TWI427802B - 可印刷半導體結構及製造和組合之相關方法 - Google Patents
可印刷半導體結構及製造和組合之相關方法 Download PDFInfo
- Publication number
- TWI427802B TWI427802B TW095119520A TW95119520A TWI427802B TW I427802 B TWI427802 B TW I427802B TW 095119520 A TW095119520 A TW 095119520A TW 95119520 A TW95119520 A TW 95119520A TW I427802 B TWI427802 B TW I427802B
- Authority
- TW
- Taiwan
- Prior art keywords
- printable semiconductor
- wafer
- semiconductor component
- component
- printable
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
- H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
- H10D30/472—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having lower bandgap active layer formed on top of wider bandgap layer, e.g. inverted HEMT
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6758—Thin-film transistors [TFT] characterised by the insulating substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/881—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being a two-dimensional material
- H10D62/882—Graphene
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01049—Indium [In]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01051—Antimony [Sb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12041—LED
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
Landscapes
- Thin Film Transistor (AREA)
- Electroluminescent Light Sources (AREA)
- Junction Field-Effect Transistors (AREA)
- Engineering & Computer Science (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/145,574 US7622367B1 (en) | 2004-06-04 | 2005-06-02 | Methods and devices for fabricating and assembling printable semiconductor elements |
| PCT/US2005/019354 WO2005122285A2 (en) | 2004-06-04 | 2005-06-02 | Methods and devices for fabricating and assembling printable semiconductor elements |
| US11/145,542 US7557367B2 (en) | 2004-06-04 | 2005-06-02 | Stretchable semiconductor elements and stretchable electrical circuits |
| US79010406P | 2006-04-07 | 2006-04-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200721517A TW200721517A (en) | 2007-06-01 |
| TWI427802B true TWI427802B (zh) | 2014-02-21 |
Family
ID=38682516
Family Applications (7)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095119520A TWI427802B (zh) | 2005-06-02 | 2006-06-01 | 可印刷半導體結構及製造和組合之相關方法 |
| TW102142517A TWI533459B (zh) | 2005-06-02 | 2006-06-01 | 可印刷半導體結構及製造和組合之相關方法 |
| TW095121212A TWI336491B (en) | 2006-04-07 | 2006-06-14 | A stretchable form of single crystal silicon for high performance electronics on rubber substrates |
| TW099127004A TWI489523B (zh) | 2006-04-07 | 2006-06-14 | 用在橡膠基板上高效能電子組件之可延伸形式之單晶矽 |
| TW105135576A TW201717261A (zh) | 2006-04-07 | 2006-06-14 | 用在橡膠基板上高效能電子組件之可延伸形式之單晶矽 |
| TW100139527A TWI466488B (zh) | 2006-04-07 | 2006-06-14 | 用在橡膠基板上高效能電子組件之可延伸形式之單晶矽 |
| TW104103340A TWI570776B (zh) | 2006-04-07 | 2006-06-14 | 用在橡膠基板上高效能電子組件之可延伸形式之單晶矽 |
Family Applications After (6)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102142517A TWI533459B (zh) | 2005-06-02 | 2006-06-01 | 可印刷半導體結構及製造和組合之相關方法 |
| TW095121212A TWI336491B (en) | 2006-04-07 | 2006-06-14 | A stretchable form of single crystal silicon for high performance electronics on rubber substrates |
| TW099127004A TWI489523B (zh) | 2006-04-07 | 2006-06-14 | 用在橡膠基板上高效能電子組件之可延伸形式之單晶矽 |
| TW105135576A TW201717261A (zh) | 2006-04-07 | 2006-06-14 | 用在橡膠基板上高效能電子組件之可延伸形式之單晶矽 |
| TW100139527A TWI466488B (zh) | 2006-04-07 | 2006-06-14 | 用在橡膠基板上高效能電子組件之可延伸形式之單晶矽 |
| TW104103340A TWI570776B (zh) | 2006-04-07 | 2006-06-14 | 用在橡膠基板上高效能電子組件之可延伸形式之單晶矽 |
Country Status (4)
| Country | Link |
|---|---|
| JP (6) | JP2007281406A (enExample) |
| KR (5) | KR20070100617A (enExample) |
| MY (4) | MY151572A (enExample) |
| TW (7) | TWI427802B (enExample) |
Families Citing this family (51)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101120433B (zh) | 2004-06-04 | 2010-12-08 | 伊利诺伊大学评议会 | 用于制造并组装可印刷半导体元件的方法 |
| TWI427802B (zh) * | 2005-06-02 | 2014-02-21 | 美國伊利諾大學理事會 | 可印刷半導體結構及製造和組合之相關方法 |
| CN101681695B (zh) * | 2006-09-06 | 2013-04-10 | 伊利诺伊大学评议会 | 在用于可拉伸电子元件的半导体互连和纳米膜中的受控弯曲结构 |
| CN105826345B (zh) * | 2007-01-17 | 2018-07-31 | 伊利诺伊大学评议会 | 通过基于印刷的组装制造的光学系统 |
| CN103872002B (zh) | 2008-03-05 | 2017-03-01 | 伊利诺伊大学评议会 | 可拉伸和可折叠的电子器件 |
| US8134163B2 (en) * | 2008-08-11 | 2012-03-13 | Taiwan Semiconductor Manfacturing Co., Ltd. | Light-emitting diodes on concave texture substrate |
| US8519379B2 (en) * | 2009-12-08 | 2013-08-27 | Zena Technologies, Inc. | Nanowire structured photodiode with a surrounding epitaxially grown P or N layer |
| US8389862B2 (en) | 2008-10-07 | 2013-03-05 | Mc10, Inc. | Extremely stretchable electronics |
| US8886334B2 (en) | 2008-10-07 | 2014-11-11 | Mc10, Inc. | Systems, methods, and devices using stretchable or flexible electronics for medical applications |
| JP2012515436A (ja) * | 2009-01-12 | 2012-07-05 | エムシー10 インコーポレイテッド | 非平面撮像アレイの方法及び応用 |
| KR101048356B1 (ko) * | 2009-06-08 | 2011-07-14 | 서울대학교산학협력단 | 잡아 늘일 수 있는 전자소자들의 금속 연결 구조 및 그 제조방법 |
| US9723122B2 (en) | 2009-10-01 | 2017-08-01 | Mc10, Inc. | Protective cases with integrated electronics |
| JP2011138934A (ja) | 2009-12-28 | 2011-07-14 | Sony Corp | 薄膜トランジスタ、表示装置および電子機器 |
| US8992807B2 (en) | 2010-01-14 | 2015-03-31 | Samsung Techwin Co., Ltd. | Method of manufacturing deformation-capable graphene sheet, deformation-capable graphene sheet, and device using the same |
| WO2012091498A1 (ko) * | 2010-12-31 | 2012-07-05 | 성균관대학교산학협력단 | 그래핀 전극을 포함하는 플렉시블/스트레처블 반도체 소자, 반도체층과 그래핀 전극 사이의 접촉저항 감소 방법, 및 그래핀 인터커넥터 |
| US9159635B2 (en) | 2011-05-27 | 2015-10-13 | Mc10, Inc. | Flexible electronic structure |
| US9171794B2 (en) | 2012-10-09 | 2015-10-27 | Mc10, Inc. | Embedding thin chips in polymer |
| TWI524825B (zh) | 2012-10-29 | 2016-03-01 | 財團法人工業技術研究院 | 碳材導電膜的轉印方法 |
| FR2997554B1 (fr) * | 2012-10-31 | 2016-04-08 | Soitec Silicon On Insulator | Procede de modification d'un etat de contrainte initial d'une couche active vers un etat de contrainte final |
| KR102229373B1 (ko) * | 2013-10-08 | 2021-03-17 | 한양대학교 산학협력단 | 유연소자의 제조방법, 그에 의하여 제조된 유연소자 및 접합소자 |
| KR101447238B1 (ko) * | 2014-06-20 | 2014-10-08 | 한국기계연구원 | 양자점 박막 형성 방법 |
| KR102255198B1 (ko) * | 2014-08-12 | 2021-05-25 | 삼성디스플레이 주식회사 | 스트레처블 기판 및 이를 구비한 유기 발광 표시 장치 |
| KR102416112B1 (ko) * | 2014-10-02 | 2022-07-04 | 삼성전자주식회사 | 스트레처블/폴더블 광전자소자와 그 제조방법 및 광전자소자를 포함하는 장치 |
| JP6369788B2 (ja) | 2014-11-27 | 2018-08-08 | パナソニックIpマネジメント株式会社 | エレクトロニクス用構造体 |
| WO2016084345A1 (en) | 2014-11-27 | 2016-06-02 | Panasonic Intellectual Property Management Co., Ltd. | Sheet-shaped stretchable structure, and resin composition for stretchable resin sheet and stretchable resin sheet used for the structure |
| KR101630817B1 (ko) | 2014-12-10 | 2016-06-15 | 한국과학기술연구원 | 굴곡진 금속 나노와이어 네트워크, 이를 포함하는 신축성 투명전극 및 이의 제조방법 |
| US10297575B2 (en) * | 2016-05-06 | 2019-05-21 | Amkor Technology, Inc. | Semiconductor device utilizing an adhesive to attach an upper package to a lower die |
| KR102250527B1 (ko) * | 2016-12-08 | 2021-05-10 | 고려대학교 산학협력단 | 가변 칼라 필터 필름 및 변형률 측정 장치 |
| WO2019074111A1 (ja) | 2017-10-12 | 2019-04-18 | 大日本印刷株式会社 | 配線基板及び配線基板の製造方法 |
| US11284507B2 (en) | 2017-10-12 | 2022-03-22 | Dai Nippon Printing Co., Ltd. | Wiring board and method for manufacturing wiring board |
| TWI754106B (zh) | 2017-10-12 | 2022-02-01 | 日商大日本印刷股份有限公司 | 配線基板及配線基板的製造方法 |
| US10959326B2 (en) | 2017-11-07 | 2021-03-23 | Dai Nippon Printing Co., Ltd. | Stretchable circuit substrate and article |
| KR102027115B1 (ko) * | 2017-11-28 | 2019-10-01 | 고려대학교 세종산학협력단 | 유기광전소자 및 이의 제조방법 |
| KR102100550B1 (ko) * | 2018-01-29 | 2020-04-13 | 충북대학교 산학협력단 | 구리 전극 제작 방법 및 구리 전극 제작 시스템 |
| KR102119009B1 (ko) * | 2018-03-08 | 2020-06-04 | 포항공과대학교 산학협력단 | 신축성 기판의 제조방법 및 그를 포함하는 신축성 전자기기의 제조방법 |
| KR102119023B1 (ko) * | 2018-04-23 | 2020-06-04 | 포항공과대학교 산학협력단 | 2종 이상의 올리고머를 이용한 신축성 기판의 제조방법 및 그를 포함하는 신축성 전자기기의 제조방법 |
| KR102554461B1 (ko) * | 2018-07-26 | 2023-07-10 | 엘지디스플레이 주식회사 | 스트레쳐블 표시 장치 |
| KR102172349B1 (ko) * | 2018-09-14 | 2020-10-30 | 포항공과대학교 산학협력단 | 신축성 기판의 제조방법 및 그를 포함하는 신축성 전자기기의 제조방법 |
| EP3876682A4 (en) | 2018-10-31 | 2022-12-07 | Dai Nippon Printing Co., Ltd. | CIRCUIT BOARD AND PROCESS OF MAKING THE CIRCUIT BOARD |
| KR102779787B1 (ko) | 2018-10-31 | 2025-03-12 | 다이니폰 인사츠 가부시키가이샤 | 배선 기판 및 배선 기판의 제조 방법 |
| EP3883352A4 (en) | 2018-11-16 | 2022-08-31 | Dai Nippon Printing Co., Ltd. | CIRCUIT SUBSTRATE AND METHOD OF MAKING THE CIRCUIT SUBSTRATE |
| US11395404B2 (en) | 2018-11-16 | 2022-07-19 | Dai Nippon Printing Co., Ltd. | Wiring board and method for manufacturing the wiring board |
| JP7249512B2 (ja) * | 2018-11-30 | 2023-03-31 | 大日本印刷株式会社 | 配線基板及び配線基板の製造方法 |
| JP6826786B1 (ja) * | 2019-03-20 | 2021-02-10 | 大日本印刷株式会社 | 配線基板及び配線基板の製造方法 |
| CN111554638B (zh) * | 2020-04-16 | 2023-09-08 | 上海交通大学 | 用于可拉伸电子装置的基底及其制备方法 |
| US11699677B2 (en) * | 2020-06-30 | 2023-07-11 | Openlight Photonics, Inc. | Die-to-wafer bonding utilizing micro-transfer printing |
| CN111952322B (zh) * | 2020-08-14 | 2022-06-03 | 电子科技大学 | 一种具有周期可调屈曲结构的柔性半导体薄膜及制备方法 |
| CN114258185A (zh) * | 2020-09-24 | 2022-03-29 | 北京梦之墨科技有限公司 | 一种电子器件及其制备方法 |
| CN112366250B (zh) * | 2020-11-17 | 2022-11-15 | 佛山市国星半导体技术有限公司 | 一种GaN基紫外探测器及其制作方法 |
| KR102412729B1 (ko) | 2021-01-18 | 2022-06-23 | 연세대학교 산학협력단 | 신축성 디스플레이 장치 |
| WO2025187670A1 (ja) * | 2024-03-04 | 2025-09-12 | 国立大学法人大阪大学 | 薄膜デバイスおよび薄膜デバイスの製造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030003759A1 (en) * | 2001-06-27 | 2003-01-02 | Infineon Technologies North America Corp | Etch selectivity inversion for etching along crystallographic directions in silicon |
| US6787052B1 (en) * | 2000-06-19 | 2004-09-07 | Vladimir Vaganov | Method for fabricating microstructures with deep anisotropic etching of thick silicon wafers |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6482673B2 (en) * | 1996-10-17 | 2002-11-19 | Seiko Epson Corporation | Semiconductor device, method of making the same, circuit board, flexible substrate, and method of making substrate |
| EP1506568B1 (en) * | 2002-04-29 | 2016-06-01 | Samsung Electronics Co., Ltd. | Direct-connect signaling system |
| JP2004071874A (ja) * | 2002-08-07 | 2004-03-04 | Sharp Corp | 半導体装置製造方法および半導体装置 |
| US7491892B2 (en) * | 2003-03-28 | 2009-02-17 | Princeton University | Stretchable and elastic interconnects |
| US7704684B2 (en) * | 2003-12-01 | 2010-04-27 | The Board Of Trustees Of The University Of Illinois | Methods and devices for fabricating three-dimensional nanoscale structures |
| JP5110766B2 (ja) * | 2003-12-15 | 2012-12-26 | 株式会社半導体エネルギー研究所 | 薄膜集積回路装置の作製方法及び非接触型薄膜集積回路装置の作製方法 |
| KR101207442B1 (ko) * | 2003-12-15 | 2012-12-03 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 박막 집적회로장치의 제조방법, 비접촉형 박막 집적회로장치 및 그 제조 방법, 비접촉형 박막 집적회로 장치를 가지는 아이디 태그 및 동전 |
| JP4841807B2 (ja) * | 2004-02-27 | 2011-12-21 | 株式会社半導体エネルギー研究所 | 薄膜集積回路及び薄型半導体装置 |
| KR101185613B1 (ko) * | 2004-04-27 | 2012-09-24 | 더 보오드 오브 트러스티스 오브 더 유니버시티 오브 일리노이즈 | 소프트 리소그래피용 복합 패터닝 장치 |
| CN101120433B (zh) * | 2004-06-04 | 2010-12-08 | 伊利诺伊大学评议会 | 用于制造并组装可印刷半导体元件的方法 |
| TWI427802B (zh) * | 2005-06-02 | 2014-02-21 | 美國伊利諾大學理事會 | 可印刷半導體結構及製造和組合之相關方法 |
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2006
- 2006-06-01 TW TW095119520A patent/TWI427802B/zh active
- 2006-06-01 MY MYPI20062537 patent/MY151572A/en unknown
- 2006-06-01 MY MYPI20113695 patent/MY152238A/en unknown
- 2006-06-01 TW TW102142517A patent/TWI533459B/zh active
- 2006-06-08 MY MYPI20062672A patent/MY143492A/en unknown
- 2006-06-08 MY MYPI20094997A patent/MY163588A/en unknown
- 2006-06-14 TW TW095121212A patent/TWI336491B/zh active
- 2006-06-14 TW TW099127004A patent/TWI489523B/zh active
- 2006-06-14 KR KR1020060053675A patent/KR20070100617A/ko not_active Ceased
- 2006-06-14 JP JP2006165159A patent/JP2007281406A/ja active Pending
- 2006-06-14 TW TW105135576A patent/TW201717261A/zh unknown
- 2006-06-14 TW TW100139527A patent/TWI466488B/zh active
- 2006-06-14 TW TW104103340A patent/TWI570776B/zh active
-
2013
- 2013-08-16 JP JP2013169101A patent/JP5851457B2/ja active Active
- 2013-10-31 KR KR1020130131753A patent/KR20130133733A/ko not_active Ceased
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2014
- 2014-07-29 KR KR1020140096828A patent/KR20140107158A/ko not_active Ceased
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2015
- 2015-03-02 JP JP2015040251A patent/JP6140207B2/ja active Active
- 2015-03-24 KR KR20150040631A patent/KR20150044865A/ko not_active Ceased
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2016
- 2016-09-08 JP JP2016175541A patent/JP6377689B2/ja active Active
- 2016-11-28 JP JP2016230221A patent/JP6574157B2/ja active Active
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2017
- 2017-06-26 KR KR1020170080342A patent/KR20170077097A/ko not_active Ceased
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2018
- 2018-07-09 JP JP2018130156A patent/JP2019004151A/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6787052B1 (en) * | 2000-06-19 | 2004-09-07 | Vladimir Vaganov | Method for fabricating microstructures with deep anisotropic etching of thick silicon wafers |
| US20030003759A1 (en) * | 2001-06-27 | 2003-01-02 | Infineon Technologies North America Corp | Etch selectivity inversion for etching along crystallographic directions in silicon |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6377689B2 (ja) | 2018-08-22 |
| JP5851457B2 (ja) | 2016-02-03 |
| JP6140207B2 (ja) | 2017-05-31 |
| KR20070100617A (ko) | 2007-10-11 |
| TWI533459B (zh) | 2016-05-11 |
| TWI466488B (zh) | 2014-12-21 |
| TW201428984A (zh) | 2014-07-16 |
| JP2017103459A (ja) | 2017-06-08 |
| MY152238A (en) | 2014-09-15 |
| JP2019004151A (ja) | 2019-01-10 |
| JP6574157B2 (ja) | 2019-09-11 |
| TW200739681A (en) | 2007-10-16 |
| TWI570776B (zh) | 2017-02-11 |
| TWI336491B (en) | 2011-01-21 |
| JP2014017495A (ja) | 2014-01-30 |
| TW201042951A (en) | 2010-12-01 |
| TWI489523B (zh) | 2015-06-21 |
| JP2017038064A (ja) | 2017-02-16 |
| JP2015133510A (ja) | 2015-07-23 |
| KR20130133733A (ko) | 2013-12-09 |
| JP2007281406A (ja) | 2007-10-25 |
| KR20170077097A (ko) | 2017-07-05 |
| TW201216641A (en) | 2012-04-16 |
| MY143492A (en) | 2011-05-31 |
| TW200721517A (en) | 2007-06-01 |
| KR20150044865A (ko) | 2015-04-27 |
| TW201519287A (zh) | 2015-05-16 |
| MY163588A (en) | 2017-09-29 |
| KR20140107158A (ko) | 2014-09-04 |
| TW201717261A (zh) | 2017-05-16 |
| MY151572A (en) | 2014-06-13 |
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