TWI557194B - 具抗靜電性質之光學裝置 - Google Patents
具抗靜電性質之光學裝置 Download PDFInfo
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- TWI557194B TWI557194B TW099137363A TW99137363A TWI557194B TW I557194 B TWI557194 B TW I557194B TW 099137363 A TW099137363 A TW 099137363A TW 99137363 A TW99137363 A TW 99137363A TW I557194 B TWI557194 B TW I557194B
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- optical
- optical device
- optical member
- film
- coating
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- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/269—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension including synthetic resin or polymer layer or component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31609—Particulate metal or metal compound-containing
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31721—Of polyimide
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/31931—Polyene monomer-containing
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/31935—Ester, halide or nitrile of addition polymer
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- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Polarising Elements (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Optical Elements Other Than Lenses (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Polymerisation Methods In General (AREA)
- Elimination Of Static Electricity (AREA)
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| US25664109P | 2009-10-30 | 2009-10-30 |
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Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5881317B2 (ja) * | 2011-06-14 | 2016-03-09 | Kjケミカルズ株式会社 | 不飽和第4級アンモニウム塩化合物の製造方法及びそれからなる帯電防止剤と帯電防止組成物 |
| JP5885459B2 (ja) * | 2011-10-21 | 2016-03-15 | Kjケミカルズ株式会社 | 非水溶性イオン性ビニルモノマーの製造方法及びそれからなる帯電防止剤と帯電防止組成物 |
| JP2016027354A (ja) * | 2013-07-19 | 2016-02-18 | 富士フイルム株式会社 | 偏光板用積層体、これを含む偏光板および液晶表示装置 |
| CN107001252B (zh) | 2014-12-16 | 2019-04-26 | 3M创新有限公司 | 离子型二醇抗静电聚氨酯及其制备方法 |
| US10227426B2 (en) | 2014-12-16 | 2019-03-12 | 3M Innovative Properties Company | Antistatic polymers and methods of making the same |
| US10113023B2 (en) | 2014-12-16 | 2018-10-30 | 3M Innovative Properties Company | Antistatic polymers and methods of making the same |
| CN208488734U (zh) * | 2015-08-21 | 2019-02-12 | 3M创新有限公司 | 包括金属迹线的透明导体 |
| JP6373299B2 (ja) * | 2016-06-02 | 2018-08-15 | 日東電工株式会社 | 粘着剤層付偏光フィルムおよび画像表示装置 |
| JP7024309B2 (ja) * | 2017-10-16 | 2022-02-24 | Dic株式会社 | 活性エネルギー線硬化性組成物及びそれを用いたフィルム |
| US11667766B2 (en) | 2018-01-26 | 2023-06-06 | Hewlett-Packard Development Company, L.P. | Three-dimensional printing |
| JP7074515B2 (ja) * | 2018-03-15 | 2022-05-24 | 三菱マテリアル電子化成株式会社 | 反応性含フッ素スルホニルイミドとその共重合体、並びにそれらを含有する溶液 |
| CN108976338A (zh) * | 2018-07-10 | 2018-12-11 | 东南大学 | 一种新型显示用光学材料及其制备方法 |
| TW202013986A (zh) * | 2018-09-18 | 2020-04-01 | 固昌通訊股份有限公司 | 主動抗噪式的耳內麥克風 |
| WO2020225717A1 (en) | 2019-05-08 | 2020-11-12 | 3M Innovative Properties Company | Nanostructured article |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009057436A (ja) * | 2007-08-31 | 2009-03-19 | Toyo Ink Mfg Co Ltd | 帯電防止ポリマーおよびその用途 |
| TW200920829A (en) * | 2007-07-23 | 2009-05-16 | 3M Innovative Properties Co | Antistatic article, method of making the same, and display device having the same |
| US20090184442A1 (en) * | 2002-08-16 | 2009-07-23 | Sabic Innovative Plastics Ip B.V. | Antistatic agents, compositions thereof, and methods of manufacture |
| JP2009179671A (ja) * | 2008-01-30 | 2009-08-13 | Toyo Ink Mfg Co Ltd | 難水溶性帯電防止性重合性化合物、及び該化合物を含有する帯電防止性重合性組成物、並びに帯電防止性を有する重合体 |
| JP2009179727A (ja) * | 2008-01-31 | 2009-08-13 | Sanyo Chem Ind Ltd | 活性エネルギー線硬化型帯電防止性樹脂組成物 |
Family Cites Families (70)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4262072A (en) | 1979-06-25 | 1981-04-14 | Minnesota Mining And Manufacturing Company | Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings |
| JPH02173601A (ja) | 1988-12-26 | 1990-07-05 | Kuraray Co Ltd | 防眩フイルター |
| US5175030A (en) | 1989-02-10 | 1992-12-29 | Minnesota Mining And Manufacturing Company | Microstructure-bearing composite plastic articles and method of making |
| US5183597A (en) | 1989-02-10 | 1993-02-02 | Minnesota Mining And Manufacturing Company | Method of molding microstructure bearing composite plastic articles |
| US5161041A (en) | 1990-04-26 | 1992-11-03 | Ois Optical Imaging Systems, Inc. | Lighting assembly for a backlit electronic display including an integral image splitting and collimating means |
| US5427835A (en) | 1992-06-04 | 1995-06-27 | Minnesota Mining And Manufacturing Company | Sulfopolymer/vanadium oxide antistatic compositions |
| US5882774A (en) | 1993-12-21 | 1999-03-16 | Minnesota Mining And Manufacturing Company | Optical film |
| US5828488A (en) | 1993-12-21 | 1998-10-27 | Minnesota Mining And Manufacturing Co. | Reflective polarizer display |
| DE69602588T2 (de) | 1995-03-03 | 1999-10-14 | Minnesota Mining & Mfg | Lichtlenkender film mit in der höhe variierender strukturierter oberfläche und daraus hergestellter lichtlenkender artikel |
| US5783120A (en) | 1996-02-29 | 1998-07-21 | Minnesota Mining And Manufacturing Company | Method for making an optical film |
| US5825543A (en) | 1996-02-29 | 1998-10-20 | Minnesota Mining And Manufacturing Company | Diffusely reflecting polarizing element including a first birefringent phase and a second phase |
| WO2009079275A1 (en) | 2007-12-14 | 2009-06-25 | 3M Innovative Properties Company | Optical article |
| US5919551A (en) | 1996-04-12 | 1999-07-06 | 3M Innovative Properties Company | Variable pitch structured optical film |
| US6280063B1 (en) | 1997-05-09 | 2001-08-28 | 3M Innovative Properties Company | Brightness enhancement article |
| JPH1114807A (ja) * | 1997-06-25 | 1999-01-22 | Dainippon Printing Co Ltd | レンズフイルム、面光源及び液晶表示装置 |
| US6577358B1 (en) | 1997-06-25 | 2003-06-10 | Dai Nippon Printing Co., Ltd. | Lens film with conductive lens layer or conductive layer |
| US6358601B1 (en) | 1997-07-11 | 2002-03-19 | 3M Innovative Properties Company | Antistatic ceramer hardcoat composition with improved antistatic characteristics |
| EP1975649A1 (en) | 1998-02-18 | 2008-10-01 | Minnesota Mining And Manufacturing Company | Optical film |
| JP4055918B2 (ja) * | 1998-03-27 | 2008-03-05 | 大日本印刷株式会社 | 透明導電性カバーテープ |
| JP3118224B2 (ja) * | 1998-11-20 | 2000-12-18 | 大日本印刷株式会社 | 静電画像記録再生方法 |
| US6277471B1 (en) | 1999-06-18 | 2001-08-21 | Shih Chieh Tang | Brightness enhancement film |
| US6372829B1 (en) | 1999-10-06 | 2002-04-16 | 3M Innovative Properties Company | Antistatic composition |
| US6581286B2 (en) | 2000-04-05 | 2003-06-24 | 3M Innovative Properties Company | Method of making tool to produce optical film |
| BR0206297A (pt) | 2001-01-10 | 2004-01-06 | 3M Innovative Properties Co | Dispositivo e método para revestir substratos de comprimento limitado e para melhorar a uniformidade de revestimentos não uniformes ou defeituosos |
| EP1414896B1 (en) * | 2001-08-02 | 2005-01-12 | 3M Innovative Properties Company | Optically clear and antistatic pressure sensitive adhesives |
| US6924329B2 (en) | 2001-11-05 | 2005-08-02 | 3M Innovative Properties Company | Water- and oil-repellent, antistatic compositions |
| JP3631992B2 (ja) * | 2001-11-13 | 2005-03-23 | 日東電工株式会社 | 配線回路基板 |
| JP3737740B2 (ja) | 2001-11-13 | 2006-01-25 | 帝人デュポンフィルム株式会社 | 帯電防止性積層ポリエステルフィルム |
| KR100813953B1 (ko) * | 2002-04-22 | 2008-03-14 | 삼성전자주식회사 | 대전방지성을 갖는 광경화성 수지 조성물 |
| DE60314433T2 (de) | 2002-09-20 | 2008-02-14 | Nisshinbo Industries, Inc. | Zusammensetzung für polyelektrolyte,polyelektrolyte,elektrische doppelschichtkondensatoren und sekundärzellen mit wasserfreiem elektrolyt |
| TW582552U (en) | 2003-03-24 | 2004-04-01 | Shih-Chieh Tang | Brightness unit structure for a brightness enhancement film |
| US7041365B2 (en) | 2003-05-12 | 2006-05-09 | 3M Innovative Properties Company | Static dissipative optical construction |
| US7074463B2 (en) | 2003-09-12 | 2006-07-11 | 3M Innovative Properties Company | Durable optical element |
| JP4780269B2 (ja) | 2004-03-11 | 2011-09-28 | 日清紡ホールディングス株式会社 | 無溶剤型液状組成物 |
| WO2005098481A1 (ja) | 2004-03-31 | 2005-10-20 | Dai Nippon Printing Co., Ltd. | 干渉縞の発生を防止した帯電防止性反射防止フィルム |
| TWI387629B (zh) * | 2004-07-26 | 2013-03-01 | Nitto Denko Corp | 壓感黏合劑組成物、壓感黏合片及表面保護膜 |
| JP5030251B2 (ja) * | 2004-07-26 | 2012-09-19 | 日東電工株式会社 | 粘着剤組成物、粘着シート類及び表面保護フィルム |
| JP4362093B2 (ja) | 2004-08-06 | 2009-11-11 | 大日本印刷株式会社 | 帯電防止膜形成用の電離放射線硬化性組成物と帯電防止膜および帯電防止膜を備えた構造体 |
| JP2006103033A (ja) | 2004-10-01 | 2006-04-20 | Tamapori Kk | 帯電防止フィルム及びその製造方法 |
| US7345137B2 (en) | 2004-10-18 | 2008-03-18 | 3M Innovative Properties Company | Modified copolyesters and optical films including modified copolyesters |
| JP2006117895A (ja) | 2004-10-25 | 2006-05-11 | Ta Chemical Co | 光硬化性組成物 |
| JP4888680B2 (ja) | 2004-11-15 | 2012-02-29 | パイオトレック株式会社 | 帯電防止剤およびその使用方法 |
| US7416309B2 (en) * | 2004-12-30 | 2008-08-26 | 3M Innovative Properties Company | Optical film having a surface with rounded structures |
| JP2006232882A (ja) * | 2005-02-22 | 2006-09-07 | Nitto Denko Corp | 粘着剤組成物、粘着シート類および両面粘着テープ |
| US7586566B2 (en) | 2005-06-03 | 2009-09-08 | 3M Innovative Properties Company | Brightness enhancing film and display device having the same |
| TWI274896B (en) | 2005-06-30 | 2007-03-01 | Efun Technology Co Ltd | Brightness enhancement film having reinforcing layer |
| JP4778274B2 (ja) * | 2005-06-30 | 2011-09-21 | 三光化学工業株式会社 | 制電性重合体組成物及びそれを用いた成形品 |
| TWI384049B (zh) * | 2005-09-05 | 2013-02-01 | Nitto Denko Corp | Adhesive composition, adhesive sheet and surface protective film |
| TWI391711B (zh) | 2005-09-13 | 2013-04-01 | 迎輝科技股份有限公司 | 具有導光構造之聚光片 |
| JP5145938B2 (ja) * | 2005-09-16 | 2013-02-20 | 大日本印刷株式会社 | 帯電防止防眩フィルム |
| US7777832B2 (en) | 2005-11-18 | 2010-08-17 | 3M Innovative Properties Company | Multi-function enhancement film |
| JP2007165729A (ja) | 2005-12-15 | 2007-06-28 | Sumida Corporation | インダクタ |
| JP2007260983A (ja) | 2006-03-27 | 2007-10-11 | Fujifilm Corp | 光学シートおよび接着層の製造方法 |
| JP2007271673A (ja) | 2006-03-30 | 2007-10-18 | Nitto Denko Corp | 光拡散フィルムの製造方法 |
| US8092904B2 (en) * | 2006-03-31 | 2012-01-10 | 3M Innovative Properties Company | Optical article having an antistatic layer |
| JP5154772B2 (ja) | 2006-07-19 | 2013-02-27 | リンテック株式会社 | 反射防止フィルム |
| TWI290232B (en) * | 2006-07-27 | 2007-11-21 | Eternal Chemical Co Ltd | Scratch-resistant optical film |
| US8986812B2 (en) | 2007-07-09 | 2015-03-24 | 3M Innovative Properties Company | Thin microstructured optical films |
| US8623140B2 (en) | 2007-07-25 | 2014-01-07 | 3M Innovative Properties Company | System and method for making a film having a matte finish |
| JP5483808B2 (ja) * | 2007-08-14 | 2014-05-07 | チェイル インダストリーズ インコーポレイテッド | 粘着剤組成物及び光学部材 |
| JP2009066986A (ja) * | 2007-09-14 | 2009-04-02 | Fujifilm Corp | 表面機能性材料及びその製造方法 |
| JP2009149834A (ja) * | 2007-11-28 | 2009-07-09 | Toyo Ink Mfg Co Ltd | 制電性アクリル系樹脂組成物、及び制電性アクリル系粘着剤組成物並びに光学部材用保護フィルム |
| JP5260273B2 (ja) | 2007-12-27 | 2013-08-14 | 三洋化成工業株式会社 | 活性エネルギー線硬化型帯電防止性樹脂組成物 |
| JP4340321B1 (ja) | 2008-05-16 | 2009-10-07 | 株式会社オプトメイト | 積層光学フィルム、その製造方法及びそれを用いた光学デバイス |
| JP2011526307A (ja) | 2008-06-03 | 2011-10-06 | スリーエム イノベイティブ プロパティズ カンパニー | ポリアルキル窒素又はリン含有フルオロアルキルスルホニルオニウム塩を含むミクロ構造 |
| US8143336B2 (en) | 2008-08-07 | 2012-03-27 | Momentive Performance Materials Inc. | Activated halo-containing aralkylsilane composition, process of preparing same and rubber compositions made therefrom |
| JP4586088B2 (ja) | 2008-08-19 | 2010-11-24 | ファナック株式会社 | 往復直線駆動装置 |
| CN102460231B (zh) | 2009-06-02 | 2016-05-18 | 3M创新有限公司 | 光重新定向膜和使用此膜的显示器 |
| TW201103885A (en) | 2009-07-22 | 2011-02-01 | Daxon Technology Inc | Antistatic ionic compound, oligomer thereof, copolymer thereof, and pressure-sensitive adhesive composition |
| KR20120061911A (ko) | 2009-08-25 | 2012-06-13 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 광 방향 전환 필름 및 이를 포함하는 디스플레이 시스템 |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090184442A1 (en) * | 2002-08-16 | 2009-07-23 | Sabic Innovative Plastics Ip B.V. | Antistatic agents, compositions thereof, and methods of manufacture |
| TW200920829A (en) * | 2007-07-23 | 2009-05-16 | 3M Innovative Properties Co | Antistatic article, method of making the same, and display device having the same |
| JP2009057436A (ja) * | 2007-08-31 | 2009-03-19 | Toyo Ink Mfg Co Ltd | 帯電防止ポリマーおよびその用途 |
| JP2009179671A (ja) * | 2008-01-30 | 2009-08-13 | Toyo Ink Mfg Co Ltd | 難水溶性帯電防止性重合性化合物、及び該化合物を含有する帯電防止性重合性組成物、並びに帯電防止性を有する重合体 |
| JP2009179727A (ja) * | 2008-01-31 | 2009-08-13 | Sanyo Chem Ind Ltd | 活性エネルギー線硬化型帯電防止性樹脂組成物 |
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| JP2020057011A (ja) | 2020-04-09 |
| US20120288675A1 (en) | 2012-11-15 |
| EP2493941B1 (en) | 2017-09-20 |
| WO2011053709A3 (en) | 2012-12-20 |
| WO2011053709A2 (en) | 2011-05-05 |
| US20180030281A1 (en) | 2018-02-01 |
| CN102906126B (zh) | 2018-02-16 |
| EP2493941A2 (en) | 2012-09-05 |
| JP2018132774A (ja) | 2018-08-23 |
| KR101831997B1 (ko) | 2018-04-04 |
| CN102906126A (zh) | 2013-01-30 |
| US11111392B2 (en) | 2021-09-07 |
| KR20120088761A (ko) | 2012-08-08 |
| JP2016197246A (ja) | 2016-11-24 |
| TW201124491A (en) | 2011-07-16 |
| JP2013509619A (ja) | 2013-03-14 |
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