SG133432A1 - Localized annealing during semiconductor device fabrication - Google Patents

Localized annealing during semiconductor device fabrication

Info

Publication number
SG133432A1
SG133432A1 SG200508210-2A SG2005082102A SG133432A1 SG 133432 A1 SG133432 A1 SG 133432A1 SG 2005082102 A SG2005082102 A SG 2005082102A SG 133432 A1 SG133432 A1 SG 133432A1
Authority
SG
Singapore
Prior art keywords
semiconductor device
device fabrication
during semiconductor
annealing during
localized annealing
Prior art date
Application number
SG200508210-2A
Other languages
English (en)
Inventor
Shu Yuan
Jing Lin
Original Assignee
Tinggi Tech Private Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tinggi Tech Private Ltd filed Critical Tinggi Tech Private Ltd
Priority to SG200508210-2A priority Critical patent/SG133432A1/en
Priority to KR1020087017343A priority patent/KR20080096510A/ko
Priority to PCT/SG2006/000395 priority patent/WO2007073354A1/en
Priority to US12/158,678 priority patent/US8329556B2/en
Priority to CN2006800481382A priority patent/CN101410991B/zh
Priority to JP2008547189A priority patent/JP2009520376A/ja
Publication of SG133432A1 publication Critical patent/SG133432A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • H01L21/263Bombardment with radiation with high-energy radiation
    • H01L21/268Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • H01L21/263Bombardment with radiation with high-energy radiation
    • H01L21/268Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
    • H01L21/2686Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation using incoherent radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28575Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Recrystallisation Techniques (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
SG200508210-2A 2005-12-20 2005-12-20 Localized annealing during semiconductor device fabrication SG133432A1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
SG200508210-2A SG133432A1 (en) 2005-12-20 2005-12-20 Localized annealing during semiconductor device fabrication
KR1020087017343A KR20080096510A (ko) 2005-12-20 2006-12-19 반도체 장치 제조시의 국지적 어닐링
PCT/SG2006/000395 WO2007073354A1 (en) 2005-12-20 2006-12-19 Localized annealing during semiconductor device fabrication
US12/158,678 US8329556B2 (en) 2005-12-20 2006-12-19 Localized annealing during semiconductor device fabrication
CN2006800481382A CN101410991B (zh) 2005-12-20 2006-12-19 半导体器件制造期间的局部退火
JP2008547189A JP2009520376A (ja) 2005-12-20 2006-12-19 半導体デバイス形成中における局部アニーリング

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG200508210-2A SG133432A1 (en) 2005-12-20 2005-12-20 Localized annealing during semiconductor device fabrication

Publications (1)

Publication Number Publication Date
SG133432A1 true SG133432A1 (en) 2007-07-30

Family

ID=38188964

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200508210-2A SG133432A1 (en) 2005-12-20 2005-12-20 Localized annealing during semiconductor device fabrication

Country Status (6)

Country Link
US (1) US8329556B2 (enExample)
JP (1) JP2009520376A (enExample)
KR (1) KR20080096510A (enExample)
CN (1) CN101410991B (enExample)
SG (1) SG133432A1 (enExample)
WO (1) WO2007073354A1 (enExample)

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US8034643B2 (en) 2003-09-19 2011-10-11 Tinggi Technologies Private Limited Method for fabrication of a semiconductor device
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CN1998094B (zh) 2004-04-07 2012-12-26 霆激技术有限公司 半导体发光二极管上的反射层的制造
SG130975A1 (en) 2005-09-29 2007-04-26 Tinggi Tech Private Ltd Fabrication of semiconductor devices for light emission
SG131803A1 (en) 2005-10-19 2007-05-28 Tinggi Tech Private Ltd Fabrication of transistors
SG140473A1 (en) 2006-08-16 2008-03-28 Tinggi Tech Private Ltd Improvements in external light efficiency of light emitting diodes
SG140512A1 (en) 2006-09-04 2008-03-28 Tinggi Tech Private Ltd Electrical current distribution in light emitting devices
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CN101410991B (zh) 2011-04-13
KR20080096510A (ko) 2008-10-30
US8329556B2 (en) 2012-12-11
WO2007073354A1 (en) 2007-06-28
JP2009520376A (ja) 2009-05-21
US20100047996A1 (en) 2010-02-25

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