TWI641936B - 漿料供應及／或化學品摻合物供應設備、方法、使用方法及製造方法 - Google Patents
漿料供應及／或化學品摻合物供應設備、方法、使用方法及製造方法 Download PDFInfo
- Publication number
- TWI641936B TWI641936B TW106103534A TW106103534A TWI641936B TW I641936 B TWI641936 B TW I641936B TW 106103534 A TW106103534 A TW 106103534A TW 106103534 A TW106103534 A TW 106103534A TW I641936 B TWI641936 B TW I641936B
- Authority
- TW
- Taiwan
- Prior art keywords
- slurry
- module
- blending
- pipe
- chemical blend
- Prior art date
Links
- 239000002002 slurry Substances 0.000 title claims abstract description 1903
- 239000000203 mixture Substances 0.000 title claims abstract description 1211
- 239000000126 substance Substances 0.000 title abstract description 1351
- 238000000034 method Methods 0.000 title abstract description 358
- 238000004519 manufacturing process Methods 0.000 title abstract description 87
- 230000008569 process Effects 0.000 title description 4
- 238000009826 distribution Methods 0.000 claims abstract description 645
- 238000002156 mixing Methods 0.000 claims abstract description 520
- 238000004458 analytical method Methods 0.000 claims abstract description 435
- 239000002245 particle Substances 0.000 claims description 355
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 154
- 239000007788 liquid Substances 0.000 claims description 101
- 239000012530 fluid Substances 0.000 claims description 100
- 238000010790 dilution Methods 0.000 claims description 84
- 239000012895 dilution Substances 0.000 claims description 84
- 238000004891 communication Methods 0.000 claims description 76
- 238000011144 upstream manufacturing Methods 0.000 claims description 69
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 49
- 239000002699 waste material Substances 0.000 claims description 14
- 239000012470 diluted sample Substances 0.000 claims description 12
- 238000007415 particle size distribution analysis Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 abstract description 14
- 238000012546 transfer Methods 0.000 description 132
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- 238000005070 sampling Methods 0.000 description 72
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- 229910021642 ultra pure water Inorganic materials 0.000 description 39
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- 239000008367 deionised water Substances 0.000 description 21
- 229910021641 deionized water Inorganic materials 0.000 description 21
- 238000005259 measurement Methods 0.000 description 21
- 230000008859 change Effects 0.000 description 17
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- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 150000007513 acids Chemical class 0.000 description 6
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- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000007596 consolidation process Methods 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 239000003989 dielectric material Substances 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 210000002310 elbow joint Anatomy 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000005339 levitation Methods 0.000 description 3
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- 239000007800 oxidant agent Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 2
- 229920001774 Perfluoroether Polymers 0.000 description 2
- -1 Polyethylene Polymers 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000003518 caustics Substances 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 238000005354 coacervation Methods 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
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- 238000005530 etching Methods 0.000 description 2
- 238000011010 flushing procedure Methods 0.000 description 2
- 229920001903 high density polyethylene Polymers 0.000 description 2
- 239000004700 high-density polyethylene Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000013011 mating Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 2
- XXQBEVHPUKOQEO-UHFFFAOYSA-N potassium superoxide Chemical compound [K+].[K+].[O-][O-] XXQBEVHPUKOQEO-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000000717 retained effect Effects 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 238000010008 shearing Methods 0.000 description 2
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- 239000007787 solid Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- MLIWQXBKMZNZNF-KUHOPJCQSA-N (2e)-2,6-bis[(4-azidophenyl)methylidene]-4-methylcyclohexan-1-one Chemical compound O=C1\C(=C\C=2C=CC(=CC=2)N=[N+]=[N-])CC(C)CC1=CC1=CC=C(N=[N+]=[N-])C=C1 MLIWQXBKMZNZNF-KUHOPJCQSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- IERHLVCPSMICTF-XVFCMESISA-N CMP group Chemical group P(=O)(O)(O)OC[C@@H]1[C@H]([C@H]([C@@H](O1)N1C(=O)N=C(N)C=C1)O)O IERHLVCPSMICTF-XVFCMESISA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- HKVFISRIUUGTIB-UHFFFAOYSA-O azanium;cerium;nitrate Chemical compound [NH4+].[Ce].[O-][N+]([O-])=O HKVFISRIUUGTIB-UHFFFAOYSA-O 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
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- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
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- 230000000779 depleting effect Effects 0.000 description 1
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- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000005194 fractionation Methods 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000000892 gravimetry Methods 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000011244 liquid electrolyte Substances 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- 230000001404 mediated effect Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 210000003643 myeloid progenitor cell Anatomy 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 235000014366 other mixer Nutrition 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 238000009428 plumbing Methods 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 238000009473 power blending Methods 0.000 description 1
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- 238000003825 pressing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
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- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000012898 sample dilution Substances 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000007613 slurry method Methods 0.000 description 1
- 239000007784 solid electrolyte Substances 0.000 description 1
- 239000008400 supply water Substances 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 239000013026 undiluted sample Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D11/00—Control of flow ratio
- G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
- G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
- G05D11/131—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components
- G05D11/132—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components by controlling the flow of the individual components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/40—Mixing liquids with liquids; Emulsifying
- B01F23/45—Mixing liquids with liquids; Emulsifying using flow mixing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/40—Mixing liquids with liquids; Emulsifying
- B01F23/49—Mixing systems, i.e. flow charts or diagrams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/20—Jet mixers, i.e. mixers using high-speed fluid streams
- B01F25/21—Jet mixers, i.e. mixers using high-speed fluid streams with submerged injectors, e.g. nozzles, for injecting high-pressure jets into a large volume or into mixing chambers
- B01F25/211—Jet mixers, i.e. mixers using high-speed fluid streams with submerged injectors, e.g. nozzles, for injecting high-pressure jets into a large volume or into mixing chambers the injectors being surrounded by guiding tubes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/50—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/60—Pump mixers, i.e. mixing within a pump
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/2132—Concentration, pH, pOH, p(ION) or oxygen-demand
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/80—Forming a predetermined ratio of the substances to be mixed
- B01F35/82—Forming a predetermined ratio of the substances to be mixed by adding a material to be mixed to a mixture in response to a detected feature, e.g. density, radioactivity, consumed power or colour
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Accessories For Mixers (AREA)
- Sampling And Sample Adjustment (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261725863P | 2012-11-13 | 2012-11-13 | |
| US61/725863 | 2012-11-13 | ||
| US201361802950P | 2013-03-18 | 2013-03-18 | |
| US61/802950 | 2013-03-18 | ||
| US201361861739P | 2013-08-02 | 2013-08-02 | |
| US61/861739 | 2013-08-02 | ||
| US201361899560P | 2013-11-04 | 2013-11-04 | |
| US61/899560 | 2013-11-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201721322A TW201721322A (zh) | 2017-06-16 |
| TWI641936B true TWI641936B (zh) | 2018-11-21 |
Family
ID=50731649
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106103534A TWI641936B (zh) | 2012-11-13 | 2013-11-12 | 漿料供應及／或化學品摻合物供應設備、方法、使用方法及製造方法 |
| TW102141075A TWI574789B (zh) | 2012-11-13 | 2013-11-12 | 漿料供應及／或化學品摻合物供應設備、方法、使用方法及製造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102141075A TWI574789B (zh) | 2012-11-13 | 2013-11-12 | 漿料供應及／或化學品摻合物供應設備、方法、使用方法及製造方法 |
Country Status (8)
| Country | Link |
|---|---|
| EP (3) | EP4166226B1 (enExample) |
| JP (1) | JP6588337B2 (enExample) |
| KR (2) | KR102090015B1 (enExample) |
| CN (1) | CN104956278B (enExample) |
| IL (1) | IL238770B (enExample) |
| SG (2) | SG11201503698RA (enExample) |
| TW (2) | TWI641936B (enExample) |
| WO (1) | WO2014078398A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI875869B (zh) * | 2019-12-26 | 2025-03-11 | 美商旭化成生物工藝美國股份有限公司 | 內聯緩衝液稀釋系統及在一定流體流量範圍內產生經稀釋之緩衝溶液之方法 |
Families Citing this family (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MX338885B (es) * | 2012-10-15 | 2016-05-04 | Resverlogix Corp | Compuestos utiles en la sintesis de compuestos de benzamida. |
| DE102015103484A1 (de) * | 2015-03-10 | 2016-09-15 | Endress + Hauser Conducta Gesellschaft für Mess- und Regeltechnik mbH + Co. KG | In-Line-Messeinrichtung |
| JP6540120B2 (ja) * | 2015-03-16 | 2019-07-10 | 住友ベークライト株式会社 | 混合装置 |
| US10768641B2 (en) * | 2015-08-26 | 2020-09-08 | Fujikin Incorporated | Flow dividing system |
| JP7306608B2 (ja) * | 2016-03-11 | 2023-07-11 | フジフイルム エレクトロニック マテリアルズ ユー．エス．エー．， インコーポレイテッド | 高度な流体処理方法およびシステム |
| US10081036B2 (en) | 2016-09-19 | 2018-09-25 | Applied Materials, Inc. | Methods and systems for liquid particle prequalification |
| CA3041841A1 (en) | 2016-11-01 | 2018-05-11 | Cms Technology, Inc. | Systems and methods for improved blending of agents in chemical applications |
| JP6602334B2 (ja) * | 2017-03-30 | 2019-11-06 | 栗田工業株式会社 | 規定濃度水の供給方法及び装置 |
| CN107050700A (zh) * | 2017-05-12 | 2017-08-18 | 广州三业科技有限公司 | 数字定比大流量混合装置及其测试系统和调试方法 |
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| TW201422376A (zh) | 2014-06-16 |
| EP2920662B1 (en) | 2019-05-29 |
| IL238770B (en) | 2021-06-30 |
| SG11201503698RA (en) | 2015-06-29 |
| IL238770A0 (en) | 2015-06-30 |
| EP4166226B1 (en) | 2024-11-06 |
| CN104956278B (zh) | 2018-05-29 |
| TWI574789B (zh) | 2017-03-21 |
| KR102090015B1 (ko) | 2020-03-17 |
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| EP2920662A4 (en) | 2017-01-25 |
| EP3564771A3 (en) | 2020-03-18 |
| WO2014078398A1 (en) | 2014-05-22 |
| KR20170049625A (ko) | 2017-05-10 |
| TW201721322A (zh) | 2017-06-16 |
| EP2920662A1 (en) | 2015-09-23 |
| EP3564771A2 (en) | 2019-11-06 |
| JP6588337B2 (ja) | 2019-10-09 |
| SG10201800355QA (en) | 2018-02-27 |
| KR20150085013A (ko) | 2015-07-22 |
| EP4166226A1 (en) | 2023-04-19 |
| CN104956278A (zh) | 2015-09-30 |
| KR101732092B1 (ko) | 2017-05-04 |
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