TWD200073S - 反應管 - Google Patents

反應管

Info

Publication number
TWD200073S
TWD200073S TW106307404D01F TW106307404D01F TWD200073S TW D200073 S TWD200073 S TW D200073S TW 106307404D01 F TW106307404D01 F TW 106307404D01F TW 106307404D01 F TW106307404D01 F TW 106307404D01F TW D200073 S TWD200073 S TW D200073S
Authority
TW
Taiwan
Prior art keywords
design
gas
substrate
article
supplied
Prior art date
Application number
TW106307404D01F
Other languages
English (en)
Inventor
Toru Kagaya
Shinya Ebata
Yusaku Okajima
Hiroaki Hiramatsu
Original Assignee
日商國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司
Publication of TWD200073S publication Critical patent/TWD200073S/zh

Links

Abstract

【物品用途】;本物品係在將複數個基板縱向排列來進行處理之基板處理裝置中所使用的反應管。;【設計說明】;本物品係在本體內側的內筒管內的左右設有縱向排列的多數橫長縫隙以及與其並排之略相同長度的縱長開口，從這裡朝向基板供應氣體，並且使氣體從設置在對面的縱長開口排出。;本物品的整體是利用透明體所形成。;本衍生設計與原設計之外觀差異在於：如立體圖及前視圖與俯視圖所示，本案的縱長開口及半圓形凹槽設計與其略有所不同，故與原設計案之差異些微，不影響原設計與衍生設計之近似。
TW106307404D01F 2017-12-27 2018-04-26 反應管 TWD200073S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2017-29309F JP1605982S (zh) 2017-12-27 2017-12-27

Publications (1)

Publication Number Publication Date
TWD200073S true TWD200073S (zh) 2019-10-01

Family

ID=62239112

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106307404D01F TWD200073S (zh) 2017-12-27 2018-04-26 反應管

Country Status (3)

Country Link
US (1) USD853979S1 (zh)
JP (1) JP1605982S (zh)
TW (1) TWD200073S (zh)

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JP1611626S (zh) * 2017-01-20 2018-08-20
JP1640260S (zh) * 2018-11-19 2019-09-02
JP1644260S (zh) * 2019-03-20 2019-10-28
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
JP1678273S (ja) * 2020-03-10 2021-02-01 反応管
JP1731671S (ja) * 2022-03-15 2025-12-15 基板処理装置用炉
JP1731672S (ja) * 2022-03-15 2025-12-15 基板処理装置用炉
JP1731673S (ja) * 2022-05-30 2025-12-15 半導体製造装置用反応管のインナー管
JP1731675S (ja) * 2022-05-30 2025-12-15 半導体製造装置用反応管のインナー管
JP1731674S (ja) * 2022-05-30 2025-12-15 半導体製造装置用反応管のインナー管

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Also Published As

Publication number Publication date
USD853979S1 (en) 2019-07-16
JP1605982S (zh) 2021-05-31

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