TW200639594A - Composition for photoresist stripping solution and process of photoresist stripping - Google Patents
Composition for photoresist stripping solution and process of photoresist strippingInfo
- Publication number
- TW200639594A TW200639594A TW095108208A TW95108208A TW200639594A TW 200639594 A TW200639594 A TW 200639594A TW 095108208 A TW095108208 A TW 095108208A TW 95108208 A TW95108208 A TW 95108208A TW 200639594 A TW200639594 A TW 200639594A
- Authority
- TW
- Taiwan
- Prior art keywords
- composition
- photoresist stripping
- photoresist
- stripping
- stripping solution
- Prior art date
Links
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 7
- 238000000034 method Methods 0.000 title abstract 3
- 239000010410 layer Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- -1 acetylene alcohol compounds Chemical class 0.000 abstract 1
- 150000001298 alcohols Chemical class 0.000 abstract 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 abstract 1
- 238000001312 dry etching Methods 0.000 abstract 1
- 239000011229 interlayer Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 150000003460 sulfonic acids Chemical class 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
- G03F7/343—Lamination or delamination methods or apparatus for photolitographic photosensitive material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31127—Etching organic layers
- H01L21/31133—Etching organic layers by chemical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/35—Mechanical effects
- H01L2924/351—Thermal stress
- H01L2924/3512—Cracking
- H01L2924/35121—Peeling or delaminating
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005069221A JP4988165B2 (ja) | 2005-03-11 | 2005-03-11 | フォトレジスト剥離液組成物及びフォトレジストの剥離方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200639594A true TW200639594A (en) | 2006-11-16 |
Family
ID=36469678
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095108208A TW200639594A (en) | 2005-03-11 | 2006-03-10 | Composition for photoresist stripping solution and process of photoresist stripping |
Country Status (7)
Country | Link |
---|---|
US (1) | US7816312B2 (zh) |
EP (1) | EP1701217A3 (zh) |
JP (1) | JP4988165B2 (zh) |
KR (1) | KR20060098333A (zh) |
CN (1) | CN1831654B (zh) |
SG (1) | SG126052A1 (zh) |
TW (1) | TW200639594A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI790196B (zh) * | 2015-12-11 | 2023-01-21 | 日商富士軟片股份有限公司 | 洗淨液、基板洗淨方法及半導體元件的製造方法 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4988165B2 (ja) * | 2005-03-11 | 2012-08-01 | 関東化学株式会社 | フォトレジスト剥離液組成物及びフォトレジストの剥離方法 |
US8026201B2 (en) * | 2007-01-03 | 2011-09-27 | Az Electronic Materials Usa Corp. | Stripper for coating layer |
US20100081595A1 (en) * | 2007-01-22 | 2010-04-01 | Freescale Semiconductor, Inc | Liquid cleaning composition and method for cleaning semiconductor devices |
US8551682B2 (en) * | 2007-08-15 | 2013-10-08 | Dynaloy, Llc | Metal conservation with stripper solutions containing resorcinol |
CN102138202B (zh) * | 2008-08-05 | 2015-11-25 | 三菱瓦斯化学株式会社 | 残渣剥离液组合物及使用其的半导体元件的洗涤方法 |
US8420529B2 (en) * | 2008-09-19 | 2013-04-16 | Mitsubishi Gas Chemical Company, Inc. | Copper wiring surface protective liquid and method for manufacturing semiconductor circuit |
TWI459875B (zh) * | 2012-04-20 | 2014-11-01 | Far Eastern New Century Corp | A method for preparing a circuit board having a patterned conductive layer |
WO2015084921A1 (en) | 2013-12-06 | 2015-06-11 | Fujifilm Electronic Materials U.S.A., Inc. | Cleaning formulation for removing residues on surfaces |
KR102427699B1 (ko) | 2015-04-27 | 2022-08-01 | 삼성전자주식회사 | 포토레지스트 제거용 조성물 및 이를 이용한 반도체 장치의 제조 방법 |
US9768058B2 (en) * | 2015-08-10 | 2017-09-19 | Globalfoundries Inc. | Methods of forming air gaps in metallization layers on integrated circuit products |
JP7150433B2 (ja) * | 2017-12-28 | 2022-10-11 | 東京応化工業株式会社 | リワーク方法、及び酸性洗浄液 |
CN111902379B (zh) * | 2018-03-28 | 2023-02-17 | 富士胶片电子材料美国有限公司 | 清洗组合物 |
KR102668667B1 (ko) * | 2019-02-21 | 2024-05-24 | 동우 화인켐 주식회사 | 레지스트 박리액 조성물 |
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-
2005
- 2005-03-11 JP JP2005069221A patent/JP4988165B2/ja not_active Expired - Fee Related
-
2006
- 2006-03-06 SG SG200601448A patent/SG126052A1/en unknown
- 2006-03-09 US US11/371,444 patent/US7816312B2/en not_active Expired - Fee Related
- 2006-03-09 EP EP06004791A patent/EP1701217A3/en not_active Withdrawn
- 2006-03-10 KR KR1020060022758A patent/KR20060098333A/ko not_active Application Discontinuation
- 2006-03-10 CN CN2006100547502A patent/CN1831654B/zh not_active Expired - Fee Related
- 2006-03-10 TW TW095108208A patent/TW200639594A/zh unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI790196B (zh) * | 2015-12-11 | 2023-01-21 | 日商富士軟片股份有限公司 | 洗淨液、基板洗淨方法及半導體元件的製造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1831654B (zh) | 2012-07-18 |
US7816312B2 (en) | 2010-10-19 |
SG126052A1 (en) | 2006-10-30 |
US20060205623A1 (en) | 2006-09-14 |
CN1831654A (zh) | 2006-09-13 |
EP1701217A3 (en) | 2007-01-03 |
EP1701217A2 (en) | 2006-09-13 |
KR20060098333A (ko) | 2006-09-18 |
JP2006251491A (ja) | 2006-09-21 |
JP4988165B2 (ja) | 2012-08-01 |
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