TWI710034B - 半導體製造裝置及半導體裝置的製造方法 - Google Patents

半導體製造裝置及半導體裝置的製造方法 Download PDF

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Publication number
TWI710034B
TWI710034B TW107115690A TW107115690A TWI710034B TW I710034 B TWI710034 B TW I710034B TW 107115690 A TW107115690 A TW 107115690A TW 107115690 A TW107115690 A TW 107115690A TW I710034 B TWI710034 B TW I710034B
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TW
Taiwan
Prior art keywords
die
chuck
aforementioned
magnet
head
Prior art date
Application number
TW107115690A
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English (en)
Chinese (zh)
Other versions
TW201903913A (zh
Inventor
高野𨺓一
牧浩
五十嵐伸之
田中裕也
Original Assignee
日商捷進科技有限公司
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Application filed by 日商捷進科技有限公司 filed Critical 日商捷進科技有限公司
Publication of TW201903913A publication Critical patent/TW201903913A/zh
Application granted granted Critical
Publication of TWI710034B publication Critical patent/TWI710034B/zh

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/52—Mounting semiconductor bodies in containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67121—Apparatus for making assemblies not otherwise provided for, e.g. package constructions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Die Bonding (AREA)
TW107115690A 2017-05-31 2018-05-09 半導體製造裝置及半導體裝置的製造方法 TWI710034B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-108048 2017-05-31
JP2017108048A JP6868471B2 (ja) 2017-05-31 2017-05-31 半導体製造装置および半導体装置の製造方法

Publications (2)

Publication Number Publication Date
TW201903913A TW201903913A (zh) 2019-01-16
TWI710034B true TWI710034B (zh) 2020-11-11

Family

ID=64542723

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107115690A TWI710034B (zh) 2017-05-31 2018-05-09 半導體製造裝置及半導體裝置的製造方法

Country Status (4)

Country Link
JP (1) JP6868471B2 (ko)
KR (1) KR102050741B1 (ko)
CN (1) CN108987291B (ko)
TW (1) TWI710034B (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI744850B (zh) * 2019-04-15 2021-11-01 日商新川股份有限公司 封裝裝置
KR102284150B1 (ko) * 2019-08-06 2021-07-30 세메스 주식회사 다이 본딩 방법 및 다이 본딩 장치

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8783319B2 (en) * 2011-03-23 2014-07-22 Hitachi High-Tech Instruments Co., Ltd. Foreign substance removing device and die bonder equipped with the same

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JP2000091794A (ja) * 1998-09-09 2000-03-31 Matsushita Electric Ind Co Ltd 電子部品実装装置
US6753534B2 (en) * 2000-12-08 2004-06-22 Nikon Corporation Positioning stage with stationary and movable magnet tracks
JP2007019090A (ja) * 2005-07-05 2007-01-25 Sumitomo Heavy Ind Ltd ステージ装置
KR200425068Y1 (ko) * 2006-04-28 2006-09-01 한양정밀 (주) 칩 이송장치
KR101335275B1 (ko) * 2007-07-20 2013-11-29 삼성전자주식회사 반도체 칩 본딩 장치
CN101409248A (zh) * 2007-10-12 2009-04-15 深圳市大族精密机电有限公司 二维运动平台
JP5075013B2 (ja) * 2008-05-27 2012-11-14 ルネサスエレクトロニクス株式会社 半導体集積回路装置の製造方法
JP5734081B2 (ja) * 2010-10-18 2015-06-10 株式会社日立国際電気 基板処理装置、基板処理装置の温度制御方法、及び基板処理装置の加熱方法
KR20120062309A (ko) * 2010-12-06 2012-06-14 주식회사 태한이엔씨 자력을 이용한 이송 장치
CN201985154U (zh) * 2011-01-28 2011-09-21 浙江机电职业技术学院 极性自动检测的led供料设备
JP5764002B2 (ja) * 2011-07-22 2015-08-12 株式会社神戸製鋼所 真空成膜装置
JP2013184281A (ja) * 2012-03-12 2013-09-19 Nippon Dempa Kogyo Co Ltd 真空吸着ノズル
JP6086680B2 (ja) 2012-09-13 2017-03-01 ファスフォードテクノロジ株式会社 ダイボンダ及びボンディング方法
KR101422356B1 (ko) * 2012-11-23 2014-07-23 세메스 주식회사 다이 픽업 유닛 및 이를 포함하는 다이 본딩 장치
CN104517876B (zh) * 2013-09-30 2018-11-27 韩华泰科株式会社 封装件运送器组件
JP6470088B2 (ja) * 2015-04-02 2019-02-13 ファスフォードテクノロジ株式会社 ボンディング装置及びボンディング方法
JP6584234B2 (ja) * 2015-08-31 2019-10-02 ファスフォードテクノロジ株式会社 ダイボンダ、ボンディング方法および半導体装置の製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8783319B2 (en) * 2011-03-23 2014-07-22 Hitachi High-Tech Instruments Co., Ltd. Foreign substance removing device and die bonder equipped with the same

Also Published As

Publication number Publication date
JP2018206844A (ja) 2018-12-27
CN108987291A (zh) 2018-12-11
KR102050741B1 (ko) 2019-12-02
JP6868471B2 (ja) 2021-05-12
TW201903913A (zh) 2019-01-16
CN108987291B (zh) 2022-05-27
KR20180131426A (ko) 2018-12-10

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