TW565921B - Semiconductor device with co-packaged die - Google Patents

Semiconductor device with co-packaged die Download PDF

Info

Publication number
TW565921B
TW565921B TW091124046A TW91124046A TW565921B TW 565921 B TW565921 B TW 565921B TW 091124046 A TW091124046 A TW 091124046A TW 91124046 A TW91124046 A TW 91124046A TW 565921 B TW565921 B TW 565921B
Authority
TW
Taiwan
Prior art keywords
semiconductor
item
patent application
clip
scope
Prior art date
Application number
TW091124046A
Other languages
English (en)
Inventor
Martin Standing
Original Assignee
Int Rectifier Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Int Rectifier Corp filed Critical Int Rectifier Corp
Application granted granted Critical
Publication of TW565921B publication Critical patent/TW565921B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/492Bases or plates or solder therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • H01L23/04Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
    • H01L23/043Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having a conductive base as a mounting as well as a lead for the semiconductor body
    • H01L23/047Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having a conductive base as a mounting as well as a lead for the semiconductor body the other leads being parallel to the base
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49575Assemblies of semiconductor devices on lead frames
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/34Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
    • H01L24/36Structure, shape, material or disposition of the strap connectors prior to the connecting process
    • H01L24/37Structure, shape, material or disposition of the strap connectors prior to the connecting process of an individual strap connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/34Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
    • H01L24/39Structure, shape, material or disposition of the strap connectors after the connecting process
    • H01L24/40Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/84Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a strap connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/07Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
    • H01L25/072Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00 the devices being arranged next to each other
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/16Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/18Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • H01L2224/0601Structure
    • H01L2224/0603Bonding areas having different sizes, e.g. different heights or widths
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • H01L2224/061Disposition
    • H01L2224/0618Disposition being disposed on at least two different sides of the body, e.g. dual array
    • H01L2224/06181On opposite sides of the body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/34Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
    • H01L2224/36Structure, shape, material or disposition of the strap connectors prior to the connecting process
    • H01L2224/37Structure, shape, material or disposition of the strap connectors prior to the connecting process of an individual strap connector
    • H01L2224/37001Core members of the connector
    • H01L2224/37099Material
    • H01L2224/371Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/37138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/37147Copper [Cu] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/34Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
    • H01L2224/39Structure, shape, material or disposition of the strap connectors after the connecting process
    • H01L2224/40Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
    • H01L2224/401Disposition
    • H01L2224/40151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/40221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/40225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/731Location prior to the connecting process
    • H01L2224/73151Location prior to the connecting process on different surfaces
    • H01L2224/73153Bump and layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/83801Soldering or alloying
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/8385Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01004Beryllium [Be]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01006Carbon [C]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01029Copper [Cu]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01047Silver [Ag]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01058Cerium [Ce]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/013Alloys
    • H01L2924/014Solder alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06Polymers
    • H01L2924/078Adhesive characteristics other than chemical
    • H01L2924/07802Adhesive characteristics other than chemical not being an ohmic electrical conductor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1203Rectifying Diode
    • H01L2924/12032Schottky diode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • H01L2924/13055Insulated gate bipolar transistor [IGBT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13091Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16152Cap comprising a cavity for hosting the device, e.g. U-shaped cap
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49169Assembling electrical component directly to terminal or elongated conductor
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49169Assembling electrical component directly to terminal or elongated conductor
    • Y10T29/49171Assembling electrical component directly to terminal or elongated conductor with encapsulating
    • Y10T29/49172Assembling electrical component directly to terminal or elongated conductor with encapsulating by molding of insulating material

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Lead Frames For Integrated Circuits (AREA)
  • Electrodes Of Semiconductors (AREA)

Description

565921 五、發明說明(1) I技術領域】 置,關於半導體裝置,特別是關於一種半導體裝 /、 括至少兩個共同封裝裸晶的半導體。 【先如技術】 ,、同封裝的裝置,通常說成copaks,係眾所皆去 置包括兩個或更多相同或不同的半導 插垃老 裳在一個共同的外殼(housing)中。逵釗、士 種好處,伤益; 〜, 逐到14
姑、田B 精由一種排列,該排列於電路板上,鱼彻w B 裝稞晶的丰瀑辦# π 低丄興個別封 Λ Μ 導體就同一電路相同功能而言,相較 占據較少空間。銥少π + …奴之下, 的裳置且/y Λ 然允許建構更多緊密 多電子元件複雜的裝置’該裝置係於相同空間有更 許多共同封裝的裝置包括一個鑄 以鉛為材料的冰k从士 口待棋成^的外殼與一個 抗環Hi : I、?卜殼提供保護予半 其用以、查妓坐列濕瑕,而鉛為材料的外框, : 連接半導體裸晶到外部元件, ;。因此,習知的排列要求許多零件該= 電路 多裳其製程更加複雜。•言之,可要Λ ▼牛於八同封裝裝置内,而減少所需的零件數。4 【發明内容】 根據本發明的半導體裝置,其、 目似的半導體裸晶。兩個半導 ^ 、目同或不 子肢稞日日係共同封裝於一個共 第5頁 565921 五、發明說明(2) 同的外部金屬夾(common outer metal clip),其當作至 少一個半導體裸晶的外部連接器。 根據本發明的第一層面,兩個相同或不相似的半導體 裸晶’係共同封裝於一個共同的外部金屬夾(c〇mm〇r] outer metal c 1 ip),其當作裸晶的外殼,且當作電氣連 接為,以連接其中一個裸晶,到電子電路的外部元件。 特別地,根據本發明的共同封裝半導體裝置,包括一 個金屬容器’金屬容器具有一個平坦的金屬薄片部(web portion),與複數個外牆(waiis),以定義一個空間。一 個第一半導體裸晶,其可為一個金氧半場效電晶體 (M0SFET) ’係藉由一個傳導層或導電性的環氧樹脂層於其 汲極電極(drain electrode)電氣連接於薄片部(web portion)。此二昇起的部份,自外部金屬夾(c〇mm〇n outer metal cl ip)兩相對面向外牆(wal ls)的邊緣,延伸 到位於一個基板上的電極,該基板可為一塊電路板,因而 連接金氧半場效電晶體^“肫以的汲極電極(drain electrode)到位於一個電子電路的適當位置。 一個第二半導體裸晶係位於一個内部夾具(inner clip)中,該夾具係藉由一個絕緣層,而連接至與外部夾 二(〇 u t e r c 1 i p )絕緣的薄片部(w e七ρ 〇 Γ 士 i 〇 n)。一個第二 ,導體裸晶可為一個金氧半場效電晶體(M〇SFET),其係與 第一半導體裸晶相同,或可為一個於半導體晶片上的. 電路’積體電路係控制第一半導體裸晶的運作。 根據本發明的第一層面,第一半導體裸晶的厚度,内 565921 五、發明說明(3) ----- 部晶片與第一半導體裸晶的總高度,皆 個別的頂端表面,係彼此共平面,且最好使侍他們 _本上土 i I好成與上昇部的接 觸表面共平面。為達成此一效果,第二 於基底而降低整體厚度。 牛導體裸晶可接觸 根據本發明的内部夾具(inner clip),其勺 ί f°ireirt nS) t 只貝上延伸自底板(bottom plate)的邊餘 +曰,. 、 緣。至少一個内部 夾具(inner clip)的外牆(waiis)包括延伸部 portion),延伸部係彎曲,以定義一個接^ ^Xtende(1 (co^act surface),該接觸表面係最好能夠鱼面 的幵起部共平面。内部夾具(inner cHp)的接觸表。 一個基板的適當墊片(pad)相接觸,以便連接 道触、 裸晶至其位於一個電子電路的位置。最好的 一,β处ί 2:夹具d — Hp)的外部表面經化學處理,以 ,表面’或是由電絕緣高分子層絕緣,例如聚亞 、巴 (polywide)。内部夾具(inner cHp)的内 佈高導電性的金屬材料,例如銀。内部夾具面最好塗 的形成,可藉由銅f0(copper f〇il)邊緣 二1* 2 =) 根據本發明第二實施例,一個共同封裝的半導體 匕括一個外部夾具(outer clip),外部夾具可為一 ^ ,該金屬係實質上類似於第一實施例所使 金A _ 本發明第二實施例,半導體裝置包括至少兩=或^
565921 五、發明說明(4) "" ' -- 似的半導體雜Θ 斗| ^ Βθ,該半導體裸晶每個具有至少一個主要電 ° /、糸藉由一層焊錫層(s〇Her J )或導電性環氧 脂(EPOXY)電性造垃$ 連接至外部夾具(outerclip)的薄片部 ion) 於本發明實施例,外部夾具(〇 u t e r
Cw/P '作一個半導體裸晶的外殼(housing),與一個連接 ""八提供連接該裝置到位於同一電子電路的外部元件。 本發明的其它特點與優點,將於本發明的下列說明 隨圖式而揭露出來。 【實施方式】 圖1係根據本發明第一實施例的半導體裝置1 〇。半導 體裝置10包括一個外部導電性夾具(〇uter c〇nductive clip)12。外部導電性夾具(〇uter c〇nductive ^^)12係 二塊金屬容器,金屬容器包括薄片部(web p〇rti〇n)14& 複數個外牆(walls)16,外牆可從薄片部(web p〇rti〇n)i4 的邊緣延伸,以定義一個空間。外部導電性夾具(οΜπ conduct i ve c 1 i p) 1 2可從銅或更優良地,以銀為材料鍍膜 而製彳于。第一半導體裸晶18係置於外部導電性夾具(〇uter conductive clip)12的外牆(waHs)i6空間内。第一半導 體裸晶1 8可為一個垂直導電的金氧半場效電晶體 (M0SFET)、功率一極體(p0wer di〇de)、絕緣柵雙極晶體 管(IGBT)或其它類似元件。 於本發明第一實施例,第一半導體裝置丨8係一個垂直 導電的金氧半場效電晶體(M0SFET),其具有源極電極
565921
五、發明說明(5) (source electrode)20、閘極電極(gate 61“1^〇(16)22與 汲極電極(gate electrode)24 (如圖2所示)。 請參考圖2 ’第一半導體裝置18的沒極電極(gate elect rode) 24,其藉由一層導電性材料26,該導電性材料 26可為焊錫(s〇lder)或導電性導電性環氧樹脂(ep〇xy), 電性連接於外部導電性夾具(outer conductive clip)l2 的薄片部(web portioif)14。根據本發明第一實施例,半 導體裝置10同時包括一個内部夾具(inner clip)28,該内 部夾具(inner cl ip)28係置於外部導電性夾具(〇uter conductive Clip)l2 的外牆(walls)16 空間内。 參考圖3與圖4,内部夾具(inner clip)28最好能從_ 個例如一銅片之薄金屬導電板製得,且最好包括垂直延伸 的外騰3 0 ’外牆3 〇即為一個位於底板部位3 2的空間。内部 夾具(inner clip)28同時包括一個延伸部34,延伸部34延 伸自位於夾具(inner clip)28的外牆3〇其中一個邊緣,且 係彎^以提供一個接觸表面33。内部夾具(inner clip)28 的内部表面(interior surface)可鍍以高度導電性材料, 例如銀,於其外部表面,可經化學處理後,以製造阻隔材 料(11^1:1&1:^6)或塗佈絕緣性的膠合劑(^}1^1” fllm) 例如聚亞醯胺(polyimide)。内部夾具(inner ip)28最好月匕藉由提咼薄銅箔c〇pper foil)的外 部邊緣’而形成外牆(wa丨丨s ) 3 〇。 外私(wa 1 1 s )的其中一個係如此形成,應有延伸部 3 4,其係往外彎曲以曝露延伸部3 4的内部表面為接觸表面
第9頁 565921 五、發明說明(6) '—^ (contact surface ) 33。用來形成内部夾具(inner clip)28的銅箔,應比外部夾具(〇uter。丨4)12的深度來 得薄。於較佳實施例,比方說,約〇1〇〇釐米(mm)厚的 銅箔,係使用於深度約〇 · 3 9 6釐米(mm )的外部夾具 (outer c1 ip) 12 〇 現在請參考圖1與圖2,第二半導體裸晶36位於—内部 夾具(inner clip)28的外牆(wans)3〇空間内。於第_實 施例,第二半導體裸晶可以為一個金氧半場效電晶體、 (M0SFET),金氧半場效電晶體(M〇SFET)具有一個汲極電極 (drain electrode)(未表示於圖),係藉由一個傳導層 (conductive layer ) 38而電性連接於内部夾具(innerB clip)28,傳導層(conductive layer)38可為焊錫或傳導 性的導電性環氧樹脂(epoxy),例如一種載入銀的環氧樹 脂(epoxy)。内部夾具(inner cHp)28 的外牆(wans)3〇 當作阻隔體(dam),以避免焊錫或導電性環氧 溢出或接觸外部夾具(outer clip)12的薄片部(web P〇rtl〇n)14,第二半導體裸晶36係藉由一個絕緣層4〇隔離 於外部夾具(outer clip)12,而絕緣層4〇係位於内部夹且 (inner clip)28的底部與外部夾具(〇uter以1?)12的薄片、 部(web p〇rti〇n)14。於較佳實施例,第一半 ' 的厚度約0.350,係藉由導電性材料26昇高到外部 (outer C11P)12深度的頂端。第二半導體裸晶36也將内 夹具(inner clip)28昇高,以便頂端的表面與一 導體裸晶18頂端的表面共平面。為得到這個結果,必須使
565921 五、發明說明(7) 用一個裸晶,該裸晶係較第一半導體裸晶丨8為薄。於較佳 貫施例’第一半導體裸晶36係0.200董米(mm)厚為達此 厚度’裸晶的背部可置於底部,使得其於放置於内部夾具 (inner clip)28前,能容納所要的厚度。
現在請參考圖7,根據本發明的一個層面,外部夾具 (outer clip)12包括至少兩個昇高部(raised portions)42 ’ 昇高部(raised portions)42 係昇起自外部 夾具(outer clip)12兩相對面向外牆(waiis)的邊緣。每 一個昇高部(raised p〇rti〇ns)42都有一個平坦接觸表 面,以供與位於基板45對應電性的墊片(pads)43為電性接 觸,該基板可為一塊電路板或一個絕緣金屬基板 (Insulated Metal Substrate)。透過昇高部(raised p〇rti〇ns)42,第一半導體裸晶18的汲極電極(drain electrode)24係電性連接於其位於同一電子電路的適當位 置。因此,外部夾具(outer ciip) 12當作第一半導體裸晶 1 8的外殼與電性連接器。
根據本發明第一實施例於半導體裝置丨〇,延伸部34的 接觸表面33,第一半導體裸晶is的源極電極(s〇urce electrode)20與第二半導體裸晶36的源極電極(s〇urce electrode)35係與外部夾具(outer clip)12昇高部 (raised portions)42的接觸表面33共平面。接觸表面連 接第二半導體裸晶36的汲極電極於一個適當的傳導塾 (conductive pad)47,傳導墊(conductive pad)47 係位於 一個基板45上,以便連接第二半導體裸晶36的汲極電極到
565921 五、發明說明(8) 其位於同一電子電路的適當位置。 圖5與圖6 ’其中相近似的數字編號表示相近似的特 徵,顯示根據本發明第二實施例半導體裝置44。根據本發 明第二實施例,半導體裝置44包括第一與第二半導體裝置 18、18’,該裝置可為金氧半場效電晶體(M〇SFETs)。然
而,功率二極體(power di〇des)、絕緣柵雙極晶體管 (I GBT)及其它類似元件’可被用於替代金氧半場效電晶體 (MOSFETs)。第一與第二半導體裝置18、18’的汲極電極 24、24’ ,係藉由導電層27、27,電性連接外部夾具(outer clip)12的薄片部(web p〇rtion)14。一個共同導電層可被 用以取代獨立的導電層27、27,,而導電層27、27,可為焊 錫層(solder layer)或導電性環氧樹脂(Ερ〇χγ),例如一 種載入銀的J辰氧樹脂(epQXy)。第一與第二半導體穿置 18、18’的源極電極20、20’係彼此共平面,且最好能與外 部夾具(outer clip)12的昇高部(raised 平面。 於第二實施例’外部夾具(outer cl ip)l2當作一個外 设’也當作一個半導體裸晶汲極電極24、24,的共同連接 器(common connector)。如圖 8 所示,昇高部(raised P〇rt10ns)42係電性連接基板45上的墊片(pads)43,以便 連接至裸晶沒極電極24、24於其位於同一電子電路的適 當位置。裸晶源極電極20、20,同時也電性連接於基板^ 上的墊片(pads)49,而因此連接源極電極2〇、2〇,到其位 於如圖8所示電子電路的適當位置。
565921 五、發明說明(9) 熟習本技藝的人士將明白本發明,可實行於多種半導 體裸晶的組合,其使用於此揭露的發明概念,且由範例並 參照貫施例而為可實行。例如,於第一實施例,第二半導 體裸晶36可被簫特基二極體(sch〇ttky di〇de),或一個控 制積=T St 2所取代,其用於控制第一半導體裸晶18。 而已,非為用=二ΐ式^及說明,僅為本發明之較佳實ί例 人士 1所依本挤日^疋本^發明之實施,大凡熟悉該項技蟄之 在以下太π Η發之精神,所作之變化或修飾,皆應涵蓋 在乂下本發明之中請專_胃1
565921 圖式簡單說明 【圖式簡單說明】 圖1係根據本發明第一實施例,一種半導體裝置的上方平 面圖。 圖2顯示本發明第一實施例,以圖1線卜1的方向觀察的剖 面圖。 圖3係根據本發明的一個層面,内部夾具(inner Clip)的 側面圖。 - 圖4係根據本發明的一個層面,圖3所示,内部夾具(inner clip)的上方平面圖。 圖5係根據本發明的第二實施例,一個層面,圖3所示,内 部夾具(inner clip)的上方平面圖。 圖6係根據本發明的第二實施例,於圖5線2 - 2的方向觀察 的剖面圖。 圖7係根據本發明的第一實施例,連接到一個基板的半導 體裝置。 圖8係根據本發明的第二實施例,連接到一個基板的半導 體裝置。 圖式編號說明】 1012141618 半導體裝置外部導電性夾具(outer conductive clip) 薄片部(web portion)外牆(w a 1 1 s) 第一半導體裝置(裸晶) 參
第14頁 565921 圖式簡單說明 18’ 20 2(T 22 24 24’ 26 27 27’ 28 30 32 33 34 35 36 38 40 42 43 44 45 47 49 半導體裝置(裸晶) 源極電極 源極電極 閘極電極(gate electrode) >及極電極 沒極電極 導電性材料 < 導電層 導電層 内部夾具(inner clip) 外牆 底板部位 接觸表面 延伸部 源極電極(source electrode) 第二半導體裸晶 傳導層(conduct i ve layer) 絕緣層 昇高部(raised portions) 墊片(pads) 半導體裝置 基板 傳導墊(conductive pad) 墊片(pads)
第15頁

Claims (1)

  1. 565921 六、申請專利範圍 1· 一種含共同封裝晶片的半導體裝置,包括: 、 外部導電性夾具,其具有一薄片部(web p〇rt i 〇n) 與複數個外牆(wal Is),該外牆係延伸自薄片部(web portion)的邊緣以定義一空間; 第 半導體裸晶’其具有至少兩個主要電極,每一 電極位於該第一半導體裸晶的個別主要表面; 一導電層(conductive layer),係電性連接該主要電 極的其中之一於該薄片部(web portion);
    一内部夾具(inner clip),其具有複數個外牆 (walls) ’且放在該空間且於該薄片部(web ρ〇ΓΗ〇η)上; 一第二半導體裸晶,其至少部份是位於在該空間且内 4 導電性夾具(inner conductive clip)。 2·如申請專利範圍第1項所述之含共同封裝晶片的半導體 裝置其中該外部導電性夾具(outer conductive cl ip),包括兩個昇起部(raised p〇rti〇ns),其係延伸自 該幵起部本身兩個相對面向外牆(w a 1 1 s)的邊緣,每一昇 起部包括一接觸表面,該接觸表面用以提供電性接觸於位 在一基板上的一對應電性接觸墊片(electrical c〇ntac^ pad)。 3 ·如申請專利範圍第2項所述之含共同封裝晶片的半導體 裝置’其中該内部夾具(inner cl ip)包括一延伸自該部的 至少一外牆(wal 1),該外牆係與該外部導電性夾具(〇uter
    第16頁 565921 六、申請專利範圍 conductive c1i 該接觸表面共平 4 ·如申請專利範 裝置,其中該内 於該薄片部(web 5 ·如申請專利範 裝置,其中該第 體(MOSFETs)。 6·如申請專利範 裝置,其中該第 (M0SFET),而具 極電極連接至該 裸晶係一積體電 (M0SFET)。 7 ·如申請專利範 裝置’其中該内 成0 8 ·如申請專利範 裝置,其中該内
    P)之該兩個升同口P (raised portions)的 面。 圍第1項所述之含共同封裝晶片的半導體 部夾具(inner cl ip)係連接至,但卻隔離 Portion) 0 圍第1項所述之含共同封裝晶片的半導體 一與該第二半導體裸晶係金氧半場效電晶 圍第1項所述之含共同封裝晶片的半導體 —半導體裸晶係一金氧半場效電晶體 ,〜汲極電極(drain electrode),該汲 薄片部(web portion),且該第二半導體 路而用以控制該金氧半場效電晶體 ,第1項所述之含共同封裝晶片的半導體 部爽具(inner clip)係由銅(copper)製 ^第1項所述之含共同封裝晶片的半導體 4失具(inner cl i p)的外部表面係絕緣的 第17頁 565921 六、申請專利範圍 (insulated) ° 9. 如申請專利範圍第1項所述之含共同封裴晶片的半導體 裝置’其中該内部爽具(inner clip)的内部表面係以銀& 膜(coated with silver) 〇 10. 如申請專利範圍第1-項所述之含共同封裝晶片的 裝置,進-步地包括-絕緣層,該絕緣層連接該内部夹^ (inner clip)於該薄片部(web p〇rti〇n)。 ’、 11·如申請專利範圍第1項所述之含共同封裝晶片的 $置,其中該第二半導體裸晶係較該第_半導體裸晶為 薄。 12. 如申請專利範圍第丨項所述之含共同封裝晶片的 裝置,其中該第二半導體裰晶俦蕤道你Μ 卞守肢採日日係籍由導電性的環氧樹脂 (EPOXY)電性連接於該内部夾具(inner clip)。 13. 如申請專利範圍第i項至第12項任一項所述之含共同封 裝晶片的半導體裝置,其中該外部導電性夹具(〇uter conductive clip)係一金屬容器(mental can’、)。
    第18頁
TW091124046A 2002-01-18 2002-10-18 Semiconductor device with co-packaged die TW565921B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/053,123 US6677669B2 (en) 2002-01-18 2002-01-18 Semiconductor package including two semiconductor die disposed within a common clip

Publications (1)

Publication Number Publication Date
TW565921B true TW565921B (en) 2003-12-11

Family

ID=21982077

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091124046A TW565921B (en) 2002-01-18 2002-10-18 Semiconductor device with co-packaged die

Country Status (6)

Country Link
US (1) US6677669B2 (zh)
EP (1) EP1466363A4 (zh)
JP (2) JP4712303B2 (zh)
CN (1) CN100466235C (zh)
TW (1) TW565921B (zh)
WO (1) WO2003063236A1 (zh)

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6946740B2 (en) * 2002-07-15 2005-09-20 International Rectifier Corporation High power MCM package
US7633158B2 (en) * 2003-09-05 2009-12-15 Rohde & Schwarz Gmbh & Co., Kg Electronic component comprising a cooling surface
JP4244318B2 (ja) * 2003-12-03 2009-03-25 株式会社ルネサステクノロジ 半導体装置
JP4312616B2 (ja) * 2004-01-26 2009-08-12 Necエレクトロニクス株式会社 半導体装置
US7235877B2 (en) * 2004-09-23 2007-06-26 International Rectifier Corporation Redistributed solder pads using etched lead frame
US7755179B2 (en) * 2004-12-20 2010-07-13 Semiconductor Components Industries, Llc Semiconductor package structure having enhanced thermal dissipation characteristics
US7884454B2 (en) 2005-01-05 2011-02-08 Alpha & Omega Semiconductor, Ltd Use of discrete conductive layer in semiconductor device to re-route bonding wires for semiconductor device package
US7898092B2 (en) * 2007-11-21 2011-03-01 Alpha & Omega Semiconductor, Stacked-die package for battery power management
US7524701B2 (en) * 2005-04-20 2009-04-28 International Rectifier Corporation Chip-scale package
US7230333B2 (en) 2005-04-21 2007-06-12 International Rectifier Corporation Semiconductor package
US7504733B2 (en) 2005-08-17 2009-03-17 Ciclon Semiconductor Device Corp. Semiconductor die package
US7560808B2 (en) * 2005-10-19 2009-07-14 Texas Instruments Incorporated Chip scale power LDMOS device
US8089147B2 (en) * 2005-11-02 2012-01-03 International Rectifier Corporation IMS formed as can for semiconductor housing
US7446375B2 (en) * 2006-03-14 2008-11-04 Ciclon Semiconductor Device Corp. Quasi-vertical LDMOS device having closed cell layout
US20070215997A1 (en) * 2006-03-17 2007-09-20 Martin Standing Chip-scale package
US7541681B2 (en) * 2006-05-04 2009-06-02 Infineon Technologies Ag Interconnection structure, electronic component and method of manufacturing the same
US7757392B2 (en) 2006-05-17 2010-07-20 Infineon Technologies Ag Method of producing an electronic component
US7476978B2 (en) * 2006-05-17 2009-01-13 Infineon Technologies, Ag Electronic component having a semiconductor power device
US7271470B1 (en) 2006-05-31 2007-09-18 Infineon Technologies Ag Electronic component having at least two semiconductor power devices
US7626262B2 (en) * 2006-06-14 2009-12-01 Infineon Technologies Ag Electrically conductive connection, electronic component and method for their production
US20080013298A1 (en) * 2006-07-14 2008-01-17 Nirmal Sharma Methods and apparatus for passive attachment of components for integrated circuits
US20080036078A1 (en) * 2006-08-14 2008-02-14 Ciclon Semiconductor Device Corp. Wirebond-less semiconductor package
DE102006044690B4 (de) * 2006-09-22 2010-07-29 Infineon Technologies Ag Elektronisches Bauteil und Verfahren zum Herstellen
DE102006047761A1 (de) * 2006-10-06 2008-04-10 Infineon Technologies Ag Halbleiterbauteil und Verfahren zu dessen Herstellung
DE102007007142B4 (de) * 2007-02-09 2008-11-13 Infineon Technologies Ag Nutzen, Halbleiterbauteil sowie Verfahren zu deren Herstellung
DE102007012154B4 (de) * 2007-03-12 2014-05-08 Infineon Technologies Ag Halbleitermodul mit Halbleiterchips und Verfahren zur Herstellung desselben
DE102007013186B4 (de) * 2007-03-15 2020-07-02 Infineon Technologies Ag Halbleitermodul mit Halbleiterchips und Verfahren zur Herstellung desselben
US7759777B2 (en) * 2007-04-16 2010-07-20 Infineon Technologies Ag Semiconductor module
US7879652B2 (en) * 2007-07-26 2011-02-01 Infineon Technologies Ag Semiconductor module
US20090057855A1 (en) * 2007-08-30 2009-03-05 Maria Clemens Quinones Semiconductor die package including stand off structures
US7701065B2 (en) * 2007-10-26 2010-04-20 Infineon Technologies Ag Device including a semiconductor chip having a plurality of electrodes
US7799614B2 (en) * 2007-12-21 2010-09-21 Infineon Technologies Ag Method of fabricating a power electronic device
US8642394B2 (en) * 2008-01-28 2014-02-04 Infineon Technologies Ag Method of manufacturing electronic device on leadframe
US8294208B2 (en) * 2008-03-04 2012-10-23 International Rectifier Corporation Semiconductor device having a gate contact on one surface electrically connected to a gate bus on an opposing surface
US8637341B2 (en) * 2008-03-12 2014-01-28 Infineon Technologies Ag Semiconductor module
US7759163B2 (en) * 2008-04-18 2010-07-20 Infineon Technologies Ag Semiconductor module
US8441804B2 (en) * 2008-07-25 2013-05-14 Infineon Technologies Ag Semiconductor device and method of manufacturing a semiconductor device
US8410590B2 (en) * 2008-09-30 2013-04-02 Infineon Technologies Ag Device including a power semiconductor chip electrically coupled to a leadframe via a metallic layer
US8710665B2 (en) 2008-10-06 2014-04-29 Infineon Technologies Ag Electronic component, a semiconductor wafer and a method for producing an electronic component
US8049312B2 (en) * 2009-01-12 2011-11-01 Texas Instruments Incorporated Semiconductor device package and method of assembly thereof
US9257375B2 (en) 2009-07-31 2016-02-09 Alpha and Omega Semiconductor Inc. Multi-die semiconductor package
US8164199B2 (en) * 2009-07-31 2012-04-24 Alpha and Omega Semiconductor Incorporation Multi-die package
US20120175688A1 (en) * 2011-01-10 2012-07-12 International Rectifier Corporation Semiconductor Package with Reduced On-Resistance and Top Metal Spreading Resistance with Application to Power Transistor Packaging
US8637981B2 (en) * 2011-03-30 2014-01-28 International Rectifier Corporation Dual compartment semiconductor package with temperature sensor
US8531016B2 (en) * 2011-05-19 2013-09-10 International Rectifier Corporation Thermally enhanced semiconductor package with exposed parallel conductive clip
US9048338B2 (en) * 2011-11-04 2015-06-02 Infineon Technologies Ag Device including two power semiconductor chips and manufacturing thereof
DE102011086687A1 (de) * 2011-11-21 2013-05-23 Robert Bosch Gmbh Verfahren zum Kontaktieren eines Halbleiters und Kontaktanordnung für einen Halbleiter
DE102012215656B4 (de) * 2012-09-04 2015-05-21 Semikron Elektronik Gmbh & Co. Kg Verfahren zur Herstellung eines Leistungshalbleitermoduls
US9202811B2 (en) * 2012-12-18 2015-12-01 Infineon Technologies Americas Corp. Cascode circuit integration of group III-N and group IV devices
US9054040B2 (en) 2013-02-27 2015-06-09 Infineon Technologies Austria Ag Multi-die package with separate inter-die interconnects
US9041170B2 (en) 2013-04-02 2015-05-26 Infineon Technologies Austria Ag Multi-level semiconductor package
US9214415B2 (en) * 2013-04-11 2015-12-15 Texas Instruments Incorporated Integrating multi-output power converters having vertically stacked semiconductor chips
US9536800B2 (en) 2013-12-07 2017-01-03 Fairchild Semiconductor Corporation Packaged semiconductor devices and methods of manufacturing
JP2015176916A (ja) * 2014-03-13 2015-10-05 株式会社東芝 半導体装置およびモジュール
DE102014118080B4 (de) * 2014-12-08 2020-10-15 Infineon Technologies Ag Elektronisches Modul mit einem Wärmespreizer und Verfahren zur Herstellung davon
DE102015200868A1 (de) * 2015-01-20 2016-07-21 Zf Friedrichshafen Ag Steuerelektronik
CN104617058B (zh) 2015-01-23 2020-05-05 矽力杰半导体技术(杭州)有限公司 用于功率变换器的封装结构及其制造方法
EP3065172A1 (en) * 2015-03-06 2016-09-07 Nxp B.V. Semiconductor device
DE102015104995B4 (de) 2015-03-31 2020-06-04 Infineon Technologies Austria Ag Verbindungshalbleitervorrichtung mit einem mehrstufigen Träger
US20180182730A1 (en) * 2016-12-23 2018-06-28 Infineon Technologies Americas Corp. Common contact semiconductor device package
US10559510B2 (en) 2017-08-24 2020-02-11 Semiconductor Components Industries, Llc Molded wafer level packaging
US10438877B1 (en) * 2018-03-13 2019-10-08 Semiconductor Components Industries, Llc Multi-chip packages with stabilized die pads

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3784726A (en) * 1971-05-20 1974-01-08 Hewlett Packard Co Microcircuit package assembly
US3972062A (en) * 1973-10-04 1976-07-27 Motorola, Inc. Mounting assemblies for a plurality of transistor integrated circuit chips
US4314270A (en) * 1977-12-02 1982-02-02 Mitsubishi Denki Kabushiki Kaisha Hybrid thick film integrated circuit heat dissipating and grounding assembly
US4766479A (en) * 1986-10-14 1988-08-23 Hughes Aircraft Company Low resistance electrical interconnection for synchronous rectifiers
JPS6481346A (en) * 1987-09-24 1989-03-27 Fujitsu Ltd Sealing structure of chip component of microwave integrated circuit
US5731970A (en) * 1989-12-22 1998-03-24 Hitachi, Ltd. Power conversion device and semiconductor module suitable for use in the device
JP2936855B2 (ja) * 1991-12-26 1999-08-23 富士電機株式会社 電力用半導体装置
US5639990A (en) * 1992-06-05 1997-06-17 Mitsui Toatsu Chemicals, Inc. Solid printed substrate and electronic circuit package using the same
JP3198796B2 (ja) * 1993-06-25 2001-08-13 富士電機株式会社 モールドモジュール
JP3180863B2 (ja) * 1993-07-27 2001-06-25 富士電機株式会社 加圧接触形半導体装置およびその組立方法
JP2991010B2 (ja) * 1993-09-29 1999-12-20 富士電機株式会社 半導体装置およびその製造方法
JPH07161925A (ja) * 1993-12-09 1995-06-23 Mitsubishi Electric Corp パワーモジュール
JPH07297575A (ja) 1994-04-21 1995-11-10 Mitsubishi Electric Corp パワーモジュール装置
US5754402A (en) * 1995-06-22 1998-05-19 Sumitomo Electric Industries, Ltd. Power amplifying module
TW315491B (en) * 1995-07-31 1997-09-11 Micron Technology Inc Apparatus for applying adhesive tape for semiconductor packages
JP3448159B2 (ja) * 1996-06-20 2003-09-16 株式会社東芝 電力用半導体装置
US6075289A (en) * 1996-10-24 2000-06-13 Tessera, Inc. Thermally enhanced packaged semiconductor assemblies
US5814884C1 (en) * 1996-10-24 2002-01-29 Int Rectifier Corp Commonly housed diverse semiconductor die
JP3535328B2 (ja) * 1996-11-13 2004-06-07 株式会社ルネサステクノロジ リードフレームとこれを用いた半導体装置
US5926695A (en) * 1997-06-10 1999-07-20 National Semiconductor Corporation Lead frame incorporating material flow diverters
US6184585B1 (en) * 1997-11-13 2001-02-06 International Rectifier Corp. Co-packaged MOS-gated device and control integrated circuit
TW451535B (en) * 1998-09-04 2001-08-21 Sony Corp Semiconductor device and package, and fabrication method thereof
US6624522B2 (en) * 2000-04-04 2003-09-23 International Rectifier Corporation Chip scale surface mounted device and process of manufacture
JP3923258B2 (ja) * 2001-01-17 2007-05-30 松下電器産業株式会社 電力制御系電子回路装置及びその製造方法
JP4286465B2 (ja) * 2001-02-09 2009-07-01 三菱電機株式会社 半導体装置とその製造方法

Also Published As

Publication number Publication date
JP4712303B2 (ja) 2011-06-29
US6677669B2 (en) 2004-01-13
JP2011049575A (ja) 2011-03-10
CN100466235C (zh) 2009-03-04
US20030137040A1 (en) 2003-07-24
EP1466363A1 (en) 2004-10-13
JP2005516398A (ja) 2005-06-02
EP1466363A4 (en) 2007-08-15
CN1613148A (zh) 2005-05-04
WO2003063236A1 (en) 2003-07-31

Similar Documents

Publication Publication Date Title
TW565921B (en) Semiconductor device with co-packaged die
US8294208B2 (en) Semiconductor device having a gate contact on one surface electrically connected to a gate bus on an opposing surface
JP3240292B2 (ja) 半導体パッケージ
TWI374529B (en) Stacked die for battery power management
US9362192B2 (en) Semiconductor device comprising heat dissipating connector
JP2005026294A (ja) 半導体装置およびその製造方法
JP2009512999A (ja) 半導体パッケージ
TW200910555A (en) Co-packaged high-side and low-side NMOSFETs for efficient DC-DC power conversion
US8952509B1 (en) Stacked multi-chip bottom source semiconductor device and preparation method thereof
TW201041089A (en) Power MOSFET package
JP2010238892A (ja) 半導体装置およびその製造方法
TWI278795B (en) Display device
JP2008177588A (ja) 半導体装置
WO2019235146A1 (ja) 半導体モジュール
US11955440B2 (en) Semiconductor device with detection conductor
TWI678773B (zh) 功率晶片封裝結構
JP7365368B2 (ja) 半導体装置
JP2023138880A (ja) 半導体装置
CN208954972U (zh) 功率芯片封装结构
JP2013179231A (ja) 半導体モジュール
KR20220044502A (ko) 반도체 장치
US20220084900A1 (en) Semiconductor device
CN111146157A (zh) 功率芯片封装结构
TWM575188U (zh) 功率晶片封裝結構
US20240030080A1 (en) Semiconductor device

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees