TW200621661A - Method and device for forming crack - Google Patents

Method and device for forming crack

Info

Publication number
TW200621661A
TW200621661A TW094137226A TW94137226A TW200621661A TW 200621661 A TW200621661 A TW 200621661A TW 094137226 A TW094137226 A TW 094137226A TW 94137226 A TW94137226 A TW 94137226A TW 200621661 A TW200621661 A TW 200621661A
Authority
TW
Taiwan
Prior art keywords
crack
line
substrate
predicted
beam spot
Prior art date
Application number
TW094137226A
Other languages
English (en)
Chinese (zh)
Other versions
TWI358395B (https=
Inventor
Togo Gonoe
Original Assignee
Mitsuboshi Diamond Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsuboshi Diamond Ind Co Ltd filed Critical Mitsuboshi Diamond Ind Co Ltd
Publication of TW200621661A publication Critical patent/TW200621661A/zh
Application granted granted Critical
Publication of TWI358395B publication Critical patent/TWI358395B/zh

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073Shaping the laser spot
    • B23K26/0736Shaping the laser spot into an oval shape, e.g. elliptic shape
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • B23K26/034Observing the temperature of the workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/40Removing material taking account of the properties of the material involved
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70Auxiliary operations or equipment
    • B23K26/702Auxiliary equipment
    • B23K26/703Cooling arrangements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K31/00Processes relevant to this subclass, specially adapted for particular articles or purposes, but not covered by any single one of main groups B23K1/00 - B23K28/00
    • B23K31/12Processes relevant to this subclass, specially adapted for particular articles or purposes, but not covered by any single one of main groups B23K1/00 - B23K28/00 relating to investigating the properties, e.g. the weldability, of materials
    • B23K31/125Weld quality monitoring
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0005Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
    • B28D5/0011Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/09Severing cooled glass by thermal shock
    • C03B33/091Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/50Inorganic materials other than metals or composite materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T225/00Severing by tearing or breaking
    • Y10T225/10Methods
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T225/00Severing by tearing or breaking
    • Y10T225/10Methods
    • Y10T225/16Transversely of continuously fed work
    • Y10T225/18Progressively to or from one side edge
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T225/00Severing by tearing or breaking
    • Y10T225/30Breaking or tearing apparatus
    • Y10T225/304Including means to apply thermal shock to work

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • Thermal Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Quality & Reliability (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Laser Beam Processing (AREA)
  • Dicing (AREA)
TW094137226A 2004-10-25 2005-10-25 Method and device for forming crack TW200621661A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004309958 2004-10-25

Publications (2)

Publication Number Publication Date
TW200621661A true TW200621661A (en) 2006-07-01
TWI358395B TWI358395B (https=) 2012-02-21

Family

ID=36227765

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094137226A TW200621661A (en) 2004-10-25 2005-10-25 Method and device for forming crack

Country Status (9)

Country Link
US (1) US7726532B2 (https=)
EP (1) EP1806202B1 (https=)
JP (1) JP4722054B2 (https=)
KR (1) KR100821937B1 (https=)
CN (1) CN100475419C (https=)
AT (1) ATE520495T1 (https=)
MX (1) MX2007005018A (https=)
TW (1) TW200621661A (https=)
WO (1) WO2006046525A1 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI451523B (zh) * 2009-03-30 2014-09-01 三星鑽石工業股份有限公司 Substrate fixing device
TWI494186B (zh) * 2009-05-27 2015-08-01 Corning Inc 在高溫下雷射刻劃玻璃之方法與設備
TWI632997B (zh) * 2013-02-28 2018-08-21 美商Ipg光子公司 雷射系統及使用該雷射系統加工藍寶石之方法

Families Citing this family (85)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007018674A1 (de) * 2007-04-18 2008-10-23 Lzh Laserzentrum Hannover E.V. Verfahren zum Bilden von Durchgangslöchern in Bauteilen aus Glas
WO2008132055A1 (de) * 2007-04-25 2008-11-06 Ceramtec Ag Chip-resistor-substrat
CN101687686A (zh) * 2007-04-30 2010-03-31 康宁股份有限公司 用于刻划移动玻璃带的装置、系统和方法
JP5011048B2 (ja) 2007-09-27 2012-08-29 三星ダイヤモンド工業株式会社 脆性材料基板の加工方法
KR100949152B1 (ko) * 2007-11-23 2010-03-25 삼성코닝정밀유리 주식회사 유리 기판 레이저 절단 장치
CN101468875A (zh) 2007-12-24 2009-07-01 鸿富锦精密工业(深圳)有限公司 脆性非金属基材及其切割方法
KR101139306B1 (ko) * 2007-12-27 2012-04-26 미쓰보시 다이야몬도 고교 가부시키가이샤 취성 재료 기판의 크랙 형성 방법
CN101497150B (zh) * 2008-02-01 2012-10-10 鸿富锦精密工业(深圳)有限公司 激光切割装置
KR100848854B1 (ko) * 2008-04-21 2008-07-30 주식회사 탑 엔지니어링 취성기판의 스크라이빙 장치 및 그 방법
IT1394891B1 (it) 2008-07-25 2012-07-20 Matteo Baistrocchi Impianto di scribing laser per il trattamento superficiale di lamierini magnetici con spot a sezione ellittica
KR101041137B1 (ko) * 2009-03-25 2011-06-13 삼성모바일디스플레이주식회사 기판 절단 장치 및 이를 이용한 기판 절단 방법
TWI517922B (zh) * 2009-05-13 2016-01-21 康寧公司 切割脆性材料之方法
US20110011227A1 (en) * 2009-07-15 2011-01-20 Tingley Iii William Q Method and apparatus for non-rotary holemaking by means of controlled fracturing
US11235395B2 (en) * 2009-07-15 2022-02-01 Tennine Corp. Controlled fracture machining method for producing through-holes
US8932510B2 (en) 2009-08-28 2015-01-13 Corning Incorporated Methods for laser cutting glass substrates
US8426767B2 (en) * 2009-08-31 2013-04-23 Corning Incorporated Methods for laser scribing and breaking thin glass
US8946590B2 (en) * 2009-11-30 2015-02-03 Corning Incorporated Methods for laser scribing and separating glass substrates
WO2011155314A1 (ja) * 2010-06-07 2011-12-15 日本電気硝子株式会社 ガラス板の切断方法
JP5696393B2 (ja) * 2010-08-02 2015-04-08 日本電気硝子株式会社 ガラスフィルムの割断方法
TWI513670B (zh) 2010-08-31 2015-12-21 Corning Inc 分離強化玻璃基板之方法
US9938180B2 (en) 2012-06-05 2018-04-10 Corning Incorporated Methods of cutting glass using a laser
KR101358672B1 (ko) * 2012-08-13 2014-02-11 한국과학기술원 극초단 펄스 레이저를 이용한 투명시편 절단방법 및 다이싱 장치
KR101355807B1 (ko) * 2012-09-11 2014-02-03 로체 시스템즈(주) 비금속 재료의 곡선 절단방법
US9610653B2 (en) 2012-09-21 2017-04-04 Electro Scientific Industries, Inc. Method and apparatus for separation of workpieces and articles produced thereby
WO2014079478A1 (en) 2012-11-20 2014-05-30 Light In Light Srl High speed laser processing of transparent materials
US9092187B2 (en) 2013-01-08 2015-07-28 Apple Inc. Ion implant indicia for cover glass or display component
US9623628B2 (en) * 2013-01-10 2017-04-18 Apple Inc. Sapphire component with residual compressive stress
EP2754524B1 (de) 2013-01-15 2015-11-25 Corning Laser Technologies GmbH Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie
CN104145320B (zh) 2013-02-12 2018-02-02 苹果公司 多步骤离子注入
US10286487B2 (en) * 2013-02-28 2019-05-14 Ipg Photonics Corporation Laser system and method for processing sapphire
US9416442B2 (en) 2013-03-02 2016-08-16 Apple Inc. Sapphire property modification through ion implantation
EP2781296B1 (de) 2013-03-21 2020-10-21 Corning Laser Technologies GmbH Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser
US9508570B2 (en) * 2013-10-21 2016-11-29 Asm Technology Singapore Pte Ltd Singulation apparatus and method
US9676167B2 (en) 2013-12-17 2017-06-13 Corning Incorporated Laser processing of sapphire substrate and related applications
US10293436B2 (en) 2013-12-17 2019-05-21 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
US9701563B2 (en) 2013-12-17 2017-07-11 Corning Incorporated Laser cut composite glass article and method of cutting
US10442719B2 (en) 2013-12-17 2019-10-15 Corning Incorporated Edge chamfering methods
US20150165560A1 (en) 2013-12-17 2015-06-18 Corning Incorporated Laser processing of slots and holes
US9815730B2 (en) 2013-12-17 2017-11-14 Corning Incorporated Processing 3D shaped transparent brittle substrate
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
US9850160B2 (en) 2013-12-17 2017-12-26 Corning Incorporated Laser cutting of display glass compositions
US10343237B2 (en) 2014-02-28 2019-07-09 Ipg Photonics Corporation System and method for laser beveling and/or polishing
US9956646B2 (en) 2014-02-28 2018-05-01 Ipg Photonics Corporation Multiple-beam laser processing using multiple laser beams with distinct wavelengths and/or pulse durations
US9764427B2 (en) 2014-02-28 2017-09-19 Ipg Photonics Corporation Multi-laser system and method for cutting and post-cut processing hard dielectric materials
JP6269830B2 (ja) * 2014-06-11 2018-01-31 株式会社Ihi 脆性材料基板の割断方法及び脆性材料基板の割断装置
CN106471140B (zh) * 2014-07-03 2019-02-05 新日铁住金株式会社 激光加工装置
TWI730945B (zh) 2014-07-08 2021-06-21 美商康寧公司 用於雷射處理材料的方法與設備
WO2016010949A1 (en) 2014-07-14 2016-01-21 Corning Incorporated Method and system for forming perforations
KR20170028943A (ko) 2014-07-14 2017-03-14 코닝 인코포레이티드 조정가능한 레이저 빔 촛점 라인을 사용하여 투명한 재료를 처리하는 방법 및 시스템
CN107073641B (zh) 2014-07-14 2020-11-10 康宁股份有限公司 接口块;用于使用这种接口块切割在波长范围内透明的衬底的系统和方法
EP3169479B1 (en) 2014-07-14 2019-10-02 Corning Incorporated Method of and system for arresting incident crack propagation in a transparent material
CN107148324A (zh) 2014-08-28 2017-09-08 Ipg光子公司 用于切割和切割后加工硬质电介质材料的多激光器系统和方法
WO2016033494A1 (en) 2014-08-28 2016-03-03 Ipg Photonics Corporation System and method for laser beveling and/or polishing
JP6303950B2 (ja) * 2014-09-19 2018-04-04 旭硝子株式会社 ガラス板の加工方法
US10047001B2 (en) 2014-12-04 2018-08-14 Corning Incorporated Glass cutting systems and methods using non-diffracting laser beams
CN107406293A (zh) 2015-01-12 2017-11-28 康宁股份有限公司 使用多光子吸收方法来对经热回火的基板进行激光切割
WO2016125609A1 (ja) * 2015-02-03 2016-08-11 セントラル硝子株式会社 脆性材料の切断方法、脆性材料の切断装置、切断脆性材料の製造方法及び切断脆性材料
US11773004B2 (en) 2015-03-24 2023-10-03 Corning Incorporated Laser cutting and processing of display glass compositions
KR20170131638A (ko) 2015-03-27 2017-11-29 코닝 인코포레이티드 가스 투과성 유리창 및 이의 제작방법
WO2017011296A1 (en) 2015-07-10 2017-01-19 Corning Incorporated Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same
US10280504B2 (en) 2015-09-25 2019-05-07 Apple Inc. Ion-implanted, anti-reflective layer formed within sapphire material
DE102016000051A1 (de) 2016-01-05 2017-07-06 Siltectra Gmbh Verfahren und Vorrichtung zum planaren Erzeugen von Modifikationen in Festkörpern
US11130200B2 (en) 2016-03-22 2021-09-28 Siltectra Gmbh Combined laser treatment of a solid body to be split
JP6938543B2 (ja) 2016-05-06 2021-09-22 コーニング インコーポレイテッド 透明基板からの、輪郭設定された形状のレーザ切断及び取り外し
US10410883B2 (en) 2016-06-01 2019-09-10 Corning Incorporated Articles and methods of forming vias in substrates
US10794679B2 (en) 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
KR20190035805A (ko) 2016-07-29 2019-04-03 코닝 인코포레이티드 레이저 처리를 위한 장치 및 방법
KR102423775B1 (ko) 2016-08-30 2022-07-22 코닝 인코포레이티드 투명 재료의 레이저 가공
US10730783B2 (en) 2016-09-30 2020-08-04 Corning Incorporated Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots
KR102428350B1 (ko) 2016-10-24 2022-08-02 코닝 인코포레이티드 시트형 유리 기판의 레이저 기반 기계 가공을 위한 기판 프로세싱 스테이션
US10752534B2 (en) 2016-11-01 2020-08-25 Corning Incorporated Apparatuses and methods for laser processing laminate workpiece stacks
US10978311B2 (en) 2016-12-12 2021-04-13 Siltectra Gmbh Method for thinning solid body layers provided with components
US10688599B2 (en) 2017-02-09 2020-06-23 Corning Incorporated Apparatus and methods for laser processing transparent workpieces using phase shifted focal lines
US10580725B2 (en) 2017-05-25 2020-03-03 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US10626040B2 (en) 2017-06-15 2020-04-21 Corning Incorporated Articles capable of individual singulation
US12180108B2 (en) 2017-12-19 2024-12-31 Corning Incorporated Methods for etching vias in glass-based articles employing positive charge organic molecules
CN108002696B (zh) * 2017-12-27 2024-05-17 信义玻璃(营口)有限公司 一种跟踪控制装置和冷却控制系统
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
CN110293310A (zh) * 2018-03-22 2019-10-01 孟晋科技股份有限公司 避免铝分子渗入镀铝硅高张力钢板焊道的加工方法
TWI706614B (zh) * 2018-11-10 2020-10-01 鴻超環保能源股份有限公司 雷射光源模組
CN109680448B (zh) * 2019-01-21 2024-04-19 苏州大喆智能科技有限公司 一种切线热粘装置
CN112828474B (zh) * 2020-12-31 2022-07-05 武汉华工激光工程有限责任公司 用于透明脆性材料的斜向切割补偿方法及系统
JP7713186B2 (ja) * 2021-08-18 2025-07-25 エンシュウ株式会社 レーザ加工装置
US12387307B2 (en) 2022-10-26 2025-08-12 Saudi Arabian Oil Company Determining severity of stepwise cracking in a pressurized vessel

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1244346B (de) * 1964-10-19 1967-07-13 Menzel Gerhard Glasbearbeitung Verfahren zum Schneiden von Glas
RU2024441C1 (ru) 1992-04-02 1994-12-15 Владимир Степанович Кондратенко Способ резки неметаллических материалов
JP3195050B2 (ja) 1992-06-18 2001-08-06 マツダ株式会社 エンジンの吸入空気量検出装置
CN2178584Y (zh) * 1993-11-09 1994-10-05 北京工业大学 可产生宽带激光束的转镜装置
JPH0929472A (ja) * 1995-07-14 1997-02-04 Hitachi Ltd 割断方法、割断装置及びチップ材料
DE69629704T2 (de) * 1995-08-31 2004-07-08 Corning Inc. Verfahren und vorrichtung zum zerbrechen von sprödem material
MY120533A (en) * 1997-04-14 2005-11-30 Schott Ag Method and apparatus for cutting through a flat workpiece made of brittle material, especially glass.
US6407360B1 (en) * 1998-08-26 2002-06-18 Samsung Electronics, Co., Ltd. Laser cutting apparatus and method
JP2001130921A (ja) * 1999-10-29 2001-05-15 Mitsuboshi Diamond Industrial Co Ltd 脆性基板の加工方法及び装置
WO2001034529A1 (en) * 1999-11-12 2001-05-17 P.T.G. Precision Technology Center Limited Llc Laser glass cutting with super cooled gas chill
KR100631304B1 (ko) * 1999-12-24 2006-10-04 삼성전자주식회사 레이저 빔을 이용한 유리기판 절단 장치 및 그 방법
DE19963939B4 (de) * 1999-12-31 2004-11-04 Schott Spezialglas Gmbh Verfahren und Vorrichtung zum Durchtrennen von flachen Werkstücken aus sprödbrüchigem Material
JP3802442B2 (ja) * 2000-12-01 2006-07-26 エルジー電子株式会社 ガラス切断方法および装置
KR100583889B1 (ko) * 2001-07-16 2006-05-26 미쓰보시 다이야몬도 고교 가부시키가이샤 취성재료기판의 스크라이브 장치
TW583046B (en) * 2001-08-10 2004-04-11 Mitsuboshi Diamond Ind Co Ltd Method and device for scribing brittle material substrate
JP2005231035A (ja) * 2001-08-23 2005-09-02 Mitsuboshi Diamond Industrial Co Ltd 脆性材料の加工方法及び加工装置
KR100794284B1 (ko) * 2001-09-29 2008-01-11 삼성전자주식회사 비금속 기판 절단 방법
TWI277612B (en) * 2002-08-09 2007-04-01 Mitsuboshi Diamond Ind Co Ltd Method and device for scribing fragile material substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI451523B (zh) * 2009-03-30 2014-09-01 三星鑽石工業股份有限公司 Substrate fixing device
TWI494186B (zh) * 2009-05-27 2015-08-01 Corning Inc 在高溫下雷射刻劃玻璃之方法與設備
TWI632997B (zh) * 2013-02-28 2018-08-21 美商Ipg光子公司 雷射系統及使用該雷射系統加工藍寶石之方法

Also Published As

Publication number Publication date
CN100475419C (zh) 2009-04-08
KR20070051945A (ko) 2007-05-18
EP1806202A4 (en) 2009-05-06
US7726532B2 (en) 2010-06-01
EP1806202A1 (en) 2007-07-11
EP1806202B1 (en) 2011-08-17
MX2007005018A (es) 2008-02-19
CN101048255A (zh) 2007-10-03
JPWO2006046525A1 (ja) 2008-05-22
ATE520495T1 (de) 2011-09-15
JP4722054B2 (ja) 2011-07-13
US20070228100A1 (en) 2007-10-04
WO2006046525A1 (ja) 2006-05-04
KR100821937B1 (ko) 2008-04-15
TWI358395B (https=) 2012-02-21

Similar Documents

Publication Publication Date Title
TW200621661A (en) Method and device for forming crack
EP1236535A3 (en) Method and device for laser welding of two or more overlapped metal sheets and for clamping the sheets
TW200624206A (en) Laser beam machining apparatus
GB2444438A (en) Methods and systems for positioning a laser beam spot relative to a semiconductor integrated circuit using a processing target as a metrology target
SG160340A1 (en) Laser beam processing machine
ATE374432T1 (de) Teilchenstrahlvorrichtung mit gekippter säule und verfahren zur verwendung derselben
WO2005107996A3 (de) Laser-hybrid-schweissverfahren und -schweissbrenner mit verwendung eines drahtes mit zink- und/oder kohlenstoff- und/oder aluminiumgehalt
AU2003294968A1 (en) Microtome
TW201043375A (en) Laser machining systems, laser machining methods andoptical head
TW200624396A (en) Method and apparatus for scribing brittle material board and system for breaking brittle material board
TW200734263A (en) Substrate exchange apparatus and substrate processing apparatus, and substrate inspection apparatus
SG138540A1 (en) Semiconductor cutting device, semiconductor cutting method, semiconductor cutting system, laser cutting device and laser cutting method
ATE500966T1 (de) Siebdruckmaschine
TW201242914A (en) Breaking device and breaking method
RU2009145279A (ru) Центрирующее устройство для плоских заготовок в прессе и способ накладки такого центрирующего устройства
WO2006020643A3 (en) Ion beam measurement systems and methods for ion implant dose and uniformity control
SG143930A1 (en) A wafer table for die bonding apparatus
JP2011183452A (ja) 鋼板等の切断方法および切断装置
GB0209380D0 (en) Metal working
MX2008009310A (es) Metodo de soldadura con laser.
TW200735169A (en) Position correcting apparatus, vacuum processing apparatus and method for correcting position
TW200710383A (en) Apparatus for inspecting outside appearances
SG155856A1 (en) Method for coarse wafer alignment in a lithographic apparatus
TW200732161A (en) Method for forming mark and liquid ejection apparatus
TW200726559A (en) Cutting off processing system for brittle material and method for the same

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees