SE8702410D0 - Forfarande for termokemisk ytbehandling av material i ett reaktivt gasplasma - Google Patents
Forfarande for termokemisk ytbehandling av material i ett reaktivt gasplasmaInfo
- Publication number
- SE8702410D0 SE8702410D0 SE8702410A SE8702410A SE8702410D0 SE 8702410 D0 SE8702410 D0 SE 8702410D0 SE 8702410 A SE8702410 A SE 8702410A SE 8702410 A SE8702410 A SE 8702410A SE 8702410 D0 SE8702410 D0 SE 8702410D0
- Authority
- SE
- Sweden
- Prior art keywords
- reactive gas
- surface treatment
- conduct
- methods described
- gas plasma
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH2415/86A CH671407A5 (sv) | 1986-06-13 | 1986-06-13 |
Publications (3)
Publication Number | Publication Date |
---|---|
SE8702410D0 true SE8702410D0 (sv) | 1987-06-10 |
SE8702410L SE8702410L (sv) | 1987-12-14 |
SE465578B SE465578B (sv) | 1991-09-30 |
Family
ID=4233265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE8702410A SE465578B (sv) | 1986-06-13 | 1987-06-10 | Foerfarande foer termokemisk ytbehandling av material i en vakuumkammare samt formkropp behandlad medelst foerfarandet |
Country Status (8)
Country | Link |
---|---|
US (1) | US4762756A (sv) |
JP (1) | JPS62294160A (sv) |
CH (1) | CH671407A5 (sv) |
DE (1) | DE3702984A1 (sv) |
FR (1) | FR2600082B1 (sv) |
GB (1) | GB2192196B (sv) |
NL (1) | NL194551C (sv) |
SE (1) | SE465578B (sv) |
Families Citing this family (49)
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---|---|---|---|---|
DE3742317A1 (de) * | 1987-12-14 | 1989-06-22 | Repenning Detlev | Verfahren zur herstellung korrosion-, verschleiss- und pressfester schichten |
FR2630133B1 (fr) * | 1988-04-18 | 1993-09-24 | Siderurgie Fse Inst Rech | Procede pour l'amelioration de la resistance a la corrosion de materiaux metalliques |
US5192410A (en) * | 1988-07-28 | 1993-03-09 | Nippon Steel Corporation | Process for manufacturing multi ceramic layer-coated metal plate |
US5079089A (en) * | 1988-07-28 | 1992-01-07 | Nippon Steel Corporation | Multi ceramic layer-coated metal plate and process for manufacturing same |
US5304417A (en) * | 1989-06-02 | 1994-04-19 | Air Products And Chemicals, Inc. | Graphite/carbon articles for elevated temperature service and method of manufacture |
DE3918562A1 (de) * | 1989-06-07 | 1990-12-13 | Repenning Detlev | Verfahren zur herstellung hochharter schichten auf refraktaeren metallwerkstoffen sowie ihren legierungen |
US5266389A (en) * | 1989-09-29 | 1993-11-30 | Sumitomo Electric Industries, Ltd. | Surface-coated hard material for cutting tools or wear resistance tools |
US5264297A (en) * | 1990-03-09 | 1993-11-23 | Kennametal Inc. | Physical vapor deposition of titanium nitride on a nonconductive substrate |
JP2704317B2 (ja) * | 1990-03-09 | 1998-01-26 | ケンナメタル インコーポレイテツド | 窒化チタニウムの非電導体基板上への物理的蒸着 |
US5707692A (en) * | 1990-10-23 | 1998-01-13 | Canon Kabushiki Kaisha | Apparatus and method for processing a base substance using plasma and a magnetic field |
US5503725A (en) * | 1991-04-29 | 1996-04-02 | Novatech | Method and device for treatment of products in gas-discharge plasma |
CH683776A5 (de) * | 1991-12-05 | 1994-05-13 | Alusuisse Lonza Services Ag | Beschichten einer Substratfläche mit einer Permeationssperre. |
US5383980A (en) * | 1992-01-20 | 1995-01-24 | Leybold Durferrit Gmbh | Process for hardening workpieces in a pulsed plasma discharge |
CA2121266C (en) * | 1992-08-14 | 1998-06-09 | Simon K. Nieh | Surface preparation and deposition method for titanium nitride onto carbonaceous |
DE4416525B4 (de) * | 1993-05-27 | 2008-06-05 | Oerlikon Trading Ag, Trübbach | Verfahren zur Herstellung einer Beschichtung erhöhter Verschleißfestigkeit auf Werkstückoberflächen, und dessen Verwendung |
KR100326488B1 (ko) * | 1993-06-21 | 2002-06-20 | 조셉 제이. 스위니 | 플라즈마화학기상증착법 |
JP2909361B2 (ja) * | 1993-09-21 | 1999-06-23 | 大阪府 | チタン金属の表面処理方法 |
RU2048601C1 (ru) * | 1993-12-20 | 1995-11-20 | Рыжов Николай Михайлович | Способ диагностики процесса химико-термической обработки сталей и сплавов в тлеющем разряде и устройство для его осуществления |
US5975912A (en) * | 1994-06-03 | 1999-11-02 | Materials Research Corporation | Low temperature plasma-enhanced formation of integrated circuits |
US5665640A (en) | 1994-06-03 | 1997-09-09 | Sony Corporation | Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor |
US5628829A (en) | 1994-06-03 | 1997-05-13 | Materials Research Corporation | Method and apparatus for low temperature deposition of CVD and PECVD films |
DE19526387C2 (de) * | 1994-07-19 | 1998-12-10 | Sumitomo Metal Mining Co | Doppelt beschichteter Stahlverbundgegenstand und Verfahren zu dessen Herstellung |
EP0703303A1 (de) * | 1994-07-27 | 1996-03-27 | Balzers Sa | Korrosions- und verschleissfester Körper sowie Verfahren zu dessen Herstellung |
EP0694629A3 (de) | 1994-07-27 | 1998-09-23 | Balzers Sa | Korrosions- und verschleissfester Körper, Verfahren zu dessen Herstellung sowie Vakuumbehandlungsanlage |
US5830540A (en) * | 1994-09-15 | 1998-11-03 | Eltron Research, Inc. | Method and apparatus for reactive plasma surfacing |
DE4440521C1 (de) | 1994-11-12 | 1995-11-02 | Rowo Coating Ges Fuer Beschich | Vorrichtung zum Beschichten von Substraten mit einem Materialdampf im Unterdruck oder Vakuum |
US5753045A (en) * | 1995-01-25 | 1998-05-19 | Balzers Aktiengesellschaft | Vacuum treatment system for homogeneous workpiece processing |
EP0724026B1 (de) * | 1995-01-25 | 1999-10-13 | Balzers Aktiengesellschaft | Verfahren zur reaktiven Schichtabscheidung |
US5749937A (en) | 1995-03-14 | 1998-05-12 | Lockheed Idaho Technologies Company | Fast quench reactor and method |
US7576296B2 (en) * | 1995-03-14 | 2009-08-18 | Battelle Energy Alliance, Llc | Thermal synthesis apparatus |
US6821500B2 (en) | 1995-03-14 | 2004-11-23 | Bechtel Bwxt Idaho, Llc | Thermal synthesis apparatus and process |
WO1996031899A1 (en) * | 1995-04-07 | 1996-10-10 | Advanced Energy Industries, Inc. | Adjustable energy quantum thin film plasma processing system |
US5972790A (en) * | 1995-06-09 | 1999-10-26 | Tokyo Electron Limited | Method for forming salicides |
US6452338B1 (en) | 1999-12-13 | 2002-09-17 | Semequip, Inc. | Electron beam ion source with integral low-temperature vaporizer |
AU2906401A (en) * | 1999-12-21 | 2001-07-03 | Bechtel Bwxt Idaho, Llc | Hydrogen and elemental carbon production from natural gas and other hydrocarbons |
US6605160B2 (en) | 2000-08-21 | 2003-08-12 | Robert Frank Hoskin | Repair of coatings and surfaces using reactive metals coating processes |
DE10048589A1 (de) * | 2000-09-30 | 2002-04-25 | Volkswagen Ag | Schaltvorrichtung für ein Kraftfahrzeuggetriebe |
US6936145B2 (en) * | 2002-02-28 | 2005-08-30 | Ionedge Corporation | Coating method and apparatus |
BR0205419B1 (pt) * | 2002-12-20 | 2017-10-24 | Coppe/Ufrj Coordenacao Dos Programas De Pos Graduacao De Engenharia Da Univ Federal Do Rio De Janeir | Process of ionic nitretation by pulsed plasma for obtaining diffusion barrier for hydrogen for steel api 5l x-65 |
US7216067B2 (en) * | 2002-12-31 | 2007-05-08 | Tokyo Electron Limited | Non-linear test load and method of calibrating a plasma system |
BRPI0414547A (pt) * | 2003-09-19 | 2006-11-07 | Akzo Nobel Nv | metalização de substrato(s) por um processo de deposição lìquido/vapor |
US20050281958A1 (en) * | 2004-06-22 | 2005-12-22 | Walton Scott G | Electron beam enhanced nitriding system (EBENS) |
US7354561B2 (en) * | 2004-11-17 | 2008-04-08 | Battelle Energy Alliance, Llc | Chemical reactor and method for chemically converting a first material into a second material |
US8591821B2 (en) * | 2009-04-23 | 2013-11-26 | Battelle Energy Alliance, Llc | Combustion flame-plasma hybrid reactor systems, and chemical reactant sources |
EP2429777B2 (en) * | 2009-05-15 | 2022-06-01 | The Gillette Company LLC | Razor blade coating |
US9761424B1 (en) | 2011-09-07 | 2017-09-12 | Nano-Product Engineering, LLC | Filtered cathodic arc method, apparatus and applications thereof |
US10304665B2 (en) | 2011-09-07 | 2019-05-28 | Nano-Product Engineering, LLC | Reactors for plasma-assisted processes and associated methods |
RU2611251C2 (ru) * | 2015-06-15 | 2017-02-21 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Уфимский государственный авиационный технический университет" | Способ азотирования в плазме повышенной плотности |
JP7244387B2 (ja) * | 2019-07-31 | 2023-03-22 | Dowaサーモテック株式会社 | 珪窒化バナジウム膜被覆部材の製造方法および珪窒化バナジウム膜被覆部材 |
Family Cites Families (32)
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DE1150655B (de) * | 1960-05-05 | 1963-06-27 | Siemens Ag | Verfahren zum Dotieren eines festen Halbleiterkristalls |
US3639151A (en) * | 1969-03-13 | 1972-02-01 | United Aircraft Corp | Vapor randomization in vacuum deposition of coatings |
RO74414A2 (ro) * | 1974-03-23 | 1981-09-24 | Institutul De Cercetari Si Proiectari Tehnologice Pentru Sectoare Calde,Ro | Procedeu de nitrurare ionica |
JPS5118944A (ja) * | 1974-08-07 | 1976-02-14 | Suwa Seikosha Kk | Kisohokaho |
GB1483966A (en) * | 1974-10-23 | 1977-08-24 | Sharp Kk | Vapourized-metal cluster ion source and ionized-cluster beam deposition |
CS176690B1 (sv) * | 1975-03-04 | 1977-06-30 | ||
GB1422519A (en) * | 1975-03-21 | 1976-01-28 | Telic Corp | Sputtering method and apparatus |
GB1582231A (en) * | 1976-08-13 | 1981-01-07 | Nat Res Dev | Application of a layer of carbonaceous material to a surface |
SE407081B (sv) * | 1977-07-27 | 1979-03-12 | Hultquist Gunnar B | Sett att framstella ytskikt med forbettrade korrosionsegenskaper pa foremal av jernkromlegerigar |
GB2030180B (en) * | 1978-01-26 | 1983-05-25 | Secr Defence | Vapour deposition of metal in plasma discharge |
JPS5845177B2 (ja) * | 1979-03-09 | 1983-10-07 | 富士通株式会社 | 半導体表面絶縁膜の形成法 |
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GB2070340B (en) * | 1980-02-07 | 1983-10-12 | Shinetsu Chemical Co | Method for surface properties of a disclike shaped article of a vinyl chloridebased resin |
JPS56116869A (en) * | 1980-02-18 | 1981-09-12 | Shunpei Yamazaki | Inductive reduced pressure gaseous phase method |
FR2501727A1 (fr) * | 1981-03-13 | 1982-09-17 | Vide Traitement | Procede de traitements thermochimiques de metaux par bombardement ionique |
FI63783C (fi) * | 1981-09-30 | 1983-08-10 | Kymin Oy Kymmene Ab | Foerfarande foer nitrering vid laogt tryck med hjaelp av glimurladdning |
JPS58141376A (ja) * | 1982-02-16 | 1983-08-22 | Seiko Epson Corp | プラズマセメンテ−シヨン |
JPS58174568A (ja) * | 1982-04-08 | 1983-10-13 | Toshiba Corp | 金属化合物被膜の形成方法 |
JPH079700B2 (ja) * | 1982-10-12 | 1995-02-01 | ティーディーケイ株式会社 | 磁気記録媒体 |
EP0106638A1 (en) * | 1982-10-12 | 1984-04-25 | National Research Development Corporation | Method and apparatus for growing material in a glow discharge |
GB2134431B (en) * | 1983-02-04 | 1986-05-21 | Atomic Energy Authority Uk | Improvements in ball-point pens |
JPS59205470A (ja) * | 1983-05-02 | 1984-11-21 | Kowa Eng Kk | 硬質被膜の形成装置及びその形成方法 |
JPS59205471A (ja) * | 1983-05-02 | 1984-11-21 | Kowa Eng Kk | 被処理物品の表面に黒色被膜を形成する方法 |
EP0154814A3 (en) * | 1984-03-16 | 1987-08-26 | American Cyanamid Company | Substrates coated by plasma enhanced chemical vapor deposition, apparatus and process for their production |
JPS60200523A (ja) * | 1984-03-26 | 1985-10-11 | Agency Of Ind Science & Technol | シリコン薄膜の製造法 |
IL71530A (en) * | 1984-04-12 | 1987-09-16 | Univ Ramot | Method and apparatus for surface-treating workpieces |
JPS61205146A (ja) * | 1985-03-08 | 1986-09-11 | Hitachi Koki Co Ltd | ドツトプリンタ用印字ヘツド |
GB8512455D0 (en) * | 1985-05-16 | 1985-06-19 | Atomic Energy Authority Uk | Coating apparatus |
CN85106828B (zh) * | 1985-09-10 | 1987-09-09 | 张戈飞 | 金属零件表面形成硫化物层的方法及设备 |
JPS62188771A (ja) * | 1986-02-14 | 1987-08-18 | Daido Steel Co Ltd | 構造用鋼の表面硬化方法 |
JPS6320300A (ja) * | 1986-07-14 | 1988-01-27 | 三菱重工業株式会社 | 有翼回収飛行体の緊急脱出装置 |
-
1986
- 1986-06-13 CH CH2415/86A patent/CH671407A5/de not_active IP Right Cessation
-
1987
- 1987-02-02 DE DE19873702984 patent/DE3702984A1/de active Granted
- 1987-04-17 JP JP62093484A patent/JPS62294160A/ja active Pending
- 1987-05-18 GB GB8711657A patent/GB2192196B/en not_active Expired - Lifetime
- 1987-06-09 NL NL8701340A patent/NL194551C/nl not_active IP Right Cessation
- 1987-06-09 FR FR8707993A patent/FR2600082B1/fr not_active Expired - Lifetime
- 1987-06-10 SE SE8702410A patent/SE465578B/sv not_active IP Right Cessation
- 1987-06-12 US US07/062,226 patent/US4762756A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US4762756A (en) | 1988-08-09 |
DE3702984A1 (de) | 1987-12-17 |
GB2192196A (en) | 1988-01-06 |
NL8701340A (nl) | 1988-01-04 |
FR2600082A1 (fr) | 1987-12-18 |
NL194551C (nl) | 2002-07-02 |
CH671407A5 (sv) | 1989-08-31 |
SE465578B (sv) | 1991-09-30 |
GB2192196B (en) | 1991-01-02 |
NL194551B (nl) | 2002-03-01 |
FR2600082B1 (fr) | 1993-04-09 |
DE3702984C2 (sv) | 1993-02-25 |
GB8711657D0 (en) | 1987-06-24 |
SE8702410L (sv) | 1987-12-14 |
JPS62294160A (ja) | 1987-12-21 |
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Legal Events
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