TW417262B - Semiconductor device of molding in ball grid array - Google Patents
Semiconductor device of molding in ball grid array Download PDFInfo
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- TW417262B TW417262B TW87117807A TW87117807A TW417262B TW 417262 B TW417262 B TW 417262B TW 87117807 A TW87117807 A TW 87117807A TW 87117807 A TW87117807 A TW 87117807A TW 417262 B TW417262 B TW 417262B
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Description
417262 五、發明說明(1) 本發明是有關 array ; 3BGA)式半 式半導體裝置之方 的連接排列方式。 習知一種模具 1 B圖所示,其結構 料1 0,然後,再黏 壓縮鍵結法焊在晶 封。第1A圖顯示的 而第1B圖顯示的則 此外,曰本專 8-204062(1996)說 體裝置,其中焊料 脂表面上。 於一種換具球柵陣列(ball grid 導體裝置、’及_種製造此模具球柵陣列 GA代表主要基底表面之球狀焊料 ,,陣列式半導體裝置,如第1A圖和第 是藉由沾黏一種稱為橡膠之緩衝彈性材 附於晶片1表面。銅導線1 2則是利用熱 片1之焊墊2上。最後,再以密封劑1 3密 是一種峰沈積於晶片1中心的狀態, 走矣•壤^'。 * 利申請公開號3-9 4438( 1 991 )和 明書中揭示了數種模具球栅陣列式半導 球是位在充填於半導體晶片前表面的樹 在另一例子中’日本專利申請公開號3_94438( 1 99 1 ) 揭示一種如第2A圖所示之半導體裝置。如第2A圖和第2B圖 所示之剖面圖’其顯示在形成焊料球前之半導體裝置,而 第2B圖所顯示的則是形成焊料球後的半導體裝置剖面圖。 如第2A圖所示’形成一與預備放置半導體晶片1於其 上的晶片墊14連接的虛擬的支撐物15,其次以導線5(金屬 細導線)連接半導體晶片焊墊2以及虛擬的支撐物1 5,然後 再以樹脂密封整個薄膜。如第2B圖所示,在以樹脂密封 後,第2A圖中的線段B-B’和C-C’之外側部份將必須切離, 留下部份半導體晶片1。然後,留下部份的表面和導線5必
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^jl7262^^ 87Π7807 及、發明說明(3) 焊料球,設置在該洞内、 導辦^發明之另一特徵是揭示一種製造模具球柵陣列弋皁 導體裝置之製造方法,其步驟包括: 哗歹】式. 形成一絕緣細膜於一半導體晶片表面除焊墊外之至,丨、 〜部份; 乂 利用導線將該焊墊、該導電層焊結合在一起,且該導 線〜鍵結是位在該導電層上; 利用樹脂密封該半導體晶片; 施一打孔步驟,以形成一個貫穿該密封樹脂且露出部 份導線鍵結於該導電層上之金屬細導線的孔;以及 在該孔内設置一焊料。 為使本發明之優點和特徵更清楚可見’茲將以根據本 發明之較佳實施例,配合相關圖式,詳細說明如下。 第1Α圖顯示的是一種習知中央焊墊結構的模具球栅陣 列式半導體裝置之剖面圖; 第1B圖顯示的是一種習知周邊焊墊結構的球柵陣列式 半導體裝置之剖面圖; 第2A圖和第2B圖顯示的是另一種習知的球柵陣列式半 導體裝置之剖面圖,及其製造流程; 第3A圖和第3B圖顯示的分別是根據本發明之一較佳實 施例的模具球栅陣列式半導體裝置之平面圖和剖面圖;以 及 4A〜4F圖顯示的是根據本發明之一較佳實施例的以 具球柵陣列式半導體裝置之剖面流程圖。
417262 案號871 Π; im- 卜?月7 _Β 曰 修正 五 '發明說明(4) 實施例: 首先’請參照第3 A圖7責顯示的是一種根據本發明之 模具球柵阵列式半導體裝置平面圖,而第3B圖顯示的則是 第3 A圖的剖面圖。 如第3A圖和第3B圖所示,利用氣相沈積一細片 狀金屬屠4 ’例如銘層’於晶片!表面之聚醯並藉由 導線5(金屬細導線)與焊墊2 此外,形成一反^狀的 導線於細板狀的金屬層4上。春脂7密封後,經由樹脂 7的打孔處理’使焊料球6與裸露的反u狀的導線5鍵結。 其次,關於上述模具球柵陣列式半導體裝置的製造方 法將於第4A〜4F圖詳細描述。 面, 首先,請參照第4A圖,形成 然後再利用氣相沉積法形成 一聚醯胺層3於晶片1表 預備負載焊料球6之銘層 其次,如第4B圖所示’以導線5進行拉線程序 J ’ 外狂吁,連接 焊墊2和鋁層4。其中,焊墊2之位置是決定於晶片丨之電 路。因此’可經由導線5連接焊料球6所在的位置 然後’請參照第4C圖,導線連結是導通在紹層 此外’如第4D圖所示’以樹脂7進行密封程 後,如第4E圖所示,以雷射光8進行打洞步驟二二价 出部份於第4C圖所形成的導線5之烊料玻Q I成一路 q J么札y , | i 4丨田愈 射進行打洞的過程中,並不會傷害到導線。最,丹才j 圖所示,將焊料球6置於焊料球孔9内。 後’如第 本發明之優點:
第7頁 五、發明說明(5) |的年々月7曰 如上所述,、在本
月 Θ
J^-iL 由於導電層是形成於 曲片表 因此 面之絕緣樹脂上,故可降低導線連接時 於曰1 可降低半導體元件之成本。此外’焊 =化費,因此 可被簡易地導通。 屬、,田導線也 雖然本發明已以較佳實施例揭露如上,然其並 限定本發明,任何熟習此技藝者,在不 欲 你个脱離本發明之精神 和範圍内,所作之各種更動與潤飾均落在本發明之範圍 内,因此本發明之專利保護範圍當視後附之申請專利範圍 所界定者為準。
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Claims (1)
- 417262 盡號 87117807 修正本 六、申請專利範圍 1. 一種模具球柵陣列式半導體裝置,豆 半導體晶片,其包括有形成於半導體晶片表面除一焊 墊外之至少一部份之絕緣樹脂細膜; ’、 導電層,形成於該絕緣樹脂細膜上的一個區域,該區 域包括至少部份對應於一焊料球所在的位置; 第一金屬細導線,線鍵結該燁墊和該導電層; 第二金屬細導線’被線鍵結在該導電層上; 樹脂,部份密封該導電晶片,且包括有一露出部分該 第二金屬細導線之洞;以及 焊料球,設置在該洞内。 2. 如申請專利範圍第1項所述之模具球柵陣列式半導 體裝置’其中該絕緣樹脂細膜是聚醯胺細膜。 3. 如申請專利範圍第3項所述之模具球柵陣列式半導 體裝置,其中該導電層為鋁層。 4-如申請專利範圍第2項所述之模具球柵陣列式半導 體裝置,其中該導電層為鋁層。 5.—種製造模具球栅陣列式半導體裝置之製造方法, 其步驟包括: 形成一絕緣細膜於一半導體晶片表面除焊墊外之至少 一部份; 利用導線將該焊墊、該導電層焊結合在一起,且該導 線-鍵結是位在該導電層上; 利用樹脂密封該半導體晶片; 施一打孔步驟,以形成一個貫穿該密封樹脂且露出部第9頁
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29530597A JP2978861B2 (ja) | 1997-10-28 | 1997-10-28 | モールドbga型半導体装置及びその製造方法 |
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TW417262B true TW417262B (en) | 2001-01-01 |
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Application Number | Title | Priority Date | Filing Date |
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TW87117807A TW417262B (en) | 1997-10-28 | 1998-10-27 | Semiconductor device of molding in ball grid array |
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US (1) | US6218728B1 (zh) |
JP (1) | JP2978861B2 (zh) |
KR (1) | KR100304681B1 (zh) |
CN (1) | CN1215921A (zh) |
TW (1) | TW417262B (zh) |
Families Citing this family (79)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2990128B2 (ja) * | 1997-10-16 | 1999-12-13 | 九州日本電気株式会社 | 半導体装置内部接続用被覆金属細線 |
US6717245B1 (en) | 2000-06-02 | 2004-04-06 | Micron Technology, Inc. | Chip scale packages performed by wafer level processing |
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-
1997
- 1997-10-28 JP JP29530597A patent/JP2978861B2/ja not_active Expired - Fee Related
-
1998
- 1998-10-26 US US09/179,154 patent/US6218728B1/en not_active Expired - Fee Related
- 1998-10-27 KR KR1019980045068A patent/KR100304681B1/ko not_active IP Right Cessation
- 1998-10-27 TW TW87117807A patent/TW417262B/zh not_active IP Right Cessation
- 1998-10-28 CN CN98120497A patent/CN1215921A/zh active Pending
Also Published As
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JPH11135663A (ja) | 1999-05-21 |
KR100304681B1 (ko) | 2001-11-02 |
KR19990037421A (ko) | 1999-05-25 |
CN1215921A (zh) | 1999-05-05 |
JP2978861B2 (ja) | 1999-11-15 |
US6218728B1 (en) | 2001-04-17 |
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