SG133537A1 - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
SG133537A1
SG133537A1 SG200608735-7A SG2006087357A SG133537A1 SG 133537 A1 SG133537 A1 SG 133537A1 SG 2006087357 A SG2006087357 A SG 2006087357A SG 133537 A1 SG133537 A1 SG 133537A1
Authority
SG
Singapore
Prior art keywords
receiving element
light receiving
reflection layer
infrared ray
layer
Prior art date
Application number
SG200608735-7A
Other languages
English (en)
Inventor
Kazuo Okada
Katsuhiko Kitagawa
Takashi Noma
Shigeki Otsuka
Hiroshi Yamada
Shinzo Ishibe
Yuichi Morita
Noboru Okubo
Hiroyuki Shinogi
Mitsuru Okigawa
Original Assignee
Sanyo Electric Co
Sanyo Semiconductor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co, Sanyo Semiconductor Co Ltd filed Critical Sanyo Electric Co
Publication of SG133537A1 publication Critical patent/SG133537A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14618Containers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14625Optical elements or arrangements associated with the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0203Containers; Encapsulations, e.g. encapsulation of photodiodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0232Optical elements or arrangements associated with the device
    • H01L31/02327Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/023Redistribution layers [RDL] for bonding areas
    • H01L2224/0237Disposition of the redistribution layers
    • H01L2224/02371Disposition of the redistribution layers connecting the bonding area on a surface of the semiconductor or solid-state body with another surface of the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/023Redistribution layers [RDL] for bonding areas
    • H01L2224/0237Disposition of the redistribution layers
    • H01L2224/02372Disposition of the redistribution layers connecting to a via connection in the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/0401Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/05541Structure
    • H01L2224/05548Bonding area integrally formed with a redistribution layer on the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • H01L2224/13001Core members of the bump connector
    • H01L2224/1302Disposition
    • H01L2224/13022Disposition the bump connector being at least partially embedded in the surface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • H01L2224/13001Core members of the bump connector
    • H01L2224/1302Disposition
    • H01L2224/13024Disposition the bump connector being disposed on a redistribution layer on the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • H01L2224/13001Core members of the bump connector
    • H01L2224/13099Material
    • H01L2224/131Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/481Internal lead connections, e.g. via connections, feedthrough structures

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Light Receiving Elements (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
SG200608735-7A 2005-12-15 2006-12-15 Semiconductor device SG133537A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005361706 2005-12-15
JP2006310623A JP5010244B2 (ja) 2005-12-15 2006-11-16 半導体装置

Publications (1)

Publication Number Publication Date
SG133537A1 true SG133537A1 (en) 2007-07-30

Family

ID=37858482

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200608735-7A SG133537A1 (en) 2005-12-15 2006-12-15 Semiconductor device

Country Status (6)

Country Link
US (1) US7986021B2 (de)
EP (1) EP1798769A3 (de)
JP (1) JP5010244B2 (de)
KR (1) KR20070064273A (de)
SG (1) SG133537A1 (de)
TW (1) TWI343645B (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007165696A (ja) * 2005-12-15 2007-06-28 Sanyo Electric Co Ltd 半導体装置及びその製造方法
JP5301108B2 (ja) * 2007-04-20 2013-09-25 セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー 半導体装置
JP2009032929A (ja) * 2007-07-27 2009-02-12 Sanyo Electric Co Ltd 半導体装置及びその製造方法
TWI382477B (zh) * 2007-08-24 2013-01-11 Xintec Inc 電子元件的晶圓級封裝及其製造方法
TWI375321B (en) * 2007-08-24 2012-10-21 Xintec Inc Electronic device wafer level scale packages and fabrication methods thereof
JP2009099591A (ja) * 2007-10-12 2009-05-07 Toshiba Corp 固体撮像素子及びその製造方法
KR101446330B1 (ko) * 2008-01-29 2014-10-02 삼성전자주식회사 관통 비아를 갖는 이미지 센서
WO2009103048A1 (en) * 2008-02-14 2009-08-20 Quantum Semiconductor Llc Dual photo-diode cmos pixels
JP2010103300A (ja) * 2008-10-23 2010-05-06 Sanyo Electric Co Ltd 半導体装置及びその製造方法
US8298917B2 (en) * 2009-04-14 2012-10-30 International Business Machines Corporation Process for wet singulation using a dicing singulation structure
JPWO2011058977A1 (ja) * 2009-11-10 2013-04-04 ローム株式会社 半導体装置および半導体装置の製造方法
CN101789414B (zh) * 2010-02-26 2011-08-17 苏州晶方半导体科技股份有限公司 超薄半导体芯片封装结构及其制造工艺
KR101731047B1 (ko) * 2010-12-01 2017-05-12 삼성디스플레이 주식회사 적외선 감지 트랜지스터, 이를 포함하는 표시 장치의 제조 방법
CN102592982B (zh) * 2011-01-17 2017-05-03 精材科技股份有限公司 晶片封装体的形成方法
JP6215612B2 (ja) * 2013-08-07 2017-10-18 ソニーセミコンダクタソリューションズ株式会社 発光素子、発光素子ウェーハ及び電子機器
TWI569427B (zh) * 2014-10-22 2017-02-01 精材科技股份有限公司 半導體封裝件及其製法
CN108450036B (zh) * 2015-12-24 2023-03-28 京瓷株式会社 摄像元件安装用基板及摄像装置
JP2018133392A (ja) * 2017-02-14 2018-08-23 キヤノン株式会社 光電変換装置
JP7204667B2 (ja) * 2017-04-20 2023-01-16 トリナミクス ゲゼルシャフト ミット ベシュレンクテル ハフツング 光検出器
WO2020157029A1 (en) 2019-01-29 2020-08-06 Trinamix Gmbh Optical detector

Family Cites Families (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6057714B2 (ja) * 1978-01-27 1985-12-16 株式会社日立製作所 光半導体装置
JPH0521698A (ja) 1991-07-11 1993-01-29 Mitsubishi Electric Corp 半導体装置
JP3242495B2 (ja) * 1993-07-01 2001-12-25 シャープ株式会社 多層膜フィルタ付き受光素子及びその製造方法
JP2674545B2 (ja) * 1995-01-20 1997-11-12 日本電気株式会社 赤外線検出器及びその駆動方法
US5804827A (en) * 1995-10-27 1998-09-08 Nikon Corporation Infrared ray detection device and solid-state imaging apparatus
US6563192B1 (en) * 1995-12-22 2003-05-13 Micron Technology, Inc. Semiconductor die with integral decoupling capacitor
JPH09321333A (ja) 1996-05-24 1997-12-12 Nikon Corp 赤外線検出素子
US5929440A (en) * 1996-10-25 1999-07-27 Hypres, Inc. Electromagnetic radiation detector
US5981314A (en) * 1996-10-31 1999-11-09 Amkor Technology, Inc. Near chip size integrated circuit package
US5982018A (en) * 1997-05-23 1999-11-09 Micron Technology, Inc. Thin film capacitor coupons for memory modules and multi-chip modules
US5973337A (en) * 1997-08-25 1999-10-26 Motorola, Inc. Ball grid device with optically transmissive coating
JPH11167154A (ja) * 1997-12-03 1999-06-22 Olympus Optical Co Ltd フレキシブルプリント基板
IL123207A0 (en) * 1998-02-06 1998-09-24 Shellcase Ltd Integrated circuit device
JP3601761B2 (ja) * 1998-11-19 2004-12-15 松下電器産業株式会社 受光素子およびその製造方法
US6236103B1 (en) * 1999-03-31 2001-05-22 International Business Machines Corp. Integrated high-performance decoupling capacitor and heat sink
JP2000349238A (ja) 1999-06-04 2000-12-15 Seiko Epson Corp 半導体装置
US6326689B1 (en) * 1999-07-26 2001-12-04 Stmicroelectronics, Inc. Backside contact for touchchip
US6465786B1 (en) * 1999-09-01 2002-10-15 Micron Technology, Inc. Deep infrared photodiode for a CMOS imager
JP2001128072A (ja) * 1999-10-29 2001-05-11 Sony Corp 撮像素子、撮像装置、カメラモジュール及びカメラシステム
JP2001085652A (ja) * 1999-09-09 2001-03-30 Sony Corp 赤外線用ccd撮像素子パッケージ
JP3632558B2 (ja) * 1999-09-17 2005-03-23 日立化成工業株式会社 封止用エポキシ樹脂組成物及び電子部品装置
JP3514681B2 (ja) * 1999-11-30 2004-03-31 三菱電機株式会社 赤外線検出器
US6455774B1 (en) * 1999-12-08 2002-09-24 Amkor Technology, Inc. Molded image sensor package
JP2002094082A (ja) * 2000-07-11 2002-03-29 Seiko Epson Corp 光素子及びその製造方法並びに電子機器
JP2002033473A (ja) * 2000-07-17 2002-01-31 Hamamatsu Photonics Kk 半導体装置
JP3409848B2 (ja) * 2000-08-29 2003-05-26 日本電気株式会社 熱型赤外線検出器
WO2002023220A1 (fr) * 2000-09-11 2002-03-21 Hamamatsu Photonics K.K. Panneau de scintillateur, capteur d'images radiographiques et procedes de production
KR20020048716A (ko) 2000-12-18 2002-06-24 박종섭 기판 뒷면에 반사층을 구비하는 이미지 센서 및 그 제조방법
JP3910817B2 (ja) * 2000-12-19 2007-04-25 ユーディナデバイス株式会社 半導体受光装置
JP2002329850A (ja) * 2001-05-01 2002-11-15 Canon Inc チップサイズパッケージおよびその製造方法
DE10142481A1 (de) * 2001-08-31 2003-03-27 Rudolf Hezel Solarzelle sowie Verfahren zur Herstellung einer solchen
TWI232560B (en) * 2002-04-23 2005-05-11 Sanyo Electric Co Semiconductor device and its manufacture
JP3923368B2 (ja) * 2002-05-22 2007-05-30 シャープ株式会社 半導体素子の製造方法
JP2003347476A (ja) * 2002-05-22 2003-12-05 Sanyo Electric Co Ltd 半導体集積装置及びその製造方法
JP4037197B2 (ja) * 2002-07-17 2008-01-23 富士フイルム株式会社 半導体撮像装置実装構造体の製造方法
US20040108588A1 (en) * 2002-09-24 2004-06-10 Cookson Electronics, Inc. Package for microchips
US7033664B2 (en) * 2002-10-22 2006-04-25 Tessera Technologies Hungary Kft Methods for producing packaged integrated circuit devices and packaged integrated circuit devices produced thereby
TWI239607B (en) * 2002-12-13 2005-09-11 Sanyo Electric Co Method for making a semiconductor device
JP5030360B2 (ja) * 2002-12-25 2012-09-19 オリンパス株式会社 固体撮像装置の製造方法
JP2004260135A (ja) * 2003-02-06 2004-09-16 Sanyo Electric Co Ltd 半導体集積装置及びその製造方法
JP2004319530A (ja) * 2003-02-28 2004-11-11 Sanyo Electric Co Ltd 光半導体装置およびその製造方法
JP2004311783A (ja) * 2003-04-08 2004-11-04 Fuji Xerox Co Ltd 光検出装置、及びその実装方法
TWI229890B (en) * 2003-04-24 2005-03-21 Sanyo Electric Co Semiconductor device and method of manufacturing same
CN100587962C (zh) 2003-07-03 2010-02-03 泰塞拉技术匈牙利公司 用于封装集成电路器件的方法和设备
JP4401181B2 (ja) * 2003-08-06 2010-01-20 三洋電機株式会社 半導体装置及びその製造方法
US7329861B2 (en) * 2003-10-14 2008-02-12 Micron Technology, Inc. Integrally packaged imaging module
JP2005327984A (ja) * 2004-05-17 2005-11-24 Shinko Electric Ind Co Ltd 電子部品及び電子部品実装構造の製造方法
US7332408B2 (en) * 2004-06-28 2008-02-19 Micron Technology, Inc. Isolation trenches for memory devices
JP4271625B2 (ja) * 2004-06-30 2009-06-03 株式会社フジクラ 半導体パッケージ及びその製造方法
JP2006093367A (ja) * 2004-09-24 2006-04-06 Sanyo Electric Co Ltd 半導体装置の製造方法
TWI273682B (en) * 2004-10-08 2007-02-11 Epworks Co Ltd Method for manufacturing wafer level chip scale package using redistribution substrate
US7374971B2 (en) * 2005-04-20 2008-05-20 Freescale Semiconductor, Inc. Semiconductor die edge reconditioning
KR100629498B1 (ko) * 2005-07-15 2006-09-28 삼성전자주식회사 마이크로 패키지, 멀티―스택 마이크로 패키지 및 이들의제조방법
US7576361B2 (en) * 2005-08-03 2009-08-18 Aptina Imaging Corporation Backside silicon wafer design reducing image artifacts from infrared radiation
JP2007165696A (ja) * 2005-12-15 2007-06-28 Sanyo Electric Co Ltd 半導体装置及びその製造方法
JP2007184680A (ja) * 2006-01-04 2007-07-19 Fujifilm Corp 固体撮像装置及びその製造方法
TW200737506A (en) * 2006-03-07 2007-10-01 Sanyo Electric Co Semiconductor device and manufacturing method of the same
WO2008018524A1 (en) * 2006-08-11 2008-02-14 Sanyo Electric Co., Ltd. Semiconductor device and its manufacturing method
US7569409B2 (en) * 2007-01-04 2009-08-04 Visera Technologies Company Limited Isolation structures for CMOS image sensor chip scale packages
JP5295783B2 (ja) * 2007-02-02 2013-09-18 セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー 半導体装置
JP5301108B2 (ja) * 2007-04-20 2013-09-25 セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー 半導体装置
JP2008294405A (ja) * 2007-04-25 2008-12-04 Sanyo Electric Co Ltd 半導体装置及びその製造方法
TW200845339A (en) * 2007-05-07 2008-11-16 Sanyo Electric Co Semiconductor device and manufacturing method thereof
JP2009032929A (ja) * 2007-07-27 2009-02-12 Sanyo Electric Co Ltd 半導体装置及びその製造方法
CN101123231B (zh) * 2007-08-31 2010-11-03 晶方半导体科技(苏州)有限公司 微机电系统的晶圆级芯片尺寸封装结构及其制造方法

Also Published As

Publication number Publication date
JP5010244B2 (ja) 2012-08-29
US7986021B2 (en) 2011-07-26
EP1798769A3 (de) 2009-07-08
US20070145420A1 (en) 2007-06-28
TW200731520A (en) 2007-08-16
TWI343645B (en) 2011-06-11
EP1798769A2 (de) 2007-06-20
JP2007189198A (ja) 2007-07-26
KR20070064273A (ko) 2007-06-20

Similar Documents

Publication Publication Date Title
SG133537A1 (en) Semiconductor device
WO2007019073A3 (en) Backside silicon wafer design reducing image artifacts from infrared radiation
TW200717879A (en) Optoelectronic component
TW200707714A (en) Backside illuminated semiconductor device
WO2017155319A3 (ko) 센싱 기능을 포함하는 디스플레이 및 그것을 포함하는 전자 장치
WO2009119979A3 (ko) 광 포인팅장치 및 이를 갖는 휴대 전자기기
TW200605652A (en) Image capturing device
TW200639378A (en) A sensor
TW200739929A (en) Semiconductor photonic devices with enhanced responsivity and reduced stray light
DE502006007354D1 (de) Optoelektronische Sensoreinrichtung
DE602007005501D1 (de) Feststofflichtquelle mit farbreflexion und kombinierten kommunikationsmitteln
TW200605412A (en) Luminous diodes arrangement
TW200625692A (en) White-light emitting device and method for manufacturing the same
TW200735648A (en) Dust-proof, light-transmitting member and its use, and imaging apparatus comprising same
EP2124263A3 (de) Optisches Reflexionssensorelement
TW200729436A (en) Integrated circuit device
WO2007146709A3 (en) Adapted led device with re-emitting semiconductor construction
TW200745969A (en) Integrated PUF
TW200619711A (en) Optical semiconductor module and semiconductor apparatus using the same
WO2008142877A1 (ja) 光学部材とそれを用いた照明装置、表示装置及びテレビ受信装置
WO2008008478A3 (en) Spatial light modulator featured with an anti-reflective structure
WO2006096794A3 (en) System having aperture-matched optical component and light emitting device
TW200943588A (en) Optoelectronic component
TW200739430A (en) Optical sensor
TW200802901A (en) Optical semiconductor device with sensitivity improved