JP2018003120A - 蒸着装置及び蒸発源 - Google Patents
蒸着装置及び蒸発源 Download PDFInfo
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- JP2018003120A JP2018003120A JP2016133683A JP2016133683A JP2018003120A JP 2018003120 A JP2018003120 A JP 2018003120A JP 2016133683 A JP2016133683 A JP 2016133683A JP 2016133683 A JP2016133683 A JP 2016133683A JP 2018003120 A JP2018003120 A JP 2018003120A
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- evaporation
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- vapor deposition
- evaporation source
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/225—Oblique incidence of vaporised material on substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
2 蒸発口部
Claims (13)
- 成膜材料が収容される容器と、前記容器に設けられた蒸発口部とを有する蒸発源と、前記蒸発源と前記蒸発源に対向する位置に配設される基板とを前記蒸発源の長手方向と直交する方向に相対的に移動させる相対移動機構とを備え、前記蒸発口部から前記成膜材料を放出することで、基板上に蒸着膜を形成するように構成した蒸着装置であって、前記蒸発源は、前記蒸発口部が、前記容器の長手方向に沿って複数列設けられており、少なくとも一対の前記蒸発口部が、夫々前記容器の長手方向外側に向くように傾斜する開口端面を有し、前記蒸発口部は夫々、蒸発口部の開口中心を通る前記基板の相対移動方向に沿う線上に他の蒸発口部の開口中心が重ならないように配列されていることを特徴とする蒸着装置。
- 前記容器の前記蒸発口部は千鳥状に配列されていることを特徴とする請求項1に記載の蒸着装置。
- 前記蒸発口部の開口中心を通る前記基板の相対移動方向に沿う線上に他の蒸発口部の開口端面が重ならないように配列されていることを特徴とする請求項1,2のいずれか1項に記載の蒸着装置。
- 成膜材料が収容される複数の容器と、前記複数の容器の夫々に設けられた蒸発口部とを有する蒸発源と、前記蒸発源と前記蒸発源に対向する位置に配設される基板とを前記蒸発源の長手方向と直交する方向に相対的に移動させる相対移動機構とを備え、前記蒸発口部から前記成膜材料を放出することで、基板上に蒸着膜を形成するように構成した蒸着装置であって、前記蒸発源は、前記蒸発口部が、前記容器の夫々の長手方向に沿って前記容器の夫々に複数設けられており、前記各容器の少なくとも一対の前記蒸発口部が、夫々前記容器の長手方向外側に向くように傾斜する開口端面を有し、前記蒸発口部は夫々、前記蒸発口部の開口中心を通る前記基板の相対移動方向に沿う線上に他の蒸発口部の開口中心が重ならないように配列されていることを特徴とする蒸着装置。
- 前記各容器の前記蒸発口部は全体として千鳥状に配列されていることを特徴とする請求項4に記載の蒸着装置。
- 前記蒸発口部の開口中心を通る前記基板の相対移動方向に沿う線上に他の蒸発口部の開口端面が重ならないように配列されていることを特徴とする請求項4,5のいずれか1項に記載の蒸着装置。
- 成膜材料が収容される容器と、前記容器に設けられた蒸発口部とを有する蒸発源であって、前記蒸発口部は、前記容器の長手方向に沿って複数列設けられ、少なくとも一対の前記蒸発口部は、夫々前記容器の長手方向外側に向くように傾斜する開口端面を有し、前記蒸発口部は夫々、前記蒸発口部の開口中心を通る前記容器の長手方向と直交する方向に沿う線上に他の蒸発口部の開口中心が重ならないように配列されていることを特徴とする蒸発源。
- 前記容器の前記蒸発口部は千鳥状に配列されていることを特徴とする請求項7に記載の蒸発源。
- 前記蒸発口部の開口中心を通る前記基板の相対移動方向に沿う線上に他の蒸発口部の開口端面が重ならないように配列されていることを特徴とする請求項7,8のいずれか1項に記載の蒸発源。
- 成膜材料が収容される複数の容器と、前記複数の容器の夫々に設けられた蒸発口部とを有する蒸発源であって、前記蒸発口部は、前記容器の夫々の長手方向に沿って前記容器の夫々に複数列設けられており、前記各容器の少なくとも一対の前記蒸発口部は、夫々前記蒸発源の長手方向外側に向くように傾斜する開口端面を有し、前記蒸発口部は夫々、前記蒸発口部の開口中心を通る前記容器の長手方向と直交する方向に沿う線上に他の蒸発口部の開口中心が重ならないように配列されていることを特徴とする蒸発源。
- 前記各容器の前記蒸発口部は全体として千鳥状に配列されていることを特徴とする請求項10に記載の蒸発源。
- 前記蒸発口部の開口中心を通る前記基板の相対移動方向に沿う線上に他の蒸発口部の開口端面が重ならないように配列されていることを特徴とする請求項10,11のいずれか1項に記載の蒸発源。
- 真空槽内に設けられた基板上に蒸着膜を形成する蒸着装置であって、請求項7〜12のいずれか1項に記載の蒸発源が設けられていることを特徴とする蒸着装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016133683A JP2018003120A (ja) | 2016-07-05 | 2016-07-05 | 蒸着装置及び蒸発源 |
CN202110833794.XA CN113463032A (zh) | 2016-07-05 | 2017-07-05 | 蒸镀装置及蒸发源 |
KR1020170085229A KR20180005133A (ko) | 2016-07-05 | 2017-07-05 | 증착 장치 및 증발원 |
CN201710539971.7A CN107574410A (zh) | 2016-07-05 | 2017-07-05 | 蒸镀装置及蒸发源 |
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JP2016133683A JP2018003120A (ja) | 2016-07-05 | 2016-07-05 | 蒸着装置及び蒸発源 |
Related Child Applications (1)
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JP2020109256A Division JP7247142B2 (ja) | 2020-06-25 | 2020-06-25 | 蒸着装置及び蒸発源 |
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JP2018003120A true JP2018003120A (ja) | 2018-01-11 |
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JP2016133683A Pending JP2018003120A (ja) | 2016-07-05 | 2016-07-05 | 蒸着装置及び蒸発源 |
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JP (1) | JP2018003120A (ja) |
KR (1) | KR20180005133A (ja) |
CN (2) | CN107574410A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022002349A1 (en) * | 2020-06-29 | 2022-01-06 | Applied Materials, Inc. | Nozzle assembly, evaporation source, deposition system and method for depositing an evaporated material onto a substrate |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012124512A1 (ja) * | 2011-03-11 | 2012-09-20 | シャープ株式会社 | 蒸着装置、蒸着方法、及び有機el表示装置 |
US20140106482A1 (en) * | 2012-10-12 | 2014-04-17 | Sang-Shin Lee | Depositing apparatus and method for manufacturing organic light emitting diode display using the same |
JP2014201833A (ja) * | 2013-04-01 | 2014-10-27 | 上海和輝光電有限公司Everdisplay Optronics (Shanghai) Limited | 蒸発源アセンブリ |
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KR100623730B1 (ko) * | 2005-03-07 | 2006-09-14 | 삼성에스디아이 주식회사 | 증발원 어셈블리 및 이를 구비한 증착 장치 |
KR100687007B1 (ko) * | 2005-03-22 | 2007-02-26 | 세메스 주식회사 | 유기전계 발광 소자 제조에 사용되는 유기 박박 증착 장치 |
JP5883230B2 (ja) * | 2011-03-14 | 2016-03-09 | キヤノントッキ株式会社 | 蒸着装置並びに蒸着方法 |
KR20120131543A (ko) * | 2011-05-25 | 2012-12-05 | 삼성디스플레이 주식회사 | 유기층 증착 장치, 유기층 증착 장치용 프레임 시트 조립체 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
KR102046440B1 (ko) * | 2012-10-09 | 2019-11-20 | 삼성디스플레이 주식회사 | 증착 장치 및 이를 이용한 유기 발광 표시장치의 제조방법 |
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2016
- 2016-07-05 JP JP2016133683A patent/JP2018003120A/ja active Pending
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2017
- 2017-07-05 KR KR1020170085229A patent/KR20180005133A/ko not_active Application Discontinuation
- 2017-07-05 CN CN201710539971.7A patent/CN107574410A/zh active Pending
- 2017-07-05 CN CN202110833794.XA patent/CN113463032A/zh active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2012124512A1 (ja) * | 2011-03-11 | 2012-09-20 | シャープ株式会社 | 蒸着装置、蒸着方法、及び有機el表示装置 |
US20140106482A1 (en) * | 2012-10-12 | 2014-04-17 | Sang-Shin Lee | Depositing apparatus and method for manufacturing organic light emitting diode display using the same |
JP2014201833A (ja) * | 2013-04-01 | 2014-10-27 | 上海和輝光電有限公司Everdisplay Optronics (Shanghai) Limited | 蒸発源アセンブリ |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022002349A1 (en) * | 2020-06-29 | 2022-01-06 | Applied Materials, Inc. | Nozzle assembly, evaporation source, deposition system and method for depositing an evaporated material onto a substrate |
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Publication number | Publication date |
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KR20180005133A (ko) | 2018-01-15 |
CN113463032A (zh) | 2021-10-01 |
CN107574410A (zh) | 2018-01-12 |
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