KR101831997B1 - 정전기 방지성을 갖는 광학 장치 - Google Patents

정전기 방지성을 갖는 광학 장치 Download PDF

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KR101831997B1
KR101831997B1 KR1020127013548A KR20127013548A KR101831997B1 KR 101831997 B1 KR101831997 B1 KR 101831997B1 KR 1020127013548 A KR1020127013548 A KR 1020127013548A KR 20127013548 A KR20127013548 A KR 20127013548A KR 101831997 B1 KR101831997 B1 KR 101831997B1
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South Korea
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delete delete
optical
coating
antistatic
film
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Korean (ko)
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KR20120088761A (ko
Inventor
토마스 피 클룬
브랜트 케이 카터
마이클 케이 제를라흐
마푸자 비 알리
마크 제이 펠러라이트
토마스 엠 스나이더
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쓰리엠 이노베이티브 프로퍼티즈 컴파니
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/308—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/16—Anti-static materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/103—Esters of polyhydric alcohols or polyhydric phenols of trialcohols, e.g. trimethylolpropane tri(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/104—Esters of polyhydric alcohols or polyhydric phenols of tetraalcohols, e.g. pentaerythritol tetra(meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/36—Amides or imides
    • C08F222/40—Imides, e.g. cyclic imides
    • C08F222/408—Imides, e.g. cyclic imides substituted imides comprising other heteroatoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00—Properties
    • C08L2201/04—Antistatic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/269—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension including synthetic resin or polymer layer or component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31609—Particulate metal or metal compound-containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31721—Of polyimide
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31931—Polyene monomer-containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31935—Ester, halide or nitrile of addition polymer

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Polarising Elements (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Polymerisation Methods In General (AREA)
  • Elimination Of Static Electricity (AREA)
KR1020127013548A 2009-10-30 2010-10-28 정전기 방지성을 갖는 광학 장치 Active KR101831997B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US25664109P 2009-10-30 2009-10-30
US61/256,641 2009-10-30
PCT/US2010/054509 WO2011053709A2 (en) 2009-10-30 2010-10-28 Optical device with antistatic property

Publications (2)

Publication Number Publication Date
KR20120088761A KR20120088761A (ko) 2012-08-08
KR101831997B1 true KR101831997B1 (ko) 2018-04-04

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Country Status (7)

Country Link
US (2) US20120288675A1 (enExample)
EP (1) EP2493941B1 (enExample)
JP (4) JP2013509619A (enExample)
KR (1) KR101831997B1 (enExample)
CN (1) CN102906126B (enExample)
TW (1) TWI557194B (enExample)
WO (1) WO2011053709A2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5881317B2 (ja) * 2011-06-14 2016-03-09 Ｋｊケミカルズ株式会社 不飽和第４級アンモニウム塩化合物の製造方法及びそれからなる帯電防止剤と帯電防止組成物
JP5885459B2 (ja) * 2011-10-21 2016-03-15 Ｋｊケミカルズ株式会社 非水溶性イオン性ビニルモノマーの製造方法及びそれからなる帯電防止剤と帯電防止組成物
JP2016027354A (ja) * 2013-07-19 2016-02-18 富士フイルム株式会社 偏光板用積層体、これを含む偏光板および液晶表示装置
CN107001252B (zh) 2014-12-16 2019-04-26 3M创新有限公司 离子型二醇抗静电聚氨酯及其制备方法
US10227426B2 (en) 2014-12-16 2019-03-12 3M Innovative Properties Company Antistatic polymers and methods of making the same
US10113023B2 (en) 2014-12-16 2018-10-30 3M Innovative Properties Company Antistatic polymers and methods of making the same
CN208488734U (zh) * 2015-08-21 2019-02-12 3M创新有限公司 包括金属迹线的透明导体
JP6373299B2 (ja) * 2016-06-02 2018-08-15 日東電工株式会社 粘着剤層付偏光フィルムおよび画像表示装置
JP7024309B2 (ja) * 2017-10-16 2022-02-24 Dic株式会社 活性エネルギー線硬化性組成物及びそれを用いたフィルム
US11667766B2 (en) 2018-01-26 2023-06-06 Hewlett-Packard Development Company, L.P. Three-dimensional printing
JP7074515B2 (ja) * 2018-03-15 2022-05-24 三菱マテリアル電子化成株式会社 反応性含フッ素スルホニルイミドとその共重合体、並びにそれらを含有する溶液
CN108976338A (zh) * 2018-07-10 2018-12-11 东南大学 一种新型显示用光学材料及其制备方法
TW202013986A (zh) * 2018-09-18 2020-04-01 固昌通訊股份有限公司 主動抗噪式的耳內麥克風
WO2020225717A1 (en) 2019-05-08 2020-11-12 3M Innovative Properties Company Nanostructured article

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004536940A (ja) * 2001-08-02 2004-12-09 スリーエム イノベイティブ プロパティズ カンパニー 光学的に透明な帯電防止性感圧粘着剤
US20080192351A1 (en) 2004-03-31 2008-08-14 Dai Nippon Printing Co., Ltd Antistatic Antireflection Film Free From Occurrence Of Interference Fringes
WO2009014897A2 (en) * 2007-07-23 2009-01-29 3M Innovative Properties Company Antistatic article, method of making the same, and display device having the same
JP2009179671A (ja) 2008-01-30 2009-08-13 Toyo Ink Mfg Co Ltd 難水溶性帯電防止性重合性化合物、及び該化合物を含有する帯電防止性重合性組成物、並びに帯電防止性を有する重合体

Family Cites Families (71)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4262072A (en) 1979-06-25 1981-04-14 Minnesota Mining And Manufacturing Company Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings
JPH02173601A (ja) 1988-12-26 1990-07-05 Kuraray Co Ltd 防眩フイルター
US5175030A (en) 1989-02-10 1992-12-29 Minnesota Mining And Manufacturing Company Microstructure-bearing composite plastic articles and method of making
US5183597A (en) 1989-02-10 1993-02-02 Minnesota Mining And Manufacturing Company Method of molding microstructure bearing composite plastic articles
US5161041A (en) 1990-04-26 1992-11-03 Ois Optical Imaging Systems, Inc. Lighting assembly for a backlit electronic display including an integral image splitting and collimating means
US5427835A (en) 1992-06-04 1995-06-27 Minnesota Mining And Manufacturing Company Sulfopolymer/vanadium oxide antistatic compositions
US5882774A (en) 1993-12-21 1999-03-16 Minnesota Mining And Manufacturing Company Optical film
US5828488A (en) 1993-12-21 1998-10-27 Minnesota Mining And Manufacturing Co. Reflective polarizer display
DE69602588T2 (de) 1995-03-03 1999-10-14 Minnesota Mining & Mfg Lichtlenkender film mit in der höhe variierender strukturierter oberfläche und daraus hergestellter lichtlenkender artikel
US5783120A (en) 1996-02-29 1998-07-21 Minnesota Mining And Manufacturing Company Method for making an optical film
US5825543A (en) 1996-02-29 1998-10-20 Minnesota Mining And Manufacturing Company Diffusely reflecting polarizing element including a first birefringent phase and a second phase
WO2009079275A1 (en) 2007-12-14 2009-06-25 3M Innovative Properties Company Optical article
US5919551A (en) 1996-04-12 1999-07-06 3M Innovative Properties Company Variable pitch structured optical film
US6280063B1 (en) 1997-05-09 2001-08-28 3M Innovative Properties Company Brightness enhancement article
JPH1114807A (ja) * 1997-06-25 1999-01-22 Dainippon Printing Co Ltd レンズフイルム、面光源及び液晶表示装置
US6577358B1 (en) 1997-06-25 2003-06-10 Dai Nippon Printing Co., Ltd. Lens film with conductive lens layer or conductive layer
US6358601B1 (en) 1997-07-11 2002-03-19 3M Innovative Properties Company Antistatic ceramer hardcoat composition with improved antistatic characteristics
EP1975649A1 (en) 1998-02-18 2008-10-01 Minnesota Mining And Manufacturing Company Optical film
JP4055918B2 (ja) * 1998-03-27 2008-03-05 大日本印刷株式会社 透明導電性カバーテープ
JP3118224B2 (ja) * 1998-11-20 2000-12-18 大日本印刷株式会社 静電画像記録再生方法
US6277471B1 (en) 1999-06-18 2001-08-21 Shih Chieh Tang Brightness enhancement film
US6372829B1 (en) 1999-10-06 2002-04-16 3M Innovative Properties Company Antistatic composition
US6581286B2 (en) 2000-04-05 2003-06-24 3M Innovative Properties Company Method of making tool to produce optical film
BR0206297A (pt) 2001-01-10 2004-01-06 3M Innovative Properties Co Dispositivo e método para revestir substratos de comprimento limitado e para melhorar a uniformidade de revestimentos não uniformes ou defeituosos
US6924329B2 (en) 2001-11-05 2005-08-02 3M Innovative Properties Company Water- and oil-repellent, antistatic compositions
JP3631992B2 (ja) * 2001-11-13 2005-03-23 日東電工株式会社 配線回路基板
JP3737740B2 (ja) 2001-11-13 2006-01-25 帝人デュポンフィルム株式会社 帯電防止性積層ポリエステルフィルム
KR100813953B1 (ko) * 2002-04-22 2008-03-14 삼성전자주식회사 대전방지성을 갖는 광경화성 수지 조성물
US6841598B2 (en) * 2002-08-16 2005-01-11 General Electric Company Antistatic and antidust agents, compositions thereof, and methods of manufacture
DE60314433T2 (de) 2002-09-20 2008-02-14 Nisshinbo Industries, Inc. Zusammensetzung für polyelektrolyte,polyelektrolyte,elektrische doppelschichtkondensatoren und sekundärzellen mit wasserfreiem elektrolyt
TW582552U (en) 2003-03-24 2004-04-01 Shih-Chieh Tang Brightness unit structure for a brightness enhancement film
US7041365B2 (en) 2003-05-12 2006-05-09 3M Innovative Properties Company Static dissipative optical construction
US7074463B2 (en) 2003-09-12 2006-07-11 3M Innovative Properties Company Durable optical element
JP4780269B2 (ja) 2004-03-11 2011-09-28 日清紡ホールディングス株式会社 無溶剤型液状組成物
TWI387629B (zh) * 2004-07-26 2013-03-01 Nitto Denko Corp 壓感黏合劑組成物、壓感黏合片及表面保護膜
JP5030251B2 (ja) * 2004-07-26 2012-09-19 日東電工株式会社 粘着剤組成物、粘着シート類及び表面保護フィルム
JP4362093B2 (ja) 2004-08-06 2009-11-11 大日本印刷株式会社 帯電防止膜形成用の電離放射線硬化性組成物と帯電防止膜および帯電防止膜を備えた構造体
JP2006103033A (ja) 2004-10-01 2006-04-20 Tamapori Kk 帯電防止フィルム及びその製造方法
US7345137B2 (en) 2004-10-18 2008-03-18 3M Innovative Properties Company Modified copolyesters and optical films including modified copolyesters
JP2006117895A (ja) 2004-10-25 2006-05-11 Ta Chemical Co 光硬化性組成物
JP4888680B2 (ja) 2004-11-15 2012-02-29 パイオトレック株式会社 帯電防止剤およびその使用方法
US7416309B2 (en) * 2004-12-30 2008-08-26 3M Innovative Properties Company Optical film having a surface with rounded structures
JP2006232882A (ja) * 2005-02-22 2006-09-07 Nitto Denko Corp 粘着剤組成物、粘着シート類および両面粘着テープ
US7586566B2 (en) 2005-06-03 2009-09-08 3M Innovative Properties Company Brightness enhancing film and display device having the same
TWI274896B (en) 2005-06-30 2007-03-01 Efun Technology Co Ltd Brightness enhancement film having reinforcing layer
JP4778274B2 (ja) * 2005-06-30 2011-09-21 三光化学工業株式会社 制電性重合体組成物及びそれを用いた成形品
TWI384049B (zh) * 2005-09-05 2013-02-01 Nitto Denko Corp Adhesive composition, adhesive sheet and surface protective film
TWI391711B (zh) 2005-09-13 2013-04-01 迎輝科技股份有限公司 具有導光構造之聚光片
JP5145938B2 (ja) * 2005-09-16 2013-02-20 大日本印刷株式会社 帯電防止防眩フィルム
US7777832B2 (en) 2005-11-18 2010-08-17 3M Innovative Properties Company Multi-function enhancement film
JP2007165729A (ja) 2005-12-15 2007-06-28 Sumida Corporation インダクタ
JP2007260983A (ja) 2006-03-27 2007-10-11 Fujifilm Corp 光学シートおよび接着層の製造方法
JP2007271673A (ja) 2006-03-30 2007-10-18 Nitto Denko Corp 光拡散フィルムの製造方法
US8092904B2 (en) * 2006-03-31 2012-01-10 3M Innovative Properties Company Optical article having an antistatic layer
JP5154772B2 (ja) 2006-07-19 2013-02-27 リンテック株式会社 反射防止フィルム
TWI290232B (en) * 2006-07-27 2007-11-21 Eternal Chemical Co Ltd Scratch-resistant optical film
US8986812B2 (en) 2007-07-09 2015-03-24 3M Innovative Properties Company Thin microstructured optical films
US8623140B2 (en) 2007-07-25 2014-01-07 3M Innovative Properties Company System and method for making a film having a matte finish
JP5483808B2 (ja) * 2007-08-14 2014-05-07 チェイル インダストリーズ インコーポレイテッド 粘着剤組成物及び光学部材
JP2009057436A (ja) * 2007-08-31 2009-03-19 Toyo Ink Mfg Co Ltd 帯電防止ポリマーおよびその用途
JP2009066986A (ja) * 2007-09-14 2009-04-02 Fujifilm Corp 表面機能性材料及びその製造方法
JP2009149834A (ja) * 2007-11-28 2009-07-09 Toyo Ink Mfg Co Ltd 制電性アクリル系樹脂組成物、及び制電性アクリル系粘着剤組成物並びに光学部材用保護フィルム
JP5260273B2 (ja) 2007-12-27 2013-08-14 三洋化成工業株式会社 活性エネルギー線硬化型帯電防止性樹脂組成物
JP5398992B2 (ja) * 2008-01-31 2014-01-29 三洋化成工業株式会社 活性エネルギー線硬化型帯電防止性樹脂組成物
JP4340321B1 (ja) 2008-05-16 2009-10-07 株式会社オプトメイト 積層光学フィルム、その製造方法及びそれを用いた光学デバイス
JP2011526307A (ja) 2008-06-03 2011-10-06 スリーエム イノベイティブ プロパティズ カンパニー ポリアルキル窒素又はリン含有フルオロアルキルスルホニルオニウム塩を含むミクロ構造
US8143336B2 (en) 2008-08-07 2012-03-27 Momentive Performance Materials Inc. Activated halo-containing aralkylsilane composition, process of preparing same and rubber compositions made therefrom
JP4586088B2 (ja) 2008-08-19 2010-11-24 ファナック株式会社 往復直線駆動装置
CN102460231B (zh) 2009-06-02 2016-05-18 3M创新有限公司 光重新定向膜和使用此膜的显示器
TW201103885A (en) 2009-07-22 2011-02-01 Daxon Technology Inc Antistatic ionic compound, oligomer thereof, copolymer thereof, and pressure-sensitive adhesive composition
KR20120061911A (ko) 2009-08-25 2012-06-13 쓰리엠 이노베이티브 프로퍼티즈 컴파니 광 방향 전환 필름 및 이를 포함하는 디스플레이 시스템

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004536940A (ja) * 2001-08-02 2004-12-09 スリーエム イノベイティブ プロパティズ カンパニー 光学的に透明な帯電防止性感圧粘着剤
US20080192351A1 (en) 2004-03-31 2008-08-14 Dai Nippon Printing Co., Ltd Antistatic Antireflection Film Free From Occurrence Of Interference Fringes
WO2009014897A2 (en) * 2007-07-23 2009-01-29 3M Innovative Properties Company Antistatic article, method of making the same, and display device having the same
JP2009179671A (ja) 2008-01-30 2009-08-13 Toyo Ink Mfg Co Ltd 難水溶性帯電防止性重合性化合物、及び該化合物を含有する帯電防止性重合性組成物、並びに帯電防止性を有する重合体

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