200909798 九、發明說明： t pfr Λ ^ 發明領域 本發明係有關於一種基板外觀檢查裝置。 5 【先前技術】 發明背景 以往’在製造LCD (液晶顯示器）等FPD (平面面板 顯示器）時，已知的是由目視觀察發生於玻璃基板之缺陷 等之基板外觀檢察裝置。如此，藉由目視進行之檢查一般 1〇稱為巨觀觀察，藉將巨觀觀察單元之面光源照射於受保持 部所支持之被檢查基板之表面，且以電視攝影機拍攝被檢 查基板表面之反射光的變化，進行微觀觀察之外觀檢查（參 照如專利文獻1之第6圖）。 【專利文獻1】曰本專利公開公報特開平10-111253 15發明欲解決之課題 然而’上述專利文獻1中，在LCD之製造程序中，對由 製造生產線上搬送來之玻璃基板，進行相機之外觀檢查 時’必須暫時由製造生產線取出檢查玻璃基板，而有無法 縮短作業時間之問題。又，在配置與製造生產線不同之外 觀檢查裝置時，需要該配置空間或搬送機器人等之機構， 也有難以達到製造設備之省空間化。 本發明係有鑒於該等況狀而作成者，其目的在於提供 種不需要由製造生產線取出由製造生產線上搬送來之玻 螭基板，可進行全面之詳細的外觀檢查，並可達到縮短作 5 200909798 業時間’並可達到製造設備之輕巧化。200909798 IX. INSTRUCTION DESCRIPTION: t pfr Λ ^ Field of the Invention The present invention relates to a substrate visual inspection device. [Prior Art] In the past, when manufacturing an FPD (Flat Panel Display) such as an LCD (Liquid Crystal Display), a substrate appearance inspection device which visually observes defects such as a glass substrate is known. In this way, the inspection by visual inspection is generally referred to as macroscopic observation, and the surface light source of the giant observation unit is irradiated onto the surface of the substrate to be inspected supported by the holding portion, and the surface of the substrate to be inspected is photographed by a television camera. The change of the reflected light is examined for the appearance of the microscopic observation (refer to Fig. 6 of Patent Document 1). [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei 10-111253. The present invention is directed to a problem. However, in the above-described Patent Document 1, in a manufacturing process of an LCD, a glass substrate conveyed from a manufacturing line is subjected to a camera. At the time of visual inspection, the inspection glass substrate must be taken out temporarily from the manufacturing line, and there is a problem that the operation time cannot be shortened. Further, when the inspection device is disposed differently from the manufacturing line, the arrangement space or the mechanism such as the transfer robot is required, and it is difficult to achieve space saving of the manufacturing equipment. The present invention has been made in view of such circumstances, and an object thereof is to provide a glass substrate which is conveyed from a manufacturing line without being taken out from a manufacturing line, and can perform a comprehensive detailed visual inspection, and can be shortened. 200909798 Industry time' and can achieve the lightness of manufacturing equipment.
【明内J 發明概要 為解決上述課題，本發明可採用以下手段。 5 本發明一種基板外觀檢查裝置，包含有：照明部，係 可產生照射到由製造生產線上搬送過來之基板之表面之照 明光者·’攝影部，係利用由該照明部發出且在前述基板表 面反射之反射光對該基板表面進行拍攝者；第丨移動機構， 係使該等照明部及攝影部朝前述製造生產線與前述基板之 10 搬送方向交叉之方向一體移動者；及第2移動機構，係使該 第1移動機構朝前述製造生產線之搬送方向移動者；其中前 述攝影部係配置於來自前述照明部之照明光之位於前述基 板表面之正反射光之光束的範圍外。 根據本發明，由照明部產生之照明光照射到基板表 15 面’該反射光可藉由攝影部之作動進行拍攝。藉此，例如， 可使拍攝之基板表面之影像顯示於螢幕，在螢幕上以目視 觀察。 此時，攝影部配置於正反射光之光束的範圍外，因此 不會在顯示於螢幕上之影像產生亮度飽和之領域。因此， 20 觀察者不會漏觀察顯示於影像全體之基板外觀。 又，藉由第1移動機構之作動，使照明部及攝影部朝與 製造生產線之搬送方向交又之方向一體移動，可詳細觀察 基板之寬度方向全體（即，與基板之搬送方向交叉之方向 全體）。又，就製造生產線之搬送方向，藉製造生產線使基 200909798 板移動，可詳細觀察搬送方向全體之基板。因此，即使基 板大型化’可輕易詳細檢查基板全體。 又’藉第2移動機構之作動，即使在生產線上基板停止 之情況下，也可使照明部及攝影部朝基板之搬送方向一體 5 移動，可詳細觀察基板全體。 又’由於觀察配置於製造生產線上之狀態之基板，因 此不需要由製造生產線取出基板。因此，可縮短作業時間。 又，不需要基板取出機構等個別裝置，可減少設置空間， 達到輕巧化。 10 又’上述發明中’前述第1移動機構具有：第1軌道， 係架設在與前述製造生產線之搬送方向交叉之方向者；第J 滑動部，係裝載前述照明部及前述攝影部，且可移動地受 支持於如述第1轨道上；及第1驅動裝置，係沿著前述第1軌 道驅動該第1滑動部。 15 藉如此構成，藉第1驅動裝置之作動，使第1滑動部在 跨架於與製造生產線之搬送方向交叉之第1軌道上移動，可 使照明部及攝影部往與製造生產線之搬送方向交又之方向 ' 一體移動。又，由於第1軌道係跨架在與製造生產線之搬送 - 方向交又之方向，因此可不選擇將第1移動機構設置於製造 20生產線之位置。又，可將第1移動機構後付於已經構築之製 造生產線。 又，上述發明中’前述第2移動機構亦可具有：第2軌 道’係沿著前述製造生產線之搬送方向配置者；第2滑動 部，係裝載前述第1移動機構，且可移動地受支持於前述第 7 200909798 2軌道上；及第2驅動裝置，係沿著前述第2軌道驅動該第2 滑動部者。 藉由如此構成，藉第2驅動裝置之作動，使第2滑動部 在沿著製造生產線之搬送方向配置之第2軌道上移動，可使 5照明部及攝影部朝製造生產線之搬送方向一體移動。又， 由於第2軌道係沿著製造生產線之搬送方向配置’因此第2 移動機構可不選擇設置於製造生產線之位置。又，可將第2 移動機構後付於已經構築之製造生產線。 又，上述發明中亦可具有一旋轉機構，該旋轉機構係 10以自前述照明部照射之照射光的照射範圍之中心為旋轉支 點’使前述攝影部旋轉者。 藉如此構成’藉旋轉機構之作動，攝影部以由照明部 所照射之照射光之照射範圍中心為旋轉支點旋轉。因此， 可改變攝影部之視點，進行基板檢察。藉此，可進行接近 15直接目視觀察之觀察。 又’前述攝影部亦可具有可將前述基板表面之影像放 大攝影之圖像放大機構，且以攝影位置為支點，使前述攝 影部朝二次元方向旋動，以使檢測出之前述基板上的缺陷 進入前述攝影部之視野内。 20 Λ f 藉如此之構成，使攝影部以攝影位置為支點朝二次元 方向旋動，而使檢出出之基板上的缺陷進入攝影部之視野 内，再藉由圖像放大機構放大基板表面之影像來攝影藉 此可容易觀察基板表面之缺陷部分。 又，上述發明中亦可具有可顯示由前述攝影部所攝影 200909798 、螢幕’且使前述第1滑動部以一定之速度移動’而 ^由别述攝影部所攝影之影像可連續放映於前述螢幕上 所仔之動畫可她察者賴缺陷之流動。 藉如此構成，基板表面所映出之螢幕上的動畫，觀察 5者可容易發現缺陷。 ” ，又上述發明中亦可具有一記憶部，該記憶部係可使 ϋ述攝,v °卩所攝影之前述照明部之照明範圍之影像與對 應於違衫像之前述基板上之座標位置相對應而保存者。 :藉如此構成，可將觀察者發現缺陷之基板的影像與對 1〇該〜像之基板上的座標位置保存於記憶部藉此，之後可 將棚疋結果運用作為再確認•檢証時之資料。 、 这發明中，則述攝影部亦可具有一可放大拍攝 前述基板表面之缺陷之圖像放大機構並且將由該圖像放 大機構放大之缺陷之影像保存於前述記憶部。 藉如此構成’之後再確認•檢驻判定結果時可容易 確認基板表面的缺陷部分。 又，上述發明中亦可具有用以顯示由前述攝影部所拍 攝之，5V像之螢幕、及用以指定顯示於前述榮幕上之前述影 像中之缺陷之位置之指示器’且前述基板外觀檢察裝置可 2〇 f出由該指示器所指定之缺陷的位置座標，並使之對應於 前述基板且加以記憶。 ' 藉如此構成，可容易在事後特定檢查中所檢測出之基 板上的缺陷位置。 土 發明之效果 200909798 根據本發明，可達到不需要由製造生產線取出由製造 生產線上搬送來之玻璃基板，並且可進行全面詳細之外觀 檢查，並可縮短作業時間、達到製造設備之輕巧化。 5 【實施方式】 較佳實施例之詳細說明 第1實施形態 以下，參關式制說明本發明之第丨實施形態之基板 外觀檢查裝置。 10 15 本實施形態之基板外觀檢查裝置】只要係設置於基板 之製造生產線，並且用以檢察藉由運送機等搬送過來之基 板表面之裝置。 基板外觀檢查裝置1係如第1圖及第示，Μ 1 以觀察由製造生產線52上搬送來之基⑽表面之外觀之檢 察裝置早α、用以顯示由該檢查裝置單以所攝影之影像 之榮幕5、用以使檢查裝置單元3朝與基板50之搬送方向交 叉之方向移動之第1移動機構7、及使檢查裝置單元3朝基板 50之搬送方向移動之第2移動機構9。 檢查裝置單元3係如第3圖所 所不，具有：用以發出散射 光與收斂先作為照射於基板5〇表 (照明部)U、及利用由該照明袭置i:發二== 基⑽“之景彡狀相機^部) 構7裝置u與相機n係安裝於如後述之第丄移動機 20 200909798 11係將照明光之光轴傾斜預定之傾斜角度配 照明裝置 面。又，如第3圖所 置之製造生產線52上配置為基板50表 示，可由照明裝置射出收斂光。 又，只要由照明裝置11射出散射光或收斂光之任一種 5 即可。 又’照明裝置11宜具有：使由光源射出之照明光收敛 之菲淫耳透鏡(Fresnel lens)、及可切換為透明狀態與散射狀 態之透過型液晶散射板。透過型液晶散射板可因應於基板 50之檢查條件切換為透明狀態與散射狀態。 1〇 相機13係可取得如CCD等2次元影像之相機，且可取得 靜畫或動晝之至少其中一影像。相機13係將其光軸傾斜預 定之傾斜角度，使光軸與照明裝置11之照明範圍之中心一 致’配置於製造生產線52上之基板5〇之表面。[Bright J. Summary of the Invention In order to solve the above problems, the present invention can adopt the following means. A substrate appearance inspection device according to the present invention, comprising: an illumination unit that emits illumination light that is incident on a surface of a substrate conveyed by a manufacturing line, and an imaging unit that is emitted by the illumination unit and is on the substrate The reflected light reflected by the surface is photographed on the surface of the substrate; the second moving mechanism is such that the illumination unit and the imaging unit are integrally moved in a direction in which the manufacturing line intersects the transport direction of the substrate 10; and the second moving mechanism And moving the first moving mechanism to a direction in which the manufacturing line is moved; wherein the imaging unit is disposed outside a range of a beam of specularly reflected light from the illumination unit of the illumination unit. According to the present invention, the illumination light generated by the illumination unit is irradiated onto the surface of the substrate surface. The reflected light can be imaged by the operation of the photographing unit. Thereby, for example, an image of the surface of the photographed substrate can be displayed on the screen and visually observed on the screen. At this time, since the photographing unit is disposed outside the range of the beam of the specular reflected light, the image displayed on the screen does not cause saturation of the image. Therefore, the observer does not miss the appearance of the substrate displayed on the entire image. Further, by the operation of the first moving mechanism, the illumination unit and the imaging unit are integrally moved in the direction of the direction in which the manufacturing line is transported, and the entire width direction of the substrate (that is, the direction intersecting the substrate transport direction) can be observed in detail. All). In addition, in the direction in which the production line is transported, the substrate 200909798 is moved by the manufacturing line, and the substrate in the entire transport direction can be observed in detail. Therefore, even if the substrate is enlarged, the entire substrate can be easily inspected in detail. By the action of the second moving mechanism, even when the substrate on the production line is stopped, the illumination unit and the imaging unit can be integrally moved 5 toward the substrate transport direction, and the entire substrate can be observed in detail. Further, since the substrate disposed in the state of the manufacturing line is observed, it is not necessary to take out the substrate from the manufacturing line. Therefore, the working time can be shortened. Moreover, an individual device such as a substrate take-out mechanism is not required, and the installation space can be reduced, and the weight can be reduced. In the above aspect of the invention, the first moving mechanism includes a first rail that is disposed in a direction intersecting a conveying direction of the manufacturing line, and a J-sliding portion that mounts the lighting unit and the image capturing unit. The first track is supported by the first track, and the first drive unit drives the first slide along the first track. According to this configuration, the first sliding unit moves on the first rail that crosses the conveying direction of the manufacturing line by the operation of the first driving device, and the lighting unit and the photographing unit can be moved to the manufacturing line. Hand in the direction of 'one move. Further, since the first rail system spans the direction of the transport-direction of the manufacturing line, the first moving mechanism can be omitted from the position of the manufacturing line 20. Further, the first moving mechanism can be paid to the already constructed manufacturing line. Further, in the above invention, the second moving mechanism may include a second rail that is disposed along a transport direction of the manufacturing line, and a second slider that is movably supported by the first moving mechanism. And the second driving device drives the second sliding portion along the second track. With this configuration, the second sliding unit is moved by the second driving device on the second rail disposed along the transport direction of the manufacturing line, so that the fifth illuminating unit and the photographing unit can be integrally moved in the transport direction of the manufacturing line. . Further, since the second rail system is disposed along the transport direction of the manufacturing line, the second moving mechanism can be selected from the position of the manufacturing line. Further, the second moving mechanism can be paid to the already constructed manufacturing line. Further, in the above invention, the rotation mechanism 10 may rotate the imaging unit by using the center of the irradiation range of the irradiation light irradiated from the illumination unit as the rotation fulcrum. By doing so, the photographing unit rotates with the center of the irradiation range of the illumination light irradiated by the illumination unit as a rotation fulcrum. Therefore, the viewpoint of the photographing unit can be changed to perform substrate inspection. Thereby, observation of direct visual observation close to 15 can be performed. Further, the image capturing unit may have an image magnifying mechanism capable of magnifying and imaging the image on the surface of the substrate, and rotating the image capturing unit in a secondary direction with the photographing position as a fulcrum to detect the substrate The defect enters the field of view of the aforementioned photography unit. 20 Λ f With such a configuration, the photographing unit is rotated in the secondary direction with the photographing position as a fulcrum, and the defect on the detected substrate enters the field of view of the photographing portion, and the surface of the substrate is enlarged by the image magnifying mechanism. The image is photographed whereby the defective portion of the substrate surface can be easily observed. Further, in the above invention, it is also possible to display that the image capturing unit is photographed by the image capturing unit, and that the screen is moved at a constant speed, and the image captured by the other camera unit can be continuously displayed on the screen. The animation of the above-mentioned children can tell her the flow of defects. By doing so, the animation on the screen reflected on the surface of the substrate can be easily observed. Further, in the above invention, the memory portion may have a memory portion that allows the image of the illumination range of the illumination portion photographed by the image to be photographed and the coordinate position on the substrate corresponding to the contraband image. According to this configuration, the image of the substrate on which the observer finds the defect and the coordinate position on the substrate on the image can be stored in the memory unit, and then the result of the shed can be used as the In the invention, the photographing unit may have an image magnifying mechanism that magnifies the defect of the surface of the substrate and saves the image of the defect magnified by the image magnifying mechanism in the memory. In this way, it is possible to easily confirm the defective portion on the surface of the substrate when the result of the determination is confirmed. The above invention may further include a screen for displaying a 5V image captured by the imaging unit, and An indicator that specifies the position of the defect in the aforementioned image displayed on the aforementioned glory screen, and the aforementioned substrate appearance inspection device can defragment the defect specified by the indicator The position coordinates are made to correspond to the aforementioned substrate and memorized. By the configuration, the position of the defect on the substrate can be easily detected in the specific inspection after the event. The effect of the invention of the earth 200909798 can be achieved according to the present invention. The manufacturing line takes out the glass substrate conveyed from the manufacturing line, and can perform a detailed detailed visual inspection, and can shorten the working time and achieve the lightness of the manufacturing equipment. 5 Embodiments Detailed Description of the Preferred Embodiments First Embodiment In the following, a substrate appearance inspection device according to a third embodiment of the present invention will be described. The substrate appearance inspection device of the present embodiment is provided on a manufacturing line of a substrate, and is used for inspection by a conveyor or the like. The apparatus for inspecting the surface of the substrate to be conveyed. The substrate appearance inspection apparatus 1 is as shown in Fig. 1 and shows that the inspection apparatus 1 for observing the appearance of the surface of the base (10) conveyed by the manufacturing line 52 is used to display The inspection device is singularly directed by the image of the captured image 5 for causing the inspection device unit 3 to face the substrate 50 The first moving mechanism 7 that moves in the direction in which the direction of intersection is moved, and the second moving mechanism 9 that moves the inspection device unit 3 in the direction in which the substrate 50 is moved. The inspection device unit 3 is as shown in FIG. The scattered light and the convergence are first applied to the substrate 5 (illumination unit) U, and the illumination is used to set i: the second == base (10) "the camera" portion 7 means u and the camera n It is attached to the second mobile unit 20, 200909798, which will be described later, and the optical axis of the illumination light is tilted by a predetermined inclination angle to the illumination device surface. Further, as shown in Fig. 3, the manufacturing line 52 is disposed as a substrate 50, and the illuminating device can emit convergent light. Further, any one of the scattered light and the convergent light may be emitted by the illumination device 11. Further, the illumination device 11 preferably includes a Fresnel lens that converges illumination light emitted from the light source, and a transmissive liquid crystal scattering plate that can be switched between a transparent state and a scattering state. The transmissive liquid crystal scattering plate can be switched to a transparent state and a scattering state in accordance with the inspection conditions of the substrate 50. 1〇 The camera 13 is a camera that can acquire a 2-dimensional image such as a CCD, and can acquire at least one of still images or moving images. The camera 13 tilts its optical axis by a predetermined tilt angle so that the optical axis is aligned with the center of the illumination range of the illumination device 11 on the surface of the substrate 5 on the manufacturing line 52.
該相機13受支持為以照明範圍之中心為旋轉支點朝χ 15 Υ之一次兀方向旋動，或者是以視點位置之相機13之撮影 位置為旋轉支點朝χγ之二次元方向旋動，並可藉由觀察 者操作操縱桿之操作部，由遠處操作相機13為所期望之攝 衫位置及攝影角度。 又’相機13具有圖像放大機構。亦可放大由該圖像放 20大機構所檢測出之缺陷，以攝影位置為旋轉支點，使相機 13可朝χγ之二次元方向旋動，使其缺陷進入相機13之視 野内。 又’相機13係可受支持為位於自照明裝置丨丨之照明光 在基板50表面正反射之收斂光之範圍外。再者，為了取得 11 200909798 鮮明之影像，亦可在收敛光之範圍外，且為收傲光之附近 設置相機13。 榮幕5係如第2圖所*，與相機13相連接，且可顯示& 相機13所拍攝之基板5G表面之影像。又，螢幕$具有可記憶 5由相機13所拍攝之照明範圍之巨觀像與放大之缺陷影狀 記憶部（省略圖示）。 第1移動機構7具有·_可架設在與製造生產線52之搬送 方向（Y方向）交又之寬度方向（又方向）之第！軌道& 可移動地受支持於該W軌道15上之第！滑動部17、及沿著 10第1軌道15驅動第1滑動部17，且由例如雜馬達等之直接 驅動機構構成之第1驅動裝置（省略圖示）。 第1滑動部17以一定的速度移動，且可在觀察者發現缺 陷時停止，前述一定的速度係使由相機13所拍攝之影像連 續映出於螢幕5上所得之動畫可由觀察者確認基板5〇上之 15缺陷之程度的移動。在此種情況下，當觀察者判定為缺陷 時，將由相機13所拍攝之影像為靜止影像保存，並且求得 對該靜止影像之基板50上之座標位置，將之保存為位置資 訊。如此，觀察者可藉由僅保存判定為缺陷之靜止影像與 位置資訊，之後再運用作為再確認暨檢證判定結果時之資 20 剩·。 第1軌道15係一對平行之軌道構件。第1軌道15係位於 製造生產線52之上方，且長手方向之兩端部由分別後述之 第2移動機構9所支持。又，第1軌道15之一對軌道構件係設 有間隔地配置於製造生產線52之搬送方向，並且分別支持 12 200909798 第1滑動部17之兩端部。 第1滑動部17形成為具有矩形之開口部之框狀，且於與 X方向對峙之兩框部搭載照明裝置11及相機13。藉此，對 搬送第1滑動部17下方之基板50，來自照明裝置11之照明光 5通過開口部照射到基板50，並且來自基板50表面之反射光 通過開口部入射於相機13，拍攝基板50之表面的影像。又， 使第1滑動部17沿著第1軌道15驅動時，照明裝置η與相機 ' 13會一體朝與製造生產線52之搬送方向直交之方向移動。 第2移動機構9具有：沿著製造生產線52之搬送方向配 10 置之一對基底部19、安裝於該基底部19上之第2軌道21、可 在該第2軌道21上移動且受支持之第2滑動部23、及由使該 第2滑動部23沿著第2軌道21移動、例如線性馬達等直線驅 動機構構成之第2驅動裝置（省略圖示）。 基底部19與製造生產線52之基板搬送路平行且配置於 15該兩側。又’基底部19可配合製造生產線52之基板搬送高 度朝上下調節位置。藉此，可調節檢察裝置單元3之高度， 且相機13之焦點位置最適合由構成基板搬送路運送機μ所 搬送之基板50。 第2軌道21係一對平行之軌道構件。第2軌道21沿著基 2〇 底部19之上端面，安裝成與製造生產線52之搬送方向平行。 第2滑動部23係與上述第1軌道15間之寬度為相同程度 之長度之板狀構件’且第1軌道15之長手方向之兩端部分別 安裝於第2滑動部23。 即’第1移動機構7與第2移動機構9係組合成互相直 13 200909798 交’並且構成為可令檢查裝置單元3朝XY方向之2次元方 向移動之ΧΥ台。藉此，檢查裝置單元3藉第1移動機構7之 作動朝與製造生產線52之搬送方向交叉之方向移動，並且 藉第2移動機構9之作動，以預定之間隔使之朝製造生產線 5 52之搬送方向移動，藉此可依預定之間隔對基板50全面朝 左右蛇行。 又’本實施形態之基板外觀檢查裝置1係於如第1執道 15與第2軌道21分別設有X標尺、Υ標尺，根據藉由該等標 尺所讀取之檢查裝置單元3之ΧΥ座標，將顯示於螢幕5上 10 之影像之中心位置對應於基板50上之座標記憶於記憶部。 又’亦可藉由以指示器（省略圖示）指定該影像中之缺陷 之中心位置，算出缺陷之位置座標（即，X方向距離與γ 方向距離）’將對應於基板50之座標記憶於記憶部。 以下說明如此構成之本實施形態之基板外觀檢查裝置 15 1之作用。 要藉由本實施形態之基板外觀檢查裝置1，檢查製造生 產線52上搬送之基板5〇時，首先將基板外觀檢查裝置丨設置 於製造生產線52之任意位置。 例如，如第4圊所示，係由第1製造裝置56搬送基板50 2〇到第2製造裝置58之製造生產線52，且在基板搬送路具有彎 曲約90°之角落部分者中，係如設置位置60、62、64，在使 基板50直線移動之直線搬送生產線之位置，將基底部丨9配 置於製造生產線52兩側，使第1軌道15橫跨於與製造生產線 52之基板搬送方向交又之方向。 200909798 而且，例如，由在基板5〇上塗布抗蝕劑之製造裝置所 搬出之基板50藉由製造生產線52之運送機54，往設置於下 一製造程序之製造裝置搬送。其中，搬送來之基板5〇在基 板外觀檢查裝置1之檢查領域内暫時停止。且將檢查裝置單 5元3如第1圖之箭頭A所示，如進行光柵掃描（Raster Scan) 般地使之移動，然後在基板5〇之表面全體由照明裝置“照 射照明光，並以相機13拍攝基板5〇之表面影像。 例如，如第4圖所示，當在為各製造裝置56 , 58之搬出 側或搬入側之設置位置6〇、64設置基板外觀檢查裝置丨時， 1〇藉由设置於為基板搬送路之運送機54間隙之位置檢測感測 器（省略圖示），當檢測到基板5〇搬入檢查領域内時停止 運送機54之驅動，並且使基板50停止於設置於設置位置 60，64之基板外觀檢查裝置1之檢查領域内。然後，藉由第 1移動機構7之作冑，使檢查裝置單元3朝與製造生產線52之 15基板搬送方向直交之方向往返移動，可進行基板50之短邊 方向全體的詳細觀察。 又，藉由第2移動機構9之作動，使第丨移動機構7以比 照明範圍之照射寬度稍微短之寬度間隔朝製造生產線5 2之 搬送方向移動，藉此可詳細觀察基板5〇之長邊方向全體。 2〇 又，如第4圖所示，於設置位置62設置基板外觀檢查裝 置1時，搬送來之基板50會以對設置位置6〇旋轉約9〇。之狀 態搬送。即，基板5〇在搬送生產線之角落部分，方向不會 改變，僅移動方向會改變約9〇。進行搬送。因此，對在設置 位置60之基板外觀檢查裝置1之基板50之方向會以旋轉約 15 200909798 9〇°之方向朝設置位置62之基板外觀檢查裝置丨搬送。 其次，使基板50停止於製造生產線52之設置位置& 上。然後，藉由第1移動機構7之作動，使檢查裝置單元3對 搬送來之長方形基板50在與製造生產線52之基板搬送方向 5直交之方向上往返移動，藉此可詳細觀察基板50之長邊方 向全體。 又，藉由第2移動機構9之作動，使第丨移動機構7以比 照明範圍之照射寬度稍微短之間隔朝製造生產線5 2之搬送 方向移動，藉此可詳細觀察基板5〇之短邊方向全體。 10 藉此，可對形成於基板50表面之長方形圖案排列方 向’由設置位置60與設置位置62大約相差90。之方向進行照 明攝影，可更詳細地檢察基板50之表面之缺陷。 如此’由相機13全面掃描之基板50之表面影像顯示於 螢幕5上’藉由觀察者之目視觀察，進行基板50之外觀檢 15查。因此，即使基板50大型化亦可輕易進行基板5〇全體之 詳細檢查。 此種情況下’如第3圖所示，相機13係位於由基板5〇 反射之正反射光之光束範圍外地受支持，因此相機13之照 明光不會入射且呈飽和，可達到高精確度之影像。因此， 20觀察者可良好地觀察顯示於螢幕5之影像全體之基板5〇。 又’由於螢幕5上顯示之影像的中心位置25與缺陷27 之位置對應於基板50上之座標記憶於記憶部，因此，可藉 例如微觀觀察裝置等其他的檢查裝置讀出該缺陷27之座 標’藉此進行回顧檢查。 16 200909798 如以上說明，根據本實施形態之基板外觀檢查裝置1， 僅藉檢跨於與製造生產線52之基板搬送方向直交之寬度方 向，可容易設置於既有之製造生產線之基板搬送空間，並 且可不用將基板50取出到製造生產線52外，而在製造生產 5 線中進行基板50之巨觀檢查。 因此’在製造生產線52之基板搬送路中，藉顯示於螢 幕5上之基板50的表面影像，進行巨觀檢查，藉此可不要習 知在製造生產線外將基板搬送之基板取出機構等另外的裝 置，可縮短作業時間。又，可有效運用製造生產線52上方 10 之空間，達到製造設備之簡約化。又，由於沿著既有的製 造生產線52之基板搬送路配置基板外觀檢查裝置1，因此可 將基板外觀檢察裝置1簡單地後附於已經構築之製造生產 線52。 又，本實施形態之基板外觀檢查裝置1係作成具有第1 15 移動機構7及第2移動機構9，但亦可取而代之，僅具有第1 移動機構7，將第2移動機構9兼用為搬送基板5〇之運送機’ 藉此可詳細觀察基板50之搬送方向全體。又，藉由省略第2 移動機構9，可使基板外觀檢查裝置1更為輕巧化。 又，例如本實施形態之基板外觀檢查裝置1係由榮幕5 2〇進行目視檢查，但亦可進一步於基板外觀檢查裝置1之下游 側，進一步放大且詳細檢查在上游側檢測出之缺卩曰進行詳 細檢查之巨觀檢查裝置，利用巨觀檢查得到缺陷之座標’ 並根據該缺陷之位置資訊，利用微觀檢查裝置詳細檢查缺 陷。 17 200909798 〔第2實施形態〕 其次，參照第5圖及第6圖說明本發明第2實施形態之基 板外觀檢查裝置31。 本實施形態之基板外觀檢查裝置31之檢查裝置單元3 5 具有導引部(旋轉機構）33。 以下，與第1實施形態之基板外觀檢查裝置1構成共通 之處賦與相同標號並省略說明。 導引部33係使相機13旋轉，使相機13之光軸經常朝向 由照明裝置11照射之照明光之基板5〇上之照射範圍的中心 10 位置35。更具體而言，導引部33係半圓弧狀之軌道，相機 14可移動地沿著導引部33安裝。 又，導引部33對相機13之光轴與基板50之角度漸漸變 小，使之對基板50傾斜約45°角度設置於照明光之反射方向 侧。藉此，如第6圖所示’在繞著中心位置35約18〇。之範圍 15 内，可使相機13在傾斜約45°之狀態下旋轉移動。 藉由如此，例如如相機位置13 A ’ 13 B，13 c，改變 相機13之視點進行基板50的檢查。因此’觀察者可對基板 50以接近將頭左右傾斜相同之目視觀察者之直視進行觀 察。 2〇 又，如第7圖所示，將可將相機13之光轴對照明光之反 射軸任意改變對基板50之角度之第2導引部37安裝於導引 部33，亦可將相機13之高度方向的移動作為導引部。 如第6圖及第7圖所示，藉以照明光之照射範圍之中心 位置作為旋轉支點，使相機13朝左右方向與前後方向旋 18 200909798 轉，可藉由對基板50之多方向改變視點之相機13進行攝 影，並可提高檢測基板50上之缺陷之精確度。 以上，係參照圖式詳述本發明之各實施形態，具體之 構成不受限於該實施形態，不脫離本發明要旨之範圍的設 5 計變更也包含在内。 例如，亦可將上述各實施形態之基板搬送裝置1，31 之基底部19形成橫跨製造生產線52之寬度方向之形狀。如 此，如第4圖之設置位置所示’亦可於製造生產線52之角落 部66、68設置基板搬送裝置1，31。因此，已往可在為死角 10之製造生產線52之肖落部分之基板搬入侧與基板搬出側設 置基板外觀檢查裝置1、31，可構築基板外觀檢查裝置i、 31，不會受製造生產線52之形狀，可進一步有效運用製造 生產線52上方之空間，並可達到製造設備之輕巧化。 又，可將檢查裝置單元3之照明掃描領域之檢查領域取 15代為由輥子運送機使基板50浮起預定之高度之空氣浮起 台。此時，為了確保基板5〇的浮起高度固定，在台上面設 置喷出空氣之噴出孔、用以吸引空氣之吸引孔，並藉由空 氣之噴出壓與吸引壓，使基板50浮起在一定之高度。如此’ 可藉使基板50浮起，可以非接觸完全支持基板％，因此可 20如母板玻璃般，減少透明基板之裏面下的背景所引起之影 響’並可防止疑似缺陷之物檢測。 【圖式簡單樹*明】 第1圖係由上方看本發明之第！實施形態之基板外觀檢 19 200909798 查裝置之概略構成圖。 第2圖係第1圖之基板外觀檢查裝置之側面圖。 第3圖係顯示第1圖之基板外觀檢查裝置之檢查裝置單 元之概略製圖。 5 第4圖係顯示基板之製造生產線之概略圖。 第5圖係顯示本發明之第2實施形態之基板外觀檢查裝 置之導引部之概略圖。 第6圖係顯示第5圖之基板外觀檢查裝置之檢查裝置單 元。 10 第7圖係顯示第5圖之導引部之變形例之概略圖。 【主要元件符號說明】 1...基板外觀檢查裝置 23., ..第2滑動部 3...檢查裝置單元 25., ..影像中心位置 5...勞幕 27., ..缺陷 7...第1移動機構 31·. ..基板檢查裝置 9...第2移動機構 33.. .·導引部 11…照明裝置(照明部） 35…中心位置 13…相機(攝影部） 37.. ..第2導引部 13A〜13C...相機位置 50·. _ 反 15…第1執道 52.. ..製造生產線 17...第1滑動部 54., .·運送機 19...基底部 56·. ..第1製造裝置 21.··第2軌道 58...第2製造裝置 20 200909798 60,62,64…設置位置 A...箭頭 66,68...角落 21The camera 13 is supported to rotate in a 兀 direction of the 支 15 以 with the center of the illumination range as a rotation fulcrum, or to rotate the fulcrum in the direction of the second direction of the χ γ by the locating position of the camera 13 at the viewpoint position, and By the operator operating the operating portion of the joystick, the camera 13 is operated from a distance to the desired camera position and shooting angle. Further, the camera 13 has an image enlargement mechanism. The defect detected by the image-receiving mechanism can also be enlarged, and the photographing position is used as a pivot point, so that the camera 13 can be rotated in the direction of the second element of the χγ to cause the defect to enter the field of view of the camera 13. Further, the camera 13 can be supported as being outside the range of the convergent light that is reflected from the surface of the substrate 50 by the illumination light from the illumination device. Furthermore, in order to obtain a vivid image of 11 200909798, it is also possible to set the camera 13 in the vicinity of the convergence light and in the vicinity of the arrogance. The glory 5 is connected to the camera 13 as shown in Fig. 2, and can display an image of the surface of the substrate 5G captured by the camera 13. Further, the screen $ has a memory image (not shown) which can be memorized by the macroscopic image of the illumination range captured by the camera 13 and enlarged. The first moving mechanism 7 has a _ can be placed in the width direction (again direction) which is in the direction of transport (Y direction) of the manufacturing line 52! The track & is movably supported on the W track 15! The sliding portion 17 and the first driving unit (not shown) including the direct driving mechanism such as a motor or the like are driven along the first rail 15 to drive the first sliding portion 17. The first sliding portion 17 moves at a constant speed and can be stopped when the observer finds a defect. The predetermined speed causes the image captured by the camera 13 to be continuously reflected on the screen 5 to be confirmed by the observer. The movement of the extent of the 15 defects on the raft. In this case, when the observer determines that the defect is a defect, the image captured by the camera 13 is saved as a still image, and the coordinate position on the substrate 50 of the still image is obtained and saved as position information. In this way, the observer can save only the still image and the position information determined to be defective, and then use the remaining time as the result of the reconfirmation and verification. The first track 15 is a pair of parallel track members. The first rail 15 is located above the manufacturing line 52, and both end portions in the long-hand direction are supported by second moving mechanisms 9 which will be described later. Further, one of the first rails 15 is disposed in the transport direction of the manufacturing line 52 at intervals in the rail member, and supports both ends of the first sliding portion 17 of 12 200909798. The first sliding portion 17 is formed in a frame shape having a rectangular opening, and the illumination device 11 and the camera 13 are mounted on the two frame portions facing the X direction. Thereby, the illumination light 5 from the illumination device 11 is irradiated to the substrate 50 through the opening on the substrate 50 under the first sliding portion 17, and the reflected light from the surface of the substrate 50 is incident on the camera 13 through the opening, and the substrate 50 is taken. The image of the surface. Further, when the first sliding portion 17 is driven along the first rail 15, the illumination device η and the camera '13 are integrally moved in a direction orthogonal to the conveyance direction of the manufacturing line 52. The second moving mechanism 9 has a pair of base portions 19 disposed along the transport direction of the manufacturing line 52, and a second rail 21 attached to the base portion 19, and is movable on the second rail 21 and supported The second sliding portion 23 and the second driving device (not shown) including the linear driving mechanism such as a linear motor that moves the second sliding portion 23 along the second rail 21 . The base portion 19 is parallel to the substrate transfer path of the manufacturing line 52 and disposed on both sides of the substrate. Further, the base portion 19 can be adjusted to the upper and lower adjustment positions in accordance with the substrate conveyance height of the manufacturing line 52. Thereby, the height of the inspection device unit 3 can be adjusted, and the focus position of the camera 13 is most suitable for the substrate 50 that is transported by the substrate transport path conveyor μ. The second track 21 is a pair of parallel track members. The second rail 21 is mounted along the upper end surface of the bottom portion 19 of the base 2 so as to be parallel to the conveying direction of the manufacturing line 52. The second sliding portion 23 is a plate-shaped member ′ having a length equal to the width between the first rails 15 and the both ends of the first rail 15 in the long-hand direction are attached to the second sliding portion 23, respectively. In other words, the first moving mechanism 7 and the second moving mechanism 9 are combined to each other and are configured to move the inspection device unit 3 in the second dimension direction in the XY direction. As a result, the inspection device unit 3 moves in the direction intersecting the conveyance direction of the manufacturing line 52 by the operation of the first moving mechanism 7, and moves to the manufacturing line 5 52 at predetermined intervals by the operation of the second moving mechanism 9. The transport direction is moved, whereby the substrate 50 can be completely snaked to the left and right at predetermined intervals. Further, the substrate appearance inspection device 1 of the present embodiment is provided with an X scale and a Υ scale as in the first lane 15 and the second rail 21, respectively, and the coordinates of the inspection device unit 3 read by the scales are used. The center position of the image displayed on the screen 5 is recorded in the memory portion corresponding to the coordinates on the substrate 50. Moreover, the position coordinates of the defect (ie, the X-direction distance and the γ-direction distance) can be calculated by specifying the center position of the defect in the image by an indicator (not shown), and the coordinates corresponding to the substrate 50 are memorized. Memory department. The operation of the substrate appearance inspection device 15 1 of the present embodiment configured as above will be described below. When the substrate 5 to be transported on the manufacturing line 52 is inspected by the substrate appearance inspection device 1 of the present embodiment, the substrate appearance inspection device 首先 is first placed at any position of the manufacturing line 52. For example, as shown in Fig. 4, the first manufacturing apparatus 56 transports the substrate 50 2 to the manufacturing line 52 of the second manufacturing apparatus 58, and the substrate transport path has a corner portion bent by about 90°. Positions 60, 62, and 64 are provided, and the base portion 丨9 is disposed on both sides of the manufacturing line 52 at a position where the substrate 50 is linearly moved to the production line, so that the first rail 15 straddles the substrate transport direction with the manufacturing line 52. Hand in the direction. 200909798 Further, for example, the substrate 50 carried out by the manufacturing apparatus that applies the resist on the substrate 5 is transported to the manufacturing apparatus installed in the next manufacturing process by the conveyor 54 that manufactures the production line 52. Among them, the substrate 5 that has been transported is temporarily stopped in the inspection area of the substrate visual inspection device 1. And the inspection device is 5 yuan 3 as shown by the arrow A in FIG. 1 , and is moved as Raster Scan, and then the illumination device is illuminated by the illumination device on the entire surface of the substrate 5 , and The camera 13 captures a surface image of the substrate 5. For example, as shown in Fig. 4, when the substrate visual inspection device 丨 is provided at the installation positions 6A, 64 of the carry-out side or the carry-in side of each of the manufacturing apparatuses 56, 58, 1感 By detecting a position detector (not shown) provided in the gap of the conveyor 54 for the substrate conveyance path, when the substrate 5 is detected to be moved into the inspection area, the driving of the conveyor 54 is stopped, and the substrate 50 is stopped. It is installed in the inspection area of the substrate appearance inspection device 1 at the installation positions 60, 64. Then, by the operation of the first movement mechanism 7, the inspection device unit 3 is reciprocated in the direction orthogonal to the substrate conveyance direction of the manufacturing line 52. By moving, the entire short-side direction of the substrate 50 can be observed in detail. Further, by the action of the second moving mechanism 9, the second-moving mechanism 7 is moved to a manufacturing space with a width slightly shorter than the irradiation width of the illumination range. When the conveyance direction of the line 5 2 is moved, the entire longitudinal direction of the substrate 5 is observed in detail. 2. As shown in Fig. 4, when the substrate appearance inspection device 1 is installed at the installation position 62, the substrate is transported. 50 will be conveyed in a state where the setting position is 6 turns by about 9 inches. That is, the substrate 5 is not in the corner portion of the conveyance line, and the direction of movement is changed by about 9 inches. Therefore, the conveyance is performed. The direction of the substrate 50 of the substrate appearance inspection device 1 at the position 60 is transferred to the substrate visual inspection device 设置 at a position of rotation of about 15 200909798 9 〇. Next, the substrate 50 is stopped at the installation position of the manufacturing line 52. Then, by the operation of the first moving mechanism 7, the inspection apparatus unit 3 reciprocates the transported rectangular substrate 50 in a direction orthogonal to the substrate transport direction 5 of the manufacturing line 52, thereby allowing detailed observation. The entire lengthwise direction of the substrate 50. Further, by the operation of the second moving mechanism 9, the second moving mechanism 7 is moved toward the manufacturing line 5 at a shorter interval than the irradiation width of the illumination range. When the conveyance direction is moved, the entire short side direction of the substrate 5A can be observed in detail. Thus, the direction in which the rectangular patterns are formed on the surface of the substrate 50 can be approximately 90 degrees from the installation position 60 and the installation position 62. Illumination photography can inspect the surface defects of the substrate 50 in more detail. Thus, the surface image of the substrate 50 which is completely scanned by the camera 13 is displayed on the screen 5, and the visual inspection of the substrate 50 is performed by visual observation by the observer. Therefore, even if the substrate 50 is enlarged, detailed inspection of the entire substrate 5 can be easily performed. In this case, as shown in Fig. 3, the camera 13 is located outside the range of the beam of the specular reflected light reflected by the substrate 5 Support, so the illumination light of the camera 13 is not incident and saturated, and a high-precision image can be achieved. Therefore, the observer 20 can observe the substrate 5 of the entire image displayed on the screen 5 well. Further, since the position of the center position 25 of the image displayed on the screen 5 and the position of the defect 27 correspond to the coordinates on the substrate 50 in the memory portion, the coordinates of the defect 27 can be read by other inspection devices such as a microscopic observation device. 'Through this review. 16200909798 As described above, the substrate appearance inspection device 1 according to the present embodiment can be easily installed in the substrate transfer space of the existing manufacturing line, and can be easily placed in the width direction orthogonal to the substrate transfer direction of the manufacturing line 52, and The macroscopic inspection of the substrate 50 can be performed in the manufacturing production line 5 without taking the substrate 50 out of the manufacturing line 52. Therefore, in the substrate transfer path of the manufacturing line 52, the surface image of the substrate 50 displayed on the screen 5 is subjected to a giant inspection, thereby eliminating the need for a substrate removal mechanism for transporting the substrate outside the manufacturing line. The device can shorten the working time. Moreover, the space above the manufacturing line 52 can be effectively utilized to achieve the simplification of the manufacturing equipment. Further, since the substrate appearance inspection device 1 is disposed along the substrate conveyance path of the existing manufacturing line 52, the substrate appearance inspection device 1 can be simply attached to the already constructed manufacturing line 52. Further, although the substrate appearance inspection device 1 of the present embodiment has the first 15 movement mechanism 7 and the second movement mechanism 9, the first movement mechanism 7 may be provided instead, and the second movement mechanism 9 may be used as the transfer substrate. The transporter of the 5" can thereby observe the entire transport direction of the substrate 50 in detail. Moreover, by omitting the second moving mechanism 9, the substrate appearance inspection device 1 can be made lighter. Further, for example, the substrate appearance inspection device 1 of the present embodiment is visually inspected by the glory screen 2 2, but the defect detected on the upstream side can be further enlarged and detailed in the downstream side of the substrate appearance inspection device 1巨The macroscopic inspection device for detailed inspection uses the giant inspection to obtain the coordinates of the defect' and based on the position information of the defect, the microscopic inspection device is used to inspect the defect in detail. 17 200909798 [Second Embodiment] Next, a substrate appearance inspection device 31 according to a second embodiment of the present invention will be described with reference to Figs. 5 and 6 . The inspection device unit 3 5 of the substrate appearance inspection device 31 of the present embodiment has a guide portion (rotation mechanism) 33. In the following, the same components as those of the substrate appearance inspection device 1 of the first embodiment are denoted by the same reference numerals, and their description will be omitted. The guiding portion 33 rotates the camera 13 such that the optical axis of the camera 13 is often directed toward the center 10 position 35 of the illumination range on the substrate 5 of the illumination light illuminated by the illumination device 11. More specifically, the guide portion 33 is a semi-arc-shaped track, and the camera 14 is movably mounted along the guide portion 33. Further, the guiding portion 33 gradually reduces the angle between the optical axis of the camera 13 and the substrate 50 so as to be inclined at an angle of about 45 with respect to the substrate 50 at the reflection direction side of the illumination light. Thereby, as shown in Fig. 6, 'about 18 绕 around the center position 35. Within the range 15, the camera 13 can be rotated in a state of being tilted by about 45 degrees. By doing so, for example, as the camera position 13 A ' 13 B, 13 c, the viewpoint of the camera 13 is changed to perform the inspection of the substrate 50. Therefore, the observer can observe the direct view of the substrate 50 by a visual observer who is inclined to tilt the head to the left and right. Further, as shown in FIG. 7, the second guiding portion 37 for arbitrarily changing the angle of the optical axis of the camera 13 to the reflection axis of the illumination light to the substrate 50 can be attached to the guiding portion 33, and the camera 13 can be attached. The movement in the height direction serves as a guide. As shown in FIGS. 6 and 7, the center position of the illumination range of the illumination light is used as a rotation fulcrum, and the camera 13 is rotated in the left-right direction and the front-back direction by 18 200909798, and the viewpoint can be changed by the multi-directional direction of the substrate 50. The camera 13 performs photography and can improve the accuracy of detecting defects on the substrate 50. The embodiments of the present invention are described in detail with reference to the drawings, and the specific configuration is not limited to the embodiments, and modifications are also included without departing from the scope of the invention. For example, the base portion 19 of the substrate transfer apparatuses 1 and 31 of the above-described respective embodiments may be formed to have a shape that straddles the width direction of the manufacturing line 52. Thus, as shown in the arrangement position of Fig. 4, the substrate transfer apparatuses 1, 31 can be provided at the corner portions 66, 68 of the manufacturing line 52. Therefore, in the past, the substrate visual inspection devices 1 and 31 can be provided on the substrate loading side and the substrate carrying-out side of the portion of the manufacturing line 52 of the blind spot 10, and the substrate appearance inspection devices i and 31 can be constructed without being subjected to the manufacturing line 52. The shape can further effectively utilize the space above the manufacturing line 52 and achieve the lightness of the manufacturing equipment. Further, the inspection field of the illumination scanning field of the inspection apparatus unit 3 can be taken as an air floating stage in which the substrate 50 is floated by a predetermined height by the roller conveyor. At this time, in order to ensure that the floating height of the substrate 5 is fixed, a discharge hole for discharging air and a suction hole for sucking air are provided on the upper surface of the stage, and the substrate 50 is floated by the discharge pressure and the suction pressure of the air. A certain height. Thus, by floating the substrate 50, the substrate can be completely supported without contact, so that the effect of the background caused by the inside and outside of the transparent substrate can be reduced as in the case of the mother glass, and the detection of a substance suspected of defects can be prevented. [Simple Tree* Ming] Figure 1 shows the first part of the invention from above! Substrate appearance inspection of the embodiment 19 200909798 A schematic diagram of the inspection apparatus. Fig. 2 is a side view showing the substrate visual inspection device of Fig. 1. Fig. 3 is a schematic view showing an inspection apparatus unit of the substrate visual inspection device of Fig. 1. 5 Fig. 4 is a schematic view showing a manufacturing line of a substrate. Fig. 5 is a schematic view showing a guide portion of a substrate appearance inspection device according to a second embodiment of the present invention. Fig. 6 is a view showing the inspection device unit of the substrate visual inspection device of Fig. 5. 10 Fig. 7 is a schematic view showing a modification of the guide portion of Fig. 5. [Description of main component symbols] 1...Substrate appearance inspection device 23., .. 2nd sliding portion 3...Inspection device unit 25., ..image center position 5...The curtain 27., .. defect 7...first moving mechanism 31·..substrate inspection device 9...second moving mechanism 33..·guide unit 11...illumination device (illumination unit) 35...center position 13...camera (photographing unit) 37. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . Conveyor 19...base portion 56·..first manufacturing device 21.·second track 58...second manufacturing device 20 200909798 60,62,64...set position A...arrow 66,68 ...corner 21