TWI432770B - 光學系統 - Google Patents
光學系統 Download PDFInfo
- Publication number
- TWI432770B TWI432770B TW094109956A TW94109956A TWI432770B TW I432770 B TWI432770 B TW I432770B TW 094109956 A TW094109956 A TW 094109956A TW 94109956 A TW94109956 A TW 94109956A TW I432770 B TWI432770 B TW I432770B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- optical
- optical system
- light
- refractive index
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims description 143
- 239000006117 anti-reflective coating Substances 0.000 claims description 47
- 238000003384 imaging method Methods 0.000 claims description 47
- 239000012788 optical film Substances 0.000 claims description 23
- 239000011248 coating agent Substances 0.000 claims description 17
- 238000000576 coating method Methods 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 15
- 238000001771 vacuum deposition Methods 0.000 claims description 12
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 5
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical group [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 5
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 5
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 5
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 4
- 238000002310 reflectometry Methods 0.000 claims 1
- 230000005499 meniscus Effects 0.000 description 37
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- 239000010408 film Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- UEGPKNKPLBYCNK-UHFFFAOYSA-L magnesium acetate Chemical compound [Mg+2].CC([O-])=O.CC([O-])=O UEGPKNKPLBYCNK-UHFFFAOYSA-L 0.000 description 4
- 229940069446 magnesium acetate Drugs 0.000 description 4
- 235000011285 magnesium acetate Nutrition 0.000 description 4
- 239000011654 magnesium acetate Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000003980 solgel method Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 108010025899 gelatin film Proteins 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3447—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide
- C03C17/3452—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide comprising a fluoride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Lenses (AREA)
- Surface Treatment Of Optical Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004099132 | 2004-03-30 | ||
| JP2005012898A JP5201435B2 (ja) | 2004-03-30 | 2005-01-20 | 光学系 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200535449A TW200535449A (en) | 2005-11-01 |
| TWI432770B true TWI432770B (zh) | 2014-04-01 |
Family
ID=34914552
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094109956A TWI432770B (zh) | 2004-03-30 | 2005-03-30 | 光學系統 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7336421B2 (https=) |
| EP (2) | EP1584955B1 (https=) |
| JP (1) | JP5201435B2 (https=) |
| CN (1) | CN100443923C (https=) |
| TW (1) | TWI432770B (https=) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070195420A1 (en) * | 2006-02-23 | 2007-08-23 | Mark Fitchmun | Extraneous light reducing lens |
| JP4978836B2 (ja) * | 2007-03-19 | 2012-07-18 | 株式会社ニコン | ズームレンズ、光学機器、および結像方法 |
| JP4984231B2 (ja) * | 2007-03-22 | 2012-07-25 | 株式会社ニコン | ズームレンズ、光学機器、および結像方法 |
| JP5213424B2 (ja) * | 2007-12-10 | 2013-06-19 | キヤノン株式会社 | 光学系及びそれを有する光学機器 |
| JP5218902B2 (ja) * | 2008-09-10 | 2013-06-26 | 株式会社ニコン | 広角レンズおよび撮像装置 |
| JP5641718B2 (ja) | 2008-09-16 | 2014-12-17 | キヤノン株式会社 | 撮影レンズ |
| JP5266019B2 (ja) * | 2008-11-10 | 2013-08-21 | 学校法人慶應義塾 | 反射防止膜、その形成方法、光学素子、交換レンズ及び撮像装置 |
| JP5522955B2 (ja) * | 2009-02-17 | 2014-06-18 | キヤノン株式会社 | 光学素子の製造方法 |
| JP2010271374A (ja) * | 2009-05-19 | 2010-12-02 | Canon Inc | 光学系及びそれを有する光学機器 |
| JP2010271502A (ja) * | 2009-05-21 | 2010-12-02 | Nikon Corp | コンバーターレンズ及びこのコンバーターレンズを有する光学装置 |
| US8736960B2 (en) * | 2009-09-15 | 2014-05-27 | Sharp Kabushiki Kaisha | Structure with observation port |
| JP5621636B2 (ja) * | 2010-03-15 | 2014-11-12 | 株式会社ニコン | 撮影レンズ、この撮影レンズを備えた光学機器、撮影レンズの製造方法 |
| EP2563826A2 (en) | 2010-04-29 | 2013-03-06 | Battelle Memorial Institute | High refractive index composition |
| JP5561256B2 (ja) * | 2011-08-09 | 2014-07-30 | 株式会社ニコン | 光学系、この光学系を有する光学機器、及び、光学系の製造方法 |
| US8908273B2 (en) * | 2010-09-21 | 2014-12-09 | Nikon Corporation | Imaging lens, optical apparatus equipped therewith and method for manufacturing imaging lens |
| DE102010048089B4 (de) * | 2010-10-01 | 2016-09-01 | Carl Zeiss Vision International Gmbh | Verfahren zur Erzeugung einer mehrere Schichten aufweisenden antistatischen Beschichtung für ein Linsenelement |
| US8717686B2 (en) * | 2010-11-22 | 2014-05-06 | Nikon Corporation | Optical system, optical apparatus and optical system manufacturing method |
| CN104094149B (zh) * | 2012-01-30 | 2018-09-14 | 兴和株式会社 | 镜头镜筒 |
| JP6339557B2 (ja) | 2012-03-26 | 2018-06-06 | スリーエム イノベイティブ プロパティズ カンパニー | ナノ構造化材料及びその作製方法 |
| JP5986454B2 (ja) | 2012-08-16 | 2016-09-06 | キヤノン株式会社 | レンズ装置及びそれを有する撮像装置 |
| JP6991706B2 (ja) * | 2016-11-30 | 2022-02-03 | キヤノン株式会社 | 光学素子およびそれを有する光学系 |
| WO2019012762A1 (ja) * | 2017-07-12 | 2019-01-17 | 日本電産株式会社 | レンズ、レンズユニットおよび撮像装置 |
| CN216210000U (zh) | 2021-05-21 | 2022-04-05 | 大立光电股份有限公司 | 塑胶光学转折元件、成像镜头模块及电子装置 |
| WO2022255791A1 (ko) * | 2021-06-01 | 2022-12-08 | 엘지이노텍 주식회사 | 렌즈 모듈 및 이를 포함하는 디스플레이 장치 |
| KR102926016B1 (ko) * | 2021-11-02 | 2026-02-11 | 엘지이노텍 주식회사 | 렌즈 모듈 및 이를 포함하는 디스플레이 장치 |
| KR102926147B1 (ko) * | 2021-06-01 | 2026-02-12 | 엘지이노텍 주식회사 | 렌즈 모듈 및 이를 포함하는 디스플레이 장치 |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2042777A1 (https=) * | 1969-08-28 | 1971-05-13 | ||
| US3781090A (en) | 1972-11-06 | 1973-12-25 | Minolta Camera Kk | Four layer anti-reflection coating |
| US4128303A (en) | 1976-04-05 | 1978-12-05 | Kabushiki Kaisha Hoya Lens | Anti reflection coating with a composite middle layer |
| JPS6027963B2 (ja) * | 1980-02-19 | 1985-07-02 | キヤノン株式会社 | 撮影レンズ |
| JPS6029701A (ja) | 1983-07-26 | 1985-02-15 | Asahi Glass Co Ltd | ５層反射防止膜 |
| JPH04138402A (ja) * | 1990-09-28 | 1992-05-12 | Minolta Camera Co Ltd | 写真レンズ |
| JP2991554B2 (ja) * | 1990-11-09 | 1999-12-20 | 旭光学工業株式会社 | 広波長域ゴースト防止光学系 |
| JPH063501A (ja) | 1992-06-23 | 1994-01-14 | Dainippon Printing Co Ltd | 多孔質光学材料 |
| JPH07128501A (ja) * | 1993-11-01 | 1995-05-19 | Olympus Optical Co Ltd | 結像光学系 |
| JPH10123670A (ja) * | 1996-10-21 | 1998-05-15 | Konica Corp | レンズ付きフィルムユニット |
| JPH10221502A (ja) | 1997-02-07 | 1998-08-21 | Nikon Corp | 光学薄膜の製造方法および光学薄膜 |
| US5993898A (en) | 1997-05-19 | 1999-11-30 | Nikon Corporation | Fabrication method and structure for multilayer optical anti-reflection coating, and optical component and optical system using multilayer optical anti-reflection coating |
| US6066401A (en) * | 1998-02-25 | 2000-05-23 | National Research Council Of Canada | Wide-band two-layer antireflection coating for optical surfaces |
| JP2000010042A (ja) * | 1998-06-19 | 2000-01-14 | Canon Inc | 画像観察装置 |
| EP0994368A3 (en) | 1998-10-13 | 2000-05-03 | Nikon Corporation | Anti-reflective films, optical elements and reduction-projection exposure apparatus utilizing same |
| JP2000357654A (ja) | 1998-10-13 | 2000-12-26 | Nikon Corp | 反射防止膜、光学素子、露光装置、及び電子物品 |
| JP2000249820A (ja) | 1999-02-26 | 2000-09-14 | Canon Inc | フィルターおよびレンズ鏡筒 |
| JP2000275526A (ja) * | 1999-03-25 | 2000-10-06 | Konica Corp | ズームレンズ |
| JP2000356704A (ja) | 1999-06-16 | 2000-12-26 | Asahi Optical Co Ltd | 反射防止膜の形成方法および光学素子 |
| JP2001074903A (ja) * | 1999-09-03 | 2001-03-23 | Nikon Corp | 反射防止膜及び光学素子 |
| WO2001023933A1 (en) * | 1999-09-29 | 2001-04-05 | Nikon Corporation | Projection optical system |
| JP3509804B2 (ja) | 1999-09-30 | 2004-03-22 | 株式会社ニコン | 多層薄膜付き光学素子及びそれを備える露光装置 |
| JP4573937B2 (ja) * | 2000-02-23 | 2010-11-04 | キヤノン株式会社 | 光学系およびそれを有する光学機器、画像投影装置、撮像装置 |
| CH694085A5 (fr) * | 2000-05-05 | 2004-07-15 | Bobst Sa | Machine de traitement de feuilles. |
| JP4156776B2 (ja) * | 2000-05-17 | 2008-09-24 | 株式会社リコー | ズームレンズ |
| EP1315005B1 (en) | 2000-08-30 | 2007-10-10 | Nikon Corporation | Method of forming optical thin film |
| DE10101017A1 (de) | 2001-01-05 | 2002-07-11 | Zeiss Carl | Reflexionsminderungsbeschichtung für Ultraviolettlicht |
| US6950236B2 (en) | 2001-04-10 | 2005-09-27 | Fuji Photo Film Co., Ltd. | Antireflection film, polarizing plate, and apparatus for displaying an image |
| JP4284006B2 (ja) | 2001-04-10 | 2009-06-24 | 富士フイルム株式会社 | 反射防止フィルム、偏光板および画像表示装置 |
| JP4107050B2 (ja) * | 2001-10-25 | 2008-06-25 | 松下電工株式会社 | コーティング材組成物及びそれにより形成された被膜を有する物品 |
| JP2003177313A (ja) * | 2001-12-12 | 2003-06-27 | Nikon Corp | 光学系 |
| JP2004302113A (ja) | 2003-03-31 | 2004-10-28 | Nikon Corp | 反射防止膜、光学部材、光学系及び投影露光装置、並びに反射防止膜の製造方法 |
| JP2005114881A (ja) | 2003-10-06 | 2005-04-28 | Nikon Corp | 投影光学系、露光装置、および露光方法 |
-
2005
- 2005-01-20 JP JP2005012898A patent/JP5201435B2/ja not_active Expired - Fee Related
- 2005-03-29 US US11/091,407 patent/US7336421B2/en not_active Expired - Lifetime
- 2005-03-30 EP EP05251963.4A patent/EP1584955B1/en not_active Expired - Lifetime
- 2005-03-30 TW TW094109956A patent/TWI432770B/zh not_active IP Right Cessation
- 2005-03-30 CN CNB2005100625028A patent/CN100443923C/zh not_active Expired - Fee Related
- 2005-03-30 EP EP17195764.0A patent/EP3324221A1/en not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| TW200535449A (en) | 2005-11-01 |
| EP1584955B1 (en) | 2017-10-11 |
| JP5201435B2 (ja) | 2013-06-05 |
| EP3324221A1 (en) | 2018-05-23 |
| US7336421B2 (en) | 2008-02-26 |
| JP2005316386A (ja) | 2005-11-10 |
| US20050219705A1 (en) | 2005-10-06 |
| CN1677131A (zh) | 2005-10-05 |
| CN100443923C (zh) | 2008-12-17 |
| EP1584955A1 (en) | 2005-10-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI432770B (zh) | 光學系統 | |
| JP4433390B2 (ja) | 反射防止膜並びにこの反射防止膜を有する光学素子及び光学系 | |
| JP5936444B2 (ja) | 光学素子、それを用いた光学系および光学機器 | |
| JP5511258B2 (ja) | 光学素子及び光学系 | |
| US8717686B2 (en) | Optical system, optical apparatus and optical system manufacturing method | |
| JP2010078803A (ja) | 光学素子及びそれを有する光学系 | |
| JP6362105B2 (ja) | 反射防止膜を有する光学素子、光学系、光学機器 | |
| JP2015004919A (ja) | 反射防止膜及びそれを有する光学素子 | |
| CN108627888A (zh) | 变倍光学系统和光学装置 | |
| JP2009008901A (ja) | 反射防止膜、光学素子及び光学系 | |
| JP2009139775A (ja) | 光学系及びそれを有する光学機器 | |
| JP5252312B2 (ja) | 反射防止膜並びにこの反射防止膜を有する光学素子及び光学系 | |
| JP7402669B2 (ja) | 反射防止膜付光学素子 | |
| CN204331079U (zh) | 防雾自清洁光学反射镜 | |
| JP2020067518A (ja) | 反射防止膜及びこれを有する光学部品 | |
| JP5895745B2 (ja) | 光学系、この光学系を有する撮像装置、及び、光学系の製造方法 | |
| JP2010066681A (ja) | 光学素子及びそれを有する光学系 | |
| JP5777682B2 (ja) | 光学素子及びその製造方法、光学系、光学機器 | |
| JP5861281B2 (ja) | 光学系、この光学系を有する撮像装置、及び、光学系の製造方法 | |
| JP2026512177A (ja) | 複合膜層構造 | |
| JP2014081431A (ja) | 撮影レンズ、この撮影レンズを有する光学機器、及び、撮影レンズの製造方法 | |
| JP2018025651A (ja) | 光学素子およびそれを有する光学系、撮像装置 | |
| JP2012159720A (ja) | 光学系 | |
| JPS6236603A (ja) | 反射防止膜 | |
| JP2015084031A (ja) | 反射防止膜、光学素子および光学機器 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |