TWI494685B - 感光性樹脂組合物、使用其之防反射膜及防反射硬塗層膜 - Google Patents

感光性樹脂組合物、使用其之防反射膜及防反射硬塗層膜 Download PDF

Info

Publication number
TWI494685B
TWI494685B TW099124975A TW99124975A TWI494685B TW I494685 B TWI494685 B TW I494685B TW 099124975 A TW099124975 A TW 099124975A TW 99124975 A TW99124975 A TW 99124975A TW I494685 B TWI494685 B TW I494685B
Authority
TW
Taiwan
Prior art keywords
film
resin composition
hard coat
meth
photosensitive resin
Prior art date
Application number
TW099124975A
Other languages
English (en)
Chinese (zh)
Other versions
TW201120566A (en
Inventor
矢作悅幸
狩野浩和
Original Assignee
日本化藥公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本化藥公司 filed Critical 日本化藥公司
Publication of TW201120566A publication Critical patent/TW201120566A/zh
Application granted granted Critical
Publication of TWI494685B publication Critical patent/TWI494685B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/068—Polysiloxanes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0276—Photolithographic processes using an anti-reflective coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Structural Engineering (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Architecture (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW099124975A 2009-07-29 2010-07-28 感光性樹脂組合物、使用其之防反射膜及防反射硬塗層膜 TWI494685B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009176524 2009-07-29

Publications (2)

Publication Number Publication Date
TW201120566A TW201120566A (en) 2011-06-16
TWI494685B true TWI494685B (zh) 2015-08-01

Family

ID=43529266

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099124975A TWI494685B (zh) 2009-07-29 2010-07-28 感光性樹脂組合物、使用其之防反射膜及防反射硬塗層膜

Country Status (5)

Country Link
JP (1) JP5767583B2 (ja)
KR (1) KR20120044286A (ja)
CN (1) CN102471425B (ja)
TW (1) TWI494685B (ja)
WO (1) WO2011013611A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11106134B2 (en) 2017-12-29 2021-08-31 Industrial Technology Research Institute Photosensitive composite material and method for forming composite film using the same

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5914978B2 (ja) * 2011-03-31 2016-05-11 大日本印刷株式会社 光硬化性樹脂組成物
TWI625241B (zh) * 2011-08-22 2018-06-01 Mitsubishi Chem Corp Transparent laminated film
KR101941445B1 (ko) * 2011-12-27 2019-04-15 엘지디스플레이 주식회사 저반사 고경도 코팅막 및 이를 이용한 표시 장치
JP2013173871A (ja) * 2012-02-27 2013-09-05 Mitsubishi Chemicals Corp 組成物、帯電防止性コート剤及び帯電防止性積層体
JP6080032B2 (ja) * 2012-03-15 2017-02-15 東レフィルム加工株式会社 反射防止フィルム
KR101407617B1 (ko) 2012-04-25 2014-06-27 주식회사 엘지화학 자기 치유 능력이 있는 열경화성 코팅 조성물, 코팅 필름 및 코팅 필름의 제조 방법
KR101379491B1 (ko) 2012-05-31 2014-04-01 주식회사 엘지화학 하드코팅 필름 및 이의 제조방법
KR101451848B1 (ko) 2012-05-31 2014-10-16 주식회사 엘지화학 하드코팅 필름의 제조방법
KR101501686B1 (ko) 2012-05-31 2015-03-11 주식회사 엘지화학 하드코팅 필름
KR20150037734A (ko) * 2012-07-24 2015-04-08 니폰 가야꾸 가부시끼가이샤 감광성 수지 조성물 및 반사 방지 필름
KR101470465B1 (ko) 2012-08-23 2014-12-08 주식회사 엘지화학 하드코팅 필름
CN103756383B (zh) * 2013-12-17 2016-09-07 张家港康得新光电材料有限公司 硬化膜用防粘连涂层组合物及相应的双面硬化膜
KR101807208B1 (ko) 2015-08-18 2017-12-08 주식회사 엘지화학 저굴절층 및 이를 포함하는 반사 방지 필름
JP7161836B2 (ja) 2015-12-18 2022-10-27 デクセリアルズ株式会社 防曇防汚積層体、物品、及びその製造方法
KR101973195B1 (ko) * 2016-03-11 2019-04-26 주식회사 엘지화학 반사 방지 필름 및 이의 제조 방법
WO2017155358A1 (ko) * 2016-03-11 2017-09-14 주식회사 엘지화학 반사 방지 필름 및 이의 제조 방법
JP6718340B2 (ja) * 2016-09-08 2020-07-08 株式会社ダイセル ハードコート積層体並びに成形体及びその製造方法
JP6874312B2 (ja) * 2016-09-28 2021-05-19 株式会社ニデック ハードコート用樹脂組成物の製造方法、及びハードコート用樹脂組成物
JP6508559B2 (ja) * 2016-12-01 2019-05-08 Dic株式会社 活性エネルギー線硬化性組成物及びそれを用いたフィルム
KR20180087956A (ko) 2017-01-26 2018-08-03 동우 화인켐 주식회사 하드코팅 필름 및 이를 구비한 디스플레이 윈도우
EP3597710B1 (en) * 2018-07-18 2021-08-18 Inkron OY Novel polysiloxane compositions and uses thereof
KR102031802B1 (ko) 2019-03-25 2019-10-15 동우 화인켐 주식회사 하드코팅 필름 및 이를 구비한 디스플레이 윈도우
JP2021081596A (ja) * 2019-11-19 2021-05-27 大日本印刷株式会社 樹脂パネル及び赤外線センサー
JP6844737B1 (ja) * 2020-07-16 2021-03-17 荒川化学工業株式会社 活性エネルギー線硬化型コーティング剤、硬化物、及び積層体
CN114350256B (zh) * 2022-01-04 2022-12-06 海洋化工研究院有限公司 耐高温高反射率涂料组分和制备方法以及其涂料和施工方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006109496A1 (ja) * 2005-04-06 2006-10-19 Jsr Corporation 放射線硬化性樹脂組成物及び反射防止膜
JP2006306008A (ja) * 2005-03-31 2006-11-09 Jsr Corp 帯電防止用積層体

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10316860A (ja) * 1997-03-19 1998-12-02 Dow Corning Asia Ltd 光学用シリカ含有ポリシロキサン樹脂
JP2001049236A (ja) * 1999-08-10 2001-02-20 Toppan Printing Co Ltd 防汚材およびこれを用いた反射防止フィルター
JP2002265866A (ja) * 2001-03-13 2002-09-18 Toppan Printing Co Ltd 低屈折率コーティング剤及び反射防止フィルム
JP2004314468A (ja) * 2003-04-17 2004-11-11 Sumitomo Chem Co Ltd 硬化被膜が形成された透明基材及びそのための硬化性組成物
JP2005089536A (ja) * 2003-09-12 2005-04-07 Jsr Corp 硬化性樹脂組成物及び反射防止膜
JP4726198B2 (ja) * 2005-04-27 2011-07-20 日本化薬株式会社 感光性樹脂組成物及びその硬化皮膜を有するフィルム
JP2009160755A (ja) * 2007-12-28 2009-07-23 Jgc Catalysts & Chemicals Ltd 透明被膜付基材

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006306008A (ja) * 2005-03-31 2006-11-09 Jsr Corp 帯電防止用積層体
WO2006109496A1 (ja) * 2005-04-06 2006-10-19 Jsr Corporation 放射線硬化性樹脂組成物及び反射防止膜

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11106134B2 (en) 2017-12-29 2021-08-31 Industrial Technology Research Institute Photosensitive composite material and method for forming composite film using the same

Also Published As

Publication number Publication date
JPWO2011013611A1 (ja) 2013-01-07
WO2011013611A1 (ja) 2011-02-03
CN102471425B (zh) 2015-03-04
CN102471425A (zh) 2012-05-23
JP5767583B2 (ja) 2015-08-19
TW201120566A (en) 2011-06-16
KR20120044286A (ko) 2012-05-07

Similar Documents

Publication Publication Date Title
TWI494685B (zh) 感光性樹脂組合物、使用其之防反射膜及防反射硬塗層膜
TWI585535B (zh) 感光性樹脂組合物及抗反射膜
WO2010090116A1 (ja) 活性エネルギー線硬化型ハードコート用樹脂組成物とその用途
JP4726198B2 (ja) 感光性樹脂組成物及びその硬化皮膜を有するフィルム
KR101241280B1 (ko) 자외선 경화형 방오성 대전방지 하드코팅용 조성물
KR20110043444A (ko) 자외선 경화형 하드코트 수지 조성물, 그것을 이용한 하드코트 필름 및 하드코트 성형물
JP2010248426A (ja) 耐指紋性に優れた転写材及びその製造方法
JP2002067238A (ja) 放射線硬化型樹脂組成物の硬化皮膜を有するフィルム
JP6578780B2 (ja) タッチパネル用積層体、及び、折り畳み式画像表示装置
JP5509774B2 (ja) 防汚性表面層用硬化性樹脂組成物及び光学フィルム
US20120207990A1 (en) Production method of antireflection film, antireflection film and coating composition
JP2007070523A (ja) 感光性樹脂組成物及びその硬化皮膜を有するフィルム
TW201510117A (zh) 紫外線硬化型硬質塗敷樹脂組合物
JP2012007028A (ja) 活性エネルギー線硬化型ハードコート用樹脂組成物とその用途
KR102501500B1 (ko) 활성에너지선 경화형 하드코트제 및 적층체
JP4433300B2 (ja) 感光性樹脂組成物及びその硬化皮膜を有するフィルム
JP2010013572A (ja) 感光性樹脂組成物及び反射防止フィルム
JP2010174056A (ja) 感光性樹脂組成物及び反射防止フィルム
JP5247977B2 (ja) 硬化性樹脂組成物及びそれからなる硬化膜
JP2009001598A (ja) 活性エネルギー線硬化型帯電防止性ハードコート樹脂組成物
JP2006199765A (ja) 感光性樹脂組成物及びその硬化皮膜を有するフィルム
JP2003306561A (ja) 帯電防止ハードコートフィルム及びその製造方法
JP2001123036A (ja) 放射線硬化型帯電防止性樹脂組成物
JP2001226413A (ja) 放射線硬化型帯電防止性樹脂組成物
JP2008081696A (ja) 紫外線硬化型帯電防止性ハードコート樹脂組成物

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees