TWI404571B - Maintenance apparatus and discharge apparatus - Google Patents
Maintenance apparatus and discharge apparatus Download PDFInfo
- Publication number
- TWI404571B TWI404571B TW99117940A TW99117940A TWI404571B TW I404571 B TWI404571 B TW I404571B TW 99117940 A TW99117940 A TW 99117940A TW 99117940 A TW99117940 A TW 99117940A TW I404571 B TWI404571 B TW I404571B
- Authority
- TW
- Taiwan
- Prior art keywords
- sub
- mobile station
- track
- moving
- discharge
- Prior art date
Links
- 238000012423 maintenance Methods 0.000 title claims abstract description 55
- 239000000758 substrate Substances 0.000 claims abstract description 86
- 239000007788 liquid Substances 0.000 claims abstract description 69
- 238000004140 cleaning Methods 0.000 claims abstract description 44
- 238000005286 illumination Methods 0.000 claims description 61
- 238000007689 inspection Methods 0.000 claims description 44
- 239000004744 fabric Substances 0.000 claims description 28
- 238000005259 measurement Methods 0.000 claims description 20
- 230000007246 mechanism Effects 0.000 claims description 17
- 238000003384 imaging method Methods 0.000 claims description 15
- 238000001514 detection method Methods 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000010408 sweeping Methods 0.000 abstract 2
- 239000000976 ink Substances 0.000 description 18
- 230000002950 deficient Effects 0.000 description 8
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 6
- 239000003086 colorant Substances 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Optical Filters (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
Description
本發明係關於吐出口的維修裝置及具有維修裝置之吐出裝置。 The present invention relates to a maintenance device for a discharge port and a discharge device having a maintenance device.
隨著近年來的資訊化社會的發展,更大型的液晶顯示裝置之需求提高,因此期望能提高其生產性。在彩色液晶顯示裝置,為了將顯示影像全彩化而使用濾色器。濾色器,是在基板上的既定區域以既定的圖案配置R(紅)、G(綠)、B(藍)這三色的墨水而製作出。 With the development of an information society in recent years, the demand for larger liquid crystal display devices has increased, and it is expected to improve productivity. In a color liquid crystal display device, a color filter is used in order to fully color the display image. The color filter is produced by arranging three colors of inks of R (red), G (green), and B (blue) in a predetermined pattern on a substrate.
以往,關於墨水的吐出,大多採用噴墨方式。在噴墨方式,吐出口周邊及內部的墨水會乾燥固化,或因灰塵附著在吐出口而使吐出口堵塞,如此般吐出口的附著物會造成阻礙而使墨水的降落精度變差。 Conventionally, an inkjet method has been used for the discharge of ink. In the inkjet method, the ink around the inside and outside of the discharge port is dried and solidified, or the dust is adhered to the discharge port to block the discharge port, and as a result, the deposit of the discharge port is hindered and the drop accuracy of the ink is deteriorated.
為了解決此課題,如專利文獻2及專利文獻3所記載的裝置那樣,必須具備檢測不良吐出口之檢查裝置及從不良吐出口將附著物除去之清掃裝置。 In order to solve this problem, as in the devices described in Patent Document 2 and Patent Document 3, it is necessary to provide an inspection device that detects a defective discharge port and a cleaning device that removes the deposit from the defective discharge port.
採用頭部移動方式(讓頭部以在基板上掃描的方式往復移動的狀態朝基板上吐出墨水)之專利文獻1所記載的裝置,可將專利文獻2所記載的檢查裝置和清掃裝置設置在與基板移動區域不同的場所,讓頭部移動至檢查裝置或清掃裝置上,來進行不良吐出口的檢查和清掃。 According to the apparatus described in Patent Document 1 in which the head moving method (the ink is ejected to the substrate in a state in which the head is reciprocated by scanning on the substrate), the inspection device and the cleaning device described in Patent Document 2 can be disposed. In a place different from the substrate moving area, the head is moved to the inspection device or the cleaning device to perform inspection and cleaning of the defective discharge port.
然而,依據頭部移動方式的裝置,隨著基板的大型化 造成墨水吐出花費更長的時間,且很難將頭部控制成能以均一之既定間隔來讓墨水降落。 However, depending on the device for moving the head, the size of the substrate increases. It takes longer to cause the ink to spit out, and it is difficult to control the head to allow the ink to land at a uniform interval.
為了對大型基板吐出墨水,必須採用頭部靜置方式,亦即讓複數個頭部靜止於基板移動區域上,在其下方讓基板通過而朝基板上吐出墨水。 In order to discharge ink onto a large substrate, it is necessary to use a head rest mode, that is, to have a plurality of heads rest on the substrate moving area, and to pass the substrate underneath and eject ink toward the substrate.
〔專利文獻1〕日本特開平11-248925號公報 [Patent Document 1] Japanese Patent Laid-Open No. Hei 11-248925
〔專利文獻2〕日本特開2003-191492號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2003-191492
〔專利文獻3〕日本特開2008-265321號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2008-265321
本發明是為了解決上述習知技術的問題點而開發完成的,其目的是針對在複數個頭部(相對於水平基準面呈靜止)下方讓基板通過以朝基板上吐出吐出液之吐出裝置,提供一種能進行各吐出口的檢查及清掃之維修裝置。 The present invention has been developed in order to solve the above problems of the prior art, and an object thereof is to provide a discharge device for allowing a substrate to pass through a discharge liquid toward a substrate under a plurality of heads (still with respect to a horizontal reference surface). A maintenance device capable of inspecting and cleaning each discharge port is provided.
為了解決上述課題,本發明之維修裝置,係沿著吐出裝置之主軌道移動的維修裝置;該吐出裝置,是將載置基板之基板載置台裝載於被固定成水平之主軌道上,讓前述基板載置台沿著前述主軌道移動而通過頭部保持部的下方,從設置於前述頭部保持部之複數個頭部的吐出口將吐出液的液滴朝前述基板載置台上的基板吐出而降落在基板上;前述維修裝置,係具備:裝載於前述主軌道上之第一移動台、讓前述第一移動台沿著前述主軌道移動之主移動裝置、配置在前述第一移動台上之載置台、讓前述載置台在前述第一移動台上移動之副移動機構、以及載置於前述載 置台上之檢查裝置;前述檢查裝置,係具備:朝向測定對象物照射照明光之照明裝置、以及拍攝被前述照明光照射後之前述測定對象物之攝影裝置;讓前述第一移動台移動至前述頭部保持部的下方後靜止,在前述第一移動台靜止的狀態下,讓前述載置台在前述第一移動台上移動,使前述攝影裝置的焦點配置在從前述頭部的各前述吐出口吐出之前述液滴的飛行路徑上時,前述照明裝置,從要拍攝的前述液滴之飛行路徑的側方朝向前述液滴照射前述照明光,前述攝影裝置,在朝向要拍攝的前述液滴照射之前述照明光的入射位置進行拍攝。 In order to solve the above problems, the maintenance device of the present invention is a maintenance device that moves along the main rail of the discharge device. The discharge device mounts the substrate mounting table on which the substrate is placed on the main rail that is fixed horizontally. The substrate mounting table moves along the main rail and passes under the head holding portion, and discharges the liquid droplets of the discharge liquid toward the substrate on the substrate mounting table from the discharge port provided in the plurality of head portions of the head holding portion. Floating on the substrate; the maintenance device includes: a first mobile station mounted on the main rail; a main mobile device that moves the first mobile station along the main rail; and is disposed on the first mobile station a mounting table, a sub-moving mechanism for moving the mounting table on the first mobile station, and a loading device The inspection apparatus is provided with: an illumination device that emits illumination light toward the measurement target; and an imaging device that images the measurement target after the illumination light is irradiated; and moves the first mobile station to the foregoing The lower side of the head holding portion is stationary, and the mounting table is moved on the first moving stage while the first moving stage is stationary, and the focus of the imaging device is placed on each of the discharge ports from the head. When the droplet is ejected on the flight path of the droplet, the illumination device irradiates the illumination light toward the droplet from the side of the flight path of the droplet to be imaged, and the imaging device irradiates the droplet toward the image to be imaged. The incident position of the illumination light is photographed.
本發明之維修裝置,係具備:根據前述液滴的攝影結果來判別吐出前述液滴的前述吐出口之良窳之控制裝置。 The maintenance device of the present invention includes a control device that determines the quality of the discharge port of the liquid droplet based on the result of the detection of the liquid droplet.
本發明之維修裝置,前述副移動機構係具備:固定在前述第一移動台上之直線狀的第一副軌道、在前述載置台和前述第一移動台之間裝載於前述第一副軌道上之第二移動台、讓前述第二移動台在前述第一移動台上沿著前述第一副軌道移動之第一副移動裝置、固定在前述第二移動台上之直線狀的第二副軌道、以及讓前述載置台在前述第二移動台上沿著前述第二副軌道移動之第二副移動裝置;前述第一副軌道和前述第二副軌道之任一方是配置成與前述主軌道平行,另一方配置成與前述主軌道垂直且呈水平。 In the maintenance device of the present invention, the sub-moving mechanism includes a linear first sub-track fixed to the first moving stage, and is mounted on the first sub-track between the mounting table and the first moving stage a second mobile station, a first sub-moving device for moving the second mobile station along the first sub-track on the first mobile station, and a second sub-track fixed to the second mobile station And a second sub-moving device that moves the aforementioned mounting table along the second sub-track on the second mobile station; one of the first sub-track and the second sub-track is disposed in parallel with the main rail The other side is configured to be perpendicular to the aforementioned main track and horizontal.
本發明之維修裝置,前述照明裝置係具備:發生前述照明光之光源、以及將從下方位置朝向上方送出之前述照明光反射成水平送出後朝向測定對象之前述液滴照射之第 一反射手段;前述攝影裝置係具備:將朝向前述液滴照射後之前述測定光予以反射成朝下方送出之第二反射手段、以及接收從前述第二反射手段送出之前述照明光並拍攝影像之攝影機。 In the maintenance device of the present invention, the illuminating device includes a light source that generates the illumination light, and the illumination light that is sent upward from the lower position and that is reflected horizontally and sent to the measurement target. a reflection means; the imaging device comprising: a second reflection means for reflecting the measurement light after the irradiation of the droplets to be sent downward; and receiving the illumination light sent from the second reflection means and capturing an image camera.
本發明之維修裝置,具有吸收吐出液之吸取布和讓前述吸取布沿鉛垂方向移動之昇降裝置的清掃裝置,是設置在前述載置台上;讓前述第一移動台移動至前述頭部保持部的下方後靜止,在前述第一移動台呈靜止的狀態下,讓前述載置台在前述第一移動台上移動,而使前述清掃裝置配置在前述頭部下方時,前述清掃裝置,是讓前述吸取布接觸前述吐出口,以將附著於前述吐出口之前述吐出液除去。 The maintenance device of the present invention has a cleaning device for absorbing the discharge liquid and a cleaning device for moving the suction cloth in the vertical direction, and is disposed on the mounting table; and moving the first moving table to the head to maintain The lower portion of the portion is stationary behind, and when the first moving table is stationary, the mounting table is moved on the first moving table, and when the cleaning device is disposed under the head, the cleaning device is The suction cloth contacts the discharge port to remove the discharge liquid adhering to the discharge port.
本發明之吐出裝置,是將載置基板之基板載置台裝載於被固定成水平之主軌道上,讓前述基板載置台沿著前述主軌道移動而通過頭部保持部的下方,從設置於前述頭部保持部之複數個頭部的吐出口將吐出液的液滴朝前述基板載置台上的基板吐出而降落在基板上;前述吐出裝置具有沿著前述主軌道移動之維修裝置;前述維修裝置,係具備:裝載於前述主軌道上之第一移動台、讓前述第一移動台沿著前述主軌道移動之主移動裝置、配置在前述第一移動台上之載置台、讓前述載置台在前述第一移動台上移動之副移動機構、以及載置於前述載置台上之檢查裝置;前述檢查裝置,係具備:朝向測定對象物照射照明光之照明裝置、以及拍攝被前述照明光照射後之前述測定對象物之攝 影裝置;讓前述第一移動台移動至前述頭部保持部的下方後靜止,在前述第一移動台靜止的狀態下,讓前述載置台在前述第一移動台上移動,使前述攝影裝置的焦點配置在從前述頭部的各前述吐出口吐出之前述液滴的飛行路徑上時,前述照明裝置,從要拍攝的前述液滴之飛行路徑的側方朝向前述液滴照射前述照明光,前述攝影裝置,在朝向要拍攝的前述液滴照射之前述照明光的入射位置進行拍攝。 In the discharge device of the present invention, the substrate mounting table on which the substrate is placed is mounted on the main rail that is fixed horizontally, and the substrate mounting table is moved along the main rail to pass under the head holding portion, and is provided from the above-mentioned The discharge port of the plurality of heads of the head holding portion discharges the liquid droplets of the discharge liquid onto the substrate on the substrate mounting table and falls onto the substrate; the discharge device has a maintenance device that moves along the main rail; and the maintenance device The first mobile station mounted on the main rail, the main mobile device that moves the first mobile station along the main rail, the mounting table disposed on the first mobile station, and the mounting table a sub-moving mechanism that moves on the first mobile station and an inspection device that is placed on the mounting table; the inspection device includes an illumination device that emits illumination light toward the measurement object, and the illumination device is irradiated with the illumination light Photograph of the aforementioned measurement object a moving device that moves the first mobile station below the head holding portion and then rests, and moves the positioning table on the first mobile station while the first mobile station is stationary, so that the imaging device When the focus is placed on the flight path of the liquid droplets discharged from the respective discharge ports of the head portion, the illumination device irradiates the illumination light toward the liquid droplet from the side of the flight path of the liquid droplet to be imaged. The photographing device photographs an incident position of the illumination light that is irradiated toward the liquid droplet to be imaged.
本發明之吐出裝置,是在前述維修裝置設置:根據前述液滴的攝影結果來判別吐出前述液滴的前述吐出口之良窳之控制裝置。 In the discharge device of the present invention, the maintenance device is provided with a control device for discriminating the discharge port of the liquid droplet based on the result of the detection of the liquid droplet.
本發明之吐出裝置,前述副移動機構係具備:固定在前述第一移動台上之直線狀的第一副軌道、在前述載置台和前述第一移動台之間裝載於前述第一副軌道上之第二移動台、讓前述第二移動台在前述第一移動台上沿著前述第一副軌道移動之第一副移動裝置、固定在前述第二移動台上之直線狀的第二副軌道、以及讓前述載置台在前述第二移動台上沿著前述第二副軌道移動之第二副移動裝置;前述第一副軌道和前述第二副軌道之任一方是配置成與前述主軌道平行,另一方配置成與前述主軌道垂直且呈水平。 In the discharge device of the present invention, the sub-moving mechanism includes a linear first sub-track fixed to the first moving stage, and is mounted on the first sub-track between the mounting table and the first moving stage a second mobile station, a first sub-moving device for moving the second mobile station along the first sub-track on the first mobile station, and a second sub-track fixed to the second mobile station And a second sub-moving device that moves the aforementioned mounting table along the second sub-track on the second mobile station; one of the first sub-track and the second sub-track is disposed in parallel with the main rail The other side is configured to be perpendicular to the aforementioned main track and horizontal.
本發明之吐出裝置,前述照明裝置係具備:發生前述照明光之光源、以及將從下方位置朝向上方送出之前述照明光反射成水平送出後朝向測定對象之前述液滴照射之第一反射手段;前述攝影裝置係具備:將朝向前述液滴照射 後之前述測定光予以反射成朝下方送出之第二反射手段、以及接收從前述第二反射手段送出之前述照明光並拍攝影像之攝影機。 In the discharge device of the present invention, the illumination device includes: a light source that generates the illumination light; and a first reflection means that reflects the illumination light that is sent upward from the lower position and that is emitted horizontally and then irradiates the droplet to the measurement target; The photographing apparatus is provided to: illuminate the droplets toward the droplet Thereafter, the measurement light is reflected as a second reflection means that is sent downward, and a camera that receives the illumination light sent from the second reflection means and captures an image.
本發明之吐出裝置,前述維修裝置係具備:具有吸收吐出液之吸取布和讓前述吸取布沿鉛垂方向移動之昇降裝置的清掃裝置,前述清掃裝置是設置在前述載置台上;讓前述第一移動台移動至前述頭部保持部的下方後靜止,在前述第一移動台呈靜止的狀態下,讓前述載置台在前述第一移動台上移動,而使前述清掃裝置配置在前述頭部下方時,前述清掃裝置,是讓前述吸取布接觸前述吐出口,以將附著於前述吐出口之前述吐出液除去。 In the discharge device of the present invention, the maintenance device includes: a suction cloth having a suction cloth for absorbing the discharge liquid; and a cleaning device for moving the suction cloth in the vertical direction, wherein the cleaning device is provided on the mounting table; a moving table moves to the lower side of the head holding portion and then is stationary. When the first moving table is stationary, the mounting table is moved on the first moving table, and the cleaning device is placed in the head. In the case of the cleaning device, the suction cloth is brought into contact with the discharge port to remove the discharge liquid adhering to the discharge port.
由於根據吐出液的液滴來判斷吐出口的良窳,不須像以往那樣朝試驗基板進行吐出,可省去試驗基板的成本。 Since the discharge of the discharge port is judged based on the droplets of the discharge liquid, it is not necessary to discharge the test substrate as in the related art, and the cost of the test substrate can be eliminated.
只要在檢測出不良吐出口之後進行清掃而使吐出口復原即可,不須更換頭部,可省去更換頭部的成本和更換所需的時間。 It is only necessary to clean the discharge port after detecting the defective discharge port, and it is not necessary to replace the head, and the cost of replacing the head and the time required for replacement can be omitted.
第1圖係顯示本發明的吐出裝置70之俯視圖,第5圖係側視圖。 Fig. 1 is a plan view showing a discharge device 70 of the present invention, and Fig. 5 is a side view.
吐出裝置70係具備:靜止於水平基準面上的台座71、固定在台座71上之直線狀的主軌道72、保持複數個頭部81之頭部保持部80、可載置基板95之基板移動部90 、判斷設置於頭部81底面之吐出口82的良窳且將附著於吐出口82之吐出液予以除去之維修裝置10。 The discharge device 70 includes a pedestal 71 that is stationary on a horizontal reference surface, a linear main rail 72 that is fixed to the pedestal 71, a head holding portion 80 that holds a plurality of head portions 81, and a substrate movement on which the substrate 95 can be placed. Department 90 The maintenance device 10 that removes the discharge port 82 provided on the bottom surface of the head portion 81 and removes the discharge liquid adhering to the discharge port 82 is determined.
以後,將沿著主軌道72的方向稱為Y方向,將與Y方向垂直的方向稱為X方向。第1圖的符號1、2分別表示X、Y方向。 Hereinafter, the direction along the main track 72 will be referred to as the Y direction, and the direction perpendicular to the Y direction will be referred to as the X direction. Symbols 1 and 2 in Fig. 1 indicate the X and Y directions, respectively.
基板移動部90和維修裝置10是配置在主軌道72上。 The substrate moving portion 90 and the maintenance device 10 are disposed on the main rail 72.
頭部保持部80,是被固定在台座71上的支柱73所支承,在主軌道72上,配置在比基板移動部90和維修裝置10雙方更高的位置。 The head holding portion 80 is supported by a stay 73 fixed to the pedestal 71, and is disposed on the main rail 72 at a position higher than both the substrate moving portion 90 and the maintenance device 10.
頭部保持部80具有複數個頭部81,在各頭部81的底面設有複數個吐出口82,在各頭部81內,將吐出口82配置成複數列的與X方向平行的吐出口列83。 The head holding portion 80 has a plurality of head portions 81, and a plurality of discharge ports 82 are provided on the bottom surface of each of the head portions 81. In each of the head portions 81, the discharge ports 82 are arranged in a plurality of rows of discharge ports parallel to the X direction. Column 83.
一個頭部81中的吐出口82是沿著X方向等間隔地配置,設其間隔為吐出口間隔(吐出口的中心間距離)D,各頭部81的吐出口間隔D彼此是相等的。 The discharge ports 82 in the one head 81 are arranged at equal intervals in the X direction, and the interval is the discharge port interval (the distance between the centers of the discharge ports) D, and the discharge port intervals D of the respective head portions 81 are equal to each other.
關於各頭部81,頭部81之X方向的長度,是形成比端部的吐出口82中心間之X方向距離加上吐出口間隔D的長度更大,因此,若將複數個頭部81排列成與X方向平行的一列,且Y方向的位置相同,位於一個頭部81的端部之吐出口82、和位於鄰接的頭部81的端部之吐出口82間之X方向距離,是隔著比吐出口間隔D更大的距離。 Regarding each of the head portions 81, the length of the head portion 81 in the X direction is larger than the length of the X-direction distance between the centers of the discharge ports 82 of the end portions and the discharge port spacing D. Therefore, if a plurality of heads 81 are provided Arranged in a row parallel to the X direction, and the position in the Y direction is the same, and the X-direction distance between the discharge port 82 at the end of one head 81 and the discharge port 82 at the end of the adjacent head 81 is A greater distance than the spout exit interval D.
在本發明,沿著X方向排列之複數個頭部81,以在 不同的頭部81之端部的吐出口82間之X方向距離也成為吐出口間隔D的方式,將鄰接的頭部81之吐出口82配置在Y方向不同的位置,又鄰接的頭部81的端部在X方向重疊,包含不同頭部81的吐出口82間,將各吐出口82配置成在X方向隔著吐出口間隔D排列。 In the present invention, a plurality of heads 81 are arranged along the X direction to The X-direction distance between the discharge ports 82 at the end portions of the different head portions 81 also serves as the discharge port spacing D, and the discharge ports 82 of the adjacent head portions 81 are disposed at positions different in the Y direction, and the adjacent head portions 81 are provided. The end portions overlap in the X direction, and include the discharge ports 82 of the different head portions 81, and the discharge ports 82 are arranged to be arranged in the X direction via the discharge port interval D.
在此情況,沿著X方向排列的複數個頭部81,可交互配置在Y方向的兩種位置上,如此般配置的一組複數個頭部81,是呈鋸齒狀排列而構成一頭部組84。 In this case, the plurality of heads 81 arranged along the X direction can be alternately arranged at two positions in the Y direction, and a plurality of sets of the heads 81 arranged in this manner are arranged in a zigzag manner to form a head. Group 84.
既定數目(n)的頭部組84是構成頭部群85,在一個頭部群85中,在一個頭部組84之鄰接的兩個吐出口82間,其他頭部組的吐出口82是在X方向以等間隔D/n的方式逐一配置。 A predetermined number (n) of head groups 84 constitutes a head group 85, and in one head group 85, between two adjacent discharge ports 82 of one head group 84, the discharge ports 82 of the other head groups are They are arranged one by one in the X direction at equal intervals of D/n.
頭部保持部80具有未圖示的墨水槽,在各墨水槽貯藏R、G、B三色當中的一色墨水(吐出液)。各頭部81之每個頭部群85連接於一個墨水槽。 The head holding portion 80 has an ink tank (not shown), and stores one color ink (discharge liquid) among the three colors of R, G, and B in each ink tank. Each head group 85 of each head 81 is connected to an ink tank.
各吐出口82的內部分別具有裝滿墨水的墨水室,在各墨水室分別配置壓力產生裝置。各壓力產生裝置接收未圖示的控制裝置所傳送之訊號,讓墨水室產生既定壓力而從吐出口82吐出既定量的墨水。 Each of the discharge ports 82 has an ink chamber filled with ink, and a pressure generating device is disposed in each of the ink chambers. Each of the pressure generating devices receives a signal transmitted from a control device (not shown), and generates a predetermined pressure in the ink chamber to discharge a predetermined amount of ink from the discharge port 82.
基板移動部90,在朝上的面上設置水平的基板載置台91。基板載置台91之朝上的面上具有未圖示的吸引口,吸引口連接於未圖示的真空泵。將基板95配置在基板載置台91上後,藉由真空泵進行排氣,以將基板95真空吸附保持在基板載置台91上。 The substrate moving portion 90 is provided with a horizontal substrate mounting table 91 on the upward facing surface. A suction port (not shown) is provided on the upward facing surface of the substrate stage 91, and the suction port is connected to a vacuum pump (not shown). After the substrate 95 is placed on the substrate stage 91, the substrate 95 is evacuated by a vacuum pump to vacuum-hold and hold the substrate 95 on the substrate stage 91.
在基板95上,設定有R、G、B各色應降落的區域(降落位置)。基板95具有分別與X、Y方向平行之格子狀的黑色矩陣,各降落位置是配置在由黑色矩陣區畫的區域。 On the substrate 95, a region (falling position) at which each of R, G, and B colors should be dropped is set. The substrate 95 has a lattice-shaped black matrix parallel to the X and Y directions, and each landing position is disposed in a region drawn by the black matrix region.
基板95之沿X方向相鄰的降落位置的間隔,是與一個頭部群85中沿X方向鄰接的吐出口間隔D/n相同,或是形成沿X方向鄰接的吐出口間隔D/n之整數倍的長度。 The interval between the landing positions of the substrate 95 adjacent to each other in the X direction is the same as the discharge port spacing D/n adjacent to the X direction in one head group 85, or the discharge port spacing D/n adjacent to each other in the X direction. The length of an integer multiple.
在基板移動部90的下方設置第一主移動機構。 A first main moving mechanism is provided below the substrate moving portion 90.
在此,在主軌道72和基板載置台91之間配置第一可動磁鐵92,在主軌道72上遍及軌道的長邊方向設置固定電磁鐵,藉由主軌道72和第一可動磁鐵92來構成線性馬達(第一主移動機構)。 Here, the first movable magnet 92 is disposed between the main rail 72 and the substrate stage 91, and a fixed electromagnet is disposed on the main rail 72 in the longitudinal direction of the rail, and is constituted by the main rail 72 and the first movable magnet 92. Linear motor (first main moving mechanism).
若第一主移動機構接收未圖示的控制裝置所傳送的訊號,會讓主軌道72之固定電磁鐵的磁極遍及軌道的長邊方向改變,而相對於台座71使基板載置台91沿著主軌道72在Y方向移動。 When the first main moving mechanism receives the signal transmitted by the control device (not shown), the magnetic pole of the fixed electromagnet of the main rail 72 is changed in the longitudinal direction of the track, and the substrate mounting table 91 is moved along the pedestal 71 along the main The track 72 moves in the Y direction.
具有基板載置台91之基板移動部90,藉由沿著主軌道72在Y方向移動,可在頭部保持部80的下方進行往復移動。 The substrate moving portion 90 having the substrate stage 91 is reciprocally movable below the head holding portion 80 by moving in the Y direction along the main rail 72.
吐出裝置70之未圖示的控制裝置,是設定成依以下順序朝基板95上吐出吐出液。 The control device (not shown) of the discharge device 70 is set to discharge the discharge liquid onto the substrate 95 in the following order.
首先,讓基板移動部90移動至在基板載置台91上載置基板95的位置(起點),藉由未圖示的機械人將基板95搬運並真空吸附在基板載置台91上之後,藉由未圖示 的對準攝影機進行對準,以使基板95上的各降落位置能通過既定吐出口82的正下方。在基板移動部90通過頭部保持部80的下方的期間之既定時點,從各吐出口82吐出吐出液,當到達從基板載置台91上卸下基板95的位置(終點)時讓基板移動部90靜止,讓基板95上的吐出液乾燥後,解除基板載置台91上的真空吸附,藉由未圖示的機械人將基板95卸下。 First, the substrate moving portion 90 is moved to a position (starting point) at which the substrate 95 is placed on the substrate mounting table 91, and the substrate 95 is conveyed by a robot (not shown) and vacuum-adsorbed on the substrate mounting table 91. Icon The alignment cameras are aligned so that each landing position on the substrate 95 can pass directly below the predetermined discharge port 82. When the substrate moving portion 90 passes the lower portion of the head holding portion 80, the discharge liquid is discharged from each of the discharge ports 82, and when the position (end point) at which the substrate 95 is removed from the substrate mounting table 91 is reached, the substrate moving portion is caused. When 90 is stopped and the discharge liquid on the substrate 95 is dried, the vacuum suction on the substrate stage 91 is released, and the substrate 95 is removed by a robot (not shown).
接著,再度讓基板移動部90移動至起點,將其他基板95搬運至基板載置台91上,反覆進行上述的吐出步驟。 Next, the substrate moving portion 90 is again moved to the starting point, and the other substrate 95 is transported to the substrate placing table 91, and the above-described discharging step is repeated.
未圖示的控制裝置被設定成,每對既定片數的基板95反覆進行上述吐出作業時,就讓維修裝置10移動至頭部保持部80的下方,以如後述般進行各吐出口82的清掃和檢查。 The control device (not shown) is set such that when the predetermined number of substrates 95 are repeatedly subjected to the above-described discharge operation, the maintenance device 10 is moved below the head holding portion 80, and each discharge port 82 is performed as will be described later. Cleaning and inspection.
第2圖係顯示維修裝置10的前視圖。 Fig. 2 is a front view showing the maintenance device 10.
維修裝置10具有第一移動台15a,第一移動台15a是配置在主軌道72上。 The maintenance device 10 has a first mobile station 15a, and the first mobile station 15a is disposed on the main rail 72.
在維修裝置10的下方設置第二主移動機構(主移動裝置)75。 A second main moving mechanism (main moving device) 75 is disposed below the maintenance device 10.
在此,在主軌道72和第一移動台15a之間配置第二可動磁鐵11,藉由主軌道72和第二可動磁鐵11來構成線性馬達(第二主移動機構75)。 Here, the second movable magnet 11 is disposed between the main rail 72 and the first moving stage 15a, and the linear motor (second main moving mechanism 75) is constituted by the main rail 72 and the second movable magnet 11.
若第二主移動機構75接收未圖示的控制裝置所傳送的訊號,會讓主軌道72之固定電磁鐵的磁性遍及軌道的 長邊方向改變,而相對於台座71使第一移動台15a沿著主軌道72在Y方向移動。 If the second main moving mechanism 75 receives the signal transmitted by the control device (not shown), the magnetic properties of the fixed electromagnet of the main track 72 are made to be in the track. The longitudinal direction changes, and the first moving stage 15a moves in the Y direction along the main rail 72 with respect to the pedestal 71.
具有第一移動台15a之維修裝置10,藉由沿著主軌道72在Y方向移動,能在頭部保持部80的下方進行往復移動。 The maintenance device 10 having the first mobile station 15a is reciprocally movable below the head holding portion 80 by moving in the Y direction along the main rail 72.
第一、第二主移動機構是藉由未圖示的控制裝置所控制,在開始進行各吐出口82的清掃作業時,首先讓基板移動部90移動至頭部保持部80之與維修裝置10相反的一側,接著讓維修裝置10移動至頭部保持部80的下方。維修裝置10之Y座標,是藉由控制裝置而根據主軌道72上的移動量來測定。各頭部81的XY座標儲存於控制裝置,當維修裝置10位於頭部保持部80的下方時停止移動。或是,維修裝置10的移動量亦可藉由目視對準,或藉由設置於頭部保持部80之未圖示的固定攝影機來檢測出。 The first and second main moving mechanisms are controlled by a control device (not shown), and when the cleaning operation of each of the discharge ports 82 is started, the substrate moving portion 90 is first moved to the head holding portion 80 and the maintenance device 10 On the opposite side, the service device 10 is then moved to below the head holding portion 80. The Y coordinate of the maintenance device 10 is measured by the amount of movement on the main rail 72 by the control device. The XY coordinates of the respective heads 81 are stored in the control device, and the movement is stopped when the maintenance device 10 is positioned below the head holding portion 80. Alternatively, the amount of movement of the maintenance device 10 may be detected by visual alignment or by a fixed camera (not shown) provided in the head holding portion 80.
維修裝置10係具備:用來接收從吐出口82吐出的吐出液之接收盤12。接收盤12被載置在第一移動台15a上。 The maintenance device 10 includes a receiving tray 12 for receiving the discharge liquid discharged from the discharge port 82. The receiving tray 12 is placed on the first mobile station 15a.
未圖示的控制裝置,讓吐出液從各吐出口82朝向接收盤12以高壓吐出,藉此將吐出口82的附著物吹走,而讓吐出液和附著物落到接收盤12上。 The control device (not shown) allows the discharge liquid to be discharged from the respective discharge ports 82 toward the receiving tray 12 at a high pressure, whereby the deposit of the discharge port 82 is blown off, and the discharge liquid and the deposit are dropped on the receiving tray 12.
在接收盤12的底部連接著廢液管13的另一端(一端則延伸至維修裝置10的外部),藉此成為能將貯留於接收盤12的吐出液排到維修裝置10外的構造。 The other end of the waste liquid pipe 13 is connected to the bottom of the receiving tray 12 (the one end extends to the outside of the maintenance device 10), whereby the discharge liquid stored in the receiving tray 12 can be discharged to the outside of the maintenance device 10.
如此般可防止:起因於吐出液附著在主軌道72上,而對維修裝置10和基板移動部90在主軌道72上的移動造成阻礙的情況。 In this way, it is possible to prevent the movement of the maintenance device 10 and the substrate moving portion 90 on the main rail 72 from being caused by the adhesion of the discharge liquid to the main rail 72.
維修裝置10係具備:在將吐出液朝接收盤12上吐出之後將附著於各吐出口82之吐出液除去的清掃裝置30、在將附著於各吐出口82之吐出液除去之後判斷各吐出口82的良窳之檢查裝置20。 The maintenance device 10 includes a cleaning device 30 that removes the discharge liquid adhering to the discharge ports 82 after discharging the discharge liquid onto the receiving tray 12, and removes the discharge liquid after the discharge liquid adhered to each discharge port 82. 82 inspection device 20 of Liangzhu.
在維修裝置10之第一移動台15a的上方設置:載置台19和第二移動台15b、直線狀的第一、第二副軌道14a、14b。 Above the first moving stage 15a of the maintenance device 10, a mounting table 19 and a second moving table 15b, and linear first and second sub-tracks 14a and 14b are provided.
檢查裝置20和清掃裝置30雙方都被載置在載置台19上。 Both the inspection device 20 and the cleaning device 30 are placed on the mounting table 19.
在第一移動台15a之朝上的面上,固定著互相平行之兩條的第一副軌道14a,在這兩條的第一副軌道14a上裝載第二移動台15b。 On the upward facing surface of the first moving stage 15a, two first sub-tracks 14a parallel to each other are fixed, and the second moving stage 15b is mounted on the first sub-tracks 14a of the two.
此外,在第二移動台15b之朝上的面上,固定著互相平行之兩條的第二副軌道14b,在這兩條的第二副軌道14b上裝載載置台19。 Further, on the upward facing surface of the second moving stage 15b, two second sub-tracks 14b which are parallel to each other are fixed, and the mounting table 19 is mounted on the second sub-tracks 14b of the two.
第二移動台15b可相對於第一副軌道14a進行移動,載置台19可相對於第二副軌道14b進行移動。 The second moving stage 15b is movable relative to the first sub-track 14a, and the stage 19 is movable relative to the second sub-track 14b.
在第二移動台15b和載置台19下方分別設有第一、第二副移動裝置16a、16b,並分別安裝有未圖示的馬達,在未圖示的控制裝置控制下,第二移動台15b和載置台19能分別沿著第一副軌道14a和第二副軌道14b移動。 First and second sub-moving devices 16a and 16b are provided below the second mobile station 15b and the mounting table 19, respectively, and motors (not shown) are attached thereto, and the second mobile station is controlled by a control device (not shown). The 15b and the stage 19 are movable along the first sub-track 14a and the second sub-track 14b, respectively.
第一副軌道14a和第二副軌道14b當中任一方配置成與主軌道72平行,另一方配置成與主軌道72垂直。 One of the first sub-track 14a and the second sub-track 14b is disposed in parallel with the main rail 72, and the other is disposed perpendicular to the main rail 72.
第一移動台15a,如前述般沿著主軌道72移動,能在頭部保持部80的下方位置呈靜止,若在該狀態下讓第二移動台15b和載置台19分別沿著第一、第二副軌道14a、14b移動,能在第一移動台15a保持靜止的狀態下讓載置台19在XY方向移動,而使載置台19上所載置的檢查裝置20和清掃裝置30移動至各頭部81的下方。 The first mobile station 15a moves along the main rail 72 as described above, and can be stationary at a position below the head holding portion 80. If the second mobile station 15b and the mounting table 19 are respectively along the first state, The second sub-tracks 14a and 14b are moved, and the mounting table 19 is moved in the XY direction while the first moving table 15a is still stationary, and the inspection device 20 and the cleaning device 30 placed on the mounting table 19 are moved to the respective positions. Below the head 81.
檢查裝置20和清掃裝置30在第一移動台15a上的座標,是藉由控制裝置而根據載置台19在第一、第二副軌道14a、14b上的移動量來測定。根據檢查裝置20和清掃裝置30在第一移動台15a上的座標、以及第一移動台15a的Y座標,可求出檢查裝置20和清掃裝置30的XY座標。各頭部81的XY座標儲存於控制裝置,因此能讓檢查裝置20和清掃裝置30靜止於各頭部81的正下方。 The coordinates of the inspection device 20 and the cleaning device 30 on the first moving stage 15a are measured by the control device based on the amount of movement of the mounting table 19 on the first and second sub-tracks 14a and 14b. The XY coordinates of the inspection device 20 and the cleaning device 30 can be obtained from the coordinates of the inspection device 20 and the cleaning device 30 on the first mobile station 15a and the Y coordinates of the first mobile station 15a. Since the XY coordinates of the respective heads 81 are stored in the control device, the inspection device 20 and the cleaning device 30 can be placed directly below the respective heads 81.
第4圖係用來說明清掃裝置30的構造之清掃裝置30的側視圖。 Fig. 4 is a side view of the cleaning device 30 for explaining the structure of the cleaning device 30.
清掃裝置30係具備:吸取吐出液之帶狀的吸取布(吸墨紙,blotter)32、棒狀的第一、第二捲芯34a、34b、以及筒狀的張緊器31。 The cleaning device 30 includes a belt-shaped suction cloth (blowing paper) 32 that sucks the discharge liquid, a rod-shaped first and second cores 34a and 34b, and a cylindrical tensioner 31.
吸取布32之寬方向的長度是比各頭部81的吐出口列83的長度更長,且吸取布32配置成寬方向與吐出口列83平行。 The length of the suction cloth 32 in the width direction is longer than the length of the discharge port row 83 of each of the head portions 81, and the suction cloth 32 is disposed in the width direction parallel to the discharge port row 83.
第一、第二捲芯34a、34b,分別以長邊方向與吐出口 列83平行的方式被支柱(固定在載置台19上,未圖示)支承,分別能以X方向(吐出口列83的延伸方向)為軸進行自轉。 The first and second cores 34a and 34b are respectively in the longitudinal direction and the discharge port The column 83 is supported in parallel by the pillars (fixed to the mounting table 19, not shown), and can be rotated in the X direction (the direction in which the discharge port 83 extends).
吸取布32的兩端,分別捲繞在第一、第二捲芯34a、34b上,在第一、第二捲芯34a、34b間將吸取布32保持成張緊狀態。 Both ends of the suction cloth 32 are wound around the first and second cores 34a and 34b, respectively, and the suction cloth 32 is held in tension between the first and second cores 34a and 34b.
張緊器31的長邊方向的長度比各頭部81之吐出口列83的長度更長,以其長邊方向與吐出口列83平行的方式在第一、第二捲芯34a、34b間配置在吸取布32的下方。 The length of the tensioner 31 in the longitudinal direction is longer than the length of the discharge port row 83 of each of the heads 81, and the longitudinal direction thereof is parallel to the discharge port array 83 between the first and second cores 34a, 34b. It is disposed below the suction cloth 32.
在張緊器31的下部,安裝著固定在載置台19上之昇降裝置33。昇降裝置33具有未圖示的馬達,若接收來自未圖示的控制裝置的訊號,會讓張緊器31相對於載置台19沿鉛垂方向移動。 A lifting device 33 fixed to the mounting table 19 is attached to a lower portion of the tensioner 31. The lifting device 33 has a motor (not shown), and receives a signal from a control device (not shown) to move the tensioner 31 in the vertical direction with respect to the mounting table 19.
張緊器31是由可變形之緩衝材料所形成,若按壓於頭部81,會與一個頭部81內之複數個吐出口82(在與吐出口列83垂直的方向上分開配置)一起接觸。 The tensioner 31 is formed of a deformable cushioning material. When pressed against the head 81, it is brought into contact with a plurality of discharge ports 82 (separated in a direction perpendicular to the discharge port array 83) in one head 81. .
藉由未圖示的控制裝置,以張緊器31位於頭部81正下方的方式將清掃裝置30移動之後,控制昇降裝置33而使張緊器31往鉛垂上方移動,使張緊器31上的吸取布32按壓在頭部81的底面。這時,張緊器31上的吸取布32會接觸一個頭部81之全部的吐出口82。 The cleaning device 30 is moved so that the tensioner 31 is positioned directly below the head portion 81 by a control device (not shown), and then the lifting device 33 is controlled to move the tensioner 31 vertically upward to cause the tensioner 31 to move. The upper suction cloth 32 is pressed against the bottom surface of the head 81. At this time, the suction cloth 32 on the tensioner 31 comes into contact with all of the discharge ports 82 of one of the heads 81.
張緊器31的表面,例如藉由鐵氟龍片等實施加工,以使吸取布32容易滑動。 The surface of the tensioner 31 is processed by, for example, a Teflon sheet to allow the suction cloth 32 to slide easily.
張緊器31上的吸取布32按壓在頭部81的底面之後 ,第一、第二捲芯34a、34b朝相同方向自轉,張緊器31上的吸取布32能將附著在吐出口82的吐出液擦掉。 The suction cloth 32 on the tensioner 31 is pressed against the bottom surface of the head 81 The first and second cores 34a, 34b rotate in the same direction, and the suction cloth 32 on the tensioner 31 can wipe off the discharge liquid adhering to the discharge port 82.
在此,是採用濕擦型的構造,亦即從外部將溶解液供應至張緊器31的內部35,從設置於張緊器31表面的小孔36將溶解液滲到吸取布32。濕擦型能夠除去吐出液乾燥後之吐出口82的堵塞。 Here, the wet rub type structure is employed, that is, the solution liquid is supplied from the outside to the inside 35 of the tensioner 31, and the solution liquid is infiltrated into the suction cloth 32 from the small holes 36 provided in the surface of the tensioner 31. The wet rub type can remove the clogging of the discharge port 82 after the discharge liquid is dried.
然而,本發明之清掃裝置30並不限定於濕擦型,也可以是不使用溶解液之乾吸墨型(dry blot)。 However, the cleaning device 30 of the present invention is not limited to the wet rub type, and may be a dry blot that does not use a solution.
將吐出液朝接收盤12上吐出而附著的吐出液,從一個頭部81的各吐出口82被除去之後,控制昇降裝置33使張緊器31往鉛垂下方移動,解除吸取布32和吐出口82之接觸,接著使檢查裝置20移動至相同頭部81內之一個吐出口82的下方。 The discharge liquid which is discharged by the discharge liquid to the receiving tray 12 is removed from each discharge port 82 of one head 81, and then the lifting device 33 is controlled to move the tensioner 31 vertically downward, thereby releasing the suction cloth 32 and spitting. The contact of the outlet 82 then moves the inspection device 20 below a discharge port 82 in the same head 81.
第3圖係用來說明檢查裝置20的構造之檢查裝置20的側視圖。 Fig. 3 is a side view of the inspection device 20 for explaining the configuration of the inspection device 20.
檢查裝置20係具備:對測定對象物照射照明光29之照明裝置21、拍攝藉由照明裝置21照射照明光29後的測定對象物之攝影裝置22。 The inspection device 20 includes an illumination device 21 that irradiates the measurement target with the illumination light 29, and an imaging device 22 that captures the measurement target after the illumination device 29 is irradiated with the illumination light 29.
照明裝置21係具備:產生並放出照明光29之光源23、將光源23所放出的照明光29反射而使照明光29的行進方向折返之第一反射手段24a。 The illuminating device 21 includes a light source 23 that generates and emits the illumination light 29, and a first reflection means 24a that reflects the illumination light 29 emitted from the light source 23 and folds the traveling direction of the illumination light 29.
在此,光源23是配置在比各頭部81的吐出口82高度更低的位置,第一反射手段24a的反射面之至少一部分,是位在吐出口82高度和光源23的高度之間,反射面, 是將下方的光源23所放出的照明光29反射成朝水平方向送出。因此,從照明裝置21可將照明光29朝水平方向射出。 Here, the light source 23 is disposed at a position lower than the height of the discharge port 82 of each of the head portions 81, and at least a part of the reflection surface of the first reflection means 24a is located between the height of the discharge port 82 and the height of the light source 23. Reflective surface, The illumination light 29 emitted from the lower light source 23 is reflected and sent in the horizontal direction. Therefore, the illumination light 29 can be emitted from the illumination device 21 in the horizontal direction.
攝影裝置22係具備:將沿水平方向行進的光反射成朝向下方送出之第二反射手段24b、以及位於第二反射手段24b的下方而接收來自第二反射手段24b的光以進行拍攝之攝影機25。 The photographing device 22 includes a second reflecting means 24b that reflects light traveling in the horizontal direction and that is sent downward, and a camera 25 that is positioned below the second reflecting means 24b and receives light from the second reflecting means 24b for photographing. .
攝影裝置22相對於照明裝置21是配置成:使第二反射手段24b能將照明裝置21所發出的光反射後射入攝影機25。因此,若水平的照明光29射入測定對象物,藉由攝影機25可拍攝測定對象物的影子,或是透過測定對象物之照明光29所產生的像。 The imaging device 22 is disposed relative to the illumination device 21 such that the second reflection means 24b can reflect the light emitted by the illumination device 21 and enter the camera 25. Therefore, when the horizontal illumination light 29 is incident on the measurement target, the camera 25 can capture the shadow of the measurement object or the image generated by the illumination light 29 of the measurement object.
將照明裝置21和攝影裝置22的相對位置設定成:使在照明裝置21和攝影裝置22之間進行收送之水平的照明光29相對於吐出口列83的延伸方向呈垂直。在維持此狀態下,藉由移動載置台19,可在各頭部81的下方進行送光。 The relative position of the illumination device 21 and the imaging device 22 is set such that the horizontal illumination light 29 that is conveyed between the illumination device 21 and the imaging device 22 is perpendicular to the direction in which the discharge port 83 extends. While maintaining this state, by moving the stage 19, light can be transmitted under the respective heads 81.
攝影機25之焦點28,與攝影機前面之透鏡在光路上隔著一定的距離,在此,焦點28是位在第一、第二反射手段24a、24b之間。 The focus 28 of the camera 25 is spaced from the lens in front of the camera by a certain distance on the optical path. Here, the focus 28 is located between the first and second reflecting means 24a, 24b.
在此,檢查裝置20具有遮光性材料所形成之檢查框體26,光源23和攝影機25是配置在檢查框體26的內部。如此,檢查框體26可防止光源23和攝影機25之電子機器部分被吐出液弄濕。此外,檢查框體26能防止外部 之過多的光射入攝影機25的受光部。 Here, the inspection device 20 has an inspection frame 26 formed of a light-blocking material, and the light source 23 and the camera 25 are disposed inside the inspection frame 26. Thus, the inspection frame 26 prevents the light source 23 and the electronic machine portion of the camera 25 from being wetted by the discharge liquid. In addition, the inspection frame 26 can prevent the outside Excessive light is incident on the light receiving portion of the camera 25.
第一、第二反射手段24a、24b,是在檢查框體26上分別被載置在光源23和攝影機25正上方的位置。檢查框體26之第一、第二反射手段24a、24b的正下方部分,可讓照明光29透過。 The first and second reflection means 24a, 24b are placed on the inspection frame 26 at positions directly above the light source 23 and the camera 25. The portion directly below the first and second reflecting means 24a, 24b of the frame 26 is inspected to allow the illumination light 29 to pass therethrough.
將吐出液朝接收盤12上吐出而附著的吐出液,從一個頭部81的各吐出口82被除去之後,藉由在靜止的第一移動台15a上讓載置台19移動,移動檢查裝置20而使攝影機25的焦點28位於一個吐出口82的正下方,接著從吐出口82吐出吐出液。 The discharge liquid which is discharged by the discharge liquid to the receiving tray 12 is removed from each discharge port 82 of one head 81, and then the mounting table 19 is moved by the stationary first mobile station 15a, and the inspection device 20 is moved. On the other hand, the focus 28 of the camera 25 is positioned directly below one discharge port 82, and then the discharge liquid is discharged from the discharge port 82.
在檢查框體26之朝上的面之第一、第二反射手段24a、24b之間的部分設置凹狀的排液路27。排液路27可接收落到檢查框體26上之吐出液的液滴,並朝向接收盤12排出而避免吐出液污染維修裝置10之其他部分。 A concave liquid discharge path 27 is provided in a portion between the first and second reflection means 24a, 24b of the upward facing surface of the inspection frame 26. The draining path 27 can receive the droplets of the discharge liquid that has fallen onto the inspection frame 26 and discharge toward the receiving tray 12 to prevent the discharge liquid from contaminating other portions of the maintenance device 10.
在從焦點28的正上方之吐出口82將吐出液吐出時,從照明裝置21將照明光29照射於往下方飛行的液滴,藉由攝影裝置22拍攝被照明光29照射的液滴,其攝影像記錄於未圖示的控制裝置。 When the discharge liquid is discharged from the discharge port 82 directly above the focus point 28, the illumination light 29 is irradiated from the illumination device 21 to the liquid droplets flying downward, and the imaging device 22 captures the liquid droplets irradiated by the illumination light 29, The photographic image is recorded on a control device not shown.
例如事先設定好從正常吐出口82吐出的液滴資料,將攝影像與該設定值作比較來判斷吐出口82的良窳。 For example, the droplet data discharged from the normal discharge port 82 is set in advance, and the photographed image is compared with the set value to determine the quality of the discharge port 82.
判斷基準,例如包括飛行中的液滴的形狀、大小、位置(速度)、飛行方向、是否有分離的液滴等。 The judgment criteria include, for example, the shape, size, position (speed) of the droplet in flight, the direction of flight, whether there are separated droplets, and the like.
吐出口82良窳的結果儲存於未圖示的控制裝置,接著,讓攝影機25的焦點28移動至該頭部81之同一吐出 口列83中鄰接的吐出口82正下方,反覆進行吐出口82的檢查。 The result of the discharge port 82 is stored in a control device (not shown), and then the focus 28 of the camera 25 is moved to the same discharge of the head 81. The discharge port 82 is directly under the adjacent discharge port 82, and the inspection of the discharge port 82 is repeated.
若一個頭部81之一個吐出口列83中全部的吐出口82之檢查結束的話,讓焦點28移動至該頭部81之在Y方向鄰接的吐出口列83中的一個吐出口82的正下方,在該鄰接的吐出口列83中反覆進行吐出口82的檢查。 When the inspection of all the discharge ports 82 in one of the discharge ports 83 of one of the heads 81 is completed, the focus 28 is moved to directly below one of the discharge ports 82 of the discharge port array 83 adjacent to the Y direction of the head 81. The inspection of the discharge port 82 is repeated in the adjacent discharge port row 83.
當一個頭部81全部的吐出口82的檢查結束時,若不良吐出口82有一個以上的話,讓清掃裝置30再度移動至該頭部81的下方,用吸取布32擦掉吐出口82的附著物,接著讓攝影機25的焦點28移動至不良吐出口82而再度進行檢查。 When the inspection of all the discharge ports 82 of one of the heads 81 is completed, if there is one or more defective discharge ports 82, the cleaning device 30 is moved to the lower side of the head portion 81 again, and the adhesion of the discharge port 82 is wiped off by the suction cloth 32. Then, the focus 28 of the camera 25 is moved to the defective discharge port 82 to be inspected again.
若一個頭部81全部的吐出口82之檢查結果良好的話,讓維修裝置10移動至在X方向鄰接之頭部81的下方,對該頭部81的吐出口82進行上述清掃和檢查。 When the inspection result of all the discharge ports 82 of one of the heads 81 is good, the maintenance device 10 is moved to the lower side of the head 81 adjacent to the X direction, and the discharge port 82 of the head 81 is subjected to the above-described cleaning and inspection.
或者,即使在同一個頭部81反覆進行既定次數的吐出口82之清掃和檢查,仍有一個以上不良吐出口82的話,為了在後述般結束全部頭部81的檢查之後更換該頭部81而在控制裝置儲存該頭部81的位置,接著與上述同樣地讓維修裝置10移動至在X方向鄰接之頭部81的下方,對該頭部81的吐出口82進行上述般的清掃和檢查。 Alternatively, even if the same head 81 is repeatedly cleaned and inspected by the discharge port 82 for a predetermined number of times, if there is one or more defective discharge ports 82, the head portion 81 is replaced after the inspection of all the heads 81 is completed as will be described later. When the control device stores the position of the head portion 81, the maintenance device 10 is moved to the lower side of the head portion 81 adjacent to the X direction in the same manner as described above, and the above-described cleaning and inspection are performed on the discharge port 82 of the head portion 81.
若沿X方向排列之全部的頭部81的檢查結束的話,讓維修裝置10移動至在Y方向鄰接之頭部81的下方,接著在與該頭部81沿著X方向排列之全部的頭部81反覆進行同樣的作業。 When the inspection of all the heads 81 arranged in the X direction is completed, the maintenance device 10 is moved to the lower side of the head 81 adjacent to the Y direction, and then all the heads arranged in the X direction with the head 81 are placed. 81 Repeat the same work.
當頭部保持部80所保持之全部的頭部81之清掃和檢查結束之後,具有無法恢復的不良吐出口82之頭部81,是用檢查過的備用頭部81更換。 After the cleaning and inspection of all the heads 81 held by the head holding portion 80 are completed, the head portion 81 having the unrecoverable defective discharge port 82 is replaced with the checked spare head 81.
接著,維修裝置10移動至頭部保持部80之與基板移動部90相反的一側,從頭部保持部80的下方將維修裝置10取出,接著再度開始進行朝向基板95之吐出步驟。 Next, the maintenance device 10 moves to the side opposite to the substrate moving portion 90 of the head holding portion 80, takes out the maintenance device 10 from below the head holding portion 80, and then starts the discharging step toward the substrate 95 again.
10‧‧‧維修裝置 10‧‧‧Maintenance device
14a、14b‧‧‧第一、第二副軌道 14a, 14b‧‧‧ first and second sub-tracks
15a、15b‧‧‧第一、第二移動台 15a, 15b‧‧‧first and second mobile stations
16a、16b‧‧‧第一、第二副移動裝置 16a, 16b‧‧‧ first and second sub-mobile devices
19‧‧‧載置台 19‧‧‧Station
20‧‧‧檢查裝置 20‧‧‧Checking device
21‧‧‧照明裝置 21‧‧‧Lighting device
22‧‧‧攝影裝置 22‧‧‧Photographing device
23‧‧‧光源 23‧‧‧Light source
24a、24b‧‧‧第一、第二反射手段 24a, 24b‧‧‧first and second reflection means
25‧‧‧攝影機 25‧‧‧ camera
28‧‧‧焦點 28‧‧‧ Focus
29‧‧‧照明光 29‧‧‧Lights
30‧‧‧清掃裝置 30‧‧‧ cleaning device
32‧‧‧吸取布 32‧‧‧Absorbing cloth
33‧‧‧昇降裝置 33‧‧‧ Lifting device
70‧‧‧吐出裝置 70‧‧‧ spitting device
72‧‧‧主軌道 72‧‧‧ main track
75‧‧‧主移動裝置 75‧‧‧Main mobile device
80‧‧‧頭部保持部 80‧‧‧ head keeping department
81‧‧‧頭部 81‧‧‧ head
82‧‧‧吐出口 82‧‧‧Exporting
91‧‧‧基板載置台 91‧‧‧Substrate mounting table
95‧‧‧基板 95‧‧‧Substrate
第1圖係本發明的吐出裝置之一例的俯視圖。 Fig. 1 is a plan view showing an example of a discharge device of the present invention.
第2圖係維修裝置的前視圖。 Figure 2 is a front view of the service unit.
第3圖係用來說明檢查裝置的構造之檢查裝置側視圖。 Fig. 3 is a side view of an inspection apparatus for explaining the configuration of the inspection apparatus.
第4圖係用來說明清掃裝置的構造之清掃裝置側視圖。 Fig. 4 is a side view of the cleaning device for explaining the structure of the cleaning device.
第5圖係本發明的吐出裝置的一例之側視圖。 Fig. 5 is a side view showing an example of the discharge device of the present invention.
1‧‧‧X方向 1‧‧‧X direction
2‧‧‧Y方向 2‧‧‧Y direction
10‧‧‧維修裝置 10‧‧‧Maintenance device
11‧‧‧第二可動磁鐵 11‧‧‧Second movable magnet
12‧‧‧接收盤 12‧‧‧ receiving tray
13‧‧‧廢液管 13‧‧‧ Waste pipe
14a、14b‧‧‧第一、第二副軌道 14a, 14b‧‧‧ first and second sub-tracks
15a、15b‧‧‧第一、第二移動台 15a, 15b‧‧‧first and second mobile stations
19‧‧‧載置台 19‧‧‧Station
20‧‧‧檢查裝置 20‧‧‧Checking device
24a、24b‧‧‧第一、第二反射手段 24a, 24b‧‧‧first and second reflection means
26‧‧‧檢查框體 26‧‧‧Check the frame
30‧‧‧清掃裝置 30‧‧‧ cleaning device
32‧‧‧吸取布 32‧‧‧Absorbing cloth
70‧‧‧吐出裝置 70‧‧‧ spitting device
71‧‧‧台座 71‧‧‧ pedestal
72‧‧‧主軌道 72‧‧‧ main track
73‧‧‧支柱 73‧‧‧ pillar
80‧‧‧頭部保持部 80‧‧‧ head keeping department
81‧‧‧頭部 81‧‧‧ head
82‧‧‧吐出口 82‧‧‧Exporting
83‧‧‧吐出口列 83‧‧‧Exhaust
84‧‧‧頭部組 84‧‧‧ head group
85‧‧‧頭部群 85‧‧‧ head group
90‧‧‧基板移動部 90‧‧‧Substrate movement department
91‧‧‧基板載置台 91‧‧‧Substrate mounting table
92‧‧‧第一可動磁鐵 92‧‧‧First movable magnet
95‧‧‧基板 95‧‧‧Substrate
Claims (10)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009145358A JP5274389B2 (en) | 2009-06-18 | 2009-06-18 | Maintenance device and discharge device |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201111048A TW201111048A (en) | 2011-04-01 |
TWI404571B true TWI404571B (en) | 2013-08-11 |
Family
ID=43367163
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW99117940A TWI404571B (en) | 2009-06-18 | 2010-06-03 | Maintenance apparatus and discharge apparatus |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5274389B2 (en) |
KR (1) | KR101207244B1 (en) |
CN (1) | CN101927608B (en) |
TW (1) | TWI404571B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104647920B (en) * | 2015-02-15 | 2017-03-01 | 广东峰华卓立科技股份有限公司 | A kind of printer head ink-jet detection and control system and its method of work |
WO2016194680A1 (en) * | 2015-05-29 | 2016-12-08 | 富士フイルム株式会社 | Dispensing inspection device, dispensing inspection method, program, and recording medium |
CN110930400B (en) * | 2019-12-10 | 2024-09-24 | 深圳劲鑫科技股份有限公司 | Abnormal detection device for spray nozzle of spray head |
JP2021138050A (en) * | 2020-03-05 | 2021-09-16 | 東京エレクトロン株式会社 | Drawing apparatus and drawing method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200519352A (en) * | 2003-11-10 | 2005-06-16 | Seiko Epson Corp | Liquid droplet ejection method, liquid droplet ejection device, nozzle abnormality determination method, display device, and electronic equipment |
TW200909798A (en) * | 2007-07-06 | 2009-03-01 | Olympus Corp | Appearance inspecting device for substrate |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10206624A (en) * | 1997-01-17 | 1998-08-07 | Asahi Glass Co Ltd | Manufacture of color filter and color filter manufacturing device used therefor |
JP2004216642A (en) * | 2003-01-10 | 2004-08-05 | Matsushita Electric Ind Co Ltd | Ink jet recorder, cleaning method of its ink jet head, process for manufacturing image display element using ink jet recording method and process for manufacturing optical recording medium |
JP2006154128A (en) * | 2004-11-26 | 2006-06-15 | Sharp Corp | Color filter manufacturing device and color filter manufacturing method |
JP4905998B2 (en) | 2005-04-25 | 2012-03-28 | 株式会社アルバック | Droplet analysis system |
JP2006305989A (en) * | 2005-05-02 | 2006-11-09 | Fuji Xerox Co Ltd | Liquid droplet discharge apparatus and method for cleaning liquid droplet discharge head |
JP2007007977A (en) * | 2005-06-30 | 2007-01-18 | Seiko Epson Corp | Liquid droplet discharge device and method for maintenance |
KR100736593B1 (en) | 2005-09-07 | 2007-07-06 | (주)에스티아이 | Multi-function head cleaner for ink-jet printer |
JP2007175614A (en) * | 2005-12-27 | 2007-07-12 | Toshiba Corp | Liquid droplet jetting inspection equipment and liquid droplet jetting device |
JP2008216728A (en) * | 2007-03-06 | 2008-09-18 | Seiko Epson Corp | Measurement method of discharge amount, discharge method of liquid material, manufacturing method of color filter, fabrication method of liquid crystal display device and fabrication method of electrooptical device |
JP5391524B2 (en) * | 2007-03-23 | 2014-01-15 | 凸版印刷株式会社 | Inkjet head management device |
JP2010099606A (en) * | 2008-10-24 | 2010-05-06 | Shibaura Mechatronics Corp | Method and apparatus for droplet application |
-
2009
- 2009-06-18 JP JP2009145358A patent/JP5274389B2/en not_active Expired - Fee Related
-
2010
- 2010-06-03 TW TW99117940A patent/TWI404571B/en not_active IP Right Cessation
- 2010-06-16 KR KR1020100057025A patent/KR101207244B1/en active IP Right Grant
- 2010-06-18 CN CN 201010208492 patent/CN101927608B/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200519352A (en) * | 2003-11-10 | 2005-06-16 | Seiko Epson Corp | Liquid droplet ejection method, liquid droplet ejection device, nozzle abnormality determination method, display device, and electronic equipment |
TW200909798A (en) * | 2007-07-06 | 2009-03-01 | Olympus Corp | Appearance inspecting device for substrate |
Also Published As
Publication number | Publication date |
---|---|
JP2011002641A (en) | 2011-01-06 |
CN101927608B (en) | 2013-02-06 |
TW201111048A (en) | 2011-04-01 |
KR20100136422A (en) | 2010-12-28 |
KR101207244B1 (en) | 2012-12-03 |
JP5274389B2 (en) | 2013-08-28 |
CN101927608A (en) | 2010-12-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI511794B (en) | A film pattern forming apparatus, a film pattern forming method, and a device adjusting method | |
TWI404571B (en) | Maintenance apparatus and discharge apparatus | |
KR20140112400A (en) | Substrate processing apparatus | |
JP2012166159A (en) | Ejection device, and ejection method | |
JP2009072691A (en) | Ink jet state inspection device, manufacturing apparatus for flat panel, and flat panel | |
EP3800054A1 (en) | Solution application apparatus and a tablet printing apparatus | |
JP7346082B2 (en) | Tablet printing inspection equipment | |
KR102599572B1 (en) | Droplet discharging apparatus, droplet discharging method, program and computer storage medium | |
KR20110007866A (en) | Apparatus and method of coating treatment solution | |
JP5384308B2 (en) | Nozzle inspection method, nozzle inspection device, liquid application method, and liquid application device | |
JP7362462B2 (en) | Liquid ejection device, imprint device, and inspection method | |
WO2021039183A1 (en) | Droplet amount measurement device | |
JP7023369B2 (en) | Drawing device and drawing method | |
JP7526150B2 (en) | Coating device and droplet discharge inspection method | |
TW201433463A (en) | Apparatus for manufacturing substrate and method for maintaining apparatus for manufacturing substrate | |
JP2009247917A (en) | Apparatus and method for inspection of substrate and apparatus and method for discharge of droplet | |
US20240034056A1 (en) | Droplet analysis unit and substrate treatment apparatus including the same | |
TWM328949U (en) | Ink-jet apparatus | |
KR20240066088A (en) | Droplet discharging system, droplet discharging method and droplet discharging apparatus | |
JP2004321891A (en) | Droplet discharge apparatus, manufacture method for electro-optical device, electro-optical device and electronic appliance | |
JP2021138050A (en) | Drawing apparatus and drawing method | |
CN117984661A (en) | Substrate processing apparatus and method | |
KR20240033864A (en) | Inkjet head unit and substrate treating apparatus including the same | |
JP2008229582A (en) | Inkjet head control device | |
JP2020127921A (en) | Nozzle inspection device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |