JP2009014617A5 - - Google Patents

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Publication number
JP2009014617A5
JP2009014617A5 JP2007178772A JP2007178772A JP2009014617A5 JP 2009014617 A5 JP2009014617 A5 JP 2009014617A5 JP 2007178772 A JP2007178772 A JP 2007178772A JP 2007178772 A JP2007178772 A JP 2007178772A JP 2009014617 A5 JP2009014617 A5 JP 2009014617A5
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JP
Japan
Prior art keywords
substrate
inspection apparatus
moving mechanism
board
unit
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Pending
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JP2007178772A
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Japanese (ja)
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JP2009014617A (en
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Priority to JP2007178772A priority Critical patent/JP2009014617A/en
Priority claimed from JP2007178772A external-priority patent/JP2009014617A/en
Priority to TW097122167A priority patent/TW200909798A/en
Priority to KR1020080063316A priority patent/KR20090004636A/en
Priority to CNA2008101281276A priority patent/CN101339143A/en
Publication of JP2009014617A publication Critical patent/JP2009014617A/en
Publication of JP2009014617A5 publication Critical patent/JP2009014617A5/ja
Pending legal-status Critical Current

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Claims (15)

基板製造ラインの基板搬送路により搬送される基板の表面に照明光を照射する照明部と、
前記照明部により照射された前記基板の表面撮影する撮影部と、
前記基板搬送路の前記基板の搬送方向に交差する方向に前記照明部および前記撮影部を一体に往復移動させる第1の移動機構と、
前記第1の移動機構または前記基板を前記基板の搬送方向に移動させる第2の移動機構とを備え、
前記照明部及び撮影部と前記基板を相対移動させて、前記撮像部により前記基板全面を撮影することを特徴とする基板外観検査装置。
An illumination unit that irradiates illumination light onto the surface of the substrate conveyed by the substrate conveyance path of the substrate production line;
A photographing unit for photographing the surface of the substrate illuminated by the illumination unit,
A first moving mechanism for integrally reciprocating the illumination unit and the imaging unit in a direction intersecting the substrate transport direction of the substrate transport path ;
A second moving mechanism for moving the first moving mechanism or the substrate in the transport direction of the substrate;
The board | substrate external appearance inspection apparatus characterized by moving the said illumination part and imaging | photography part, and the said board | substrate relatively, and image | photographing the said whole board | substrate by the said imaging part .
前記照明部は、照明光軸が前記基板面に対して傾くように配置され、前記撮影部は、前記照明部により照射された前記基板の照射範囲に対して光軸を傾けて配置されることを特徴とする請求項1に記載の基板外観検査装置。The illumination unit is arranged so that an illumination optical axis is inclined with respect to the substrate surface, and the imaging unit is arranged with an optical axis inclined with respect to an irradiation range of the substrate irradiated by the illumination unit. The board | substrate visual inspection apparatus of Claim 1 characterized by these. 前記撮影部は、前記照明部により照射される基板の照射範囲の中心を回転支点にして回動する回動機構を備えたことを特徴とする請求項1又は2に記載の基板外観検査装置。3. The substrate appearance inspection apparatus according to claim 1, wherein the imaging unit includes a rotation mechanism that rotates about a center of an irradiation range of the substrate irradiated by the illumination unit as a rotation fulcrum. 前記撮影部は、前記前記照明部により照射される基板の照射範囲の中心を向くように回動することを特徴とする請求項1又は2に記載の基板外観検査装置。3. The substrate appearance inspection apparatus according to claim 1, wherein the imaging unit rotates so as to face the center of an irradiation range of the substrate irradiated by the illumination unit. 前記撮影部は、撮影位置を回転支点にして回動することを特徴とする請求項1又は2に記載の基板外観検査装置。The board appearance inspection apparatus according to claim 1, wherein the imaging unit rotates about an imaging position as a rotation fulcrum. 前記撮像部は、撮影位置を回転支点にして回動する回動機構と、前記基板の表面を拡大するズーム機構とを有し、前記回動機構により前記基板上の欠陥が視野内に入るように前記撮影部を回動させることを特徴とする請求項1又は2に記載の基板外観検査装置。The imaging unit includes a rotation mechanism that rotates around a photographing position as a rotation fulcrum, and a zoom mechanism that expands the surface of the substrate, so that defects on the substrate enter the field of view by the rotation mechanism. The board appearance inspection apparatus according to claim 1, wherein the photographing unit is rotated. 前記撮像部は、前記基板の表面を拡大するズーム機構を有し、前記ズーム機構により拡大して撮影した画像を記憶部に記憶することを特徴とする請求項1又は2に記載の基板外観検査装置。The substrate appearance inspection according to claim 1, wherein the imaging unit includes a zoom mechanism that enlarges a surface of the substrate, and stores an image that is enlarged and photographed by the zoom mechanism in a storage unit. apparatus. 前記撮像部により前記基板の照射範囲を撮影した画像の座標位置と、前記ズーム機構により拡大して撮影した画像の座標位置とを前記基板の座標位置に対応付けて記憶部に記憶することを特徴とする請求項7に記載の基板外観検査装置。A coordinate position of an image obtained by photographing the irradiation range of the substrate by the imaging unit and a coordinate position of an image photographed by the zoom mechanism are stored in the storage unit in association with the coordinate position of the substrate. A substrate visual inspection apparatus according to claim 7. 前記撮像部により前記基板の照射範囲を撮影した画像と、前記基板の照射範囲を撮影した画像の座標位置を前記基板の座標位置に対応付けて記憶部に記憶することを特徴とする請求項1又は2に記載の基板外観検査装置。2. An image obtained by photographing the irradiation range of the substrate by the imaging unit and a coordinate position of an image obtained by photographing the irradiation range of the substrate are stored in the storage unit in association with the coordinate position of the substrate. Or the board | substrate external appearance inspection apparatus of 2. 前記撮像部により撮影された画像を表示するモニタと、前記モニタ上に表示された前記画像中の欠陥位置を指定するポインタとを備え、前記ポインタで指定した欠陥の座標を前記基板の座標に対応付けて記憶部に記憶することを特徴とする請求項1又は2に記載の基板外観検査装置。A monitor for displaying an image photographed by the imaging unit; and a pointer for designating a defect position in the image displayed on the monitor, wherein the coordinates of the defect designated by the pointer correspond to the coordinates of the substrate The board appearance inspection apparatus according to claim 1, wherein the board appearance inspection apparatus is stored in a storage unit. 前記撮像部により撮影された画像を表示するモニタを備え、前記第1の移動機構は、モニタ上に表示される画像が観察者により確認できる流れとなるように前記撮像部を一定の速度で移動させるとともに、前記観察者が欠陥を発見した位置に前記撮像部を停止させることを特徴とする請求項1又は2に記載の基板外観検査装置。A monitor that displays an image captured by the imaging unit is provided, and the first moving mechanism moves the imaging unit at a constant speed so that an image displayed on the monitor can be confirmed by an observer. The board appearance inspection apparatus according to claim 1, wherein the imaging unit is stopped at a position where the observer has found a defect. 前記第1の移動機構と前記第2の移動機構は、互いに直交するように組み合わされたXYステージで構成され、前記第2に移動機構は、前記製造ラインの基板搬送路の両側に沿って配置され高さ調整が可能なベース上に取り付けられることを特徴とする請求項1に記載の基板外観検査装置。The first moving mechanism and the second moving mechanism are configured by XY stages combined so as to be orthogonal to each other, and the second moving mechanism is disposed along both sides of the substrate conveyance path of the production line. The board visual inspection apparatus according to claim 1, wherein the board visual inspection apparatus is mounted on a base whose height is adjustable. 前記第1の移動機構は、前記製造ラインの搬送方向と交差する方向に前記基板搬送路を跨ぐように架け渡される一対の第1のレールと、前記第1のレールに移動可能に設けられ前記照明部と前記撮影部を搭載する第1のスライダと、前記第1のスライダを前記第1のレールに沿って移動させる第1の駆動装置とを備え、  The first moving mechanism is provided movably on the first rail and a pair of first rails spanned across the substrate transport path in a direction intersecting the transport direction of the production line. A first slider on which the illumination unit and the photographing unit are mounted; and a first driving device that moves the first slider along the first rail;
前記第2に移動機構は、前記基板を搬送方向に搬送する基板搬送路を兼用したことを特徴とする請求項1に記載の基板外観検査装置。The substrate visual inspection apparatus according to claim 1, wherein the second moving mechanism also serves as a substrate conveyance path for conveying the substrate in a conveyance direction.
前記第1の移動機構は、前記製造ラインの搬送方向と交差する方向に前記基板搬送路を跨ぐように架け渡される一対の第1のレールと、前記第1のレールに移動可能に設けられ前記照明部と前記撮影部を搭載する第1のスライダと、前記第1のスライダを前記第1のレールに沿って移動させる第1の駆動装置とを備え、The first moving mechanism is provided movably on the first rail and a pair of first rails spanned across the substrate transport path in a direction intersecting the transport direction of the production line. A first slider on which the illumination unit and the photographing unit are mounted; and a first driving device that moves the first slider along the first rail;
前記第2の移動機構は、前記製造ラインの基板搬送路の両側に沿って配置される一対の第2のレールと、前記第2のレールに移動可能に設けられ前記第1の移動機構を搭載する第2のスライダと、前記第1のスライダを前記第2のレールに沿って移動させる第2の駆動装置とを備え、The second moving mechanism is provided with a pair of second rails arranged along both sides of the substrate conveyance path of the manufacturing line, and the first moving mechanism mounted on the second rail so as to be movable. A second slider for moving the first slider along the second rail, and a second driving device for moving the first slider along the second rail,
前記製造ラインの基板搬送路の両側に沿って配置され高さ調整が可能なベース上に前記第2のレールを取り付けたことを特徴とする請求項1に記載の基板外観検査装置。The board appearance inspection apparatus according to claim 1, wherein the second rail is mounted on a base that is arranged along both sides of the board conveyance path of the manufacturing line and capable of height adjustment.
基板製造ラインの基板搬送路は、前記基板を回転させず搬送方向を90°変えて搬送するコーナ部分を有し、前記90°に折り曲げられた前記コーナ部分の搬入側の基板搬送路及び搬出側の基板搬送路にそれぞれ前記第1の移動機構を設置し、一方の基板搬送路に設置された第1の移動機構に搭載された前記撮影部と、 他方の基板搬送路に設置された第1の移動機構に搭載された前記撮影部により前記基板に形成された長方形のパターンの配列方向に対して90°の異なった方向から撮影することを特徴とする請求項1に記載の基板外観検査装置。The substrate transport path of the substrate production line has a corner portion that transports the substrate by changing the transport direction by 90 ° without rotating the substrate, and the substrate transport path and the unload side on the carry-in side of the corner portion bent at 90 ° The first moving mechanism is installed in each of the substrate transfer paths, the imaging unit mounted on the first moving mechanism installed in one of the substrate transfer paths, and the first installed in the other substrate transfer path The board appearance inspection apparatus according to claim 1, wherein the imaging unit mounted on the moving mechanism performs imaging from a direction different from 90 ° with respect to an arrangement direction of the rectangular patterns formed on the substrate. .
JP2007178772A 2007-07-06 2007-07-06 Substrate visual inspection apparatus Pending JP2009014617A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007178772A JP2009014617A (en) 2007-07-06 2007-07-06 Substrate visual inspection apparatus
TW097122167A TW200909798A (en) 2007-07-06 2008-06-13 Appearance inspecting device for substrate
KR1020080063316A KR20090004636A (en) 2007-07-06 2008-07-01 Substrate surface inspection apparatus
CNA2008101281276A CN101339143A (en) 2007-07-06 2008-07-03 Appearance inspecting device for substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007178772A JP2009014617A (en) 2007-07-06 2007-07-06 Substrate visual inspection apparatus

Publications (2)

Publication Number Publication Date
JP2009014617A JP2009014617A (en) 2009-01-22
JP2009014617A5 true JP2009014617A5 (en) 2010-07-08

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JP2007178772A Pending JP2009014617A (en) 2007-07-06 2007-07-06 Substrate visual inspection apparatus

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JP (1) JP2009014617A (en)
KR (1) KR20090004636A (en)
CN (1) CN101339143A (en)
TW (1) TW200909798A (en)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101080216B1 (en) * 2009-02-17 2011-11-09 (주)글로벌 텍 Apparatus for inspecting glass edge and method for inspecting glass edge using thereof
JP5274389B2 (en) * 2009-06-18 2013-08-28 株式会社アルバック Maintenance device and discharge device
TW201118027A (en) * 2009-11-30 2011-06-01 Schmid Yaya Technology Co Ltd Chip transporting machine table
US8432540B2 (en) * 2010-03-31 2013-04-30 Cooper S.K. Kuo Support mechanism for inspection systems
CN102680495B (en) * 2011-03-15 2016-09-07 上海赫立电子科技有限公司 Automatic optical detection device and method
KR20140022064A (en) * 2011-05-10 2014-02-21 아사히 가라스 가부시키가이샤 Method for inspecting minute defect of translucent board-like body, and apparatus for inspecting minute defect of translucent board-like body
CN102621149B (en) * 2012-03-21 2015-07-22 深圳市华星光电技术有限公司 Substrate detection device and method
US20130248692A1 (en) * 2012-03-21 2013-09-26 Shenzhen China Star Optoelectronics Technology Co Ltd. Detecting apparatus and method for substrate
CN102636498B (en) * 2012-03-22 2014-04-16 深圳市华星光电技术有限公司 Detection device and detection method for glass substrate
CN102866167A (en) * 2012-10-19 2013-01-09 深圳市劲拓自动化设备股份有限公司 Offline detecting system and method of circuit board
CN104568973A (en) * 2015-02-09 2015-04-29 京东方科技集团股份有限公司 Device and method for detecting substrate
CN105115979A (en) * 2015-09-09 2015-12-02 苏州威盛视信息科技有限公司 Image mosaic technology-based PCB working sheet AOI (Automatic Optic Inspection) method
JP6587211B2 (en) * 2015-12-17 2019-10-09 日本電気硝子株式会社 Manufacturing method of glass plate
KR101751801B1 (en) * 2016-05-18 2017-06-29 한국기계연구원 Defect inspecting device for substrate and inspecting method using the same
CN107884318B (en) * 2016-09-30 2020-04-10 上海微电子装备(集团)股份有限公司 Flat plate granularity detection method
CN106862097A (en) * 2017-03-27 2017-06-20 江苏凯伦铝业有限公司 Photovoltaic module aluminium frame full-automatic detection apparatus
FR3066821B1 (en) * 2017-05-24 2019-07-12 Areva Np DEVICE FOR DETECTING A DEFECT ON A SURFACE BY MULTIDIRECTIONAL LIGHTING
CN107843991A (en) * 2017-09-05 2018-03-27 努比亚技术有限公司 Detection method, system, terminal and the computer-readable recording medium of screen light leak
JP6795479B2 (en) * 2017-09-25 2020-12-02 株式会社Screenホールディングス Inspection equipment and inspection method
CN107526196A (en) * 2017-09-27 2017-12-29 武汉华星光电技术有限公司 Glass base-board load-bearing device and detection device
CN107907549A (en) * 2017-11-13 2018-04-13 武汉华星光电半导体显示技术有限公司 Inspecting substrate equipment and substrate inspecting method
JP2019158500A (en) * 2018-03-12 2019-09-19 オムロン株式会社 Visual inspection system, image processing device, imaging device, and inspection method
KR102374037B1 (en) * 2018-06-29 2022-03-11 캐논 톡키 가부시키가이샤 Subtrate inspection system, manufacturing system of electronic device, subtrate inspection method, and manufacturing method of electronic device
CN110783223B (en) * 2018-07-24 2024-04-16 泰克元有限公司 Imaging device for electronic component processing equipment
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Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10300446A (en) * 1997-04-30 1998-11-13 Nissan Motor Co Ltd Surface defect inspection device
JP2000039564A (en) * 1998-07-24 2000-02-08 Sony Corp Enlarging observation device
JP4744665B2 (en) * 2000-03-15 2011-08-10 オリンパス株式会社 Substrate inspection apparatus and substrate inspection system
JP2003075294A (en) * 2001-09-05 2003-03-12 Toray Ind Inc Method for inspecting substrate
WO2003027652A1 (en) * 2001-09-21 2003-04-03 Olympus Corporation Defect inspection apparatus
JP2003262593A (en) * 2002-03-08 2003-09-19 Mitsubishi Rayon Co Ltd Apparatus and method for detection of defect
JP4243837B2 (en) * 2003-03-14 2009-03-25 株式会社日立ハイテクノロジーズ Transparent substrate surface inspection method and inspection apparatus

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