TWI527850B - Prepreg, paste metal laminates and printed circuit boards - Google Patents
Prepreg, paste metal laminates and printed circuit boards Download PDFInfo
- Publication number
- TWI527850B TWI527850B TW100119153A TW100119153A TWI527850B TW I527850 B TWI527850 B TW I527850B TW 100119153 A TW100119153 A TW 100119153A TW 100119153 A TW100119153 A TW 100119153A TW I527850 B TWI527850 B TW I527850B
- Authority
- TW
- Taiwan
- Prior art keywords
- resin
- chemical formula
- mass
- prepreg
- phosphorus
- Prior art date
Links
- 229910052751 metal Inorganic materials 0.000 title claims description 17
- 239000002184 metal Substances 0.000 title claims description 17
- 239000000126 substance Substances 0.000 claims description 76
- 239000000945 filler Substances 0.000 claims description 55
- 229910052698 phosphorus Inorganic materials 0.000 claims description 55
- 239000011574 phosphorus Substances 0.000 claims description 46
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 45
- 239000004848 polyfunctional curative Substances 0.000 claims description 43
- 239000011521 glass Substances 0.000 claims description 40
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 39
- 239000011342 resin composition Substances 0.000 claims description 27
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims description 26
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 22
- 239000004593 Epoxy Substances 0.000 claims description 21
- 239000002245 particle Substances 0.000 claims description 21
- 125000000962 organic group Chemical group 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 18
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 9
- 125000004437 phosphorous atom Chemical group 0.000 claims description 9
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 8
- 125000003700 epoxy group Chemical group 0.000 claims description 8
- 239000011888 foil Substances 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 230000005484 gravity Effects 0.000 claims description 6
- 239000007787 solid Substances 0.000 claims description 6
- 229920005989 resin Polymers 0.000 description 52
- 239000011347 resin Substances 0.000 description 52
- 239000003822 epoxy resin Substances 0.000 description 37
- 229920000647 polyepoxide Polymers 0.000 description 37
- 229920003986 novolac Polymers 0.000 description 24
- 239000005011 phenolic resin Substances 0.000 description 18
- 235000013824 polyphenols Nutrition 0.000 description 15
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- 238000005553 drilling Methods 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- 229910000420 cerium oxide Inorganic materials 0.000 description 9
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- -1 acid anhydride compound Chemical class 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 239000002966 varnish Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 4
- 229930003836 cresol Natural products 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000000155 melt Substances 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N n-butylhexane Natural products CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- ZRSNZINYAWTAHE-UHFFFAOYSA-N p-methoxybenzaldehyde Chemical compound COC1=CC=C(C=O)C=C1 ZRSNZINYAWTAHE-UHFFFAOYSA-N 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000004843 novolac epoxy resin Substances 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 239000002759 woven fabric Substances 0.000 description 3
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 2
- YTNUOGWCFLMGLF-UHFFFAOYSA-N 5-methylbenzene-1,2,3,4-tetrol Chemical compound CC1=CC(O)=C(O)C(O)=C1O YTNUOGWCFLMGLF-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 2
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 2
- WBODDOZXDKQEFS-UHFFFAOYSA-N 1,2,3,4-tetramethyl-5-phenylbenzene Chemical group CC1=C(C)C(C)=CC(C=2C=CC=CC=2)=C1C WBODDOZXDKQEFS-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- CRSBERNSMYQZNG-UHFFFAOYSA-N 1-dodecene Chemical compound CCCCCCCCCCC=C CRSBERNSMYQZNG-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- BLBVJHVRECUXKP-UHFFFAOYSA-N 2,3-dimethoxy-1,4-dimethylbenzene Chemical group COC1=C(C)C=CC(C)=C1OC BLBVJHVRECUXKP-UHFFFAOYSA-N 0.000 description 1
- KUFFULVDNCHOFZ-UHFFFAOYSA-N 2,4-xylenol Chemical compound CC1=CC=C(O)C(C)=C1 KUFFULVDNCHOFZ-UHFFFAOYSA-N 0.000 description 1
- AAMHBRRZYSORSH-UHFFFAOYSA-N 2-octyloxirane Chemical compound CCCCCCCCC1CO1 AAMHBRRZYSORSH-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- XAVGNEJDRLVNOO-UHFFFAOYSA-N [P].OC1=CC=CC=C1 Chemical compound [P].OC1=CC=CC=C1 XAVGNEJDRLVNOO-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- HHCZYYBKCPWBMS-UHFFFAOYSA-N decylurea Chemical compound CCCCCCCCCCNC(N)=O HHCZYYBKCPWBMS-UHFFFAOYSA-N 0.000 description 1
- YPWYKIZLWMBFKH-UHFFFAOYSA-N diamino(diphenyl)phosphanium Chemical compound C=1C=CC=CC=1[P+](N)(N)C1=CC=CC=C1 YPWYKIZLWMBFKH-UHFFFAOYSA-N 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000005194 fractionation Methods 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 229910001853 inorganic hydroxide Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- JZWFDVDETGFGFC-UHFFFAOYSA-N salacetamide Chemical group CC(=O)NC(=O)C1=CC=CC=C1O JZWFDVDETGFGFC-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
- C08G59/621—Phenols
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0326—Organic insulating material consisting of one material containing O
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/092—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising epoxy resins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/38—Layered products comprising a layer of synthetic resin comprising epoxy resins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form
- B32B3/10—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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Description
本發明係關於一種預浸體、與使用該預浸體之貼金屬層合板及印刷電路板。
近年,在半導體等電子機器的領域中從高密度封裝技術的進步、習知的面封裝轉移至區域封裝之趨勢正進行,BGA(Ball Grid Allay)或CSP(Chip on Package)等新的封裝體正在登場、增加中。因此,以前亦增加而中介層用基板被受注目起來,高耐熱、低熱膨脹之玻璃環氧基板的要求正在高漲。
如此之狀況下,一般為降低熱膨脹係數,常使用無機填充材,尤其球狀熔融二氧化矽。又,隨環境問題之昇高,尋求不含鹵化物之樹脂系,就耐燃劑而言常使用與以氫氧化鋁為首之無機氫氧化物併用(例如,專利文獻1~3)。
[專利文獻1]特開2010-31263號公報
[專利文獻2]特開2009-74036號公報
[專利文獻3]特開2009-155398號公報
以熱膨脹係數降低為目的而調配二氧化矽等之玻璃填料,進一步,以耐燃性之確保及加工性之提昇作為目的而併用氫氧化鋁而成之預浸體,係使用此預浸體而製作基材時,起因於玻璃填料與氫氧化鋁之流動性的不均一性而於基材端部產生由樹脂之流動所構成之流紋、基材外觀惡化、基材端部特性較中央部更降低、基材之鑽孔加工性降低之問題仍存在。
是故,本發明係目的在於提供一種儘管以二氧化矽等之玻璃填料以及耐燃性之確保或加工性之提昇作為目的而併用氫氧化鋁,亦可得到玻璃填料均一分散、樹脂之流動性被確保、電路成形性優異、鑽孔加工性優異、且低熱膨脹之貼金屬層合板之預浸體;與使用該預浸體之貼金屬層合板及印刷電路板。
本發明係提供以下之[1]~[7]。
[1]一種預浸體,其係使樹脂組成物含浸於基材而成之預浸體,前述樹脂組成物含有平均粒徑2.5~4.5μm之氫氧化鋁與平均粒徑1.0~3.0μm、比重2.3~2.6g/cm3且SiO2之含有量為50~65質量%之玻璃填料,前述樹脂組成物之固形分總量中,前述氫氧化鋁與前述玻璃填料之配合量之合計為30~50質量%。
[2]如[1]記載之預浸體,其中前述樹脂組成物為具有於1分子中至少具有2個以上環氧基之非鹵化環氧化合物。
[3]如[1]或[2]記載之預浸體,其中前述樹脂組成物含有下述化學式(1)所表示之含磷之硬化劑,
(其中,R為具有2個以上之酚性羥基且分子量為180以上之有機基。)
[4]如[3]記載之預浸體,其中前述化學式(1)中之R所表示之有機基係具有1種或2種以上選自下述化學式(2)、(3)、(4)、(5)、及(6)之構造,且具有2個以上之酚性羥基;
(化學式(2)~(6)中之*係表示直接鍵結於化學式(1)之磷原子的部位)
[5]如[4]記載之預浸體,其中化學式(1)中之R所表示之有機基具有1種或2種以上選自下述化學式(7)、(8)及(9)之構造,且具有2個以上酚性羥基;(化學式(7)~(9)中之*係表示直接鍵結於化學式(1)之磷原子的部位)
[6]一種貼金屬層合板,其係重疊一片或複數片之如[1]~[5]中任一項之預浸體,於其兩面或單面配置金屬箔,且加熱加壓而成。
[7]一種印刷電路板,其係使如[6]記載之貼金屬層合板之金屬層進行配線加工而成。
若依本發明,本發明係可提供一種儘管併用玻璃填料
與氫氧化鋁,亦可得到玻璃填料均一分散、鑽孔加工性優異、且低熱膨脹率之貼金屬層合板之預浸體;與使用該預浸體之貼金屬層合板及印刷電路板。
本發明所使用之預浸體係於基材含浸特定之樹脂組成物而成者。
基材係只要為製造貼金屬箔層合板或多層印刷電路板時所使用者即可,無特別限制,但一般可使用織布或不織布等之纖維基材。纖維基材之材質係有玻璃、氧化鋁、硼、氧化矽氧化鋁玻璃、氧化矽玻璃、Tyranno纖維、碳化矽、氮化矽、氧化鋯等之無機纖維或芳醯胺、聚醚醚酮、聚醚醯亞胺、聚醚碸、碳、纖維素等之有機纖維等及此等之混抄系,尤宜使用玻璃填料之織布。可使用於預浸體之基材尤適宜使用10μm~200μm的玻璃織布。
上述樹脂組成物係含有平均粒徑2.5~4.5μm之氫氧化鋁與平均粒徑1.0~3.0μm,比重2.3~2.6g/cm3且SiO2比率50~65質量%之玻璃填料,固形分總量中之前述氫氧化鋁與前述玻璃填料之配合量之合計為30~50質量%。
其次,說明有關樹脂組成物之各成分。
上述樹脂組成物係含有氫氧化鋁。氫氧化鋁係水合水之數目多於氫氧化鎂或其他之無機水合物,耐燃性良好,對於酸、鹼亦比較安定,故適宜於層合板用途。又,若考量樹脂之流動,平均粒徑必須為2.5~4.5μm。若低於2.5μm,隨比表面積的增大,耐藥品性降低。又,若高於4.5μm,清漆中之沉澱變快,故不佳。
又,平均粒徑係使用例如日機裝股份公司製雷射散射粒度分布計MT 3000等,以水作為分散液而測定。
又,玻璃填料係可使用SiO2的含量為50~65質量%者。若SiO2之含量未達50%,熱膨脹降低效果變小,又,若高於65%,鑽孔等之加工性惡化,故不佳。
玻璃填料中之SiO2以外的成分可考量Al2O3、K2O、Na2O、CaO、Fe2O3、B2O3、SrO、MgO、MnO、GeO2、P2O3、P2O5、Y2O5、ZrO2等,但不受此等限制。
又,玻璃填料係平均粒徑為1.0μm~3.0μm,且比重為2.3g/cm2~2.5g/cm3。具有此範圍外之玻璃填料的預浸體係樹脂之流動性降低變大,產生凝集而電路成形性差者。
熱膨脹特性係宜在Tg以下之熱膨脹係數為40ppm/℃。又,玻璃填料之熔融溫度若為1700℃以上,可均一攪拌而
品質安定,故佳。
在樹脂組成物之固形分總量中之前述氫氧化鋁與前述玻璃填料之調配量的合計為30~50質量%。若此合計低於30質量%,無法得到用以確保連接信賴性之低熱膨脹特性,又,若高於50質量%,可看出外層剝離強度的降低、鑽孔磨耗量增加、及電路成形性的降低。
又,氫氧化鋁與玻璃填料之使用比率可任意地設定,但,宜為4:6~6:4。若為此範圍內,耐熱性高,鑽孔磨耗量小,流動性優異。
樹脂組成物中之樹脂係無特別限定,但宜為熱硬化性樹脂,亦可為富耐熱性之熱塑性樹脂。樹脂係可使用例如環氧樹脂、聚醯亞胺樹脂、三嗪樹脂、三聚氰胺樹脂、酚樹脂等。又,此等之樹脂係亦可併用2種類以上,依需要而於樹脂中調配後述之各種硬化劑、硬化促進劑,此等形成溶劑、溶液而調配亦無妨。
上述樹脂宜使用於1分子中至少具有2個以上環氧基之環氧樹脂。尤其宜含有於1分子中至少具有2個以上環氧基,且不含有鹵原子之非鹵化環氧化合物。藉此,因火災等引起之燃燒時,可防止起因於鹵元素之有毒氣體發生,又,亦可防止加熱時因鹵素元素分解造成耐熱性或信賴性降
低。此非鹵化環氧化合物可舉例如雙酚A環氧樹脂、雙酚F環氧樹脂、雙酚S型環氧樹脂、聯苯基型環氧樹脂、脂環式環氧樹脂、酚酚醛清漆環氧樹脂、雙酚A酚醛清漆環氧樹脂、甲酚酚醛清漆環氧樹脂、多官能酚之二縮水甘油基醚化物、多官能醇之二縮水甘油基醚化物、此等之氫添加物等,但不限定於此等。此等非鹵化環氧化合物係可單獨使用,亦可併用任何種類。此等之中,若考量耐熱性及高的玻璃轉移溫度,宜為酚酚醛清漆環氧樹脂、雙酚A酚醛清漆環氧樹脂、甲酚酚醛清漆環氧樹脂等之酚醛清漆型環氧樹脂。又,若考量電氣特性,宜使用四甲基聯苯基型環氧、酚芳烷基環氧、萘芳烷基環氧、二環戊二烯型環氧等之環氧樹脂。
硬化劑係可使用以往公知之各種者,例如就樹脂而言,使用環氧樹脂時,係可舉例如二氰二醯胺、二胺基二苯基甲烷、二胺基二苯基碸等之胺化合物、酞酸酐、均苯四甲酸酐等之酸酐化合物、酚酚醛清漆樹脂、或甲酚酚醛清漆樹脂等之多官能性酚化合物等。此等之硬化劑亦可併用任何種類。
又,亦可使用含磷之硬化劑。此含磷之硬化劑可適宜使用以下述化學式(1)所表示之含磷之硬化劑。
使用此含磷之硬化劑之預浸體、貼金屬層合板等之成形品係具有耐燃性,進一步,耐熱性、電氣特性、耐水性等之特性亦非常良好。
上述化學式(1)中,R宜為具有2個以上之酚性羥基且分子量為180以上之有機基,更宜為190以上之有機基。
若此分子量為180以上,磷硬化劑之溶劑溶解性提高,處理性提昇。含磷之硬化劑係可舉例如HCA-HQ(10-(2,5-二羥基苯基)-10H-9-氧-10-磷菲-10-氧化物)、HCA-NQ(10-(2,7-二羥基萘基)-10-二羥-9-氧-10-磷菲-10-氧化物)等。
此等係因於溶劑之溶解性低,故一般為進行預反應後進行調配。進一步宜於有機基(R)之構造中具有以化學式(-(CH2)-)所示之構造。具有以化學式(-(CH2)-)所示之構造時,耐熱性提高,處理性提昇。
從耐燃性之觀點,樹脂組成物中之磷含量宜樹脂組成物之固形分全體的0.8~5.0質量%,更宜為1.0~2.5質量%。
磷含量為未達樹脂組成物之固形分全體的0.8質量%時,很難得到安定之耐燃性,超過5.0質量%時,硬化物之特性惡
化。
此處,所謂磷含量係於樹脂組成物中之磷原子的含量,例如於分子量620之物質中具有1個磷原子,若為含有此物質50質量%之調配,成為2.5質量%之磷成分含量(磷原子的原子量約為31,故31/620×0.5=0.0250)。
以化學式(1)中之R所表示之有機基係具有1種或2種以上選自下述化學式(2)、(3)、(4)、(5)、及(6)之構造,且具有2個以上之酚性羥基。化學式(2)~(6)中之*係表示直接鍵結於化學式(1)之磷原子的部位。
化學式(1)中之R所表示之有機基係具有1種或2種以上之選自下述化學式(7)、(8)及(9)之構造,且具有2個以上酚性羥基。化學式(7)~(9)中之*係表示直接鍵結於化學式(1)之磷原子的部位。
具有以上述化學式(2)所示之構造時,含有該含磷之硬化劑之環氧樹脂組成物的耐熱性提高。又,含磷之硬化劑於反應系之溶劑的溶解性提昇,故處理性提高。
具有以上述化學式(3)所示之構造時,與樹脂之反應性提高。
具有以上述化學式(4)所示之構造時,含有該含磷之硬化劑之環氧樹脂組成物的耐熱性提高。
具有以上述化學式(5)~(9)所示之構造時,含有該含磷之硬化劑之環氧樹脂組成物的耐熱性提高。
尤其,具有以上述化學式(2)所示之構造的該含磷之硬化劑係因低黏度,故處理性優異,可提昇生產性。
例如,含磷之硬化劑係可形成具有以下述化學式(10)所示之構造單元A與以下述化學式(11)所示之構造單元B之樹脂。
亦即,此樹脂係亦可具有複數個構造單元A連續而成之單元,亦可具有複數個構造單元B連續而成之單元,亦可具有構造單元A與構造單元B交互鍵結而成之單元,亦可具有前述三者單元混在一起之構造。
使用具有上述構造單元之酚樹脂作為含磷之硬化劑時,環氧樹脂組成物的耐熱性提高。
(A)含磷之硬化劑係可形成具有以下述化學式(12)所示之構造單元C與以下述化學式(13)所示之構造單元D之樹脂。
亦即,此樹脂係亦可具有複數個構造單元C連續而成之單元,亦可具有複數個構造單元D連續而成之單元,亦可具有構造單元C與構造單元D交互連結而成之單元,亦可具有前述三者單元混在一起之構造。
使用具有上述構造單元之酚樹脂作為含磷之硬化劑時,環氧樹脂組成物的耐熱性提高。
(A)含磷之硬化劑係可形成具有以下述化學式(14)所示之構造單元E與以下述化學式(15)所示之構造單元F之樹脂。
亦即,此樹脂係亦可具有複數個構造單元E連續而成之單元,亦可具有複數個構造單元F連續而成之單元,亦可具有構造單元E與構造單元F交互鍵結而成之單元,亦可具有前述三者單元混在一起之構造。
使用具有上述構造單元之酚樹脂作為含磷之硬化劑時,環氧樹脂組成物的耐熱性提高。
以化學式(1)所示之含磷之硬化劑係對以化學式(16)所示之磷化合物、與具有酚性羥基之化合物反應所得
到。又,依情形,亦可添加對-茴香醛。
化學式(10)中之X係H原子或鹵原子。
有關能用於製造含磷之硬化劑的酚性羥基之化合物,係宜為於1分子中具有2個以上之酚性羥基之化合物,有:酚、甲酚、二甲酚、間二甲酚、兒茶酚、雙酚A、雙酚F等之酚類或α-萘酚、β-萘酚、二羥基萘等之萘酚類與甲醛、乙醛、丙醛、苯甲醛、水楊基醛等之醛類在酸性觸媒下縮合或共縮合所得到之樹脂(酚醛清漆類)、聚對乙烯基酚樹脂、酚類與二甲氧基對二甲苯所合成之具有二甲苯基的酚/芳烷基樹脂等,亦可單獨或併用2種類以上。
硬化促進劑之種類或調配量係無特別限定,可使用例如咪唑系化合物、有機磷系化合物、第2級胺、第3級胺、第4級銨鹽等,亦可併用2種類以上。硬化促進劑之調配量亦無特別限定,但相對於主材之樹脂100質量份宜為0.01~10.0質量份。
樹脂組成物中係亦可添加偶合劑。藉由添加偶合劑,
可提昇無機填充材之分散性,可得到耐藥品性或剝離強度優異之材料。
偶合劑係一般於熱硬化性樹脂組成物所使用者,無特別限制,但可舉例如具1級及/或2級及/或3級胺之矽烷化合物、環氧基矽烷、氫硫基矽烷、烷基矽烷、脲基矽烷、乙烯基矽烷等之各種矽烷系化合物、鈦系化合物、鋁螯合劑類、鋁/鋯系化合物等。
於基材含浸樹脂組成物之方法無特別限制。可舉例如,濕式方法或乾式方法等,於樹脂組成物清漆含浸基材之方法;使樹脂組成物塗佈於基材之方法等。例如,於玻璃布或玻璃不織布塗佈含浸前述熱硬化性樹脂組成物,連續或非連續地加熱乾燥而進行B階段化,可得到預浸體。
於上述預浸體或使其複數片層合之層合體,依需要而於其單面或雙面重疊金屬箔,加熱加壓成形,成為貼金屬箔層合板。此加熱溫度宜為170℃~240℃,壓力宜為1~8MPa。
又,可使此貼金屬層合板之金屬層進行配線加工(電路加工)而形成印刷配線板(電路板)。
此金屬箔一般為8μm~80μm,此層合體之厚度一般為20μm~200μm。
進一步,亦可於貼金屬箔層合板或電路圖型形成畢之內層用基板的雙面或單片,介由上述預浸體,使樹脂面對向而層合,進行加熱成形,並進一步,實施外層之電路形成,來藉此得到多層印刷電路板。
以下,藉實施例而更詳細說明本發明,但只要不超出本發明之技術思想,本發明係不限定於此等之實施例。
使含有SiO2:53質量%、Al2O3:14質量%、CaO:20質量%、MgO:3質量%、B2O3:10質量%之無機物高溫熔解,冷卻後,以球磨機粉碎,迴旋分級機實施分級,製作平均粒徑2.0μm、比重2.5g/cm3的玻璃填料(破碎無機填充物)A。
又,平均粒徑係使用日機裝股份公司製雷射散射粒度分布計MT 3000,以水作為分散液而測定。
使含有SiO2:62質量%、Al2O3:18質量%、CaO:8質量%、B2O3:12質量%之無機物高溫熔解,冷卻後,以球磨機粉碎,迴旋分級機實施分級,製作平均粒徑2.0μm、比重2.4g/cm3的玻璃填料(破碎無機填充物)B。
在以下,敘述磷系樹脂(硬化劑)1的合成方法。
又,在180℃之熔融黏度係依據ASTM D4287而測定,軟化點係依據JIS K7234而測定。
於安裝有溫度計、冷卻管、分餾管、氮氣導入管、攪拌機之燒瓶中饋入酚酚醛清漆樹脂192.4g(1.85莫耳)與對茴香醛68.0g(0.50莫耳)與9,10-二氫-9-氧-10-磷菲-10-氧化物(以下省略為HCA)108.0g(0.50莫耳),昇溫至180℃,並以180℃反應8小時。
繼而,在加熱減壓下除去水,得到具有以下述化學式(10)所示之構造單元與以下述化學式(11)所示之構造單元之酚樹脂1(磷系樹脂(硬化劑))355g。所得到之酚樹脂(磷系樹脂(硬化劑))1的軟化點為125℃(B&R法)、熔融黏度(測定法:ICI黏度計法,測定溫度:180℃)為13dPa.s,羥基當量為190g/eq、磷含量為4.2質量%。
在合成例1中,使酚酚醛清漆樹脂改變成雙酚A酚醛清漆樹脂330.4g(2.80莫耳)以外,其餘係與合成例1同樣做法,而得到具有以下述化學式(12)所示之構造單元與以下述化學式(13)所示之構造單元之酚樹脂2(磷系樹脂(硬化劑))490g。此酚樹脂(磷系樹脂(硬化劑))2的軟化點為139℃(B&R法)、熔融黏度(測定法:ICI黏度計法,測定溫度:180℃)為65dPa.s,羥基當量為232g/eq、磷含量為3.1質量%。
在合成例1中,使酚酚醛清漆樹脂改變成酚芳烷基樹脂392.9g(2.35莫耳)以外,其餘係與合成例1同樣做法,而得到具有以下述化學式(14)所示之構造單元與以下述化學式(15)所示之構造單元之酚樹脂3(磷系樹脂(硬化劑))550g。所得到之酚樹脂(磷系樹脂(硬化劑))3的軟化點為102℃(B&R法)、熔融黏度(測定法ICI黏度計法,測定溫度:150℃)為2.5dPa.s,羥基當量為232g/eq、磷含量為2.7質量%。
於具備攪拌裝置、冷凝器、及溫度計之玻璃燒瓶中,就環氧樹脂而言,添加酚酚醛清漆型環氧樹脂(環氧基當量:178,三菱化學股份公司製、Epikote 154)25.0質量份、及溴化環氧樹脂(環氧基當量:475,三菱化學股份公司製、Epikote 5046)75.0質量份,就硬化劑(酚樹脂)而言,添加酚酚醛清漆樹脂(日立化成工業股份公司製、HP-1100)31.3質量份,就填充材(1)而言,添加氫氧化鋁(住友化學股份公司製、CL-303、平均粒徑4.1μm)30.0質量份,就填充材(2)而言,添加玻璃填料A 30.0質量份,就硬化促進劑而言,添加2E4MZ(四國化成股份公司製)0.1質量份之混合物,以清漆溫度40℃溶解、稀釋於MEK(甲乙酮),在室溫下攪拌1小時,以MEK調整成固形分60質量%之樹脂組成物清漆。
使此清漆含浸於厚約100μm之玻璃布(Style 2116、E玻璃)後,以150℃乾燥5分鐘而得到樹脂分50質量%之預浸體。重疊此預浸體16片,於其兩側重疊12μm之銅箔,以170℃、90分鐘、4.0MPa之沖壓條件加熱加壓,製作厚
約1.6mm之貼銅層合板。
就環氧樹脂而言,添加酚酚醛清漆型環氧樹脂(環氧基當量:178,三菱化學股份公司製、Epikote 154)15.0質量份、及四羥基苯基甲烷型環氧樹脂(環氧基當量:200,三菱化學股份公司製、Epikote 1031S)3.0質量份、及溴化環氧樹脂(環氧基當量:475,三菱化學股份公司製、Epikote 5046)82.0質量份,就硬化劑(酚樹脂)而言,使用酚酚醛清漆樹脂(日立化成工業股份公司製、HP-1100)28.6質量份,就填充材(1)而言,使用氫氧化鋁(住友化學股份公司製、CL-303)43.0質量份,就填充材(2)而言,使用玻璃填料A 43.0質量份,除了這些以外,其餘係與實施例1同樣做法而得到預浸體與貼銅層合板。
就環氧樹脂而言,添加酚酚醛清漆型環氧樹脂(環氧基當量:178,三菱化學股份公司製、Epikote 154)100.0質量份,就硬化劑(酚樹脂)而言,使用酚酚醛清漆樹脂(日立化成工業股份公司製、HP-1100)59.0質量份,就填充材(1)而言,使用氫氧化鋁(住友化學股份公司製、CL-303)79.0質量份,就填充材(2)而言,使用玻璃填料A 79.0質量份,除了這些以外,其餘係與實施例1同
樣做法而得到預浸體與貼銅層合板。
就環氧樹脂而言,添加酚酚醛清漆型環氧樹脂(環氧基當量:178,三菱化學股份公司製、Epikote 154)80.0質量份、及四羥基苯基甲烷型環氧樹脂(環氧基當量:200,三菱化學股份公司製、Epikote 1031S)20.0質量份,就硬化劑(酚樹脂)而言,使用酚酚醛清漆樹脂(日立化成工業股份公司製、HP-1100)53.0質量份,就磷系樹脂(硬化劑)而言,使用磷酚樹脂(Dow Chemical Company、XZ-92741)33.5質量份,就填充材(1)而言,使用氫氧化鋁(住友化學股份公司製、CL-303)60.0質量份,就填充材(2)而言,使用玻璃填料B 60.0質量份,除了這些以外,其餘係與實施例1同樣做法而得到預浸體與貼銅層合板。
就填充材(2)而言,使用玻璃填料B 40.0質量份,除了這些以外,其餘係與實施例4同樣做法而得到預浸體與貼銅層合板。
就環氧樹脂而言,添加酚酚醛清漆型環氧樹脂(環氧基當量:178,三菱化學股份公司製、Epikote 154)80.0
質量份、及雙酚A酚醛清漆型環氧樹脂(環氧基當量:210,三菱化學股份公司製、Epikote 157)20.0質量份,省略硬化劑(酚樹脂),就磷系樹脂(硬化劑)而言,使用上述合成例1所合成之樹脂103.5質量份,就填充材(1)而言,使用氫氧化鋁(住友化學股份公司製、CL-303)45.0質量份,就填充材(2)而言,使用玻璃填料A 45.0質量份,除了這些以外,其餘係與實施例1同樣做法而得到預浸體與貼銅層合板。
就環氧樹脂而言,添加酚酚醛清漆型環氧樹脂(環氧基當量:178,三菱化學股份公司製、Epikote 154)50.0質量份、及雙酚A酚醛清漆型環氧樹脂(環氧基當量:210,三菱化學股份公司製、Epikote 157)50.0質量份,省略硬化劑(酚樹脂),就磷系樹脂(硬化劑)而言,使用上述合成例2所合成之樹脂119.0質量份,就填充材(1)而言,使用氫氧化鋁(住友化學股份公司製、CL-303)60.0質量份,就填充材(2)而言,使用玻璃填料A 90.0質量份,除了這些以外,其餘係與實施例1同樣做法而得到預浸體與貼銅層合板。
就環氧樹脂而言,添加酚酚醛清漆型環氧樹脂(環氧基當量:178,三菱化學股份公司製、Epikote 154)30.0
質量份、及雙酚A酚醛清漆型環氧樹脂(環氧基當量:210,三菱化學股份公司製、Epikote 157)70.0質量份,省略硬化劑(酚樹脂),就磷系樹脂(硬化劑)而言,使用上述合成例3所合成之樹脂100.0質量份,就填充材(1)而言,使用氫氧化鋁(住友化學股份公司製、CL-303)120.0質量份,就填充材(2)而言,使用玻璃填料A 80.0質量份,除了這些以外,其餘係與實施例1同樣做法而得到預浸體與貼銅層合板。
除使用作為填充材(3)之二氧化矽(股份公司Admatex製、SO-25R、非晶形二氧化矽粉末、平均粒徑0.5μm)30質量份取代填充材(2)而以外,其餘係與實施例1同樣做法而得到預浸體與貼銅層合板。
除使用作為填充材(3)之二氧化矽(股份公司Admatex製、SO-25R、非晶形二氧化矽粉末、平均粒徑0.5μm)43質量份取代填充材(1)而以外,其餘係與實施例2同樣做法而得到預浸體與貼銅層合板。
除未添加填充材(1)及填充材(2)以外,其餘係與實施例2同樣做法而得到預浸體與貼銅層合板。
表1及表2係歸納於實施例1~8及比較例1~3所使用的主要成分者。
以全面蝕刻在實施例1~8及比較例1~3所製作之貼銅層合板的外層銅箔者作為試料,進行以下之評估。其結果表示於表3中。
使於上述試料表面不產生由樹脂流動所構成之流紋者作為「良好」。又,產生流紋者記為「流紋」,特定產生處。
對於上述試料,使用TMA 2940(股份公司製TA Instruments製)而藉壓縮法在50~120℃之範圍測定面方向及厚度方向之熱膨脹率。
對於試料,以鑽孔徑0.2mm、旋轉數300krpm、輸送速度2.1m/分、重疊片數2片,Entry Board 150μm鋁板,實施20000孔之開孔加工,測定鑽孔之刀尖磨耗量。又,鑽孔係使用Union tool公司製之製品編號:MD E747S。
實施例之貼銅層合板係可知基材外觀優異,熱膨脹係數小,鑽孔加工性(壽命)優異。
然而,使用平均粒徑小之二氧化矽(平均粒徑0.5μm)取代填充材(2)之比較例1中,係由二氧化矽與氫氧化鋁之流動性的不均一性而於基材表面端部產生由樹脂之流動所構成之流紋、基材外觀惡化。
又,使用填充材(2)以及平均粒徑小之二氧化矽(平均粒徑0.5μm)之比較例2係鑽孔加工性差。
不含有填充材之比較例3係熱膨脹係數高。
Claims (6)
- 一種預浸體,其係使樹脂組成物含浸於基材而成之預浸體,前述樹脂組成物含有:於1分子中至少具有2個以上環氧基之非鹵化環氧化合物、平均粒徑2.5~4.5μm之氫氧化鋁與平均粒徑1.0~3.0μm、比重2.3~2.6g/cm3且SiO2之含有量為50~65質量%之玻璃填料,前述樹脂組成物之固形分總量中,前述氫氧化鋁與前述玻璃填料之配合量之合計為30~50質量%,前述氫氧化鋁與前述玻璃填料之使用比例為4:6~6:4。
- 如請求項1之預浸體,其中前述樹脂組成物含有下述化學式(1)所表示之含磷之硬化劑,
- 如請求項2之預浸體,其中前述化學式(1)中之R所表示之有機基係具有1種或2種以上選自下述化學式(2)、(3)、(4)、(5)、及(6)之構造,且具有2個以上之酚性羥基;化學式(2)~(6)中之*係表示直接鍵結於化學式(1)之磷原子的部位;
- 如請求項3之預浸體,其中化學式(1)中之R所表示之有機基具有1種或2種以上之選自下述化學式(7)、(8)及(9)之構造,且具有2個以上酚性羥基;化學式(7)~(9)中之*係表示直接鍵結於化學式(1)之磷原子的部位;
- 一種貼金屬層合板,其係重疊一枚或複數枚之如 請求項1~4中任一項之預浸體,於其兩面或單面配置金屬箔,且加熱加壓而成。
- 一種印刷電路板,其係對如請求項5之貼金屬層合板之金屬層進行配線加工而成。
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US20130108843A1 (en) | 2013-05-02 |
EP2578613B8 (en) | 2018-12-19 |
CN105669952B (zh) | 2018-05-29 |
US20130126218A1 (en) | 2013-05-23 |
KR20130103331A (ko) | 2013-09-23 |
EP2578632B1 (en) | 2019-10-30 |
CN102918107B (zh) | 2016-10-05 |
US9215803B2 (en) | 2015-12-15 |
TWI516518B (zh) | 2016-01-11 |
WO2011152412A1 (ja) | 2011-12-08 |
US8980424B2 (en) | 2015-03-17 |
HK1179290A1 (zh) | 2013-09-27 |
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