TWD175119S - 反應管 - Google Patents
反應管Info
- Publication number
- TWD175119S TWD175119S TW104304617F TW104304617F TWD175119S TW D175119 S TWD175119 S TW D175119S TW 104304617 F TW104304617 F TW 104304617F TW 104304617 F TW104304617 F TW 104304617F TW D175119 S TWD175119 S TW D175119S
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- supplied
- main body
- body wall
- slits
- Prior art date
Links
- 239000000758 substrate Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
Abstract
【物品用途】;本物品是在將複數片基板以複數片排列成多層來進行處理的基板處理裝置中所使用的反應管。;【設計說明】;在以圓筒狀為基礎的主體的外周面,在圖式中正面側與背面側分別相對的位置形成有將氣體進行供/排氣的突出部。在該突出部的內側區劃有複數的空間,在與該區劃空間相對的主體壁面形成有供/排氣用的狹縫,當從背面側的突出部供給氣體時,則從主體壁面的狹縫將氣體供給到主體內部,從相反側的主體壁面的狹縫將氣體朝正面側的突出部排出。;圖式中各立體圖中所表示的細線,用來表示立體表面的特定形狀。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPD2015-3957F JP1535455S (zh) | 2015-02-25 | 2015-02-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD175119S true TWD175119S (zh) | 2016-04-21 |
Family
ID=54293783
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104304617F TWD175119S (zh) | 2015-02-25 | 2015-08-24 | 反應管 |
Country Status (3)
Country | Link |
---|---|
US (1) | USD772824S1 (zh) |
JP (1) | JP1535455S (zh) |
TW (1) | TWD175119S (zh) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP1548462S (zh) * | 2015-09-04 | 2016-04-25 | ||
JP1546512S (zh) * | 2015-09-04 | 2016-03-22 | ||
WO2017138087A1 (ja) * | 2016-02-09 | 2017-08-17 | 株式会社日立国際電気 | 基板処理装置および半導体装置の製造方法 |
JP1605460S (zh) * | 2017-08-09 | 2021-05-31 | ||
JP1605461S (zh) * | 2017-08-10 | 2021-05-31 | ||
JP1605462S (zh) * | 2017-08-10 | 2021-05-31 | ||
JP1605982S (zh) * | 2017-12-27 | 2021-05-31 | ||
JP1644260S (zh) * | 2019-03-20 | 2019-10-28 | ||
USD931823S1 (en) * | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube |
JP1678273S (ja) * | 2020-03-10 | 2021-02-01 | 反応管 | |
JP1713188S (zh) * | 2021-09-15 | 2022-04-21 | ||
JP1731789S (zh) * | 2022-03-01 | 2022-12-09 | ||
JP1731877S (zh) * | 2022-03-01 | 2022-12-09 | ||
JP1731878S (zh) * | 2022-03-01 | 2022-12-09 | ||
JP1731673S (zh) * | 2022-05-30 | 2022-12-08 | ||
JP1731675S (zh) * | 2022-05-30 | 2022-12-08 | ||
JP1731674S (zh) * | 2022-05-30 | 2022-12-08 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD405429S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
USD417438S (en) * | 1997-01-31 | 1999-12-07 | Tokyo Electron Limited | Quartz outer tube |
USD406113S (en) * | 1997-01-31 | 1999-02-23 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
USD423463S (en) * | 1997-01-31 | 2000-04-25 | Tokyo Electron Limited | Quartz process tube |
USD405062S (en) * | 1997-08-20 | 1999-02-02 | Tokyo Electron Ltd. | Processing tube for use in a semiconductor wafer heat processing apparatus |
USD405431S (en) * | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus |
US5948300A (en) * | 1997-09-12 | 1999-09-07 | Kokusai Bti Corporation | Process tube with in-situ gas preheating |
JP3985899B2 (ja) * | 2002-03-28 | 2007-10-03 | 株式会社日立国際電気 | 基板処理装置 |
USD521464S1 (en) * | 2003-11-04 | 2006-05-23 | Tokyo Electron Limited | Process tube for semiconductor device manufacturing apparatus |
JP5157100B2 (ja) * | 2006-08-04 | 2013-03-06 | 東京エレクトロン株式会社 | 成膜装置及び成膜方法 |
USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
USD586768S1 (en) * | 2006-10-12 | 2009-02-17 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
JP5096182B2 (ja) * | 2008-01-31 | 2012-12-12 | 東京エレクトロン株式会社 | 熱処理炉 |
USD611013S1 (en) * | 2008-03-28 | 2010-03-02 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
JP4930438B2 (ja) * | 2008-04-03 | 2012-05-16 | 東京エレクトロン株式会社 | 反応管及び熱処理装置 |
USD618638S1 (en) * | 2008-05-09 | 2010-06-29 | Hitachi Kokusai Electric, Inc. | Reaction tube |
USD610559S1 (en) * | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube |
TWD167987S (zh) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | 反應管之部分 |
USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
TWD168774S (zh) * | 2013-06-28 | 2015-07-01 | 日立國際電氣股份有限公司 | 反應管之部分 |
TWD167986S (zh) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | 反應管之部分 |
TWD167985S (zh) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | 反應管之部分 |
-
2015
- 2015-02-25 JP JPD2015-3957F patent/JP1535455S/ja active Active
- 2015-08-19 US US29/536,784 patent/USD772824S1/en active Active
- 2015-08-24 TW TW104304617F patent/TWD175119S/zh unknown
Also Published As
Publication number | Publication date |
---|---|
USD772824S1 (en) | 2016-11-29 |
JP1535455S (zh) | 2015-10-19 |
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