TWI545289B - Lamp position adjustment method, lamp position adjustment tool and irradiation device - Google Patents

Lamp position adjustment method, lamp position adjustment tool and irradiation device Download PDF

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Publication number
TWI545289B
TWI545289B TW101109653A TW101109653A TWI545289B TW I545289 B TWI545289 B TW I545289B TW 101109653 A TW101109653 A TW 101109653A TW 101109653 A TW101109653 A TW 101109653A TW I545289 B TWI545289 B TW I545289B
Authority
TW
Taiwan
Prior art keywords
lamp
light
image
condensing mirror
diffusing plate
Prior art date
Application number
TW101109653A
Other languages
English (en)
Chinese (zh)
Other versions
TW201305489A (zh
Inventor
Daisuke Ogawa
Norikuni Morikawa
Kazuyoshi Yamada
Katsumi Kimura
Original Assignee
Iwasaki Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Iwasaki Electric Co Ltd filed Critical Iwasaki Electric Co Ltd
Publication of TW201305489A publication Critical patent/TW201305489A/zh
Application granted granted Critical
Publication of TWI545289B publication Critical patent/TWI545289B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW101109653A 2011-03-23 2012-03-21 Lamp position adjustment method, lamp position adjustment tool and irradiation device TWI545289B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011063968A JP5045833B1 (ja) 2011-03-23 2011-03-23 ランプ位置調整方法、ランプ位置調整用具、及び照射装置

Publications (2)

Publication Number Publication Date
TW201305489A TW201305489A (zh) 2013-02-01
TWI545289B true TWI545289B (zh) 2016-08-11

Family

ID=46879129

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101109653A TWI545289B (zh) 2011-03-23 2012-03-21 Lamp position adjustment method, lamp position adjustment tool and irradiation device

Country Status (3)

Country Link
JP (1) JP5045833B1 (ja)
TW (1) TWI545289B (ja)
WO (1) WO2012127966A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112068607B (zh) * 2020-09-11 2024-03-29 广州彩熠灯光股份有限公司 一种灯具调整方法、介质及电子设备

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0669015B2 (ja) * 1986-09-11 1994-08-31 キヤノン株式会社 投影露光装置
JPH11295819A (ja) * 1998-04-08 1999-10-29 Asahi Optical Co Ltd レーザー露光装置の光軸調整装置
JP2000299270A (ja) * 1999-04-13 2000-10-24 Canon Inc 露光用ランプ、その製造誤差測定装置および露光装置
JP2000349003A (ja) * 1999-06-03 2000-12-15 Canon Inc 露光用ランプ、これを用いた露光装置、ランプ適正位置測定および刻印装置、ならびにランプ適正位置設定装置
JP2003272408A (ja) * 2002-03-19 2003-09-26 Toto Ltd 放電ランプの光軸調整装置および光軸調整方法
JP4086582B2 (ja) * 2002-08-06 2008-05-14 キヤノン株式会社 照明装置及び露光装置
JP2004079254A (ja) * 2002-08-13 2004-03-11 Canon Inc 光源装置及び露光装置
JP2010262141A (ja) * 2009-05-07 2010-11-18 Hitachi High-Technologies Corp 露光装置及び露光装置のランプ位置調整方法

Also Published As

Publication number Publication date
TW201305489A (zh) 2013-02-01
JP5045833B1 (ja) 2012-10-10
JP2012199488A (ja) 2012-10-18
WO2012127966A1 (ja) 2012-09-27

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MM4A Annulment or lapse of patent due to non-payment of fees