TWI304257B - - Google Patents

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Publication number
TWI304257B
TWI304257B TW095118484A TW95118484A TWI304257B TW I304257 B TWI304257 B TW I304257B TW 095118484 A TW095118484 A TW 095118484A TW 95118484 A TW95118484 A TW 95118484A TW I304257 B TWI304257 B TW I304257B
Authority
TW
Taiwan
Prior art keywords
electrostatic chuck
dielectric substrate
electrode
plasma
dielectric
Prior art date
Application number
TW095118484A
Other languages
English (en)
Chinese (zh)
Other versions
TW200707695A (en
Inventor
Ikuo Itakura
Shoichiro Himuro
Original Assignee
Toto Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toto Ltd filed Critical Toto Ltd
Publication of TW200707695A publication Critical patent/TW200707695A/zh
Application granted granted Critical
Publication of TWI304257B publication Critical patent/TWI304257B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Jigs For Machine Tools (AREA)
TW095118484A 2005-05-24 2006-05-24 Electrostatic chuck TW200707695A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005151483A JP2006332204A (ja) 2005-05-24 2005-05-24 静電チャック

Publications (2)

Publication Number Publication Date
TW200707695A TW200707695A (en) 2007-02-16
TWI304257B true TWI304257B (ja) 2008-12-11

Family

ID=37451929

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095118484A TW200707695A (en) 2005-05-24 2006-05-24 Electrostatic chuck

Country Status (6)

Country Link
US (2) US7468880B2 (ja)
JP (1) JP2006332204A (ja)
KR (2) KR100978996B1 (ja)
CN (1) CN100562983C (ja)
TW (1) TW200707695A (ja)
WO (1) WO2006126503A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI458043B (zh) * 2012-01-31 2014-10-21 A stage for a plasma processing device

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070283891A1 (en) * 2006-03-29 2007-12-13 Nobuyuki Okayama Table for supporting substrate, and vacuum-processing equipment
US7672111B2 (en) * 2006-09-22 2010-03-02 Toto Ltd. Electrostatic chuck and method for manufacturing same
JP2008205415A (ja) * 2007-02-16 2008-09-04 Creative Technology:Kk 静電チャック
JP5018244B2 (ja) * 2007-05-30 2012-09-05 住友大阪セメント株式会社 静電チャック
WO2009078923A2 (en) 2007-12-19 2009-06-25 Lam Research Corporation Film adhesive for semiconductor vacuum processing apparatus
CN102132395B (zh) * 2008-08-27 2013-08-07 爱发科股份有限公司 静电卡盘及真空处理装置
JP2010199475A (ja) * 2009-02-27 2010-09-09 Tokyo Electron Ltd プラズマ処理装置のクリーニング方法及び記憶媒体
JP2012204644A (ja) * 2011-03-25 2012-10-22 Tokyo Electron Ltd プラズマ処理装置及びプラズマ処理方法
JP5348439B2 (ja) * 2011-09-30 2013-11-20 Ｔｏｔｏ株式会社 静電チャック
CN103327720B (zh) * 2012-03-21 2016-01-20 长毅技研股份有限公司 可透视静电吸板
US9281226B2 (en) 2012-04-26 2016-03-08 Applied Materials, Inc. Electrostatic chuck having reduced power loss
JP5441019B1 (ja) * 2012-08-29 2014-03-12 Ｔｏｔｏ株式会社 静電チャック
JP5441021B1 (ja) * 2012-09-12 2014-03-12 Ｔｏｔｏ株式会社 静電チャック
KR102098981B1 (ko) 2012-11-27 2020-04-08 가부시키가이샤 크리에이티브 테크놀러지 정전 척, 유리 기판 처리 방법 및 그 유리 기판
JP6071514B2 (ja) * 2012-12-12 2017-02-01 東京エレクトロン株式会社 静電チャックの改質方法及びプラズマ処理装置
JP6132957B2 (ja) * 2015-10-13 2017-05-24 ヤス カンパニー リミテッド 帯電処理による基板チャッキング方法及びシステム
KR20190104040A (ko) * 2017-01-27 2019-09-05 울트라테크 인크. 기판-바이어스된 원자층 증착을 위한 향상된 전기적 절연을 가진 척 시스템 및 방법
US11911863B2 (en) 2019-09-11 2024-02-27 Creative Technology Corporation Attachment and detachment device

Family Cites Families (29)

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JPS55132048A (en) * 1979-04-03 1980-10-14 Toshiba Corp Semiconductor device
JPS6096832A (ja) 1983-11-01 1985-05-30 Fukuo Iwabori ガスライタの発火装置を製造する方法
JPH0697677B2 (ja) 1987-04-21 1994-11-30 東陶機器株式会社 静電チャック基盤の製造方法
JP2521471B2 (ja) 1987-05-14 1996-08-07 富士通株式会社 静電吸着装置
JPH01240243A (ja) * 1988-03-18 1989-09-25 Tokuda Seisakusho Ltd 電極およびその製造方法
JPH04133443A (ja) 1990-09-26 1992-05-07 Fujitsu Ltd 半導体装置の製造方法
JP2552420Y2 (ja) * 1991-05-30 1997-10-29 京セラ株式会社 セラミック製静電チャック
JP2971369B2 (ja) * 1995-08-31 1999-11-02 トーカロ株式会社 静電チャック部材およびその製造方法
JP3457477B2 (ja) 1995-09-06 2003-10-20 日本碍子株式会社 静電チャック
JP3225850B2 (ja) 1995-09-20 2001-11-05 株式会社日立製作所 静電吸着電極およびその製作方法
JPH10154745A (ja) 1996-11-26 1998-06-09 Hitachi Ltd 静電吸着装置
JP3527823B2 (ja) 1997-01-31 2004-05-17 京セラ株式会社 静電チャック
JPH10261697A (ja) 1997-03-19 1998-09-29 Kobe Steel Ltd 静電チャック
JP4156699B2 (ja) 1998-02-16 2008-09-24 株式会社巴川製紙所 静電チャック装置用シートおよび静電チャック装置
JP3888766B2 (ja) * 1998-03-16 2007-03-07 太平洋セメント株式会社 静電チャック及びその製造方法
JP2001060619A (ja) 1999-06-16 2001-03-06 Toto Ltd 静電チャック及びその製造方法
JP2001284328A (ja) 2000-03-31 2001-10-12 Taiheiyo Cement Corp セラミック部品
JP2001313331A (ja) 2000-04-28 2001-11-09 Sumitomo Osaka Cement Co Ltd 静電吸着装置
JP2001338970A (ja) 2000-05-26 2001-12-07 Sumitomo Osaka Cement Co Ltd 静電吸着装置
JP2002093896A (ja) 2000-09-12 2002-03-29 Nippon Steel Corp 静電チャック及びその製造方法
JP4917715B2 (ja) 2001-07-24 2012-04-18 太平洋セメント株式会社 静電チャック
JP4008230B2 (ja) * 2001-11-14 2007-11-14 住友大阪セメント株式会社 静電チャックの製造方法
JP2003168725A (ja) 2001-11-30 2003-06-13 Kyocera Corp ウエハ支持部材及びその製造方法
JP2002324834A (ja) 2002-04-03 2002-11-08 Tomoegawa Paper Co Ltd 静電チャック装置、静電チャック用積層シート、および静電チャック用接着剤
JP2004168609A (ja) 2002-11-21 2004-06-17 Taiheiyo Cement Corp 窒化アルミニウム焼結体およびそれを用いた静電チャック
JP2004200462A (ja) 2002-12-19 2004-07-15 Nhk Spring Co Ltd 静電チャックおよびその製造方法
JP2004235563A (ja) 2003-01-31 2004-08-19 Tomoegawa Paper Co Ltd 静電チャック装置用電極シート及びこれを用いた静電チャック装置
JP4064835B2 (ja) 2003-02-07 2008-03-19 太平洋セメント株式会社 静電チャック及びその製造方法
JP4369765B2 (ja) * 2003-07-24 2009-11-25 京セラ株式会社 静電チャック

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI458043B (zh) * 2012-01-31 2014-10-21 A stage for a plasma processing device

Also Published As

Publication number Publication date
US20080273284A1 (en) 2008-11-06
US20060268491A1 (en) 2006-11-30
US7468880B2 (en) 2008-12-23
CN100562983C (zh) 2009-11-25
KR100968019B1 (ko) 2010-07-07
TW200707695A (en) 2007-02-16
US7760484B2 (en) 2010-07-20
JP2006332204A (ja) 2006-12-07
KR100978996B1 (ko) 2010-08-30
KR20090007476A (ko) 2009-01-16
WO2006126503A1 (ja) 2006-11-30
CN101180721A (zh) 2008-05-14
KR20070106782A (ko) 2007-11-05

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