TWI329681B - - Google Patents
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- TWI329681B TWI329681B TW092132450A TW92132450A TWI329681B TW I329681 B TWI329681 B TW I329681B TW 092132450 A TW092132450 A TW 092132450A TW 92132450 A TW92132450 A TW 92132450A TW I329681 B TWI329681 B TW I329681B
- Authority
- TW
- Taiwan
- Prior art keywords
- oxide
- heat
- coating layer
- substrate
- resistant
- Prior art date
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- 239000000758 substrate Substances 0.000 claims description 128
- 239000011247 coating layer Substances 0.000 claims description 94
- 229910052751 metal Inorganic materials 0.000 claims description 75
- 239000002184 metal Substances 0.000 claims description 72
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 71
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 69
- 229910052799 carbon Inorganic materials 0.000 claims description 67
- 239000012298 atmosphere Substances 0.000 claims description 59
- 239000011248 coating agent Substances 0.000 claims description 55
- 238000000576 coating method Methods 0.000 claims description 55
- 239000002131 composite material Substances 0.000 claims description 54
- 239000010410 layer Substances 0.000 claims description 45
- 238000010438 heat treatment Methods 0.000 claims description 43
- 239000000463 material Substances 0.000 claims description 43
- 239000007789 gas Substances 0.000 claims description 42
- 229910052747 lanthanoid Inorganic materials 0.000 claims description 41
- 150000002602 lanthanoids Chemical class 0.000 claims description 41
- 239000000919 ceramic Substances 0.000 claims description 39
- 238000005245 sintering Methods 0.000 claims description 39
- 229910052726 zirconium Inorganic materials 0.000 claims description 32
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 31
- 150000004767 nitrides Chemical class 0.000 claims description 30
- 239000000203 mixture Substances 0.000 claims description 29
- 238000005507 spraying Methods 0.000 claims description 27
- 229910052721 tungsten Inorganic materials 0.000 claims description 26
- 229910052715 tantalum Inorganic materials 0.000 claims description 24
- 239000011261 inert gas Substances 0.000 claims description 22
- 229910052750 molybdenum Inorganic materials 0.000 claims description 22
- 229910052727 yttrium Inorganic materials 0.000 claims description 20
- 239000007921 spray Substances 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 17
- 239000011224 oxide ceramic Substances 0.000 claims description 17
- 229910052574 oxide ceramic Inorganic materials 0.000 claims description 17
- 238000004663 powder metallurgy Methods 0.000 claims description 17
- 229910052796 boron Inorganic materials 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 229910052758 niobium Inorganic materials 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 11
- 229910000311 lanthanide oxide Inorganic materials 0.000 claims description 10
- 230000003746 surface roughness Effects 0.000 claims description 10
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 9
- 229910052765 Lutetium Inorganic materials 0.000 claims description 7
- 239000011195 cermet Substances 0.000 claims description 7
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 6
- 229910052775 Thulium Inorganic materials 0.000 claims description 6
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 5
- 229910052689 Holmium Inorganic materials 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000002344 surface layer Substances 0.000 claims description 4
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 4
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims description 2
- 238000007254 oxidation reaction Methods 0.000 claims 2
- 150000002736 metal compounds Chemical class 0.000 claims 1
- NCPHGZWGGANCAY-UHFFFAOYSA-N methane;ruthenium Chemical compound C.[Ru] NCPHGZWGGANCAY-UHFFFAOYSA-N 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 230000009467 reduction Effects 0.000 claims 1
- 230000000052 comparative effect Effects 0.000 description 56
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 40
- 239000002245 particle Substances 0.000 description 27
- 239000000843 powder Substances 0.000 description 24
- 229910052786 argon Inorganic materials 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 20
- 238000007751 thermal spraying Methods 0.000 description 19
- 238000012360 testing method Methods 0.000 description 15
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 14
- 229910045601 alloy Inorganic materials 0.000 description 10
- 239000000956 alloy Substances 0.000 description 10
- 238000005260 corrosion Methods 0.000 description 9
- 230000007797 corrosion Effects 0.000 description 9
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 7
- 230000004888 barrier function Effects 0.000 description 7
- 229910052746 lanthanum Inorganic materials 0.000 description 7
- 150000002739 metals Chemical class 0.000 description 7
- 238000005488 sandblasting Methods 0.000 description 7
- 239000002002 slurry Substances 0.000 description 7
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 7
- 229910052691 Erbium Inorganic materials 0.000 description 6
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 6
- 238000010304 firing Methods 0.000 description 6
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 6
- 239000010955 niobium Substances 0.000 description 6
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- -1 cermets Substances 0.000 description 5
- 238000005253 cladding Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 230000009257 reactivity Effects 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 150000001247 metal acetylides Chemical class 0.000 description 4
- 238000004901 spalling Methods 0.000 description 4
- 229910052693 Europium Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 229910052772 Samarium Inorganic materials 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 150000002910 rare earth metals Chemical class 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 229910003468 tantalcarbide Inorganic materials 0.000 description 2
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 2
- 238000005382 thermal cycling Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- QIJNJJZPYXGIQM-UHFFFAOYSA-N 1lambda4,2lambda4-dimolybdacyclopropa-1,2,3-triene Chemical compound [Mo]=C=[Mo] QIJNJJZPYXGIQM-UHFFFAOYSA-N 0.000 description 1
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 description 1
- 229910052580 B4C Inorganic materials 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 101100055113 Caenorhabditis elegans aho-3 gene Proteins 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 239000006243 Fine Thermal Substances 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- 229910039444 MoC Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 208000034809 Product contamination Diseases 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 229910009043 WC-Co Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- CFJRGWXELQQLSA-UHFFFAOYSA-N azanylidyneniobium Chemical compound [Nb]#N CFJRGWXELQQLSA-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000007723 die pressing method Methods 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 229910052811 halogen oxide Inorganic materials 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000004255 ion exchange chromatography Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000007561 laser diffraction method Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 229910001172 neodymium magnet Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
- 238000007581 slurry coating method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000011232 storage material Substances 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/10—Sintering only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/18—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
- C23C4/11—Oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Coating By Spraying Or Casting (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Physical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Powder Metallurgy (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002336769A JP4081574B2 (ja) | 2002-11-20 | 2002-11-20 | 耐熱性被覆部材の製造方法 |
| JP2002356171A JP2004190056A (ja) | 2002-12-09 | 2002-12-09 | 耐熱性被覆部材 |
| JP2003089797 | 2003-03-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200420431A TW200420431A (en) | 2004-10-16 |
| TWI329681B true TWI329681B (enExample) | 2010-09-01 |
Family
ID=32329646
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW092132450A TW200420431A (en) | 2002-11-20 | 2003-11-19 | Heat resistant coated member, making method, and treatment using the same |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7507481B2 (enExample) |
| EP (1) | EP1428904A3 (enExample) |
| KR (7) | KR101168422B1 (enExample) |
| CN (1) | CN100497718C (enExample) |
| TW (1) | TW200420431A (enExample) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3996138B2 (ja) * | 2004-03-26 | 2007-10-24 | Ｔｏｗａ株式会社 | 低密着性材料及び樹脂成形型 |
| JP4128161B2 (ja) * | 2004-07-13 | 2008-07-30 | 富士通株式会社 | ハードディスクドライブのキャリッジアセンブリ、およびその製造方法 |
| JP2006199515A (ja) * | 2005-01-18 | 2006-08-03 | Hitachi Tool Engineering Ltd | 耐熱性被覆部材 |
| US20070057391A1 (en) * | 2005-08-05 | 2007-03-15 | Den-Mat Corporation | Method for forming ceramic ingot |
| JP5154141B2 (ja) * | 2007-05-21 | 2013-02-27 | 信越化学工業株式会社 | 希土類酸化物含有溶射基板及び積層板 |
| US8138060B2 (en) * | 2007-10-26 | 2012-03-20 | Shin-Etsu Chemical Co., Ltd. | Wafer |
| US9556374B2 (en) | 2009-08-25 | 2017-01-31 | Kabushiki Kaisha Toshiba | Rare-earth regenerator material particles, and group of rare-earth regenerator material particles, refrigerator and measuring apparatus using the same, and method for manufacturing the same |
| DE102009057444A1 (de) * | 2009-12-08 | 2011-06-09 | Dürr Systems GmbH | Lackieranlagenbauteil mit einer Oberflächenbeschichtung |
| CN102650051A (zh) * | 2011-02-25 | 2012-08-29 | 鸿富锦精密工业（深圳）有限公司 | 铝或铝合金的壳体及其制造方法 |
| US9932852B2 (en) * | 2011-08-08 | 2018-04-03 | General Electric Company | Sensor assembly for rotating devices and methods for fabricating |
| WO2013061836A1 (ja) * | 2011-10-27 | 2013-05-02 | インターメタリックス株式会社 | NdFeB系焼結磁石の製造方法 |
| US9034199B2 (en) | 2012-02-21 | 2015-05-19 | Applied Materials, Inc. | Ceramic article with reduced surface defect density and process for producing a ceramic article |
| US9212099B2 (en) | 2012-02-22 | 2015-12-15 | Applied Materials, Inc. | Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics |
| US9090046B2 (en) | 2012-04-16 | 2015-07-28 | Applied Materials, Inc. | Ceramic coated article and process for applying ceramic coating |
| TW201418190A (zh) * | 2012-07-06 | 2014-05-16 | Tocalo Co Ltd | 具有溶射被覆層之碳材料 |
| US9604249B2 (en) | 2012-07-26 | 2017-03-28 | Applied Materials, Inc. | Innovative top-coat approach for advanced device on-wafer particle performance |
| US9343289B2 (en) | 2012-07-27 | 2016-05-17 | Applied Materials, Inc. | Chemistry compatible coating material for advanced device on-wafer particle performance |
| WO2014085276A1 (en) * | 2012-11-30 | 2014-06-05 | Ceralink Inc. | Method of sintering ceramic articles by exothermic heating |
| JP5854512B2 (ja) * | 2012-12-17 | 2016-02-09 | 信越化学工業株式会社 | 熱分解窒化ホウ素被覆炭素質基材の製造方法 |
| CN103266294A (zh) * | 2013-03-07 | 2013-08-28 | 贵阳嘉瑜光电科技咨询中心 | 一种在hem晶体生长中重复使用钼坩埚的方法 |
| US9865434B2 (en) | 2013-06-05 | 2018-01-09 | Applied Materials, Inc. | Rare-earth oxide based erosion resistant coatings for semiconductor application |
| US9850568B2 (en) | 2013-06-20 | 2017-12-26 | Applied Materials, Inc. | Plasma erosion resistant rare-earth oxide based thin film coatings |
| KR101585446B1 (ko) * | 2013-12-31 | 2016-01-15 | 현대자동차주식회사 | 슬러리 조성물 및 이를 이용한 용사코팅용 분말제조방법 |
| US9869013B2 (en) * | 2014-04-25 | 2018-01-16 | Applied Materials, Inc. | Ion assisted deposition top coat of rare-earth oxide |
| US20220013335A1 (en) * | 2015-11-16 | 2022-01-13 | Coorstek, Inc. | Corrosion-resistant components |
| KR102674364B1 (ko) * | 2015-11-16 | 2024-06-13 | 쿠어스 테크, 인코포레이티드 | 내부식성 부품 및 제조 방법 |
| JP6908973B2 (ja) * | 2016-06-08 | 2021-07-28 | 三菱重工業株式会社 | 遮熱コーティング、タービン部材、ガスタービン、ならびに遮熱コーティングの製造方法 |
| CN107904559B (zh) * | 2017-12-21 | 2019-11-12 | 福州大学 | 一种具有复合陶瓷涂层的内加热蒸发舟及其制备方法 |
| US11047035B2 (en) | 2018-02-23 | 2021-06-29 | Applied Materials, Inc. | Protective yttria coating for semiconductor equipment parts |
| JP7169077B2 (ja) | 2018-03-26 | 2022-11-10 | 三菱重工業株式会社 | 遮熱コーティング、タービン部材、ガスタービン及び遮熱コーティングの製造方法 |
| JP6939853B2 (ja) * | 2018-08-15 | 2021-09-22 | 信越化学工業株式会社 | 溶射皮膜、溶射皮膜の製造方法、及び溶射部材 |
| CN109898055A (zh) * | 2019-03-27 | 2019-06-18 | 中国航发北京航空材料研究院 | 一种用于纤维增强镍基复合材料界面纳米多层扩散障涂层的制备方法 |
| KR102416899B1 (ko) * | 2020-05-15 | 2022-07-05 | 피에스테크놀러지(주) | 소결용 지그 및 소결용 지그의 제조 방법 |
| CN111889684B (zh) * | 2020-07-17 | 2022-04-08 | 洛阳科威钨钼有限公司 | 一种煤粉直接点火燃烧器的制备方法 |
| CN112159946B (zh) * | 2020-09-04 | 2022-11-29 | 崇义章源钨业股份有限公司 | 防粘涂层和碳基舟皿及其制备方法 |
| RU2766627C1 (ru) * | 2021-06-07 | 2022-03-15 | Федеральное государственное казенное военное образовательное учреждение высшего образования "Краснодарское высшее военное авиационное училище летчиков имени Героя Советского Союза А.К. Серова" | Способ нанесения теплозащитного износостойкого покрытия на детали из чугуна и стали |
| CN115287574B (zh) * | 2022-08-25 | 2023-06-16 | 航天特种材料及工艺技术研究所 | 一种高韧性抗烧蚀涂层及其制备方法 |
| CN116334522B (zh) * | 2023-01-17 | 2025-11-21 | 江西省科学院应用物理研究所 | 纳米稀土氧化物及其掺杂WC-CoCr喷涂粉末、涂层、制备方法 |
| TWI853755B (zh) * | 2023-11-29 | 2024-08-21 | 財團法人金屬工業研究發展中心 | 醫療植入物的表面處理方法及所處理獲得的醫療植入物 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60141103U (ja) | 1984-02-28 | 1985-09-18 | 住友特殊金属株式会社 | 希土類磁石熱処理用台板 |
| DE3543802A1 (de) * | 1985-12-12 | 1987-06-19 | Bbc Brown Boveri & Cie | Hochtemperatur-schutzschicht und verfahren zu ihrer herstellung |
| JPH03277764A (ja) | 1990-03-27 | 1991-12-09 | Komatsu Ltd | 溶射皮膜方法 |
| JP3179812B2 (ja) | 1991-09-17 | 2001-06-25 | トーカロ株式会社 | 密着性に優れた金属溶射被覆層を有する炭素部材 |
| JPH05271900A (ja) | 1992-03-23 | 1993-10-19 | Mitsubishi Heavy Ind Ltd | 溶射皮膜の加熱加圧方法 |
| JPH05320860A (ja) | 1992-05-18 | 1993-12-07 | Tosoh Corp | 溶射用ジルコニア粉末 |
| JPH0665745A (ja) | 1992-08-24 | 1994-03-08 | Sumitomo Electric Ind Ltd | ダイヤモンド被覆硬質材料およびその製造法 |
| JPH0673522A (ja) | 1992-08-27 | 1994-03-15 | Toyota Motor Corp | 断熱性溶射材料 |
| JP3403459B2 (ja) | 1993-07-22 | 2003-05-06 | トーカロ株式会社 | セラミック溶射皮膜を備えた炭素製部材 |
| SE506482C2 (sv) * | 1996-04-23 | 1997-12-22 | Sandvik Ab | Sintringsunderlag |
| DE19758751B4 (de) * | 1997-04-16 | 2010-12-02 | Deutsches Zentrum für Luft- und Raumfahrt e.V. | Keramische Wärmedämmschichten mit Keulenstruktur |
| CN1069616C (zh) * | 1997-12-19 | 2001-08-15 | 化学工业部天津化工研究院 | 氧化锆-氧化铝复合物的制法及其用途 |
| US6159610A (en) * | 1998-06-12 | 2000-12-12 | Ut-Battelle, Llc | Buffer layers on metal surfaces having biaxial texture as superconductor substrates |
| JP2000094090A (ja) | 1998-09-21 | 2000-04-04 | Toshiba Corp | 鋳造用鋳型およびその製造方法 |
| JP2000281469A (ja) | 1999-03-31 | 2000-10-10 | Ngk Insulators Ltd | 被覆層を有する炭素複合材およびその製造方法 |
| EP1178129B1 (en) | 1999-11-29 | 2010-12-15 | Fujikura Ltd. | Polycrystalline thin film and method for preparation thereof, and superconducting oxide and method for preparation thereof |
| EP1642994B8 (en) * | 2000-06-29 | 2017-04-19 | Shin-Etsu Chemical Co., Ltd. | Rare earth oxid powder used in thermal spray coating |
| JP3672833B2 (ja) | 2000-06-29 | 2005-07-20 | 信越化学工業株式会社 | 溶射粉及び溶射被膜 |
| JP3994253B2 (ja) | 2000-07-24 | 2007-10-17 | 宇部興産株式会社 | セラミックス複合材料 |
| US6916534B2 (en) | 2001-03-08 | 2005-07-12 | Shin-Etsu Chemical Co., Ltd. | Thermal spray spherical particles, and sprayed components |
| EP1243666B1 (en) | 2001-03-21 | 2008-05-07 | Shin-Etsu Chemical Co., Ltd. | Thermal spray rare earth oxide particles, sprayed components and corrosion resistant components |
| US6596397B2 (en) | 2001-04-06 | 2003-07-22 | Shin-Etsu Chemical Co., Ltd. | Thermal spray particles and sprayed components |
| JP4650598B2 (ja) | 2001-05-07 | 2011-03-16 | 信越化学工業株式会社 | 半導体製造装置用酸化物溶射用粒子およびその製造方法、ならびに半導体製造装置用部材 |
| JP2002371383A (ja) * | 2001-06-18 | 2002-12-26 | Shin Etsu Chem Co Ltd | 耐熱性被覆部材 |
| JP2003073794A (ja) | 2001-06-18 | 2003-03-12 | Shin Etsu Chem Co Ltd | 耐熱性被覆部材 |
| JP3865363B2 (ja) | 2001-09-11 | 2007-01-10 | 株式会社タンガロイ | 硬質焼結合金の焼結用セッター |
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| CN1502718A (zh) | 2004-06-09 |
| KR20040044167A (ko) | 2004-05-27 |
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| EP1428904A3 (en) | 2004-08-18 |
| US7507481B2 (en) | 2009-03-24 |
| CN100497718C (zh) | 2009-06-10 |
| KR20110003457A (ko) | 2011-01-12 |
| EP1428904A2 (en) | 2004-06-16 |
| KR20130046411A (ko) | 2013-05-07 |
| KR20120090883A (ko) | 2012-08-17 |
| KR101168422B1 (ko) | 2012-07-25 |
| KR20110003458A (ko) | 2011-01-12 |
| KR20110003456A (ko) | 2011-01-12 |
| KR20130048750A (ko) | 2013-05-10 |
| KR101313417B1 (ko) | 2013-10-01 |
| TW200420431A (en) | 2004-10-16 |
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