KR101958499B1 - 증착 장치 및 증착 방법 - Google Patents

증착 장치 및 증착 방법 Download PDF

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Publication number
KR101958499B1
KR101958499B1 KR1020137026765A KR20137026765A KR101958499B1 KR 101958499 B1 KR101958499 B1 KR 101958499B1 KR 1020137026765 A KR1020137026765 A KR 1020137026765A KR 20137026765 A KR20137026765 A KR 20137026765A KR 101958499 B1 KR101958499 B1 KR 101958499B1
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South Korea
Prior art keywords
mask
evaporation
deposition
substrate
opening
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Korean (ko)
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KR20140044313A (ko
Inventor
히로지 나루미
히로유키 다무라
마사히로 이치하라
에이이치 마츠모토
미유키 다지마
히로아키 나가타
마사키 요시오카
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캐논 톡키 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020137026765A 2011-03-14 2012-02-16 증착 장치 및 증착 방법 Active KR101958499B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2011-055872 2011-03-14
JP2011055872A JP5883230B2 (ja) 2011-03-14 2011-03-14 蒸着装置並びに蒸着方法
PCT/JP2012/053621 WO2012124428A1 (ja) 2011-03-14 2012-02-16 蒸着装置並びに蒸着方法

Publications (2)

Publication Number Publication Date
KR20140044313A KR20140044313A (ko) 2014-04-14
KR101958499B1 true KR101958499B1 (ko) 2019-03-14

Family

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Application Number Title Priority Date Filing Date
KR1020137026765A Active KR101958499B1 (ko) 2011-03-14 2012-02-16 증착 장치 및 증착 방법

Country Status (4)

Country Link
JP (1) JP5883230B2 (https=)
KR (1) KR101958499B1 (https=)
TW (1) TW201250025A (https=)
WO (1) WO2012124428A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022150100A1 (en) * 2021-01-06 2022-07-14 Applied Materials, Inc. High resolution oled fabricated with overlapped masks
TWI915464B (zh) 2021-01-06 2026-02-21 美商應用材料股份有限公司 形成電致發光裝置的方法與設備

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014203632A1 (ja) 2013-06-21 2014-12-24 シャープ株式会社 有機エレクトロルミネッセンス素子の製造方法及び有機エレクトロルミネッセンス表示装置
KR102373436B1 (ko) * 2015-03-30 2022-03-14 삼성디스플레이 주식회사 표시 장치, 표시 장치의 제조장치 및 표시 장치의 제조방법
JP2018003120A (ja) * 2016-07-05 2018-01-11 キヤノントッキ株式会社 蒸着装置及び蒸発源
KR101866956B1 (ko) * 2016-12-30 2018-06-14 주식회사 선익시스템 선형 증발원용 도가니 및 선형 증발원
JP6570561B2 (ja) * 2017-02-07 2019-09-04 キヤノン株式会社 蒸着装置及び蒸着源
JP6566977B2 (ja) * 2017-02-07 2019-08-28 キヤノン株式会社 蒸着装置及び蒸着源
CN110273133A (zh) * 2019-07-26 2019-09-24 西安拉姆达电子科技有限公司 一种专用于晶片镀膜的磁控溅射镀膜机

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004107763A (ja) 2002-09-20 2004-04-08 Ulvac Japan Ltd 薄膜形成装置
JP2010270396A (ja) 2009-05-22 2010-12-02 Samsung Mobile Display Co Ltd 薄膜蒸着装置
JP2011047035A (ja) 2009-08-25 2011-03-10 Samsung Mobile Display Co Ltd 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9323034D0 (en) * 1993-11-09 1994-01-05 Gen Vacuum Equip Ltd Vacuum web coating
JPH10319870A (ja) * 1997-05-15 1998-12-04 Nec Corp シャドウマスク及びこれを用いたカラー薄膜ｅｌ表示装置の製造方法
JP2004055198A (ja) * 2002-07-17 2004-02-19 Konica Minolta Holdings Inc 有機エレクトロルミネッセンス素子を有するディスプレイ装置の製造装置及び製造方法
JP2004103268A (ja) * 2002-09-05 2004-04-02 Sanyo Electric Co Ltd 有機ｅｌ表示装置の製造方法
US20080131587A1 (en) 2006-11-30 2008-06-05 Boroson Michael L Depositing organic material onto an oled substrate
JP5042195B2 (ja) * 2008-10-29 2012-10-03 株式会社日立ハイテクノロジーズ 蒸着マスクの洗浄装置および洗浄方法
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004107763A (ja) 2002-09-20 2004-04-08 Ulvac Japan Ltd 薄膜形成装置
JP2010270396A (ja) 2009-05-22 2010-12-02 Samsung Mobile Display Co Ltd 薄膜蒸着装置
JP2011047035A (ja) 2009-08-25 2011-03-10 Samsung Mobile Display Co Ltd 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022150100A1 (en) * 2021-01-06 2022-07-14 Applied Materials, Inc. High resolution oled fabricated with overlapped masks
US11659759B2 (en) 2021-01-06 2023-05-23 Applied Materials, Inc. Method of making high resolution OLED fabricated with overlapped masks
TWI915464B (zh) 2021-01-06 2026-02-21 美商應用材料股份有限公司 形成電致發光裝置的方法與設備

Also Published As

Publication number Publication date
KR20140044313A (ko) 2014-04-14
JP5883230B2 (ja) 2016-03-09
WO2012124428A1 (ja) 2012-09-20
TW201250025A (en) 2012-12-16
JP2012193391A (ja) 2012-10-11

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