bath represents a different combination of parameters, which may be held constant or varied in a systematic manner.
  • laminated materials may be prepared by alternately electroplating a substrate or mandrel in two or more electrolyte baths of differing electrolyte composition and/or under differing plating conditions (e.g., current density and mass transfer control).
  • laminated materials may be prepared using a single electrolyte bath by varying the electrodeposition parameters such as the voltage applied, the current density, mixing rate, substrate or mandrel movement (e.g., rotation) rate, and/or temperature. By varying those and/or other parameters, laminated materials having layers with differing metal content can be produced in a single bath.
  • the present disclosure provides a process for forming a multilayered nickel and chromium containing coating on a substrate or mandrel by electrodeposition comprising:
  • step (d) includes contacting at least a portion of the substrate or mandrel that having the first layer deposited on it with a second of said one or more electrolyte solutions (baths) prior to passing a second electric current through the substrate, to deposit second layer comprising a nickel-chromium alloy on the surface.
  • the method may further comprise a step of separating the substrate or mandrel from the electroplated coating.
  • a step of separating the electroplated material form the substrate or mandrel is to be employed, the use of electrodes (mandrel) that do not form tight bonds with the coating are desirable, such as titanium electrode (mandrel).
  • providing one or more electrolyte solutions comprises providing a single electrolyte solution comprising a nickel salt and a chromium salt, and passing an electric current through said substrate or mandrel comprises alternately pulsing said electric current for predetermined durations between said first electrical current density and said second electrical current density; where the first electrical current density is effective to electrodeposit a first composition comprising either nickel or an alloy of nickel and chromium; and the second electrical current density is effective to electrodeposit a second composition comprising nickel and chromium; the process is repeated to producing a multilayered alloy having alternating first and second layers on at least a portion of said surface of the substrate or mandrel.
  • the electrolytes employed may be aqueous or non-aqueous. Where aqueous baths are employed they may benefit from the addition of one or more, two or more, or three or more complexing agents, which can be particularly useful in complexing chromium in the +3 valency.
  • the complexing agents that may be employed in aqueous baths are one or more of citric acid, ethylendiaminetetraacetic acid (EDTA), triethanolamine (TEA), ethylenediamine (En), formic acid, acetic acid, hydroxyacetic acid, malonic acid, or an alkali metal salt or ammonium salt of any thereof.
  • the electrolyte used in plating comprises a Cr +3 salt (e.g., a tri-chrome plating bath).
  • the electrolyte used in plating comprises either Cr +3 and one or more complexing agents selected from citric acid, formic acid, acetic acid, hydroxyacetic acid, malonic acid, or an alkali metal salt or ammonium salt of any thereof.
  • the electrolyte used in plating comprises either Cr +3 and one or more amine containing complexing agents selected from EDTA, triethanolamine (TEA), ethylenediamine (En), or salt of any thereof.
  • the temperature at which the electrodeposition process is conducted may alter the composition of the electrodeposit.
  • the electrodeposition process will typically be kept in the range of about 18° C. to about 45° C. (e.g., 18° C. to about 35° C.). for the deposition of both the first and second layers. Both potentiostatic and galvanostatic control of the electrodeposition of the first and second layers is possible regardless of whether those layers are applied from different electrolyte baths or from a single bath.
  • a single electrolyte bath is employed and the first electrical current ranges from approximately 10 mA/cm 2 to approximately 100 mA/cm 2 for the deposition of the first layers.
  • the second electrical current ranges from approximately 100 mA/cm 2 to approximately 500 mA/cm 2 for the deposition of the second layers.
  • Plating of each layer may be conducted either continuously or by pulse or pulse reverse plating.
  • the first electrical current is applied to the substrate or mandrel in pulses ranging from approximately 0.001 second to approximately 1 seconds.
  • the second electrical current is applied to the substrate or mandrel in pulses ranging from approximately 1 second to approximately 100 seconds.
  • the electrodeposition may employ periods of DC plating followed by periods of pulse plating.
  • plating of the nearly pure nickel layer may be conducted either by direct current or by pulse plating.
  • the first electrical current is applied to the substrate or mandrel in pulses ranging from approximately 0.001 second to approximately 1 seconds.
  • the second electrical current is applied to the substrate or mandrel in pulses ranging from approximately 1 second to approximately 100 seconds.
  • the electrodeposition may employ periods of DC plating followed by periods of pulse plating.
  • a strike layer particularly where the substrate is a polymer or plastic that has previously been rendered conductive by electroless plating or by chemical conversion of its surface, as in the case for zincate processing of aluminum, which is performed prior to the electroless or electrified deposition.
  • a strike layer may be chosen from an of a number of metals including, but not limited to, copper nickel, zinc, cadmium, platinum etc.
  • the strike layer is nickel or a nickel alloy from about 100 nm to about 1000 nm or about 250 nm to about 2500 nm thick.
  • a first layer applied to a substrate may act as a strike layer, in which case it is applied so that it is directly in contact with a substrate, or in the case of a polymeric substrate rendered conductive by electroless deposition of a metal, directly in contact with the electroless metal layer. Accordingly, in one embodiment a first layer is in contact with the substrate or mandrel. In another embodiment, the second layer is in contact with the substrate or mandrel.
  • the hard nanolaminate materials, such as coatings, produced by the processes described above will typically comprise alternating first and second layers in addition to any strike layer applied to the substrate.
  • the first layers each having a thickness independently selected from about 25 nm to about 75 nm, from about 25 nm to about 50 nm, from about 35 nm to about 65 nm, from about 40 nm to about 60 nm, or from about 50 nm to about 75 nm.
  • the second layers having thickness independently from about 125 nm to about 175 nm, from about 125 nm to about 150 nm, from about 135 nm to about 165 nm, from about 140 nm to about 160 nm, or from about 150 nm to about 175 nm.
  • First layers may typically comprise greater than about 92%, 93%, 94%, 95%, 96%, 97%, 98% or 99% nickel.
  • the balance of first layers may be chromium, or may be comprised of one or more, two or more, three or more, or four or more elements selected independently for each first layer from C, Co, Cr, Cu, Fe, In, Mn, Nb, Sn, W, Mo, and P.
  • the balance of the first layers are each an alloy comprising chromium and one or more elements selected independently for each layer from C, Co, Cu, Fe, Ni, W, Mo and/or P.
  • Second layers may typically comprise about 5% to about 40%, about 5% to about 21%, about 10% to about 14%, about 12% to about 16%, about 14% to about 18%, about 16 to about 21%, about 18% to about 21% or about 18% to about 40% chromium.
  • the balance of second layers may be nickel, or may be comprised of nickel and one or more, two or more, three or more, or four or more elements selected independently for each second layer from C, Co, Cu, Fe, In, Mn, Mo, P, Nb, Ni and W.
  • the balance of the second layers is an alloy comprising nickel and one or more elements selected independently for each layer from C, Co, Cr, Cu, Mo, P, Fe, Ti and W.
  • Laminated or nanolaminated materials including coatings prepared as described herein comprise two or more, three or more, four or more, six or more, eight or more, ten or more, twenty or more, forty or more, fifty or more, 100 or more, 200 or more, 500 or more or 1000 or more alternating first and second layers.
  • the first and second layers are counted as pairs of first and second layers. Accordingly, two layers each having a first layer and second layer, consists of a total of four laminate layers (i.e., each layer is counted separately).
  • the present disclosure is directed to hard NiCr materials, including hard NiCr coatings and electroformed NiCr objects prepared by the methods described above.
  • the hard NiCr materials described herein have a number of properties that render them useful for both industrial and decorative purposes.
  • the coatings applied are self-leveling and depending on the exact composition of the outermost layer can be reflective to visible light. Accordingly, the hard NiCr materials may serve as a replacement for chrome finishes in a variety of application where reflective metal surfaces are desired. Such applications include, but are not limited to, minors, automotive details such as bumpers or fenders, decorative finishes and the like.
  • the laminated NiCr coatings described herein have a surface roughness (arithmetical mean roughness or Ra) of less than 0.1 micrometer (e.g., 0.09, 0.08, 0.07, or 0.05 microns).
  • NiCr alloys above the hardness observed for homogeneous electrodeposited NiCr compositions (alloys) that have not been heat treated and have the same thickness and average composition as the hard NiCr nanolaminate material.
  • laminated NiCr materials have a Vickers microhardness as measured by ASTM E384-11e1of 550-750, 550-600, 600-650, 650-700, 700-750 or greater than 750 but less than about 900, 950, 1000 or 1100 units without heat treatment.
  • the use of heat treatments in the presence of other elements such as P, C in the first and second layers can increase the hardness of the coating.
  • NiCr materials described herein comprising alternating first and second layers, where the first layers that comprise nickel or comprise a nickel-chromium alloy, and the second layers comprise a nickel-chromium alloy.
  • Such materials have a Vickers microhardness as measured by ASTM E384-11e1 of 550-750, 550-600, 600-650, 650-700, 700-750, 750-800, or 800-850 without heat treatment.
  • the NiCr materials described herein consist of alternating first and second layers, where the first layers consist of a nickel or a nickel-chromium alloy and second layers consist of a nickel-chromium alloy.
  • Such materials have a Vickers microhardness as measured by ASTM E384-11e1 of 550-750, 550-600, 600-650, 650-700, 700-750, 750-800 or 800-850 without heat treatment.
  • the laminated NiCr materials are useful as a means of providing resistance to abrasion, especially when they are employed as coatings.
  • the nanolaminate NiCr coatings that have not been heat treated display 5%, 10%, 20%, 30% or 40% less loss of weight than homogeneous electrodeposited NiCr compositions (alloys) that have not been heat treated and have the same thickness and average composition as the hard NiCr nanolaminate material when subject to testing on a Taber Abraser equipped with CS-10 wheels and a 250 g load and operated at room temperature at the same speed for both samples (e.g., 95 RPM).
  • the laminated NiCr compositions display a higher abrasion resistance when subject to testing under ASTM D4060 than their homogeneous counterpart (e.g., homogeneous electrodeposited counterpart having the average composition of the laminated NiCr composition).
  • NiCr generally acts as barrier coating being more electronegative (more noble) than substrates to which it will be applied, such as iron-based substrates.
  • NiCr coatings act by forming a barrier to oxygen and other agents (e.g., water, acid, base, salts, and/or H 2 S) causing corrosive damage, including oxidative corrosion.
  • a barrier coating that is more noble than its underlying substrate is maned or scratched, or if coverage is not complete, the coatings will not work and may accelerate the progress of substrate corrosion at the substrate-coating interface, resulting in preferential attack of the substrate.
  • coatings prepared from the hard NiCr coatings described herein offer advantages over softer NiCr nanolaminate coatings as they are less likely to permit a scratch to reach the surface of a corrosion susceptible substrate.
  • Another advantage offered by the hard NiCr laminate coatings described herein are their fully dense structure, which lacks any significant pores or micro-cracks that extend from the surface of the coating to the substrate.
  • the first layer can be a nickel rich ductile layer that hinders the formation of continuous cracks from the coating surface to the substrate. To the extent that microcracks occur in the high chromium layers, they are small and tightly spaced.
US14/855,252 2013-03-15 2015-09-15 Nickel-Chromium Nanolaminate Coating Having High Hardness Abandoned US20160002803A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US14/855,252 US20160002803A1 (en) 2013-03-15 2015-09-15 Nickel-Chromium Nanolaminate Coating Having High Hardness
US16/191,386 US10844504B2 (en) 2013-03-15 2018-11-14 Nickel-chromium nanolaminate coating having high hardness
US17/077,970 US11168408B2 (en) 2013-03-15 2020-10-22 Nickel-chromium nanolaminate coating having high hardness

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361802112P 2013-03-15 2013-03-15
PCT/US2014/030381 WO2014145588A1 (fr) 2013-03-15 2014-03-17 Revêtement nanostratifié de chrome et de nickel ayant une dureté élevée
US14/855,252 US20160002803A1 (en) 2013-03-15 2015-09-15 Nickel-Chromium Nanolaminate Coating Having High Hardness

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US16/191,386 Continuation US10844504B2 (en) 2013-03-15 2018-11-14 Nickel-chromium nanolaminate coating having high hardness

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US16/191,386 Active US10844504B2 (en) 2013-03-15 2018-11-14 Nickel-chromium nanolaminate coating having high hardness
US17/077,970 Active US11168408B2 (en) 2013-03-15 2020-10-22 Nickel-chromium nanolaminate coating having high hardness

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US17/077,970 Active US11168408B2 (en) 2013-03-15 2020-10-22 Nickel-chromium nanolaminate coating having high hardness

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US (3) US20160002803A1 (fr)
EP (1) EP2971265A4 (fr)
CN (2) CN105189828B (fr)
BR (1) BR112015022020A8 (fr)
CA (1) CA2905513C (fr)
EA (1) EA201500949A1 (fr)
HK (1) HK1220743A1 (fr)
SA (1) SA515361168B1 (fr)
WO (1) WO2014145588A1 (fr)

Cited By (21)

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US20150337447A1 (en) * 2014-05-22 2015-11-26 The Boeing Company Co-bonded electroformed abrasion strip
US9828313B2 (en) 2013-07-31 2017-11-28 Calera Corporation Systems and methods for separation and purification of products
US9957623B2 (en) 2011-05-19 2018-05-01 Calera Corporation Systems and methods for preparation and separation of products
US9957621B2 (en) 2014-09-15 2018-05-01 Calera Corporation Electrochemical systems and methods using metal halide to form products
WO2019016543A1 (fr) * 2017-07-17 2019-01-24 Queen Mary University Of London Électrodéposition à partir de multiples électrolytes
US10253419B2 (en) 2009-06-08 2019-04-09 Modumetal, Inc. Electrodeposited, nanolaminate coatings and claddings for corrosion protection
US10378118B2 (en) * 2013-12-11 2019-08-13 United Technologies Corporation Electroformed nickel-chromium alloy
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US11168408B2 (en) 2021-11-09
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EA201500949A1 (ru) 2016-02-29
CN105189828A (zh) 2015-12-23
US10844504B2 (en) 2020-11-24
WO2014145588A1 (fr) 2014-09-18
BR112015022020A8 (pt) 2019-12-10
SA515361168B1 (ar) 2019-06-11
EP2971265A1 (fr) 2016-01-20
CA2905513A1 (fr) 2014-09-18
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WO2014145588A9 (fr) 2015-02-19

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