TW424073B - Apparatus and method for transporting substrates - Google Patents
Apparatus and method for transporting substrates Download PDFInfo
- Publication number
- TW424073B TW424073B TW087118241A TW87118241A TW424073B TW 424073 B TW424073 B TW 424073B TW 087118241 A TW087118241 A TW 087118241A TW 87118241 A TW87118241 A TW 87118241A TW 424073 B TW424073 B TW 424073B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- complete
- robot
- wait
- load lock
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G65/00—Loading or unloading
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
- H10P72/0466—Apparatus for manufacturing or treating in a plurality of work-stations characterised by the construction of the load-lock chamber
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
- H10P72/3304—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber characterised by movements or sequence of movements of transfer devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Warehouses Or Storage Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US6703697P | 1997-12-01 | 1997-12-01 | |
| US09/089,752 US6257827B1 (en) | 1997-12-01 | 1998-06-02 | Apparatus and method for transporting substrates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW424073B true TW424073B (en) | 2001-03-01 |
Family
ID=26747423
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW087118241A TW424073B (en) | 1997-12-01 | 1998-11-03 | Apparatus and method for transporting substrates |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6257827B1 (https=) |
| EP (1) | EP1051342A1 (https=) |
| JP (2) | JP5046435B2 (https=) |
| KR (1) | KR20010032641A (https=) |
| AU (1) | AU1109599A (https=) |
| TW (1) | TW424073B (https=) |
| WO (1) | WO1999028222A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI786329B (zh) * | 2018-09-18 | 2022-12-11 | 美商應用材料股份有限公司 | 電腦可讀媒體、處理多個基板的方法及用於處理多個基板的系統 |
Families Citing this family (48)
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| JPH0936198A (ja) * | 1995-07-19 | 1997-02-07 | Hitachi Ltd | 真空処理装置およびそれを用いた半導体製造ライン |
| JPH11204411A (ja) * | 1998-01-19 | 1999-07-30 | Nikon Corp | 塗布現像露光装置 |
| WO2000028587A1 (en) * | 1998-11-09 | 2000-05-18 | Tokyo Electron Limited | Processing device |
| TW442891B (en) * | 1998-11-17 | 2001-06-23 | Tokyo Electron Ltd | Vacuum processing system |
| US6322312B1 (en) | 1999-03-18 | 2001-11-27 | Applied Materials, Inc. | Mechanical gripper for wafer handling robots |
| JP4248695B2 (ja) * | 1999-07-26 | 2009-04-02 | 東京エレクトロン株式会社 | ウェハ移載装置の緊急停止装置 |
| US7374644B2 (en) | 2000-02-17 | 2008-05-20 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
| US6379095B1 (en) * | 2000-04-14 | 2002-04-30 | Applied Materials, Inc. | Robot for handling semiconductor wafers |
| US6582175B2 (en) | 2000-04-14 | 2003-06-24 | Applied Materials, Inc. | Robot for handling semiconductor wafers |
| EP1174910A3 (en) * | 2000-07-20 | 2010-01-06 | Applied Materials, Inc. | Method and apparatus for dechucking a substrate |
| US6578893B2 (en) | 2000-10-02 | 2003-06-17 | Ajs Automation, Inc. | Apparatus and methods for handling semiconductor wafers |
| US6451118B1 (en) * | 2000-11-14 | 2002-09-17 | Anon, Inc. | Cluster tool architecture for sulfur trioxide processing |
| US6852194B2 (en) * | 2001-05-21 | 2005-02-08 | Tokyo Electron Limited | Processing apparatus, transferring apparatus and transferring method |
| US6528767B2 (en) | 2001-05-22 | 2003-03-04 | Applied Materials, Inc. | Pre-heating and load lock pedestal material for high temperature CVD liquid crystal and flat panel display applications |
| JP4821074B2 (ja) * | 2001-08-31 | 2011-11-24 | 東京エレクトロン株式会社 | 処理システム |
| US6634686B2 (en) | 2001-10-03 | 2003-10-21 | Applied Materials, Inc. | End effector assembly |
| US6835039B2 (en) * | 2002-03-15 | 2004-12-28 | Asm International N.V. | Method and apparatus for batch processing of wafers in a furnace |
| WO2004001817A1 (en) * | 2002-06-21 | 2003-12-31 | Applied Materials, Inc. | Transfer chamber for vacuum processing system |
| US7204669B2 (en) | 2002-07-17 | 2007-04-17 | Applied Materials, Inc. | Semiconductor substrate damage protection system |
| US6696367B1 (en) * | 2002-09-27 | 2004-02-24 | Asm America, Inc. | System for the improved handling of wafers within a process tool |
| US20040096636A1 (en) * | 2002-11-18 | 2004-05-20 | Applied Materials, Inc. | Lifting glass substrate without center lift pins |
| US6852644B2 (en) * | 2002-11-25 | 2005-02-08 | The Boc Group, Inc. | Atmospheric robot handling equipment |
| US7641247B2 (en) * | 2002-12-17 | 2010-01-05 | Applied Materials, Inc. | End effector assembly for supporting a substrate |
| US6917755B2 (en) * | 2003-02-27 | 2005-07-12 | Applied Materials, Inc. | Substrate support |
| US20040226513A1 (en) * | 2003-05-12 | 2004-11-18 | Applied Materials, Inc. | Chamber for uniform heating of large area substrates |
| US20070269297A1 (en) | 2003-11-10 | 2007-11-22 | Meulen Peter V D | Semiconductor wafer handling and transport |
| US7458763B2 (en) * | 2003-11-10 | 2008-12-02 | Blueshift Technologies, Inc. | Mid-entry load lock for semiconductor handling system |
| KR100578134B1 (ko) * | 2003-11-10 | 2006-05-10 | 삼성전자주식회사 | 멀티 챔버 시스템 |
| US10086511B2 (en) | 2003-11-10 | 2018-10-02 | Brooks Automation, Inc. | Semiconductor manufacturing systems |
| US20050223837A1 (en) | 2003-11-10 | 2005-10-13 | Blueshift Technologies, Inc. | Methods and systems for driving robotic components of a semiconductor handling system |
| US8033245B2 (en) * | 2004-02-12 | 2011-10-11 | Applied Materials, Inc. | Substrate support bushing |
| JP4128973B2 (ja) * | 2004-03-30 | 2008-07-30 | 株式会社日立ハイテクノロジーズ | 真空処理装置及び真空処理方法 |
| US20060201074A1 (en) * | 2004-06-02 | 2006-09-14 | Shinichi Kurita | Electronic device manufacturing chamber and methods of forming the same |
| US7784164B2 (en) * | 2004-06-02 | 2010-08-31 | Applied Materials, Inc. | Electronic device manufacturing chamber method |
| CN103199039B (zh) * | 2004-06-02 | 2016-01-13 | 应用材料公司 | 电子装置制造室及其形成方法 |
| US20060005770A1 (en) * | 2004-07-09 | 2006-01-12 | Robin Tiner | Independently moving substrate supports |
| KR100805397B1 (ko) * | 2004-08-17 | 2008-02-20 | 맷슨 테크놀로지, 인크. | 웨이퍼 가공 장치 및 그 구성 방법 |
| US7699021B2 (en) | 2004-12-22 | 2010-04-20 | Sokudo Co., Ltd. | Cluster tool substrate throughput optimization |
| US20060130767A1 (en) * | 2004-12-22 | 2006-06-22 | Applied Materials, Inc. | Purged vacuum chuck with proximity pins |
| US7798764B2 (en) | 2005-12-22 | 2010-09-21 | Applied Materials, Inc. | Substrate processing sequence in a cartesian robot cluster tool |
| WO2007047163A2 (en) * | 2005-10-04 | 2007-04-26 | Applied Materials, Inc. | Methods and apparatus for drying a substrate |
| US20080308884A1 (en) * | 2005-10-13 | 2008-12-18 | Silex Microsystems Ab | Fabrication of Inlet and Outlet Connections for Microfluidic Chips |
| KR100781082B1 (ko) * | 2005-12-03 | 2007-11-30 | 주식회사 뉴파워 프라즈마 | 기판 반송 장치 및 그것을 사용한 기판 처리 설비 |
| US9117859B2 (en) * | 2006-08-31 | 2015-08-25 | Brooks Automation, Inc. | Compact processing apparatus |
| JP4746003B2 (ja) * | 2007-05-07 | 2011-08-10 | リンテック株式会社 | 移載装置及び移載方法 |
| JP5253933B2 (ja) * | 2008-09-04 | 2013-07-31 | 東京エレクトロン株式会社 | 成膜装置、基板処理装置、成膜方法及び記憶媒体 |
| CN103917466B (zh) * | 2011-09-14 | 2019-01-04 | 布鲁克斯自动化公司 | 装载工位 |
| US9673071B2 (en) * | 2014-10-23 | 2017-06-06 | Lam Research Corporation | Buffer station for thermal control of semiconductor substrates transferred therethrough and method of transferring semiconductor substrates |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4801241A (en) * | 1984-03-09 | 1989-01-31 | Tegal Corporation | Modular article processing machine and method of article handling therein |
| JPS6218037A (ja) * | 1985-07-17 | 1987-01-27 | Wakomu:Kk | パススル−ル−ム |
| US4915564A (en) * | 1986-04-04 | 1990-04-10 | Materials Research Corporation | Method and apparatus for handling and processing wafer-like materials |
| US4836733A (en) * | 1986-04-28 | 1989-06-06 | Varian Associates, Inc. | Wafer transfer system |
| KR100309932B1 (ko) * | 1986-04-28 | 2001-12-15 | 제임스 엠. 윌리암스 | 웨이퍼 운반 장치 및 방법 |
| US4851101A (en) * | 1987-09-18 | 1989-07-25 | Varian Associates, Inc. | Sputter module for modular wafer processing machine |
| US5310410A (en) * | 1990-04-06 | 1994-05-10 | Sputtered Films, Inc. | Method for processing semi-conductor wafers in a multiple vacuum and non-vacuum chamber apparatus |
| US5399531A (en) * | 1990-12-17 | 1995-03-21 | United Micrpelectronics Corporation | Single semiconductor wafer transfer method and plural processing station manufacturing system |
| JP3238432B2 (ja) * | 1991-08-27 | 2001-12-17 | 東芝機械株式会社 | マルチチャンバ型枚葉処理装置 |
| JP2867194B2 (ja) * | 1992-02-05 | 1999-03-08 | 東京エレクトロン株式会社 | 処理装置及び処理方法 |
| JP3139155B2 (ja) * | 1992-07-29 | 2001-02-26 | 東京エレクトロン株式会社 | 真空処理装置 |
| JP3005373B2 (ja) * | 1992-10-23 | 2000-01-31 | 東京エレクトロン株式会社 | 処理装置 |
| KR100261532B1 (ko) * | 1993-03-14 | 2000-07-15 | 야마시타 히데나리 | 피처리체 반송장치를 가지는 멀티챔버 시스템 |
| JP3522796B2 (ja) * | 1993-07-15 | 2004-04-26 | 株式会社日立国際電気 | 半導体製造装置 |
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| JP3181455B2 (ja) * | 1993-11-20 | 2001-07-03 | 東京エレクトロン株式会社 | 搬送アーム装置及びこれを用いた処理室集合装置 |
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| JPH098094A (ja) * | 1995-06-21 | 1997-01-10 | Shibaura Eng Works Co Ltd | 真空処理装置 |
| TW309503B (https=) * | 1995-06-27 | 1997-07-01 | Tokyo Electron Co Ltd | |
| JPH09115985A (ja) * | 1995-10-24 | 1997-05-02 | Toshiba Mach Co Ltd | ウエハトランスファチャンバ及びウエハの予熱方法 |
| JP2857097B2 (ja) * | 1996-03-29 | 1999-02-10 | 芝浦メカトロニクス株式会社 | 真空処理装置 |
| US5863170A (en) * | 1996-04-16 | 1999-01-26 | Gasonics International | Modular process system |
| US5975740A (en) * | 1996-05-28 | 1999-11-02 | Applied Materials, Inc. | Apparatus, method and medium for enhancing the throughput of a wafer processing facility using a multi-slot cool down chamber and a priority transfer scheme |
| US5900105A (en) * | 1996-07-09 | 1999-05-04 | Gamma Precision Technology, Inc. | Wafer transfer system and method of using the same |
| JP3632812B2 (ja) * | 1997-10-24 | 2005-03-23 | シャープ株式会社 | 基板搬送移載装置 |
-
1998
- 1998-06-02 US US09/089,752 patent/US6257827B1/en not_active Expired - Lifetime
- 1998-10-21 EP EP98953820A patent/EP1051342A1/en not_active Withdrawn
- 1998-10-21 AU AU11095/99A patent/AU1109599A/en not_active Abandoned
- 1998-10-21 WO PCT/US1998/022240 patent/WO1999028222A1/en not_active Ceased
- 1998-10-21 JP JP2000523138A patent/JP5046435B2/ja not_active Expired - Lifetime
- 1998-10-21 KR KR1020007005919A patent/KR20010032641A/ko not_active Withdrawn
- 1998-11-03 TW TW087118241A patent/TW424073B/zh not_active IP Right Cessation
-
2010
- 2010-10-29 JP JP2010244420A patent/JP5543318B2/ja not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI786329B (zh) * | 2018-09-18 | 2022-12-11 | 美商應用材料股份有限公司 | 電腦可讀媒體、處理多個基板的方法及用於處理多個基板的系統 |
| TWI798148B (zh) * | 2018-09-18 | 2023-04-01 | 美商應用材料股份有限公司 | 電腦可讀媒體、處理多個基板的方法及用於處理多個基板的系統 |
| TWI815776B (zh) * | 2018-09-18 | 2023-09-11 | 美商應用材料股份有限公司 | 電腦可讀媒體、處理多個基板的方法及用於處理多個基板的系統 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5046435B2 (ja) | 2012-10-10 |
| US6257827B1 (en) | 2001-07-10 |
| AU1109599A (en) | 1999-06-16 |
| EP1051342A1 (en) | 2000-11-15 |
| JP5543318B2 (ja) | 2014-07-09 |
| JP2001524763A (ja) | 2001-12-04 |
| KR20010032641A (ko) | 2001-04-25 |
| JP2011049585A (ja) | 2011-03-10 |
| WO1999028222A1 (en) | 1999-06-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GD4A | Issue of patent certificate for granted invention patent | ||
| MM4A | Annulment or lapse of patent due to non-payment of fees |