TWI624001B - Substrate support device - Google Patents

Substrate support device Download PDF

Info

Publication number
TWI624001B
TWI624001B TW106108716A TW106108716A TWI624001B TW I624001 B TWI624001 B TW I624001B TW 106108716 A TW106108716 A TW 106108716A TW 106108716 A TW106108716 A TW 106108716A TW I624001 B TWI624001 B TW I624001B
Authority
TW
Taiwan
Prior art keywords
substrate
light
pattern
base layer
outer peripheral
Prior art date
Application number
TW106108716A
Other languages
English (en)
Chinese (zh)
Other versions
TW201727818A (zh
Inventor
Masaki Kato
Yoshiaki Kito
Masakazu Hori
Tohru Kiuchi
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW201727818A publication Critical patent/TW201727818A/zh
Application granted granted Critical
Publication of TWI624001B publication Critical patent/TWI624001B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Registering, Tensioning, Guiding Webs, And Rollers Therefor (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Laminated Bodies (AREA)
TW106108716A 2012-08-28 2013-04-12 Substrate support device TWI624001B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012188116 2012-08-28

Publications (2)

Publication Number Publication Date
TW201727818A TW201727818A (zh) 2017-08-01
TWI624001B true TWI624001B (zh) 2018-05-11

Family

ID=50182989

Family Applications (4)

Application Number Title Priority Date Filing Date
TW106108716A TWI624001B (zh) 2012-08-28 2013-04-12 Substrate support device
TW107111761A TWI658535B (zh) 2012-08-28 2013-04-12 Pattern forming device
TW108109820A TWI729366B (zh) 2012-08-28 2013-04-12 圖案形成裝置
TW102112961A TWI581362B (zh) 2012-08-28 2013-04-12 A substrate supporting device, and an exposure device

Family Applications After (3)

Application Number Title Priority Date Filing Date
TW107111761A TWI658535B (zh) 2012-08-28 2013-04-12 Pattern forming device
TW108109820A TWI729366B (zh) 2012-08-28 2013-04-12 圖案形成裝置
TW102112961A TWI581362B (zh) 2012-08-28 2013-04-12 A substrate supporting device, and an exposure device

Country Status (7)

Country Link
JP (4) JP6245174B2 (ko)
KR (4) KR101999497B1 (ko)
CN (3) CN106886133B (ko)
HK (2) HK1207694A1 (ko)
IN (1) IN2015DN01909A (ko)
TW (4) TWI624001B (ko)
WO (1) WO2014034161A1 (ko)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106886133B (zh) * 2012-08-28 2018-06-29 株式会社尼康 图案形成装置及衬底支承装置
TWI674484B (zh) * 2014-04-01 2019-10-11 日商尼康股份有限公司 基板處理方法
WO2015152217A1 (ja) * 2014-04-01 2015-10-08 株式会社ニコン 基板処理装置、デバイス製造方法及び基板処理装置の調整方法
TWI692830B (zh) * 2014-09-04 2020-05-01 日商尼康股份有限公司 處理系統
KR102345439B1 (ko) * 2015-01-15 2021-12-30 삼성디스플레이 주식회사 롤투롤 노광 시스템
JP6413784B2 (ja) * 2015-01-19 2018-10-31 株式会社ニコン 基板処理装置及びデバイス製造方法
TWI720911B (zh) * 2015-02-27 2021-03-01 日商尼康股份有限公司 圖案描繪裝置
WO2016152758A1 (ja) * 2015-03-20 2016-09-29 株式会社ニコン ビーム走査装置、ビーム走査方法、および描画装置
JP2017058494A (ja) * 2015-09-16 2017-03-23 株式会社ニコン パターン描画装置、パターン描画方法、基板処理装置、および、デバイス製造方法
CN111781807B (zh) * 2015-10-30 2024-01-12 株式会社尼康 基板处理装置及元件制造方法
JP6551175B2 (ja) * 2015-11-10 2019-07-31 株式会社ニコン 回転円筒体の計測装置、基板処理装置及びデバイス製造方法
US9918375B2 (en) * 2015-11-16 2018-03-13 Kla-Tencor Corporation Plasma based light source having a target material coated on a cylindrically-symmetric element
JP6589607B2 (ja) * 2015-12-04 2019-10-16 株式会社ニコン 描画装置および描画方法
KR102541913B1 (ko) 2016-03-30 2023-06-13 가부시키가이샤 니콘 패턴 묘화 장치, 패턴 묘화 방법, 및 디바이스 제조 방법
KR102379193B1 (ko) * 2016-05-19 2022-03-28 가부시키가이샤 니콘 기판 지지 장치, 노광 장치, 및 패터닝 장치
TWI736621B (zh) * 2016-10-04 2021-08-21 日商尼康股份有限公司 圖案描繪裝置及圖案描繪方法
JP6680330B2 (ja) * 2018-09-14 2020-04-15 株式会社ニコン パターン形成装置
JP6587026B2 (ja) * 2018-10-30 2019-10-09 株式会社ニコン パターン露光装置
CN112114499B (zh) * 2019-06-19 2022-02-11 上海微电子装备（集团）股份有限公司 一种曝光装置、光刻设备及太阳能电池电极的制备方法
JP6787447B2 (ja) * 2019-06-27 2020-11-18 株式会社ニコン 基板処理装置
JP6996580B2 (ja) * 2020-03-05 2022-01-17 株式会社ニコン 基板処理方法
US20220244631A1 (en) * 2021-02-03 2022-08-04 Visera Technologies Company Limited Exposure mask
EP4382870A1 (en) * 2022-12-08 2024-06-12 Kaunas University of Technology Anti-fogging incremental scales for optical encoders and fabrication method thereof

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Publication number Priority date Publication date Assignee Title
JPH05205997A (ja) * 1992-01-29 1993-08-13 Canon Inc 基板保持盤
JP2006064992A (ja) * 2004-08-26 2006-03-09 Kyocera Corp 液晶基板保持盤とその製造方法
TW200728931A (en) * 2005-09-07 2007-08-01 Fujifilm Corp Pattern exposure method and pattern exposure apparatus
US20090279101A1 (en) * 2008-05-08 2009-11-12 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Electrostatic Chuck With Anti-Reflective Coating, Measuring Method and Use of Said Chuck
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Also Published As

Publication number Publication date
KR101999497B1 (ko) 2019-07-11
JP6414308B2 (ja) 2018-10-31
TW201409603A (zh) 2014-03-01
KR101812857B1 (ko) 2017-12-27
TWI581362B (zh) 2017-05-01
WO2014034161A1 (ja) 2014-03-06
IN2015DN01909A (ko) 2015-08-07
HK1246408A1 (zh) 2018-09-07
TWI658535B (zh) 2019-05-01
CN104583874B (zh) 2017-11-03
CN106886133A (zh) 2017-06-23
TW201828405A (zh) 2018-08-01
JPWO2014034161A1 (ja) 2016-08-08
JP2018189989A (ja) 2018-11-29
CN104583874A (zh) 2015-04-29
TW201926542A (zh) 2019-07-01
JP6245174B2 (ja) 2017-12-13
KR20180112115A (ko) 2018-10-11
JP2017083855A (ja) 2017-05-18
CN107656427A (zh) 2018-02-02
JP6558484B2 (ja) 2019-08-14
KR101907365B1 (ko) 2018-10-11
JP6229785B2 (ja) 2017-11-15
CN106886133B (zh) 2018-06-29
KR20150048113A (ko) 2015-05-06
KR101855612B1 (ko) 2018-05-04
KR20180035950A (ko) 2018-04-06
KR20160143892A (ko) 2016-12-14
TWI729366B (zh) 2021-06-01
TW201727818A (zh) 2017-08-01
HK1207694A1 (en) 2016-02-05
CN107656427B (zh) 2020-07-03
JP2018013805A (ja) 2018-01-25

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