SG123752A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG123752A1
SG123752A1 SG200508322A SG200508322A SG123752A1 SG 123752 A1 SG123752 A1 SG 123752A1 SG 200508322 A SG200508322 A SG 200508322A SG 200508322 A SG200508322 A SG 200508322A SG 123752 A1 SG123752 A1 SG 123752A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200508322A
Other languages
English (en)
Inventor
Johannes Jacobus Mat Baselmans
Sjoerd Nicolaas Lamber Donders
Christiaan Alexander Hoogendam
Jeroen Johannes Sophia Mertens
Johannes Catharinus Hu Mulkens
Bob Streefkerk
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG123752A1 publication Critical patent/SG123752A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
SG200508322A 2004-12-30 2005-12-22 Lithographic apparatus and device manufacturing method SG123752A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/025,603 US20060147821A1 (en) 2004-12-30 2004-12-30 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG123752A1 true SG123752A1 (en) 2006-07-26

Family

ID=35790378

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200508322A SG123752A1 (en) 2004-12-30 2005-12-22 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (4) US20060147821A1 (ja)
EP (2) EP2264530A1 (ja)
JP (3) JP2006191079A (ja)
KR (1) KR100742765B1 (ja)
CN (1) CN1808279A (ja)
SG (1) SG123752A1 (ja)
TW (1) TWI342468B (ja)

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Also Published As

Publication number Publication date
KR20060079112A (ko) 2006-07-05
KR100742765B1 (ko) 2007-07-25
TWI342468B (en) 2011-05-21
US20060147821A1 (en) 2006-07-06
US8354209B2 (en) 2013-01-15
EP1677156B1 (en) 2011-08-31
US20120086928A1 (en) 2012-04-12
CN1808279A (zh) 2006-07-26
JP2011018925A (ja) 2011-01-27
EP1677156A1 (en) 2006-07-05
JP2009055068A (ja) 2009-03-12
TW200627088A (en) 2006-08-01
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