TWI701471B - 光學積層體及影像顯示裝置 - Google Patents
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- TWI701471B TWI701471B TW107142766A TW107142766A TWI701471B TW I701471 B TWI701471 B TW I701471B TW 107142766 A TW107142766 A TW 107142766A TW 107142766 A TW107142766 A TW 107142766A TW I701471 B TWI701471 B TW I701471B
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Images
Classifications
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- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
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- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L33/50—Wavelength conversion elements
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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Abstract
本發明提供一種光學積層體,其用於影像顯示裝置時,可在抑制反射率的同時,展現充分亮度並可展現良好色相,可實現成本之降低。
本發明之光學積層體具備:波長轉換層與配置於波長轉換層之單側的吸收層;吸收層於580nm~610nm之波長帶區域具有吸收峰,且該吸收層包含通式(I)或通式(II)所示化合物X。
Description
本發明係涉及光學積層體。
近年來,具備由量子點等發光材料所構成之發光層的影像顯示裝置,作為色彩再現性優異的影像顯示裝置備受矚目(例如專利文獻1)。舉例而言,使用了量子點之量子點薄膜只要有光入射,量子點便會受激發而發出螢光。譬如當使用藍色LED之背光件時,一部分藍色光透過量子點薄膜會轉換為紅色光及綠色光,而一部分藍色光則直接射出藍色光。結果可實現白色光。並且一般認為使用所述量子點薄膜可以實現NTSC比為100%以上之色彩再現性。
如上述之影像顯示裝置其反射率高。因此,為了降低反射率,一般會於如上所述之影像顯示裝置使用偏光板。
然而,使用偏光板時,會產生亮度降低、色相異常、高成本等問題。因而對如上所述之影像顯示裝置尋求亮度之提升、色相之改善、成本之降低。
先前技術文獻
專利文獻
專利文獻1:日本專利特開2015-111518號公報
發明概要
本發明是為了解決上述以往之課題而成者,其主要目的在於提供一種光學積層體,其在用於影像顯示裝置時,可在抑制反射率的同時,展現充分亮度並可展現良好色相,可實現成本之降低。
本發明之光學積層體具備:波長轉換層與配置於該波長轉換層之單側的吸收層;該吸收層於580nm~610nm之範圍的波長帶區域具有吸收峰,且該吸收層包含下述通式(I)或通式(II)所示化合物X。
式(I)中,R1、R2、R3、R4、R5、R6、R7及R8分別獨立為氫原子、鹵素原子、碳數1以上且20以下之取代或非取代之烷基、式(a)所示取代基或式(b)所示取代基;或是
R1
與R2
形成由5或6個碳原子所構成之飽和環狀骨架且R3
、R4
、R5
、R6
、R7
及R8
分別獨立為氫原子、鹵素原子(宜為Cl)、碳數1以上且20以下之取代或非取代之烷基、式(a)所示取代基或式(b)所示取代基;或是
R2
與R3
形成由5~7個碳原子所構成之飽和環狀骨架且R1
、R4
、R5
、R6
、R7
及R8
分別獨立為氫原子、鹵素原子(宜為Cl)、碳數1以上且20以下之取代或非取代之烷基、式(a)所示取代基或式(b)所示取代基;或是
R5
與R6
形成由5或6個碳原子所構成之飽和環狀骨架且R1
、R2
、R3
、R4
、R7
及R8
分別獨立為氫原子、鹵素原子(宜為Cl)、碳數1以上且20以下之取代或非取代之烷基、式(a)所示取代基或式(b)所示取代基;或是
R6
與R7
形成由5~7個碳原子所構成之飽和環狀骨架且R1
、R2
、R3
、R4
、R5
及R8
分別獨立為氫原子、鹵素原子(宜為Cl)、碳數1以上且20以下之取代或非取代之烷基、式(a)所示取代基或式(b)所示取代基;或是
R1
與R2
形成由5或6個碳原子所構成之飽和環狀骨架、R5
與R6
形成由5或6個碳原子所構成之飽和環狀骨架且R3
、R4
、R7
及R8
分別獨立為氫原子、鹵素原子(宜為Cl)、碳數1以上且20以下之取代或非取代之烷基、式(a)所示取代基或式(b)所示取代基;或者,
R2
與R3
形成由5~7個碳原子所構成之飽和環狀骨架、R6
與R7
形成由5~7個碳原子所構成之飽和環狀骨架且R1
、R4
、R5
及R8
分別獨立為氫原子、鹵素原子(宜為Cl)、碳數1以上且20以下之取代或非取代之烷基、式(a)所示取代基或式(b)所示取代基;
式(II)中,R4
及R8
分別獨立為氫原子或碳數1以上且20以下之取代或非取代之烷基。
在一實施形態中,上述光學積層體於上述吸收層之與波長轉換層相反之側不具有偏光板。
在一實施形態中,上述波長轉換層含有量子點或螢光體作為波長轉換材料。
在一實施形態中,上述波長轉換層為彩色濾光片。
根據本發明之另一面向,提供一種影像顯示裝置。該影像顯示裝置包含上述光學積層體。
在一實施形態中,上述影像顯示裝置具備:包含上述光學積層體之液晶面板與背光件。
在一實施形態中,上述液晶面板由視辨側起依序具備:上述吸收層、上述波長轉換層、視辨側偏光板、液晶單元與背光側偏光板。
根據本發明可提供一種光學積層體,其在用於影像顯示裝置時,可在抑制反射率的同時,展現充分亮度並可展現良好色相,可實現成本之降低。
用以實施發明之形態
以下說明本發明之較佳實施形態,惟本發明不受該等實施形態限定。
≪≪光學積層體≫≫
圖1係本發明之一實施形態的光學積層體的概略截面圖。本實施形態之光學積層體100具備:波長轉換層10;與吸收層20,其配置於波長轉換層10之單側。在一實施形態中,上述光學積層體100係以使吸收層20成為視辨側之方式配置於影像顯示裝置之視辨側。
波長轉換層係將入射光之一部分的波長轉換並發光之層。
吸收層含有後述特定色素(通式(I)或(II)所示色素)。藉由含有所述特定色素而形成吸收層,可提供一種光學積層體,其在用於影像顯示裝置時,可在抑制反射率的同時展現充分亮度,並可展現良好色相,而可實現成本之降低。
在一實施形態中,上述光學積層體於吸收層之與波長轉換層相反之側不具有偏光板。本發明之光學積層體即使不具備偏光板,仍可在抑制反射率的同時展現充分亮度,並可展現良好色相。且,將偏光板排除,可防止亮度降低及降低成本。並且,上述吸收層由於可高自由度地調整其機械特性,因此除了降低反射之功能之外,亦可做附加作為硬塗層之功能等設計。另外,本說明書中,「於吸收層之與波長轉換層相反之側不具有偏光板」之形態還包含於該處不具有偏光件之形態及於該處不具有圓偏光板之形態。
本發明之光學積層體的厚度宜為10μm~1000μm,較佳為15μm~800μm,且20μm~600μm更佳,20μm~500μm尤佳。
光學積層體之全光線反射率(測定方法於後文中詳述)宜為60%以下,更宜為50%以下,又更宜為40%以下,尤宜為35%以下,最宜為30%以下。光學積層體之全光線反射率的下限值愈小愈佳,例如為5%。
本發明中,相對於基於光學積層體之反射色相(a*
,b*
)(測定方法於後文中詳述)的D65,Δab宜為8以下,更宜為7以下,又更宜為6以下。Δab之下限値越小越好,理想上為0。本發明之光學積層體的Δab只要在上述範圍內,則在用於影像顯示裝置時可展現更良好的色相。此外,Δab可藉由(a2
+b2
)1/2
之式求得。
本發明之光學積層體可在不損及本發明之效果的範圍內具有任意且適當之其他層。
本發明之光學積層體亦可具有保護薄膜。具體而言,本發明之光學積層體舉例而言亦可於吸收層之與波長轉換層相反之側具有保護薄膜。
本發明之光學積層體亦可具有折射率調整層。具體而言,本發明之光學積層體譬如亦可於吸收層之與波長轉換層相反之側具有折射率調整層。
≪波長轉換層≫
波長轉換層代表上包含波長轉換材料。更詳細而言,波長轉換層可含有基質與分散於該基質中的波長轉換材料。
波長轉換層舉例而言亦可採用作為彩色濾光片。
波長轉換層可為單一層,亦可具有積層結構。波長轉換層具有積層結構時,在代表上,各層可含有具有不同發光特性之波長轉換材料。
波長轉換層之厚度(在具有積層結構時為其總厚度)宜為1μm~500μm,更宜為100μm~400μm。只要波長轉換層之厚度在所述範圍內,即可製得轉換效率及耐久性優異的光學積層體。波長轉換層具有積層結構時,各層之厚度宜為1μm~300μm,更宜為10μm~250μm。
<基質>
構成基質之材料(以下亦稱為基質材料),可在不損及本發明之效果的範圍內使用任意適當之材料。所述之材料例如可舉樹脂、有機氧化物、無機氧化物。基質材料宜具有低透氧性及低透濕性,且具有高度光穩定性及高化學穩定性,具有預定折射率,具有優異的透明性及/或對波長轉換材料具有優異的分散性。基質在實際使用上可以樹脂薄膜或黏著劑來構成。
(樹脂薄膜)
基質為樹脂薄膜時,構成樹脂薄膜之樹脂可在不損及本發明效果之範圍內使用任意且適當之樹脂。具體而言,樹脂可為熱可塑性樹脂,可為熱硬化性樹脂,亦可為活性能量線硬化性樹脂。活性能量線硬化性樹脂可舉例如電子射線硬化型樹脂、紫外線硬化型樹脂、可見光線硬化型樹脂。
基質為樹脂薄膜時,構成樹脂薄膜之樹脂的具體例可舉例如環氧、(甲基)丙烯酸酯(例如甲基丙烯酸甲酯、丙烯酸丁酯)、降莰烯、聚乙烯、聚(乙烯醇縮丁醛)、聚(乙酸乙烯酯)、聚脲、聚胺甲酸酯、胺基聚矽氧(AMS)、聚苯基甲基矽氧烷、聚苯基烷基矽氧烷、聚二苯基矽氧烷、聚二烷基矽氧烷、倍半矽氧烷、氟化聚矽氧、乙烯基及氫化物取代聚矽氧、苯乙烯系聚合物(例如聚苯乙烯、胺基聚苯乙烯(APS)、聚(丙烯腈乙烯苯乙烯)(AES))、經與二官能性單體交聯之聚合物(例如二乙烯苯)、聚酯系聚合物(例如聚對苯二甲酸乙二酯)、纖維素系聚合物(例如三乙醯纖維素)、氯乙烯系聚合物、醯胺系聚合物、醯亞胺系聚合物、乙烯醇系聚合物、環氧系聚合物、聚矽氧系聚合物、丙烯酸胺甲酸酯系聚合物。該等可單獨使用,亦可組合(例如摻合、共聚)使用。該等樹脂亦可在形成膜後施行延伸、加熱、加壓等處理。樹脂宜為熱硬化性樹脂或紫外線硬化型樹脂,且較佳為熱硬化性樹脂。
(黏著劑)
基質為黏著劑時,黏著劑可在不損及本發明效果的範圍內使用任意適當之黏著劑。黏著劑宜具有透明性且在光學上為各向同性。黏著劑之具體例例如可舉橡膠系黏著劑、丙烯酸系黏著劑、聚矽氧系黏著劑、環氧系黏著劑、纖維素系黏著劑。黏著劑較佳為橡膠系黏著劑或丙烯酸系黏著劑。
<波長轉換材料>
波長轉換材料可控制波長轉換層之波長轉換特性。波長轉換材料可舉如量子點、螢光體。亦即,波長轉換層宜含有量子點或螢光體作為波長轉換材料。
波長轉換層中波長轉換材料之含量(使用2種以上時為合計含量),相對於基質材料(代表上為樹脂或黏著劑固體成分)100重量份,宜為0.01重量份~50重量份,更宜為0.01重量份~30重量份。只要波長轉換材料之含量在所述範圍內,即可實現一種RGB所有色相平衡優異的影像顯示裝置。
(量子點)
量子點之發光中心波長可依量子點之材料及/或組成、粒子尺寸、形狀等來調整。
量子點可在無損本發明效果的範圍內以任意且適當的材料構成。量子點較佳以無機材料構成,更佳以無機導體材料或無機半導體材料構成。半導體材料可舉如II-VI族、III-V族、IV-VI族及IV族之半導體。具體例可舉Si、Ge、Sn、Se、Te、B、C(包含鑽石)、P、BN、BP、BAs、AlN、AlP、AlAs、AlSb、GaN、GaP、GaAs、GaSb、InN、InP、InAs、InSb、ZnO、ZnS、ZnSe、ZnTe、CdS、CdSe、CdSeZn、CdTe、HgS、HgSe、HgTe、BeS、BeSe、BeTe、MgS、MgSe、GeS、GeSe、GeTe、SnS、SnSe、SnTe、PbO、PbS、PbSe、PbTe、CuF、CuCl、CuBr、CuI、Si3
N4
、Ge3
N4
、Al2
O3
、(Al、Ga、In)2
(S、Se、Te)3
、Al2
CO。該等可單獨使用亦可將2種以上組合使用。量子點亦可含有p型摻雜劑或n型摻雜劑。量子點亦可具有內核外殼結構。所述內核外殼結構中,外殼周圍可因應目的形成有任意適當之機能層(單一層或多層),且外殼表面亦可經表面處理及/或化學修飾。
量子點形狀可因應目的採用任意且適當之形狀。量子點形狀之具體例可舉例如真球狀、鱗片狀、板狀、橢圓球狀、不定形。
量子點尺寸可因應所期望之發光波長採用任意且適當之尺寸。量子點的尺寸宜為1nm~10nm,較佳為2nm~8nm。量子點之尺寸只要在所述範圍內,綠色及紅色兩色各即可展現鮮明的發光,而可實現高演色性。舉例而言,綠色光可在量子點之尺寸為7nm左右時發光,而紅色光可在3nm左右時發光。另,量子點之尺寸譬如在量子點為真球狀時為平均粒徑,在其以外之形狀時為沿該形狀中之最小軸的尺寸。
量子點之細項例如已記載於日本特開2012-169271號公報、日本特開2015-102857號公報、日本特開2015-65158號公報、日本特表2013-544018號公報、日本特表2010-533976號公報中,而本說明書即援用該等公報之記載作為參考。量子點亦可使用市售品。
(螢光體)
螢光體可因應目的使用可發出所期望之顏色的光之任意適當的螢光體。具體例可舉如紅色螢光體、綠色螢光體。
紅色螢光體可舉例如已被Mn4+
活化之複合氟化物螢光體。所謂複合氟化物螢光體意指下述配位化合物:含有至少一個配位中心(例如後述之M),且被作為配位子行使作用之氟化物離子包圍,並因應需求透過相對離子(例如後述之A)獲得電荷補償者。所述複合氟化物螢光體之具體例可舉A2
[MF5
]:Mn4+
、A3
[MF6
]:Mn4+
、Zn2
[MF7
]:Mn4+
、A[In2
F7
]:Mn4+
、A2
[M´F6
]:Mn4+
、E[M´F6
]:Mn4+
、A3
[ZrF7
]:Mn4+
、Ba0.65
Zr0.35
F2.70
:Mn4+
。此處,A係Li、Na、K、Rb、Cs、NH4
或其組合。M係Al、Ga、In或其組合。M´係Ge、Si、Sn、Ti、Zr或其組合。E係Mg、Ca、Sr、Ba、Zn或其組合。以配位中心的配位數為6之複合氟化物螢光體為佳。所述紅色螢光體的細項記載於如日本特開2015-84327號公報中。本說明書中係援用該公報之記載整體作為參考。
綠色螢光體可舉例如含有具有β型Si3
N4
晶體結構的矽鋁氮氧化物之固溶體作為主成分之化合物。宜進行處理使所述矽鋁氮氧化物晶體中所含之氧量在特定量(例如0.8質量%)以下。進行所述處理,可製波峰寬窄且能發出鮮明的光之綠色螢光體。所述綠色螢光體的細項記載於如日本特開2013-28814號公報中。本說明書中係援用該公報之記載整體作為參考。
≪吸收層≫
吸收層較佳為包含1種以上任意且適當之色料。代表上,在吸收層中,色料係存在於基質中。
如上述,上述吸收層於580nm~610nm之範圍的波長帶區域具有吸收峰。只要形成所述吸收層,即可在抑制可見光透射率降低(亦即亮度降低)的同時,提升抗反射功能。又,藉由調整所吸收的光之波長,可使反射色相中性化,製得著色少之光學積層體。此外,吸收光譜可利用分光光度計(股份有限公司日立High-Technologies製,製品名「U-4100」)測定。
上述吸收層在波長580nm~610nm中之最大吸收峰的吸光度Amax
、與在波長545nm之吸光度A545
的比(A545
/Amax
)宜為0.13以下,更宜為0.12以下,且0.11以下更佳,0.1以下尤佳。只要依上所述形成在波長545nm中吸光度小的吸收層,即可吸收在色彩表現上不需要的光,而可製得可有助於影像顯示裝置之廣色域化的光學積層體。又,由於不易吸收來自光視效能高的545nm左右之光源的發光,因此可減少亮度降低之情形。
上述吸收層之位於波長580nm~610nm之範圍內的吸收峰之半值寬度宜為35nm以下,且30nm以下更佳,25nm以下又更佳,20nm以下尤佳。只要在所述範圍內,即可製得可有助於影像顯示裝置之廣色域化的光學積層體。
在一實施形態中,上述吸收層於530nm~570nm之範圍內不具有吸收峰。更具體而言,上述吸收層於530nm~570nm之範圍內不具有吸光度在0.1以上的吸收峰。只要形成所述吸收層,即可製得可有助於影像顯示裝置之廣色域化的光學積層體。
在一實施形態中,上述吸收層層更於440nm~510nm之範圍的波長帶區域具有吸收峰。即,在本實施形態中,上述吸收層於440nm~510nm及580nm~610nm之範圍的波長帶區域具有吸收峰。只要為所述構成,即可良好地防止紅色光與綠色光混色、以及綠色光與藍色光混色。只要將依所述方式構成之光學積層體用作影像顯示裝置的抗反射薄膜,即可使影像顯示裝置廣色域化,而可獲得明亮且鮮豔的畫質。如上所述具有2以上之吸收峰的吸收層,可透過使用多種色素來製得。
吸收層在吸收峰下之透射率宜為0%~80%,更宜為0%~70%。若為所述範圍內,本發明之上述效果便更明顯。
上述吸收層的可見光透射率宜為30%~90%,且較宜為30%~80%。只要在所述範圍內,即可製得可在抑制亮度降低的同時發揮抗反射功能之光學積層體。
上述吸收層的霧度值以15%以下為佳,10%以下較佳,5%以下更佳。吸收層的霧度值越小越好,惟其下限例如為0.1%。
吸收層的厚度宜為1μm~100μm,較宜為2μm~30μm。
(色料)
在一實施形態中,上述吸收層包含下述通式(I)或通式(II)所示化合物X作為色料。化合物X係於580nm~610nm之範圍的波長帶區域具有吸收峰之化合物。
[化學式2]
式(I)中,R1
、R2
、R3
、R4
、R5
、R6
、R7
及R8
分別獨立為氫原子、鹵素原子、碳數1以上且20以下之取代或非取代之烷基、式(a)所示取代基或式(b)所示取代基;或是
R1
與R2
形成由5或6個碳原子所構成之飽和環狀骨架且R3
、R4
、R5
、R6
、R7
及R8
分別獨立為氫原子、鹵素原子(宜為Cl)、碳數1以上且20以下之取代或非取代之烷基、式(a)所示取代基或式(b)所示取代基;或是
R2
與R3
形成由5~7個碳原子所構成之飽和環狀骨架且R1
、R4
、R5
、R6
、R7
及R8
分別獨立為氫原子、鹵素原子(宜為Cl)、碳數1以上且20以下之取代或非取代之烷基、式(a)所示取代基或式(b)所示取代基;或是
R5
與R6
形成由5或6個碳原子所構成之飽和環狀骨架且R1
、R2
、R3
、R4
、R7
及R8
分別獨立為氫原子、鹵素原子(宜為Cl)、碳數1以上且20以下之取代或非取代之烷基、式(a)所示取代基或式(b)所示取代基;或是
R6
與R7
形成由5~7個碳原子所構成之飽和環狀骨架且R1
、R2
、R3
、R4
、R5
及R8
分別獨立為氫原子、鹵素原子(宜為Cl)、碳數1以上且20以下之取代或非取代之烷基、式(a)所示取代基或式(b)所示取代基;或是
R1
與R2
形成由5或6個碳原子所構成之飽和環狀骨架、R5
與R6
形成由5或6個碳原子所構成之飽和環狀骨架且R3
、R4
、R7
及R8
分別獨立為氫原子、鹵素原子(宜為Cl)、碳數1以上且20以下之取代或非取代之烷基、式(a)所示取代基或式(b)所示取代基;或者,
令R2
與R3
形成由5~7個碳原子所構成之飽和環狀骨架、R6
與R7
形成由5~7個碳原子所構成之飽和環狀骨架且R1
、R4
、R5
及R8
分別獨立為氫原子、鹵素原子(宜為Cl)、碳數1以上且20以下之取代或非取代之烷基、式(a)所示取代基或式(b)所示取代基。
式(II)中,R4
及R8
分別獨立為氫原子或碳數1以上且20以下之取代或非取代之烷基。
含有R1
與R2
而形成之上述飽和環狀骨架(碳數:5或6)及含有R5
與R6
而形成之上述飽和環狀骨架(碳數:5或6)亦可具有取代基。該取代基可舉如碳數1~4之烷基。又,含有R2
與R3
而形成之上述飽和環狀骨架(碳數:5~7)及含有R6
與R7
而形成之上述飽和環狀骨架(碳數:5~7)亦可具有取代基。該取代基可舉如碳數1~4之烷基。
在一實施形態中,R4
及/或R8
具有苯環或萘環作為取代基。
上述式(I)或(II)所示具體之化合物X可舉如下述通式(I-1)~(I-27)或(II-1)所示化合物。關於(I-1)~(I-23)係列出於脂肪族聚碳酸酯混合化合物X而調製出樹脂組成物後,測定由該樹脂組成物構成之薄膜的吸光度而取得的吸收峰;關於(I-24)~(I-27)及(II-1)則係列出於聚甲基丙烯酸甲酯樹脂混合化合物X而調製出樹脂組成物後,測定由該樹脂組成物構成之薄膜的吸光度而取得之吸收峰。
[化學式3]
相對於基質材料100重量份,上述化合物X的含量宜為0.01重量份~50重量份,0.05重量份~10重量份較佳,0.1重量份~5重量份更佳,0.1重量份~1重量份尤佳。
相對於基質材料100重量份,於440nm~510nm之範圍的波長帶區域具有吸收峰之化合物的含量宜為0.01重量份~50重量份,且0.01重量份~25重量份更佳。
(基質)
基質可為黏著劑亦可為樹脂薄膜。較佳為黏著劑。且,亦可使用樹脂薄膜形成吸收層,並將該吸收層作為硬塗層等機能層(或亦可作為機能層之一要素)。
基質為黏著劑時,黏著劑可在不損及本發明效果的範圍內使用任意適當之黏著劑。黏著劑宜具有透明性且在光學上為各向同性。黏著劑之具體例例如可舉橡膠系黏著劑、丙烯酸系黏著劑、聚矽氧系黏著劑、環氧系黏著劑、纖維素系黏著劑。黏著劑較佳為橡膠系黏著劑或丙烯酸系黏著劑。
橡膠系黏著劑(黏著劑組成物)之橡膠系聚合物係於室溫左右之溫度區中會展現橡膠彈性之聚合物。較佳之橡膠系聚合物(A)可舉苯乙烯系熱可塑性彈性體(A1)、異丁烯系聚合物(A2)及其組合。
苯乙烯系熱可塑性彈性體(A1)可舉例如苯乙烯-乙烯-丁烯-苯乙烯嵌段共聚物(SEBS)、苯乙烯-異戊二烯-苯乙烯嵌段共聚物(SIS)、苯乙烯-丁二烯-苯乙烯嵌段共聚物(SBS)、苯乙烯-乙烯-丙烯-苯乙烯嵌段共聚物(SEPS、SIS之氫化物)、苯乙烯-乙烯-丙烯嵌段共聚物(SEP、苯乙烯-異戊二烯嵌段共聚物之氫化物)、苯乙烯-異丁烯-苯乙烯嵌段共聚物(SIBS)、苯乙烯-丁二烯橡膠(SBR)等苯乙烯系嵌段共聚物。在該等之中,由在分子兩末端具有聚苯乙烯嵌段且作為聚合物具有高度凝集力之觀點,又以苯乙烯-乙烯-丙烯-苯乙烯嵌段共聚物(SEPS、SIS之氫化物)、苯乙烯-乙烯-丁烯-苯乙烯嵌段共聚物(SEBS)、苯乙烯-異丁烯-苯乙烯嵌段共聚物(SIBS)為佳。苯乙烯系熱可塑性彈性體(A1)亦可使用市售品。市售品之具體例例如可舉Kuraray公司製之SEPTON、HYBRAR、ASAHI KASEI CHEMICALS CO.製之Tuftec、Kaneka公司製之SIBSTAR。
苯乙烯系熱可塑性彈性體(A1)之重量平均分子量以5萬~50萬左右為佳,5萬~30萬左右較佳,5萬~25萬左右更佳。苯乙烯系熱可塑性彈性體(A1)之重量平均分子量若在所述範圍內,因可兼顧聚合物之凝集力與黏彈性故而為佳。
苯乙烯系熱可塑性彈性體(A1)中之苯乙烯含量以5重量%~70重量%左右為佳,5重量%~40重量%左右較佳,10重量%~20重量%左右更佳。苯乙烯系熱可塑性彈性體(A1)中之苯乙烯含量只要在所述範圍內,即可在保持來自苯乙烯部位之凝集力的同時確保來自軟段之黏彈性,故而為佳。
異丁烯系聚合物(A2)可舉如含有異丁烯作為構成單體且重量平均分子量(Mw)較佳為50萬以上者。異丁烯系聚合物(A2)可為異丁烯之均聚物(聚異丁烯,PIB),亦可為以異丁烯為主單體之共聚物(亦即以異丁烯占超過50莫耳%之比率共聚而成之共聚物)。所述共聚物可舉例如異丁烯與正丁烯之共聚物、異丁烯與異戊二烯之共聚物(例如普通丁基橡膠(regular butyl rubber)、氯化丁基橡膠、溴化丁基橡膠、部分交聯丁基橡膠等丁基橡膠類)、該等之硫化物或改質物(例如以羥基、羧基、胺基、環氧基等官能基改質者)。在該等之中,由主鏈中不含雙鍵且耐候性優異之觀點,又以聚異丁烯(PIB)為佳。異丁烯系聚合物(A2)亦可使用市售品。市售品之具體例可舉BASF公司製之OPPANOL。
且,異丁烯系聚合物(A2)之重量平均分子量(Mw)宜為50萬以上,較佳為60萬以上,70萬以上更佳。且,重量平均分子量(Mw)的上限宜為500萬以下,較佳為300萬以下,200萬以下更佳。藉由將異丁烯系聚合物(A2)之重量平均分子量設為50萬以上,可做出高溫保管時之耐久性更佳的黏著劑組成物。
黏著劑(黏著劑組成物)中之橡膠系聚合物(A)的含量,在黏著劑組成物之總固體成分中,宜為30重量%以上,更宜為40重量%以上,又更宜為50重量%以上,尤宜為60重量%以上。橡膠系聚合物含量之上限宜為95重量%以下,較宜為90重量%以下。
橡膠系黏著劑中亦可將橡膠系聚合物(A)與其他橡膠系聚合物組合使用。其他橡膠系聚合物之具體例可舉例如丁基橡膠(IIR)、丁二烯橡膠(BR)、丙烯腈-丁二烯橡膠(NBR)、EPR(二元系乙烯-丙烯橡膠)、EPT(三元系乙烯-丙烯橡膠)、丙烯酸橡膠、胺甲酸酯橡膠、聚胺甲酸酯系熱可塑性彈性體;聚酯系熱可塑性彈性體;聚丙烯與EPT(三元系乙烯-丙烯橡膠)之聚合物摻合物等摻合物系熱可塑性彈性體。其他橡膠系聚合物之摻混量相對於橡膠系聚合物(A)100重量份宜為10重量份左右以下。
丙烯酸系黏著劑(黏著劑組成物)之丙烯酸系聚合物在代表上含有(甲基)丙烯酸烷基酯作為主成分,且可因應目的含有含芳香環(甲基)丙烯酸酯、含醯胺基之單體、含羧基之單體及/或含羥基之單體作為共聚成分。本說明書中,「(甲基)丙烯酸酯」意指丙烯酸酯及/或甲基丙烯酸酯。(甲基)丙烯酸烷基酯可例示直鏈狀或支鏈狀烷基的碳數1~18者。含芳香環(甲基)丙烯酸酯係一於其結構中含有芳香環結構且含有(甲基)丙烯醯基之化合物。作為芳香環,可舉如苯環、萘環或聯苯環。含芳香環(甲基)丙烯酸酯可滿足耐久性(尤其是針對透明導電層之耐久性),並且可改善周邊部之泛白引起的顯示不均。含醯胺基之單體係一於其結構中含有醯胺基且含有(甲基)丙烯醯基、乙烯基等聚合性不飽和雙鍵之化合物。含羧基之單體係一於其結構中含有羧基且含有(甲基)丙烯醯基、乙烯基等聚合性不飽和雙鍵之化合物。含羥基之單體係一於其結構中含有羥基且含有(甲基)丙烯醯基、乙烯基等聚合性不飽和雙鍵之化合物。丙烯酸系黏著劑之細項例如已記載於日本特開2015-199942號公報中,而本說明書即援用該公報之記載作為參考。
基質為樹脂薄膜時,構成樹脂薄膜之樹脂可使用任意且適當之樹脂。具體而言,樹脂可為熱可塑性樹脂,可為熱硬化性樹脂,亦可為活性能量線硬化性樹脂。活性能量線硬化性樹脂可舉例如電子射線硬化型樹脂、紫外線硬化型樹脂、可見光線硬化型樹脂。
基質為樹脂薄膜時,構成樹脂薄膜之樹脂的具體例可舉例如環氧、(甲基)丙烯酸酯(例如甲基丙烯酸甲酯、丙烯酸丁酯)、降莰烯、聚乙烯、聚(乙烯醇縮丁醛)、聚(乙酸乙烯酯)、聚脲、聚胺甲酸酯、胺基聚矽氧(AMS)、聚苯基甲基矽氧烷、聚苯基烷基矽氧烷、聚二苯基矽氧烷、聚二烷基矽氧烷、倍半矽氧烷、氟化聚矽氧、乙烯基及氫化物取代聚矽氧、苯乙烯系聚合物(例如聚苯乙烯、胺基聚苯乙烯(APS)、聚(丙烯腈乙烯苯乙烯)(AES))、經與二官能性單體交聯之聚合物(例如二乙烯苯)、聚酯系聚合物(例如聚對苯二甲酸乙二酯)、纖維素系聚合物(例如三乙醯纖維素)、氯乙烯系聚合物、醯胺系聚合物、醯亞胺系聚合物、乙烯醇系聚合物、環氧系聚合物、聚矽氧系聚合物、丙烯酸胺甲酸酯系聚合物。該等可單獨使用,亦可組合(例如摻合、共聚)使用。該等樹脂亦可在形成膜後施行延伸、加熱、加壓等處理。樹脂宜為熱硬化性樹脂或紫外線硬化型樹脂,且較佳為熱硬化性樹脂。
≪保護薄膜≫
保護薄膜可採用任意且適當的薄膜。作為所述薄膜之主成分的材料之具體例,可舉如三乙醯纖維素(TAC)等纖維素系樹脂、(甲基)丙烯酸系樹脂、聚酯系樹脂、聚乙烯醇系樹脂、聚碳酸酯系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚醚碸系樹脂、聚碸系樹脂、聚苯乙烯系樹脂、聚降莰烯系樹脂、聚烯烴系樹脂及乙酸酯系等透明樹脂。又,亦可舉出丙烯酸系樹脂、胺甲酸酯系樹脂、丙烯酸胺甲酸酯系樹脂、環氧系樹脂、聚矽氧系樹脂等熱硬化型樹脂或紫外線硬化型樹脂等。其他亦可舉出例如矽氧烷系聚合物等之玻璃質系聚合物。並且,亦可使用日本專利特開2001-343529號公報(WO01/37007)所記載之聚合物薄膜。作為該薄膜之材料,例如可以使用含有在側鏈具有取代或非取代之醯亞胺基的熱可塑性樹脂與在側鏈具有取代或非取代之苯基以及腈基的熱可塑性樹脂之樹脂組成物,例如可舉出具有由異丁烯與N-甲基馬來醯亞胺構成之交替共聚物及丙烯腈-苯乙烯共聚物之樹脂組成物。上述聚合物薄膜例如可為上述樹脂組成物之擠製成形物。積層偏光件與保護薄膜可採用任意且適當的黏著劑層或接著劑層。黏著劑層代表上係以丙烯酸系黏著劑形成。接著劑層代表上係以聚乙烯醇系接著劑形成。
≪折射率調整層≫
折射率調整層之折射率宜為1.2以下,較佳為1.15以下,且1.01~1.1更佳。只要折射率調整層之折射率在所述範圍內,即可提升從波長轉換層射出之光的利用效率,並且可抑制外光反射。
折射率調整層代表上於內部具有空隙。折射率調整層之空隙率可取任意且適當之值。折射率調整層之空隙率宜為5%~99%,較佳為25%~95%。藉由使折射率調整層之空隙率在所述範圍內,可充分壓低折射率調整層之折射率,並可獲得高機械強度。
內部具有空隙之折射率調整層亦可由例如具有粒狀、纖維狀、平板狀之至少一種形狀之結構所構成。形成粒狀之結構體(構成單元)可為實心粒子亦可為中空粒子,具體上可列舉如聚矽氧粒子或具有微細孔之聚矽氧粒子、二氧化矽中空奈米粒子或二氧化矽中空奈米球。纖維狀之構成單元例如係直徑為奈米尺寸之奈米纖維,具體上可列舉纖維素奈米纖維或氧化鋁奈米纖維。平板狀之構成單元可舉如奈米黏土,具體上可列舉如奈米尺寸之膨土(例如Kunipia F(商品名))。
構成折射率調整層之材料可採用任意且適當的材料。所述材料可採用例如記載於國際公開第2004/113966號公報手冊、日本特開2013-254183號公報及日本特開2012-189802號公報之材料。具體而言可舉例如:二氧化矽系化合物;水解性矽烷類、以及其部分水解物及脫水縮合物;有機聚合物;含矽醇基之矽化合物;使矽酸鹽與酸及離子交換樹脂接觸而獲得之活性二氧化矽;聚合性單體(例如(甲基)丙烯酸系單體及苯乙烯系單體);硬化性樹脂(例如(甲基)丙烯酸系樹脂、含氟樹脂及胺甲酸酯樹脂);以及該等之組合。
有機聚合物可舉例如聚烯烴類(例如聚乙烯及聚丙烯)、聚胺甲酸酯類、含氟聚合物(例如以含氟單體單元與用於賦予交聯反應性的構成單元為構成成分之含氟共聚物)、聚酯類(例如聚(甲基)丙烯酸衍生物(本說明書中所謂(甲基)丙烯酸係意指丙烯酸及甲基丙烯酸,且所有的「(甲基)」皆以該意義作使用))、聚醚類、聚醯胺類、聚醯亞胺類、聚脲類及聚碳酸酯類。
構成折射率調整層之材料宜含有二氧化矽系化合物;水解性矽烷類以及其部分水解物及脫水縮合物。
二氧化矽系化合物舉例而言可為SiO2
(矽酸酐);含有SiO2
與選自於由Na2
O-B2
O3
(硼矽酸)、Al2
O3
(氧化鋁)、B2
O3
、TiO2
、ZrO2
、SnO2
、Ce2
O3
、P2
O5
、Sb2
O3
、MoO3
、ZnO2
、WO3
、TiO2
-Al2
O3
、TiO2
-ZrO2
、In2
O3
-SnO2
及Sb2
O3
-SnO2
所構成群組中之至少一種化合物的化合物(上述「-」表示其為複合氧化物)。
水解性矽烷類可舉例如含有亦可具有取代基(例如氟)之烷基的水解性矽烷類。上述水解性矽烷類以及其部分水解物及脫水縮合物宜為烷氧基矽烷及倍半矽氧烷。
烷氧基矽烷可為單體,亦可為寡聚物。烷氧基矽烷單體宜具有3個以上烷氧基。烷氧基矽烷單體可舉例如甲基三甲氧基矽烷、甲基三乙氧基矽烷、苯基三乙氧基矽烷、四甲氧基矽烷、四乙氧基矽烷、四丁氧基矽烷、四丙氧基矽烷、二乙氧基二甲氧基矽烷、二甲基二甲氧基矽烷及二甲基二乙氧基矽烷。烷氧基矽烷寡聚物宜為透過烷氧基矽烷單體之水解及聚縮合所獲得之縮聚物。構成折射率調整層之材料使用烷氧基矽烷,藉此可製得具有優異均勻性之折射率調整層。
倍半矽氧烷為以通式RSiO1.5
(惟,R表示有機官能基)表示之網狀聚矽氧烷的總稱。R可舉例如烷基(可為直鏈亦可為支鏈,且碳數為1~6)、苯基及烷氧基(例如甲氧基及乙氧基)。倍半矽氧烷之結構可舉例如梯子型及籠型。上述材料使用倍半矽氧烷,藉此可獲得具有優異均勻性、耐候性、透明性及硬度之折射率調整層。
上述粒子可採用任意且適當的粒子。上述粒子代表上為二氧化矽粒子。
二氧化矽粒子的形狀例如可透過穿透型電子顯微鏡觀察來確認。二氧化矽粒子的平均粒徑宜為5nm~200nm,且較佳為10nm~200nm。藉由具有上述構成,可獲得折射率夠低之折射率調整層,並且可維持折射率調整層之透明性。另,在本說明書中,平均粒徑意指從氮吸附法(BET法)測得之比表面積(m2
/g),透過平均粒徑=(2720/比表面積)之式所賦予之值(參照日本專利特開平1-317115號)。
製得折射率調整層之方法可舉如記載於日本特開2010-189212號公報、日本特開2008-040171號公報、日本特開2006-011175號公報、國際公開第2004/113966號公報手冊及其等參考文獻中之方法。具體而言可舉例如以下方法:使二氧化矽系化合物、水解性矽烷類以及其部分水解物及脫水縮合物中之至少任一種水解及聚合縮合之方法;使用多孔質粒子及/或中空微粒子之方法;以及利用彈回現象(springback)來製作氣凝膠層之方法;使用粉碎凝膠之方法,該粉碎凝膠係將透過溶膠凝膠法製得之凝膠粉碎,並以觸媒等使上述粉碎液中之微細孔粒子彼此化學結合而成。惟,折射率調整層並不限定於該製造方法,可使用任何製造方法來製造。
折射率調整層可透過任意適當之接著層(例如接著劑層、黏著劑層:並未示於圖式中)貼合於波長轉換層或吸收層。折射率調整層以黏著劑構成時,可省略接著層。
折射率調整層之霧度例如為0.1%~30%,且宜為0.2%~10%。
折射率調整層之機械強度舉例而言以BEMCOT(註冊商標)造成之耐擦傷性為60%~100%為佳。
折射率調整層與波長轉換層或與吸收層之間的投錨力並無特別限制,但宜為0.01N/25mm以上,更宜為0.1N/25mm以上,又更宜為1N/25mm以上。另,為了提升機械強度及投錨力,亦可在塗膜形成前後及將其與任意適當之接著層、抑或其他構件貼合前後之步驟中,施行底塗處理、加熱處理、加濕處理、UV處理、電暈處理、電漿處理等。
折射率調整層之厚度宜為100nm~5000nm,較佳為200nm~4000nm,且300nm~3000nm更佳,500nm~2000nm尤佳。只要在所述範圍內,即可實現一種折射率調整層,其可對可見光區域之光充分展現光學上之功能並具有優異耐久性。
≪≪影像顯示裝置≫≫
圖2為包含本發明之光學積層體的影像顯示裝置之一實施形態的概略截面圖。圖2中係圖示影像顯示裝置為液晶顯示裝置之情形作為代表例。液晶顯示裝置1000具備液晶面板200與背光件300,且本發明之光學積層體可為液晶面板200之構件。波長轉換層可作為液晶面板200所具備之彩色濾光片。
在一實施形態中,光學積層體係具有波長轉換層與吸收層之光學積層體,且於吸收層之與波長轉換層相反之側不具有偏光板。所述本發明之光學積層體之一實施形態,舉例而言如圖3所示,依序具有吸收層20、波長轉換層10與偏光板30。圖3中,代表上吸收層20側為視辨側,而偏光板30之側為背光側。當然,圖3僅為本發明之光學積層體之一實施形態,本發明之光學積層體並不僅限於圖3所示之實施形態。
液晶顯示裝置1000更具體來說可採用如圖4所示實施形態。圖4中,液晶顯示裝置1000具備液晶面板200與背光件300,且液晶面板200依序具有吸收層20、波長轉換層10、偏光板(視辨側偏光板)30a、液晶單元40與偏光板(背光側偏光板)30b。圖4中,吸收層20側為視辨側,而偏光板(背光側偏光板)30b側為背光側。當然,圖4僅為包含本發明之光學積層體的影像顯示裝置之一實施形態,包含本發明之光學積層體的影像顯示裝置並不僅限於圖4所示之實施形態。
背光件具備之光源可舉例如冷陰極管光源(CCFL)、LED光源等。於一實施形態中,上述背光件具備LED光源。只要使用LED光源,即可製得視角特性優異的影像顯示裝置。在一實施形態中,係使用發出藍色光之光源(以LED光源為佳)。
背光件可為直下型方式,亦可為側光型方式。
背光件除光源外,可因應需要更具備導光板、擴散板、稜鏡片等其他構件。
液晶面板代表上具備液晶單元。
液晶單元具有一對基板與被包夾在該基板間作為顯示媒體的液晶層。在一般的構成中,係於其中一基板設有彩色濾光片(例如波長轉換層)及黑矩陣,而於另一基板設有:控制液晶之電光學特性的切換元件、賦予該切換元件閘控訊號之掃描線及賦予該切換元件來源訊號之訊號線、畫素電極及對向電極。上述基板之間隔(單元間隙)可透過分隔件等來控制。在上述基板之與液晶層相接之側,舉例而言可設置由聚醯亞胺構成之定向膜等。
在一實施形態中,液晶層包含在電場不存在之狀態下定向成垂面排列之液晶分子。所述液晶層(結果為液晶單元)代表上係展現nz>nx=ny之3維折射率。使用在電場不存在之狀態下定向成垂面排列之液晶分子的驅動模式可舉例如垂直配向(VA)模式。VA模式包含多域VA(MVA)模式。
在另一實施形態中,液晶層包含在電場不存在之狀態下定向成沿面排列之液晶分子。所述液晶層(結果為液晶單元)代表上係展現nx>ny=nz之3維折射率。另,本說明書中,所謂ny=nz不只包含ny與nz完全相同之情形,亦包含ny與nz在實質上相同之情形。使用展現所述3維折射率之液晶層的驅動模式之代表例可舉如平面內切換(IPS)模式、邊緣電場切換(FFS)模式等。另,上述IPS模式包含採用了V字型電極或鋸齒形電極等之超級平面內切換(S-IPS)模式、進階超級平面內切換(AS-IPS)模式。又,上述FFS模式包含採用了V字型電極或鋸齒形電極等之進階邊緣電場切換(A-FFS)模式、極端邊緣電場切換(U-FFS)模式。另,「nx」為面內折射率成最大的方向(亦即慢軸方向)之折射率,「ny」為在面內與慢軸正交之方向(亦即快軸方向)之折射率,而「nz」為厚度方向之折射率。
實施例
以下,以實施例來具體說明本發明,惟本發明不受該等實施例限定。又,各特性之測定方法如以下所述。
[反射率、反射光譜、反射色相(a*
,b*
)]
使用Konica Minolta公司製之分光測色計CM-2600d(光源:D65),測定了實施例及比較例中所製得之光學積層體之全光線反射率、反射光譜、反射色相(a*
,b*
)。另,若為具有波長轉換層與吸收層之光學積層體,則透過參考日本專利2549388號製成之丙烯酸系黏著劑(厚度20μm),將反射板(東麗(Toray)薄膜加工公司製,Cerapeel DMS-X42)貼合於波長轉換層側,並從吸收層側使光入射。
[Δab]
藉由(a2
+b2
)1/2
之式從上述反射色相(a*
,b*
)求出Δab。
[正面亮度]
將實施例及比較例中所製得之光學積層體設置成波長轉換層為光源側,並使用藍色LED之均勻發光照明(AITEC SYSTEM公司製:型號:TMN150×180-22BD-4)作為光源,以亮度計(Konica Minolta公司製,商品名「SR-UL1」)測定亮度。另,均勻發光照明之發光亮度在僅有波長轉換層時為1335cd/m2
。
[實施例1]
(波長轉換層)
將市售之TV(Samsung公司製,商品名「UN65JS9000FXZA」)分解,而獲得了背光側含有之波長轉換材料,亦即量子點片材。將此量子點片材作為波長轉換層(1)。
(吸收層)
製作出下述含色素黏著劑:相對於由丙烯酸正丁酯、含羥基之單體共聚而成的丙烯酸系聚合物100重量份,含有自由基引發劑(過氧化苯甲醯,日本油脂公司製,商品名「NYPER BMT」)0.3重量份、異氰酸酯系交聯劑(Tosoh公司製,商品名「Coronate L」)1重量份、下述通式(I-20)所示方酸化合物0.3重量份、酚系抗氧化劑(BASF Japan公司製,商品名「IRGANOX 1010」)0.2重量份而成。以塗佈器將上述所製得之含色素的黏著劑以20μm之厚度塗敷於已施行過易使黏著劑剝離之處理的PET基材(三菱樹脂公司製,商品名「MRF38CK」)上,並在155℃下乾燥2分鐘後,貼合於TAC(三乙醯纖維素薄膜,富士軟片(Fujifilm)公司製),而於TAC上形成吸收層(1)(吸收極大波長:594nm)。
此外,通式(I-20)所示方酸化合物係以以下方法合成。
<方酸化合物之合成>
依” M. Beller et. al., J. Am. Chem. Soc., 2013, 135(30), 11384-11388)”所記載之方法合成1-苯-1,4,5,6-四氫環戊[b]吡咯。
於乙醇5mL中混合1-苯-1,4,5,6-四氫環戊[b]吡咯300mg與方酸80mg,並於80℃下攪拌2小時。之後,令其冷卻至室溫,並濾取出產物。將濾取出之產物以乙醇洗淨,並於70℃下進行減壓乾燥,而製得197mg之方酸化合物。並以矽膠層析法進行純化,而製得120mg之方酸化合物。
[化學式9]
(光學積層體)
將上述波長轉換層(1)與上述吸收層(1)積層,而製得具有波長轉換層/吸收層之積層結構的光學積層體(1)。將光學積層體(1)供於上述評估。將結果列於表1。
[比較例1]
使用卟啉系色素(山本化成公司製,商品名「PD-320」)0.3重量份取代通式(I-20)所示方酸化合物0.3重量份,除此之外依與實施例1相同方式而製得包含波長轉換層(1)與吸收層(1)(吸收極大波長:595nm)之光學積層體(2)。將光學積層體(2)供於上述評估。將結果列於表1。
[比較例2]
不使用來形成吸收層之黏著劑中含有色素(方酸化合物)(亦即不形成吸收層而形成黏著劑層),除此之外依與實施例1相同方式而製得光學積層體(3)。將光學積層體(3)供於上述評估。將結果列於表1。
產業上之可利用性
本發明的光學積層體可適宜用於影像顯示裝置。
10‧‧‧波長轉換層
20‧‧‧吸收層
30‧‧‧偏光板
30a‧‧‧偏光板(視辨側偏光板)
30b‧‧‧偏光板(背光側偏光板)
40‧‧‧液晶單元
100‧‧‧光學積層體
200‧‧‧液晶面板
300‧‧‧背光件
1000‧‧‧液晶顯示裝置
圖1係本發明之一實施形態的光學積層體的概略截面圖。
圖2為包含本發明之光學積層體的影像顯示裝置之一實施形態的概略截面圖。
圖3係本發明之一實施形態的光學積層體的概略截面圖。
圖4為包含本發明之光學積層體的影像顯示裝置之一實施形態的概略截面圖。
10:波長轉換層
20:吸收層
100:光學積層體
Claims (6)
- 一種光學積層體,具備:波長轉換層與配置於該波長轉換層之單側的吸收層;並且,該光學積層體於前述吸收層之與波長轉換層相反之側不具有偏光板;該吸收層於580nm~610nm之範圍的波長帶區域具有吸收峰,且該吸收層包含下述通式(I)或通式(II)所示化合物X:
- 如請求項1之光學積層體,其中前述波長轉換層含有量子點或螢光體作為波長轉換材料。
- 如請求項1之光學積層體,其中前述波長 轉換層為彩色濾光片。
- 一種影像顯示裝置,包含如請求項1之光學積層體。
- 如請求項4之影像顯示裝置,其具備:包含如請求項1之光學積層體的液晶面板與背光件。
- 如請求項5之影像顯示裝置,其中前述液晶面板由視辨側起依序具備:前述吸收層、前述波長轉換層、視辨側偏光板、液晶單元與背光側偏光板。
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