TW200540353A - Gas supply integrated unit and method of adding gas unit - Google Patents
Gas supply integrated unit and method of adding gas unit Download PDFInfo
- Publication number
- TW200540353A TW200540353A TW094115878A TW94115878A TW200540353A TW 200540353 A TW200540353 A TW 200540353A TW 094115878 A TW094115878 A TW 094115878A TW 94115878 A TW94115878 A TW 94115878A TW 200540353 A TW200540353 A TW 200540353A
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- unit
- flow path
- common flow
- manual valve
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 161
- 238000011010 flushing procedure Methods 0.000 claims description 101
- 238000009434 installation Methods 0.000 claims description 17
- 239000007787 solid Substances 0.000 claims description 2
- 238000010926 purge Methods 0.000 abstract description 7
- 230000000149 penetrating effect Effects 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 521
- 238000005192 partition Methods 0.000 description 12
- 238000010586 diagram Methods 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000008267 milk Substances 0.000 description 8
- 210000004080 milk Anatomy 0.000 description 8
- 235000013336 milk Nutrition 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 7
- 238000004891 communication Methods 0.000 description 6
- 241001674048 Phthiraptera Species 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 238000005096 rolling process Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000000739 chaotic effect Effects 0.000 description 2
- 210000000078 claw Anatomy 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000796 flavoring agent Substances 0.000 description 2
- 235000019634 flavors Nutrition 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 235000010627 Phaseolus vulgaris Nutrition 0.000 description 1
- 244000046052 Phaseolus vulgaris Species 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 210000000481 breast Anatomy 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- IUCHKMAZAWJNBJ-RCYXVVTDSA-N oleanolic acid 3-O-beta-D-glucosiduronic acid Chemical compound O([C@H]1CC[C@]2(C)[C@H]3CC=C4[C@@]([C@@]3(CC[C@H]2C1(C)C)C)(C)CC[C@]1(CCC(C[C@H]14)(C)C)C(O)=O)[C@@H]1O[C@H](C(O)=O)[C@@H](O)[C@H](O)[C@H]1O IUCHKMAZAWJNBJ-RCYXVVTDSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 238000004148 unit process Methods 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
- F16K27/003—Housing formed from a plurality of the same valve elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K5/00—Plug valves; Taps or cocks comprising only cut-off apparatus having at least one of the sealing faces shaped as a more or less complete surface of a solid of revolution, the opening and closing movement being predominantly rotary
- F16K5/08—Details
- F16K5/10—Means for additional adjustment of the rate of flow
- F16K5/103—Means for additional adjustment of the rate of flow specially adapted for gas valves
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Valve Housings (AREA)
- Pipeline Systems (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004150192 | 2004-05-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200540353A true TW200540353A (en) | 2005-12-16 |
| TWI338755B TWI338755B (enExample) | 2011-03-11 |
Family
ID=35428453
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094115878A TW200540353A (en) | 2004-05-20 | 2005-05-17 | Gas supply integrated unit and method of adding gas unit |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP4504368B2 (enExample) |
| KR (1) | KR101074266B1 (enExample) |
| CN (1) | CN100408900C (enExample) |
| TW (1) | TW200540353A (enExample) |
| WO (1) | WO2005114016A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI568962B (zh) * | 2011-05-20 | 2017-02-01 | 富士金股份有限公司 | 流體控制裝置 |
| TWI650500B (zh) * | 2018-04-02 | 2019-02-11 | 奇鼎科技股份有限公司 | 多流道閥塊 |
| TWI656292B (zh) * | 2016-06-21 | 2019-04-11 | 日商富士金股份有限公司 | Fluid control device |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5081665B2 (ja) * | 2008-02-28 | 2012-11-28 | 株式会社フジキン | 流体制御装置 |
| JP5324347B2 (ja) * | 2009-07-15 | 2013-10-23 | 大陽日酸イー・エム・シー株式会社 | 気相成長装置 |
| JP5669583B2 (ja) * | 2009-09-30 | 2015-02-12 | 株式会社堀場エステック | 流量算出システム、集積型ガスパネル装置及びベースプレート |
| US20140137961A1 (en) * | 2012-11-19 | 2014-05-22 | Applied Materials, Inc. | Modular chemical delivery system |
| JP7583186B2 (ja) | 2021-03-03 | 2024-11-13 | アイコール・システムズ・インク | マニホールドアセンブリを備える流体流れ制御システム |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6068016A (en) * | 1997-09-25 | 2000-05-30 | Applied Materials, Inc | Modular fluid flow system with integrated pump-purge |
| JPH10214117A (ja) * | 1998-03-05 | 1998-08-11 | Ckd Corp | ガス供給集積ユニット及びそのシステム |
| JPH11294698A (ja) * | 1998-04-10 | 1999-10-29 | Nippon Sanso Kk | ガス供給設備 |
| JP2000035148A (ja) * | 1998-07-22 | 2000-02-02 | Hitachi Metals Ltd | 集積形流体制御装置 |
| JP3409060B2 (ja) * | 1999-03-31 | 2003-05-19 | エスエムシー株式会社 | シリアル信号駆動のマニホールド形電磁弁 |
| JP4238453B2 (ja) * | 2000-03-10 | 2009-03-18 | 株式会社東芝 | 流体制御装置 |
| JP2001355800A (ja) * | 2000-06-14 | 2001-12-26 | Nippon Applied Flow Kk | ガス供給装置 |
| JP3482601B2 (ja) * | 2000-06-30 | 2003-12-22 | 東京エレクトロン株式会社 | 流体制御装置 |
| US6325248B1 (en) * | 2000-07-05 | 2001-12-04 | Robert E. Corba | Container assembly |
| JP4487135B2 (ja) * | 2001-03-05 | 2010-06-23 | 東京エレクトロン株式会社 | 流体制御装置 |
| JP4554853B2 (ja) * | 2001-09-17 | 2010-09-29 | シーケーディ株式会社 | ガス供給集積弁 |
| JP4501027B2 (ja) * | 2003-08-22 | 2010-07-14 | 株式会社フジキン | 流体制御装置 |
| JP3809162B2 (ja) * | 2003-11-12 | 2006-08-16 | シーケーディ株式会社 | ガス供給集積ユニット |
| JP3767897B2 (ja) * | 2004-03-01 | 2006-04-19 | シーケーディ株式会社 | ガス供給集積ユニット |
-
2005
- 2005-05-12 CN CNB2005800160442A patent/CN100408900C/zh not_active Expired - Lifetime
- 2005-05-12 JP JP2006513686A patent/JP4504368B2/ja not_active Expired - Lifetime
- 2005-05-12 WO PCT/JP2005/008694 patent/WO2005114016A1/ja not_active Ceased
- 2005-05-17 TW TW094115878A patent/TW200540353A/zh unknown
-
2006
- 2006-12-18 KR KR1020067026668A patent/KR101074266B1/ko not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI568962B (zh) * | 2011-05-20 | 2017-02-01 | 富士金股份有限公司 | 流體控制裝置 |
| TWI656292B (zh) * | 2016-06-21 | 2019-04-11 | 日商富士金股份有限公司 | Fluid control device |
| TWI650500B (zh) * | 2018-04-02 | 2019-02-11 | 奇鼎科技股份有限公司 | 多流道閥塊 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101074266B1 (ko) | 2011-10-19 |
| JP4504368B2 (ja) | 2010-07-14 |
| CN100408900C (zh) | 2008-08-06 |
| CN1957197A (zh) | 2007-05-02 |
| WO2005114016A1 (ja) | 2005-12-01 |
| KR20070028428A (ko) | 2007-03-12 |
| TWI338755B (enExample) | 2011-03-11 |
| JPWO2005114016A1 (ja) | 2008-03-27 |
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