JP6062600B2 - シリンダ用メッキ装置及び方法 - Google Patents
シリンダ用メッキ装置及び方法 Download PDFInfo
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- JP6062600B2 JP6062600B2 JP2016511465A JP2016511465A JP6062600B2 JP 6062600 B2 JP6062600 B2 JP 6062600B2 JP 2016511465 A JP2016511465 A JP 2016511465A JP 2016511465 A JP2016511465 A JP 2016511465A JP 6062600 B2 JP6062600 B2 JP 6062600B2
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- 238000007747 plating Methods 0.000 title claims description 124
- 238000000034 method Methods 0.000 title claims description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 24
- 230000002093 peripheral effect Effects 0.000 claims description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 229910052804 chromium Inorganic materials 0.000 description 15
- 239000011651 chromium Substances 0.000 description 15
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000007788 liquid Substances 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- 239000000654 additive Substances 0.000 description 3
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000007646 gravure printing Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 229960004643 cupric oxide Drugs 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/04—Tubes; Rings; Hollow bodies
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/18—Curved printing formes or printing cylinders
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/16—Curved printing plates, especially cylinders
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Manufacturing & Machinery (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Coating Apparatus (AREA)
Description
メッキ装置として図1〜5に示した構成の装置を用いた。メッキ液として、クロム酸濃度250g/L、硫酸濃度2.5g/L、添加剤に「CHRIO RX−ML」(奥野製薬製)を50mL/Lを含むクロムメッキ液を使用した。メッキで消費されるクロム及び添加剤成分は、自動補給装置により「CHRIO RX−R」(奥野製薬製)を供給した。不溶性陽極としては、下部部分を湾曲させたチタン板の表面に白金をコーティングしたものを用いた。
メッキ装置として図1〜5に示した構成の装置を用いた。メッキ液として銅メッキ液を使用した。
被処理シリンダとして、円周600mm、面長1100mmのアルミ芯の円筒型基材を用い、被処理シリンダの両端をチャックしてメッキ槽に装着し、電極をコンピューター制御された回動機構により不溶性電極を20mmまで被処理シリンダに接近させ、銅メッキ液をオーバーフローさせ、被処理シリンダを全没させた。被処理シリンダの回転数を250rpmとし、メッキ液温度45℃、電流密度30A/dm2(電流1980A)、電圧7Vとした。この条件で10分メッキ処理を行い、表面にブツやピットの発生がない厚さ60μmの均一なメッキ被膜が得られた。
Claims (5)
- メッキ液が貯留されるメッキ槽と、被処理シリンダを回転可能且つ通電可能に長手方向両端を把持して前記メッキ槽に収容するチャック手段と、前記メッキ槽内で被処理シリンダの両側面に対向して垂設され且つ所定の通電が行われる相対向する一対の不溶性電極とを備え、前記一対の不溶性電極を前記被処理シリンダの両側面に所定間隔をおいて近接せしめ、前記被処理シリンダの外周表面にメッキを施すようにしたシリンダ用メッキ装置であり、
前記不溶性電極が、少なくとも下部部分を内方に湾曲せしめてなる形状を有し、且つ少なくとも前記下部部分が櫛目状部とされてなり、
一方の前記不溶性電極の前記櫛目状部の凹部の位置に他方の前記不溶性電極の前記櫛目状部の凸部が位置するように互い違いに相対向せしめ、
前記不溶性電極の上端部分を回動中心として前記不溶性電極を回動可能に構成し、前記被処理シリンダの径に応じて前記被処理シリンダの外周表面に対する前記不溶性電極の近接距離を調節可能にしてなることを特徴とするシリンダ用メッキ装置。 - 前記不溶性電極の湾曲形状が前記被処理シリンダの外周面の曲率に対応する湾曲形状であることを特徴とする請求項1記載のシリンダ用メッキ装置。
- 前記不溶性電極が、メッシュ状電極であることを特徴とする請求項1又は2記載のシリンダ用メッキ装置。
- 前記メッキ液が銅メッキ液又はクロムメッキ液であり、前記被処理シリンダが中空円筒状のグラビア製版用シリンダであることを特徴する請求項1〜3いずれか1項記載のシリンダ用メッキ装置。
- 請求項1〜4いずれか1項記載のシリンダ用メッキ装置を用いて、被処理シリンダの外周表面にメッキを施すようにしたことを特徴するシリンダ用メッキ方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014072093 | 2014-03-31 | ||
JP2014072093 | 2014-03-31 | ||
PCT/JP2015/055568 WO2015151665A1 (ja) | 2014-03-31 | 2015-02-26 | シリンダ用メッキ装置及び方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP6062600B2 true JP6062600B2 (ja) | 2017-01-18 |
JPWO2015151665A1 JPWO2015151665A1 (ja) | 2017-04-13 |
Family
ID=54240000
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016511465A Active JP6062600B2 (ja) | 2014-03-31 | 2015-02-26 | シリンダ用メッキ装置及び方法 |
Country Status (10)
Country | Link |
---|---|
US (1) | US10041185B2 (ja) |
EP (1) | EP3128045B1 (ja) |
JP (1) | JP6062600B2 (ja) |
KR (1) | KR101739060B1 (ja) |
CN (1) | CN106103814B (ja) |
ES (1) | ES2683243T3 (ja) |
RU (1) | RU2637460C1 (ja) |
TR (1) | TR201810859T4 (ja) |
TW (1) | TWI638911B (ja) |
WO (1) | WO2015151665A1 (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2381015B1 (en) | 2005-08-12 | 2019-01-16 | Modumetal, Inc. | Compositionally modulated composite materials |
EA029168B1 (ru) | 2009-06-08 | 2018-02-28 | Модьюметал, Инк. | Электроосажденное наноламинатное покрытие и оболочка для защиты от коррозии |
EP2971266A4 (en) | 2013-03-15 | 2017-03-01 | Modumetal, Inc. | A method and apparatus for continuously applying nanolaminate metal coatings |
CA2905548C (en) | 2013-03-15 | 2022-04-26 | Modumetal, Inc. | Nanolaminate coatings |
CA2905536C (en) | 2013-03-15 | 2023-03-07 | Modumetal, Inc. | Electrodeposited compositions and nanolaminated alloys for articles prepared by additive manufacturing processes |
WO2014145588A1 (en) | 2013-03-15 | 2014-09-18 | Modumetal, Inc. | Nickel chromium nanolaminate coating having high hardness |
BR112017005464A2 (pt) | 2014-09-18 | 2017-12-05 | Modumetal Inc | método e aparelho para aplicar continuamente revestimentos de metal nanolaminado |
AR102068A1 (es) | 2014-09-18 | 2017-02-01 | Modumetal Inc | Métodos de preparación de artículos por electrodeposición y procesos de fabricación aditiva |
US11365488B2 (en) | 2016-09-08 | 2022-06-21 | Modumetal, Inc. | Processes for providing laminated coatings on workpieces, and articles made therefrom |
WO2018175975A1 (en) | 2017-03-24 | 2018-09-27 | Modumetal, Inc. | Lift plungers with electrodeposited coatings, and systems and methods for producing the same |
EP3612669A1 (en) * | 2017-04-21 | 2020-02-26 | Modumetal, Inc. | Tubular articles with electrodeposited coatings, and systems and methods for producing the same |
CN110191807B (zh) * | 2017-12-11 | 2020-07-14 | 株式会社新克 | 凹版制版用机器人的把持部结构 |
WO2019176586A1 (ja) * | 2018-03-16 | 2019-09-19 | 株式会社シンク・ラボラトリー | シリンダ体メッキ装置用集電部材及びメッキ装置 |
CN112272717B (zh) | 2018-04-27 | 2024-01-05 | 莫杜美拓有限公司 | 用于使用旋转生产具有纳米层压物涂层的多个制品的设备、系统和方法 |
CN110760909B (zh) * | 2019-12-06 | 2021-03-23 | 隆鑫通用动力股份有限公司 | 用于缸体槽外电镀的通用型工装 |
CN110923789B (zh) * | 2019-12-06 | 2021-03-23 | 隆鑫通用动力股份有限公司 | 用于缸体槽外电镀的电镀环境处理装置 |
KR20220136414A (ko) * | 2020-03-09 | 2022-10-07 | 가부시키가이샤 씽크. 라보라토리 | 판 모재 전자동 제조 시스템 및 판 모재 제조 방법 |
KR20240033149A (ko) * | 2022-03-01 | 2024-03-12 | 가부시키가이샤 씽크. 라보라토리 | 실린더용 3가크롬 도금 장치 및 방법 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH0741980A (ja) * | 1993-06-17 | 1995-02-10 | Permelec Electrode Ltd | 電解用電極 |
WO2012004351A1 (en) * | 2010-07-07 | 2012-01-12 | Octonus Finland Oy | Improved method for analyzing a gemstone |
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US1918627A (en) * | 1928-04-16 | 1933-07-18 | Standard Process Corp | Apparatus for producing printing forms |
CH560769A5 (ja) | 1972-03-17 | 1975-04-15 | Safan Belgium | |
DE2722857A1 (de) * | 1977-04-27 | 1978-11-02 | Graphicart Int | Vorrichtung zur auftragung einer metallischen schicht durch elektrolyse auf einen zylindrischen koerper, insbesondere zur aufkupferung eines zylinders |
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2015
- 2015-02-26 CN CN201580012279.8A patent/CN106103814B/zh active Active
- 2015-02-26 WO PCT/JP2015/055568 patent/WO2015151665A1/ja active Application Filing
- 2015-02-26 KR KR1020167024005A patent/KR101739060B1/ko active IP Right Grant
- 2015-02-26 US US15/125,314 patent/US10041185B2/en active Active
- 2015-02-26 TR TR2018/10859T patent/TR201810859T4/tr unknown
- 2015-02-26 ES ES15773673.7T patent/ES2683243T3/es active Active
- 2015-02-26 JP JP2016511465A patent/JP6062600B2/ja active Active
- 2015-02-26 RU RU2016138768A patent/RU2637460C1/ru not_active IP Right Cessation
- 2015-02-26 EP EP15773673.7A patent/EP3128045B1/en active Active
- 2015-03-04 TW TW104106823A patent/TWI638911B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH0741980A (ja) * | 1993-06-17 | 1995-02-10 | Permelec Electrode Ltd | 電解用電極 |
WO2012004351A1 (en) * | 2010-07-07 | 2012-01-12 | Octonus Finland Oy | Improved method for analyzing a gemstone |
Also Published As
Publication number | Publication date |
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US10041185B2 (en) | 2018-08-07 |
CN106103814A (zh) | 2016-11-09 |
TW201602421A (zh) | 2016-01-16 |
JPWO2015151665A1 (ja) | 2017-04-13 |
KR20160116345A (ko) | 2016-10-07 |
RU2637460C1 (ru) | 2017-12-04 |
ES2683243T3 (es) | 2018-09-25 |
EP3128045A4 (en) | 2017-12-27 |
EP3128045B1 (en) | 2018-07-11 |
EP3128045A1 (en) | 2017-02-08 |
US20170073833A1 (en) | 2017-03-16 |
CN106103814B (zh) | 2017-10-24 |
TR201810859T4 (tr) | 2018-08-27 |
WO2015151665A1 (ja) | 2015-10-08 |
KR101739060B1 (ko) | 2017-05-23 |
TWI638911B (zh) | 2018-10-21 |
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