KR20180005133A - 증착 장치 및 증발원 - Google Patents
증착 장치 및 증발원 Download PDFInfo
- Publication number
- KR20180005133A KR20180005133A KR1020170085229A KR20170085229A KR20180005133A KR 20180005133 A KR20180005133 A KR 20180005133A KR 1020170085229 A KR1020170085229 A KR 1020170085229A KR 20170085229 A KR20170085229 A KR 20170085229A KR 20180005133 A KR20180005133 A KR 20180005133A
- Authority
- KR
- South Korea
- Prior art keywords
- evaporation
- container
- opening
- longitudinal direction
- evaporation source
- Prior art date
Links
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/225—Oblique incidence of vaporised material on substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2016-133683 | 2016-07-05 | ||
JP2016133683A JP2018003120A (ja) | 2016-07-05 | 2016-07-05 | 蒸着装置及び蒸発源 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20180005133A true KR20180005133A (ko) | 2018-01-15 |
Family
ID=60944854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020170085229A KR20180005133A (ko) | 2016-07-05 | 2017-07-05 | 증착 장치 및 증발원 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2018003120A (ja) |
KR (1) | KR20180005133A (ja) |
CN (2) | CN113463032A (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4172377A1 (en) * | 2020-06-29 | 2023-05-03 | Applied Materials, Inc. | Nozzle assembly, evaporation source, deposition system and method for depositing an evaporated material onto a substrate |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100623730B1 (ko) * | 2005-03-07 | 2006-09-14 | 삼성에스디아이 주식회사 | 증발원 어셈블리 및 이를 구비한 증착 장치 |
KR100687007B1 (ko) * | 2005-03-22 | 2007-02-26 | 세메스 주식회사 | 유기전계 발광 소자 제조에 사용되는 유기 박박 증착 장치 |
US9240572B2 (en) * | 2011-03-11 | 2016-01-19 | Sharp Kabushiki Kaisha | Vapor deposition device, vapor deposition method, and organic EL display device |
JP5883230B2 (ja) * | 2011-03-14 | 2016-03-09 | キヤノントッキ株式会社 | 蒸着装置並びに蒸着方法 |
KR20120131543A (ko) * | 2011-05-25 | 2012-12-05 | 삼성디스플레이 주식회사 | 유기층 증착 장치, 유기층 증착 장치용 프레임 시트 조립체 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
KR102046440B1 (ko) * | 2012-10-09 | 2019-11-20 | 삼성디스플레이 주식회사 | 증착 장치 및 이를 이용한 유기 발광 표시장치의 제조방법 |
KR102046441B1 (ko) * | 2012-10-12 | 2019-11-20 | 삼성디스플레이 주식회사 | 증착 장치 및 이를 이용한 유기 발광 표시장치의 제조방법 |
CN104099571A (zh) * | 2013-04-01 | 2014-10-15 | 上海和辉光电有限公司 | 蒸发源组件和薄膜沉积装置和薄膜沉积方法 |
-
2016
- 2016-07-05 JP JP2016133683A patent/JP2018003120A/ja active Pending
-
2017
- 2017-07-05 CN CN202110833794.XA patent/CN113463032A/zh active Pending
- 2017-07-05 CN CN201710539971.7A patent/CN107574410A/zh active Pending
- 2017-07-05 KR KR1020170085229A patent/KR20180005133A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
CN113463032A (zh) | 2021-10-01 |
CN107574410A (zh) | 2018-01-12 |
JP2018003120A (ja) | 2018-01-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |