SE8702410L - Forfarande for termokemisk ytbehandling av material i ett reaktivt gasplasma - Google Patents

Forfarande for termokemisk ytbehandling av material i ett reaktivt gasplasma

Info

Publication number
SE8702410L
SE8702410L SE8702410A SE8702410A SE8702410L SE 8702410 L SE8702410 L SE 8702410L SE 8702410 A SE8702410 A SE 8702410A SE 8702410 A SE8702410 A SE 8702410A SE 8702410 L SE8702410 L SE 8702410L
Authority
SE
Sweden
Prior art keywords
reactive gas
surface treatment
conduct
methods described
gas plasma
Prior art date
Application number
SE8702410A
Other languages
Unknown language ( )
English (en)
Other versions
SE465578B (sv
SE8702410D0 (sv
Inventor
E Bergmann
E Hummer
Original Assignee
Balzers Hochvakuum
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Hochvakuum filed Critical Balzers Hochvakuum
Publication of SE8702410D0 publication Critical patent/SE8702410D0/sv
Publication of SE8702410L publication Critical patent/SE8702410L/sv
Publication of SE465578B publication Critical patent/SE465578B/sv

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated
    • C23C16/0272Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/021Cleaning or etching treatments
    • C23C14/022Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Physical Vapour Deposition (AREA)
SE8702410A 1986-06-13 1987-06-10 Foerfarande foer termokemisk ytbehandling av material i en vakuumkammare samt formkropp behandlad medelst foerfarandet SE465578B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH2415/86A CH671407A5 (sv) 1986-06-13 1986-06-13

Publications (3)

Publication Number Publication Date
SE8702410D0 SE8702410D0 (sv) 1987-06-10
SE8702410L true SE8702410L (sv) 1987-12-14
SE465578B SE465578B (sv) 1991-09-30

Family

ID=4233265

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8702410A SE465578B (sv) 1986-06-13 1987-06-10 Foerfarande foer termokemisk ytbehandling av material i en vakuumkammare samt formkropp behandlad medelst foerfarandet

Country Status (8)

Country Link
US (1) US4762756A (sv)
JP (1) JPS62294160A (sv)
CH (1) CH671407A5 (sv)
DE (1) DE3702984A1 (sv)
FR (1) FR2600082B1 (sv)
GB (1) GB2192196B (sv)
NL (1) NL194551C (sv)
SE (1) SE465578B (sv)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3742317A1 (de) * 1987-12-14 1989-06-22 Repenning Detlev Verfahren zur herstellung korrosion-, verschleiss- und pressfester schichten
FR2630133B1 (fr) * 1988-04-18 1993-09-24 Siderurgie Fse Inst Rech Procede pour l'amelioration de la resistance a la corrosion de materiaux metalliques
US5079089A (en) * 1988-07-28 1992-01-07 Nippon Steel Corporation Multi ceramic layer-coated metal plate and process for manufacturing same
US5192410A (en) * 1988-07-28 1993-03-09 Nippon Steel Corporation Process for manufacturing multi ceramic layer-coated metal plate
US5304417A (en) * 1989-06-02 1994-04-19 Air Products And Chemicals, Inc. Graphite/carbon articles for elevated temperature service and method of manufacture
DE3918562A1 (de) * 1989-06-07 1990-12-13 Repenning Detlev Verfahren zur herstellung hochharter schichten auf refraktaeren metallwerkstoffen sowie ihren legierungen
DE69008511T2 (de) * 1989-09-29 1994-08-18 Sumitomo Electric Industries Oberflächenbeschichtete hartwerkstoffe für schneidende und verschleissfeste werkzeuge.
EP0518879A4 (en) * 1990-03-09 1993-09-01 Kennametal Inc. Physical vapor deposition of titanium nitride on a nonconductive substrate
US5264297A (en) * 1990-03-09 1993-11-23 Kennametal Inc. Physical vapor deposition of titanium nitride on a nonconductive substrate
US5707692A (en) * 1990-10-23 1998-01-13 Canon Kabushiki Kaisha Apparatus and method for processing a base substance using plasma and a magnetic field
EP0583473B1 (en) * 1991-04-29 1998-10-14 Scientific-Industrial Enterprise NOVATECH Method and device for treatment of articles in gas-discharge plasma
CH683776A5 (de) * 1991-12-05 1994-05-13 Alusuisse Lonza Services Ag Beschichten einer Substratfläche mit einer Permeationssperre.
US5383980A (en) * 1992-01-20 1995-01-24 Leybold Durferrit Gmbh Process for hardening workpieces in a pulsed plasma discharge
WO1994004716A1 (en) * 1992-08-14 1994-03-03 Hughes Aircraft Company Surface preparation and deposition method for titanium nitride onto carbonaceous materials
DE4416525B4 (de) * 1993-05-27 2008-06-05 Oerlikon Trading Ag, Trübbach Verfahren zur Herstellung einer Beschichtung erhöhter Verschleißfestigkeit auf Werkstückoberflächen, und dessen Verwendung
KR100326488B1 (ko) * 1993-06-21 2002-06-20 조셉 제이. 스위니 플라즈마화학기상증착법
JP2909361B2 (ja) * 1993-09-21 1999-06-23 大阪府 チタン金属の表面処理方法
RU2048601C1 (ru) * 1993-12-20 1995-11-20 Рыжов Николай Михайлович Способ диагностики процесса химико-термической обработки сталей и сплавов в тлеющем разряде и устройство для его осуществления
US5975912A (en) * 1994-06-03 1999-11-02 Materials Research Corporation Low temperature plasma-enhanced formation of integrated circuits
US5628829A (en) 1994-06-03 1997-05-13 Materials Research Corporation Method and apparatus for low temperature deposition of CVD and PECVD films
US5665640A (en) 1994-06-03 1997-09-09 Sony Corporation Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
DE19526387C2 (de) * 1994-07-19 1998-12-10 Sumitomo Metal Mining Co Doppelt beschichteter Stahlverbundgegenstand und Verfahren zu dessen Herstellung
EP0703303A1 (de) * 1994-07-27 1996-03-27 Balzers Sa Korrosions- und verschleissfester Körper sowie Verfahren zu dessen Herstellung
EP0694629A3 (de) 1994-07-27 1998-09-23 Balzers Sa Korrosions- und verschleissfester Körper, Verfahren zu dessen Herstellung sowie Vakuumbehandlungsanlage
US5830540A (en) * 1994-09-15 1998-11-03 Eltron Research, Inc. Method and apparatus for reactive plasma surfacing
DE4440521C1 (de) 1994-11-12 1995-11-02 Rowo Coating Ges Fuer Beschich Vorrichtung zum Beschichten von Substraten mit einem Materialdampf im Unterdruck oder Vakuum
US5753045A (en) * 1995-01-25 1998-05-19 Balzers Aktiengesellschaft Vacuum treatment system for homogeneous workpiece processing
EP0724026B1 (de) * 1995-01-25 1999-10-13 Balzers Aktiengesellschaft Verfahren zur reaktiven Schichtabscheidung
US6821500B2 (en) 1995-03-14 2004-11-23 Bechtel Bwxt Idaho, Llc Thermal synthesis apparatus and process
US5749937A (en) * 1995-03-14 1998-05-12 Lockheed Idaho Technologies Company Fast quench reactor and method
US7576296B2 (en) * 1995-03-14 2009-08-18 Battelle Energy Alliance, Llc Thermal synthesis apparatus
WO1996031899A1 (en) * 1995-04-07 1996-10-10 Advanced Energy Industries, Inc. Adjustable energy quantum thin film plasma processing system
US5972790A (en) * 1995-06-09 1999-10-26 Tokyo Electron Limited Method for forming salicides
US6452338B1 (en) 1999-12-13 2002-09-17 Semequip, Inc. Electron beam ion source with integral low-temperature vaporizer
AU2906401A (en) * 1999-12-21 2001-07-03 Bechtel Bwxt Idaho, Llc Hydrogen and elemental carbon production from natural gas and other hydrocarbons
US6605160B2 (en) 2000-08-21 2003-08-12 Robert Frank Hoskin Repair of coatings and surfaces using reactive metals coating processes
DE10048589A1 (de) * 2000-09-30 2002-04-25 Volkswagen Ag Schaltvorrichtung für ein Kraftfahrzeuggetriebe
US6936145B2 (en) * 2002-02-28 2005-08-30 Ionedge Corporation Coating method and apparatus
BR0205419B1 (pt) * 2002-12-20 2017-10-24 Coppe/Ufrj Coordenacao Dos Programas De Pos Graduacao De Engenharia Da Univ Federal Do Rio De Janeir Process of ionic nitretation by pulsed plasma for obtaining diffusion barrier for hydrogen for steel api 5l x-65
US7216067B2 (en) * 2002-12-31 2007-05-08 Tokyo Electron Limited Non-linear test load and method of calibrating a plasma system
EP1664379B1 (en) * 2003-09-19 2010-04-28 Akzo Nobel N.V. Metallization of substrate (s) by a liquid/vapor deposition process
US20050281958A1 (en) * 2004-06-22 2005-12-22 Walton Scott G Electron beam enhanced nitriding system (EBENS)
US7354561B2 (en) * 2004-11-17 2008-04-08 Battelle Energy Alliance, Llc Chemical reactor and method for chemically converting a first material into a second material
US8591821B2 (en) * 2009-04-23 2013-11-26 Battelle Energy Alliance, Llc Combustion flame-plasma hybrid reactor systems, and chemical reactant sources
PL2429777T3 (pl) * 2009-05-15 2017-11-30 The Gillette Company Llc Powłoka ostrza maszynki do golenia
US10304665B2 (en) 2011-09-07 2019-05-28 Nano-Product Engineering, LLC Reactors for plasma-assisted processes and associated methods
US9761424B1 (en) 2011-09-07 2017-09-12 Nano-Product Engineering, LLC Filtered cathodic arc method, apparatus and applications thereof
RU2611251C2 (ru) * 2015-06-15 2017-02-21 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Уфимский государственный авиационный технический университет" Способ азотирования в плазме повышенной плотности
JP7244387B2 (ja) * 2019-07-31 2023-03-22 Dowaサーモテック株式会社 珪窒化バナジウム膜被覆部材の製造方法および珪窒化バナジウム膜被覆部材

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1150655B (de) * 1960-05-05 1963-06-27 Siemens Ag Verfahren zum Dotieren eines festen Halbleiterkristalls
US3639151A (en) * 1969-03-13 1972-02-01 United Aircraft Corp Vapor randomization in vacuum deposition of coatings
RO74414A2 (ro) * 1974-03-23 1981-09-24 Institutul De Cercetari Si Proiectari Tehnologice Pentru Sectoare Calde,Ro Procedeu de nitrurare ionica
JPS5118944A (ja) * 1974-08-07 1976-02-14 Suwa Seikosha Kk Kisohokaho
GB1483966A (en) * 1974-10-23 1977-08-24 Sharp Kk Vapourized-metal cluster ion source and ionized-cluster beam deposition
CS176690B1 (sv) * 1975-03-04 1977-06-30
GB1422519A (en) * 1975-03-21 1976-01-28 Telic Corp Sputtering method and apparatus
GB1582231A (en) * 1976-08-13 1981-01-07 Nat Res Dev Application of a layer of carbonaceous material to a surface
SE407081B (sv) * 1977-07-27 1979-03-12 Hultquist Gunnar B Sett att framstella ytskikt med forbettrade korrosionsegenskaper pa foremal av jernkromlegerigar
GB2030180B (en) * 1978-01-26 1983-05-25 Secr Defence Vapour deposition of metal in plasma discharge
JPS5845177B2 (ja) * 1979-03-09 1983-10-07 富士通株式会社 半導体表面絶縁膜の形成法
GB2058146B (en) * 1979-09-14 1983-08-10 Atomic Energy Authority Uk Ion implanting ferrous metals to improve corrosion resistance
JPS5665975A (en) * 1979-11-02 1981-06-04 Akihiro Saito Surface treatment of metal
GB2070340B (en) * 1980-02-07 1983-10-12 Shinetsu Chemical Co Method for surface properties of a disclike shaped article of a vinyl chloridebased resin
JPS56116869A (en) * 1980-02-18 1981-09-12 Shunpei Yamazaki Inductive reduced pressure gaseous phase method
FR2501727A1 (fr) * 1981-03-13 1982-09-17 Vide Traitement Procede de traitements thermochimiques de metaux par bombardement ionique
FI63783C (fi) * 1981-09-30 1983-08-10 Kymin Oy Kymmene Ab Foerfarande foer nitrering vid laogt tryck med hjaelp av glimurladdning
JPS58141376A (ja) * 1982-02-16 1983-08-22 Seiko Epson Corp プラズマセメンテ−シヨン
JPS58174568A (ja) * 1982-04-08 1983-10-13 Toshiba Corp 金属化合物被膜の形成方法
EP0106638A1 (en) * 1982-10-12 1984-04-25 National Research Development Corporation Method and apparatus for growing material in a glow discharge
JPH079700B2 (ja) * 1982-10-12 1995-02-01 ティーディーケイ株式会社 磁気記録媒体
GB2134431B (en) * 1983-02-04 1986-05-21 Atomic Energy Authority Uk Improvements in ball-point pens
JPS59205470A (ja) * 1983-05-02 1984-11-21 Kowa Eng Kk 硬質被膜の形成装置及びその形成方法
JPS59205471A (ja) * 1983-05-02 1984-11-21 Kowa Eng Kk 被処理物品の表面に黒色被膜を形成する方法
EP0154814A3 (en) * 1984-03-16 1987-08-26 American Cyanamid Company Substrates coated by plasma enhanced chemical vapor deposition, apparatus and process for their production
JPS60200523A (ja) * 1984-03-26 1985-10-11 Agency Of Ind Science & Technol シリコン薄膜の製造法
IL71530A (en) * 1984-04-12 1987-09-16 Univ Ramot Method and apparatus for surface-treating workpieces
JPS61205146A (ja) * 1985-03-08 1986-09-11 Hitachi Koki Co Ltd ドツトプリンタ用印字ヘツド
GB8512455D0 (en) * 1985-05-16 1985-06-19 Atomic Energy Authority Uk Coating apparatus
CN85106828B (zh) * 1985-09-10 1987-09-09 张戈飞 金属零件表面形成硫化物层的方法及设备
JPS62188771A (ja) * 1986-02-14 1987-08-18 Daido Steel Co Ltd 構造用鋼の表面硬化方法
JPS6320300A (ja) * 1986-07-14 1988-01-27 三菱重工業株式会社 有翼回収飛行体の緊急脱出装置

Also Published As

Publication number Publication date
US4762756A (en) 1988-08-09
NL194551B (nl) 2002-03-01
NL8701340A (nl) 1988-01-04
JPS62294160A (ja) 1987-12-21
GB2192196A (en) 1988-01-06
SE465578B (sv) 1991-09-30
GB2192196B (en) 1991-01-02
SE8702410D0 (sv) 1987-06-10
DE3702984A1 (de) 1987-12-17
DE3702984C2 (sv) 1993-02-25
GB8711657D0 (en) 1987-06-24
NL194551C (nl) 2002-07-02
FR2600082A1 (fr) 1987-12-18
FR2600082B1 (fr) 1993-04-09
CH671407A5 (sv) 1989-08-31

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