TW444298B - Semiconductor device and method of production of the semiconductor device - Google Patents

Semiconductor device and method of production of the semiconductor device Download PDF

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Publication number
TW444298B
TW444298B TW089101276A TW89101276A TW444298B TW 444298 B TW444298 B TW 444298B TW 089101276 A TW089101276 A TW 089101276A TW 89101276 A TW89101276 A TW 89101276A TW 444298 B TW444298 B TW 444298B
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TW
Taiwan
Prior art keywords
circuit pattern
substrate
external circuit
protective layer
semiconductor
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Application number
TW089101276A
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English (en)
Inventor
Toshimi Kawahara
Hirohisa Matsuki
Yasuhiro Shinma
Yoshiyuki Yoneda
Norio Fukasawa
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Fujitsu Ltd
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Publication of TW444298B publication Critical patent/TW444298B/zh

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01DMEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D4/00Tariff metering apparatus
    • G01D4/002Remote reading of utility meters
    • G01D4/004Remote reading of utility meters to a fixed location
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    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3114Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed the device being a chip scale package, e.g. CSP
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    • G01D9/00Recording measured values
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    • G06COMPUTING; CALCULATING OR COUNTING
    • G06QINFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

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經濟部智慧財產局員工消費合作社印製 4442 9 8 A7 ______B7__ 五、發明說明(1 ) 本發明大致有關於一半導體元件及一製造半導體元件 的方法,更明確的係有關於一具有晶片大小封裝結構((jSp) 的半導體及其製造方法。 為使半導體元件的形狀及大小與晶月形狀大小盡可能 吻合’曾經提出半導體元件的晶片大小封裝結構,其中在 半導體元件上提供外部輸出终端,並使其包袠於樹脂材料 以下裝先參考第丨1、U及13囷對傳統CSP半導體元件 加以敘述。第11圊說明傳統CSP半導體元件1100。第,12圖 為該CSP半導體元件11 00延第11圖中所顯示之虛線所載切 的截面圖。第13圖顯示傳統CSP半導體元件1100中構件的 内連結電路。 如第12圖所示,傳統CSP半導體元件1100中提供一半 導體基材1101、一内部線路圖樣1102、介層1103 ' —保護 層1104及一外部線路圖樣1105及伸出電極1106。基材1101 含一提供其中的電子電路,而該電子電路包括終端。該内 部線路圊樣1102提供於基材1101上且連接至該電子電路終 端。介層1103由鋁金屬(Α1)製成且具有導電性質》介層1103 連接至内部線圈圖樣1102上。該介層1103係提供於基材 1101中並自保護層1104伸出。保護層1104係以樹脂材料如 聚亞胺製成,其為介電層並提供於基材1101上。外部線路 圖樣1105係由銅金屬(Cu)製成並與從保護層1104中伸出的 介層1103連接。伸出電極1106係提供於外部線路圖樣1105 上。 本纸張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 4 ------ -------裝--------訂—! !_ 線 * , (請先閱讀背面之注意事項再填寫本頁) 經濟‘部智1时產灵員工消費合泎祛-鉍 A7 _________B7__ 五、發明說明(2 ) 於上述第13圖的半導體元件η〇〇中,為了便於顯示構 件1103、1105、1106及1108而省略保護層1104。 - 在最後封裝的階段’除了伸出電極丨丨06之最上端被封 裝包袠外’其他半導體元件11〇〇封裝於一樹脂封裝材料中 。第12圖中並未說明傳統CSP晶片封裝。 在上述第13圖的半導趙元件noo中,該伸出電極11〇6 在晶片上的位置係藉由外部線路圊樣之再熔焊接以固定的 ^ 方式加以決定。外部線路圖樣U 05的再熔焊接可使塊墊 1108及伸出電極11 〇6。由於伸出電極π 06間的間隔可以比 塊墊1108間的間隔大,因此當藉由再熔焊接外部線路圖樣 把上述半導體元件11 〇〇插接至主印刷電路板上時,可避免 伸出電極1106形成短路。 然而,如第13圖所示,塊墊11〇8是在晶片表面的周圍 部份。這些塊墊實質上與既有之線路連接元件所用的塊墊 一樣。一般來說每個塊墊1108大小為ΐ〇〇μπι X ι〇〇μιη,且 將這些塊墊U 08安排於周圍部份會防礙半導體元件封裝密 度之增加。因此可以接在傳統CSP半導體元件的總電容數 目就會因塊墊的大小受到嚴重的限制。 上述半導體元件1100中,外部線路圖樣1105並非以最 短的距離連接塊墊1108及伸出電極〗〗06。某些外部線路圖 樣U 05必須加長以連接周圍的塊墊丨丨〇8及伸出電極〗〗〇6, 此舉會降低傳統csp半導體元件中連接線路的電性效能3 為了克服上述的問題*本發明之實施例提供一改良之 半導體元件·,其可在半導體元件上達到電容高封裝密度, :CXS).V1 規格 ί2]ΰχ 裝--------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 4 442 9 8 經濟部智慧財產尾員工消費合作社印製 Α7 Β7 五、發明說明(3 ) 並可在不使半導體元件中連接線路的電性效能降低下縮小 半導體元件的大小。 ,· 根據本發明之一較佳實施例,一半導體元件包括:一 半導體基材;一提供於該基材中的電子電路,該電子電路 具有終端;一内部線路圊樣,其提供於該基材中,該内部 線路圖樣與該電子電路終端連接;一保護層,其提供於基 材上,該保護層覆蓋該基材;介層提供於該基材上,且自 保護層中伸出’該介層與内部線路圖樣在基材上的任意位 置相連接;一外部線路圖樣,其與介層連接;伸出電極係 k供於該外部線路圖樣上,該伸出電極該外部線路圖樣連 接以在該伸出電極與該電子電路終端建立連接,該伸出電 極具有一預定高於該外部線路圖樣之高度;及一樹脂材料 封裝層’其係提供於保護層上,該封裝層覆蓋該伸出電極 的側邊及外部線路圖樣的外表面。 較佳實施例之半導體元件不需要傳統CSP半導體元件 令的塊墊。在此半導體元件較佳實施例中,該伸出電極與 外部線路圖樣連接以在伸出電極與電子電路終端間建立連— 接β該外部線路圖樣以最短的距離連接介層與伸出電極β 本發明之半導體元件可有效地達成半導體元件體積縮小, 並增加半導體元件上電容之封裝密度。由於伸出電極與電 子電路終端間的連接可以最短距離達成,該較佳實施例之 半導體元件可有效將連接線路的電性效能維持在適當的水 準。 在本發明半導體元件之另一較佳實施例中,一半導體 本紙張又度適用中S國家標準(CNS)A4規格(210 X 297公釐) {請先閱讀背面之注意事項再填寫本頁) v > -------訂--------•線: A7 ______B7__ 五、發明說明(4 ) 元件包括:一半導體基材;一提供於該基材中的電子電路 ,該電子電路具有終端;—内部奴路圖樣’其提供於該基 材t ’該内部線路圖樣與該電子電路終端連接;一保護層 ’其提供於基材上’該保護層復蓋該基材:介層提供於該 基材上,並自保護層中伸出,該介層與内部線路圖樣在基 材上的任意位置相連接;一外部線路圖樣,其與介層連接 ,引導線其與外部線路圖樣連接,該引導線以一踢帶支撐 ;及一樹脂材料封裝層,其係提供於保護層上,該封裝層 覆蓋該引導線的部份及外部線路圖樣的外表面。 上述本發明較佳實施例之半導體元件可有效地 達成半導體元件體積縮小,並增加半導體元件上電 谷之封裝密度。上述本發明較佳實施例之半導體元 件可有效將連接線路的電性效能維持在適當的水準 〇 在本發明半導體元件製造方法之一較佳實施例中,該 # 製造方法包括以下步驟:提供一電子電路於半導體基材中 ,忒電子電路包括一輸入電容及輸出電容,該輸入電容具 有一輸入終端’該輸出電容具有一輸出終端;提供一内部 線路圖樣於該基材中,該内部線路圖樣連接至該輸入終端 與該輸出終端;提供一保護層於基材上,該保護層覆蓋該 基材‘提供介層於基材上的任意位置,該介層自保護層中 伸出並與内部線路圊樣相連接;提供一外部線路圖樣,該 外部線路圖樣與介層連接;提供伸出電極於該外部線路圖 樣上’該伸出電極與該外部線路圖樣連接以在該伸出電極 規格 d Ί 4--— -------------裝--------訂---------線 (請先閱讀背面之江意事項再填寫本頁) " 經濟部智楚时產"員工消費合作祛印" 4442 9 8 A7 --------- 一 B7 五、發明說明(5 ) 與*玄電子電路終端建立連接,且該伸出電極以一預定高度 高於該外部線路圖樣;及利用一壓塑方法提供一樹脂材料 封裝層於保護層上,該封裝廣復蓋該伸出電極的側邊及外 部線路圖樣的外表面》 上述本發明半導體元件製造方法之較佳實施例可有效 地達成半導想元件體積縮小,並增加半導想元件上電容之 封裝密度。由於伸出電極與電子電路終端間的連接可以最 短距離達成,上述較佳實施例之製造方法可有效將連接線 路的電性效能維持在適當的水準。 圖示簡要說明 配合以下所附圖示,本發明之其他目的、特徵及優點 可藉由以下的說明更為清楚。 第1A及1B圖為根據本發明半導體元件之第一較佳實 施例圖示; 第2A及2B圖為解釋本發明之第一較佳實施例與傳統 半導體元件間差異之圖示; 第3圖為解釋根據本發明之半導體元件第一較佳實施 例之製造方法圖示; 第4圖為顯示接上阻隔塞的半導體元件之第一較佳實 拖例圖; 第5圖為顯示半導體元件之第一較佳實施例的晶圓狀 況; '第6A及6B圊為根據本發明半導體元件之第二較佳實 施例的截面圖; 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 装--------訂·!------線. 經濟部智慧时 4^'nmrH"',^i¥3i-Ju A7 ____E7_ 五、發明說明(6 ) 第7A及7B圖為根據本發明半導體元件之第三較佳實 施例的圖示; 第8圖為根據本發明半導體元件之第四較佳實施例的 截面圖; 第9圖為根據本發明半導體元件之第五較佳實施例的 截面圖; 第10A及10B圊為根據本發明半導體元件之第六較佳 i 實施例的戴面圖; 第11圖為傳統CSP半導體元件之俯視圖: 第12圖為第11圖之傳統CSP半導體元件的截面圖;及 第13圖為顯示第11圖之傳統c SP半導體元件中構件之 内連結圖示。 以下將配合圖示提供本發明較佳實施例之詳細說明。 第1A及1B圖顯示根據本發明半導體元件之第一較佳 實施例。第1A圖為半導體元件之第一較佳實施例的俯視 圖。第1B圖為延第1A圖中之虛線切割後半導體元件之第 一較佳實施例載面圖。 此實施例之半導體元件1 〇具有CSP結構,如第1A及 1B圖所示。在此實施例之半導體元件丨〇中,提供一半導 體基材11’其中包括一電子電路。包含於基材u中之電子 電路包括一輸入電容及一輸出電容,該輸入電容具有一輸 入終瑞,而該輸出電容包括一輸出終端。 一内部線路圖樣12提供於基材U中,且該内部線路圖 樣12與電子電路終端連接。一保護層14提供於基材丨丨上’ .........____________ _ 又-、义 XNS)A-1 ί?Η! - :, --- -------------裝--------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 4 442 9 8 經濟部智慧財產局員工消費合作社印製 Α7 Β7 五、發明說明(7 ) 並且該保護層14覆蓋該基材u。數個介層丨3提供於基材η 上並自保濩層14伸出。該等介層i3内部線路圊樣12在墓材 11上的任意位置相連接。該介層丨3經由内部線路圖樣12與 包括於基材11中的電子電路輸入或輸出終端相連接。 一外部線路囷樣15提供於保護層14上’且該外部線路 圖樣15連接至介層13。數個伸出電極16提供於該外部線路 圖樣15上且與外部線路圖樣15連接,以在伸出電極μ及電 子電路終端間建立連接。該伸出電極16以一預定高度高於 外部線路圚樣1 5。 於本實施例半導體元件1〇中,一樹脂材料封裝層17 提供於保護層14上,且該封裝層π覆蓋該伸出電極16的側 邊及該外部線路圖樣15的外表面。只有伸出電極Μ的上表 面未被封裝層17覆蓋。 如第1A及1B圖所示,本實施例之半導體元件1〇中, 該介層13與外部線路圖樣15於基材上的任意位置相連。於 第1A圖中’元件標號13a代表介層13及外部線路圖樣15間 之連接位置之一。如第1A圖所示’部份的外部線路圖樣Η 自連接部份13a延伸至伸出電極16。該伸出電極丨6提供於 外部線路圖樣15之該部份端上》 於第3圖之傳統CSP半導體元件中,電子電路終端係 連接至塊>塾1108 ’且該塊^塾1108藉由安排外部線路圖樣 1105連接至該伸出電極1106。也就是該外部線路圖樣1 的路線是自塊墊1丨08牵至伸出電極1106。因此,該外部線 路圖樣1105並非以最短距離連接介層1103及伸出電極11〇6 本纸張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 10 ----------裝--------訂---------線- (請先Μ讀背面之注意事項再填寫本頁) 經濟部智慧財產"員工消費合作社.S纪 A7 -------B7____ 五、發明說明(8 ) □ 本實施例之半導體元件丨〇不需要提供於傳統cs-p半 導體凡件中的塊墊。於本實施例之半導體元件丨〇中,該 伸出電極16與外部線路圖樣15相連以在伸出電極16與電子 電路終端間建立連接。該外部線路圖樣15以最短的距離連 接介電丨3與伸出電極16。因此,本實施例之半導體元件j 〇 可有效地達成半導體元件體積縮小,並增加半導體元件上 ) 電容之封裝密度a由於伸出電極16與電子電路終端間的連 接可以最短距離達成,本實施例之半導體元件1 〇可有效增 加連接線路的電性效能。 本實施例之半導體元件10中,介層13係以鋁製成,且 其直徑從内部線路圖樣12計算在5μηι至25μπι範圍間,高 度在ΙΟμηι至50μπι範圍間。如第1Β圖所示,介層13連接至 基材11中的内部線路圖樣12,該内部線路圖樣12以鋁製成 且連接至電子電路終端及介層丨3。然而’上述實施例可修 改。若有任何包括在基材11的電子電路部份沒有剛好在介 層13下方時,介層13可提供於任何藉由内部線路圖樣12與 電子電路終端連接的位置。外部線路圖樣15提供於保護層 14上,该外部線珞圊樣1 5具有一位於每個介層丨3上的部份 ,且該外部線路圊樣15於此部份與介層13連接。藉由此本 發明之半導體元件10的修改,可在不降低連結的電子效能 及減少降低產生於基材1 1之電子電路中的彈性電容係數或 彈性感應係數。 於第丨Β圖之實施例中,内部線路圖樣】2的上層與介 -------------裝--------訂---------線 (請先閲讀背面之注意事項再填寫本頁) H ΐ ☆ :¾ 甬玄嘌:¾ 規格 dl〇 Xd 經濟部智慧財產炅員工消費合作社b製 ίι 442 98 Α7 Β7 五、發明說明(9 ) 層13連接。然而,本發明並非侷限於此實施例,而可將内 部線路圖樣丨2之下層與介層13連'接》 .· 於本實施例之半導體元件10中,介層13用於連接該内 部線路圖樣12及外部線路圖樣15。介層13的材料並不—定 要與線路圖樣12及15的材料相同,而介層13的材料可不同 於線路圖樣12及15的材料。本實施例之外部線路圖樣丨5係 由寬度25μιη之銅材料製成。該外部線路圖樣15係提供於 保護層14上《該外部線路圖樣15的材料並不限於銅,而可 使用金或鎳作為外部線路圖樣15的材料。 於本實施例之半導體元件1 〇中,外部線路圊樣丨5在晶 片製造過程完成後扮演重新安排從13a部份至伸出電極16 間之連接的功能。於傳統CSP半導體元件中,外部線路圊 樣的路徑安排是設定從周圍部份的塊墊通往伸出電極。如 上所述,該介層13可提供於基材上的任意位置,且伸出電 極16及電子電路終端可以最短的距離連接》本實施例之半 導體元件10可有效地達成半導體元件體積縮小,並増加 半導體元件上電容之封裝密度。相較於傳統CSP半導體元 件’本實施例之半導趙元件10可更有效增加連接線路的電 性效能。 考/2 A及2B圖顯示第本發明之第一較佳實施例之半導 體元件10與一傳統CSP半導體元件20之差異》 如第2A圖中所示,連接至半導體元件10之外部線路 圖樣15之介層13在連接部份!3a具有與外部線路圖樣15 — 樣或更小的寬度。半導體元件10之外表面上的介層丨3與連 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐〉 <請先閱讀背面之注意事項再填寫本頁) •^^-----I丨—訂---II----t 12
經濟部智碧財產尸α'員工消費合作.u」tr,K A7 _______B7_____ 五、發明說明(10) 接至包括於基材11内之内部線路圖樣12的介層一樣大小。 此有助於本實施例之半導體元件10達成體積縮小。介廣13 的連接部份1 3a在寬度上稍微比外部線路圖樣1 5大。然而 ’該連接部份13 a可經由調整以修正任何外部線路圖樣i 5 之對齊失準,且不會造成半導體元件的大小明顯增加。 如第2B圖所示’半導體晶片2 1,其中傳統CSP半導體 元件2 0之周圍部份包括塊墊11 〇 8,大小上較本實施例之 ] 半導體元件10大。該塊墊1108在半導體晶片21中所佔的區 域會嚴重妨害達成縮小半導體元件的目的。 如第2A圖所示,在本實施例之半導體元件1 〇中,伸 出電極16提供於外部線路圖樣15上的外部線路圖樣15預定 端部份。該外部線路圖樣15預定端部份的形狀與各別伸出 電極16的位置一致。 於本實施例之半導體元件10中’伸出電極16藉由銅鍍 膜形成於外部線路圖樣15上。該伸出電極μ的直徑為30 μηι 且以ΙΟΟμπί高於外部線路圖樣〗5 。該伸出電極]6係以與 該半導體元件10要配裝的主印刷電路板外部終端之安排一 致的方式加以安排《樹脂材料製成的封裝層17提供於基材 上並覆蓋伸出電極16的側邊及外部線路圖樣15的外表面。 只有伸出電極16的上表面未被封裝層丨7覆蓋。在此實施例 中’該樹脂材料封裝層17係藉由壓塑的方法形成於基材U 上,以下將會對其加以說明。 接著’將參考第3圖提供第—較佳實施例之半導體元
件的製造方法之說明D t如’S f 鮮 XXS)A-i 規心2ΐ〇χ297 々餐 13 裝--------訂----------線 <請先閱讀背面之注意事項再填寫本頁) 4442 98 A7 B7 五、發明說明(η) 如同第3圖所示,一厚度為Ιμιη之PSG/SiN層34a藉油 濺鍍形成於半導體基材31上,且一厚度為ΙΟμπι之聚壶胺 樹脂藉由濺鍍再形成於基材31之PSG/SiN層34a上。藉由 該PSG/SiN層34a及覆蓋層34b構成一保護層34。該基材31 包含一電子電路(未示)及一内部線路圖樣12。 一深達内部線路圖樣12的開口藉由在一對應於一介層 33的位置蝕刻形成於基材31中》接著該基材31中的開α藉 由自底往上填洞方法填入鋁以形成介層。 形成介層33後,一由鉻製成厚度為1μιη的接觸金屬層 35a藉由濺鍍形成於基材31整個表面上《接下來,一由銅 製成厚度為2μπι線路基底金屬層35b藉由濺鍍形成於該接 觸金屬層35b上。 在該線路基底金屬層35b形成後,一外部線路圖樣35 以如下方法形成於線路基底金屬層35b上。以一線路形成 光阻(未示)將不提供外部線路圖樣35之線路基底金屬層 35b部份加以覆蓋,並藉由電鍍的方式將使以銅製成厚度 為5μιη之外部線路圖樣35形成於線路基底金屬層35b上。 卷济部線路圖樣35形成後,以一線路形成光阻(未示) 將不提供伸出電極36之外部線路圖樣35部份加以覆蓋,並 藉由電鍍的方式將使以銅製成厚度為ΙΟΟμηι之伸出電極36 形成於外部線路圖樣35上《接著,未了提供具有抗腐蝕的 伸出電極36,一由鎳、金或纪製成的保護金屬層形成於伸 出電極36的上表面上。 在除去電極形成光阻後,利用外部線路圖樣35做為幕 本纸張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意Ϋ項再填寫本頁) -.裝|--訂---— II---線 ' *一. 經濟部智慧財產尾員工消費合作社印製 A7 A7 經清郭智慧財產局員工"'費合^.^^-¾ ^--------- 五、發明說明(⑴ 罩進行蝕刻。未被遮罩的接觸金屬層35a及線路基底金屬 層部份藉由此蚀刻而加以移除,-如第3圊所示。此姓刻會 造成外部線路圖樣35及保護金屬層之厚度稍微減少。應注 意到在形成外部線路圖樣35及保護金屬層40時要製造適當 厚的厚度,且上述兩層厚度即使在經上述蝕刻使厚度減少 後都要維持一適當的厚度。 在此實施例之製造方法中,伸出電極36形成後,該覆 ' 蓋層丨7(未示於第3圖中)藉由一壓塑方法形成於基材η上 ,接下來將對此說明。 上述壓塑方法使用上及下模板,其以一預定形狀形成 一空腔。一其上已製成半導體元件半成品(每個半成品係 包括已形成之伸出電極但封裝層仍未形成)之晶圓置於該 上下模板間的空腔中。將熱塑樹脂板,如PPS、PEEK或PES 板至於晶圓中央上方,此時需必免樹脂沾黏至上下模板。 可藉由在上下模板使用保護膜來避免樹脂沾黏。 在壓塑方法中’在樹脂板置於上下模板間的空腔内後
I ’將該具有晶圓置於其中的上下模板加熱至高於該樹脂熔 點的溫度’當該模板經加熱後’其中一模板壓向另一模板 以使晶圓上的樹脂板受熱及擠壓。該樹脂,其因受熱而軟 化’可在壓塑的條件下伸展至整個晶圓表面。在每一個半 導體元件,樹脂材料的封裝層17係形成於基材3 1上,以使 封裝層1 7 II蓋伸出電極3 6的側邊及外部線路圖樣3 5的外表 面= 上述實施例中’上述的壓塑方法係用於晶圊。另外, -------------裝--------訂---------線 (請先閱讀背面之注意事項再填寫本頁) ^ ^4298 A7 --------E--- 五、發明說明(I3) 此壓塑方法可用於各別半導體晶片,其係由切割晶圓成塊 而產生。 ' 上述壓塑方法之詳細說明已在如丨997年1月23日提申 之曰本專利申請案第9-10683號,其對應美國專利申請案 第029608號並讓渡予本發明之申請人。上述前申請案之有 關壓塑方法之揭露在此列入參考。 本實施例之製造方法使用以壓塑樹脂製成的封裝層17 ’其依上述壓塑方法形成於保護層上。該樹脂並不一定要 包括一傳統半導體元件之封裝層所需的塑形潤滑劑。因為 在封裝層17之樹脂中並無塑形潤滑劑,因此本實施例之半 導想元件可在不降低用以封裝層17之樹脂黏著力的情形下 覆蓋伸出電極16的側邊及線路圖樣15之外表面。 在封裝層17依此壓塑方法形成於保護層丨4上後,一薄 樹脂層可能出現在伸出電極16的上表面上。此薄樹脂層可 藉由一#刻製程、一研磨製程、一沖沙方法或一紫外光照 射輕易地自伸出電極之上表面上移除。 或者’一適當材料之彈性膜可在進行壓塑時用於封裝 層的上模板。在使用彈性膜後,該伸出電極16在進行壓塑 時會穿透該彈性膜,而在壓塑完成後,移去該彈性膜。藉 由此方法使用彈性膜可避免伸出電極16之上表面上形成一 薄樹脂層》 第4圖顯示已接上焊接球之半導體元件第一較佳實施 例。 如上所述’於本實施例之半導體元件丨〇中,只有伸出 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁)
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經濟部智慧財產局員工消費合作钍印S 16 經濟部智慧时產局員工"費合泎钍^¾ A7 __________B7 _ 五、發明說明(14) 電極16的上表面未被樹脂材料封裝層所復蓋。於第4圖之 半導體元件10中,焊接球48係形成於伸出電極46的上表面 上。 如第4圖所示’於本實施例之半導體元件1〇中,提供 —半導體基材41,其包含一電子電路於其中。該基材4丨所 包含之電子電路包括一輸入電容及—輸出電容,該輸入電 容具有一輸入終端,而該輸出電容具有一輸出終端。 一内部線路圖樣42係提供於基材41中’且該内部線路 圖樣42與電路終端連接。一保護層44提供於基材41上,並 且該保護層44覆蓋該基材41 ^數個介層43提供於基材41上 並自保護層44伸出。該等介層43内部線路圖樣42在基材41 上的任意位置相連接。該介層43經由内部線路圖樣42與包 括於基材41中的電子電路輸入或輸出終端相連接。 一外部線路圊樣45提供於保護層44上,且該外部線路 圖樣45連接至介層43。數個伸出電極仏提供於該外部線路 、 圖樣45上且與外部線路圖樣C連接,以在伸出電極46及電 子電路終端間建立連接。該伸出電極46以一預定高度高於 外部線路圖樣45。 於本實施例半導體元件1〇中1 一樹脂材料封裝層〇 提供於保護層44上,且該封裝層47覆蓋該伸出電㈣的側 邊及該外部,線路圖樣45的外表面。尸'有伸出電極46的上表 面未被封裝層47覆蓋。焊接球48係形成於伸出電極仏的上 表面上。 有許多習知的方法可在伸出電極46的上表面上形成焊 » — — — — — — — — —* — — — 1 I ---11111 » I t ------I I (請先閱讀背面之注意事項再填寫本頁} 17 經濟部智慧財產局員工消費合作社印製 -V 4 442 9 8 A7 _ B7 五、發明說明(15) 接球48。例如一傳遞焊接球形成方法或一利用模板遮罩之 幕印方法可用於在此實施例之半專體裝製伸出電極46的上 表面上形成焊接球。典型的烊接球材料為錫鉛合金。此合 金的組合比例依所需之焊接球性質而改變。 可在不使用焊接球48下將半導體元件1〇配裝到主印刷 電路板。然而’第4圖中使用形成於伸出電極46上之焊接 球48的半導體元件10在配裝該半導體元件丨〇之前不需任何 焊接點在主印刷電路板上。此實施例之半導體元件1〇增加 其配裝至主印刷電路板的方便性。 在進行完焊接球45之形成後,即產生一晶圓其中每個 半導體元件包括外部線路圖樣45及伸出電極46在基材41上 形成且焊接球亦在伸出電極46上形成。晶圓上的每個半導 體元件中’樹脂材料之封裝層藉由壓塑方法形成於基材上 〇 第5圖顯示在晶圓切刻成數個晶片前之第一半導體元 件較佳實施例晶圓的狀況。如第5圈所示,該樹脂材料封 裝層57係形成於晶圓之基材51的整個表面上,且該焊接球 58形成於各個半導體元件伸出電極上。第5圖中,晶圓上 每個半導體元件之詳細的構件構造實質上與第4圖中之丰 導趙元件10—樣,因此在此省略其說明。 最後,藉由切割鋸將上述晶圓如第5圖中的虛點線所 示切割成數塊’而所產生的每塊晶片及構成本實施例之半 導體元件10。因此’在此實施例之半導體元件10中,如第 4圖所示,該封裝層47包括一第一側邊表面且該基材μ包 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ---------------訂-----I I I I I # (請先閱讀背面之注意事項再填寫本頁) 18 經濟部智慧財i"·員工消費合作社.-17¾ A7 B7 五、發明說明(16) 括一第二側邊表面,而該第一側邊表面及第二侧邊表面形 成一因切割鋸切割而產生的共同年面。 - 因此’此實施例之半導體元件可有效地達成半導體元 件體積縮小’並增加半導體元件上電容之封裝密度。 於第1A及2A圖所示之本實施例半導體元件中,介層13 與外部線路圖樣1 5於基材11上的任意位置相連,且伸出電 極16與電子電路終端間的連接可以最短距離達成。外部線 ί 路圖樣丨5以最短的距離連接介電13與伸出電極16 »此外, 樹脂材料封裝層17係藉由壓塑的方法形成於基材丨1上。隨 著外部線路圖樣1 5的長度減到最低,樹脂在壓塑時的流動 性質可明顯地改善且可完全地避免孔洞包含於封裝層17内 〇 此外’本實施例之半導體元件中,一輸入訊號可經由 伸出電極16直接供應至基材η中的電子電路,而一來自電 子電路之回應輸出訊號可經由伸出電極16偵測而得。根攄 本發明,此實施例之半導體元件在藉由壓塑的方法於基材 11上形成樹脂材料封裝層17後,進一步包括一步驟,其連 接一測試探針至伸出電極16,以測試包含於基材u的電子 電路。於此測試步驟中’一輸入訊號係自測試探針經由伸 出電極16提供至基材11之電子電路,且一來自電子電路之 回應輸出訊號可經由與伸出電極16連接之測試探針價測而 得= 大致上’傳統半導體元件在測試已封裝之半導體晶片 時有其困難。然而 '本實施例之半導體元件在達成測試的 Γ、;:0:ν φ S S vCNS)A4 I Jio x J97 ) B — -------------裝--------訂---------線 <請先閱讀背面之注意事項再填寫本頁) 4442 9 8 A7 B7 經濟部智慧財產尾員工消費合作社印製 五、發明說明(17) 目的上顯得十分方便’該測試係接著封裝後而進行。此外 ’此實施例之半導趙元件實質上在-為最終產品的狀態下 ’而如此可藉著利用此實施例之半導體元件以便對已在最 終產品之狀態下的半導體元件進行測試步驟。 第6A及6B圖顯示根據本發明之第二較佳實施例的半 導想元件。於此實施例之半導體元件令,使用一由膠帶支 撑的引導線以取代第1八及1£5圖之第_較佳實施例中的伸 出電極16。 如第6 A所示,此實施例之半導體元件包括一半導體 基材61。一電子電路提供於該基材61中,該電子電路具有 終端。一内部線路圖樣62提供於該基材61中,該内部線路 圖樣62與該電子電路終端連接,一保護層64提供於基材61 上,該保護層64覆蓋該基材61。數個介層63提供於該基材 61上’並該介層63自保護層64中伸出,且該介層63與内部 線路圖樣62在基材61上的任意位置相連接。一外部線路圖 樣65提供於保護層64上’該外部線路囷樣65連接至介層63 。數個以一膠帶68支撐之引導線63連接至外部線路圖樣65 。一樹脂材料封裝層67提供於保護層64上,該封裝層67覆 蓋該引導線66的部份及外部線路圖樣65的外表面。 於上述實施例中,使用該引導線66取代伸出電極16, 以將包含於此實施例之半導體元件_的電子電路連接至一 外部元件。此實施例之半導體元件可有效降低引導線間距 離至相當小約3 Ο μπι的程度。 第6Β圖的半導體元件大致上與第6Α圖之半導體元件 本纸張尺度適用中國囡家標準(CNS)A4規格(210 X 297公釐) 20 <請先閱讀背面之注意事項再填寫本頁) 裝 II訂.--------線. A7 Β7
經濟耶智慧財產尾員工消費合作社i'JK 五、發明說明(l8) 相同,其與第6A圖中之實施例不同的地方在於其進一步 在外部線路圖樣65及引導線66間撻供一不同導電材料尚連 接層69,例如金(Au)。此實施例之半導體元件其包括該連 接層69,可有效地防止引導線66在外部線路圖樣65上短路 ’及降低引導線及外部線路圖樣65間内連線中的應力》 第7A及7B圖顯示依本發明之半導體元件第三較佳實 施例。第7A圖為此實施例之半導體元件的俯視圖。第7B 圖為延第7A圖中之點虛線切割後此實施例之半導體元件 的戴面圖。 如第7A及7B圊所示’此實施例之半導體元件包括一 主印刷電路板71、一第一半導體元件72及一第二半導體元 件73。於此實施例之半導體元件中,該第二半導艘元件73 在一個方向之長度上較小於第一半導體元件72且藉一黏著 劑連接至第一半導體元件72上。藉由此黏著劑在第一及第 二半導體元件72及73間形成一黏著層74。 上述第7A及7B圖之實施例中,該第一半導體元件72 以不同於本發明第一較佳實施例之半導體元件的結構來構 成。此第一半導體元件72包括一第一基材,其具有第一表 面及周圍部份在此第一表面上。一第一電子電路提供於此 基材中1此第一電子電路具有終端。數個塊墊76係提供於 此第一基材的周圍部份’且該塊墊·與第一電子電路終端相 連接。 於上述第7A及7B圖之實施例中,該第二半導體元件73 係以實質上與本發明第一較佳實施例之半導體元件相同的 ^;Λ:Χ X iCNS)A-i -'97 ; --------I I--- I ------訂--------- (請先閱讀背面之注意事項再填寫本頁) 21 4 442 9 8 經濟耶智慧財產局員工消費合作社印製 A7 B7 五、發明說明(19) 結構來構成◊該第二半導體元件73包括一第二基材。一第 一電子電路提供於此第二基材中--,且此第二電子電路真有 終端。一内部線路圖樣提供於此第二基材中,且此内部線 路圖樣連接至該第二電子電路終端。一保護層提供於此第 一基材上,且此保護層覆蓋該第二基材。數個介層77提供 於第二基材上,且該等介層77自保護層伸出。介層77於第 二基材上之任意位置連接至内部線路圖樣。一外部線路圖 樣75提供於保護層上,且該外部線路圖樣75連接至介層 以在外部線路圖樣75與第二電子電路終端間建立電性連接 。此外,如第7A及7B圖中所示,該外部線路圊樣75藉由 使用電線連接至第一半導體元件72之塊墊76。 於此實施例令,可藉由進行樹脂材料的射·(ρ〇η1η§) 方法提供覆蓋該第一及第二半導體元件72及73的封裝層, 但其未示於第7Α或7Β圊中。 於上述實施例中,將兩個具有不同功能的丰導體元件 配裝到主印刷電路板上可在一只有將近一個晶片的區域並 降低整個半導體元件的而度下達成。例如,該第—半導體 元件72可由邏輯LSI元件構成,而第二半導體元件73可由 一快閃記憶元件構成。 第8圖顯示一本發明半導體元件之第四較佳實施例。 如第8圖所示,此實施例之半導體元件包括一主印刷 電路板81、一第一半導體元件82及一第二半導趙元件83。 於此實施例之半導體元件中’該第二半導體元件83在一個 方向之長度上較小於第一半導體元件82,且固接至第一半 木纸張义度適用中國國家標準(CNS)A4規格(210 * 297公釐) ^ ^------11 ---------^ . (琦先閱讀背面之注意事項再填寫本頁) 22 五 A7 B7 發明說明(2〇) 導體元件82上以使第一及第二半導體元件82及83之電子電 路表面可相互吻合’而第一及第二半導體元件82及83籍由 焊接球86内連。此外,該第一及第二半導體元件82及83以 電線配裝在主印刷電路板上。 此實施例之每個第一及第二半導體元件82及83包括實 質相同於第1A及1B圖之第一較佳實施例中的構件1丨、^ 2 、13、14及15的構件。相似於第一較佳實施例,該第二半 導體元件83包括介層87且外部線路圖樣85連接至介層87, 但不包括伸出電極與封裝層。藉由焊接球86,其係焊接而 成‘該第二半導體元件83之外部線路圖樣85經由一不同導 電材料例如金(Au)的連接層84連接至第一半導體元件82。 於此實施例中’焊接球86在第一及第二半導體元件82及83 内的電子電路間建立電性連接。 上述實施例之半導體元件中,並未提供伸出電極,且 第一及第二半導體元件82及83内的電子電路間藉由焊接球 86内連。第一及第二半導體元件82及83配裝至主印刷電路 板上所造成總半導體元件高度可降低到相當小的高度。於 此實施例中,可藉由進行樹脂材料的射擊(p〇uing)方法提 供復蓋忒第一及第二半導體元件82及83的封裝層,但其未 示於第8圖中。 於上述實施例中,將兩個具有不同功能的半導體元件 配裝到主印刷電路板上可在—只有將近一個晶片的區域並 降低整個半導體元件的高度下達成。 第9圖顯示一本發明半導體元件之第五較佳實施例◊ 一· I - 3舀 1:嵘主(.CXS)A4 規格 3---- -------------裝--------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產"員工消費合作钍化 % A7 4442 98 __.-__B7___ 五、發明說明(21) 如第9圖所示,此實施例之半導體元件實質相同於第8 圖之半導體元件,其不同於第8圖中的半導體元件為使用 伸出電極96取代引導線以將第一及第二半導體元件配接至 主印刷電路板上。 於此實施例之半導體元件’如第9圖所示,提供一第 —半導體元件91及一第二半導體元件92。該第二半導趙元 件92在一個方向之長度上較小於第一半導體元件91,且固 接至第一半導體元件91上以使第一及第二半導體元件μ及 92之電子電路表面可相互吻合’而第一及第二半導艘元件 91及92藉由焊接球94内連。該第二半導體元件92包括介層 97且外部線路圖樣連街至介層97。 此第一半導體元件91伸出電極96提供於該第一半導通 元件91之外部線路圏樣95上,其中該第二半導體元件92未 固接。該伸出電極96連接至外部線路圖樣95。該伸出電極 96以一預定高度高於外部線路圖樣95。 此第一半導體元件91包括一樹脂材料封裝層97提供於 第一半導想元件91之保護層上’該封裝層97復蓋該第一半 導體元件91之伸出電極96的側邊及外部線路圖樣95的外表 面0 在製造此實施例之半導體元件中,將一晶圓置於上下 模板間’該晶圓上已有半導體元件半成品在第一及第二半 導體元件91及92藉由焊接球94内連後製備而得,並接著進 行壓塑方法以相似於上述第一較佳實施例之方式製造封裝 層97於第一半導體元件91之保護層上。 t國國家標準規格(210 X 297公髮) ------ -----7裝--------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印®!: 24 五、發明說明(22) A7 於上述實施例中,將兩個具有不同功能的半導體元件 配裝到主印刷電路板上可在一只肴將近一個晶片的區域下 達成。此外提供該封裝層,純蓋介於兩個半導體 元件間的焊接球,此實施例之半導體元件可有效提供可靠 性高的半導體元件。 第IOA及10B圖顯示一本發明半導體元件之第六較佳 實施例。 如第10圖所示’此實施例之半導體元件包括—主印刷 電路板101及一第二半導體元件1〇2。 於此實施例中,該第二半導體元件1〇2包括構件,其 實質與第1A及m圖中第一較佳實施例中的對應構件相同 ,除了第一較佳實施例中的伸出電極16與封裴層17。於此 實施例中,藉著使用電線106將第二半導鱧元件1〇2配裝至 主印刷電路板101。第一半導體元件102上的外部線路圖樣 105具有電線連接部份,其適用於電線1〇6的線路連接。 於主印刷電路板丨01的適當位置上。藉由進行電線線 路連接’該第二半導體元件102之外部線路圖樣1〇5及主印 刷電路板101之塊墊可藉由電線i 06内連。由電線! 〇6產生 的内連建立了第二半導體元件102中電子電路與主印刷電 路板101中的電子電路間的電性連接。 於苐10A圖中所禾的内連接中,延伸自主印刷電路板 101之塊墊的電線106直接連接至第二半導體元件1〇2之外 部線路圖樣105的電線連接部份。 於第10B圖中所示的内連接中,延伸自主印刷電路板 --------------裳--------訂---------線 (請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財4^員工消費合作吐"; 25 A7 444298 ___B7_____ 五、發明說明(23) 101之塊墊的電線106經過一不同導電材料,例如金(Au)的 連接層104連接至第二半導體元件1 〇2之外部線路圖樣-丨〇5 的電線連接部份。 根據上述實施例之半導體元件,本發明之半導體元件 可適於藉由既有的線路連接設備配裝至主印刷電路板上。 由於上述實施例之半導體元件並不包括第一較佳實施例中 的樹脂封裝層,因此此實施例不需要利用特殊的壓塑設備 來製造此半導體元件。 本發明並不侷限於上述該等較佳實施例,任何在不偏 離本發明之範圍内的變化與修改均屬本發明之範疇。 此外,本發明係基於1999年2月23曰提申之日本優先 權申請案第11-044,919號,其中所有的内容在此列為參考 — — — — — —-------裝 -----— 丨訂--------線— (請先閱讀背面之注意事項再填寫本頁) 用 適 度 K 張 纸 _冬 經濟部智慧財產局員工消費合作社印製 21 /\ 格 規 A4 s) N (c 準 標 家 國 國 釐 1公 7 29 26 經濟部智慧財4"工消費合^-^ds A7 B7 五、發明說明(24) 元件標號對照 10, 20, 102,1100…半導體元件 11,31, 41,51,61, 1101 …基材 12, 32, 42, 62. 1102··,内部線路圖樣 13, 33, 43, 63, 77, 87,97, 1 103…介層 14, 34, 44, 64, 1104···保護層 ) 15, 35, 45, 65, 75, 85, 95, 105 1105…外部線路圖樣 16, 36, 46, 66, 96, 1 106…伸出電極 17, 37, 47. 67, 97···封裝層 34a-"PSG/SiN 層 34b…覆蓋層 35a…接觸金屬層 35b…線路基底金屬層 4 0…保護金屬層 48, 58, 86, 94…焊接球 66···引導線 69, 84. 104…連接層 68…膠帶 71. 81. 101···印刷電路板 72. 82. 9卜·第一半導體元件 73. 83. 92…第二半導體元件 74…黏著層 76…塊塾 106···電線 27 -------------裝-------訂---------線 (請先閱讀背面之注意事項再填寫本頁)

Claims (1)

  1. A8B8C8D8 六 經濟部智慧財產局員工消費合作社印製 4442 9 8 申請專利範圍 I". 1 _ 一種半導體: 一半導體全' ' —電子電路提供於該基材中,該電子電路具有終 端; 内部線路圖樣’其提供於該基材中,該内部線 路圖樣與該電子電路終端連接; 一保護層,其提供於基材上,該保護層覆蓋該基 材; 介層提供於該基材上,且自保護層令伸出,該介 層與内部線路圖樣在基材上的任意位置相連接; 一外部線路圖樣’其與介層連接,該外部線路圖 樣連接至該介層; 伸出電極提供於該外部線路圖樣上,該伸出電極 遠外部線路圊樣連接以在該伸出電極與該電子電路終 端建立連接,該伸出電極具有一預定高於該外部線路 囷樣之高度;及 一樹脂材料封裝層’其係提供於保護層上,該封 裝層覆蓋該伸出電極的側邊及外部線路圖樣的外表面 Ο 2·如申請專利範圍第丨項之半導體元件,其特徵在於該半 導體元件更包括焊接球提供於該伸出電極上,該等焊 接球經由該伸出電極連接至該外部線路圖樣上。 3-如申請專利範圍第丨項之半導體元件,其特徵在於該封 裝層包括一第一側邊表面且該基材包括一第二側邊 本紙張尺度適用申國國家標準(CNS)A4規格(210 X 297公釐) --—HI, I I I Γ ---·1111111 · I I I--— II (铢先|»讀,背面之注意事項再起寫本頁) 28 翼08 六、申請專利範圍 面’该第一側邊表面及第二側邊表面形成一因切割鑛 切割而產生的共同平面。 ' (請先閲讀背面之注意事項再填寫本頁) 4. 如申請專利範圍第丨項之半導體元件,其特徵在於該提 供於基材中的電子電路包括一輸入電容及一輸出電容 ’該輸入電容具有一輸入終端’而該輸出電容包括一 輸出終端,且該介層1 3與該輸入終端或輸出終端連接 ΰ 5. 如申請專利範圍第丨項之半導體元件,其特徵在於該封 裝層係由一壓塑樹脂製成。 6. 如申請專利範圍第丨項之半導體元件,其特徵在於該外 部線路圖樣以最短的距離連接該介電與該伸出電極。 7·如申請專利範圍第1項之半導體元件,其特徵在於每個 該介層均具有一連接部份,於此該介層經由外部線路 圖樣連接至伸出電極,該介層在該連接部份具有與該 外部線路圖樣或更小的寬度。 8. —種丰導體元^包,括: 一半導體棊材 1 , 一電子電硌於該基材中,該電子電路具有終 經濟部智慧財產局MT工消費合作钍 端: 一内部線路圖樣’其提供於該基材中,該内部線 路圖樣與該電子電路終端連接: 一保護層’其提供於基材上,該保護層覆蓋該基 材; 介層提供於該基材上,並自保護層中伸出,該 本嗛漢这用办國國家標準(CNSM4規格* 297公釐) 29 0^88^ ABCS 4442 9 8 六、申請專利範圍 層與内部線路圖樣在基材上的任意位置相連接; 一外部線路圖樣’其與介層連接,該外部線路圖 樣連接至該介層; 引導線其與外部線路圖樣連接,該引導線以一膠 帶支撺;及 一樹脂材料封裝層’其係提供於保護層上,該封 裝層復羞線的部份及外部線路圖樣的外表面。 9. 一種半導體七持一第一半導體元件及_第二半導體 元件,其中導體元件在一個方向之長度上較 小於第一半導趙;^件且藉一黏著劑連接至第一半導雜 元件上, 該第一半導體元件包括: 一第一基材,其具有第一表面及周圍部份在該第 一表面上; 一第一電子電路提供於此基材中,該第_電子電 路具有終端; 塊墊提供於該第一基材的周圍部份,且該塊墊與 該第一電子電路終端相連接,且 該第二半導體元件包括: 一第二基材; 一第二電子電路提供於該第二基材中,且該第二 電子電路具有終端; 一内部線路圖樣提供於該第二基材中,且該内部 線路圖樣連接至該第二電子電路終端; -ί 丨丨 —Γ I 丨,---* 裝---- !訂--1!!-^ {洗先閲讀"·面之注音¥項再4寫衣頁) 經濟部智慧財產局員工消費合作社印製
    30 ;i A8 B8 C8 D8 申請專利範圍 一保護層提供於該第二基材上,且該保護層覆蓋 5玄第二基材; 、 介層提供於該第二基材上且自保護層伸出,該等 介層於該第二基材上之任意位置連接至該内邹線路圖 樣; 一外部線路圖樣提供於該保護層上,且該外部線 路圖樣連接至該等介層以在該外部線路圖樣與該第二 電子電路終端間建立電性連接,且該外部線路圖樣藉 由電線連接至一半導體元件之塊墊。 ίο.—種半導體元^(括一第一半導體元件及一第二半導 體元件,其中:該第二半導體元件在一個方向之長度上 較小於該第一半導體元件且固接至該第一半導體元件 上以使該第一及第二半導體元件之電子電路表面可相 互吻合,而該第一及第二半導體元件藉由焊接球内連 1 每個第一及第二半導體元件包括: 一半導體基材; 一電子電路提供於該基材中,該電子電路具有終 端; 一内部線路圖樣,其提供於該基材令,該内部線 路圖樣與該電子電路終端連接; 一保護層’其提供於基材上,該保護層覆蓋該基 材: 介層提供於該基材上,且自保護層尹伸出,該介 -------------裝---I----^訂---------線 (請先閱讀背面之注意事項再填寫本頁) 31 4442 9 8 六、申請專利範圍 層與内部線路圖樣在基材上的任意位置相連接,及 -外部線路圖樣提供於該#護層±,該外部線路 圖樣連接至該等介層以在該外部線路圖樣與該電子電 路端間建立電性連接,且該外部線路圖樣連接至該 焊接球, Λ 其特徵在於該第一及第二半導體元件之外部線路 圖樣由該焊接球内連。 丨1·如申請專利範圍第10項之半導體元件,其特徵在於該 第一半導體元件包括: 伸出電極提供於該第一半導體元件之外部線路圖 樣上,其中該第二半導體元件未固接該伸出電極連 接至5玄外部線路圖樣,該伸出電極96以一預定高度高 於該外部線路圖樣;及 線 —樹脂材料封裝層提供於該第一半導體元件之保 濩層上,該封裝層覆蓋該第一半導體元件之該伸出電 極的側邊及線路圖樣的外表面。 12.—種半導體括: —半導體Λ 經 濟 部 智 I ί .¾ X 消 广t —電子電路餐供於該基材中,該電子電路具有終 端; 一内部線路圖樣’其提供於該基材中,該内部線 路圖樣與該電子電路終端連接; ~保護層’其提供於基材上,該保護層覆蓋該基 材; 表如〈fiS _ :g S 家標m (CXS)A4 規格(21Q χ 297 公笼) 32 V 8 〇0 008 AKaD 六、申請專利範圍 介層提供於該基材上,且自保護層中伸出’該介 層與内部線路圖樣在基材上的任意位置相連接:及- 一外部線路圖樣提供於該保護層上,且該外部線 路圖樣連接至該等介層以在該外部線路圖樣與該電子 電路終端間建立電性連接,且該外部線路圖樣包括電 線連接部份其藉由連接電線連接至該一主印刷電路板 之塊墊。Ί ' i3. —種半導體包括: 一半導基材; —電子電提供於該基材中,該電子電路具有終 端; 一保護層’其提供於基材上,該保護層復蓋該基 材; 介層提供於該基材上,且自保護層中伸出,該介 層與内部線路圖樣在基材上的任意位置相連接: 一外部線路圖樣提供於保護層上,該外部線路圖 樣位於每個介層之上方,且該外部線路圖樣於該部份 連接至該介層; 伸出電極提供於該外部線路圊樣上,該伸出電極 該外部線路圖樣連接以在該伸出電極與該電子電路終 端建立連接,該伸出電極具有一預定高於該外部線路 圖樣之高度;及 一樹脂材料封裝層,其係提供於保護層上,該封 裝層復蓋該伸出電極的侧邊及外部線路圖樣的外表面 --------^---------‘線 (請先閱讀背面之注意事項再填寫本頁)
    33 A8 B8 C8 D8 六 經濟部智^財4局3、工消迂^咋;£.-!)::、- 44098 申請專利範圍 〇 I4.—種半導體元件的製造方法;'包括以下步驟:: 提供一電子電路於半導體基材中,該電子電路包 括一輸入電容及輸出電容,該輸入電容具有一輸入終 端’該輸出電容具有一輸出終端: 提供一内部線路圖樣於該基材中’該内部線路圖 樣連接至該輸入終端與該輸出終端; 提供一保護層於該基材上,該保護層覆蓋該基材 » 提供介層於該基材上的任意位置,該介層自該保 護層中伸出並與該内部線路圖樣相連接; 提供一外部線路圈樣於保護層上,該外部線路圖 樣與介層連接; 提供伸出電極於該外部線路圖樣上,該伸出電極 與該外部線路圖樣連接以在該伸出電極與該電子電路 終端建立連接,且該伸出電極以一預定高度高於該外 部線路圖樣;及 藉由利用一壓塑方法提供一樹脂材料封裝層於保 護層上’該封裝層覆蓋該伸出電極的側邊及外部線路 圖樣的外表面。 如申請專利範圍第14項$_#,其特徵在於該製造方 法更包括以下的步驟: 提供一晶圓,其上已製$數個半導體元件半成品 ’每個半成品係包括伸出電極及封裝層;及 衣沃張这用*!3囡家標m (CXS)A4規格(21〇 X 297公釐) ------------— -----訂---------線 (請先閱讀背面之注意事項再填寫本頁) 34 六、申請專利範圍 Α8 Β8 C8 D8 切割晶圓成該半導體元件。 16. 如申請專利範圍第14項'法,其特徵在於該製ΪΙ:方 法更包括以下的步驟:在該封裝層形成後進行該伸出 電極之上表面之蝕刻’以便自該伸出電極之上表面除 去一樹脂層。 17. 如申請專利範圍第14項之妹’其特徵在於該製造方 法更包括在該封裝層形該伸出電極之上表面提 供焊接球的步驟。 18. —種半導體元件的製造方法,包括以下步驟: 提供一電子電路於半導體基材中,該電子電路包 括一輸入電容及輸出電容,該輸入電容具有一輸入終 端’該輸出電容具有一輸出終端; 提供一内部線路圖樣於該基材中,該内部線路圖 樣連接至該輸入終端與該輸出終端; 提供一保護層於該基材上,該保護層覆蓋該基材 -----I if----裝-------丨訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智^-时4 33、工消费>^;£.5:..卜:: &供介層於該基材上的任意位置,該介層自該保 護層中伸出並與該内部線路圖樣相連接; 提供一外部線路圖樣於保護層上,該外部線路 樣與介層連接; 提供伸出電極於該外部線路圊樣上,該伸出電 與忒外部線路圖樣連接以在該伸出電極與該電子電路 終端建立連接,且該伸出電極以一預定高度高於該 部線路圖樣: 圖 極 外 35 A8 B8 C8 D8 4442 9 8 六、申請專利範圍 藉由利用-塵塑方法提供一樹脂材料封裝層於保 護層上,該封裝層覆蓋該伸·出電極的侧邊及外部^路 圖樣的外表面:及 連接一測試探針至該伸出電極以測試包含於基材 中的電子電路。 --- - - ----- -- ----1--—訂----— ί· · ί請先閱讀背面之沒意事項再填寫本頁> 經-部智¾財查'¾員工"费合作ίtί',¾ 本纸張义度这用中围囤家標单(C;\S)A·!規格ΟΠΟ X 297公衮) 36
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8368150B2 (en) 2003-03-17 2013-02-05 Megica Corporation High performance IC chip having discrete decoupling capacitors attached to its IC surface
US9024431B2 (en) 2009-10-29 2015-05-05 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor die contact structure and method
US9190348B2 (en) 2012-05-30 2015-11-17 Taiwan Semiconductor Manufacturing Company, Ltd. Scheme for connector site spacing and resulting structures
US9472521B2 (en) 2012-05-30 2016-10-18 Taiwan Semiconductor Manufacturing Company, Ltd. Scheme for connector site spacing and resulting structures

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4505983B2 (ja) * 2000-12-01 2010-07-21 日本電気株式会社 半導体装置
KR100567225B1 (ko) * 2001-07-10 2006-04-04 삼성전자주식회사 칩 패드가 셀 영역 위에 형성된 집적회로 칩과 그 제조방법 및 멀티 칩 패키지
DE10231385B4 (de) * 2001-07-10 2007-02-22 Samsung Electronics Co., Ltd., Suwon Halbleiterchip mit Bondkontaktstellen und zugehörige Mehrchippackung
JP4649792B2 (ja) * 2001-07-19 2011-03-16 日本電気株式会社 半導体装置
JP2003068933A (ja) * 2001-08-23 2003-03-07 Hitachi Maxell Ltd 半導体装置
US6847105B2 (en) 2001-09-21 2005-01-25 Micron Technology, Inc. Bumping technology in stacked die configurations
JP2003100744A (ja) * 2001-09-21 2003-04-04 Ricoh Co Ltd 半導体装置及びその製造方法
JP2003243435A (ja) 2002-02-14 2003-08-29 Hitachi Ltd 半導体集積回路装置の製造方法
JP3825370B2 (ja) * 2002-05-24 2006-09-27 富士通株式会社 半導体装置の製造方法
JP3808030B2 (ja) * 2002-11-28 2006-08-09 沖電気工業株式会社 半導体装置及びその製造方法
JP4150604B2 (ja) * 2003-01-29 2008-09-17 日立マクセル株式会社 半導体装置
DE10313047B3 (de) 2003-03-24 2004-08-12 Infineon Technologies Ag Verfahren zur Herstellung von Chipstapeln
US7109573B2 (en) * 2003-06-10 2006-09-19 Nokia Corporation Thermally enhanced component substrate
US7205649B2 (en) * 2003-06-30 2007-04-17 Intel Corporation Ball grid array copper balancing
US7071421B2 (en) * 2003-08-29 2006-07-04 Micron Technology, Inc. Stacked microfeature devices and associated methods
JP3757971B2 (ja) * 2003-10-15 2006-03-22 カシオ計算機株式会社 半導体装置の製造方法
JP4377269B2 (ja) * 2004-03-19 2009-12-02 Necエレクトロニクス株式会社 半導体装置
JP4747508B2 (ja) * 2004-04-21 2011-08-17 カシオ計算機株式会社 半導体装置
US7700409B2 (en) * 2004-05-24 2010-04-20 Honeywell International Inc. Method and system for stacking integrated circuits
US7863720B2 (en) * 2004-05-24 2011-01-04 Honeywell International Inc. Method and system for stacking integrated circuits
JP2006005101A (ja) * 2004-06-16 2006-01-05 Rohm Co Ltd 半導体装置
KR100632257B1 (ko) * 2004-11-09 2006-10-11 삼성전자주식회사 액정 디스플레이 구동용 탭 패키지의 배선 패턴 구조
US20080123335A1 (en) * 2006-11-08 2008-05-29 Jong Kun Yoo Printed circuit board assembly and display having the same
US8861214B1 (en) * 2006-11-22 2014-10-14 Marvell International Ltd. High resistivity substrate for integrated passive device (IPD) applications
US20080203581A1 (en) * 2007-02-27 2008-08-28 Qimonda Ag Integrated circuit
JP4398989B2 (ja) 2007-03-26 2010-01-13 株式会社東芝 三次元集積回路設計方法及び三次元集積回路設計装置
WO2009013826A1 (ja) * 2007-07-25 2009-01-29 Fujitsu Microelectronics Limited 半導体装置
JP4317245B2 (ja) * 2007-09-27 2009-08-19 新光電気工業株式会社 電子装置及びその製造方法
JP2010199148A (ja) * 2009-02-23 2010-09-09 Fujikura Ltd 半導体センサデバイス及びその製造方法、パッケージ及びその製造方法、モジュール及びその製造方法、並びに電子機器
JP5170134B2 (ja) * 2010-03-16 2013-03-27 日本電気株式会社 半導体装置及びその製造方法
WO2012111397A1 (ja) * 2011-02-17 2012-08-23 富士電機株式会社 半導体装置の内部配線構造
JP2013110264A (ja) * 2011-11-21 2013-06-06 Fujitsu Semiconductor Ltd 半導体装置及び半導体装置の製造方法
JP2012129570A (ja) * 2012-04-03 2012-07-05 Megica Corp チップの製造方法
US8878353B2 (en) * 2012-12-20 2014-11-04 Invensas Corporation Structure for microelectronic packaging with bond elements to encapsulation surface
KR102511543B1 (ko) * 2018-03-09 2023-03-17 삼성디스플레이 주식회사 표시 장치
CN109860125A (zh) * 2018-12-29 2019-06-07 华进半导体封装先导技术研发中心有限公司 芯片封装结构和封装方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5510758A (en) * 1993-04-07 1996-04-23 Matsushita Electric Industrial Co., Ltd. Multilayer microstrip wiring board with a semiconductor device mounted thereon via bumps
US5391914A (en) * 1994-03-16 1995-02-21 The United States Of America As Represented By The Secretary Of The Navy Diamond multilayer multichip module substrate
JPH07302858A (ja) * 1994-04-28 1995-11-14 Toshiba Corp 半導体パッケージ
JP2780649B2 (ja) * 1994-09-30 1998-07-30 日本電気株式会社 半導体装置
US5883429A (en) * 1995-04-25 1999-03-16 Siemens Aktiengesellschaft Chip cover
JP3726318B2 (ja) * 1995-08-22 2005-12-14 株式会社日立製作所 チップ サイズ パッケージとその製造方法及びセカンド レヴェル パッケージング
KR0163871B1 (ko) * 1995-11-25 1998-12-01 김광호 하부에 히트 싱크가 부착된 솔더 볼 어레이 패키지
JPH09172036A (ja) * 1995-12-19 1997-06-30 Toshiba Corp 半導体パッケージ装置の製造方法
US5952709A (en) * 1995-12-28 1999-09-14 Kyocera Corporation High-frequency semiconductor device and mounted structure thereof
WO1997037374A2 (en) * 1996-03-26 1997-10-09 Advanced Micro Devices, Inc. Method of packaging multiple integrated circuit chips in a standard semiconductor device package
JPH09326465A (ja) * 1996-06-06 1997-12-16 Matsushita Electric Ind Co Ltd 半導体装置及びその製造方法
KR100469516B1 (ko) * 1996-07-12 2005-02-02 후지쯔 가부시끼가이샤 반도체 장치의 제조 방법 및 반도체 장치
DE19754372A1 (de) 1997-03-10 1998-09-24 Fraunhofer Ges Forschung Chipanordnung und Verfahren zur Herstellung einer Chipanordnung
US5808873A (en) * 1997-05-30 1998-09-15 Motorola, Inc. Electronic component assembly having an encapsulation material and method of forming the same
JP3509507B2 (ja) * 1997-11-10 2004-03-22 松下電器産業株式会社 バンプ付電子部品の実装構造および実装方法

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8368150B2 (en) 2003-03-17 2013-02-05 Megica Corporation High performance IC chip having discrete decoupling capacitors attached to its IC surface
US9024431B2 (en) 2009-10-29 2015-05-05 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor die contact structure and method
US9536811B2 (en) 2009-10-29 2017-01-03 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor die contact structure and method
US10163785B2 (en) 2009-10-29 2018-12-25 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor die contact structure and method
US10847459B2 (en) 2009-10-29 2020-11-24 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor die contact structure and method
US11515272B2 (en) 2009-10-29 2022-11-29 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor die contact structure and method
US12074127B2 (en) 2009-10-29 2024-08-27 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor die contact structure and method
US9190348B2 (en) 2012-05-30 2015-11-17 Taiwan Semiconductor Manufacturing Company, Ltd. Scheme for connector site spacing and resulting structures
US9472521B2 (en) 2012-05-30 2016-10-18 Taiwan Semiconductor Manufacturing Company, Ltd. Scheme for connector site spacing and resulting structures
US9484317B2 (en) 2012-05-30 2016-11-01 Taiwan Semiconductor Manufacturing Company, Ltd. Scheme for connector site spacing and resulting structures
US10504856B2 (en) 2012-05-30 2019-12-10 Taiwan Semiconductor Manufacturing Company, Ltd. Scheme for connector site spacing and resulting structures
US10985114B2 (en) 2012-05-30 2021-04-20 Taiwan Semiconductor Manufacturing Company, Ltd. Scheme for connector site spacing and resulting structures

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KR20000071326A (ko) 2000-11-25
EP1032041A3 (en) 2002-09-04

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