JP5201435B2 - 光学系 - Google Patents

光学系 Download PDF

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Publication number
JP5201435B2
JP5201435B2 JP2005012898A JP2005012898A JP5201435B2 JP 5201435 B2 JP5201435 B2 JP 5201435B2 JP 2005012898 A JP2005012898 A JP 2005012898A JP 2005012898 A JP2005012898 A JP 2005012898A JP 5201435 B2 JP5201435 B2 JP 5201435B2
Authority
JP
Japan
Prior art keywords
optical
layer
optical system
approximately
antireflection film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005012898A
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English (en)
Japanese (ja)
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JP2005316386A5 (https=
JP2005316386A (ja
Inventor
一政 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2005012898A priority Critical patent/JP5201435B2/ja
Priority to US11/091,407 priority patent/US7336421B2/en
Priority to EP05251963.4A priority patent/EP1584955B1/en
Priority to TW094109956A priority patent/TWI432770B/zh
Priority to EP17195764.0A priority patent/EP3324221A1/en
Priority to CNB2005100625028A priority patent/CN100443923C/zh
Publication of JP2005316386A publication Critical patent/JP2005316386A/ja
Publication of JP2005316386A5 publication Critical patent/JP2005316386A5/ja
Application granted granted Critical
Publication of JP5201435B2 publication Critical patent/JP5201435B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3447—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide
    • C03C17/3452—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a halide comprising a fluoride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Lenses (AREA)
  • Surface Treatment Of Optical Elements (AREA)
JP2005012898A 2004-03-30 2005-01-20 光学系 Expired - Fee Related JP5201435B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2005012898A JP5201435B2 (ja) 2004-03-30 2005-01-20 光学系
US11/091,407 US7336421B2 (en) 2004-03-30 2005-03-29 Optical system with anti-reflection coating
TW094109956A TWI432770B (zh) 2004-03-30 2005-03-30 光學系統
EP17195764.0A EP3324221A1 (en) 2004-03-30 2005-03-30 Antireflective coating
EP05251963.4A EP1584955B1 (en) 2004-03-30 2005-03-30 Antireflective coating
CNB2005100625028A CN100443923C (zh) 2004-03-30 2005-03-30 光学系统

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004099132 2004-03-30
JP2004099132 2004-03-30
JP2005012898A JP5201435B2 (ja) 2004-03-30 2005-01-20 光学系

Publications (3)

Publication Number Publication Date
JP2005316386A JP2005316386A (ja) 2005-11-10
JP2005316386A5 JP2005316386A5 (https=) 2008-02-28
JP5201435B2 true JP5201435B2 (ja) 2013-06-05

Family

ID=34914552

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005012898A Expired - Fee Related JP5201435B2 (ja) 2004-03-30 2005-01-20 光学系

Country Status (5)

Country Link
US (1) US7336421B2 (https=)
EP (2) EP1584955B1 (https=)
JP (1) JP5201435B2 (https=)
CN (1) CN100443923C (https=)
TW (1) TWI432770B (https=)

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JP4984231B2 (ja) * 2007-03-22 2012-07-25 株式会社ニコン ズームレンズ、光学機器、および結像方法
JP5213424B2 (ja) * 2007-12-10 2013-06-19 キヤノン株式会社 光学系及びそれを有する光学機器
JP5218902B2 (ja) * 2008-09-10 2013-06-26 株式会社ニコン 広角レンズおよび撮像装置
JP5641718B2 (ja) 2008-09-16 2014-12-17 キヤノン株式会社 撮影レンズ
JP5266019B2 (ja) * 2008-11-10 2013-08-21 学校法人慶應義塾 反射防止膜、その形成方法、光学素子、交換レンズ及び撮像装置
JP5522955B2 (ja) * 2009-02-17 2014-06-18 キヤノン株式会社 光学素子の製造方法
JP2010271374A (ja) * 2009-05-19 2010-12-02 Canon Inc 光学系及びそれを有する光学機器
JP2010271502A (ja) * 2009-05-21 2010-12-02 Nikon Corp コンバーターレンズ及びこのコンバーターレンズを有する光学装置
US8736960B2 (en) * 2009-09-15 2014-05-27 Sharp Kabushiki Kaisha Structure with observation port
JP5621636B2 (ja) * 2010-03-15 2014-11-12 株式会社ニコン 撮影レンズ、この撮影レンズを備えた光学機器、撮影レンズの製造方法
EP2563826A2 (en) 2010-04-29 2013-03-06 Battelle Memorial Institute High refractive index composition
JP5561256B2 (ja) * 2011-08-09 2014-07-30 株式会社ニコン 光学系、この光学系を有する光学機器、及び、光学系の製造方法
US8908273B2 (en) * 2010-09-21 2014-12-09 Nikon Corporation Imaging lens, optical apparatus equipped therewith and method for manufacturing imaging lens
DE102010048089B4 (de) * 2010-10-01 2016-09-01 Carl Zeiss Vision International Gmbh Verfahren zur Erzeugung einer mehrere Schichten aufweisenden antistatischen Beschichtung für ein Linsenelement
US8717686B2 (en) * 2010-11-22 2014-05-06 Nikon Corporation Optical system, optical apparatus and optical system manufacturing method
CN104094149B (zh) * 2012-01-30 2018-09-14 兴和株式会社 镜头镜筒
JP6339557B2 (ja) 2012-03-26 2018-06-06 スリーエム イノベイティブ プロパティズ カンパニー ナノ構造化材料及びその作製方法
JP5986454B2 (ja) 2012-08-16 2016-09-06 キヤノン株式会社 レンズ装置及びそれを有する撮像装置
JP6991706B2 (ja) * 2016-11-30 2022-02-03 キヤノン株式会社 光学素子およびそれを有する光学系
WO2019012762A1 (ja) * 2017-07-12 2019-01-17 日本電産株式会社 レンズ、レンズユニットおよび撮像装置
CN216210000U (zh) 2021-05-21 2022-04-05 大立光电股份有限公司 塑胶光学转折元件、成像镜头模块及电子装置
WO2022255791A1 (ko) * 2021-06-01 2022-12-08 엘지이노텍 주식회사 렌즈 모듈 및 이를 포함하는 디스플레이 장치
KR102926016B1 (ko) * 2021-11-02 2026-02-11 엘지이노텍 주식회사 렌즈 모듈 및 이를 포함하는 디스플레이 장치
KR102926147B1 (ko) * 2021-06-01 2026-02-12 엘지이노텍 주식회사 렌즈 모듈 및 이를 포함하는 디스플레이 장치

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Also Published As

Publication number Publication date
TW200535449A (en) 2005-11-01
EP1584955B1 (en) 2017-10-11
EP3324221A1 (en) 2018-05-23
TWI432770B (zh) 2014-04-01
US7336421B2 (en) 2008-02-26
JP2005316386A (ja) 2005-11-10
US20050219705A1 (en) 2005-10-06
CN1677131A (zh) 2005-10-05
CN100443923C (zh) 2008-12-17
EP1584955A1 (en) 2005-10-12

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