TWI686466B - 先進流體處理方法及系統 - Google Patents

先進流體處理方法及系統 Download PDF

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Publication number
TWI686466B
TWI686466B TW108126599A TW108126599A TWI686466B TW I686466 B TWI686466 B TW I686466B TW 108126599 A TW108126599 A TW 108126599A TW 108126599 A TW108126599 A TW 108126599A TW I686466 B TWI686466 B TW I686466B
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Taiwan
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tank
chemical composition
mixing
mixing tank
continuous
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TW108126599A
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English (en)
Chinese (zh)
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TW201943832A (zh
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周仕斌
張文宏
狄帕克 馬休理克
塔瑪斯 瓦爾瓜
阿布達雅 米斯拉
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美商富士軟片電子材料美國股份有限公司
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    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/50—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle
    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • B01F33/00—Other mixers; Mixing plants; Combinations of mixers
    • B01F33/80—Mixing plants; Combinations of mixers
    • B01F33/84—Mixing plants with mixing receptacles receiving material dispensed from several component receptacles, e.g. paint tins
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    • C—CHEMISTRY; METALLURGY
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Materials Engineering (AREA)
  • Accessories For Mixers (AREA)
  • Detergent Compositions (AREA)
  • Materials For Photolithography (AREA)
  • Measuring Volume Flow (AREA)
  • Mixers With Rotating Receptacles And Mixers With Vibration Mechanisms (AREA)
TW108126599A 2016-03-11 2017-02-20 先進流體處理方法及系統 TWI686466B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201662306795P 2016-03-11 2016-03-11
US62/306,795 2016-03-11

Publications (2)

Publication Number Publication Date
TW201943832A TW201943832A (zh) 2019-11-16
TWI686466B true TWI686466B (zh) 2020-03-01

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TW113133616A TWI880844B (zh) 2016-03-11 2017-02-20 先進流體處理方法及系統
TW109101773A TWI852982B (zh) 2016-03-11 2017-02-20 先進流體處理方法及系統
TW106105581A TWI673353B (zh) 2016-03-11 2017-02-20 先進流體處理方法及系統
TW109117190A TWI857063B (zh) 2016-03-11 2017-02-20 先進流體處理方法及系統
TW108126599A TWI686466B (zh) 2016-03-11 2017-02-20 先進流體處理方法及系統

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TW113133616A TWI880844B (zh) 2016-03-11 2017-02-20 先進流體處理方法及系統
TW109101773A TWI852982B (zh) 2016-03-11 2017-02-20 先進流體處理方法及系統
TW106105581A TWI673353B (zh) 2016-03-11 2017-02-20 先進流體處理方法及系統
TW109117190A TWI857063B (zh) 2016-03-11 2017-02-20 先進流體處理方法及系統

Country Status (9)

Country Link
US (2) US10159949B2 (enExample)
EP (2) EP3888779A1 (enExample)
JP (3) JP7306608B2 (enExample)
KR (4) KR20170106233A (enExample)
CN (1) CN107198975B (enExample)
IL (1) IL261595A (enExample)
SG (1) SG11201807521WA (enExample)
TW (5) TWI880844B (enExample)
WO (1) WO2017155669A1 (enExample)

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US10159949B2 (en) * 2016-03-11 2018-12-25 Fujifilm Planar Solutions, LLC Advanced fluid processing methods and systems
UA127186C2 (uk) * 2017-09-18 2023-05-31 Феррінґ Інтернешнл Сентер С.А. Виготовлення фармацевтичного складу
CN107661728B (zh) * 2017-09-19 2019-09-24 中国计量大学 基于变速率学习的直落式物料配料装置及其控制器
WO2020106567A1 (en) 2018-11-20 2020-05-28 Fujifilm Electronic Materials U.S.A., Inc. Systems and methods for purifying solvents
CN109433037A (zh) * 2018-12-27 2019-03-08 扬州宏远电子股份有限公司 一种电极箔生产用腐蚀液自动配液装置
US12263286B2 (en) * 2019-05-23 2025-04-01 Nxstage Medical, Inc. Medicament preparation devices, methods, and systems
IT201900010236A1 (it) * 2019-06-27 2020-12-27 Ats S R L Processo di preparazione e confezionamento di un prodotto cosmetico e impianto implementante lo stesso
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