TWI596125B - 嵌段共聚物 - Google Patents

嵌段共聚物 Download PDF

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Publication number
TWI596125B
TWI596125B TW103142782A TW103142782A TWI596125B TW I596125 B TWI596125 B TW I596125B TW 103142782 A TW103142782 A TW 103142782A TW 103142782 A TW103142782 A TW 103142782A TW I596125 B TWI596125 B TW I596125B
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Taiwan
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block
block copolymer
group
formula
chain
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TW103142782A
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English (en)
Chinese (zh)
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TW201538548A (zh
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金廷根
李濟權
朴魯振
尹聖琇
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Ｌｇ化學股份有限公司
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    • C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
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    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
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    • C07C217/00—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton
    • C07C217/78—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton
    • C07C217/80—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of non-condensed six-membered aromatic rings
    • C07C217/82—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of non-condensed six-membered aromatic rings of the same non-condensed six-membered aromatic ring
    • C07C217/84—Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of non-condensed six-membered aromatic rings of the same non-condensed six-membered aromatic ring the oxygen atom of at least one of the etherified hydroxy groups being further bound to an acyclic carbon atom
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    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/03—Use of a di- or tri-thiocarbonylthio compound, e.g. di- or tri-thioester, di- or tri-thiocarbamate, or a xanthate as chain transfer agent, e.g . Reversible Addition Fragmentation chain Transfer [RAFT] or Macromolecular Design via Interchange of Xanthates [MADIX]
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2353/00—Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers
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Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105873968B (zh) 2013-12-06 2018-09-28 株式会社Lg化学 嵌段共聚物
WO2015084133A1 (ko) 2013-12-06 2015-06-11 주식회사 엘지화학 블록 공중합체
EP3101043B1 (en) 2013-12-06 2021-01-27 LG Chem, Ltd. Block copolymer
EP3078694B1 (en) 2013-12-06 2021-01-27 LG Chem, Ltd. Block copolymer
WO2015084130A1 (ko) 2013-12-06 2015-06-11 주식회사 엘지화학 블록 공중합체
CN105934455B (zh) 2013-12-06 2019-01-18 株式会社Lg化学 嵌段共聚物
WO2015084124A1 (ko) 2013-12-06 2015-06-11 주식회사 엘지화학 블록 공중합체
EP3078691B1 (en) 2013-12-06 2018-04-18 LG Chem, Ltd. Block copolymer
JP6432847B2 (ja) 2013-12-06 2018-12-05 エルジー・ケム・リミテッド ブロック共重合体
US10239980B2 (en) 2013-12-06 2019-03-26 Lg Chem, Ltd. Block copolymer
US10081698B2 (en) 2013-12-06 2018-09-25 Lg Chem, Ltd. Block copolymer
KR101780097B1 (ko) * 2013-12-06 2017-09-19 주식회사 엘지화학 블록 공중합체
EP3078685B1 (en) 2013-12-06 2020-09-09 LG Chem, Ltd. Block copolymer
JP6483694B2 (ja) 2013-12-06 2019-03-13 エルジー・ケム・リミテッド 単量体およびブロック共重合体
JP6483693B2 (ja) 2013-12-06 2019-03-13 エルジー・ケム・リミテッド ブロック共重合体
CN107075028B (zh) 2014-09-30 2020-04-03 株式会社Lg化学 嵌段共聚物
WO2016053011A1 (ko) 2014-09-30 2016-04-07 주식회사 엘지화학 블록 공중합체
CN107077066B9 (zh) 2014-09-30 2021-05-14 株式会社Lg化学 制造图案化基底的方法
JP6394798B2 (ja) 2014-09-30 2018-09-26 エルジー・ケム・リミテッド ブロック共重合体
WO2016052994A1 (ko) 2014-09-30 2016-04-07 주식회사 엘지화학 블록 공중합체
JP6637495B2 (ja) 2014-09-30 2020-01-29 エルジー・ケム・リミテッド パターン化基板の製造方法
US10310378B2 (en) 2014-09-30 2019-06-04 Lg Chem, Ltd. Block copolymer
US10633533B2 (en) 2014-09-30 2020-04-28 Lg Chem, Ltd. Block copolymer
US10703897B2 (en) 2014-09-30 2020-07-07 Lg Chem, Ltd. Block copolymer
JP6538158B2 (ja) 2014-09-30 2019-07-03 エルジー・ケム・リミテッド ブロック共重合体
JP7078211B2 (ja) * 2016-11-30 2022-05-31 エルジー・ケム・リミテッド 高分子組成物
US11299596B2 (en) 2016-11-30 2022-04-12 Lg Chem, Ltd. Laminate
KR102096271B1 (ko) * 2016-11-30 2020-05-27 주식회사 엘지화학 블록 공중합체
KR102096274B1 (ko) * 2016-11-30 2020-04-02 주식회사 엘지화학 블록 공중합체
KR101946775B1 (ko) * 2016-11-30 2019-02-12 주식회사 엘지화학 블록 공중합체
KR102261687B1 (ko) 2016-11-30 2021-06-08 주식회사 엘지화학 적층체
KR102183698B1 (ko) 2016-11-30 2020-11-26 주식회사 엘지화학 고분자막의 제조 방법
KR102096272B1 (ko) * 2016-11-30 2020-04-02 주식회사 엘지화학 블록 공중합체
KR102277770B1 (ko) * 2017-07-14 2021-07-15 주식회사 엘지화학 블록 공중합체 막의 평탄화 방법 및 패턴 형성 방법
KR102096276B1 (ko) 2017-07-14 2020-04-03 주식회사 엘지화학 중성층 조성물
JP7027668B2 (ja) 2017-07-14 2022-03-02 エルジー・ケム・リミテッド 中性層組成物
KR102096270B1 (ko) * 2017-07-14 2020-04-02 주식회사 엘지화학 중성층 조성물
TWI805617B (zh) * 2017-09-15 2023-06-21 南韓商Ｌｇ化學股份有限公司 層壓板
KR102146538B1 (ko) * 2017-11-07 2020-08-20 주식회사 엘지화학 고분자 조성물
KR102436923B1 (ko) * 2018-01-26 2022-08-26 주식회사 엘지화학 광 감응기를 포함하는 블록 공중합체
KR102484629B1 (ko) * 2018-08-16 2023-01-04 주식회사 엘지화학 중성층 조성물
KR102484628B1 (ko) * 2018-08-16 2023-01-04 주식회사 엘지화학 중성층 조성물
KR102484627B1 (ko) * 2018-08-16 2023-01-04 주식회사 엘지화학 피닝층 조성물
KR102522249B1 (ko) * 2018-08-16 2023-04-17 주식회사 엘지화학 패턴화 기판의 제조 방법
KR102550419B1 (ko) 2018-08-16 2023-07-04 주식회사 엘지화학 블록 공중합체
KR102498631B1 (ko) * 2018-08-16 2023-02-10 주식회사 엘지화학 패턴화 기판의 제조 방법
KR102484630B1 (ko) * 2018-08-16 2023-01-04 주식회사 엘지화학 패턴화 기판의 제조 방법
KR102484626B1 (ko) * 2018-08-16 2023-01-04 주식회사 엘지화학 기판의 제조 방법
KR102534530B1 (ko) * 2018-08-31 2023-05-19 주식회사 엘지화학 패턴화 기판의 제조 방법
KR102522182B1 (ko) * 2018-08-31 2023-04-14 주식회사 엘지화학 패턴화 기판의 제조 방법
KR20210103167A (ko) 2020-02-13 2021-08-23 삼성전자주식회사 반도체 패키지

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002145973A (ja) * 2000-11-08 2002-05-22 National Institute Of Advanced Industrial & Technology シンジオタクチック芳香族ビニル系ブロック共重合体およびその製造方法
KR100622353B1 (ko) * 1998-12-30 2006-09-11 노베온, 인코포레이티드 각질을 처리하기 위한 분지형/블록형 공중합체
TW201536823A (zh) * 2013-12-06 2015-10-01 Lg Chemical Ltd 嵌段共聚物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3121116B2 (ja) * 1992-05-21 2000-12-25 出光興産株式会社 スチレン系ブロック共重合体及びその製造方法
US5728431A (en) * 1996-09-20 1998-03-17 Texas A&M University System Process for forming self-assembled polymer layers on a metal surface
JP4453814B2 (ja) * 2003-11-12 2010-04-21 Ｊｓｒ株式会社 重合性化合物および混合物ならびに液晶表示素子の製造方法
JP2010115832A (ja) 2008-11-12 2010-05-27 Panasonic Corp ブロックコポリマーの自己組織化促進方法及びそれを用いたブロックコポリマーの自己組織化パターン形成方法
CN101492520A (zh) * 2009-03-04 2009-07-29 中国科学院上海有机化学研究所 含有全氟环丁基芳基醚嵌段的两嵌段聚合物、制备方法及用途
JP5505371B2 (ja) * 2010-06-01 2014-05-28 信越化学工業株式会社 高分子化合物、化学増幅ポジ型レジスト材料、及びパターン形成方法
KR20140090595A (ko) * 2011-09-06 2014-07-17 코넬 유니버시티 블럭 공중합체 및 그것을 사용한 리소그래피 패턴화

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100622353B1 (ko) * 1998-12-30 2006-09-11 노베온, 인코포레이티드 각질을 처리하기 위한 분지형/블록형 공중합체
JP2002145973A (ja) * 2000-11-08 2002-05-22 National Institute Of Advanced Industrial & Technology シンジオタクチック芳香族ビニル系ブロック共重合体およびその製造方法
TW201536823A (zh) * 2013-12-06 2015-10-01 Lg Chemical Ltd 嵌段共聚物

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