JP5883230B2 - 蒸着装置並びに蒸着方法 - Google Patents

蒸着装置並びに蒸着方法 Download PDF

Info

Publication number
JP5883230B2
JP5883230B2 JP2011055872A JP2011055872A JP5883230B2 JP 5883230 B2 JP5883230 B2 JP 5883230B2 JP 2011055872 A JP2011055872 A JP 2011055872A JP 2011055872 A JP2011055872 A JP 2011055872A JP 5883230 B2 JP5883230 B2 JP 5883230B2
Authority
JP
Japan
Prior art keywords
vapor deposition
mask
substrate
evaporation
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2011055872A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012193391A5 (https=
JP2012193391A (ja
Inventor
廣治 鳴海
廣治 鳴海
博之 田村
博之 田村
正浩 市原
正浩 市原
松本　栄一
栄一 松本
三之 田島
三之 田島
永田　博彰
博彰 永田
吉岡　正樹
正樹 吉岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Tokki Corp
Original Assignee
Canon Tokki Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Tokki Corp filed Critical Canon Tokki Corp
Priority to JP2011055872A priority Critical patent/JP5883230B2/ja
Priority to PCT/JP2012/053621 priority patent/WO2012124428A1/ja
Priority to KR1020137026765A priority patent/KR101958499B1/ko
Priority to TW101107918A priority patent/TW201250025A/zh
Publication of JP2012193391A publication Critical patent/JP2012193391A/ja
Publication of JP2012193391A5 publication Critical patent/JP2012193391A5/ja
Application granted granted Critical
Publication of JP5883230B2 publication Critical patent/JP5883230B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
JP2011055872A 2011-03-14 2011-03-14 蒸着装置並びに蒸着方法 Active JP5883230B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011055872A JP5883230B2 (ja) 2011-03-14 2011-03-14 蒸着装置並びに蒸着方法
PCT/JP2012/053621 WO2012124428A1 (ja) 2011-03-14 2012-02-16 蒸着装置並びに蒸着方法
KR1020137026765A KR101958499B1 (ko) 2011-03-14 2012-02-16 증착 장치 및 증착 방법
TW101107918A TW201250025A (en) 2011-03-14 2012-03-08 Deposition device and deposition method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011055872A JP5883230B2 (ja) 2011-03-14 2011-03-14 蒸着装置並びに蒸着方法

Publications (3)

Publication Number Publication Date
JP2012193391A JP2012193391A (ja) 2012-10-11
JP2012193391A5 JP2012193391A5 (https=) 2014-05-01
JP5883230B2 true JP5883230B2 (ja) 2016-03-09

Family

ID=46830505

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011055872A Active JP5883230B2 (ja) 2011-03-14 2011-03-14 蒸着装置並びに蒸着方法

Country Status (4)

Country Link
JP (1) JP5883230B2 (https=)
KR (1) KR101958499B1 (https=)
TW (1) TW201250025A (https=)
WO (1) WO2012124428A1 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014203632A1 (ja) 2013-06-21 2014-12-24 シャープ株式会社 有機エレクトロルミネッセンス素子の製造方法及び有機エレクトロルミネッセンス表示装置
KR102373436B1 (ko) * 2015-03-30 2022-03-14 삼성디스플레이 주식회사 표시 장치, 표시 장치의 제조장치 및 표시 장치의 제조방법
JP2018003120A (ja) * 2016-07-05 2018-01-11 キヤノントッキ株式会社 蒸着装置及び蒸発源
KR101866956B1 (ko) * 2016-12-30 2018-06-14 주식회사 선익시스템 선형 증발원용 도가니 및 선형 증발원
JP6570561B2 (ja) * 2017-02-07 2019-09-04 キヤノン株式会社 蒸着装置及び蒸着源
JP6566977B2 (ja) * 2017-02-07 2019-08-28 キヤノン株式会社 蒸着装置及び蒸着源
CN110273133A (zh) * 2019-07-26 2019-09-24 西安拉姆达电子科技有限公司 一种专用于晶片镀膜的磁控溅射镀膜机
US11659759B2 (en) 2021-01-06 2023-05-23 Applied Materials, Inc. Method of making high resolution OLED fabricated with overlapped masks

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9323034D0 (en) * 1993-11-09 1994-01-05 Gen Vacuum Equip Ltd Vacuum web coating
JPH10319870A (ja) * 1997-05-15 1998-12-04 Nec Corp シャドウマスク及びこれを用いたカラー薄膜ｅｌ表示装置の製造方法
JP2004055198A (ja) * 2002-07-17 2004-02-19 Konica Minolta Holdings Inc 有機エレクトロルミネッセンス素子を有するディスプレイ装置の製造装置及び製造方法
JP2004103268A (ja) * 2002-09-05 2004-04-02 Sanyo Electric Co Ltd 有機ｅｌ表示装置の製造方法
JP4156891B2 (ja) * 2002-09-20 2008-09-24 株式会社アルバック 薄膜形成装置
US20080131587A1 (en) 2006-11-30 2008-06-05 Boroson Michael L Depositing organic material onto an oled substrate
JP5042195B2 (ja) * 2008-10-29 2012-10-03 株式会社日立ハイテクノロジーズ 蒸着マスクの洗浄装置および洗浄方法
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
JP5620146B2 (ja) * 2009-05-22 2014-11-05 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 薄膜蒸着装置
JP5328726B2 (ja) * 2009-08-25 2013-10-30 三星ディスプレイ株式會社 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法

Also Published As

Publication number Publication date
KR20140044313A (ko) 2014-04-14
KR101958499B1 (ko) 2019-03-14
WO2012124428A1 (ja) 2012-09-20
TW201250025A (en) 2012-12-16
JP2012193391A (ja) 2012-10-11

Similar Documents

Publication Publication Date Title
JP5883230B2 (ja) 蒸着装置並びに蒸着方法
JP5616812B2 (ja) 蒸着装置並びに蒸着方法
JP2012193391A5 (https=)
TWI687315B (zh) 蒸鍍遮罩、圖案之製造方法、有機半導體元件的製造方法
CN105143497B (zh) 蒸镀掩模、蒸镀掩模准备体、蒸镀掩模的制造方法、及有机半导体元件的制造方法
JP5356210B2 (ja) マスク組立体、その製造方法及びそれを用いた平板表示装置用蒸着装置
TWI509095B (zh) A manufacturing method of the imposition-type deposition mask and a manufacturing method of the resulting stencil sheet and an organic semiconductor device
TWI725466B (zh) 蒸鍍遮罩、附框架的蒸鍍遮罩、蒸鍍遮罩之製造方法、蒸鍍遮罩準備體、圖案之形成方法、及有機半導體元件之製造方法
US20120100282A1 (en) Organic film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
JP2007297704A (ja) 蒸着装置、蒸着方法、及び電気光学装置の製造方法、並びに成膜装置
CN107858642A (zh) 蒸镀掩模、蒸镀掩模准备体、蒸镀掩模的制造方法、及有机半导体元件的制造方法
US9644256B2 (en) Mask assembly and thin film deposition method using the same
US20190390322A1 (en) Material deposition arrangement, vacuum deposition system and methods therefor
WO2012127993A1 (ja) 蒸着装置並びに蒸着方法
JP5745895B2 (ja) 蒸着装置並びに蒸着方法
KR20170104103A (ko) 고해상도 오엘이디 패턴 증착용 곡면증발원
US20200239998A1 (en) Vapor deposition structure of display panel
JP2012197467A5 (https=)
JP2014065936A (ja) 蒸着装置並びに蒸着方法
KR100990185B1 (ko) ＬＣＯＳ Ｐａｎｅｌ 제작을 위한 증착장치 및선경사각제어를 위한 증착지그
WO2025248276A1 (en) Evaporation source, nozzle set, and method of assembling an evaporation source
KR20160035170A (ko) 마스크 조립체 및 이를 이용한 증착 장치
JP2008106336A (ja) 成膜基板の製造方法及び成膜基板の製造装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140313

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20140313

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20141211

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20141222

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150220

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20150817

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150818

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20160118

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20160205

R150 Certificate of patent or registration of utility model

Ref document number: 5883230

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250