US20150213990A1 - Barrier film constructions and methods of making same - Google Patents

Barrier film constructions and methods of making same Download PDF

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US20150213990A1
US20150213990A1 US14/419,352 US201314419352A US2015213990A1 US 20150213990 A1 US20150213990 A1 US 20150213990A1 US 201314419352 A US201314419352 A US 201314419352A US 2015213990 A1 US2015213990 A1 US 2015213990A1
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layer
adhesion
polymer layer
base polymer
oxide
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Joseph C. Spagnola
Mark A. Roehrig
Thomas P. Klun
Alan K. Nachtigal
Christopher S. Lyons
Guy D. Joly
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3M Innovative Properties Co
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3M Innovative Properties Co
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Assigned to 3M INNOVATIVE PROPERTIES COMPANY reassignment 3M INNOVATIVE PROPERTIES COMPANY ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SPAGNOLA, JOSEPH C., JOLY, GUY D., KLUN, THOMAS P., LYONS, CHISTOPHER S., NACHTIGAL, ALAN K., ROEHRIG, MARK A.
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/042Coating with two or more layers, where at least one layer of a composition contains a polymer binder
    • C08J7/0423Coating with two or more layers, where at least one layer of a composition contains a polymer binder with at least one layer of inorganic material and at least one layer of a composition containing a polymer binder
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/043Improving the adhesiveness of the coatings per se, e.g. forming primers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/048Forming gas barrier coatings
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/024Deposition of sublayers, e.g. to promote adhesion of the coating
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58After-treatment
    • C23C14/5806Thermal treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/54Screens on or from which an image or pattern is formed, picked-up, converted, or stored; Luminescent coatings on vessels
    • H01J1/62Luminescent screens; Selection of materials for luminescent coatings on vessels
    • H01J1/70Luminescent screens; Selection of materials for luminescent coatings on vessels with protective, conductive, or reflective layers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2367/00Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • C08J2367/02Polyesters derived from dicarboxylic acids and dihydroxy compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/06Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2433/08Homopolymers or copolymers of acrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/06Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2433/10Homopolymers or copolymers of methacrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08J2433/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/06Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2433/10Homopolymers or copolymers of methacrylic acid esters
    • C08J2433/12Homopolymers or copolymers of methyl methacrylate
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/14Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
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    • Y10T428/31855Of addition polymer from unsaturated monomers

Definitions

  • the present disclosure relates generally to barrier films and methods of making barrier films.
  • Multilayer stacks of polymers and oxides are deposited in a single pass coating process on flexible polymeric films to make barrier films resistant to moisture permeation.
  • barrier films can be prepared by a variety of production methods, including liquid coating techniques such as solution coating, roll coating, dip coating, spray coating, spin coating; and dry coating techniques such as Chemical Vapor Deposition (CVD), Plasma Enhanced Chemical Vapor Deposition (PECVD), sputtering and vacuum processes for thermal evaporation of solid materials. Examples of such barrier films and processes can be found, for example, in U.S. Pat. No. 5,440,446 (Shaw et al.); U.S. Pat. No.
  • the inventors of the present application sought to develop barrier films with improved weatherability and resistance to inter-layer delamination.
  • a barrier film include a substrate, a base polymer layer adjacent to the substrate, an oxide layer adjacent to the base polymer layer, an adhesion-modifying layer adjacent to the oxide layer; and a top coat polymer layer adjacent to the adhesion-modifying layer.
  • the top coat polymer includes an acrylate.
  • an inorganic layer can be located on the top coat polymer layer.
  • the adhesion-modifying layer is an adhesion-promoting layer. In other embodiments, the adhesion-modifying layer is a release layer.
  • Some embodiments of a process for making barrier films includes the steps of providing a substrate, applying a base polymer layer to the substrate, applying an oxide layer to the base polymer layer, applying a adhesion-modifying layer to the oxide layer; and applying a top coat polymer layer on the adhesion-modifying layer.
  • a separate adhesion-promoting layer provides for enhanced resistance to moisture and improved peel strength adhesion of the top coat layer to the underlying barrier stack layers.
  • a separate release layer provides for application and subsequent removal of a temporary protective layer to one of the oxide layer and polymer layer, creating an improved barrier assembly.
  • the protective layer is applied to the oxide layer to protect the oxide layer during processing. Inclusion of the protective layer during processing reduces defect formation in the oxide layer.
  • the protective layer is subsequently removed from the oxide layer during downstream processing.
  • the exposed oxide layer is immediately protected by application of an adhesive layer and/or a top sheet or protective liner.
  • FIG. 1 is a schematic cross-section showing a barrier film having an adhesion-modifying layer
  • FIG. 2 is a schematic diagram illustrating a process for making a barrier film.
  • adhesion between layers in a multilayer barrier film is insufficient for a desired application.
  • polymer layers e.g., a polyester layer, an acrylate or methacrylate layer
  • polymer layers may not have good adhesion to adjacent oxide layers.
  • Adhesion problems may occur, for example when a sputter process is used for forming oxide layers. In the sputter process, the deposition energy useful for forming a barrier oxide layer is generally high.
  • the energy involved in depositing polymer layers is generally low, and this difference in deposition energy may lead to adhesion problems.
  • a thin sputtered layer e.g., inorganic “tie” layer
  • silicon sub-oxide has been shown to be useful.
  • This inorganic tie layer element can then form chemical bonds to both the substrate layer, an oxide, and the polymeric capping layer.
  • the sputter process for making the inorganic tie layer must be carried out with precise power and gas flow settings to improve adhesion performance. This deposition process has historically been susceptible to noise, which results in varied and low adhesion of the polymer layer.
  • the adhesion between the sub oxide and polymer layer or between adjacent polymer layers has demonstrated weakness when exposed to accelerated aging conditions of 85° C. and 85% relative humidity.
  • defects in the oxide layer may occur during processing. Defects in the oxide layer may lower adhesion between polymer and oxide layers, resulting in an increased susceptibility of water ingress, degradation, and/or delamination of the barrier film from the devices it is intended to protect. A more robust solution for making a barrier film is desirable.
  • the inventors of the present application sought to develop a barrier film with improved weatherability and resistance to inter-layer delamination.
  • the inventors recognized the need to increase adhesion between the layers of the barrier film.
  • the inventors recognized the need to temporarily protect the oxide layer during processing in order to reduce defect formation.
  • FIG. 1 is a schematic cross-section of a barrier film 10 .
  • Film 10 includes layers arranged in the following order: a substrate 12 ; a base polymer layer 14 ; an inorganic layer (e.g., oxide layer) 16 ; a separate adhesion-modifying layer 18 ; a top coat polymer layer 20 ; and an optional inorganic layer 21 .
  • inorganic layer e.g., oxide layer
  • film 10 can include additional alternating layers of polymer and oxide between substrate 10 and top coat polymer layer 20 or inorganic layer 21 .
  • adhesion-modifying layer 18 being positioned between inorganic layer 16 and top coat polymer layer 20 in FIG.
  • the adhesion-modifying layer can be present at any polymer-polymer or polymer-oxide interface.
  • the adhesion-modifying layer may be disposed between the substrate and the base polymer layer, between the base polymer layer and the oxide layer, between the oxide layer and the top coat polymer layer, and/or above the top coat polymer layer.
  • the adhesion-modifying layer 18 is an adhesion-promoting layer, which improves the moisture resistance of film 10 and the peel strength adhesion of the barrier film 10 .
  • the adhesion-modifying layer is a release layer, which may provide for temporary protection of the oxide layer. Exemplary materials for the layers of barrier film 10 are identified below and in the Examples.
  • FIG. 2 is a diagram of a system 22 , illustrating an exemplary process for making barrier film 10 .
  • System 22 is under vacuum and includes a chilled drum 24 for receiving and moving substrate 12 , as represented by a film 26 , providing a moving web.
  • An evaporator 28 applies a base polymer, which is cured by curing unit 30 to form base polymer layer 14 as drum 24 advances the film in a direction shown by arrow 25 .
  • An oxide sputter unit 32 applies an oxide to form inorganic layer 16 as drum 24 advances film 26 .
  • drum 24 can rotate in a reverse direction opposite arrow 25 and then advance film 26 again to apply the additional alternating base polymer and oxide layers, and that sub-process can be repeated for as many alternating layers as desired or needed.
  • drum 24 further advances the film, and an evaporator 34 deposits an adhesion-modifying layer.
  • Drum 24 further advances the film, and an evaporator 36 deposits the top coat polymer layer 20 .
  • Adhesion-modifying layer 18 and top coat polymer layer 20 can be cured separately. Alternatively, adhesion-modifying layer 18 and top coat polymer layer 20 can be cured together by curing unit 38 .
  • Top coat polymer layer 20 can include, for example, a radiation cured monomer (e.g., a (meth)acrylate). The Examples describe in more detail exemplary processes using system 22 to make barrier film 10 .
  • adhesion-modifying layers may be present at any interface, as described above.
  • one or more layers may comprise an adhesion-promoting layer.
  • one or more layers may comprise a release layer.
  • a first layer may comprise an adhesion-promoting layer, while a second layer may comprise a release layer.
  • system 22 may comprise additional evaporators and/or curing units or the location of the existing evaporators/curing units may be altered.
  • drum 24 can rotate in a reverse direction opposite arrow 25 and then advance film 26 again to apply the additional alternating oxide, adhesion-modifying layer, and top polymer layers.
  • This sub-process can be repeated for as many alternating layers as desired or needed.
  • Adhesion-promoting materials often have at least one moiety that is reactive with or capable of non-reactive interaction with at least one adjacent layer.
  • the moieties are reactive and/or capable of non-reactive interaction with both adjacent layers.
  • Exemplary materials for use in the adhesion-promoting layer include, for example, silanes (e.g., silane coupling agents, alkoxy silanes, halo silanes, acetoxy silanes, cyclic aza-silanes, and amino functional silanes), hydroxamic acids, phosphoric acid esters, phosphonic acid esters, phosphonic acids, zirconates, titanates, and the like, all of which may have additional reactive groups such as, for example, (meth) acrylate and epoxy.
  • silanes e.g., silane coupling agents, alkoxy silanes, halo silanes, acetoxy silanes, cyclic aza-silanes, and amino functional silanes
  • hydroxamic acids
  • adhesion-promoting materials include those described in the following copending applications filed the same date as the present application: “Barrier Film, Method of Making the Barrier Film, and Articles Including the Barrier Film” (Attorney Docket No. 70169US002), “Composite Layers Including Urea Acrylate Silanes” (Attorney Docket No. 69821US002), “Composite Layers Including Diurethane Silanes” (Attorney Docket No. 69822US002), and “Composite Layers Including Urea Urethane Acrylate Silanes” (Attorney Docket No. 69823US002), all of which are incorporated herein by reference.
  • the adhesion-promoting layer is a silane coupling agent.
  • a characteristic of this type of material is its ability to react with metal-hydroxyl (metal-OH) groups on a freshly sputter deposited metal oxide layer, such as, for example, a freshly sputtered SiO 2 layer with surface hydroxyl-silanol (Si—OH) groups.
  • metal-OH metal-hydroxyl
  • Si—OH surface hydroxyl-silanol
  • adhesion between the release layer and at least one adjacent layer is low enough to enable the removal of said adjacent layer under appropriate conditions, but not so low that the layers prematurely separate by forces normally encountered in normal handling and processing operations.
  • exemplary materials used in the release layer include silicones, fluorinated materials (e.g., monomers, oligomers, or polymers containing fluoroalkyl or fluoroalkylene or perfluoropolyether moieties), soluble materials, alkyl chains (e.g., straight, branched, and/or cyclic hydrocarbon moieties containing 12-36 carbon atoms), and the like.
  • the films and processes described herein improve the overall adhesion and adhesion retention of vapor deposited multilayer barrier coatings after exposure to moisture by the addition of a separate adhesion-modifying layer.
  • the adhesion-modifying layer is applied in a vapor coating process where the adhesion-modifying layer adsorbs or condenses onto a moving web substrate that has just been sputter coated with an oxide of silicon and aluminum.
  • the adsorbed or condensed layer may then be exposed to subsequent processing steps, for example to curing (e.g., electron beam radiation), additional inorganic layer sputtering, and/or or additional polymer layer deposition.
  • the peel strength adhesion is greatly improved, especially after exposure to high heat and humidity conditions. Additionally, the addition of the adhesion-modifying layer removes the need for a tie layer, which greatly simplifies the coating process and barrier coating stack construction. The resulting barrier coatings retain high barrier properties and optical transmission performance
  • Exemplary polymers for use in the substrate, base polymer layer and/or top coat polymer layer include those listed in U.S. Patent Application Publication No. 2012/0003448 (Weigel et al), incorporated herein by reference in its entirety.
  • the barrier films of the present application may further comprise a top sheet.
  • the top sheet is adhered to the barrier film by means of a pressure sensitive adhesive.
  • Useful materials that can form the top sheet include polyesters, polycarbonates, polyethers, polyimides, polyolefins, fluoropolymers, and combinations thereof. Exemplary materials for use in the top sheet include those listed in U.S. Patent Application Publication No. 2012/0003448 (Weigel et al), incorporated herein by reference in its entirety.
  • the barrier films of the present application are used for encapsulating solar devices.
  • UV light e.g., in a range from 280 to 400 nm
  • the top sheets described herein can provide, for example, a durable, weatherable topcoat for a photovoltaic device.
  • the substrates are generally abrasion and impact resistant and can prevent degradation of, for example, photovoltaic devices when they are exposed to outdoor elements.
  • flexible electronic devices can be encapsulated directly with the methods described herein.
  • the devices can be attached to a flexible carrier substrate, and a mask can be deposited to protect electrical connections from the inorganic layer(s), (co)polymer layer(s), or other layer(s)s during their deposition.
  • the inorganic layer(s), (co)polymeric layer(s), and other layer(s) making up the multilayer barrier assembly can be deposited as described elsewhere in this disclosure, and the mask can then be removed, exposing the electrical connections.
  • the moisture sensitive device is a moisture sensitive electronic device.
  • the moisture sensitive electronic device can be, for example, an organic, inorganic, or hybrid organic/inorganic semiconductor device including, for example, a photovoltaic device such as a copper indium gallium (di)selenide (CIGS) solar cell; a display device such as an organic light emitting display (OLED), electrochromic display, electrophoretic display, or a liquid crystal display (LCD) such as a quantum dot LCD display; an OLED or other electroluminescent solid state lighting device, or combinations thereof and the like.
  • a photovoltaic device such as a copper indium gallium (di)selenide (CIGS) solar cell
  • a display device such as an organic light emitting display (OLED), electrochromic display, electrophoretic display, or a liquid crystal display (LCD) such as a quantum dot LCD display
  • OLED organic light emitting display
  • LCD liquid crystal display
  • the barrier assembly in an article or film can be fabricated by deposition of the various layers onto the substrate, in a roll-to-roll vacuum chamber similar to the system described in U.S. Pat. No. 5,440,446 (Shaw et al.) and U.S. Pat. No. 7,018,713 (Padiyath, et al.).
  • Comparative Laminate Construction A and Laminate Constructions 1-2 were prepared by using a 0.05 mm thick pressure sensitive adhesive (PSA) (obtained under the trade designation “3M OPTICALLY CLEAR ADHESIVE 8172P” from 3M Company, St. Paul, Minn.) to laminate 22.9 cm by 15.2 cm barrier films to an ethylene tetrafluoroethylene polymer sheet (ETFE) (0.05 mm thick, available under the trade designation “NORTON ETFE”, from St. Gobain Performance Plastics, Wayne, N.J.), with the top coat polymer layer of the barrier film adjacent the ETFE sheet.
  • PSA pressure sensitive adhesive
  • ETF ethylene tetrafluoroethylene polymer sheet
  • NORTON ETFE ethylene tetrafluoroethylene polymer sheet
  • Comparative Laminate Construction A and Laminate Constructions 1-2 were prepared using barrier films of, respectively, Comparative Example A, and Examples 1-2.
  • PET polyethylene terephtalate
  • PTFE polytetrafluoroethylene
  • a 13 mm (0.5 in) wide desiccated edge tape (obtained under the trade designation “SOLARGAIN EDGE TAPE SET LP01” from Truseal Technologies Inc., Solon, Ohio) was placed around the perimeter of the PTFE-coated aluminum foil to secure the laminated barrier sheet to the PTFE layer.
  • a 0.38 cm (0.015 in) thick encapsulant film (obtained under the trade designation “JURASOL” from JuraFilms, Downer Grove, Ill.) was placed on the aluminum side of the PTFE-coated aluminum foil.
  • the PET layer of a second laminated barrier sheet identical in composition to the first laminated barrier sheet, was disposed over the encapsulant film, to form a laminate construction. The construction was vacuum laminated at 150° C. for 12 min.
  • Spectral transmission was measured using a spectrometer (model “LAMBDA 900”, commercially available from PerkinElmer, Waltham, Mass.). Spectral transmission is reported as average percent transmission (Tvis) between 400 nm and 700 nm at a 0° angle of incidence.
  • Water vapor transmission rate (WVTR) of the barrier films of Comparative Example A and Examples 1-2 was measured in accordance with the procedure outlined in ASTM F-1249-06, “Standard Test Method for Water Vapor Transmission Rate Through Plastic Film and Sheeting Using a Modulated Infrared Sensor”, using a MOCON PERMATRAN-W® Model 700 WVTR testing system (obtained from MOCON, Inc, Minneapolis, Minn.). Temperature of about 50° C. and relative humidity (RH) of about 100% were used and WVTR is expressed in grams per square meter per day (g/m2/day). The lowest detection limit of the testing system was 0.005 g/m2/day. In some instances, the measured WVTR was below the lowest detection limit and is reported as ⁇ 0.005 g/m2/day.
  • Barrier films were prepared by covering a polyetheylene teraphthalate (PET) substrate film (obtained from E. I. DuPont de Nemours, Wilmington, Del., under the trade name “XST 6642”) with a stack of an base polymer layer, an inorganic silicon aluminum oxide (SiAlOx) barrier layer, and an top coat polymer layer on a vacuum coater similar to the coater described in U.S. Pat. No. 5,440,446 (Shaw et al.) and U.S. Pat. No. 7,018,713 (Padiyath, et al), both of which are incorporated herein by reference.
  • the individual layers were formed as follows:
  • Layer 1 (base polymer layer): a 350 meter long roll of 0.127 mm thick ⁇ 366 mm wide PET film was loaded into a roll-to-roll vacuum processing chamber. The chamber was pumped down to a pressure of 1 ⁇ 10 ⁇ 5 Torn A web speed of 4.8 meter/min was held while maintaining the backside of the PET film in contact with a coating drum chilled to ⁇ 10° C. With the backside in contact with the drum, the film frontside surface was treated with a nitrogen plasma at 0.02 kW of plasma power. The film frontside surface was then coated with tricyclodecane dimethanol diacrylate monomer (obtained under the trade designation “SR-833S”, from Sartomer USA, Exton, Pa.).
  • SR-833S tricyclodecane dimethanol diacrylate monomer
  • the monomer was degassed under vacuum to a pressure of 20 mTorr prior to coating, loaded into a syringe pump, and pumped at a flow rate of 1.33 mL/min through an ultrasonic atomizer operating at a frequency of 60 kHz into a heated vaporization chamber maintained at 260° C.
  • the resulting monomer vapor stream condensed onto the film surface and was electron beam crosslinked using a multi-filament electron-beam cure gun operating at 7.0 kV and 4 mA to form a 720 nm thick base polymer layer.
  • Layer 2 (inorganic layer): immediately after the base polymer layer deposition and with the backside of the PET film still in contact with the drum, a SiAlOx layer was sputter-deposited atop a 23 m length of the base polymer layer.
  • Two alternating current (AC) power supplies were used to control two pairs of cathodes; with each cathode housing two 90% Si/10% Al sputtering targets (obtained from Materion Corporation, Mayfield Heights, Ohio).
  • the voltage signal from each power supply was used as an input for a proportional-integral-differential control loop to maintain a predetermined oxygen flow to each cathode.
  • the AC power supplies sputtered the 90% Si/10% Al targets using 5000 watts of power, with a gas mixture containing 450 standard cubic centimeter per minute (sccm) argon and 63 sccm oxygen at a sputter pressure of 3.5 millitorr. This provided a 30 nm thick SiAlOx layer deposited atop the base polymer layer of Layer 1 .
  • sccm standard cubic centimeter per minute
  • Layer 3 top coat polymer layer: immediately after the SiAlOx layer deposition and with the backside of the PET film still in contact with the drum, the acrylate monomer (same monomer of Layer 1 ) was condensed onto Layer 2 and crosslinked as described in Layer 1 , except that a multi-filament electron-beam cure gun operating at 7 kV and 5 mA was used. This provided a 720 nm thick top coat polymer layer atop Layer 2 .
  • a barrier film was prepared as described in Comparative Example A, with the exception that an adhesion-promoting material was deposited over (i.e., vaporized and condensed) Layer 2 and immediately prior to deposition and condensation of the top coat polymer layer (Layer 3 ). The barrier film was subsequently e-beam crosslinked as described in Comparative Example A.
  • a cyclic azasilane obtained under the trade designation “1932.4”, from Gelest, Morrisville, Pa. was used as adhesion-promoting material.
  • T-peel adhesion, spectral transmission (Tvis) and water vapor transmission rate (WVTR) of the barrier film of Example 1 were measured using the test methods described above.
  • the barrier film was then aged, following the procedure outlined above, for 250 and 500 hours. T-peel adhesion was measured for the aged sample. Results are reported in Table 1, below.
  • a barrier film was prepared as described in Example 1, with the exception that the adhesion-promoting material was (3-acryloxypropyl) trimethoxysilane (obtained under the trade designation “SIA0A200.0” from Gelest).
  • T-peel adhesion, spectral transmission (Tvis) and water vapor transmission rate (WVTR) of the barrier film of Example 2 were measured using the test methods described above.
  • the barrier film was then aged, following the procedure outlined above, for 250 and 500 hours. T-peel adhesion was measured for the aged sample. Results are reported in Table 1, below.
  • the words “on” and “adjacent” cover both a layer being directly on and indirectly on something, with other layers possibly being located therebetween.
  • major surface and “major surfaces” refer to the surface(s) with the largest surface area on a three-dimensional shape having three sets of opposing surfaces.

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10199603B2 (en) 2013-07-24 2019-02-05 3M Innovative Properties Company Adhesive barrier film construction
US10658096B2 (en) 2016-03-04 2020-05-19 3M Innovative Properties Company Magnetic multilayer sheet

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102446693B1 (ko) * 2014-04-04 2022-09-26 도판 인사츠 가부시키가이샤 파장 변환 시트, 백라이트 유닛 및 형광체용 보호 필름
WO2016190058A1 (ja) * 2015-05-25 2016-12-01 コニカミノルタ株式会社 ガスバリアーフィルム、波長変換部材及びバックライトユニット
CN107995892B (zh) * 2015-06-25 2021-08-27 博世汽车多媒体葡萄牙公司 使用液体粘合剂结合两层的方法及其被结合的组件
EP3313661B1 (en) * 2015-06-29 2022-07-27 3M Innovative Properties Company Ultrathin barrier laminates and devices
JP6438370B2 (ja) * 2015-08-03 2018-12-12 Jx金属株式会社 プリント配線板の製造方法、表面処理銅箔、積層体、プリント配線板、半導体パッケージ及び電子機器
WO2017031294A1 (en) 2015-08-19 2017-02-23 3M Innovative Properties Company Composite article including a multilayer barrier assembly and methods of making the same
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CN107921753B (zh) 2015-08-19 2020-09-11 3M创新有限公司 包括多层阻挡组件的复合制品及其制备方法
KR20180063180A (ko) * 2015-09-30 2018-06-11 쓰리엠 이노베이티브 프로퍼티즈 캄파니 다층 배리어 코팅
CN105572970A (zh) * 2016-01-16 2016-05-11 汕头万顺包装材料股份有限公司 增亮阻隔膜及具有该增亮阻隔膜的量子点膜、背光模组
WO2017165522A1 (en) 2016-03-25 2017-09-28 3M Innovative Properties Company Multilayer barrier films
KR102075074B1 (ko) * 2017-02-10 2020-02-07 (주)엘지하우시스 자가 세정 유리용 적층체, 자가 세정 유리 및 자가 세정 유리를 제조하는 방법
US11117358B2 (en) * 2017-03-30 2021-09-14 3M Innovative Properties Company Transfer articles
KR101989870B1 (ko) * 2017-08-02 2019-06-17 도레이첨단소재 주식회사 디스플레이용 플라스틱 필름
WO2021260601A1 (en) 2020-06-25 2021-12-30 3M Innovative Properties Company Curable high refractive index ink compositions and articles prepared from the ink compositions
WO2021260596A1 (en) 2020-06-25 2021-12-30 3M Innovative Properties Company Low dielectric constant curable ink compositions
KR20240004863A (ko) * 2021-05-06 2024-01-11 바스프 코팅스 게엠베하 다층 배리어 필름, 그의 제조 및 광기전 적용 분야에서의 용도
WO2023121646A1 (en) * 2021-12-20 2023-06-29 Applied Materials, Inc. Improved adhesion layer in flexible coverlens

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5763033A (en) * 1996-01-30 1998-06-09 Becton, Dickinson And Company Blood collection tube assembly
US7018713B2 (en) * 2003-04-02 2006-03-28 3M Innovative Properties Company Flexible high-temperature ultrabarrier
US20090029125A1 (en) * 2005-02-15 2009-01-29 Fujifilm Corporation Photosensitive material for forming conductive film, conductive film, light transmitting electromagnetic wave shielding film and method for manufacturing the same
WO2010067857A1 (ja) * 2008-12-12 2010-06-17 リンテック株式会社 積層体、その製造方法、電子デバイス部材および電子デバイス
WO2011062932A1 (en) * 2009-11-18 2011-05-26 3M Innovative Properties Company Flexible assembly and method of making and using the same
JP2011230320A (ja) * 2010-04-26 2011-11-17 Dainippon Printing Co Ltd モールディング成形用離型フィルム及びその製造方法
US9254506B2 (en) * 2010-07-02 2016-02-09 3M Innovative Properties Company Moisture resistant coating for barrier films

Family Cites Families (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5131590B2 (ja) 1972-02-03 1976-09-07
US5032461A (en) 1983-12-19 1991-07-16 Spectrum Control, Inc. Method of making a multi-layered article
US5018048A (en) 1983-12-19 1991-05-21 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making
US5125138A (en) 1983-12-19 1992-06-30 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making same
US5097800A (en) 1983-12-19 1992-03-24 Spectrum Control, Inc. High speed apparatus for forming capacitors
US4842893A (en) 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
US4722515A (en) 1984-11-06 1988-02-02 Spectrum Control, Inc. Atomizing device for vaporization
EP0242460A1 (en) 1985-01-18 1987-10-28 SPECTRUM CONTROL, INC. (a Pennsylvania corporation) Monomer atomizer for vaporization
US4954371A (en) 1986-06-23 1990-09-04 Spectrum Control, Inc. Flash evaporation of monomer fluids
JP2825736B2 (ja) 1993-07-30 1998-11-18 京セラ株式会社 誘電体磁器組成物および半導体素子収容用パッケージ
US5440446A (en) 1993-10-04 1995-08-08 Catalina Coatings, Inc. Acrylate coating material
WO1995010117A1 (en) * 1993-10-04 1995-04-13 Catalina Coatings, Inc. Cross-linked acrylate coating material useful for forming capacitor dielectrics and oxygen barriers
US6083628A (en) 1994-11-04 2000-07-04 Sigma Laboratories Of Arizona, Inc. Hybrid polymer film
DE69601316T2 (de) 1995-02-28 1999-08-26 Dow Corning Verfahren zur Herstellung organomodifizierter strahlungshärtbarer Silikonharze
EP0760283A4 (en) 1995-03-14 1998-12-16 Daicel Chem COMPOSITE BARRIER FILM AND PROCESS FOR PRODUCING THE SAME
US5877895A (en) 1995-03-20 1999-03-02 Catalina Coatings, Inc. Multicolor interference coating
JP3767002B2 (ja) * 1996-03-08 2006-04-19 東洋紡績株式会社 ガスバリアフィルムおよびその製造方法
US6045864A (en) 1997-12-01 2000-04-04 3M Innovative Properties Company Vapor coating method
US6268695B1 (en) * 1998-12-16 2001-07-31 Battelle Memorial Institute Environmental barrier material for organic light emitting device and method of making
US6878440B1 (en) 1999-07-02 2005-04-12 3M Innovative Properties Company Pressure sensitive adhesive sheet and production method thereof
US6413645B1 (en) 2000-04-20 2002-07-02 Battelle Memorial Institute Ultrabarrier substrates
CZ20022991A3 (cs) 2000-03-09 2003-02-12 Isovolta-Österreichische Isollierstoffwerke Ag Způsob výroby tenkovrstvového fotovoltaického modulu
US6867539B1 (en) * 2000-07-12 2005-03-15 3M Innovative Properties Company Encapsulated organic electronic devices and method for making same
JP2002052639A (ja) * 2000-08-09 2002-02-19 Toyobo Co Ltd 積層体及び包装体
JP4631181B2 (ja) * 2001-02-16 2011-02-16 東洋紡績株式会社 無機蒸着フイルム積層体および包装体
US20040229051A1 (en) * 2003-05-15 2004-11-18 General Electric Company Multilayer coating package on flexible substrates for electro-optical devices
DE10362060B4 (de) 2003-10-21 2009-07-09 Altana Coatings & Sealants Gmbh Verpackungsmaterial mit einer Barriereschicht für Gase
JP4501558B2 (ja) * 2004-07-06 2010-07-14 凸版印刷株式会社 高ガスバリア性を有する透明積層体
JP4716773B2 (ja) * 2005-04-06 2011-07-06 富士フイルム株式会社 ガスバリアフィルムとそれを用いた有機デバイス
JP2006327098A (ja) * 2005-05-27 2006-12-07 Nitto Denko Corp 透明フィルムおよびその製造方法
JP2008546557A (ja) 2005-06-13 2008-12-25 スリーエム イノベイティブ プロパティズ カンパニー 積層体を含有するフルオロポリマー
US20100219079A1 (en) 2006-05-07 2010-09-02 Synkera Technologies, Inc. Methods for making membranes based on anodic aluminum oxide structures
JP2008080704A (ja) * 2006-09-28 2008-04-10 Toppan Printing Co Ltd ガスバリア性積層体
KR20090094829A (ko) 2006-12-29 2009-09-08 쓰리엠 이노베이티브 프로퍼티즈 컴파니 무기 또는 무기/유기 하이브리드 필름의 제조 방법
US7833574B2 (en) 2007-01-29 2010-11-16 Guardian Industries Corp. Method of making heat treated coated article using diamond-like carbon (DLC) coating and protective film
UA97140C2 (ru) 2007-04-04 2012-01-10 Тетра Лаваль Холдингс Энд Файненс С.А. Защитная пленка, многослойный упаковочный ламинат для упаковки напитка или другого пищевого продукта, способ изготовления защитной пленки и упаковочный контейнер для упаковки напитка или другого пищевого продукта
JP2008265096A (ja) 2007-04-18 2008-11-06 Toppan Printing Co Ltd ガスバリア性透明フィルム、およびそれを用いたガスバリア性透明包装体
US9481927B2 (en) 2008-06-30 2016-11-01 3M Innovative Properties Company Method of making inorganic or inorganic/organic hybrid barrier films
JP5131590B2 (ja) 2008-07-31 2013-01-30 株式会社ピーエス三菱 張り出し架設工法における柱頭部pc桁仮固定構造
JP2012509203A (ja) 2008-11-17 2012-04-19 スリーエム イノベイティブ プロパティズ カンパニー 傾斜組成物バリア
JP5216724B2 (ja) * 2009-09-01 2013-06-19 富士フイルム株式会社 ガスバリアフィルムおよびデバイス
JP5990164B2 (ja) * 2010-07-02 2016-09-07 スリーエム イノベイティブ プロパティズ カンパニー 封入材及び光起電セルを有するバリア組立品
JP5974465B2 (ja) * 2010-12-01 2016-08-23 東洋紡株式会社 積層フィルム
US20130323519A1 (en) 2011-01-31 2013-12-05 3M Innovative Properties Company Coatings for barrier films and methods of making and using the same
WO2012106184A2 (en) 2011-01-31 2012-08-09 3M Innovative Properties Company Vapor-deposited coating for barrier films and methods of making and using the same
US20150027533A1 (en) 2011-08-04 2015-01-29 3M Innovative Properties Company Edge protected barrier assemblies
TWI610806B (zh) 2012-08-08 2018-01-11 3M新設資產公司 障壁膜,製造該障壁膜之方法,及包含該障壁膜之物件
KR20150041058A (ko) 2012-08-08 2015-04-15 쓰리엠 이노베이티브 프로퍼티즈 캄파니 다이우레탄 (메트)아크릴레이트-실란 조성물 및 이를 포함하는 물품
KR20150043412A (ko) 2012-08-16 2015-04-22 쓰리엠 이노베이티브 프로퍼티즈 컴파니 배리어 조립체의 제조방법
KR20150043410A (ko) 2012-08-16 2015-04-22 쓰리엠 이노베이티브 프로퍼티즈 캄파니 배리어 조립체를 제조하는 방법

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5763033A (en) * 1996-01-30 1998-06-09 Becton, Dickinson And Company Blood collection tube assembly
US7018713B2 (en) * 2003-04-02 2006-03-28 3M Innovative Properties Company Flexible high-temperature ultrabarrier
US20090029125A1 (en) * 2005-02-15 2009-01-29 Fujifilm Corporation Photosensitive material for forming conductive film, conductive film, light transmitting electromagnetic wave shielding film and method for manufacturing the same
WO2010067857A1 (ja) * 2008-12-12 2010-06-17 リンテック株式会社 積層体、その製造方法、電子デバイス部材および電子デバイス
US20110274933A1 (en) * 2008-12-12 2011-11-10 Lintec Corporation Laminate, method for producing same, electronic device member, and electronic device
WO2011062932A1 (en) * 2009-11-18 2011-05-26 3M Innovative Properties Company Flexible assembly and method of making and using the same
JP2011230320A (ja) * 2010-04-26 2011-11-17 Dainippon Printing Co Ltd モールディング成形用離型フィルム及びその製造方法
US9254506B2 (en) * 2010-07-02 2016-02-09 3M Innovative Properties Company Moisture resistant coating for barrier films

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10199603B2 (en) 2013-07-24 2019-02-05 3M Innovative Properties Company Adhesive barrier film construction
US10658096B2 (en) 2016-03-04 2020-05-19 3M Innovative Properties Company Magnetic multilayer sheet

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US10947618B2 (en) 2021-03-16
US20190180968A1 (en) 2019-06-13
CN104684727A (zh) 2015-06-03
CN104684727B (zh) 2017-05-17
TWI598224B (zh) 2017-09-11
KR20150041062A (ko) 2015-04-15
KR102126719B1 (ko) 2020-06-25
EP2882587A4 (en) 2016-04-13
TW201410455A (zh) 2014-03-16
SG11201500934RA (en) 2015-03-30
EP2882587A1 (en) 2015-06-17
BR112015002840A2 (pt) 2017-08-08
JP2015530289A (ja) 2015-10-15
JP6316813B2 (ja) 2018-04-25

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