TWI731162B - 研磨裝置及研磨方法 - Google Patents
研磨裝置及研磨方法 Download PDFInfo
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- TWI731162B TWI731162B TW106131446A TW106131446A TWI731162B TW I731162 B TWI731162 B TW I731162B TW 106131446 A TW106131446 A TW 106131446A TW 106131446 A TW106131446 A TW 106131446A TW I731162 B TWI731162 B TW I731162B
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Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
- B24B37/105—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/013—Devices or means for detecting lapping completion
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
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- B24B37/005—Control means for lapping machines or devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
- B24B37/32—Retaining rings
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
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- B24B37/34—Accessories
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
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- B24B37/34—Accessories
- B24B37/345—Feeding, loading or unloading work specially adapted to lapping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
- B24B49/105—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means using eddy currents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Disintegrating Or Milling (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016-193641 | 2016-09-30 | ||
| JP2016193641 | 2016-09-30 | ||
| JP2017074167A JP6357260B2 (ja) | 2016-09-30 | 2017-04-04 | 研磨装置、及び研磨方法 |
| JP2017-074167 | 2017-04-04 | ||
| JP2017-091152 | 2017-05-01 | ||
| JP2017091152A JP6227821B1 (ja) | 2016-09-30 | 2017-05-01 | 研磨装置、及び研磨方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201813770A TW201813770A (zh) | 2018-04-16 |
| TWI731162B true TWI731162B (zh) | 2021-06-21 |
Family
ID=60265848
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106131446A TWI731162B (zh) | 2016-09-30 | 2017-09-13 | 研磨裝置及研磨方法 |
| TW110117574A TWI776509B (zh) | 2016-09-30 | 2017-09-13 | 研磨裝置及研磨方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW110117574A TWI776509B (zh) | 2016-09-30 | 2017-09-13 | 研磨裝置及研磨方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US10688620B2 (enExample) |
| JP (5) | JP6357260B2 (enExample) |
| KR (4) | KR102399251B1 (enExample) |
| CN (3) | CN107877356B (enExample) |
| SG (1) | SG10201707291RA (enExample) |
| TW (2) | TWI731162B (enExample) |
Families Citing this family (51)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017158955A1 (ja) * | 2016-03-14 | 2017-09-21 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及びコンピュータ読み取り可能な記録媒体 |
| JP6357260B2 (ja) * | 2016-09-30 | 2018-07-11 | 株式会社荏原製作所 | 研磨装置、及び研磨方法 |
| JP7098311B2 (ja) * | 2017-12-05 | 2022-07-11 | 株式会社荏原製作所 | 研磨装置、及び研磨方法 |
| JP6970601B2 (ja) * | 2017-12-06 | 2021-11-24 | 株式会社荏原製作所 | 半導体製造装置の設計方法 |
| TWI759595B (zh) * | 2018-05-11 | 2022-04-01 | 日商東京威力科創股份有限公司 | 基板處理系統及基板處理方法 |
| CN110504186B (zh) * | 2018-05-16 | 2022-01-18 | 台湾积体电路制造股份有限公司 | 半导体制造机台的状况监控方法及半导体制造系统 |
| JP2019198938A (ja) * | 2018-05-18 | 2019-11-21 | 株式会社荏原製作所 | 研磨ヘッドを用いて研磨パッドの研磨面を検出する方法、および研磨装置 |
| JP7117171B2 (ja) * | 2018-06-20 | 2022-08-12 | 株式会社荏原製作所 | 研磨装置、研磨方法、及び研磨制御プログラム |
| JP7083279B2 (ja) * | 2018-06-22 | 2022-06-10 | 株式会社荏原製作所 | 渦電流センサの軌道を特定する方法、基板の研磨の進行度を算出する方法、基板研磨装置の動作を停止する方法および基板研磨の進行度を均一化する方法、これらの方法を実行するためのプログラムならびに当該プログラムが記録された非一過性の記録媒体 |
| US11312015B2 (en) * | 2018-09-10 | 2022-04-26 | Reliabotics LLC | System and method for controlling the contact pressure applied by an articulated robotic arm to a working surface |
| JP2020053550A (ja) * | 2018-09-27 | 2020-04-02 | 株式会社荏原製作所 | 研磨装置、研磨方法、及び機械学習装置 |
| US11731232B2 (en) * | 2018-10-30 | 2023-08-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Irregular mechanical motion detection systems and method |
| CN109500712A (zh) * | 2018-12-14 | 2019-03-22 | 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) | 抛光装置及半导体晶圆平坦化设备 |
| KR102708233B1 (ko) * | 2019-02-15 | 2024-09-23 | 주식회사 케이씨텍 | 기판 연마 시스템 |
| JP7155035B2 (ja) | 2019-02-18 | 2022-10-18 | 株式会社荏原製作所 | 研磨装置および研磨方法 |
| JP7570004B2 (ja) | 2019-02-19 | 2024-10-21 | パナソニックIpマネジメント株式会社 | 研磨加工システム、学習装置、学習装置の学習方法 |
| JP7160725B2 (ja) * | 2019-03-06 | 2022-10-25 | 株式会社荏原製作所 | 基板処理装置 |
| BR112021019580A2 (pt) | 2019-03-29 | 2021-12-14 | Saint Gobain Abrasifs Sa | Desempenho de soluções de retificação |
| CN110227990A (zh) * | 2019-05-07 | 2019-09-13 | 重庆市璧山区宗辉机械有限公司 | 一种智能叶片磨削机 |
| TW202044394A (zh) * | 2019-05-22 | 2020-12-01 | 日商荏原製作所股份有限公司 | 基板處理系統 |
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