UA64008C2 - A furnace for the manufacture of ingots of synthetic transparent quartz glass and a method for preparing the shaped article from the synthetic transparent quartz glass - Google Patents
A furnace for the manufacture of ingots of synthetic transparent quartz glass and a method for preparing the shaped article from the synthetic transparent quartz glass Download PDFInfo
- Publication number
- UA64008C2 UA64008C2 UA2001021047A UA2001021047A UA64008C2 UA 64008 C2 UA64008 C2 UA 64008C2 UA 2001021047 A UA2001021047 A UA 2001021047A UA 2001021047 A UA2001021047 A UA 2001021047A UA 64008 C2 UA64008 C2 UA 64008C2
- Authority
- UA
- Ukraine
- Prior art keywords
- ingot
- quartz glass
- transparent quartz
- glass
- synthetic transparent
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 91
- 238000000034 method Methods 0.000 title claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 27
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 16
- 239000000155 melt Substances 0.000 claims abstract description 14
- 238000003786 synthesis reaction Methods 0.000 claims abstract description 14
- 238000005245 sintering Methods 0.000 claims abstract 2
- 239000011521 glass Substances 0.000 claims description 41
- 238000001125 extrusion Methods 0.000 claims description 20
- 238000000151 deposition Methods 0.000 claims description 15
- 230000008021 deposition Effects 0.000 claims description 12
- -1 silica compound Chemical class 0.000 claims description 9
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 7
- 239000007789 gas Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 230000004927 fusion Effects 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 238000003892 spreading Methods 0.000 claims description 4
- 238000007740 vapor deposition Methods 0.000 claims description 4
- 238000010924 continuous production Methods 0.000 claims description 3
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 claims description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 3
- 239000003870 refractory metal Substances 0.000 claims description 3
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 claims description 2
- 239000011148 porous material Substances 0.000 claims description 2
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 claims 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052727 yttrium Inorganic materials 0.000 claims 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims 1
- 239000000047 product Substances 0.000 description 13
- 239000007858 starting material Substances 0.000 description 9
- 239000011449 brick Substances 0.000 description 8
- 239000011819 refractory material Substances 0.000 description 8
- 238000002844 melting Methods 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 229910021487 silica fume Inorganic materials 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000011859 microparticle Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000006060 molten glass Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 150000003377 silicon compounds Chemical class 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000004017 vitrification Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- YXTPWUNVHCYOSP-UHFFFAOYSA-N bis($l^{2}-silanylidene)molybdenum Chemical compound [Si]=[Mo]=[Si] YXTPWUNVHCYOSP-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910021343 molybdenum disilicide Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000005373 porous glass Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1484—Means for supporting, rotating or translating the article being formed
- C03B19/1492—Deposition substrates, e.g. targets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/04—Forming tubes or rods by drawing from stationary or rotating tools or from forming nozzles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1407—Deposition reactors therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/50—Multiple burner arrangements
- C03B2207/52—Linear array of like burners
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Glass Melting And Manufacturing (AREA)
- Silicon Compounds (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB9815357.0A GB9815357D0 (en) | 1998-07-15 | 1998-07-15 | Improvements in and relating to the manufacture of synthetic vitreous silica ingot |
| PCT/GB1999/002278 WO2000003955A1 (en) | 1998-07-15 | 1999-07-15 | Process and apparatus for manufacturing a glass ingot from synthetic silica |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| UA64008C2 true UA64008C2 (en) | 2004-02-16 |
Family
ID=10835565
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| UA2001021047A UA64008C2 (en) | 1998-07-15 | 1999-07-15 | A furnace for the manufacture of ingots of synthetic transparent quartz glass and a method for preparing the shaped article from the synthetic transparent quartz glass |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US6763682B1 (zh) |
| EP (1) | EP1097110B1 (zh) |
| JP (1) | JP4639274B2 (zh) |
| KR (1) | KR100637027B1 (zh) |
| CN (1) | CN1227171C (zh) |
| AT (1) | ATE265990T1 (zh) |
| AU (1) | AU4922599A (zh) |
| DE (1) | DE69917035T2 (zh) |
| GB (1) | GB9815357D0 (zh) |
| RU (1) | RU2240988C2 (zh) |
| UA (1) | UA64008C2 (zh) |
| WO (1) | WO2000003955A1 (zh) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001342026A (ja) * | 2000-05-30 | 2001-12-11 | Tosoh Quartz Corp | 石英ガラスの製造方法及び製造装置 |
| JP4509342B2 (ja) * | 2000-09-21 | 2010-07-21 | 東ソー・クォーツ株式会社 | 長尺石英ガラスの製造方法及びその装置 |
| US6997015B2 (en) * | 2001-11-27 | 2006-02-14 | Corning Incorporated | EUV lithography glass structures formed by extrusion consolidation process |
| US7299657B2 (en) * | 2002-07-12 | 2007-11-27 | Corning Incorporated | Method of making high strain point glass |
| US20040118155A1 (en) * | 2002-12-20 | 2004-06-24 | Brown John T | Method of making ultra-dry, Cl-free and F-doped high purity fused silica |
| DE10337388B4 (de) * | 2003-08-13 | 2006-04-20 | Heraeus Quarzglas Gmbh & Co. Kg | Vertikal-Tiegelziehverfahren zur Herstellung eines zylinderförmigen Quarzglaskörpers und Vorrichtung zur Durchführung des Verfahrens |
| GB0605461D0 (en) * | 2006-03-17 | 2006-04-26 | Saint Gobain Quartz Plc | Manufacture of large articles in synthetic vitreous silica |
| US8062986B2 (en) * | 2007-07-27 | 2011-11-22 | Corning Incorporated | Fused silica having low OH, OD levels and method of making |
| GB2478307A (en) | 2010-03-02 | 2011-09-07 | Heraeus Quartz Uk Ltd | Manufacture of silica glass |
| US9120700B2 (en) * | 2010-03-26 | 2015-09-01 | Corning Incorporated | Non-contact etching of moving glass sheets |
| DE102010033408B3 (de) * | 2010-08-05 | 2011-06-16 | Heraeus Quarzglas Gmbh & Co. Kg | Ziehverfahren zur Herstellung zylinderförmiger Bauteile aus Quarzglas |
| GB201106015D0 (en) | 2011-04-08 | 2011-05-25 | Heraeus Quartz Uk Ltd | Production of silica soot bodies |
| CN102701568B (zh) * | 2012-06-11 | 2014-07-09 | 山东理工大学 | 高纯石英连续熔融炉用陶瓷内胆的制备方法及连续熔融炉 |
| GB2514118B (en) | 2013-05-13 | 2015-11-11 | Heraeus Quartz Uk Ltd | Froth floatation separation and analysis |
| EP3209615A4 (en) * | 2014-10-20 | 2018-07-04 | Navus Automation, Inc. | Fused silica furnace system&method for continuous production of fused silica |
| DE102016105519A1 (de) * | 2015-03-24 | 2016-09-29 | Shin-Etsu Chemical Co., Ltd. | Sintervorrichtung und Sinterverfahren |
| CN104926087B (zh) * | 2015-07-16 | 2018-03-27 | 中国建筑材料科学研究总院 | 制备合成石英玻璃砣的沉积炉 |
| CN104926088B (zh) * | 2015-07-16 | 2018-04-10 | 中国建筑材料科学研究总院 | 高均匀合成石英玻璃砣的制备方法 |
| EP3390304B1 (de) | 2015-12-18 | 2023-09-13 | Heraeus Quarzglas GmbH & Co. KG | Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas |
| TWI794150B (zh) | 2015-12-18 | 2023-03-01 | 德商何瑞斯廓格拉斯公司 | 自二氧化矽顆粒製備石英玻璃體 |
| TW201731782A (zh) | 2015-12-18 | 2017-09-16 | 何瑞斯廓格拉斯公司 | 在多腔式爐中製備石英玻璃體 |
| EP3390302B1 (de) | 2015-12-18 | 2023-09-20 | Heraeus Quarzglas GmbH & Co. KG | Herstellung eines quarzglaskörpers in einem schmelztiegel aus refraktärmetall |
| WO2017103131A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur |
| TWI788278B (zh) | 2015-12-18 | 2023-01-01 | 德商何瑞斯廓格拉斯公司 | 由均質石英玻璃製得之玻璃纖維及預成型品 |
| US11952303B2 (en) | 2015-12-18 | 2024-04-09 | Heraeus Quarzglas Gmbh & Co. Kg | Increase in silicon content in the preparation of quartz glass |
| KR20180095624A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 불투명 실리카 유리 제품의 제조 |
| KR20180095616A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 용융 가열로에서 이슬점 조절을 이용한 실리카 유리체의 제조 |
| KR20180095880A (ko) | 2015-12-18 | 2018-08-28 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 합성 석영 유리 결정립의 제조 |
| US20200123039A1 (en) | 2017-06-14 | 2020-04-23 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a quartz glass body |
| EP3656744A1 (en) * | 2018-11-23 | 2020-05-27 | Heraeus Conamic UK Limited | On-line annealing of large fused quartz ingots |
| EP3656746B1 (en) | 2018-11-23 | 2024-06-05 | Heraeus Conamic UK Limited | Method and apparatus for cutting a hollow quartz glass ingot |
| CN114349310B (zh) * | 2021-12-29 | 2023-06-23 | 中建材衢州金格兰石英有限公司 | 一种大直径石英砣熔制炉 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1363233A (fr) | 1963-04-16 | 1964-06-12 | Corning Glass Works | Procédé de fabrication de masses pleines, notamment de verres et céramiques, et appareil de mise en oeuvre |
| JPS63288906A (ja) | 1987-05-20 | 1988-11-25 | Nkk Corp | ケイ酸の製造方法 |
| JPS63319220A (ja) | 1987-06-23 | 1988-12-27 | Nkk Corp | ケイ酸の製造方法 |
| JPS643028A (en) | 1987-06-26 | 1989-01-06 | Nkk Corp | Production of silicic acid |
| JPS649823A (en) | 1987-06-30 | 1989-01-13 | Nippon Kokan Kk | Production of silicic acid |
| DE3815974C1 (zh) * | 1988-05-10 | 1989-08-24 | Heraeus Quarzschmelze | |
| DE4212099C2 (de) * | 1992-04-10 | 1994-07-21 | Heraeus Quarzglas | Verfahren und Vorrichtung zur Herstellung eines Verbundkörpers aus Glas |
| DE69635662T2 (de) | 1995-09-12 | 2006-08-10 | Corning Inc. | Verfahren und Ofen zur Herstellung von Quarzglas mit reduziertem Gehalt an Schlieren |
| JP3850880B2 (ja) | 1995-09-12 | 2006-11-29 | コーニング インコーポレイテッド | 溶融シリカガラス製造用閉じ込め容器 |
| JPH10167741A (ja) * | 1996-12-16 | 1998-06-23 | Nikon Corp | 合成石英ガラスの製造方法、合成石英ガラスの製造装置および合成石英ガラス |
-
1998
- 1998-07-15 GB GBGB9815357.0A patent/GB9815357D0/en not_active Ceased
-
1999
- 1999-07-15 UA UA2001021047A patent/UA64008C2/uk unknown
- 1999-07-15 KR KR1020017000581A patent/KR100637027B1/ko not_active IP Right Cessation
- 1999-07-15 RU RU2001104345/03A patent/RU2240988C2/ru not_active IP Right Cessation
- 1999-07-15 AU AU49225/99A patent/AU4922599A/en not_active Abandoned
- 1999-07-15 CN CNB998098531A patent/CN1227171C/zh not_active Expired - Fee Related
- 1999-07-15 EP EP99933050A patent/EP1097110B1/en not_active Expired - Lifetime
- 1999-07-15 US US09/743,623 patent/US6763682B1/en not_active Expired - Lifetime
- 1999-07-15 WO PCT/GB1999/002278 patent/WO2000003955A1/en active IP Right Grant
- 1999-07-15 DE DE69917035T patent/DE69917035T2/de not_active Expired - Fee Related
- 1999-07-15 AT AT99933050T patent/ATE265990T1/de not_active IP Right Cessation
- 1999-07-15 JP JP2000560067A patent/JP4639274B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP4639274B2 (ja) | 2011-02-23 |
| EP1097110B1 (en) | 2004-05-06 |
| DE69917035D1 (de) | 2004-06-09 |
| CN1313839A (zh) | 2001-09-19 |
| GB9815357D0 (en) | 1998-09-16 |
| AU4922599A (en) | 2000-02-07 |
| WO2000003955A1 (en) | 2000-01-27 |
| EP1097110A1 (en) | 2001-05-09 |
| KR100637027B1 (ko) | 2006-10-20 |
| RU2240988C2 (ru) | 2004-11-27 |
| JP2002520249A (ja) | 2002-07-09 |
| CN1227171C (zh) | 2005-11-16 |
| US6763682B1 (en) | 2004-07-20 |
| ATE265990T1 (de) | 2004-05-15 |
| DE69917035T2 (de) | 2005-04-28 |
| KR20010074714A (ko) | 2001-08-09 |
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