TWI305867B - - Google Patents
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- TWI305867B TWI305867B TW095101068A TW95101068A TWI305867B TW I305867 B TWI305867 B TW I305867B TW 095101068 A TW095101068 A TW 095101068A TW 95101068 A TW95101068 A TW 95101068A TW I305867 B TWI305867 B TW I305867B
- Authority
- TW
- Taiwan
- Prior art keywords
- photosensitive resin
- mass
- compound
- carboxyl group
- parts
- Prior art date
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- -1 oxetane compound Chemical class 0.000 claims description 53
- 229920005989 resin Polymers 0.000 claims description 50
- 239000011347 resin Substances 0.000 claims description 50
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 42
- 239000011342 resin composition Substances 0.000 claims description 39
- 150000001875 compounds Chemical class 0.000 claims description 35
- 238000000576 coating method Methods 0.000 claims description 26
- 239000011248 coating agent Substances 0.000 claims description 23
- 125000006850 spacer group Chemical group 0.000 claims description 20
- 239000003999 initiator Substances 0.000 claims description 13
- 239000003513 alkali Substances 0.000 claims description 10
- 238000011282 treatment Methods 0.000 claims description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 229920006395 saturated elastomer Polymers 0.000 claims description 5
- 238000007334 copolymerization reaction Methods 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 4
- 125000003566 oxetanyl group Chemical group 0.000 claims description 4
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical group C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 238000003384 imaging method Methods 0.000 claims 1
- 238000000016 photochemical curing Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 28
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 27
- 239000010408 film Substances 0.000 description 21
- 239000000047 product Substances 0.000 description 21
- 239000000126 substance Substances 0.000 description 16
- 238000003860 storage Methods 0.000 description 14
- 150000008065 acid anhydrides Chemical class 0.000 description 13
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Natural products CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 12
- 125000000217 alkyl group Chemical group 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 9
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 8
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 8
- 229920000647 polyepoxide Polymers 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 8
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 7
- 239000003822 epoxy resin Substances 0.000 description 7
- 150000002148 esters Chemical class 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 125000003700 epoxy group Chemical group 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 239000004973 liquid crystal related substance Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 150000005215 alkyl ethers Chemical class 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- 150000007519 polyprotic acids Polymers 0.000 description 5
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- 244000028419 Styrax benzoin Species 0.000 description 4
- 235000000126 Styrax benzoin Nutrition 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 235000008411 Sumatra benzointree Nutrition 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 4
- 229960002130 benzoin Drugs 0.000 description 4
- 239000012965 benzophenone Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 235000019382 gum benzoic Nutrition 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Inorganic materials [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 239000002966 varnish Substances 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
- 230000001588 bifunctional effect Effects 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 229910001882 dioxygen Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000003709 fluoroalkyl group Chemical group 0.000 description 3
- YEJRWHAVMIAJKC-UHFFFAOYSA-N gamma-butyrolactone Natural products O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 150000002460 imidazoles Chemical class 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 3
- XXRMWTWYBZRJCB-UHFFFAOYSA-N oxetane Chemical class C1COC1.C1COC1 XXRMWTWYBZRJCB-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 150000003512 tertiary amines Chemical class 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- WRMNZCZEMHIOCP-UHFFFAOYSA-N 2-phenylethanol Chemical compound OCCC1=CC=CC=C1 WRMNZCZEMHIOCP-UHFFFAOYSA-N 0.000 description 2
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- BVTJGGGYKAMDBN-UHFFFAOYSA-N Dioxetane Chemical compound C1COO1 BVTJGGGYKAMDBN-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- UMLWXYJZDNNBTD-UHFFFAOYSA-N alpha-dimethylaminoacetophenone Natural products CN(C)CC(=O)C1=CC=CC=C1 UMLWXYJZDNNBTD-UHFFFAOYSA-N 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 229930188620 butyrolactone Natural products 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- IJDNQMDRQITEOD-UHFFFAOYSA-N sec-butylidene Natural products CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229940014800 succinic anhydride Drugs 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- PYOKUURKVVELLB-UHFFFAOYSA-N trimethyl orthoformate Chemical compound COC(OC)OC PYOKUURKVVELLB-UHFFFAOYSA-N 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- RLUFBDIRFJGKLY-UHFFFAOYSA-N (2,3-dichlorophenyl)-phenylmethanone Chemical compound ClC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1Cl RLUFBDIRFJGKLY-UHFFFAOYSA-N 0.000 description 1
- VMHYWKBKHMYRNF-UHFFFAOYSA-N (2-chlorophenyl)-phenylmethanone Chemical compound ClC1=CC=CC=C1C(=O)C1=CC=CC=C1 VMHYWKBKHMYRNF-UHFFFAOYSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- CFCRODHVHXGTPC-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-pentacosafluorododecane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F CFCRODHVHXGTPC-UHFFFAOYSA-N 0.000 description 1
- KMMOLDZBACYVIN-UHFFFAOYSA-N 1,1,2,2,3,3-hexafluoro-1-[2-[2-[2-[2-[2-[2-(1,1,2,2,3,3-hexafluoropentoxy)propoxy]propoxy]propoxy]propoxy]propoxy]propoxy]pentane Chemical compound CCC(F)(F)C(F)(F)C(F)(F)OCC(C)OCC(C)OCC(C)OCC(C)OCC(C)OCC(C)OC(F)(F)C(F)(F)C(F)(F)CC KMMOLDZBACYVIN-UHFFFAOYSA-N 0.000 description 1
- FWFUGQANHCJOAR-UHFFFAOYSA-N 1,1,2,2,3,3-hexafluorodecane Chemical compound CCCCCCCC(F)(F)C(F)(F)C(F)F FWFUGQANHCJOAR-UHFFFAOYSA-N 0.000 description 1
- NHMQIIWXKSTTCZ-UHFFFAOYSA-N 1,1,2,2,8,8,9,9,10,10-decafluorododecane Chemical compound CCC(F)(F)C(F)(F)C(F)(F)CCCCCC(F)(F)C(F)F NHMQIIWXKSTTCZ-UHFFFAOYSA-N 0.000 description 1
- IJURQEZAWYGJDB-UHFFFAOYSA-N 1,1,2,2-tetrafluoro-1-(1,1,2,2-tetrafluorobutoxy)butane Chemical compound CCC(F)(F)C(F)(F)OC(F)(F)C(F)(F)CC IJURQEZAWYGJDB-UHFFFAOYSA-N 0.000 description 1
- MKNKAWHZNOFVLS-UHFFFAOYSA-N 1,1,2,2-tetrafluoro-1-(1,1,2,2-tetrafluoropropoxy)octane Chemical compound CCCCCCC(F)(F)C(F)(F)OC(F)(F)C(C)(F)F MKNKAWHZNOFVLS-UHFFFAOYSA-N 0.000 description 1
- XKSUVRWJZCEYQQ-UHFFFAOYSA-N 1,1-dimethoxyethylbenzene Chemical compound COC(C)(OC)C1=CC=CC=C1 XKSUVRWJZCEYQQ-UHFFFAOYSA-N 0.000 description 1
- VPBZZPOGZPKYKX-UHFFFAOYSA-N 1,2-diethoxypropane Chemical compound CCOCC(C)OCC VPBZZPOGZPKYKX-UHFFFAOYSA-N 0.000 description 1
- MKPHQUIFIPKXJL-UHFFFAOYSA-N 1,2-dihydroxypropyl 2-methylprop-2-enoate Chemical compound CC(O)C(O)OC(=O)C(C)=C MKPHQUIFIPKXJL-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- ONCICIKBSHQJTB-UHFFFAOYSA-N 1-[4-(dimethylamino)phenyl]propan-1-one Chemical compound CCC(=O)C1=CC=C(N(C)C)C=C1 ONCICIKBSHQJTB-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- FUWDFGKRNIDKAE-UHFFFAOYSA-N 1-butoxypropan-2-yl acetate Chemical compound CCCCOCC(C)OC(C)=O FUWDFGKRNIDKAE-UHFFFAOYSA-N 0.000 description 1
- FNBHVKBYRFDOJK-UHFFFAOYSA-N 1-butoxypropan-2-yl propanoate Chemical compound CCCCOCC(C)OC(=O)CC FNBHVKBYRFDOJK-UHFFFAOYSA-N 0.000 description 1
- QZOPRMWFYVGPAI-UHFFFAOYSA-N 1-chloroindole Chemical compound C1=CC=C2N(Cl)C=CC2=C1 QZOPRMWFYVGPAI-UHFFFAOYSA-N 0.000 description 1
- CRSBERNSMYQZNG-UHFFFAOYSA-N 1-dodecene Chemical compound CCCCCCCCCCC=C CRSBERNSMYQZNG-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- DOVZUKKPYKRVIK-UHFFFAOYSA-N 1-methoxypropan-2-yl propanoate Chemical compound CCC(=O)OC(C)COC DOVZUKKPYKRVIK-UHFFFAOYSA-N 0.000 description 1
- RVNBCIQRFGXLRD-UHFFFAOYSA-N 1-propoxypropan-2-yl propanoate Chemical compound CCCOCC(C)OC(=O)CC RVNBCIQRFGXLRD-UHFFFAOYSA-N 0.000 description 1
- OAMHTTBNEJBIKA-UHFFFAOYSA-N 2,2,2-trichloro-1-phenylethanone Chemical compound ClC(Cl)(Cl)C(=O)C1=CC=CC=C1 OAMHTTBNEJBIKA-UHFFFAOYSA-N 0.000 description 1
- CERJZAHSUZVMCH-UHFFFAOYSA-N 2,2-dichloro-1-phenylethanone Chemical compound ClC(Cl)C(=O)C1=CC=CC=C1 CERJZAHSUZVMCH-UHFFFAOYSA-N 0.000 description 1
- GIMQKKFOOYOQGB-UHFFFAOYSA-N 2,2-diethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)(OCC)C(=O)C1=CC=CC=C1 GIMQKKFOOYOQGB-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- BRKORVYTKKLNKX-UHFFFAOYSA-N 2,4-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC(C(C)C)=C3SC2=C1 BRKORVYTKKLNKX-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- DVVXXHVHGGWWPE-UHFFFAOYSA-N 2-(dimethylamino)benzoic acid Chemical class CN(C)C1=CC=CC=C1C(O)=O DVVXXHVHGGWWPE-UHFFFAOYSA-N 0.000 description 1
- JGAOCDTVTRQLEG-UHFFFAOYSA-N 2-(triphenyl-$l^{5}-phosphanylidene)propanedinitrile Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=C(C#N)C#N)C1=CC=CC=C1 JGAOCDTVTRQLEG-UHFFFAOYSA-N 0.000 description 1
- RVGLEPQPVDUSOJ-UHFFFAOYSA-N 2-Methyl-3-hydroxypropanoate Chemical compound COC(=O)CCO RVGLEPQPVDUSOJ-UHFFFAOYSA-N 0.000 description 1
- ZZEANNAZZVVPKU-UHFFFAOYSA-N 2-[2-[2-[2-[2-[2-[2-(2-hydroxypropoxy)propoxy]propoxy]propoxy]propoxy]propoxy]propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)COC(C)COC(C)COC(C)COC(C)COC(C)CO ZZEANNAZZVVPKU-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- VFBREPODMPKTCC-UHFFFAOYSA-N 2-tert-butyl-9h-fluorene Chemical compound C1=CC=C2C3=CC=C(C(C)(C)C)C=C3CC2=C1 VFBREPODMPKTCC-UHFFFAOYSA-N 0.000 description 1
- WXBXVVIUZANZAU-UHFFFAOYSA-N 2E-decenoic acid Natural products CCCCCCCC=CC(O)=O WXBXVVIUZANZAU-UHFFFAOYSA-N 0.000 description 1
- LMIOYAVXLAOXJI-UHFFFAOYSA-N 3-ethyl-3-[[4-[(3-ethyloxetan-3-yl)methoxymethyl]phenyl]methoxymethyl]oxetane Chemical compound C=1C=C(COCC2(CC)COC2)C=CC=1COCC1(CC)COC1 LMIOYAVXLAOXJI-UHFFFAOYSA-N 0.000 description 1
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 1
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- KNDQHSIWLOJIGP-UHFFFAOYSA-N 826-62-0 Chemical compound C1C2C3C(=O)OC(=O)C3C1C=C2 KNDQHSIWLOJIGP-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- DEVXQDKRGJCZMV-UHFFFAOYSA-K Aluminum acetoacetate Chemical compound [Al+3].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O DEVXQDKRGJCZMV-UHFFFAOYSA-K 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- XDWAZMXMZBJDFI-UHFFFAOYSA-N C(C(=C)C)(=O)OCCC(=O)O.C(C=C)(=O)O Chemical compound C(C(=C)C)(=O)OCCC(=O)O.C(C=C)(=O)O XDWAZMXMZBJDFI-UHFFFAOYSA-N 0.000 description 1
- DBJFSFSBHGPDPG-GOSISDBHSA-N C(C(=C)C)(=O)OCCC[C@H](C(OC)(OC)OC)CCCCCCCC Chemical compound C(C(=C)C)(=O)OCCC[C@H](C(OC)(OC)OC)CCCCCCCC DBJFSFSBHGPDPG-GOSISDBHSA-N 0.000 description 1
- YJSMVGDOPSWOEM-UHFFFAOYSA-N C(C1CO1)OCCCC(CCCCCC(OC)(OC)OC)CCC Chemical compound C(C1CO1)OCCCC(CCCCCC(OC)(OC)OC)CCC YJSMVGDOPSWOEM-UHFFFAOYSA-N 0.000 description 1
- FVTOQWIQUBLMHD-UHFFFAOYSA-N C1(=CC=CC2=CC=CC=C12)CC1=C(C=CC=C1)P(C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound C1(=CC=CC2=CC=CC=C12)CC1=C(C=CC=C1)P(C1=CC=CC=C1)C1=CC=CC=C1 FVTOQWIQUBLMHD-UHFFFAOYSA-N 0.000 description 1
- TUWJDCSAKCPKHQ-UHFFFAOYSA-N CC1=CC=C(C=C=P(C2=CC=CC=C2)(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 Chemical compound CC1=CC=C(C=C=P(C2=CC=CC=C2)(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 TUWJDCSAKCPKHQ-UHFFFAOYSA-N 0.000 description 1
- WNPVFEWUPCSCCZ-UHFFFAOYSA-N CCC(C=CC(P(C1=CC=CC=C1)C1=CC=CC=C1)=C1C#N)=C1C#N Chemical compound CCC(C=CC(P(C1=CC=CC=C1)C1=CC=CC=C1)=C1C#N)=C1C#N WNPVFEWUPCSCCZ-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- YFPJFKYCVYXDJK-UHFFFAOYSA-N Diphenylphosphine oxide Chemical compound C=1C=CC=CC=1[P+](=O)C1=CC=CC=C1 YFPJFKYCVYXDJK-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical class [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- XYVQFUJDGOBPQI-UHFFFAOYSA-N Methyl-2-hydoxyisobutyric acid Chemical compound COC(=O)C(C)(C)O XYVQFUJDGOBPQI-UHFFFAOYSA-N 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- QOSMNYMQXIVWKY-UHFFFAOYSA-N Propyl levulinate Chemical compound CCCOC(=O)CCC(C)=O QOSMNYMQXIVWKY-UHFFFAOYSA-N 0.000 description 1
- AUNGANRZJHBGPY-SCRDCRAPSA-N Riboflavin Chemical compound OC[C@@H](O)[C@@H](O)[C@@H](O)CN1C=2C=C(C)C(C)=CC=2N=C2C1=NC(=O)NC2=O AUNGANRZJHBGPY-SCRDCRAPSA-N 0.000 description 1
- DBNJSZYFWVVQBO-UHFFFAOYSA-N SOOS Chemical compound SOOS DBNJSZYFWVVQBO-UHFFFAOYSA-N 0.000 description 1
- QHWKHLYUUZGSCW-UHFFFAOYSA-N Tetrabromophthalic anhydride Chemical compound BrC1=C(Br)C(Br)=C2C(=O)OC(=O)C2=C1Br QHWKHLYUUZGSCW-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- RBPAXHFLJGXGPC-UHFFFAOYSA-N [3-hydroxy-2,2-bis(hydroxymethyl)propyl] 2,2,3-trimethylbutanoate Chemical compound CC(C)C(C)(C)C(=O)OCC(CO)(CO)CO RBPAXHFLJGXGPC-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- KZXXJTHFLADKJK-UHFFFAOYSA-N [Fe].C(C)(=N)N Chemical compound [Fe].C(C)(=N)N KZXXJTHFLADKJK-UHFFFAOYSA-N 0.000 description 1
- NKPZYVUQPUPOMS-UHFFFAOYSA-N [N+](=O)([O-])C1=CC=C(C=C=P(C2=CC=CC=C2)(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 Chemical compound [N+](=O)([O-])C1=CC=C(C=C=P(C2=CC=CC=C2)(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 NKPZYVUQPUPOMS-UHFFFAOYSA-N 0.000 description 1
- YZETUZZBXNVESH-UHFFFAOYSA-I [V+5].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O Chemical compound [V+5].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O YZETUZZBXNVESH-UHFFFAOYSA-I 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 125000000641 acridinyl group Chemical class C1(=CC=CC2=NC3=CC=CC=C3C=C12)* 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229940107816 ammonium iodide Drugs 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 150000008378 aryl ethers Chemical class 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- TXHIDIHEXDFONW-UHFFFAOYSA-N benzene;propan-2-one Chemical compound CC(C)=O.C1=CC=CC=C1 TXHIDIHEXDFONW-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- 125000006269 biphenyl-2-yl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C1=C(*)C([H])=C([H])C([H])=C1[H] 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 125000006226 butoxyethyl group Chemical group 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- VFGRALUHHHDIQI-UHFFFAOYSA-N butyl 2-hydroxyacetate Chemical compound CCCCOC(=O)CO VFGRALUHHHDIQI-UHFFFAOYSA-N 0.000 description 1
- BMOACRKLCOIODC-UHFFFAOYSA-N butyl 3-butoxypropanoate Chemical compound CCCCOCCC(=O)OCCCC BMOACRKLCOIODC-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- IXLQOOXAQLYREP-UHFFFAOYSA-K chromium(3+) 3-oxobutanoate Chemical compound [Cr+3].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O.CC(=O)CC([O-])=O IXLQOOXAQLYREP-UHFFFAOYSA-K 0.000 description 1
- HHZAIOOQYMFSFC-UHFFFAOYSA-L cobalt(2+);3-oxobutanoate Chemical compound [Co+2].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O HHZAIOOQYMFSFC-UHFFFAOYSA-L 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229960000956 coumarin Drugs 0.000 description 1
- 235000001671 coumarin Nutrition 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical group C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 150000003983 crown ethers Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- MAWOHFOSAIXURX-UHFFFAOYSA-N cyclopentylcyclopentane Chemical group C1CCCC1C1CCCC1 MAWOHFOSAIXURX-UHFFFAOYSA-N 0.000 description 1
- QECQLMGRLZYSEW-UHFFFAOYSA-N decoxybenzene Chemical compound CCCCCCCCCCOC1=CC=CC=C1 QECQLMGRLZYSEW-UHFFFAOYSA-N 0.000 description 1
- 230000036425 denaturation Effects 0.000 description 1
- 238000004925 denaturation Methods 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- GPLRAVKSCUXZTP-UHFFFAOYSA-N diglycerol Chemical compound OCC(O)COCC(O)CO GPLRAVKSCUXZTP-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- FLISWPFVWWWNNP-BQYQJAHWSA-N dihydro-3-(1-octenyl)-2,5-furandione Chemical compound CCCCCC\C=C\C1CC(=O)OC1=O FLISWPFVWWWNNP-BQYQJAHWSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- GPAYUJZHTULNBE-UHFFFAOYSA-N diphenylphosphine Chemical compound C=1C=CC=CC=1PC1=CC=CC=C1 GPAYUJZHTULNBE-UHFFFAOYSA-N 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- POULHZVOKOAJMA-UHFFFAOYSA-M dodecanoate Chemical compound CCCCCCCCCCCC([O-])=O POULHZVOKOAJMA-UHFFFAOYSA-M 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- GFUIDHWFLMPAGY-UHFFFAOYSA-N ethyl 2-hydroxy-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)O GFUIDHWFLMPAGY-UHFFFAOYSA-N 0.000 description 1
- ZANNOFHADGWOLI-UHFFFAOYSA-N ethyl 2-hydroxyacetate Chemical compound CCOC(=O)CO ZANNOFHADGWOLI-UHFFFAOYSA-N 0.000 description 1
- UKDLORMZNPQILV-UHFFFAOYSA-N ethyl 3-hydroxypropanoate Chemical compound CCOC(=O)CCO UKDLORMZNPQILV-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- WHRIKZCFRVTHJH-UHFFFAOYSA-N ethylhydrazine Chemical compound CCNN WHRIKZCFRVTHJH-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 125000004991 fluoroalkenyl group Chemical group 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- IIRDTKBZINWQAW-UHFFFAOYSA-N hexaethylene glycol Chemical compound OCCOCCOCCOCCOCCOCCO IIRDTKBZINWQAW-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 235000013847 iso-butane Nutrition 0.000 description 1
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002632 lipids Chemical class 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- IKUGFMANZPAVJJ-UHFFFAOYSA-L manganese(2+);3-oxobutanoate Chemical compound [Mn+2].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O IKUGFMANZPAVJJ-UHFFFAOYSA-L 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- VWTREAQKLNMBGC-UHFFFAOYSA-N methyl 2-diphenylphosphanylbenzoate Chemical compound COC(=O)C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 VWTREAQKLNMBGC-UHFFFAOYSA-N 0.000 description 1
- GSJFXBNYJCXDGI-UHFFFAOYSA-N methyl 2-hydroxyacetate Chemical compound COC(=O)CO GSJFXBNYJCXDGI-UHFFFAOYSA-N 0.000 description 1
- VBCSBEIIIFLVQV-UHFFFAOYSA-N methyl 3-butoxypropanoate Chemical compound CCCCOCCC(=O)OC VBCSBEIIIFLVQV-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- JYXPWUYLZPYOAH-UHFFFAOYSA-N methylhydrazine Chemical compound CN=N JYXPWUYLZPYOAH-UHFFFAOYSA-N 0.000 description 1
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N methylimidazole Natural products CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- LZNXRHAOBSKINW-UHFFFAOYSA-N n-[[3,5-dimethyl-4-(oxiran-2-ylmethoxy)phenyl]methyl]-2-methylprop-2-enamide Chemical compound CC1=CC(CNC(=O)C(=C)C)=CC(C)=C1OCC1OC1 LZNXRHAOBSKINW-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- ZPIRTVJRHUMMOI-UHFFFAOYSA-N octoxybenzene Chemical compound CCCCCCCCOC1=CC=CC=C1 ZPIRTVJRHUMMOI-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- CBFCDTFDPHXCNY-UHFFFAOYSA-N octyldodecane Natural products CCCCCCCCCCCCCCCCCCCC CBFCDTFDPHXCNY-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 150000002921 oxetanes Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- IMACFCSSMIZSPP-UHFFFAOYSA-N phenacyl chloride Chemical compound ClCC(=O)C1=CC=CC=C1 IMACFCSSMIZSPP-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229940067107 phenylethyl alcohol Drugs 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003003 phosphines Chemical group 0.000 description 1
- 150000004714 phosphonium salts Chemical group 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- AMLFJZRZIOZGPW-UHFFFAOYSA-N prop-1-en-1-amine Chemical compound CC=CN AMLFJZRZIOZGPW-UHFFFAOYSA-N 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- YGSFNCRAZOCNDJ-UHFFFAOYSA-N propan-2-one Chemical compound CC(C)=O.CC(C)=O YGSFNCRAZOCNDJ-UHFFFAOYSA-N 0.000 description 1
- ILVGAIQLOCKNQA-UHFFFAOYSA-N propyl 2-hydroxypropanoate Chemical compound CCCOC(=O)C(C)O ILVGAIQLOCKNQA-UHFFFAOYSA-N 0.000 description 1
- HJIYVZIALQOKQI-UHFFFAOYSA-N propyl 3-butoxypropanoate Chemical compound CCCCOCCC(=O)OCCC HJIYVZIALQOKQI-UHFFFAOYSA-N 0.000 description 1
- KNCDNPMGXGIVOM-UHFFFAOYSA-N propyl 3-hydroxypropanoate Chemical compound CCCOC(=O)CCO KNCDNPMGXGIVOM-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- RSVDRWTUCMTKBV-UHFFFAOYSA-N sbb057044 Chemical compound C12CC=CC2C2CC(OCCOC(=O)C=C)C1C2 RSVDRWTUCMTKBV-UHFFFAOYSA-N 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- PYHOFAHZHOBVGV-UHFFFAOYSA-N triazane Chemical compound NNN PYHOFAHZHOBVGV-UHFFFAOYSA-N 0.000 description 1
- YFDSDPIBEUFTMI-UHFFFAOYSA-N tribromoethanol Chemical compound OCC(Br)(Br)Br YFDSDPIBEUFTMI-UHFFFAOYSA-N 0.000 description 1
- 229950004616 tribromoethanol Drugs 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- OHBAKIGZYDGQOJ-UHFFFAOYSA-N triphenyl(2-phenylethenylidene)-$l^{5}-phosphane Chemical compound C=1C=CC=CC=1C=C=P(C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 OHBAKIGZYDGQOJ-UHFFFAOYSA-N 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/285—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety
- C08F220/286—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety and containing polyethylene oxide in the alcohol moiety, e.g. methoxy polyethylene glycol (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
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Description
1305867 … (1) 九、發明說明 【發明所屬之技術領域】 本發明係有關感光性樹脂組成物,及其硬化物以及該 硬化物所成之顯示面板用間隔件者。更詳細而言,係有關 適合作爲形成液晶面板、或接觸面板等顯示面板用間隔件 之材料的儲存穩定性、壓縮強度優異的感光性樹脂組成物 ,及其硬化物以及顯示面板用間隔件者。 【先前技術】 以往,爲使液晶面板中兩枚基板之間隔保持於一定, 使用具有所定之粒徑的玻璃珠、塑料珠等間隔件粒子。但 是,此等間隔件粒子,無規散佈於玻璃基板上之故,在有 效畫素部內存在該間隔件時,有間隔件之轉錄、射入光受 散射響使液晶面板之對比降低的問題。爲解決此等問題, 有藉由微影法形成使用感光性樹脂組成物之間隔件的方法 如此之間隔件,要求耐貼黏液晶面板時之壓縮荷重的 性質。但是’使用由感光性樹脂、多官能單體及光聚合引 發劑所構成之以往的感光性樹脂組成物所形成之間隔件, 有硬度不足、在彩色濾色片與TFT陣列基板之組裝(元件 壓黏)時的高溫高壓下,塑性變性量增大,導致妨礙作爲 間隔件之機能的問題,依然殘留改善之餘地。 又,間隔件,爲在液晶面板中作爲永久膜使用,亦要 求耐熱性及耐藥品性。因此,爲使此用途中使用之感光性 -4 - 1305867 ' * (2) 樹目曰組成物獲得作爲永久膜的特性,有使用同—·分子內兼 具羧基與環氧基之熱硬化樹脂(參照專利文獻1),亦有添 , 加與黏結劑樹脂反應而得之環氧樹脂等交聯劑的情況(參 照專利文獻2)。不過,使用環氧系之交聯劑的感光性樹 、 脂組成物時,引起交聯反應之環氧基的反應性高,存在有 儲存穩定性成爲問題、或操作性降低等不適宜之情況。難 以使硬化物之特性與操作性兩立。 # 專利文獻1 :特開平1 1 - 1 3 3 600號公報(申請專利範圍) 專利文獻2 :特開平2001-3 24809號公報(申請專利範 圍) 【發明內容】 [發明所欲解決之課題] 本發明基於上述各項問題,其目的係提供一種,即使 在室溫保管條件下亦不造成感光性樹脂組成物之黏度增加 • 或膠化,具有充分之儲存穩定性,且兼備作爲永久膜所必 要的耐熱性 '耐藥品性,進而可形成壓縮強度優越之顯示 面板用間隔件的感光性樹脂組成物。本發明之另一目的係 提供,使該感光性樹脂組成物照射活性能量線,進行加熱 硬化而得之硬化物、及以該硬化物所形成之顯示面板用間 隔件。 [課題之解決手段] 本發明的工作同仁爲達成上述目的,經深入探討與不 -5 - 1305867 .. (3) * 斷硏究之結果發現,其基本形態係,一種感光性樹脂組成 物,其爲含有: 、 (A)l分子中兼具羧基與至少兩個乙烯性不飽和鍵之 含有羧基的感光性樹脂、 (B) l分子中具有一個以上乙烯性不飽和鍵之聚合性 化合物、 (C) 光聚合引發劑、及 φ (D)l分子中具有至少2個氧雜環丁烷基之氧雜環丁烷 化合物的組成物; 其特徵爲該含有羧基之感光性樹脂(A),係含有以具有 下述一般式(1)所示之不飽和雙鍵的化合物作爲共聚合成份 之含羧基的感光性樹脂。其儲存穩定性優越,使該感光性 樹脂組成物硬化所成之硬化物,硬度、耐熱性、耐藥品性 、壓縮強度優異,完成本發明。 【化2】
式中,X爲0〜2之整數;R1爲氫或甲基;R2爲碳數 10〜20之二環戊二烯衍生物、或碳數10~20之三環癸烷衍生 物。 又,依本發明,可提供經由: 使該感光性樹脂組成物塗佈•乾燥之形成塗膜步驟。 • 6 - 1305867 (4) 在經該形成塗膜步驟而得之塗膜上,選擇性照射活性 能量線之光硬化處理步驟、 在光硬化處理步驟之後,使用鹼顯像液去除未照射部 份而得圖型之鹼顯像步驟、及 將該鹼顯像步驟所得之圖型加熱•硬化的步驟,而得 之硬化物。 還有,本發明中,所謂「活性能量線」,係指包含可 > 見光線、紫外線、遠紫外線、電子線、X射線等之意。 進而,依本發明可提供,由使用該感光性樹脂組成物 而得之耐熱性、耐藥品性優越,且壓縮強度優異的硬化物 所成之顯示面板用間隔件。 [發明之功效] 本發明之感光性樹脂組成物,係含有作爲交聯成份之 氧雜環丁烷化合物的硬化系之故,儲存穩定性優越,所得 φ 硬化物具有充分的耐熱性、耐藥品性。即,本發明之感光 性樹脂組成物,全無以往使用環氧樹脂作爲交聯成份時之 儲存穩定性劣化的問題,可形成耐熱性、耐藥品性等各特 性優異之硬化物。進而,本發明之感光性樹脂組成物,從 賦予硬化物優越的透明性而言,極適合於間隔件或平坦化 膜等用途。又,從儲存穩定性優越而言,操作性優異 '且 藉由切斷活性可減少感光性樹脂組成物之廢棄等,從經濟 性之點而言,非常適合。即,依本發明之感光性樹脂組成 物,由於儲存穩定性優越可省略即將使用前之2液混合的 -7 - (5) 1305867 « - . 手續,能提供操作性優異之作爲1液型的感光性樹脂組成 物。 [發明之實施形態i ' 本發明之感光性組成物中,作爲交聯成份增加之氧雜 環丁烷化合物,具有肆圜之氧雜環丁烷基,其熱硬化時與 鹼可溶性感光性樹脂之羧基反應,主要產生伯羥基之故。 Φ 與使用主要產生仲羥基之環氧樹脂的情況比較,可獲得密 著性優異之硬化物。又,氧雜環丁烷化合物與環氧樹脂比 較’在低溫的反應遲緩之故,含有其之感光性組成物的儲 存壽命延長,從操作性或經濟性之點而言,極爲適合。 就本發明之感光性組成物的各構成成份,詳細說明如 下。 本發明之分子中兼具羧基與至少兩個乙烯性不飽和鍵 的含有羧基之感光性樹脂(A) ’係含有以具有下述—般式 Φ (1)所示之不飽和雙鍵的化合物作爲共聚合成份之含殘基 感光性樹脂。
式中,X爲〇〜2之整數;R1爲氫或甲基;r2爲碳數 10〜20之二環戊二烯衍生物、或碳數ι〇~20之三環癸院衍生 1305867 - (6) * 物。 如此之含殘基感光性樹脂(A),係含有以具有該一般式 (1)所示之不飽和雙鍵的化合物作爲共聚合成份,可提升玻 璃轉移溫度、且透明性高之故,能顯著提高由使用其之感 光性樹脂組成物而得的硬化物之硬度,壓縮強度、耐熱性 、耐藥品性。 如此之含羧基感光性樹脂(A),並不限定於特定者。尤 其可使用藉由下述列舉之不飽和單體的共聚合所合成之感 光性樹脂。 (1) 藉由在含有(a)不飽和羧酸、與(b)具有該一般式(1) 所示之不飽和雙鍵的化合物、或進而(c)具有其他之不飽雙 鍵的化合物之共聚物中,附加乙烯性不飽和基作爲側基而 得之含羧基感光性樹脂。 (2) 使含有(d)具有環氧基與不飽和雙鍵之化合物、與 (b)具有該一般式(1)所不之不飽和雙鍵的化合物、或進而(c) 具有其他之不飽和雙鍵的化合物之共聚物,與(a)不飽和羧 酸反應,在生成之仲羥基中與(e)飽和或不飽和多元酸酐反 應而得的含羧基感光性樹脂。 (3) 使含有(f)具有不飽和雙鍵之酸酐、與(b)具有該一般 式(1)所示之不飽和雙鍵的化合物、或進而(c)具有其他之不 飽和雙鍵的化合物之共聚物,與(g)具有羥基與不飽和雙鍵 之化合物反應而得的含羧基感光性樹脂等。 該含有羧基感光性樹脂(1)及(2)之合成所使用的不飽和 羧酸(a)有,例如丙烯酸、甲基丙烯酸、衣康酸、/3-羧基乙 1305867 ' - (7) - 基丙烯酸酯' 羧基乙基甲基丙烯酸酯、或含有羥基之(甲 基)丙烯酸酯中附加多元酸酐的化合物等。此等之中,從感 . 光性' 反應性、儲存穩定性之方面而言,以丙烯酸或甲基 丙烯酸更適合。此等不飽和單羧基(a),可單獨或兩種以上 混合使用。 還有,本說明書中所謂(甲基)丙烯酸酯,係丙烯酸酯與 甲基丙烯酸酯之總稱用語,其餘類推。 φ 本發明之含羧基感光性樹脂的特徵之具有該一般式(1) 所示的不飽和雙鍵之化合物(b)的具體例有,(甲基)丙烯酸 二環戊烯基酯、(甲基)丙烯酸二環戊烯基氧乙基酯、.(甲基) 丙烯酸二環戊基酯等。具市售品有,例如日立化成工業公 司製之華恩庫利魯 FA-511A、FA-512A、FA-513A、FA-512M、FA-513M 等。 該含羧基感光性樹脂(1)、(2)及(3)之合成所使用的其 他具有不飽和雙鍵之化合物(c),可使用眾所周知慣用之單 • 官能單體。例如苯乙烯、氯苯乙烯、α-甲基苯乙烯;以甲 基 '乙基、丙基、異丙基、正丁基、異丁基、叔丁基、戊基 、2-乙基己基、辛基、壬基、癸基、(十二)烷基、(十六)烷 基、(十八)烷基、環己基、異冰片基、甲氧基乙基、丁氧基 乙基、2-羥基乙基、2-羥基丙基、3_氯-2·羥基丙基等爲取代 基之具有取代基的丙烯酸酯、甲基丙烯酸酯或反丁烯二酸 酯;聚乙二醇之單丙烯酸酯或單甲基丙烯酸酯 '或聚丙二 醇之單丙烯酸酯、單甲基丙烯酸酯、乙酸乙烯酯、丁酸乙烯 酯或苯甲酸乙烯酯;乙烯、丙烯等烯烴類;丙烯腈等。 -10- 1305867 .- (8) . 該含羧基感光性樹脂(2)之合成所使用的具有環氧基與 不飽和雙鍵之化合物(d)有,(甲基)丙烯酸環氧丙基酯、(甲 基)丙烯酸/3-甲基環氧丙基酯、(甲基)丙烯酸/3-乙基環氧丙 基酯、Ν_[4·(2,3-環氧丙氧基)-3,5-二甲基苄基]丙烯醯胺、 N-[4-(2,3-環氧丙氧基)-3,5-二甲基苄基]甲基丙烯醯胺、丁 烯酸環氧丙基酯、或3,4-環氧環乙基甲基(甲基)丙烯酸酯等 。此等之中,從反應性而言,以(甲基)丙烯酸環氧丙基酯爲 • 佳。 該含羧基感光性樹脂(2)之合成所使用的該飽和或不 飽和多元酸酐(e)有,甲基四氫苯二甲酸酐.、四氫苯二甲 酸酐、六氫苯二甲酸酐、甲基六氫苯二甲酸酐、納吉庫酸 酐、3,6_內亞甲基四氫苯二甲酸酐、甲基內亞甲基四氫苯 二甲酸酐、四溴苯二甲酸酐等脂環式二元酸酐;丁二酸酐 、順丁烯二酸酐、衣康酸酐 '辛烯基丁二酸酐、(十五)烯 基丁二酸酐、苯二甲酸酐、偏苯三酸酐等脂肪族或芳香族 φ 多元酸酐等。此等可一種或兩種以上使用。此等之中,從 顯像性而言,以脂環式二元酸酐爲佳。 該含羧基感光性樹脂(3)之合成所使用的具有不飽和 雙鍵之酸酐(f)有,順丁烯二酸酐、衣康酸酐、進而均苯 四甲酸酐與2·羥基乙基(甲基)丙烯酸酯、2-羥基丙基(甲 基)丙烯酸酯等羥基烷基(甲基)丙烯酸酯類等具有羥基之 不飽和化合物的部份反應生成物等。此等可單獨或兩種以 上組合使用。此等之中,以能穩定合成聚合物之順丁烯二 酸酐爲佳。 -11 - 1305867 Ο) 該含羧基感光性樹脂(3)之合成所使用的具有羥基與 不飽和雙鍵之酸酐(g)有,(甲基)丙烯酸2-羥基乙基酯、( 甲基)丙烯酸酯2-羥基丙基酯、(甲基)丙烯酸酯4_羥基丁 基酯等(甲基)丙烯酸羥基烷基酯類;二乙二醇單(甲基)丙 烯酸酯、二丙二醇單(甲基)丙烯酸酯、三羥甲基丙烷二( 甲基)丙烯酸酯、丙三醇二(甲基)丙烯酸酯、季戊四醇三( 甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯等。進而 ,可使用在上述化合物之羥基上附加ε-己內酯等環狀酯 的化合物。此等可單獨或兩種以上組合使用。 如此之含羧基感光性樹脂(Α),可單獨或混合使用。 任一情況此等之合計爲組成物全量之5~80質量%,較佳 爲10~60質量%之比例配合更適合。進而,因應需求,可 少量添加上述以外之含羧基感光性樹脂,例如在環氧丙烯 酸酯中附加多元酸酐之樹脂。 該含羧基感光性樹脂(Α)之酸價爲30~250 mgKOH/g, 較佳爲50~150 mgKOH/g。該含羧基感光性樹脂之酸價未 達30 mgKOH/g時,難以進行與該氧雜環丁烷化合物(D) 之充分的硬化反應,又,相對於鹼水溶液之溶解性不足, 容易造成顯像不良。另—方面,超過250 mgK0H/g之情 況,顯像時容易造成皮膜的密著性劣化或光硬化部(曝光 部)之溶解,甚不適合。 又,含羧基感光性樹脂(A)之雙鍵當量爲350~2,0〇0, 適合使用較佳爲斗00〜1,5 00者。含羧基感光性樹脂(A)之 雙鍵當量未達3 5 0之情況,儲存穩定性降低,硬化物之強 -12- (11) 1305867 上述3官能以上之(甲基)丙烯酸酯有,例如三淫甲基 丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、三 [(甲基)丙烯醯氧基乙基]磷酸酯 '季戊四醇四(甲基)丙燒 酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲 基)丙烯酸酯等。其市售品有,例如阿洛尼庫斯M_3〇9、 同 M-400、同 M-402、同 M-405、同 M-450、同 M-7100、 同 M-8030、同 M-8060、同 Μ -13 1 0、同 Μ -1 6 0 〇、同 Μ-1960、同 Μ-8100、同 Μ-8530、同 Μ-8560、同 Μ-9050、 同ΤΟ-1450(以上爲東亞合成股份有限公司製,卡亞拉得 ΤΜΡΤΑ、同 DPHA、同 DPCA-20、同 D P C A - 3 0、同 D P C A-60、同DPCA-120(以上爲日本化藥股份有限公司製),比 斯口多 295、同 300、同 360、同 GPT、同 3PA、同 400( 以上爲大阪有機化學工業股份有限公司製)等。此等單官 能、2官能或3官能以上之(甲基)丙烯酸酯,可單獨或組 合使用。 此等聚合性化合物(B)之配合量’相對於該含羧基感 光性樹脂(A) 1 〇 〇質量份,以5〜1 0 0質量份爲佳’更佳爲 5 ~50質量份。(B)成份未達5質量份’不能獲得充分的硬 化性。另一方面,爲100質量份以上時,指觸乾燥性惡化 ,硬化物脆化’甚不適合。 該光聚合引發劑(C),可使用藉由照射活性能量線產 生自由基之眾所周知的化合物’例如苯乙醇、2,2·二甲氧 基-2-苯基苯乙酮、2,2-二乙氧基-2-苯基苯乙酮、對-二甲 基胺基苯丙酮、二氯苯乙酮、三氯苯乙酮、對·叔丁基三 -14 - (12) 1305867 氯苯乙酮' 1-羥基環己基苯基酮、2-甲基-l-[4-(甲硫基)苯 基]·2-嗎啉(代)_丙烷-;!_酮、2_苄基-2_二甲基胺基、嗎 琳(代)苯基)丁酮-1、N,N-二甲基胺基苯乙酮等苯乙酮類; 二苯甲酮 '甲基二苯甲酮、2-氯二苯甲酮、4,4、二氯二苯 甲酮、4,4,_雙二甲基胺基二苯甲酮、4,4,_雙二乙基胺基二 苯甲酮、米布勒酮、4-苯甲醯基-4,-甲基二苯基硫化物等 二苯甲酮類;苯偶醯、苯偶姻、苯偶姻甲基醚、苯偶姻乙 基醚、苯偶姻異丙基醚、苯偶姻異丁基醚等苯偶姻醚類; 苯乙酮二甲基縮酮、苯偶醯二甲基縮酮等縮酮類;噻噸酮 、2-氯噻噸酮、2,4-二甲基噻噸酮、2,4_二乙基噻噸酮、 2,4-二異丙基噻噸酮等噻噸酮類;2·甲基蒽醌、2-乙基恵 醌、2-叔丁基蒽醌、1-氯蒽醌、2-胺基蒽醌、2,3-二苯基 蒽醌等蒽醌類;苯甲醯基過氧化物、異丙苯基過氧化物等 有機過氧化物;2,4,5-三芳基咪唑二聚物、核黃素四丁酸 酯' 2 -毓基苯并咪唑、2 -巯基苯并噁唑、2 -毓基苯并噻唑 等硫醇化合物;2,4,6-三-S·三嗪、2,2,2·三溴乙醇、三溴甲 基苯基碾等有機鹵化物,· 2,4,6-三甲基苯甲醯基二苯基膦 氧化物等。又’其他之例有’吖啶化合物類、肟酯類等。 此等化合物,可單獨或兩種以上組合使用。 進而,如上述之光聚合引發劑(c)可使用Ν,Ν·二甲基 胺基苯甲酸乙基酯、Ν,Ν -二甲基胺基苯甲酸異戊基酯、戊 基-4-二甲基胺基苯甲酸酯 '三乙胺、三乙醇胺等叔胺類 ;硫代雙乙醇等硫醚類;氧化香豆素、噻噸等增感色 素類;菁、若丹明、藏紅 '孔雀綠、亞甲藍等烷基硼酸鹽 -15 - 1305867 . (13) . 等光增感劑或促進劑之一種或兩種以上組合。 該光聚合引發劑(C)之較佳組合有’ 2-甲基·1-[4-(甲 硫基)苯基l·2-嗎啉(代)-丙烷-1·酮(例如吉巴特殊化學品公 司製之依魯加丘爾- 907)、與2-氯噻噸酮(例如日本化藥股 • 份有限公司製之卡亞丘爾CTX),或2,4·二乙基噻噸酮(例 如日本化藥股份有限公司製之卡亞丘爾DETX)、2-異丙基 噻噸酮、4-苯甲醯基- 4’-甲基二苯基硫化物等之組合。又 g ,上述光聚合引發劑(C)之使用量的適合範圍,相對於該 含羧基感光性樹脂(Α)100質量份爲0.01~30質量份,較佳 爲.0.1 ~ 15質量份之比例。光聚合引發劑之配合比例未達 0.01質量份時,光硬化性惡化;另一方面,比30質量份 多時’硬化塗膜之特性惡化;又,儲存穩定性惡化之故極 不適合。 該氧雜環丁烷化合物(D),爲1分子中具有兩個以上 之氧雜環丁烷基時’均可使用,並非限定於特定之化合物 0 ,從硬化物的透明性之點而言,以使用可溶於後述之有機 溶劑(E)者較爲適合。 2官能氧雜環丁烷化合物’有下述一般式(2)所示之雙 氧雜環丁烷類等。
上述一般式(2)中,R3爲氫原子或碳數之烷基;r4 -16 - (14) 1305867 爲選自氧原子、硫原子、及碳數1~12之線狀或支鏈狀飽和 烴類、碳數1~12之線狀或支鏈狀不飽和烴類 '下述式(I)、 (II)、(III)、(IV)及(V)所示之芳香族烴類、或(VI)及(VII)所 示之含羰基的直鏈狀或環狀之伸烷基類、式(VIII)及(IX)所 示之含羰基的芳香族烴類的具有兩個原子價之基。其他之2 官能氧雜環丁烷化合物,有卡魯多型、萘型等。
式中,R5爲氫原子,碳數1~12之烷基、芳基或芳院基 ;R6 爲-0-、-S.、-CH2-、-NH-、-S〇2-、-CH(CH3)-、-C(CH3)2-、或-C(CF3)2- ; R7爲氫原子或碳數1~6之烷基。 -17- (15)1305867 【化6 Ο ο (;V1) Θ
(Λί) 式中,η爲1~12之整數。
【化7】
im 多官能氧雜環丁烷化合物’除下述一般式(3)所示之 化合物以外’有氧雜環丁醇、與酚醛樹脂、聚(經基苯乙 烯)、卡利庫斯羥基丙二烯類、或倍半矽氧烷等聚矽氧樹 脂類等含有㈣之樹脂_化合物等。其他,具有氧雜環 烷環之不飽和單H、與(甲冑)芮烯酸烷基酯之共聚物等 -18、 (16) 1305867 【化8 R8- -Θ· R9 I-爾-,一,株 H2G—Θ (3) 上述一般式(3)中,R3爲與上述相同者,R8爲該醚化合 物之含有羥基的殘基、下述式(X)、(XI)及(ΧΠ)所示之碳數 1〜12的支鏈狀伸烷基、式(XIII)、(XIV)及(XV))所示之芳香 族烴類。又,m爲殘基R8之鍵結的官能基之數,爲3以上 之整數,較佳爲3~100之整數。
【化9】
【化1 Ο】
c細
-19- (17) 1305867
φ 式中R9爲氫原子,碳數卜6之烷基 '具有取代基之芳 基。 氧雜環丁烷化合物(D)之作用有’與含羧基感光性樹脂 中之羧基反應形成交聯結構’形成經提升耐藥品性、耐熱 性之堅固的硬化物。氧雜環丁烷化合物(D)之配合量,相對 於該含羧基感光性樹脂(A) 1〇〇質量份’以5~100質量份之 比例爲佳’更佳爲15~60質量份。 爲促進氧雜環丁烷化合物(D)、與含羧基感光性樹脂 φ (A)中之羧基的反應,可添加下述所示之反應促進劑。 反應促進劑,可自如叔胺類、咪唑類、季鑰鹽類、叔 膦類、鐵內鑰類、乙醯丙酮金屬錯合物類、或冠醚錯合物 之中隨意選擇;此等可單獨或兩種以上組合使用。 叔胺類有,三乙胺、三丁胺、DBU{1,8-二吖二環 [5.4.0](十一)-7-烯}、DBN{1,5-二吖二環[4.3.0]壬-5-烯} 、DABC0{1,4-二吖二環[2.2.2]辛烷}、吡啶、n,N-二甲基-4-胺基吡啶等。 咪唑類有,咪唑、2·甲基咪唑、2-(十一)烷基咪唑、 -20- (19) 1305867 之例有,(甲醯基亞甲基)三苯基膦、(乙醯基亞甲基)三苯 基膦 '(三甲基乙醯基亞甲基)三苯基膦、(苯甲醯基亞甲 基)三苯基膦、(對-甲氧基苯甲醯基亞甲基)三苯基膦、( 對-甲基苯甲醯基亞甲基)三苯基膦、(對-硝基苯甲醯基亞 甲基)三苯基膦、(萘甲醯基)三苯基膦、(甲氧基羰基)三苯 基膦、(二乙醯基亞甲基)三苯基膦、(乙醯基氰基)三苯基 膦、(二氰基亞甲基)三苯基膦等。 乙醯丙酮錯合物類有,乙醯丙酮釩錯合物、乙醯丙酮 鉻錯合物、乙醯丙酮錳錯合物、乙醯丙酮鐵錯合物、乙醯 丙酮鈷錯合物、乙醯丙酮鎳錯合物、乙醯丙酮鋁錯合物等 〇 此等反應促進劑之使用量,相對於氧雜環丁烷基1莫 耳,以0.1~25莫耳%之比例爲佳,較佳爲0.5~20莫耳% 之比例,更佳爲1~15莫耳%之比例。反應促進劑之使用 量比相對於氧雜環丁烷基〇 . 1莫耳%少時,很難以實用上 之速度進行反應;另一方面,即使超過25莫耳%多量存 在,亦無顯著的促進反應效果,從經濟性之點而言甚不適 合。 本發明之感光性樹脂組成物,爲使該感光性樹脂組成 物均勻溶解、調整黏度,因應需求可使用(E)有機溶劑。 尤其,使該含羧基感光性樹脂(A)、1分子具有一個以上 之乙烯性不飽和鍵的聚合性化合物(B)、光聚合引發劑(C) '及氧雜環丁烷化合物(D)之各成份均勻溶解’以不與各 成份反應者爲佳。各成份對上述有機溶劑(E)之溶解性低 -22- (20) 1305867 時,難以均勻溶解,很難確保間隔件中所要求的透明性之 故,甚不適合。
此等有機溶劑(E)之具體例有,例如甲醇、乙醇等醇 類;四氫呋喃等醚類;乙二醇單甲醚、乙二醇單乙醚等二 醇醚類;甲基溶纖劑乙酸酯、乙基溶纖劑乙酸酯等乙二醇 烷基醚乙酸酯類;二乙二醇單甲醚、二乙二醇單乙醚、二 乙二醇二甲醚等二乙醇類;丙二醇單甲醚、丙二醇單乙醚 、丙二醇單丙醚、丙二醇單丁醚等丙二醇單烷基醚類;丙
、丙二醇丁醚乙酸酯等丙二醇烷基醚乙酸酯類;丙二醇甲 醚丙酸酯、丙二醇乙醚丙酸酯、丙二醇丙醚丙酸酯、丙二 醇丁醚丙酸酯等丙二醇烷基醚丙酸酯類;甲苯、二甲苯等 芳香族烴類;甲乙酮、4-羥基-4-甲基-2·戊酮等酮類;及 乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸丁酯、2-羥基丙酸 乙酯、2-羥基-2-甲基丙酸甲酯、2-羥基-2-甲基丙酸乙酯 、羥基乙酸甲酯、羥基乙酸乙酯、羥基乙酸丁酯、乳酸甲 酯、乳酸乙酯、乳酸丙酯、乳酸丁酯、3-羥基丙酸甲酯、 3-羥基丙酸乙酯、3-羥基丙酸丙酯、3-丁氧基丙酸甲酯、 3-丁氧基丙酸乙酯、3-丁氧基丙酸丙酯、3· 丁氧基丙酸丁 酯等酯類等。 此等有機溶劑(E)中,從溶解性、與各成份之反應性 及形成塗膜之容易度而言,以使用二醇醚類 '乙二醇烷基 醚乙酸酯類、酯類及二乙二醇類爲佳。此等有機溶劑(E) 可單獨或兩種以上混合使用,其使用量沒有特別的限制, -23- (21) 1305867 通常在本發明之感光性樹脂組成物中,爲30〜90質量%, 較佳爲4〇~85質量%之範圍。 本發明之感光性樹脂組成物,在不損及本發明之目的 的範圍’因應需求可含有上述以外之其他成份。 例如爲提升塗佈性之界面活性劑等。界面活性劑可使 用氟系界面活性劑及聚矽氧系界面活性劑。氟系界面活性 劑’可使用在末端、主鏈及側鏈之至少任一部位具有氟烷 基或氟鏈烯基的化合物。其具體例有,1,1,2,2-四氟辛基 (1,1,2,2-四氟丙基)醚、l,i,2,2-四氟辛基己基醚、八乙二醇 二(1,1,2,2·四氟丁基)醚 '六乙二醇二(i,l,2,2,3,3-六氟戊基 )醚、八丙二醇二(1,1,2,2-四氟丁基)醚、六丙二醇二 (1,1,2,2,3,3-六氟戊基)醚、全氟(十二)烷基磺酸鈉、 1,1,2,2,8,8,9,9,10,10-十氟(十二)烷、1,1,2,2,3,3-六氟癸烷、 氟烷基苯磺酸鈉、氟烷基膦酸鈉、氟烷基羧酸鈉' 氟烷基 聚環氧乙烷醚、二丙三醇四(氟烷基聚環氧乙烷醚)、氟烷 基銨碘化物、氟烷基甜菜鹼、全氟烷基聚環氧乙烷乙醇、 全氟烷基烷氧基醇鹽、氟系烷基酯等。 又,此等之市售品有,例如 BM-1000、BM-1100(以 上’ BM化學公司製),美加華庫 F142D、同 F172、同 F173、同 F183、同 F178、同 F191、同 F471(以上,大曰 本油墨化學工業股份有限公司製),夫洛拉多FC170C、 FC-171、FC-430、FC-431(以上,住友3M股份有限公司 製),薩夫龍 S-112' 同 S-113、同 S-131、同 S-141、同 S-145、同 S-382、同 SC-101、同 SC-102 ' 同 SC-103、同 -24- (22) 1305867 SC-104、同SC-105、同SC-106(以上,旭硝子股份有限公 司製),耶夫多普EF301、同303、同352(以上’新秋田 化成股份有限公司製),夫達結恩多FT-100'同FT-110、 同 FT-140A、同 FT-150、同 FT-250、同 FT-251、同 FTX-251、同 FTX-218、同 FT-300、同 FT-310、同 FT-400S(以 上,內歐斯股份有限公司製)等。又’聚矽氧系界面活性 劑有,例如以多雷西利控 DC-3PA、同 DC-7PA、同 SH11PA、同 SH21PA、同 SH28PA、同 SH29PA、同 SH30PA ' 同 SH-190、同 SH-193、同 SZ-6032、同 SF-8428、同DC-57、同DC-190(以上,東麗西利控股份有限 公司製),TSF-4440 、 TSF-4300 、 TSF-4445 、 TSF-4446 、 TSF-4460、TSF-4452(以上,東芝西利控股份有限公司製) ,BYK-300、BYK-302、BYK-306 ' BYK-307、BYK-310、 BYK-315、BYK-320、BYK-322 ' BYK-323、BYK-325 ' BYK-330、BYK-331 > BYK-332、BYK-333、BYK-337、 BYK-344 ' BYK-370、B Y K - 3 7 5 (以上,比庫化學公司製) 等商品名市售者等。 其他尙有,聚環氧乙烷(十二)烷基醚、聚環氧乙烷( 十八)烷基醚、聚環氧乙烷油基醚等聚環氧乙烷烷基醚類 :聚環氧乙烷辛基苯基醚、聚環氧己烷壬基苯基醚等聚環 氧乙烷芳基醚類;聚環氧乙烷二(十二)酸酯、聚環氧乙烷 二(十八)酸酯等聚環氧乙烷二烷基酯類等非離子系界面活 性劑;有機矽氧烷聚合物K P - 3 4 1 (信越化學工業股份有限 公司製),(甲基)丙烯酸系共聚物波利夫洛N057、95(共榮 -25- (23) 1305867 社油脂化學工業股份有限公司製),BYK-352、 BYK-35 5 ' BYK-35 6、BYK-357、BYK-358、 BYK-361、BYK-390 ' BYK-392(以上,比庫也 等。此等界面活性劑,相對於含羧基感光性 質量份,使用5質量份以下,較佳爲2質量份 活性劑之量超過5質量份時,塗佈之際容易產 又,爲提高與基板之黏著性,可使用黏著 之黏著助劑,以使用官能性矽烷偶合劑爲佳, 基、甲基丙烯醯基 '異氰酸酯基、環氧基等反 之矽烷偶合劑等.。具體的有,三甲氧基甲矽烷 r -甲基丙烯氧基丙基三甲氧基矽烷、乙烯基 矽烷、乙烯基三甲氧基矽烷、r-異氰酸酯基 基矽烷、7環氧丙氧基丙基三甲氧基矽烷、/ 環己基)乙基三甲氧基矽烷等。如此之黏著助 該含羧基感光性樹脂(A)100質量份,使用20 ,較佳爲10質量份以下之量。黏著助劑之量® 份時,容易造成顯像殘留。 如此調製之感光性樹脂組成物溶液,採用 程度之米利波阿過濾器過濾後,可供應使用。 使用本發明之感光性樹脂組成物,形成圖 具體而言,係將本發明之感光性樹脂組成物塗 或事先在基板上形成之固體的著色感光性樹月丨 以下稱其爲基板等)之上,自經塗佈之感光性 層去除溶劑等揮發成份,透過光罩使去除揮發 BYK-354、 BYK-35 9、 1學公司製) 樹脂(A)100 以下。界面 生皺紋。 助劑。如此 例如具有羧 應性取代基 基苯甲酸、 三乙醯氧基 丙基三乙氧 3 -(3,4-環氧 劑,相對於 質量份以下 g過20質量 孔徑0.5 // m 型之方法, 料於,基板 I組成物層( 樹脂組成物 成份之層曝 -26- (24) 1305867 • 光後,進行顯像之方法。 基板有,例如玻璃基板、矽基板、聚碳酸酯基板、聚 . 酯基板 '芳香族聚醯胺基板、聚醯胺醯亞胺基板、聚醯亞 胺基板、鋁基板、GaAs基板等平面平坦的基板等。此等 基板,可施行使用矽烷偶合劑等藥品之藥品處理、電漿處 理、離子電鍍處理、濺鍍處理、氣相反應處理、真空蒸鍍 處理等前處理。使用矽基板等作爲基板時,可在該矽基板 φ 等表面形成電荷結合元件(CCD)、薄膜晶體(TFT)等。 將感光性樹脂組成物塗佈於該基板上時,例如以旋轉 塗佈法、.流延塗佈法、滾筒塗佈法、縫隙及旋轉塗佈法、 採用無旋轉塗膜機等省液塗佈機予以塗佈等眾所周知的塗 佈方法,塗佈於基板等之上’接著藉由加熱使溶劑等揮發 成份揮發爲佳。如此進行,在基板等之上形成由感光性樹 脂組成物的固形份所成之層。接著,使由感光性樹脂組成 物的固形份所成之層(以下稱爲感光性樹脂組成物層)曝光 # 。曝光時,以例如透過光罩選擇性照射活性能量線爲佳。 曝光光源,通常以低壓水銀燈、中壓水銀燈、高壓水銀燈 、超高壓水銀燈、氙氣燈 '金屬鹵化物燈等較適合。又, 可利用雷射光線等作爲曝光用活性能量線。其他,亦可使 用電子線、α線、/5線、r線、X射線、中性子線等。活 性能量線係透過光罩而照射;於此,光罩爲例如在玻璃板 之表面設置遮蔽活性能量線的遮光層者。玻璃板中未設置 遮光層之部份爲透過活性能量線的透光部,依此透光部之 圖型,在圖型之感光性樹脂組成物層被曝光,產生未照射 -27- 1305867 - (25) - 活性能量線之未照射區域 '與照射活性能量線之照射區域 。在照射區域之活性能量線的照射量,依黏結劑聚合物之 重量平均分子量' 單體比、含量、光聚合性化合物之種類 或含量、光聚合引發劑之種類或含量、光聚合引發助劑之 ' 種類或含量’適當選擇。 進行如上所述之曝光的基板,藉由稀鹼水溶液予以顯 像。顯像時,以例如使曝光後之感光性樹脂組成物層與稀 φ 鹼水溶液接觸爲佳。具體而言,以使在其表面上形成感光 性樹脂組成物層的狀態之基板,浸漬於稀鹼水溶液、或將 .稀鹼水溶液以噴淋狀噴淋爲佳。稀鹼水溶液有,例如碳酸 鈉、碳酸鉀、氫氧化鈉、氫氧化鉀、氫氧化四甲基銨、有 機胺等鹼性化合物之水溶液等。藉由顯像,去除感光性樹 脂組成物層中之未照射活性能量線的未照射區域。在其另 一方面,照射能量線之區域維持原狀而殘留,構成圖型。 進行如上所述之顯像的基板,通常藉由水洗、乾燥, 馨 可獲得目標之圖型。乾無後可進彳了加熱。藉由使圖型加熱 而硬化,可更提高其機械強度。加熱溫度通常爲18(TC以 上’較佳爲2 0 0 °C以上。通常爲2 5 0 °c以下。加熱溫度爲 180-250 °C時,可提高塗膜之機械強度’提升耐溶劑性、 耐液晶性,極爲適合。加熱時間通常爲5〜1 2 0分鐘,較佳 爲10~9〇分鐘,更佳爲I5〜6〇分鐘。加熱時間爲5420分 鐘時’能提高塗膜之機械強度,甚爲適合。如此進行,可 形成由感光性樹脂組成物所成之間隔件。 -28 - (27) 1305867 ,加入偶氮雙異丁腈4.1質量份、丙二醇單甲醚乙酸醋 125g,在水浴中加熱使內溫爲70。(:。於其中,以3小時 滴加甲基丙烯酸甲酯55質量份、苯乙烯20.8質量份 '甲 基丙烯酸環氧丙基酯42.7質量份之混合物,進行"聚合反 應。進而於7 01攪拌3小時,以G P C確認沒有未&應單 體存在。在此聚合物中,加入丙烯酸23.4質量份及Ξ苯 基膦0.8質量份,於80~90°C反應16小時。以1R光譜確 認環氧基消失後,加入四氫苯二甲酸酐45.7質量份’再 於80。(:反應8小時,即得不含一般式(1)所示之化合物的 含羧基感光性樹脂(R-1)清漆。還有,含羧基感光性樹脂 (R-1)之酸價爲90 mgKOH/g,以GPC測定之分子量(Mw) 爲15,000。此含羧基感光性樹脂(R-1)清漆的固形份濃度 爲6 0質量%。 實施例及比較例中使用之原料如表1所示。
-30 - (28) 1305867 [表1] 成份 化學名或商品名 含羧基感光性樹脂 合成例1所得之(A-ι)清漆 比較合成例1所得之(R-υ清漆 聚合性化合物 二季戊四醇六丙烯酸酯 光聚合引發劑 2-苄基-2-二甲基胺基-1-(4-嗎啉代苯基 )-丁院-1-酬 氧雜環丁烷 ①苯二甲基型二氧雜環丁烷η ②聯苯型二氧雜環丁烷2) ③苯酚酚醛型氧雜環丁烷(核體數=5 )3) 環氧樹脂 ①耶皮口多8284) ② ΕΡΡΝ-2015) 有機溶劑 丙二醇單甲醚乙酸酯 備註: 1) 東亞合成公司製之2官能氧雜環丁烷化合物 籲 (商品名:OXT-121) 2) 宇部興產公司製之2官能氧雜環丁烷化合物 (商品名:Eternaco II OXBP) 3) 東亞合成公司製之多官能氧雜環丁烷化合物 (商品名:PNOX-1009) 4) 日本環氧樹脂公司製之2官能環氧樹脂 5) 日本化藥公司製之多官能環氧樹脂 [實施例1~3 '及比較例1~4] -31 - (30) 1305867 - 12mW/cm2的累積光量l〇〇mJ/cm2之紫外線。此時之紫外 線照射係在氧氣體環境下(空氣中)進行,曝光間隙爲1〇〇 /zm。接者’使用氫氧化四甲基鞍〇.4質量%水溶液,進行 於25 °C 120秒鐘之顯像後,以純水進行3〇秒鐘之流水洗 淨。將上述所形成之間隔件圖型在烘箱中於23(rc加熱6〇 分鐘,使硬化。 在上述所述之間隔件圖型’圓點徑i 〇 V m之圖型可解 . 像時爲〇' 不能解像時爲X。結果如表3所示。 (2)耐NMP性之評估 在玻璃基板上’使用旋轉塗佈器以轉速U00 rpm 2〇 秒’使該感光性樹脂組成物溶液塗佈後,在加熱板上於9〇 °(:進行預熱3分鐘’形成乾燥塗膜。在上述所得塗膜之全 面上’照射在365nm之強度爲i2mW/cm2的累積光量1〇〇 mJ/cm2之紫外線。此時之紫外線照射係在氧氣體環境下(空 | 氣中)進行’曝光間隙爲10 0 # m。其後在烘箱中,於2 3 0 °c 加熱60分鐘,使硬化。 將上述硬化塗膜浸入N-甲基-2-吡咯烷酮中,觀測以碎 布擦式之表面狀態,完全無改變時爲〇、表面溶解或軟化 而帶有傷痕時爲X。 (3 )耐7 - 丁內酯性 將與上述(2)同樣製作之硬化塗膜,浸入丁內酯中, 觀測以碎布擦拭之表面狀態’完全無改變時爲〇' 表面溶 -33 - (31) 1305867 解或軟化而帶有傷痕時爲X。 (4)透明性之評估
以目視觀測與上述(2)同樣製作之硬化塗膜,進行透明 性之評估。完全透明時爲〇、塗膜稍有混濁之不透明時爲X 鲁 (5)壓縮強度 形成膜厚圓點徑30ym之圖型,使用微硬度計 ,進行於230°C加熱60分鐘硬化之間隔件圖型的評估。藉 由50#m之平面壓頭,測定施加50mN之荷重時的變形量。 此數値在0.6以下時爲〇、比〇.6多時爲x。 (6)儲存穩定性 將該感光性樹脂組成物儲存於4〇。(:之烘箱中14天, β 可觀測到膠化或顯著黏度上升時爲X、梢有黏度上升無膠化 者爲〇。 上述之試驗結果如表3所示。 -34- (32) 1305867 [表3] 實施例 比較例 1 2 3 1 2 3 4 (1)解像性 〇 〇 〇 〇 〇 〇 〇 (2)耐NMP性 〇 〇 〇 X 〇 〇 〇 (3)耐τ -丁內酯性 〇 〇 〇 X 〇 〇 〇 (4)透明性 〇 〇 〇 〇 〇 X 〇 (5)壓縮強度 〇 〇 〇 X 〇 〇 X (6)儲存穩定性 〇 〇 〇 〇 X X 〇
由表3所示之結果可知,本發明之感光性樹脂組成物 的實施例1 ~3,具有優越之儲存穩定性,同時其硬化物具 有優異之耐藥品性及壓縮強度,且具透明性。
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Claims (1)
- (1) 1305867 十、申請專利範圍 第95 1 01 068號專利申請案 中文申請專利範圍修正本 民國96年2月B曰修正 1 · 一種感光性樹脂組成物,其特徵爲含有: (A) l分子中兼具羧基與至少兩個乙烯性不飽和鍵之 含有羧基的感光性樹脂、 (B) l分子中具有一個以上乙烯性不飽和鍵之聚合性 化合物、 (C) 光聚合引發劑、及 (D) l分子中具有至少兩個氧雜環丁烷基之氧雜環丁烷 化合物, 該含有羧基之感光性樹脂(A)係,含有以具有下述一般 式(1)所示之不飽和雙鍵之化合物作爲共聚合成份之含羧基 感光性樹脂,該聚合性化合物(B)之配合量,相對於該感光性樹脂 (A)100質量份爲5〜100質量份, 該光聚合引發劑(C)之配合量,相對於該感光性樹脂 (A)100質量份爲〇.〇1〜30質量份, 該氧雜環丁烷化合物(D)之配合量,相對於該感光性 樹脂(A)l〇〇質量份爲5~100質量份, 【化1 «Κ (S ) <1) (2) 13.05867 式中,X爲0~2之整數;R1爲氫或甲基;R2爲碳數 10〜20之二環戊二烯衍生物、或碳數10〜20之三環癸烷衍生 物。 2 . —種硬化物,其特徵爲經由: 使如申請專利範圍第1項之感光性樹脂組成物塗佈· 乾燥之形成塗膜步驟, 在經該形成塗膜步驟而得之塗膜上,選擇性照射活性 φ能量線之光硬化處理步驟, 在光硬化處理步驟之後,使用鹼顯像液去除未照射部 份而得圖型之鹼顯像步驟、及 將該鹼顯像步驟所得圖型加熱•硬化之步驟,而得。 3.—種顯示面板用間隔件,其特徵爲使用如申請專利範 圍第1項之感光性樹脂組成物而得。-2-
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JP4994136B2 (ja) * | 2006-07-26 | 2012-08-08 | 富士フイルム株式会社 | 感光性組成物、感光性樹脂転写フイルム及びフォトスペーサーの製造方法並びに液晶表示装置用基板、及び液晶表示装置 |
JP4806611B2 (ja) * | 2006-09-22 | 2011-11-02 | 昭和電工株式会社 | 感光性樹脂組成物 |
JP5002479B2 (ja) * | 2007-02-16 | 2012-08-15 | 太陽ホールディングス株式会社 | 硬化皮膜パターン形成用組成物及びそれを用いた硬化皮膜パターン作製方法 |
EP2116902A4 (en) * | 2007-02-16 | 2011-02-02 | Taiyo Ink Mfg Co Ltd | COMPOSITION FOR MANUFACTURING HARDENED FILM PATTERN AND METHOD FOR MANUFACTURING HARDENED FILM PATTERN USING THE SAME |
JP5376793B2 (ja) * | 2007-11-07 | 2013-12-25 | 太陽ホールディングス株式会社 | 光硬化性樹脂組成物及びその硬化物パターン、並びに該硬化物パターンを具備するプリント配線板 |
CN101923282B (zh) | 2009-06-09 | 2012-01-25 | 清华大学 | 纳米压印抗蚀剂及采用该纳米压印抗蚀剂的纳米压印方法 |
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