JP6602334B2 - 規定濃度水の供給方法及び装置 - Google Patents
規定濃度水の供給方法及び装置 Download PDFInfo
- Publication number
- JP6602334B2 JP6602334B2 JP2017068091A JP2017068091A JP6602334B2 JP 6602334 B2 JP6602334 B2 JP 6602334B2 JP 2017068091 A JP2017068091 A JP 2017068091A JP 2017068091 A JP2017068091 A JP 2017068091A JP 6602334 B2 JP6602334 B2 JP 6602334B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- water
- specified
- concentration
- meter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims description 52
- 238000000034 method Methods 0.000 title claims description 34
- 239000007788 liquid Substances 0.000 claims description 113
- 238000003860 storage Methods 0.000 claims description 29
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 29
- 239000012498 ultrapure water Substances 0.000 claims description 29
- 238000004140 cleaning Methods 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 14
- 239000003513 alkali Substances 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 6
- 239000004065 semiconductor Substances 0.000 claims description 6
- 239000011259 mixed solution Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 description 23
- 238000002347 injection Methods 0.000 description 18
- 239000007924 injection Substances 0.000 description 18
- 239000000243 solution Substances 0.000 description 14
- 239000003814 drug Substances 0.000 description 9
- 238000012544 monitoring process Methods 0.000 description 7
- 229940079593 drug Drugs 0.000 description 6
- 239000011261 inert gas Substances 0.000 description 6
- 238000001514 detection method Methods 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- 230000004043 responsiveness Effects 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000033116 oxidation-reduction process Effects 0.000 description 2
- 230000020477 pH reduction Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000004448 titration Methods 0.000 description 2
- -1 HCl Chemical class 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000008237 rinsing water Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D11/00—Control of flow ratio
- G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
- G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
- G05D11/139—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring a value related to the quantity of the individual components and sensing at least one property of the mixture
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/2132—Concentration, pH, pOH, p(ION) or oxygen-demand
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/80—Forming a predetermined ratio of the substances to be mixed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/40—Mixing liquids with liquids; Emulsifying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/40—Mixing liquids with liquids; Emulsifying
- B01F23/405—Methods of mixing liquids with liquids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/40—Mixing liquids with liquids; Emulsifying
- B01F23/45—Mixing liquids with liquids; Emulsifying using flow mixing
- B01F23/451—Mixing liquids with liquids; Emulsifying using flow mixing by injecting one liquid into another
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/311—Injector mixers in conduits or tubes through which the main component flows for mixing more than two components; Devices specially adapted for generating foam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F33/00—Other mixers; Mixing plants; Combinations of mixers
- B01F33/80—Mixing plants; Combinations of mixers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/211—Measuring of the operational parameters
- B01F35/2111—Flow rate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/211—Measuring of the operational parameters
- B01F35/2112—Level of material in a container or the position or shape of the upper surface of the material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/211—Measuring of the operational parameters
- B01F35/2117—Weight
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/22—Control or regulation
- B01F35/2201—Control or regulation characterised by the type of control technique used
- B01F35/2202—Controlling the mixing process by feed-back, i.e. a measured parameter of the mixture is measured, compared with the set-value and the feed values are corrected
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/22—Control or regulation
- B01F35/221—Control or regulation of operational parameters, e.g. level of material in the mixer, temperature or pressure
- B01F35/2214—Speed during the operation
- B01F35/22141—Speed of feeding of at least one component to be mixed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/71—Feed mechanisms
- B01F35/717—Feed mechanisms characterised by the means for feeding the components to the mixer
- B01F35/71745—Feed mechanisms characterised by the means for feeding the components to the mixer using pneumatic pressure, overpressure, gas or air pressure in a closed receptacle or circuit system
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/71—Feed mechanisms
- B01F35/717—Feed mechanisms characterised by the means for feeding the components to the mixer
- B01F35/7176—Feed mechanisms characterised by the means for feeding the components to the mixer using pumps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/80—Forming a predetermined ratio of the substances to be mixed
- B01F35/82—Forming a predetermined ratio of the substances to be mixed by adding a material to be mixed to a mixture in response to a detected feature, e.g. density, radioactivity, consumed power or colour
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/80—Forming a predetermined ratio of the substances to be mixed
- B01F35/83—Forming a predetermined ratio of the substances to be mixed by controlling the ratio of two or more flows, e.g. using flow sensing or flow controlling devices
- B01F35/831—Forming a predetermined ratio of the substances to be mixed by controlling the ratio of two or more flows, e.g. using flow sensing or flow controlling devices using one or more pump or other dispensing mechanisms for feeding the flows in predetermined proportion, e.g. one of the pumps being driven by one of the flows
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/02—Feed or outlet devices; Feed or outlet control devices for feeding measured, i.e. prescribed quantities of reagents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
- B01F2101/305—Treatment of water, waste water or sewage
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
- B01F2101/58—Mixing semiconducting materials, e.g. during semiconductor or wafer manufacturing processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/40—Mixing liquids with liquids; Emulsifying
- B01F23/48—Mixing liquids with liquids; Emulsifying characterised by the nature of the liquids
- B01F23/483—Mixing liquids with liquids; Emulsifying characterised by the nature of the liquids using water for diluting a liquid ingredient, obtaining a predetermined concentration or making an aqueous solution of a concentrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F33/00—Other mixers; Mixing plants; Combinations of mixers
- B01F33/80—Mixing plants; Combinations of mixers
- B01F33/834—Mixing in several steps, e.g. successive steps
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Fluid Mechanics (AREA)
- Automation & Control Theory (AREA)
- Accessories For Mixers (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
図1のシステムにおいて、次の条件で超純水に薬注を行った。結果を表1に示す。
第1液:NH4OH 10ppm水溶液
第2液:H2O2 1ppm溶解水
ポンプ8の制御方式:PID
試験時間:20分
図2のように積算流量計4,5の代わりに重量センサ20を用いたこと以外は実施例1と同じ条件で薬注を行った。結果を表1に示す。
ポンプ8を省略し、図3の不活性ガス圧送方式のシステムを用いたこと以外は、実施例1と同じ条件で薬注を行った。結果を表1に示す。
実施例3において、図2のように積算流量計4,5の代わりに重量センサ20を用いたこと以外は同一条件で薬注を行った。結果を表1に示す。
図4に示すように、貯留槽6には第1液のみを供給し、別途設けられた第2貯留槽6Aに第2液のみを供給し、第1液をポンプ8を介して薬注点10aで薬注し、第2液については第2ポンプ8Aを介して第2薬注点10bで薬注するようにしたシステムを用いた。非導電性である第2液の濃度計測はオンラインH2O2モニター13を用いて行った。その際の瞬時流量は瞬時流量計14を用いて計測した。その他は実施例1と同じ条件で薬注を行った。結果を表1に示す。
貯留タンクにおける下記の濃厚薬液(混合液)中の各成分の自己分解性について以下の条件で計測した。結果を図5に示す。
NH4OH濃度:25wt%
H2O2濃度:30wt%
外気温:25℃
保管期間:1か月
検出方法:比色滴定
図5の通り、濃厚薬液を混合した状態でも、5日間は濃度一定であることが分かった。これより、タンク貯留量は5日以下になるよう設計することで、薬液毎にタンクおよび薬注点を設けなくてもよいことが明らかとなった。またタンク貯留量が所定の値より低くなった場合は、積算式流量計もしくは重量メーターを用いて各薬液を補充することで解消できることが認められた。
6,6A 貯留槽
11 導電率計
13 H2O2モニター
12,14 瞬時流量計
Claims (4)
- 超純水に、酸又はアルカリの水溶液よりなる導電性の第1液と、H 2 ,H 2 O 2 又はO 3 の溶解水よりなる非導電性の第2液との少なくとも2種類の液を添加して規定濃度の第1液成分及び第2液成分を含んだ規定濃度水を製造する工程と、
製造された規定濃度水を半導体洗浄工程の洗浄機に送水する工程とを有する規定濃度水の供給方法において、
該第1液と第2液とを予め規定混合比で混合した混合液を調製しておき、
該混合液を超純水に、添加後の超純水の導電率又は比抵抗が規定値となるように添加することを特徴とする規定濃度水の供給方法。 - 請求項1において、前記第1液はアルカリの水溶液であり、第2液はH 2O 2 の溶解水であることを特徴とする規定濃度水の供給方法。
- 導電性の酸又はアルカリの水溶液よりなる第1液と、H 2 ,H 2 O 2 又はO 3 の溶解水よりなる非導電性の第2液との少なくとも2種類の液が規定混合比で混合された混合液の貯留槽と、
該貯留槽内の混合液を超純水に薬注するための混合液送液手段と、
混合液が薬注された超純水の導電率又は比抵抗を計測する導電率計又は比抵抗計と、
混合液が薬注された超純水の瞬時流量を計測する瞬時流量計と、
該導電率計又は比抵抗計の検出値が規定となるように前記混合液送液手段を制御する制御手段と
を備えてなり、該混合液が添加された、規定濃度の第1液成分及び第2液成分を含んだ規定濃度水を製造する手段と、
製造された規定濃度水を半導体洗浄工程の洗浄機に送水する手段とを有する規定濃度水の供給装置。 - 請求項3において、前記第1液はアルカリの水溶液であり、第2液はH 2O 2 の溶解水であることを特徴とする規定濃度水の供給装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017068091A JP6602334B2 (ja) | 2017-03-30 | 2017-03-30 | 規定濃度水の供給方法及び装置 |
KR1020197010708A KR102415178B1 (ko) | 2017-03-30 | 2017-09-15 | 규정 농도수의 공급 방법 및 장치 |
PCT/JP2017/033550 WO2018179503A1 (ja) | 2017-03-30 | 2017-09-15 | 規定濃度水の供給方法及び装置 |
CN201780082842.8A CN110167661A (zh) | 2017-03-30 | 2017-09-15 | 规定浓度水的供给方法及装置 |
US16/497,957 US11565224B2 (en) | 2017-03-30 | 2017-09-15 | Method and apparatus for supplying water of specified concentration |
TW106132881A TW201836994A (zh) | 2017-03-30 | 2017-09-26 | 規定濃度水的供給方法及裝置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017068091A JP6602334B2 (ja) | 2017-03-30 | 2017-03-30 | 規定濃度水の供給方法及び装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018170450A JP2018170450A (ja) | 2018-11-01 |
JP6602334B2 true JP6602334B2 (ja) | 2019-11-06 |
Family
ID=63674969
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017068091A Active JP6602334B2 (ja) | 2017-03-30 | 2017-03-30 | 規定濃度水の供給方法及び装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US11565224B2 (ja) |
JP (1) | JP6602334B2 (ja) |
KR (1) | KR102415178B1 (ja) |
CN (1) | CN110167661A (ja) |
TW (1) | TW201836994A (ja) |
WO (1) | WO2018179503A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6835126B2 (ja) * | 2019-03-28 | 2021-02-24 | 栗田工業株式会社 | 希薄薬液製造装置 |
CN114247684B (zh) * | 2021-12-17 | 2023-04-14 | 北京北方华创微电子装备有限公司 | 供液系统和半导体清洗系统 |
CN115140815B (zh) * | 2022-05-27 | 2023-11-10 | 安徽普氏生态环境有限公司 | 一种精准溶药控制方法、系统及设备 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6050283A (en) * | 1995-07-07 | 2000-04-18 | Air Liquide America Corporation | System and method for on-site mixing of ultra-high-purity chemicals for semiconductor processing |
JP2000208471A (ja) * | 1999-01-11 | 2000-07-28 | Kurita Water Ind Ltd | 電子材料用洗浄水の調製装置 |
US6884359B2 (en) | 2000-09-27 | 2005-04-26 | Dainippon Ink And Chemicals, Inc. | Apparatus and method for controlling resistivity of ultra pure water |
JP2003334433A (ja) * | 2002-05-16 | 2003-11-25 | Kurita Water Ind Ltd | 連続溶解装置、連続溶解方法及び気体溶解水供給装置 |
JP4417642B2 (ja) * | 2003-03-17 | 2010-02-17 | 芝浦メカトロニクス株式会社 | 処理液の製造装置、製造方法及び基板の処理装置 |
JP2008211096A (ja) * | 2007-02-27 | 2008-09-11 | Ngk Insulators Ltd | 比抵抗制御装置 |
TWI508766B (zh) * | 2010-03-30 | 2015-11-21 | Kurita Water Ind Ltd | 水處理裝置 |
JP5484278B2 (ja) | 2010-09-17 | 2014-05-07 | オルガノ株式会社 | 過酸化水素濃度の測定装置及び測定方法 |
TWI574789B (zh) * | 2012-11-13 | 2017-03-21 | 氣體產品及化學品股份公司 | 漿料供應及/或化學品摻合物供應設備、方法、使用方法及製造方法 |
JP6059087B2 (ja) * | 2013-05-31 | 2017-01-11 | 東京エレクトロン株式会社 | 液処理装置、液処理方法および記憶媒体 |
-
2017
- 2017-03-30 JP JP2017068091A patent/JP6602334B2/ja active Active
- 2017-09-15 US US16/497,957 patent/US11565224B2/en active Active
- 2017-09-15 WO PCT/JP2017/033550 patent/WO2018179503A1/ja active Application Filing
- 2017-09-15 CN CN201780082842.8A patent/CN110167661A/zh active Pending
- 2017-09-15 KR KR1020197010708A patent/KR102415178B1/ko active IP Right Grant
- 2017-09-26 TW TW106132881A patent/TW201836994A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
US11565224B2 (en) | 2023-01-31 |
KR102415178B1 (ko) | 2022-06-29 |
JP2018170450A (ja) | 2018-11-01 |
KR20190127653A (ko) | 2019-11-13 |
CN110167661A (zh) | 2019-08-23 |
US20200316543A1 (en) | 2020-10-08 |
WO2018179503A1 (ja) | 2018-10-04 |
TW201836994A (zh) | 2018-10-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6602334B2 (ja) | 規定濃度水の供給方法及び装置 | |
KR102427577B1 (ko) | 희박 약액 제조 장치 | |
WO2020195341A1 (ja) | 希薄薬液製造装置 | |
JP2018182098A (ja) | 洗浄水供給装置 | |
KR102275626B1 (ko) | 희석액 제조장치 및 희석액 제조방법 | |
JP6738726B2 (ja) | 希釈液製造装置および希釈液製造方法 | |
KR20060095640A (ko) | 약액 혼합 공급 장치 및 방법 | |
CN116651832A (zh) | 一种晶片稳定清洗控制方法 | |
US10180211B2 (en) | Supply method for liquid and supply apparatus | |
EP4401114A1 (en) | Device for supplying liquid for semiconductor manufacturing | |
US20230335417A1 (en) | Wafer cleaning water supply system and wafer cleaning water supply method | |
CN114365269A (zh) | 稀药液供给装置 | |
US20240025785A1 (en) | Production device for ph/redox potential-adjusted water | |
KR100737752B1 (ko) | 처리액 공급장치 및 이를 이용한 처리액 공급방법 | |
JP2024032251A (ja) | ウェハ洗浄水供給装置 | |
KR20090030051A (ko) | 약액 공급 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170906 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20171205 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180202 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20180529 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20191008 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6602334 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |