TW201250025A - Deposition device and deposition method - Google Patents
Deposition device and deposition method Download PDFInfo
- Publication number
- TW201250025A TW201250025A TW101107918A TW101107918A TW201250025A TW 201250025 A TW201250025 A TW 201250025A TW 101107918 A TW101107918 A TW 101107918A TW 101107918 A TW101107918 A TW 101107918A TW 201250025 A TW201250025 A TW 201250025A
- Authority
- TW
- Taiwan
- Prior art keywords
- vapor deposition
- mask
- substrate
- evaporation
- opening
- Prior art date
Links
- 238000000151 deposition Methods 0.000 title claims abstract description 23
- 230000008021 deposition Effects 0.000 title claims abstract description 18
- 238000001704 evaporation Methods 0.000 claims abstract description 358
- 230000008020 evaporation Effects 0.000 claims abstract description 287
- 239000000758 substrate Substances 0.000 claims abstract description 245
- 230000033001 locomotion Effects 0.000 claims abstract description 90
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 82
- 238000007740 vapor deposition Methods 0.000 claims description 458
- 239000002245 particle Substances 0.000 claims description 79
- 239000000463 material Substances 0.000 claims description 45
- 238000007747 plating Methods 0.000 claims description 13
- 238000009792 diffusion process Methods 0.000 claims description 11
- 230000000903 blocking effect Effects 0.000 claims description 9
- 238000010025 steaming Methods 0.000 claims description 8
- 238000004140 cleaning Methods 0.000 claims description 7
- 238000000926 separation method Methods 0.000 claims description 6
- 238000011084 recovery Methods 0.000 claims description 5
- 239000011368 organic material Substances 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 1
- 230000005611 electricity Effects 0.000 claims 1
- 230000012447 hatching Effects 0.000 claims 1
- 238000009834 vaporization Methods 0.000 claims 1
- 230000008016 vaporization Effects 0.000 claims 1
- 238000009826 distribution Methods 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000001816 cooling Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000007261 regionalization Effects 0.000 description 4
- 239000002826 coolant Substances 0.000 description 3
- 238000005323 electroforming Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 238000009751 slip forming Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910001374 Invar Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011055872A JP5883230B2 (ja) | 2011-03-14 | 2011-03-14 | 蒸着装置並びに蒸着方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201250025A true TW201250025A (en) | 2012-12-16 |
Family
ID=46830505
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101107918A TW201250025A (en) | 2011-03-14 | 2012-03-08 | Deposition device and deposition method |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5883230B2 (https=) |
| KR (1) | KR101958499B1 (https=) |
| TW (1) | TW201250025A (https=) |
| WO (1) | WO2012124428A1 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014203632A1 (ja) | 2013-06-21 | 2014-12-24 | シャープ株式会社 | 有機エレクトロルミネッセンス素子の製造方法及び有機エレクトロルミネッセンス表示装置 |
| KR102373436B1 (ko) * | 2015-03-30 | 2022-03-14 | 삼성디스플레이 주식회사 | 표시 장치, 표시 장치의 제조장치 및 표시 장치의 제조방법 |
| JP2018003120A (ja) * | 2016-07-05 | 2018-01-11 | キヤノントッキ株式会社 | 蒸着装置及び蒸発源 |
| KR101866956B1 (ko) * | 2016-12-30 | 2018-06-14 | 주식회사 선익시스템 | 선형 증발원용 도가니 및 선형 증발원 |
| JP6570561B2 (ja) * | 2017-02-07 | 2019-09-04 | キヤノン株式会社 | 蒸着装置及び蒸着源 |
| JP6566977B2 (ja) * | 2017-02-07 | 2019-08-28 | キヤノン株式会社 | 蒸着装置及び蒸着源 |
| CN110273133A (zh) * | 2019-07-26 | 2019-09-24 | 西安拉姆达电子科技有限公司 | 一种专用于晶片镀膜的磁控溅射镀膜机 |
| US11659759B2 (en) | 2021-01-06 | 2023-05-23 | Applied Materials, Inc. | Method of making high resolution OLED fabricated with overlapped masks |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9323034D0 (en) * | 1993-11-09 | 1994-01-05 | Gen Vacuum Equip Ltd | Vacuum web coating |
| JPH10319870A (ja) * | 1997-05-15 | 1998-12-04 | Nec Corp | シャドウマスク及びこれを用いたカラー薄膜ｅｌ表示装置の製造方法 |
| JP2004055198A (ja) * | 2002-07-17 | 2004-02-19 | Konica Minolta Holdings Inc | 有機エレクトロルミネッセンス素子を有するディスプレイ装置の製造装置及び製造方法 |
| JP2004103268A (ja) * | 2002-09-05 | 2004-04-02 | Sanyo Electric Co Ltd | 有機ｅｌ表示装置の製造方法 |
| JP4156891B2 (ja) * | 2002-09-20 | 2008-09-24 | 株式会社アルバック | 薄膜形成装置 |
| US20080131587A1 (en) | 2006-11-30 | 2008-06-05 | Boroson Michael L | Depositing organic material onto an oled substrate |
| JP5042195B2 (ja) * | 2008-10-29 | 2012-10-03 | 株式会社日立ハイテクノロジーズ | 蒸着マスクの洗浄装置および洗浄方法 |
| US20100159132A1 (en) * | 2008-12-18 | 2010-06-24 | Veeco Instruments, Inc. | Linear Deposition Source |
| JP5620146B2 (ja) * | 2009-05-22 | 2014-11-05 | 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． | 薄膜蒸着装置 |
| JP5328726B2 (ja) * | 2009-08-25 | 2013-10-30 | 三星ディスプレイ株式會社 | 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法 |
-
2011
- 2011-03-14 JP JP2011055872A patent/JP5883230B2/ja active Active
-
2012
- 2012-02-16 WO PCT/JP2012/053621 patent/WO2012124428A1/ja not_active Ceased
- 2012-02-16 KR KR1020137026765A patent/KR101958499B1/ko active Active
- 2012-03-08 TW TW101107918A patent/TW201250025A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20140044313A (ko) | 2014-04-14 |
| JP5883230B2 (ja) | 2016-03-09 |
| KR101958499B1 (ko) | 2019-03-14 |
| WO2012124428A1 (ja) | 2012-09-20 |
| JP2012193391A (ja) | 2012-10-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW201250025A (en) | Deposition device and deposition method | |
| US20110033621A1 (en) | Thin film deposition apparatus including deposition blade | |
| US8882921B2 (en) | Thin film deposition apparatus | |
| TW201247912A (en) | Deposition apparatus and deposition method | |
| TWI618804B (zh) | 遮罩片及使用其製造有機發光二極體顯示器之方法 | |
| US20120100282A1 (en) | Organic film deposition apparatus and method of manufacturing organic light-emitting display device by using the same | |
| KR101074792B1 (ko) | 박막 증착 장치 | |
| US20170342541A1 (en) | Mask arrangement for masking a substrate in a processing chamber | |
| JP2012193391A5 (https=) | ||
| US8882920B2 (en) | Thin film deposition apparatus | |
| CN103726030B (zh) | 沉积装置以及使用其的有机发光显示装置的制造方法 | |
| KR20160090988A (ko) | 복수의 모듈을 갖는 증착원 | |
| KR101074793B1 (ko) | 박막 증착 장치 | |
| TW201305372A (zh) | 蒸鍍裝置及蒸鍍方法 | |
| CN211665166U (zh) | 一种oled蒸镀坩埚 | |
| CN110129724B (zh) | 掩膜板组件及其制备方法 | |
| US20150021166A1 (en) | Sputtering apparatus and method | |
| JP5745895B2 (ja) | 蒸着装置並びに蒸着方法 | |
| TW201425608A (zh) | 蒸鍍裝置及蒸鍍方法 | |
| CN111378933A (zh) | 蒸发源、蒸发源系统 | |
| JP2012197467A5 (https=) | ||
| KR101268672B1 (ko) | 직립장식 증착장치 | |
| KR100695236B1 (ko) | 유기 발광 디스플레이 소자 제조 장치 및 제조 방법 | |
| KR20190136695A (ko) | 유기 발광 소자의 스캔 타입 인라인 제조 시스템 | |
| KR20150075917A (ko) | 증착장치용 증발원 |